JP2006514149A5 - - Google Patents
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- Publication number
- JP2006514149A5 JP2006514149A5 JP2004572150A JP2004572150A JP2006514149A5 JP 2006514149 A5 JP2006514149 A5 JP 2006514149A5 JP 2004572150 A JP2004572150 A JP 2004572150A JP 2004572150 A JP2004572150 A JP 2004572150A JP 2006514149 A5 JP2006514149 A5 JP 2006514149A5
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- gas
- main chamber
- product
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007789 gas Substances 0.000 claims description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- 150000001768 cations Chemical class 0.000 claims description 4
- 150000002500 ions Chemical class 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 2
- 229910052786 argon Inorganic materials 0.000 claims description 2
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000001307 helium Substances 0.000 claims description 2
- 229910052734 helium Inorganic materials 0.000 claims description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 2
- 238000000034 method Methods 0.000 claims description 2
- 238000000465 moulding Methods 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2003-0029393A KR100500040B1 (ko) | 2003-05-09 | 2003-05-09 | 전자파 차단, 대전방지, 표면경화를 위한 고분자재료성형품의 표면 이온화 방법 |
| PCT/KR2003/001659 WO2004104074A1 (en) | 2003-05-09 | 2003-08-18 | An ionization method of surface of high molecular materials |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006514149A JP2006514149A (ja) | 2006-04-27 |
| JP2006514149A5 true JP2006514149A5 (enExample) | 2008-09-11 |
Family
ID=36383816
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004572150A Pending JP2006514149A (ja) | 2003-05-09 | 2003-08-18 | 高分子材料表面のイオン化方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20060042745A1 (enExample) |
| EP (1) | EP1629029A4 (enExample) |
| JP (1) | JP2006514149A (enExample) |
| KR (1) | KR100500040B1 (enExample) |
| CN (1) | CN1771282A (enExample) |
| AU (1) | AU2003256107A1 (enExample) |
| WO (1) | WO2004104074A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE202009001530U1 (de) * | 2009-02-06 | 2009-04-09 | Sura Co. | Strahlenschutzvorrichtung für Mobiltelefone |
| FR2942801B1 (fr) * | 2009-03-05 | 2012-03-23 | Quertech Ingenierie | Procede de traitement d'une piece en elastomere par des ions multi-energies he+ et he2+ pour diminuer le frottement |
| FR2964972B1 (fr) * | 2010-09-20 | 2014-07-11 | Valeo Vision | Materiau a base de polyamide(s) traite en surface |
| FR2964971B1 (fr) * | 2010-09-20 | 2014-07-11 | Valeo Vision | Materiau a base de polymere(s) traite en surface |
| FR2969078B1 (fr) | 2010-12-15 | 2013-04-12 | Valeo Systemes Dessuyage | Organe d'essuyage en materiau a base d'elastomere(s) sur-reticule |
| FR2969079B1 (fr) | 2010-12-15 | 2013-04-12 | Valeo Systemes Dessuyage | Procede de fabrication d'une jumelle d'organes d'essuyage |
| CN103370363B (zh) | 2010-12-15 | 2016-02-10 | 法雷奥系统公司 | 风挡擦拭器刮片处理方法 |
| FR2975308B1 (fr) | 2011-05-16 | 2015-06-26 | Valeo Systemes Dessuyage | Dispositif d'etancheite pour le traitement sous vide d'une surface d'un objet |
| FR2976536B1 (fr) | 2011-06-15 | 2014-09-12 | Valeo Systemes Dessuyage | Procede de traitement d'un organe d'essuyage |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5133757A (en) * | 1990-07-31 | 1992-07-28 | Spire Corporation | Ion implantation of plastic orthopaedic implants |
| KR960000481B1 (ko) * | 1992-06-23 | 1996-01-08 | 주식회사고진공산업 | 플라스틱에 전자파 방해 차단용 금속 피막 형성방법 |
| US5868897A (en) * | 1996-07-31 | 1999-02-09 | Toyo Technologies, Inc. | Device and method for processing a plasma to alter the surface of a substrate using neutrals |
| US5993678A (en) * | 1996-07-31 | 1999-11-30 | Toyo Technologies Inc. | Device and method for processing a plasma to alter the surface of a substrate |
| JPH1180947A (ja) * | 1997-09-01 | 1999-03-26 | Anelva Corp | イオン化スパッタ装置 |
| KR100347971B1 (ko) * | 2000-03-06 | 2002-08-09 | 한국전력공사 | 낮은 에너지 이온빔조사에 의한 폴리머 표면의 전기 전도성 및 기계적 물성향상 장치 |
| EP1279955B2 (en) * | 2001-07-24 | 2010-03-03 | Services Petroliers Schlumberger | Helium ionization detector |
-
2003
- 2003-05-09 KR KR10-2003-0029393A patent/KR100500040B1/ko not_active Expired - Fee Related
- 2003-08-18 US US10/522,369 patent/US20060042745A1/en not_active Abandoned
- 2003-08-18 CN CNA038264293A patent/CN1771282A/zh active Pending
- 2003-08-18 WO PCT/KR2003/001659 patent/WO2004104074A1/en not_active Ceased
- 2003-08-18 JP JP2004572150A patent/JP2006514149A/ja active Pending
- 2003-08-18 EP EP03817017A patent/EP1629029A4/en not_active Withdrawn
- 2003-08-18 AU AU2003256107A patent/AU2003256107A1/en not_active Abandoned
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