JP2006278991A - Manufacturing method of multilayer wiring board - Google Patents

Manufacturing method of multilayer wiring board Download PDF

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JP2006278991A
JP2006278991A JP2005100152A JP2005100152A JP2006278991A JP 2006278991 A JP2006278991 A JP 2006278991A JP 2005100152 A JP2005100152 A JP 2005100152A JP 2005100152 A JP2005100152 A JP 2005100152A JP 2006278991 A JP2006278991 A JP 2006278991A
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multilayer wiring
wiring board
manufacturing
misalignment
interlayer
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Toru Meura
徹 和布浦
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Sumitomo Bakelite Co Ltd
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Sumitomo Bakelite Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a multilayer wiring board that can laminate layers with a high location accuracy in laminating a number of multilayer wiring boards at once. <P>SOLUTION: This method manufactures a multilayer wiring board through the thermocompression of a connection board 107 with a junction for preventing inter-layer position misalignment and another board 110 subject to connection with a junction for preventing an inter-layer position misalignment formed at the location opposite to the junction for preventing the inter-layer position misalignment of the above connection board. It joins a junction 112 of an inter-layer position misalignment and the above junction 112 to constitute prevention fixture for an inter-layer position misalignment through thermocompression. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、多層配線板の製造方法に関するものである。   The present invention relates to a method for manufacturing a multilayer wiring board.

多層配線板の製造方法として、複数枚の多層配線板製造用基板を一括で熱圧着して製造する方法がある。一括で積層する際、近来の配線の微細化、高密度化に伴い、回路基板間の位置精度の向上が大きな課題となっている。   As a method of manufacturing a multilayer wiring board, there is a method of manufacturing a plurality of multilayer wiring board manufacturing substrates by collectively thermocompression bonding. When stacking together, improvement in positional accuracy between circuit boards has become a major issue as miniaturization and higher density of recent wiring.

従来の技術として、熱圧着時の位置ズレを抑制するために、ピンにより位置合わせするピンラミネーション方式により複数の回路基板を位置合わせしたのち、ピンを挿入したまま熱圧着を行なう方法がある(例えば、特許文献1参照)。さらには、複数の回路基板を位置合わせしたのちハトメピン等によりカシメを行なう方法やプリプレグ等の接着性のある部材を用いて部分的に熱溶着する方法、またはこれらを同時に行なったのち、一括熱圧着を行なう方法がある(例えば、特許文献2参照)。これらの方法により、熱圧着時の内層回路基板の位置ズレをある程度抑制することが出来る。   As a conventional technique, there is a method in which a plurality of circuit boards are aligned by a pin lamination method in which alignment is performed by pins in order to suppress misalignment at the time of thermocompression bonding, and then thermocompression bonding is performed with the pins inserted (for example, , See Patent Document 1). Furthermore, after aligning a plurality of circuit boards, a method of caulking with eyelet pins or the like, a method of partial thermal welding using an adhesive member such as a prepreg, or a simultaneous thermocompression bonding after performing these simultaneously (For example, refer to Patent Document 2). By these methods, the positional deviation of the inner circuit board during thermocompression bonding can be suppressed to some extent.

しかしながら、ピンやハトメピン等を用いる場合、熱圧着時にピン挿入用の穴のクリアランス分だけ位置ズレが生じる。また、熱圧着時にピンのクリアランス部に溶融した樹脂が入ることで、ピンが抜けにくくなり、ピンを抜く工程が面倒になる。さらには、ハトメピン等の仮止め用のピンを用いてかしめる方法では仮止めピンを使い捨てすることになり、コストもかかる。プリプレグ等の接着性のある部材をもちいて、熱溶着により各層間の位置ズレを抑制する方法では、熱圧着時の加熱により熱溶着部分が再溶融することで、各層間の位置ズレが生じる。
特開2002−101253号公報(第2項) 特開2002−198644号公報(第2項)
However, when using a pin, eyelet pin, or the like, a positional deviation occurs by the clearance of the pin insertion hole during thermocompression bonding. In addition, when the molten resin enters the clearance portion of the pin at the time of thermocompression bonding, it becomes difficult to remove the pin, and the process of removing the pin becomes troublesome. Furthermore, in the method of caulking with a pin for temporary fixing such as eyelet pins, the temporary fixing pin is disposable, which is expensive. In a method of using an adhesive member such as a prepreg to suppress misalignment between the layers by thermal welding, misalignment between the respective layers occurs due to remelting of the thermally welded portion by heating during thermocompression bonding.
JP 2002-101253 A (2nd term) Japanese Patent Application Laid-Open No. 2002-198644 (second item)

本発明は、上記の問題を解決すべく、多層配線板の一括積層方法において、高精度に積層することができる多層配線板の製造方法を提供することを目的とする。   In order to solve the above-described problems, an object of the present invention is to provide a method for manufacturing a multilayer wiring board that can be laminated with high precision in a method for collectively laminating multilayer wiring boards.

