JP2006278713A - Apparatus for cleaning substrate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an apparatus for cleaning a substrate capable of preventing a cleaning liquid containing particles from re-adhering on the surface of a substrate. <P>SOLUTION: In the apparatus, a rotating cleaning brush 2 comes into contact with a horizontally transferred substrate W to eliminate the particles on the surface of the substrate W. In this apparatus, the cleaning brush 2 is covered with a brush case 3 to prevent splashing of the cleaning liquid L due to the rotation of the cleaning brush 2. Further, the cleaning liquid L is supplied from the downstream side of a cleaning region to the upstream side by an ejection nozzle 41 provided on the brush case 3, and the cleaning liquid L is recovered in the upstream side of the cleaning region by a suction nozzle 51 provided on the brush case 3. Thus, the particles can be prevented from re-adhering on the surface of the substrate. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a substrate cleaning apparatus that performs a cleaning process while conveying a semiconductor substrate, a glass substrate for a liquid crystal display device, a glass substrate for a photomask, a substrate for an optical disk, etc. (hereinafter simply referred to as “substrate”).

  As a substrate cleaning device that performs a cleaning process on a substrate, brush cleaning is performed by sliding a roller-shaped brush that is driven to rotate while supplying a cleaning liquid to the surface of the substrate that is transported by a transport roller laid horizontally. What is performed is known (for example, refer to Patent Document 1).

  In such brush cleaning, the cleaning liquid after the cleaning process includes particles removed by the brush. Therefore, it is necessary to remove such cleaning liquid from the substrate surface to prevent reattachment of particles to the substrate.

  For example, the cleaning liquid is supplied at a predetermined inclination angle with respect to the direction intersecting the substrate transport direction, not perpendicular to the substrate, and the cleaning liquid is supplied from the end in the direction intersecting the substrate transport direction. A technique is known that prevents the cleaning liquid containing particles from staying on the substrate by facilitating the outflow (see Patent Document 2).

  In addition, a technique is known in which a cleaning liquid remaining in a through hole of a substrate after brush cleaning is sucked and removed by a suction brush in contact with the lower surface of the substrate (see Patent Document 3).

Japanese Patent Laid-Open No. 5-23651 JP 2002-239485 A JP-A-8-316614

  By the way, in such brush cleaning, the cleaning power is enhanced by rotationally driving the brush at a considerably high rotational speed. However, the cleaning liquid is scattered by the rotation of the brush, and a mist of the cleaning liquid containing particles removed by the brush is generated. The mist is scattered on the downstream side of the substrate transport, which causes the particles to reattach to the substrate surface after the cleaning process. With the above technique, it is impossible to prevent re-adhesion of particles contained in the scattered cleaning liquid to the substrate surface.

  The present invention has been made in view of the above problems, and an object of the present invention is to provide a substrate cleaning apparatus that prevents a cleaning liquid containing particles from re-adhering to the substrate surface. It is another object of the present invention to provide a substrate cleaning apparatus that prevents re-deposition of particles on the substrate surface caused by scattering of the cleaning liquid by preventing the cleaning liquid from scattering due to brush cleaning.

  The invention according to claim 1 is a substrate cleaning apparatus that transports a substrate in a predetermined direction and performs a predetermined cleaning process on the substrate, and cleans a surface to be processed of the substrate and a transport unit that transports the substrate. Brush means and cover means for covering the brush means.

  The invention of claim 2 is the substrate cleaning apparatus according to claim 1, wherein when the direction perpendicular to the transport direction of the substrate is defined as the width direction, the brush means is larger than the size in the width direction of the substrate. The roller has a length and abuts the entire length of the substrate in the width direction.

  A third aspect of the present invention is the substrate cleaning apparatus according to the second aspect, wherein the cover means includes a concave portion having an opening facing the surface to be processed of the substrate, and the brush means is disposed in the concave portion. While being stored, a part of the brush means is exposed from the opening to brush the surface to be processed.

  A fourth aspect of the present invention is the substrate cleaning apparatus according to the third aspect, wherein the cover means is formed with a first through hole having a hole in the vicinity of the opening. The processing liquid supplied through the through hole is discharged onto the surface to be processed.

