JP2006305786A - Mold manufacturing method - Google Patents

Mold manufacturing method Download PDF

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Publication number
JP2006305786A
JP2006305786A JP2005128784A JP2005128784A JP2006305786A JP 2006305786 A JP2006305786 A JP 2006305786A JP 2005128784 A JP2005128784 A JP 2005128784A JP 2005128784 A JP2005128784 A JP 2005128784A JP 2006305786 A JP2006305786 A JP 2006305786A
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mold
manufacturing
substrate
plating layer
metal
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JP2005128784A
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Japanese (ja)
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Takeshi Nakahara
剛 中原
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Nippon Seiki Co Ltd
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Nippon Seiki Co Ltd
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Priority to JP2005128784A priority Critical patent/JP2006305786A/en
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a mold manufacturing method which enables the shortening of the manufacturing time of the mold while reducing the production cost of the mold. <P>SOLUTION: The mold 7 is obtained by applying metallurgical treatment, which uses a fine powder 6 comprising a metal or ceramic powder, to a substrate 1, which has a predetermined formed pattern 4, on the side of the formed pattern 4. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、金型の製造方法に関し、特に精密構造の成型品を得る際に用いられる金型の製造方法に関するものである。   The present invention relates to a method for manufacturing a mold, and more particularly to a method for manufacturing a mold used for obtaining a molded product having a precision structure.

樹脂製品等の精密寸法製品を形成する金型の製造方法としては、特許文献1に開示されるものがある。かかる金型の製造方法は、シリコンや水晶のような単結晶基板に異方性エッチングにより所定の形状(形成パターン)を形成し、この単結晶基板の前記形状の形成面側にスパッタリングと電鋳とを行い、前記形状を転写して型を形成する方法が知られている。
特開平5−4232号公報
As a method of manufacturing a mold for forming a precision dimension product such as a resin product, there is one disclosed in Patent Document 1. In such a mold manufacturing method, a predetermined shape (formation pattern) is formed by anisotropic etching on a single crystal substrate such as silicon or quartz, and sputtering and electroforming are performed on the formation surface side of the shape of the single crystal substrate. And a method of forming the mold by transferring the shape is known.
Japanese Patent Laid-Open No. 5-4232

しかしながら、かかる金型の製造方法において、電鋳で金型を製造するために時間を要し、金型の製造コストを高くしてしまうことから、製造方法に改善の余地があった。   However, in such a mold manufacturing method, it takes time to manufacture the mold by electroforming, which increases the manufacturing cost of the mold, and there is room for improvement in the manufacturing method.

そこで本発明は、この問題に鑑みなされたものであり、基板にエッチング処理により所定の形状を得た後、この形状を転写することで金型を得る製造方法において、金型を製造時間を短縮することができ、金型の製造コストを低減させることが可能な金型の製造方法を提供することを目的とするものである。   Accordingly, the present invention has been made in view of this problem, and in a manufacturing method for obtaining a mold by transferring the shape after obtaining a predetermined shape by etching on a substrate, the manufacturing time of the mold is shortened. An object of the present invention is to provide a mold manufacturing method that can reduce the manufacturing cost of the mold.

本発明は、請求項1に記載した金型の製造方法のように、所定の形成パターンを有した基板の前記形成パターン側に金属もしくはセラミックからなる微粉末を用いた冶金処理を施して金型を得るものである。   As in the method for manufacturing a mold according to claim 1, the present invention performs metallurgy processing using a fine powder made of metal or ceramic on the side of the formation pattern of a substrate having a predetermined formation pattern. Is what you get.

また、請求項2に記載した金型の製造方法は、請求項1に記載した金型の製造方法において、前記基板の前記形成パターンの形成面側にメッキ層を形成し、前記メッキ層形成後に前記冶金処理を行うものである。   The mold manufacturing method according to claim 2 is the mold manufacturing method according to claim 1, wherein a plating layer is formed on a surface of the substrate on which the formation pattern is formed, and after the plating layer is formed. The metallurgical treatment is performed.

また、請求項3に記載した金型の製造方法は、請求項2に記載した金型の製造方法において、前記メッキ層は、ニッケルもしくはクロムからなるものである。   The mold manufacturing method described in claim 3 is the mold manufacturing method described in claim 2, wherein the plating layer is made of nickel or chromium.

また、請求項4に記載した金型の製造方法は、請求項1に記載した金型の製造方法において、前記基板は、シリコンからなるものである。   The mold manufacturing method described in claim 4 is the mold manufacturing method described in claim 1, wherein the substrate is made of silicon.

基板にエッチング処理により所定の形状を得た後、この形状を転写することで金型を得る製造方法に関し、金型を製造時間を短縮することができ、金型の製造コストを低減させることができる。   The present invention relates to a manufacturing method for obtaining a mold by obtaining a predetermined shape by etching on a substrate and then transferring the shape to reduce the manufacturing time of the mold and reduce the manufacturing cost of the mold. it can.