即ち、本発明は、
(1) 層間位置ズレ防止用接合部が形成された接続用基板と、前記接続用基板の層間位置ズレ防止用接合部と対向する位置に層間位置ズレ防止用被接合部が形成された被接続用基板とを熱圧着して多層配線板を製造する方法であって、前記層間位置ズレ防止用接合部と前記前記層間位置ズレ防止用被接合部とを接合し、層間位置ズレ防止用固定部を形成して熱圧着することを特徴とする多層配線板の製造方法、
(2) 前記位置ズレ防止用の固定部は、前記接合部を構成する金属と被接合部を構成する金属により形成された合金で構成されるものである第(1)項に記載の多層配線板の製造方法、
(3) 前記合金は、前記前記接合部を構成する金属または被接合部を構成する金属よりも、高い融点を有するものである第(2)項に記載の多層配線板の製造方法、
(4) 前記合金は、Snと、Ag、Cu、AuおよびNiから選ばれる少なくとも1種とを含むものである第(2)項または第(3)項に記載の多層配線板、
(5) 前記位置ズレ防止用固定部の形成は、仮積層の際に行うものである第(1)項乃至第(4)項のいずれかに記載の多層配線板の製造方法、
(6) 前記層間位置ズレ防止用固定部の形成は、固定部材質の融点未満、前記接合部を構成する金属の融点および非接合部を構成する金属の融点のうち高い方の融点超、の温度で加熱して行うものである第(1)項乃至第(5)項のいずれかに記載の多層配線板の製造方法、
(7) 前記熱圧着は、前記接続用基板と被接続用基板とを複数枚積層し一括して行うものである第(1)項乃至第(6)項のいずれかに記載の多層配線板の製造方法、
(8) 熱圧着後の前記層間位置ズレ防止用接合部の中心部と、層間位置ズレ防止用被接合部の中心部との距離が、50μm以下である第(1)項乃至第(7)項のいずれかに記載の多層配線板の製造方法、
を提供するものである。
を提供するものである。
That is, the present invention
(1) A connection substrate on which an interlayer misalignment prevention joint is formed, and a connection in which an interlayer misalignment prevention joint is formed at a position facing the interlayer misalignment prevention joint of the connection substrate. A method of manufacturing a multilayer wiring board by thermocompression bonding with a circuit board, wherein the interlayer misalignment prevention joining portion and the interlayer misalignment prevention joined portion are joined, and an interlayer misalignment prevention fixing portion A method of manufacturing a multilayer wiring board, characterized by forming a thermocompression bonding,
(2) The multilayer wiring according to (1), wherein the fixing portion for preventing misalignment is made of an alloy formed of a metal constituting the joining portion and a metal constituting the joined portion. Board manufacturing method,
(3) The method for producing a multilayer wiring board according to (2), wherein the alloy has a higher melting point than the metal constituting the joining portion or the metal constituting the joined portion,
(4) The multilayer wiring board according to (2) or (3), wherein the alloy includes Sn and at least one selected from Ag, Cu, Au, and Ni.
(5) The method for producing a multilayer wiring board according to any one of (1) to (4), wherein the formation of the fixing portion for preventing misalignment is performed during temporary lamination.
(6) The formation of the fixing portion for preventing interlayer misalignment is less than the melting point of the fixing member material, the melting point of the higher melting point of the melting point of the metal constituting the joining portion and the melting point of the metal constituting the non-joining portion, The method for producing a multilayer wiring board according to any one of items (1) to (5), which is performed by heating at a temperature,
(7) The multilayer wiring board according to any one of (1) to (6), wherein the thermocompression bonding is performed by laminating a plurality of the connection substrates and the connection substrates. Manufacturing method,
(8) Items (1) to (7), wherein a distance between the center portion of the interlayer displacement prevention joint after thermocompression bonding and the center portion of the interlayer displacement prevention joint portion is 50 μm or less. A method for producing a multilayer wiring board according to any one of the items,
Is to provide.
Is to provide.

本発明によれば、熱圧着時の多層配線板の層間の位置ズレを抑制し、高精度に位置決めされた多層配線板を得ることができる。   ADVANTAGE OF THE INVENTION According to this invention, the position shift between the layers of the multilayer wiring board at the time of thermocompression bonding is suppressed, and the multilayer wiring board positioned with high precision can be obtained.

本発明は、層間位置ズレ防止用接合部が形成された接続用基板と、前記接続用基板の層間位置ズレ防止用接合部と対向する位置に層間位置ズレ防止用被接合部が形成された被接続用基板とを熱圧着して多層配線板を製造する方法であって、前記層間位置ズレ防止用接合部と前記前記層間位置ズレ防止用被接合部とを接合し、層間位置ズレ防止用固定部を形成して熱圧着することを特徴とする多層配線板の製造方法であり、多層配線板の熱圧着工程において、内層回路基板同士の位置ズレを抑制し、位置精度よく熱圧着できるものである。   The present invention provides a connection board on which an interlayer displacement prevention joint is formed, and a substrate on which an interlayer position prevention joint is formed at a position facing the interlayer displacement prevention joint of the connection board. A method of manufacturing a multilayer wiring board by thermocompression bonding with a connecting substrate, wherein the interlayer misalignment prevention joint and the interlayer misalignment prevention joint are joined, and interlayer misalignment prevention fixing This is a method for manufacturing a multilayer wiring board characterized by forming a portion and thermocompression bonding. In the thermocompression bonding process of the multilayer wiring board, the positional displacement between inner circuit boards can be suppressed and thermocompression bonding can be performed with high positional accuracy. is there.