  A fifth aspect of the present invention is the substrate cleaning apparatus according to the fourth aspect, wherein when the upstream side and the downstream side are defined on the basis of the transport direction of the substrate, the first through hole is formed from the opening. Is also formed on the downstream side, and the hole axis of the first through hole is inclined to the downstream side.

  A sixth aspect of the present invention is the substrate cleaning apparatus according to the fifth aspect, wherein a portion of the cover means downstream of the first through hole has a surface made of a water repellent material.

  A seventh aspect of the present invention is the substrate cleaning apparatus according to the fourth aspect, wherein the cover means has a hole on the opposite side of the first through hole from the opening. A second through-hole is formed, and the treatment liquid supplied to the substrate from the first through-hole and passing through a brushing portion by the brush means is passed through the second through-hole. And collect.

  The invention according to claim 8 is the substrate cleaning apparatus according to claim 7, wherein when the upstream side and the downstream side are defined on the basis of the transport direction of the substrate, the second through hole is formed from the opening. Is also formed on the upstream side, and the hole axis of the second through hole is inclined to the upstream side.

  A ninth aspect of the present invention is the substrate cleaning apparatus according to the eighth aspect, further comprising: a drive unit that brushes the surface to be processed in a direction opposite to the transport direction by rotating the brush unit; The hole of the second through hole communicates with the recess.

  A tenth aspect of the present invention is the substrate cleaning apparatus according to the ninth aspect, wherein the hole axis of the second through hole is a rotational radius of the brush means in the vicinity of the hole opening of the second through hole. It is substantially perpendicular to the direction.

  The invention of claim 11 is the substrate cleaning apparatus according to any one of claims 7 to 10, wherein a portion of the cover means upstream of the second through hole is made of a water repellent material. Have a rough surface.

  In the invention of claim 12, the combination structure of the brush means and the cover means is respectively disposed on the upper and lower surfaces of the substrate to be horizontally conveyed, and the upper and lower surfaces of the substrate are respectively treated surfaces. Are arranged so as to face each other.

  A thirteenth aspect of the present invention is a substrate cleaning apparatus that transports a substrate in a predetermined direction and performs a predetermined cleaning process on the substrate, and cleans a processing surface of the substrate and a transport unit that transports the substrate. Brush means, liquid supply means for supplying a processing liquid to the surface to be processed, and liquid recovery means for recovering the processing liquid from the surface to be processed, wherein the liquid supply means includes the brush means and the surface to be processed. The processing liquid is supplied from the downstream side to the upstream side in the substrate transport direction with respect to the contact portion with the processing surface, and the liquid recovery means is configured to supply the processing liquid from the upstream side of the contact portion. Recover.

  The invention of claim 14 is the substrate cleaning apparatus according to claim 13, wherein when the direction perpendicular to the transport direction of the substrate is defined as the width direction, the brush means is not less than the size in the width direction of the substrate. The roller has a length and abuts the entire length of the substrate in the width direction.

  A fifteenth aspect of the present invention is the substrate cleaning apparatus according to the fourteenth aspect, further comprising a driving unit that rotates the brush unit, wherein the liquid recovery unit includes a liquid suction nozzle portion, and the liquid suction unit The hole axis of the nozzle portion is substantially perpendicular to the direction of the rotation radius of the brush means in the vicinity of the suction port of the liquid suction nozzle portion.

  In the first aspect of the invention, since the brush means is covered with the cover means, it is possible to prevent the treatment liquid from being scattered by the brush cleaning. Thereby, it is possible to prevent the particles from reattaching to the substrate surface due to the scattering of the processing liquid.

  According to the third aspect of the present invention, the brush means is housed in the recess, and a part of the brush means is exposed from the opening to brush the surface to be processed. Therefore, the brush cleaning is performed without affecting the brush cleaning power. It is possible to reliably prevent the treatment liquid from splashing.

  In the invention described in claim 4, since the processing liquid is discharged to the processing surface of the substrate through the through hole formed in the cover means, it is possible to obtain the liquid supply nozzle with a simple configuration that does not require a supporting means or the like. In addition, the substrate cleaning apparatus can be reduced in size.

  In the invention according to claim 5, since the processing liquid is discharged from the through hole formed on the downstream side of the opening and having the hole axis inclined to the downstream side, the liquid is prevented from staying on the substrate and the cleaning region It is possible to make it difficult for the processing liquid to flow out downstream.

