JP2006309207A5 - - Google Patents

Download PDF

Info

Publication number
JP2006309207A5
JP2006309207A5 JP2006094224A JP2006094224A JP2006309207A5 JP 2006309207 A5 JP2006309207 A5 JP 2006309207A5 JP 2006094224 A JP2006094224 A JP 2006094224A JP 2006094224 A JP2006094224 A JP 2006094224A JP 2006309207 A5 JP2006309207 A5 JP 2006309207A5
Authority
JP
Japan
Prior art keywords
lens
array
optical path
beam homogenizer
array lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006094224A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006309207A (ja
JP4865382B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006094224A priority Critical patent/JP4865382B2/ja
Priority claimed from JP2006094224A external-priority patent/JP4865382B2/ja
Publication of JP2006309207A publication Critical patent/JP2006309207A/ja
Publication of JP2006309207A5 publication Critical patent/JP2006309207A5/ja
Application granted granted Critical
Publication of JP4865382B2 publication Critical patent/JP4865382B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2006094224A 2005-04-01 2006-03-30 ビームホモジナイザ及びレーザ照射装置 Expired - Fee Related JP4865382B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006094224A JP4865382B2 (ja) 2005-04-01 2006-03-30 ビームホモジナイザ及びレーザ照射装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005106392 2005-04-01
JP2005106392 2005-04-01
JP2006094224A JP4865382B2 (ja) 2005-04-01 2006-03-30 ビームホモジナイザ及びレーザ照射装置

Publications (3)

Publication Number Publication Date
JP2006309207A JP2006309207A (ja) 2006-11-09
JP2006309207A5 true JP2006309207A5 (https=) 2009-04-23
JP4865382B2 JP4865382B2 (ja) 2012-02-01

Family

ID=37476099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006094224A Expired - Fee Related JP4865382B2 (ja) 2005-04-01 2006-03-30 ビームホモジナイザ及びレーザ照射装置

Country Status (1)

Country Link
JP (1) JP4865382B2 (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008124149A (ja) * 2006-11-09 2008-05-29 Advanced Lcd Technologies Development Center Co Ltd 光学装置および結晶化装置
JP4818958B2 (ja) * 2007-03-02 2011-11-16 住友重機械工業株式会社 ビーム照射装置、及び、ビーム照射方法
EP2128694B1 (en) 2007-03-19 2014-02-26 Panasonic Corporation Laser illuminating device and image display device
DE102007057868B4 (de) * 2007-11-29 2020-02-20 LIMO GmbH Vorrichtung zur Erzeugung einer linienförmigen Intensitätsverteilung
DE102008027231B4 (de) * 2008-06-06 2016-03-03 Limo Patentverwaltung Gmbh & Co. Kg Vorrichtung zur Strahlformung
US8946594B2 (en) * 2011-11-04 2015-02-03 Applied Materials, Inc. Optical design for line generation using microlens array
DE102013102553B4 (de) * 2013-03-13 2020-12-03 LIMO GmbH Vorrichtung zur Homogenisierung von Laserstrahlung
CN103499882A (zh) * 2013-10-10 2014-01-08 山东神戎电子股份有限公司 利用光锥的矩形光斑整形装置
KR101913654B1 (ko) * 2017-05-30 2018-12-28 학교법인 한동대학교 주밍기구가 포함된 빔 균질기
JP2020177132A (ja) * 2019-04-18 2020-10-29 株式会社ブイ・テクノロジー レンズユニット及びこのレンズユニットを備える光照射装置
CN114041079B (zh) * 2019-06-28 2025-07-22 大日本印刷株式会社 照明装置和照明方法
KR102324610B1 (ko) * 2019-12-26 2021-11-09 세메스 주식회사 기판 가열 유닛, 기판 처리 장치 및 기판 처리 방법
CN113182533B (zh) * 2021-03-19 2023-09-29 中国科学院福建物质结构研究所 一种激光加热3d打印系统及其控制方法
JP7661199B2 (ja) * 2021-10-29 2025-04-14 株式会社オーク製作所 照明光学系及びレーザ加工装置

Similar Documents

Publication Publication Date Title
JP2006309207A5 (https=)
US7842565B2 (en) Beam homogenizer and laser irradiation apparatus
JP2020201511A5 (https=)
JP6649402B2 (ja) ラインビーム形成装置
KR101322346B1 (ko) 파이버 전송 레이저 광학계
RU2539680C2 (ru) Устройство для формирования лазерного излучения и лазер с таким устройством
JP5432438B2 (ja) レーザ光線の均一な角度分布生成装置
JP2000517436A (ja) 光学的なビーム形成システム
JPH049293A (ja) 投影装置及び光照射方法
CN111367136A (zh) 多通道投影光学组件、多通道投影设备以及投影方法
CN102722027A (zh) 光整形装置和激光光源
JP4808733B2 (ja) 光均質化装置
JP2006215476A5 (https=)
KR101194972B1 (ko) 광 균일화 장치
WO2011048877A1 (ja) レーザ露光装置
CN102308364A (zh) 激光曝光装置
JP2008509436A5 (https=)
CN101762879B (zh) 一种激光扩束系统
JP2004521398A (ja) 光線を光学的に均質化するための配置および装置
CN102305969B (zh) 实现半导体激光光束匀化的微光学元件
JP2007047757A (ja) 透過型スクリーンの製造方法、その製造装置および透過型スクリーン
Jin et al. Microlens beam homogenizer for excimer laser processing
TW200419203A (en) Exposure apparatus
CN110133843A (zh) 一种激光扫描单元以及激光打印机
CN111381422A (zh) 投影设备及其控制方法