以下、図面を参照して、本発明の実施形態について具体的に説明するが、本発明はこれによって何ら限定されるものではない。   Hereinafter, embodiments of the present invention will be specifically described with reference to the drawings, but the present invention is not limited thereto.

まず、絶縁層101から一方の面を露出するように、絶縁層中に埋め込まれた導体回路102とランド103の、露出面と反対側の面上に、前記絶縁層を貫通し、先端が凸状になっている導体ポスト104が、その先端部分を絶縁層から突出して形成され、更に導体回路およびランドと導体ポスト先端の少なくとも一方に半田105が形成され、更に前記導体ポストの先端が突出している前記絶縁層の表面、および前記導体ポストの先端が、接着剤層106で覆われている多層配線板製造用基板(接続用基板)107を、ベース銅箔に導体回路108とランド109が形成された被接続用基板110を対向させるように配置する(図1(a))。
ここで、層間位置ズレ防止用固定部を構成するものは、前記接続用基板における層間位置ズレ防止用接合部としては、導体ポスト104および半田105を用いるとことができ、前記被接続用基板における層間位置ズレ防止用被接合部としては、前記層間位置ズレ防止用接合部の対向する位置に設けられたランド109を用いることができ、予め、多層配線板内に位置ズレ防止用固定部を形成するランド、導体ポスト、半田を、層間の電気的接続に無関係な部分に設計しておくことが好ましい。
前記接合部を構成する半田は、SnとIn、あるいはSnと、Ag、Cu、Zn、Bi、Pd、Sb、Pb、InおよびAuの中から選ばれる1種以上とからなるものなどが挙げられる。また、導体ポストとしては、銅や導電ペーストなどで構成されるものが挙げられるが挙げられるが、導体ポストが前記半田層と同じ材質で構成されるものであれば、導体ポスト先端に半田層を形成する必要は無い。
First, so that one surface is exposed from the insulating layer 101, the conductor circuit 102 and the land 103 embedded in the insulating layer pass through the insulating layer on the surface opposite to the exposed surface, and the tip is convex. The conductor post 104 is formed so that the tip portion protrudes from the insulating layer, and the solder 105 is formed on at least one of the conductor circuit, the land, and the conductor post tip, and the tip of the conductor post protrudes. A multilayer wiring board manufacturing substrate (connection substrate) 107 whose surface of the insulating layer and the tip of the conductor post are covered with an adhesive layer 106 is formed, and a conductor circuit 108 and a land 109 are formed on the base copper foil. The connected substrates 110 to be connected are arranged so as to face each other (FIG. 1A).
Here, what constitutes the fixing portion for preventing the misalignment between the layers can use the conductor post 104 and the solder 105 as the joining portion for preventing the misalignment between the layers in the connecting substrate. As an inter-layer misalignment prevention bonded portion, a land 109 provided at a position opposite to the inter-layer misalignment prevention junction can be used, and a misalignment prevention fixing portion is previously formed in the multilayer wiring board. It is preferable to design the land, the conductor post, and the solder that are not related to the electrical connection between the layers.
Examples of the solder constituting the junction include Sn and In, or Sn and one or more selected from Ag, Cu, Zn, Bi, Pd, Sb, Pb, In, and Au. . In addition, examples of the conductor post include those made of copper or conductive paste, but if the conductor post is made of the same material as the solder layer, a solder layer is provided at the end of the conductor post. There is no need to form.

上記多層配線板製造用配線基板107および被接続用基板110の製造方法は、詳細に記述しないが、例えば、金属板上に、パターニングされためっきレジストを形成し、金属板を電解めっき用リード(給電用電極)として、レジスト金属層、導体回路を順に電解めっきにより形成する。次に、めっきレジストを除去すると被接続用基板を得る。続いて、形成した導体回路上に絶縁層を形成し、形成した絶縁層にビアを形成する。次に、金属板を電解めっき用リード(給電用電極)として、導体ポストを電解めっきにより形成する。この電解めっきにより、絶縁層のビアが形成されている部分に、導体ポストが形成しさらにその先端表面に半田を形成する。次に、接合用金属材料層の先端表面と絶縁層を覆うように、接着剤層を形成し、金属板をエッチングで除去することで、本発明の絶縁層から一方の面を露出するように絶縁層中に埋め込まれた導体回路を有する多層配線板製造用配線基板を得ることができる。   Although the manufacturing method of the wiring board 107 for manufacturing the multilayer wiring board and the substrate for connection 110 is not described in detail, for example, a patterned plating resist is formed on a metal plate, and the metal plate is subjected to an electrolytic plating lead ( As the power supply electrode), a resist metal layer and a conductor circuit are sequentially formed by electrolytic plating. Next, when the plating resist is removed, a substrate for connection is obtained. Subsequently, an insulating layer is formed on the formed conductor circuit, and a via is formed in the formed insulating layer. Next, the metal plate is used as an electroplating lead (feeding electrode), and the conductor post is formed by electroplating. By this electroplating, a conductor post is formed in the portion of the insulating layer where the via is formed, and solder is formed on the tip surface thereof. Next, an adhesive layer is formed so as to cover the tip surface of the bonding metal material layer and the insulating layer, and the metal plate is removed by etching so that one surface is exposed from the insulating layer of the present invention. A wiring board for producing a multilayer wiring board having a conductor circuit embedded in an insulating layer can be obtained.