以下、添付図面に基づいて、本発明の実施形態について説明する。   Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.

図1は、金型の製造方法を示す第1の実施形態を説明するものである。金型の製造方法において、ガラスや水晶あるいはシリコンからなる平板状の基板1を用意し(図1(a))、この基板1上にスピンコートや印刷等により光感光性樹脂材を塗布してレジスト層2を形成する(図1(b))。   FIG. 1 illustrates a first embodiment showing a mold manufacturing method. In the mold manufacturing method, a flat substrate 1 made of glass, quartz or silicon is prepared (FIG. 1A), and a photosensitive resin material is applied onto the substrate 1 by spin coating or printing. A resist layer 2 is formed (FIG. 1B).

次に、レジスト層2を焼き付け処理し、所定のレジストパターン3を得る。そして、このレジストパターン3をマスクとして、SF6CF4等を用いたドライエッチング処理、あるいはKOH水溶液,TMAH及びフッ硝酸等を用いたウエットエッチング処理を用いて、基板1に所定形状の形成パターン(後述する金型に転写されるパターン)4をエッチング処理する(図1(c))。   Next, the resist layer 2 is baked to obtain a predetermined resist pattern 3. Then, by using this resist pattern 3 as a mask, a dry etching process using SF6CF4 or the like, or a wet etching process using KOH aqueous solution, TMAH, hydrofluoric acid, or the like is used to form a formation pattern (a gold pattern to be described later) on the substrate 1. The pattern 4 transferred to the mold is etched (FIG. 1C).

次に、基板1に残っているレジスト層2をレジスト除去液を用いて除去して所定形状の形成パターン4を有する原版5を得る(図1(d))。   Next, the resist layer 2 remaining on the substrate 1 is removed using a resist removing solution to obtain an original plate 5 having a formation pattern 4 having a predetermined shape (FIG. 1D).

そして、原版5を治具(図示しない)に上向きに配設し(形成パターン4が上向きの状態)、原版5上からニッケルやクロム、超鋼等の金属材料、あるいはセラミックからなる微粉末6を所定量配設し(図1(e))、その後、HIP(熱間静水圧プレス)あるいはSPS(プラズマ焼結)によって微粉末6を焼き固める冶金処理を施すことで、原版5の形成パターン4が転写された金型7を得るものである(図1(f),(g))。   Then, the original plate 5 is placed upward on a jig (not shown) (the formation pattern 4 is upward), and a fine powder 6 made of a metal material such as nickel, chromium, super steel, or ceramic is formed on the original plate 5. A predetermined amount is disposed (FIG. 1 (e)), and then a metallurgical process is performed to bake and harden the fine powder 6 by HIP (hot isostatic pressing) or SPS (plasma sintering), thereby forming the pattern 4 of the original 5 1 is obtained (FIGS. 1 (f) and 1 (g)).

かかる金型7の製造方法は、金属粉末あるいはセラミック粉末等の微粉末6を用いた冶金処理を施して金型7を製造方法を採用することによって、従来の電鋳により金型を得る製造方法に比べ、金型を短時間で製造することができるようになる。また製造時間を短縮することができることから、金型の製造コストを低減させることが可能となる。   The manufacturing method of this metal mold | die 7 is the manufacturing method which obtains a metal mold | die by the conventional electroforming by performing the metallurgical process using the fine powders 6, such as a metal powder or a ceramic powder, and employ | adopting the metal mold | die 7 manufacturing method Compared to, the mold can be manufactured in a short time. In addition, since the manufacturing time can be shortened, the manufacturing cost of the mold can be reduced.

次に、図2を用いて金型の製造方法を示す第2の実施形態について説明するが、前述した第1の実施形態と同様もしくは相当個所には同一符号を付してその詳細な説明は省く。   Next, a second embodiment showing a method for manufacturing a mold will be described with reference to FIG. 2. The same reference numerals are used for the same or corresponding parts as in the first embodiment described above, and the detailed description thereof will be given. Omit.

第2の実施形態に示す金型の製造方法が第1の実施形態における金型7の製造方法と比べ異なる点は、原版5の形成後の冶金処理にある。即ち、原版5を得た後に、原版5の形成パターン4の形成面側にメッキ層8を形成し、メッキ層8の形成面側に微粉末6を所定量配設し(図2(e))、その後、HIP法あるいはSPS法によって微粉末6を焼き固める冶金処理を施して金型9を得るものである(図2(f),(g))。メッキ層8は、例えば無電解メッキ法によるニッケルメッキ層,クロムメッキ層からなるものであり、所定の厚さを有するように形成される。尚、基板1をシリコンから構成する場合において、メッキ層8は、電解メッキ法によっても得ることができる。   The metal mold manufacturing method shown in the second embodiment is different from the metal mold manufacturing method in the first embodiment in the metallurgical process after the master 5 is formed. That is, after obtaining the original 5, the plating layer 8 is formed on the formation surface 4 side of the formation pattern 4 of the original 5, and a predetermined amount of fine powder 6 is disposed on the formation surface side of the plating layer 8 (FIG. 2E). Thereafter, metal mold processing for baking and solidifying the fine powder 6 by the HIP method or the SPS method is performed to obtain the mold 9 (FIGS. 2 (f) and 2 (g)). The plating layer 8 is formed of, for example, a nickel plating layer or a chromium plating layer by an electroless plating method, and is formed to have a predetermined thickness. In the case where the substrate 1 is made of silicon, the plating layer 8 can also be obtained by electrolytic plating.