  In the invention described in claim 6, since there is a water-repellent surface area downstream from the through hole through which the processing liquid is discharged, the liquid hardly flows out downstream from the cleaning area, and the cleaning area is always in a wet state. Can be kept in.

  According to the seventh aspect of the present invention, since the treatment liquid after passing through the brushing site is recovered through the through hole formed in the cover means, the liquid containing particles can be removed from the substrate. In addition, the liquid recovery nozzle can be obtained with a simple configuration that does not require a support means and the substrate cleaning apparatus can be downsized.

  In the invention according to claim 8, since the processing liquid is recovered through the through hole formed on the upstream side of the opening and the hole axis is inclined to the upstream side, the liquid containing the particles is removed upstream of the cleaning region. It is possible to collect without flowing out to the side.

  In the ninth aspect of the invention, since the surface to be processed is brushed in the direction opposite to the substrate conveyance, a high cleaning power can be obtained.

  In the invention described in claim 10, since the processing liquid is recovered through the through hole whose hole axis is substantially perpendicular to the direction of the radius of rotation of the brush means, the processing liquid is recovered using the brush rotational thrust. Can do.

  In the invention according to claim 11, since the water-repellent surface region is upstream of the through hole where the treatment liquid is collected, the liquid is unlikely to flow out upstream of the cleaning region, and the cleaning region is always wet. Can be kept in a state.

  In the invention described in claim 12, since the combination structure of the brush means and the cover means is disposed to face each other with the upper and lower surfaces of the substrate being treated surfaces, the upper and lower surfaces of the substrate can be cleaned. At the same time, it is possible to prevent the particles from reattaching to the substrate surface on both the upper and lower surfaces of the substrate.

  In the invention according to claim 13, the processing liquid is supplied from the downstream side to the upstream side of the contact portion between the brush means and the surface to be processed, and is further recovered from the upstream side. The outflow of the cleaning liquid containing particles can be prevented. Thereby, reattachment of particles to the substrate surface can be prevented.

  1, 2 and 6 and 7 are side views showing the configuration of the substrate cleaning apparatus according to the present invention, and FIG. 3 is a front view showing the configuration of the substrate cleaning apparatus according to the present invention. 4 and 5 are perspective views showing a brush case in the substrate cleaning apparatus according to the present invention. 1 to 7 are attached with an XYZ orthogonal coordinate system in order to clarify their directional relationship. In this coordinate system, the Z-axis direction is the vertical direction, and among the X and Y axes that define the horizontal plane, the direction substantially parallel to the transport direction S1 of the substrate W is the Y-axis. Accordingly, the X axis defines a direction perpendicular to the transport path PL of the substrate W.

  The substrate cleaning apparatus 100 performs a cleaning process on a substrate W transported in a predetermined direction S1 (Y-axis positive direction) by a plurality of transport rollers 1 laid horizontally.

<First Embodiment>
〔Device configuration〕
1 and 3 are a side view (FIG. 1) and a front view (FIG. 3) showing a substrate cleaning apparatus 100 according to the first embodiment of the present invention. FIG. 2 is a diagram specifically showing the vicinity of the brush case 3 in detail.

  The substrate cleaning apparatus 100 includes an upper surface cleaning unit 10 a installed on the upper surface side of the substrate W and a lower surface cleaning unit 10 b installed on the lower surface side of the substrate W across the transport path PL formed by the arrangement of the transport rollers 1. Prepare.

  As shown in FIG. 1, each part 10a, 10b is comprised from the cleaning brush 2, the brush case 3, the liquid supply part 4, and the liquid collection | recovery part 5, respectively. A water repellent part 7 is formed at a predetermined position of the brush case 3. The lower surface cleaning unit 10 b further includes a drainage unit 6. Each component will be described below.

[1 Cleaning brush]
The substrate cleaning apparatus 100 performs brushing by sliding the rotating cleaning brush 2 while supplying a cleaning liquid to the surface of the substrate W, thereby removing particles on the surface of the substrate W.

  The cleaning brush 2 is a roller-shaped brush composed of a cleaning portion 2a formed in a cylinder and a shaft portion 2b that supports the cleaning portion 2a formed by implantation of a cleaning member made of PVA, mohair, or the like. It is almost the same length as the width of W. Here, the “lateral width” is a width in a direction X (a direction that floats through the paper surface of FIG. 1) perpendicular to the transport direction S1 of the substrate W. In general, a cleaning unit having a length equal to or larger than the width of the substrate W can be used.