次に、多層配線板製造用基板107と被接続用基板110を位置合わせし、前記半田が溶融せず接着剤が溶融し前記基板同士が接着剤を介して密着する温度で熱圧着し、仮積層した多層配線板111を得る(図1(b))。位置合わせ方法としては、図示しないが、ピンラミネーションによる方法のときには、予め多層配線板および被接続用基板の所定の個所へピン挿入用孔を形成し、所定の位置にピンが設置された治具を用いて、前記ピン挿入用孔に前記ピンを挿入して設置する。画像認識装置を用いる場合には、吸着機構を有する貼り合わせ用のステージへ、接続用基板と被接続用基板を、それぞれ載置する。吸着機構としては、真空吸着、静電チャックによる吸着などが利用できる。また、ステージには、位置合わせを行なうための微調整が可能な駆動を行なう機構や、加圧、貼り合わせを行うための機構を有することが好ましい。   Next, the multilayer wiring board manufacturing substrate 107 and the substrate to be connected 110 are aligned, and thermocompression bonding is performed at a temperature at which the solder does not melt and the adhesive melts and the substrates adhere to each other through the adhesive. A laminated multilayer wiring board 111 is obtained (FIG. 1B). Although not shown in the figure as an alignment method, when using the pin lamination method, a pin insertion hole is previously formed in a predetermined portion of the multilayer wiring board and the substrate to be connected, and the pin is installed at a predetermined position. The pin is inserted into the pin insertion hole and installed. In the case of using the image recognition device, the connection substrate and the connection target substrate are respectively placed on a bonding stage having a suction mechanism. As an adsorption mechanism, vacuum adsorption, adsorption by an electrostatic chuck, or the like can be used. Further, the stage preferably has a driving mechanism capable of fine adjustment for positioning and a mechanism for pressing and bonding.

次に、仮積層した多層配線板111の位置ズレ防止用固定部を形成したい箇所の層間位置ズレ防止用接合部(ランド103、導体ポスト104、半田105)を、多層配線板製造用基板107側から、接合用機構113により半田融点以上の温度で、部分的に熱圧着を行い、位置ズレ防止用固定部112を形成し、仮積層体114を得る(図1(c))。
本発明で用いる接合用機構としては、位置ズレ防止用固定部を局所的に半田融点以上の温度まで加熱し加圧できるものが好ましく、例えば半田ごてを用いて、位置ズレ防止用固定部を形成したい場所を多層配線板製造用基板側から押し付ける方法が挙げられる。
前記層間位置ズレ防止用固定部の形成は、固定部材質の融点未満、前記接合部を構成する金属の融点および非接合部を構成する金属の融点のうち高い方の融点超、の温度で加熱して行うことが好ましい。
Next, the interlayer misalignment prevention junction (land 103, conductor post 104, solder 105) at the location where the temporarily misaligned multilayer wiring board 111 is to be formed with the misalignment prevention fixing portion is connected to the multilayer wiring board manufacturing substrate 107 side. Then, the bonding mechanism 113 is partially subjected to thermocompression bonding at a temperature equal to or higher than the solder melting point to form a misalignment prevention fixing portion 112 to obtain a temporary laminate 114 (FIG. 1C).
As the bonding mechanism used in the present invention, a mechanism capable of locally heating and pressurizing the misalignment prevention fixing portion to a temperature equal to or higher than the solder melting point is preferable. For example, using a soldering iron, the misalignment prevention fixing portion is provided. The method of pressing the place to form from the board | substrate side for multilayer wiring board manufacture is mentioned.
The fixing portion for preventing the interlayer displacement is heated at a temperature lower than the melting point of the fixing member material, the higher melting point of the melting point of the metal constituting the joining portion and the melting point of the metal constituting the non-joining portion. It is preferable to do so.

