JP2006324119A5 - - Google Patents

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Publication number
JP2006324119A5
JP2006324119A5 JP2005146139A JP2005146139A JP2006324119A5 JP 2006324119 A5 JP2006324119 A5 JP 2006324119A5 JP 2005146139 A JP2005146139 A JP 2005146139A JP 2005146139 A JP2005146139 A JP 2005146139A JP 2006324119 A5 JP2006324119 A5 JP 2006324119A5
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JP
Japan
Prior art keywords
electron
electron gun
extraction
magnetic pole
electron beam
Prior art date
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Pending
Application number
JP2005146139A
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English (en)
Japanese (ja)
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JP2006324119A (ja
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Priority to JP2005146139A priority Critical patent/JP2006324119A/ja
Priority claimed from JP2005146139A external-priority patent/JP2006324119A/ja
Publication of JP2006324119A publication Critical patent/JP2006324119A/ja
Publication of JP2006324119A5 publication Critical patent/JP2006324119A5/ja
Pending legal-status Critical Current

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JP2005146139A 2005-05-19 2005-05-19 電子銃 Pending JP2006324119A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005146139A JP2006324119A (ja) 2005-05-19 2005-05-19 電子銃

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005146139A JP2006324119A (ja) 2005-05-19 2005-05-19 電子銃

Publications (2)

Publication Number Publication Date
JP2006324119A JP2006324119A (ja) 2006-11-30
JP2006324119A5 true JP2006324119A5 (zh) 2008-06-26

Family

ID=37543638

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005146139A Pending JP2006324119A (ja) 2005-05-19 2005-05-19 電子銃

Country Status (1)

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JP (1) JP2006324119A (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7923060B2 (en) * 2006-10-18 2011-04-12 Ngk Insulators, Ltd. Method of manufacturing ceramic filter
JP4988444B2 (ja) 2007-06-19 2012-08-01 株式会社日立製作所 検査方法および装置
JP5386229B2 (ja) 2009-05-22 2014-01-15 株式会社日立ハイテクノロジーズ 電子銃
JP5290238B2 (ja) * 2010-05-21 2013-09-18 株式会社日立ハイテクノロジーズ 電子顕微鏡
EP2444990B1 (en) * 2010-10-19 2014-06-25 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Simplified particle emitter and method of operating thereof
JP6095338B2 (ja) * 2012-11-28 2017-03-15 株式会社日立製作所 電子銃および荷電粒子線装置
JP6340165B2 (ja) * 2013-04-25 2018-06-06 株式会社日立ハイテクノロジーズ 電子銃、荷電粒子銃およびそれらを用いた荷電粒子線装置
JP2013225521A (ja) * 2013-06-17 2013-10-31 Hitachi High-Technologies Corp 電子銃
US10410827B2 (en) 2017-05-03 2019-09-10 Fei Company Gun lens design in a charged particle microscope
WO2019049261A1 (ja) 2017-09-07 2019-03-14 株式会社日立ハイテクノロジーズ 電子銃および電子ビーム応用装置
EP4075475A4 (en) * 2019-12-17 2024-07-24 Inter Univ Research Institute Corporation National Institutes Of Natural Sciences CATHODE LENS FOR CORRECTING SPHERICAL ABERRATION, ELECTROSTATIC LENS FOR CORRECTING SPHERICAL ABERRATION, ELECTRON SPECTROSCOPE AND PHOTOEMISSION ELECTRON MICROSCOPE

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH073771B2 (ja) * 1987-12-11 1995-01-18 日本電子株式会社 静磁界重畳型電子銃
JP2835265B2 (ja) * 1992-08-27 1998-12-14 株式会社東芝 磁界界浸型電子銃及び磁界界浸型電子銃操作方法
JP3900792B2 (ja) * 2000-04-26 2007-04-04 株式会社日立製作所 電子銃

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