  The cleaning brush 2 is pivotally supported by a bearing (not shown) so as to be able to rotate around the brush rotation shaft 20. Furthermore, as shown in FIG. 3, the direction of the brush rotation axis 20 is orthogonal to the transport direction S1 (Y direction) of the substrate W, and the substrate W and the cleaning brush 2 are in a horizontal position where they contact the substrate W at a predetermined distance. Be placed. That is, the cleaning brush 2 is disposed so that the cleaning unit 2 a contacts the entire length of the substrate W in the width direction. In the following, the portion where the cleaning brush 2 is in contact with the surface of the substrate W is referred to as a brushing portion B (see FIG. 2).

  Further, a rotary drive motor 21 is attached to one end of the rotary shaft 2a, and the cleaning brush 2 can be rotated around the rotary shaft 20. The rotation direction S2 of the cleaning brush 2 by the motor 21 is a direction in which the peripheral speed direction of the brush is opposite to the transport direction S1 of the substrate W in the portion B where the cleaning brush 2 is brushing the substrate W. ing. 1, the rotation of the cleaning brush 2 of the upper surface cleaning unit 10a is clockwise, and the rotation of the cleaning brush 2 of the lower surface cleaning unit 10b is counterclockwise.

  With the above configuration, the rotating cleaning brush 2 can be brought into sliding contact with the surface of the substrate W transported in the horizontal direction.

[2 Brush case]
The brush case 3 is a case that stores the cleaning brush 2, and functions as a cover that covers the cleaning brush 2. 4 and 5 are perspective views showing the brush case 3 in the upper surface cleaning unit 10a. In the present embodiment, the outer shape of the brush case 3 is a box shape, but may be a shape other than this.

  The brush case 3 is formed with a substantially cylindrical recess Q for storing the cleaning brush 2 therein, and a part of the cleaning portion 2a of the cleaning brush 2 is exposed from the opening S of the recess Q during storage. Can be projected. That is, in the cleaning brush 2 in the state stored in the brush case 3, the cleaning portion 2a contacts the surface of the substrate W at the portion protruding from the opening S (see FIG. 2).

  Further, at both ends in the width direction of the brush case 3, insertion holes R through which the shaft portions 2 b at both ends of the cleaning brush 2 are inserted when the cleaning brush 2 is stored are formed. By inserting the shaft portion 2 b of the cleaning brush 2 into the insertion hole R, the cleaning brush 2 is loosely inserted into the brush case 3. Each of the upper surface cleaning unit 10a and the lower surface cleaning unit 10b has a combination structure of the cleaning brush 2 and the brush case 3 (cover means). As shown in FIG.

  Further, the brush case 3 is formed with a plurality of through holes. These through holes function as the discharge nozzle 41 or the suction nozzle 51, respectively, which will be described later. Further, a drainage groove 61 is further formed in the brush case 3 in the lower surface cleaning unit 10b, which will be described later.

[3 Liquid supply unit]
The liquid supply unit 4 is for supplying the cleaning liquid to the cleaning region of the substrate W, that is, the contact region (brushing part B) of the cleaning brush 2 on the substrate W.

  As shown in FIG. 3, the liquid supply unit 4 includes a plurality of discharge nozzles 41 arranged along the width direction X of the substrate W, a supply pipe 43 that connects these discharge nozzles 41 to the cleaning liquid tank 44, and a supply pipe And a pump 42 inserted in 43 pipes.

  As shown in FIG. 3 and FIG. 4, the discharge nozzle 41 is a discontinuous through-hole penetrating the brush case 3 at a predetermined interval. By driving the pump 42, the cleaning liquid stored in the cleaning liquid tank 44 can be discharged from the plurality of discharge nozzles 41 at a predetermined pressure.

  Thus, by using the discharge nozzle 41 as a through-hole formed in the brush case 3, the substrate cleaning apparatus can be reduced in size as compared with the case where the plurality of discharge nozzles 41 are formed of individual components.

  As shown in FIG. 2, the discharge nozzle 41 is provided on the downstream side of the transport path PL with respect to the concave portion Q (that is, the cleaning brush 2) formed in the brush case 3. By providing the discharge nozzle 41 on the downstream side of the recess Q, the cleaning liquid is supplied from the downstream side of the cleaning region.