このようにして得られた位置ズレ防止用固定部は、前記接合部を構成する金属と被接合部を構成する金属により形成された合金で構成されることが好ましく、前記前記接合部を構成する金属または被接合部を構成する金属よりも、高い融点を有するものであることがより好ましい。合金化することにより融点が高くなり、圧着における加熱温度を調整することができ、金属が溶融し流動することが抑制でき、位置ズレ防止ができる。このような位置ズレ防止用固定部の合金の具体例としては、半田固定部を構成する材質としては、Snと、Ag、Cu、AuおよびNiから選ばれる少なくとも1種とを含む合金が好ましく、半田接合時に合金化し融点が上昇する系であるSn−Cu合金、Sn−Ag−Ni合金、Sn−Au合金を含む合金組成がより好ましい。接合部へ前記の系を構成するためには、例えば、導体ポストへ形成する半田へSn−Ag半田を用い、ランドの半田と接触する部分へは、Auを形成する。仮積層体を熱圧着するときに、半田固定部がない状態では、熱圧着した場合には、半田の溶融と同時に多層配線板製造用基板と被接続用基板は圧着する力によりせん断応力や接着材の流れ方向の層間がずれる力がはたらき、層間の位置が大きくずれることとなるが、半田固定部を形成することで、熱圧着時に半田固定部にクラックが入ったり、バンプと半田の濡れの中心部分がずれたりするものの、層間がずれる力を大きく抑制することができるため、層間の位置ズレを大幅に抑制できる。さらに半田固定部に形成する合金を半田よりも融点を高くしておくことで、半田が溶融する温度で、半田固定部は固体であり、せん断応力や接着材の流れによる層間のずれをさらに小さくすることが出来る。これらにより、多層配線板の製造において、一括熱圧着することができる。   The positional misalignment prevention fixing portion obtained in this manner is preferably composed of an alloy formed of a metal constituting the joint and a metal constituting the joined portion, and constitutes the joint. It is more preferable that the metal has a higher melting point than the metal constituting the bonded portion. By alloying, the melting point becomes high, the heating temperature in the pressure bonding can be adjusted, the metal can be prevented from melting and flowing, and displacement can be prevented. As a specific example of such a misalignment-preventing fixing part, the material constituting the solder fixing part is preferably an alloy containing Sn and at least one selected from Ag, Cu, Au and Ni. An alloy composition including Sn—Cu alloy, Sn—Ag—Ni alloy, and Sn—Au alloy, which are alloyed at the time of soldering and increase in melting point, is more preferable. In order to configure the above system at the joint, for example, Sn-Ag solder is used for the solder formed on the conductor post, and Au is formed on the portion in contact with the land solder. When the temporary laminate is thermocompression bonded, if there is no solder fixing part, when thermocompression bonding is performed, shearing stress or adhesion is caused by the pressure of the multilayer wiring board manufacturing substrate and the connected substrate simultaneously with melting of the solder. The force that moves between the layers in the material flow direction works, and the position of the layers is greatly displaced. Although the center portion is displaced, the force of shifting the layers can be greatly suppressed, so that the positional deviation between the layers can be significantly suppressed. Furthermore, by keeping the melting point of the alloy formed on the solder fixing part higher than that of the solder, the solder fixing part is solid at the temperature at which the solder melts, and the interlayer displacement due to shear stress and adhesive flow is further reduced. I can do it. Thus, batch thermocompression bonding can be performed in the production of the multilayer wiring board.

更に多層配線板の層数を多くしたい場合には、所定の回数だけ前述の仮積層工程を繰り返すと良いが、例として、もう1層仮積層した場合について図を用いて説明する。仮積層体114へ多層配線板製造用基板115を対向させ(図1(d))、位置合わせして貼り合わせを行ない仮積層された多層配線板116を得る(図2(e))。このとき層間位置ズレ防止用固定部を形成した場所は、局所的に熱圧着するため、凹みが発生するが、仮積層時の熱圧着により接着剤層が溶融し、接着材で凹みを埋めることとなる。ここで、真空雰囲気で熱圧着することで、凹みが確実に接着剤により埋まる為、一括積層した多層配線板内にボイドを含みづらくなり好ましい。さらに仮積層した多層配線板116の位置ズレ防止用固定部を形成したい場所に多層配線板製造用基板115がわから、接合用機構113により半田融点以上の温度で熱圧着を行い、位置ズレ防止用固定部118を形成し、仮積層体117を得る。   Further, when it is desired to increase the number of layers of the multilayer wiring board, the above-described temporary stacking process may be repeated a predetermined number of times. However, as an example, the case where another layer is temporarily stacked will be described with reference to the drawings. The multilayer wiring board manufacturing substrate 115 is opposed to the temporary laminate 114 (FIG. 1 (d)) and aligned and bonded to obtain a temporarily laminated multilayer wiring board 116 (FIG. 2 (e)). At this time, the place where the fixing part for preventing misalignment between layers is locally thermocompression bonded, so a dent is generated, but the adhesive layer is melted by thermocompression during temporary lamination, and the dent is filled with an adhesive. It becomes. Here, thermocompression bonding in a vacuum atmosphere is preferable because the dent is surely filled with an adhesive, so that it is difficult for voids to be contained in the multilayered wiring board laminated in a lump. Furthermore, the multilayer wiring board manufacturing substrate 115 is known at a place where the fixing portion for preventing misalignment of the temporarily laminated multilayer wiring board 116 is to be formed, and the bonding mechanism 113 performs thermocompression bonding at a temperature equal to or higher than the solder melting point to prevent misalignment. The fixing part 118 is formed, and the temporary laminate 117 is obtained.

次に、仮積層体117を一括で熱圧着して、多層配線板119を得る(図2(g))。このとき、各内層間は位置ズレ防止用の固定部のために層間の位置ズレが大幅に抑制され、位置精度に優れた多層配線板を得ることが出来る。このとき、位置ズレ防止用固定部を形成するためにできた多層配線板製造用基板がわにある凹みを矯正するように圧着されるため、導体ポストの中心と、位置ズレ防止用固定部を形成したときにできた半田塗れ部分の中心の距離は50μm以内でずれることとなるが、位置ズレ防止用固定部を形成しない場合には、さらに大きくずれるため、歩留まりが悪化する。   Next, the temporary laminated body 117 is thermocompression-bonded at a time to obtain a multilayer wiring board 119 (FIG. 2 (g)). At this time, since each inner layer is a fixing portion for preventing displacement, the displacement between layers is greatly suppressed, and a multilayer wiring board having excellent positional accuracy can be obtained. At this time, since the multilayer wiring board manufacturing substrate formed to form the misalignment prevention fixing portion is crimped so as to correct the dent on the alligator, the center of the conductor post and the misalignment prevention fixing portion are The distance of the center of the soldered portion formed when formed is shifted within 50 μm. However, when the fixing portion for preventing misalignment is not formed, the distance is further shifted, so that the yield is deteriorated.