かかる第2実施形態における金型9の製造方法は、前述した第1の実施形態と同様の効果を得ることができる。また、形成パターン4をメッキ層8により型取りを行うことができるため、形成パターン4を正確に金型9に転写することが可能となる。   The manufacturing method of the mold 9 in the second embodiment can obtain the same effects as those of the first embodiment described above. Further, since the formation pattern 4 can be molded by the plating layer 8, the formation pattern 4 can be accurately transferred to the mold 9.

前述した金型7,9の製造方法は、所定の形成パターン4を有した基板1の形成パターン4側に金属粉末もしくはセラミック粉末からなる微粉末6を用いた冶金処理を施して金型7,9を得るものであり、従来よりも短時間で金型7,9を得ることができ、しかも製造コストも低減させることが可能となる。   In the manufacturing method of the molds 7 and 9 described above, the metallization process using the fine powder 6 made of metal powder or ceramic powder is performed on the formation pattern 4 side of the substrate 1 having the predetermined formation pattern 4 to obtain the molds 7 and 9. 9, the molds 7 and 9 can be obtained in a shorter time than before, and the manufacturing cost can be reduced.

また、第2の実施形態における金型の製造方法は、基板1の形成パターン4の形成面側にニッケルもしくはクロムからなるメッキ層8を形成し、メッキ層8の形成後に前記冶金処理を行うものであり、形成パターン4をメッキ層8により型取りを行うことができるため、より正確に形成パターン4を金型9に転写することが可能となる。   In the mold manufacturing method according to the second embodiment, a plating layer 8 made of nickel or chromium is formed on the surface of the formation pattern 4 of the substrate 1, and the metallurgical treatment is performed after the formation of the plating layer 8. In addition, since the formation pattern 4 can be molded by the plating layer 8, the formation pattern 4 can be transferred to the mold 9 more accurately.

また、基板1をシリコンを用いることによって、メッキ層8を形成する場合に無電解メッキ法の他に電解メッキ法を用いることが可能となり、製造工程の自由度を増すことができる。   In addition, by using silicon for the substrate 1, it is possible to use an electrolytic plating method in addition to the electroless plating method when forming the plating layer 8, and the degree of freedom of the manufacturing process can be increased.

本発明の第1の実施形態の金型の製造方法を示す図である。It is a figure which shows the manufacturing method of the metal mold | die of the 1st Embodiment of this invention. 本発明の第2の実施形態の金型の製造方法を示す図である。It is a figure which shows the manufacturing method of the metal mold | die of the 2nd Embodiment of this invention.

符号の説明Explanation of symbols

1 基板
2 レジスト層
3 レジストパターン
4 形成パターン
5 原版
6 微粉体
7,9 金型
8 メッキ層
DESCRIPTION OF SYMBOLS 1 Substrate 2 Resist layer 3 Resist pattern 4 Formation pattern 5 Original plate 6 Fine powder 7,9 Mold 8 Plating layer

Claims (4)

所定の形成パターンを有した基板の前記形成パターン側に金属もしくはセラミックからなる微粉末を用いた冶金処理を施して金型を得ることを特徴とする金型の製造方法。   A metal mold manufacturing method, wherein a metal mold is obtained by performing metallurgical processing using a fine powder made of metal or ceramic on a side of the substrate having a predetermined pattern. 前記基板の前記形成パターンの形成面側にメッキ層を形成し、前記メッキ層形成後に前記冶金処理を行うことを特徴とする請求項1に記載の金型の製造方法。   The method for producing a mold according to claim 1, wherein a plating layer is formed on a side of the substrate on which the formation pattern is formed, and the metallurgical treatment is performed after the formation of the plating layer. 前記メッキ層は、ニッケルもしくはクロムからなることを特徴とする請求項2に記載の金型の製造方法。   The mold manufacturing method according to claim 2, wherein the plating layer is made of nickel or chromium. 前記基板は、シリコンからなることを特徴とする請求項1に記載の金型の製造方法。   The method for manufacturing a mold according to claim 1, wherein the substrate is made of silicon.
JP2005128784A 2005-04-27 2005-04-27 Mold manufacturing method Pending JP2006305786A (en)

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