  Further, as shown in FIGS. 2 and 4, the hole axis 410 of the discharge nozzle 41 is inclined downstream with respect to the normal line (Z-axis direction) of the surface of the substrate W. That is, the through-hole constituting the discharge nozzle 41 is inclined so that the hole opening (hereinafter referred to as the discharge opening 411) opens in the direction opposite to the transport direction S1 of the substrate W. For this reason, the cleaning liquid discharged from the discharge port 411 flows in the direction opposite to the transport direction S1. The inclination angle can be arbitrarily set regardless of what is shown in the figure.

  In addition, the shape of the discharge nozzle 41, that is, the shape of the through hole may be such that the discharge port 411 is substantially circular or elliptical (see FIG. 4), or the discharge port 411 is linear. It may be a thing (refer FIG. 5). In the latter case, a slit-like discharge port 411 can be obtained by arranging a plurality of linear discharge ports 411 close to each other.

  The pressure of the pump 42 is defined according to the shape of the discharge nozzle 41 and the required discharge pressure.

[4 liquid recovery unit]
The liquid recovery unit 5 is for recovering the cleaning liquid after the cleaning process including the particles removed from the substrate W by the cleaning brush 2.

  As shown in FIG. 3, the liquid recovery unit 5 includes a plurality of suction nozzles 51 arranged along the width direction X of the substrate W, a recovery pipe 53 that connects these suction nozzles 51 to a recovery liquid tank 54, and a recovery And a pump 52 inserted in the pipe 53.

  As shown in FIG. 4, the suction nozzle 51 is a discontinuous through-hole that is provided through the brush case 3 at a predetermined interval. By driving the pump 52, the substrate-like cleaning liquid can be sucked from the suction nozzle 51 and can be collected in the collection liquid tank 54.

  Thus, by using the suction nozzle 51 as a through-hole formed in the brush case 3, the substrate cleaning apparatus can be downsized as compared with the case where the plurality of suction nozzles 51 are formed of individual components.

  Further, as shown in FIG. 2, the suction nozzle 51 has a recess Q formed in the brush case 3 on the side opposite to the side where the discharge nozzle 41 is formed, that is, on the upstream side of the transport path PL with respect to the recess Q. Is provided. By providing the suction nozzle 51 on the upstream side of the recess Q, the cleaning liquid supplied from the downstream side of the cleaning region is smoothly recovered from the upstream side.

  Further, as shown in FIGS. 2 and 4, the hole axis 510 of the suction nozzle 51 is inclined in the upstream direction with respect to the normal line (Z-axis direction) of the surface of the substrate W. That is, the through-hole constituting the suction nozzle 51 is inclined so that the hole opening (hereinafter referred to as the suction opening 511) opens in the direction of the substrate W transport direction S1. For this reason, the liquid can be sucked without countering the flow of the cleaning liquid flowing in the direction opposite to the transport direction S1. The inclination angle can be arbitrarily set. In particular, as shown in FIG. 2, the concentric tangential direction slightly larger than the outer peripheral rotation circle of the cleaning brush 2, that is, the hole axis of the suction nozzle 51. A direction in which 510 forms a substantially right angle with the radial direction r of the cleaning brush 2 near the suction port 511 is desirable. The reason will be described later.

  The shape of the suction nozzle 51, that is, the shape of the through-hole, may be such that the suction port 511 is substantially circular or elliptical as in the case of the discharge nozzle 41 (see FIG. 4), or the suction port 511. May be linear (see FIG. 5). The shape of the discharge nozzle 41 and the shape of the suction nozzle 51 can be defined independently of each other. For example, you may comprise combining the discharge nozzle 41 of the shape described in FIG. 4, and the suction nozzle 51 of the shape described in FIG.

  The pressure of the pump 52 is defined according to the shape of the suction nozzle 51 and the required suction force.

[5 Drainage section]
The drainage unit 6 is for collecting the cleaning liquid after the cleaning process including the particles removed by the cleaning brush 2 by gravity drop, and is provided only in the lower surface cleaning unit 10b.

  As shown in FIG. 1, the drainage unit 6 includes a drainage groove 61, a drainage pipe 63, and a recovery liquid tank 54.