次に、ベース銅箔をエッチングにより除去することで、多層配線板120を得る(図2(g))。このとき、図示しないが、導体回路108およびランド109には、エッチングバリアとしてのレジスト金属層が形成されていることが好ましく、その形成方法としては、ベース銅箔に電解めっきにより導体回路108およびランド109を形成する前に電解めっきによりレジスト金属層を形成することで、レジスト金属層を形成できる。   Next, the multilayer copper wiring board 120 is obtained by removing the base copper foil by etching (FIG. 2G). At this time, although not shown, it is preferable that a resist metal layer as an etching barrier is formed on the conductor circuit 108 and the land 109. As a method for forming the conductive circuit 108 and the land 109, the conductor circuit 108 and the land are electroplated on the base copper foil. By forming a resist metal layer by electrolytic plating before forming 109, the resist metal layer can be formed.

以下、実施例により更に具体的に説明するが、本発明はこれによって何ら限定されるものではない。   Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited thereto.

まず、多層配線板製造用配線基板および被接続用基板の製造方法について詳細に説明する。   First, a method for manufacturing a wiring board for manufacturing a multilayer wiring board and a substrate for connection will be described in detail.

<多層配線板製造用配線基板および被接続用基板の製造>
表面を粗化処理した150μm厚の圧延銅板(金属板101・古川電気工業製、EFTEC−64T)に、ドライフィルムレジスト(旭化成製、AQ−2058)をロールラミネートし、所定のネガフィルムを用いて露光・現像し、導体回路、ランドの形成に必要なめっきレジストを形成した。
次に、圧延銅板を電解めっき用リードとして、レジスト金属として金を電解めっきにより形成し、さらに電解銅めっきすることにより導体回路とランドを形成した。導体回路は、線幅/線間/厚み=40μm/40μm/10μmとした。
次に、ドライフィルムレジストを剥離した。ここで、被接続用基板のみに半田との濡れ性をあげるため、導体回路およびランドの上に電解めっきにより金を形成し、50mm×50mmの大きさに個片化して被接続用基板を得た。
次に、剥離したあとの基板に支持基材であるPETフィルムが付いた絶縁層(住友ベークライト製)を真空ラミネートにより導体回路の凹凸を埋め込みながら成形し、PETフィルムを剥がして、25μm厚の絶縁層を形成した。
次に、50μm径のビアを、UV−YAGレーザにより形成し、ビア内部および周辺の加工残渣を、超音波を併用したウエットデスミア処理によって洗浄除去した。
続いて、圧延銅板を電解めっき用リードとして、電解銅めっきすることによりビアを銅で充填し、導体ポストおよび半田固定部形成用の導体ポストを形成した。
次に、圧延銅板を電解めっき用リードとして、導体ポスト上にSn−Ag半田を電解めっきにより厚み5μmとなるよう形成した。次に50mm×50mmの大きさに個片化した。
次に、接着剤をPETフィルムに塗布し、80℃20分間乾燥させドライフィルム状にし、絶縁層の表面、すなわち半田が形成された面に接着剤層をドライフィルムラミネーター(大成ラミネーター(株)製)で形成した。最後に圧延銅箔を塩化第二鉄溶液で全面エッチングして、多層配線板製造用配線基板を得た。
<Manufacture of wiring boards for manufacturing multilayer wiring boards and connected boards>
A dry film resist (AQ-2058, manufactured by Asahi Kasei, AQ-2058) is roll-laminated on a rolled copper plate (metal plate 101, manufactured by Furukawa Electric Co., Ltd., EFTEC-64T) with a roughened surface, and a predetermined negative film is used. Exposure and development were performed to form a plating resist necessary for the formation of conductor circuits and lands.
Next, a rolled copper plate was used as a lead for electrolytic plating, gold as a resist metal was formed by electrolytic plating, and further a conductive circuit and a land were formed by electrolytic copper plating. The conductor circuit had a line width / interline / thickness = 40 μm / 40 μm / 10 μm.
Next, the dry film resist was peeled off. Here, in order to increase the wettability with the solder only on the substrate to be connected, gold is formed by electrolytic plating on the conductor circuit and the land, and is separated into a size of 50 mm × 50 mm to obtain the substrate to be connected. It was.
Next, an insulating layer (manufactured by Sumitomo Bakelite) with a PET film as a supporting base material formed on the substrate after peeling is molded while embedding the irregularities of the conductor circuit by vacuum laminating, and the PET film is peeled off to insulate 25 μm thick A layer was formed.
Next, vias having a diameter of 50 μm were formed by a UV-YAG laser, and processing residues inside and around the vias were removed by wet desmearing using ultrasonic waves.
Subsequently, the rolled copper plate was used as an electrolytic plating lead, and electrolytic copper plating was performed to fill the via with copper, thereby forming a conductive post and a conductive post for forming a solder fixing portion.
Next, Sn-Ag solder was formed on the conductor post so as to have a thickness of 5 μm by electrolytic plating using the rolled copper plate as a lead for electrolytic plating. Next, it separated into pieces of 50 mm × 50 mm.
Next, the adhesive is applied to a PET film, dried at 80 ° C. for 20 minutes to form a dry film, and the adhesive layer is formed on the surface of the insulating layer, that is, the surface on which the solder is formed, by a dry film laminator (manufactured by Taisei Laminator Co., Ltd.). ). Finally, the entire surface of the rolled copper foil was etched with a ferric chloride solution to obtain a wiring board for producing a multilayer wiring board.