  The drainage groove 61 is, for example, a slit-type opening that extends through the recess Q in the brush case 3. Moreover, a plurality of non-continuous through holes may be used. As shown in FIG. 1, the drainage groove 61 is connected to the recovery liquid tank 54 by a drainage pipe 63.

  As shown in FIG. 1, the drainage groove 61 is provided on the bottom surface of the installed brush case 3. In particular, it is desirable that an opening be formed in the lowest part of the recess Q. By forming the drainage groove 61 in this manner, the cleaning liquid can be drained from the drainage groove 61 to the recovery liquid tank 54 through the drainage pipe 63 without storing the cleaning liquid in the recess Q.

[6 water repellent part]
The water repellent part 7 is for preventing the cleaning liquid from flowing from the cleaning region of the substrate W, that is, the vicinity of the contact region (brushing part B) of the cleaning brush 2 on the substrate W, and always keeping the cleaning region in a wet state.

  A part of the water repellent part 7 is a partial component of the brush case 3 and is formed of a water repellent material such as PTFE. The portion formed by the water repellent portion 7 in the brush case 3 includes a side edge portion on the downstream side of the transport path PL on the surface of the brush case 3 that contacts the substrate W, and an upstream side of the transport path PL on the surface. It is a side edge part of the side. Hereinafter, the water repellent part 7 constituting the former part is referred to as a downstream water repellent part 7a, and the water repellent part 7 constituting the latter part is referred to as an upstream water repellent part 7b.

  In addition, a rotatable roller-like auxiliary member is formed in the vicinity of the upstream water-repellent part 7b in the lower surface cleaning part 10b. This auxiliary member is also formed of a water repellent material, and this is referred to as an auxiliary water repellent portion 7c. Each of these water repellent parts 7a to 7c only needs to have at least a surface formed of a water repellent material, and the entire member does not necessarily need to be a water repellent material.

  The roller-shaped auxiliary member is provided to assist horizontal conveyance of the substrate W. For example, when the substrate W is sandwiched between the upper surface cleaning unit 10a and the lower surface cleaning unit 10b, its own weight is provided. It is for preventing the accident that it touches with the washing brush 2 of the lower surface washing | cleaning part 10b, and breaks by curving.

[Cleaning operation]
Next, a cleaning process of the substrate cleaning apparatus 100 having the above configuration will be described with reference to FIG. The substrate W is subjected to the following cleaning process while being transported in the Y direction by the transport roller 1.

  The substrate W is transported in the Y direction (transport direction S1) by the transport roller 1 and is sandwiched between the upper surface cleaning unit 10a and the lower surface cleaning unit 10b. In addition, the horizontal conveyance of the substrate W is assisted by the auxiliary water repellent portion 7c at the time of insertion, and the substrate W is prevented from being bent by its own weight.

  When the substrate W is sandwiched between the upper surface cleaning unit 10a and the lower surface cleaning unit 10b, the substrate W is cleaned.

  On the downstream side of the cleaning brush 2, the cleaning liquid L is supplied to the upper and lower surfaces of the substrate W by the liquid supply units 4 of the upper surface cleaning unit 10 a and the lower surface cleaning unit 10 b. That is, by driving the pump 42, the cleaning liquid L stored in the cleaning liquid tank 44 is discharged from the discharge nozzle 41 and the cleaning liquid L is supplied to the surface of the substrate W. Here, since the discharge port 411 of the discharge nozzle 41 is opened in the direction opposite to the transport direction S1 of the substrate W, the cleaning liquid L supplied to the substrate W flows from the downstream side toward the upstream side. become.

  The cleaning brush 2 of each of the upper surface cleaning unit 10a and the lower surface cleaning unit 10b is rotationally driven by a rotation drive motor 21 and is brought into sliding contact with the upper and lower surfaces of the substrate W in a wet state by the cleaning liquid L. Remove particles. The rotation direction S2 of the cleaning brush 2 is opposite to the transport direction S1 of the substrate W on the surface of the substrate W.

  Here, since the cleaning brush 2 is covered with the brush case 3, scattering of the cleaning liquid L due to rotation of the cleaning brush 2 is prevented. Therefore, almost all of the cleaning liquid L including the removed particles is pushed away toward the upstream side of the substrate W by the rotation of the cleaning brush 2 without being scattered.