続いて、上記の多層配線板製造用配線基板を用いた、多層配線板の製造方法について詳細に説明する。   Then, the manufacturing method of a multilayer wiring board using said wiring board for multilayer wiring board manufacture is demonstrated in detail.

<多層配線板の製造>
上記の工程により得られた多層配線板製造用配線基板と、被接続用基板に予め形成されている位置決めマークを、画像認識貼り合わせ装置((株)システム開発製)により読み取り、両者を位置合わせして重ね合わせた。重ね合わせたのち、予め設けていた半田固定部を形成する部分に多層配線板製造用基板がわから280℃に加温したはんだごてを押し付けることにより、半田固定部を形成した。このとき半田固定部を中心として、多層配線板製造用基板に凹みを生じた。
さらに多層配線板製造用基板の表面に露出したマークと次に積相する多層配線板製造用基板とを画像認識により位置合わせして貼り合わせ、半田固定部を形成する工程を2回繰り返し、被接続用基板に3層だけ多層配線板製造用基板が形成された多層配線板を得た。
次に、パルスヒート加熱方式による熱圧着プレスにより、250℃まで10秒で昇温した後、0.1MPaの圧力で加圧し、導体ポストとランドの全点接続を行なうとともに、層間を接着剤層によって接着した。
次に、塩化第二鉄液を用いて圧延銅箔をエッチングにより除去して、多層配線板製造用配線基板が3層積層された多層配線板を得た。
次に、予め基板の4隅に配置されたアライメントマークをX線検査装置(東芝ITコントロールシステム(株)製)で各層間ごとのアライメントマークのズレ量を測定した結果、位置ズレ量の平均は46μmであった。基板表面からX線透過により観察した時の半田接合部のバンプの中心と、ランドに残った濡れの中心の距離は、50μm以内であった。
比較例として、上記実施例の多層配線板の製造方法のうち、半田固定部を形成する工程を除いて比較例の基板を形成し、得られた基板のズレ量は、平均68μmであった。最後に被接続用基板の圧延銅箔を塩化第二鉄溶液で全面エッチングした。以上により、半田接合部を形成することで、層間の位置精度に優れた多層配線板を得た。
<Manufacture of multilayer wiring boards>
The wiring board for manufacturing the multilayer wiring board obtained by the above process and the positioning mark formed in advance on the substrate to be connected are read with an image recognition bonding apparatus (manufactured by System Development Co., Ltd.), and both are aligned. And superimposed. After the overlapping, the solder fixing part was formed by pressing the soldering iron heated to 280 ° C. from the multilayer wiring board manufacturing substrate to the part where the solder fixing part provided in advance was formed. At this time, a dent was formed in the substrate for manufacturing the multilayer wiring board, centering on the solder fixing portion.
Further, the process of forming the solder fixing portion by repeating the process of aligning and bonding the mark exposed on the surface of the multilayer wiring board manufacturing substrate and the next multilayer wiring board manufacturing substrate by image recognition to form the solder fixing portion is repeated. A multilayer wiring board in which a multilayer wiring board manufacturing substrate was formed on only three layers on the connection substrate was obtained.
Next, the temperature is raised to 250 ° C. in 10 seconds by a thermocompression press using a pulse heat heating method, and then pressure is applied at a pressure of 0.1 MPa to connect all the points between the conductor posts and the lands, and the layers are adhesive layers. Glued by.
Next, the rolled copper foil was removed by etching using a ferric chloride solution to obtain a multilayer wiring board in which three layers of wiring boards for manufacturing a multilayer wiring board were laminated.
Next, as a result of measuring the alignment mark displacement amount for each layer with an X-ray inspection apparatus (manufactured by Toshiba IT Control System Co., Ltd.), the alignment marks arranged in advance at the four corners of the substrate are as follows. It was 46 μm. The distance between the center of the bump of the solder joint and the center of the wetness remaining on the land when observed by X-ray transmission from the substrate surface was within 50 μm.
As a comparative example, in the manufacturing method of the multilayer wiring board of the above example, the substrate of the comparative example was formed except for the step of forming the solder fixing portion, and the deviation amount of the obtained substrate was 68 μm on average. Finally, the entire surface of the rolled copper foil of the substrate to be connected was etched with a ferric chloride solution. As described above, a multilayer wiring board having excellent positional accuracy between layers was obtained by forming solder joints.

本発明により得られる多層配線板は、半導体チップ搭載用基板などに好適であり、さらに微細配線、高密度配線および薄型化が要求されている電子部品に適用できる。   The multilayer wiring board obtained by the present invention is suitable for a substrate for mounting a semiconductor chip, and can be applied to fine wiring, high-density wiring, and electronic components that are required to be thin.

本発明の実施形態である多層配線板の製造方法の一例を説明するための断面図である。It is sectional drawing for demonstrating an example of the manufacturing method of the multilayer wiring board which is embodiment of this invention. 本発明の実施形態である多層配線板の製造方法の一例を説明するための断面図である(図1の続き)。It is sectional drawing for demonstrating an example of the manufacturing method of the multilayer wiring board which is embodiment of this invention (continuation of FIG. 1).

符号の説明Explanation of symbols

101 : 絶縁層
102 : 導体回路
103 : ランド
104 : 導体ポスト
105 : 半田
106 : 接着剤層
107 : 多層配線板製造用基板
108 : 導体回路
109 : ランド
110 : 被接続用基板
111 : 多層配線板
112 : 位置ズレ防止用固定部
113 : 接合用機構
114 : 仮積層体
115 : 多層配線板製造用基板
116 : 仮積層した多層配線板
117 : 仮積層体
118 : 位置ズレ防止用固定部
119 : 多層配線板
120 : 多層配線板
DESCRIPTION OF SYMBOLS 101: Insulating layer 102: Conductor circuit 103: Land 104: Conductor post 105: Solder 106: Adhesive layer 107: Board | substrate for multilayer wiring board manufacture 108: Conductor circuit 109: Land 110: Substrate for connection 111: Multilayer wiring board 112 : Positioning prevention fixing portion 113: Joining mechanism 114: Temporary laminated body 115: Multilayer wiring board manufacturing substrate 116: Temporarily laminated multilayer wiring board 117: Temporary laminated body 118: Positional deviation preventing fixing portion 119: Multilayer wiring Board 120: Multilayer wiring board

Claims (8)

層間位置ズレ防止用接合部が形成された接続用基板と、前記接続用基板の層間位置ズレ防止用接合部と対向する位置に層間位置ズレ防止用被接合部が形成された被接続用基板とを熱圧着して多層配線板を製造する方法であって、前記層間位置ズレ防止用接合部と前記前記層間位置ズレ防止用被接合部とを接合し、層間位置ズレ防止用固定部を形成して熱圧着することを特徴とする多層配線板の製造方法。 A connection substrate on which an interlayer displacement prevention joint is formed, and a connection substrate on which an interlayer displacement prevention joined portion is formed at a position facing the interlayer displacement prevention joint of the connection substrate; A multilayer wiring board is manufactured by thermocompression bonding, wherein the interlayer misalignment prevention joint and the interlayer misalignment prevention joint are joined to form an interlayer misalignment prevention fixing portion. A method of manufacturing a multilayer wiring board, characterized by thermocompression bonding. 前記位置ズレ防止用の固定部は、前記接合部を構成する金属と被接合部を構成する金属により形成された合金で構成されるものである請求項1記載の多層配線板の製造方法。 2. The method of manufacturing a multilayer wiring board according to claim 1, wherein the fixing portion for preventing misalignment is made of an alloy formed of a metal constituting the joining portion and a metal constituting the joined portion. 前記合金は、前記前記接合部を構成する金属または被接合部を構成する金属よりも、高い融点を有するものである請求項2に記載の多層配線板の製造方法。 The method for producing a multilayer wiring board according to claim 2, wherein the alloy has a melting point higher than that of the metal constituting the joining portion or the metal constituting the joined portion. 前記合金は、Snと、Ag、Cu、AuおよびNiから選ばれる少なくとも1種とを含むものである請求項2または3に記載の多層配線板。 4. The multilayer wiring board according to claim 2, wherein the alloy includes Sn and at least one selected from Ag, Cu, Au, and Ni. 5. 前記位置ズレ防止用固定部の形成は、仮積層の際に行うものである請求項1乃至4のいずれかに記載の多層配線板の製造方法。 The method of manufacturing a multilayer wiring board according to claim 1, wherein the formation of the misalignment prevention fixing portion is performed during temporary lamination. 前記層間位置ズレ防止用固定部の形成は、固定部材質の融点未満、前記接合部を構成する金属の融点および非接合部を構成する金属の融点のうち高い方の融点超、の温度で加熱して行うものである請求項1乃至5のいずれかに記載の多層配線板の製造方法。 The fixing portion for preventing the interlayer displacement is heated at a temperature lower than the melting point of the fixing member material, the higher melting point of the melting point of the metal constituting the joining portion and the melting point of the metal constituting the non-joining portion. The method for producing a multilayer wiring board according to claim 1, wherein the method is carried out as follows. 前記熱圧着は、前記接続用基板と被接続用基板とを複数枚積層し一括して行うものである請求項1乃至6のいずれかに記載の多層配線板の製造方法。 The method for manufacturing a multilayer wiring board according to claim 1, wherein the thermocompression bonding is performed by laminating a plurality of the connection substrates and the connection substrates. 熱圧着後の前記層間位置ズレ防止用接合部の中心部と、層間位置ズレ防止用被接合部の中心部との距離が、50μm以下である請求項1乃至7のいずれかに記載の多層配線板の製造方法。 The multilayer wiring according to any one of claims 1 to 7, wherein a distance between a center portion of the interlayer misalignment preventing joined portion after thermocompression bonding and a center portion of the interlayer misalignment preventing joined portion is 50 µm or less. A manufacturing method of a board.
JP2005100152A 2005-03-30 2005-03-30 Manufacturing method of multilayer wiring board Pending JP2006278991A (en)

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JP2004297053A (en) * 2003-03-10 2004-10-21 Sumitomo Bakelite Co Ltd Interlayer junction and multilayer printed circuit board having the same
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JP2004207647A (en) * 2002-12-26 2004-07-22 Nippon Mektron Ltd Method for manufacturing multilayer printed circuit board
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