  The downstream water repellent portion 7a prevents the cleaning liquid L from flowing out downstream from the cleaning region of the cleaning brush 2. Moreover, the upstream water-repellent part 7b and the auxiliary water-repellent part 7c prevent the outflow to the upstream side. As a result, the cleaning area is always kept wet.

  On the upstream side of the cleaning brush 2, the liquid recovery units 5 of the upper surface cleaning unit 10 a and the lower surface cleaning unit 10 b collect the cleaning liquid L after the cleaning process by the cleaning brush 2, that is, the cleaning liquid L including the removed particles. Is done. That is, the cleaning liquid L that has flowed to the upstream side of the cleaning brush 2 is sucked from the suction nozzle 51 that is negatively pressured by the pump 52 and is recovered in the recovery liquid tank 54. Here, since the suction port 511 of the suction nozzle 51 opens toward the transport direction S1 of the substrate W, the cleaning liquid L flowing from the downstream side to the upstream side of the upper and lower surfaces of the substrate W is It will be sucked along the flow. Further, in the lower surface cleaning unit 10 b, the cleaning liquid L dripped into the recess Q is drained from the drainage groove 61.

  The above is the cleaning process in the substrate cleaning apparatus 100. Here, the balance between supply and recovery of the cleaning liquid L will be described. The pump 42 and the pump 52 are controlled so that the supply rate of the cleaning liquid L by the liquid supply unit 4 and the recovery rate of the cleaning liquid L by the liquid recovery unit 5 and the drainage unit 6 are maintained in substantially the same state. .

  Here, since the rotation direction S2 of the cleaning brush 2 is opposite to the transport direction S1 of the substrate W, the rotational thrust of the cleaning brush 2 contributes as the recovery force of the cleaning liquid L. Therefore, if the supply speed of the cleaning liquid L and the rotation speed of the cleaning brush 2 are appropriately set, the substrate cleaning apparatus 100 can be configured without the pump 52. Here, as described above, by rotating the hole shaft 510 of the suction nozzle 51 in the tangential direction of the rotational concentric circle of the cleaning brush 2, the rotational thrust of the cleaning brush 2 is used as the liquid recovery force most efficiently. be able to.

[Modification of First Embodiment]
In the above operation mode, the cleaning brush 2 is rotationally driven on the surface of the substrate W in the direction opposite to the transport direction S1 of the substrate W. However, as a modified example, the cleaning brush 2 is in the opposite direction, that is, the substrate W An operation mode in which the substrate is rotationally driven in the same direction as the transport direction S1 of the substrate W on the surface is also possible.

  Moreover, it is also possible to reverse the direction of supply and recovery of the cleaning liquid L with substantially the same apparatus configuration. For example, the supply pipe 43 and the recovery pipe 53 may be connected to the suction nozzle 51 and the discharge nozzle 41, respectively. As a result, the cleaning liquid L can be supplied from the upstream side and recovered from the downstream side.

  For example, when the rotation direction of the cleaning brush 2 is the same direction as the transport direction S1 of the substrate W, the cleaning liquid L may be supplied from the upstream side.

<Second Embodiment>
〔Device configuration〕
FIG. 6 is a side view showing a substrate cleaning apparatus 100 according to the second embodiment of the present invention.

  As in the first embodiment, the substrate cleaning apparatus 100 is installed on the upper surface cleaning unit 10a installed on the upper surface side of the substrate W and the lower surface side of the substrate W across the transport path PL formed by the transport roller 1. The lower surface cleaning unit 10b is provided.

  The difference from the first embodiment is that the liquid recovery unit 5 is not provided. Further, the discharge nozzle 41 of the liquid supply unit 4 is not integrally formed with the brush case 3 and is disposed independently on the upstream side of the transport path PL of the substrate W. Further, only the downstream water-repellent part 7a is provided as the water-repellent part 7, and the upstream water-repellent part 7b and the auxiliary water-repellent part 7c are not provided. The other points are the same as in the first embodiment.

[Cleaning operation]
Next, a cleaning process of the substrate cleaning apparatus 100 having the above configuration will be described with reference to FIG. The substrate W is subjected to the following cleaning process while being transported in the Y direction by the transport roller 1.

  The substrate W is transported in the Y direction (transport direction S1) by the transport roller 1 and is sandwiched between the upper surface cleaning unit 10a and the lower surface cleaning unit 10b. In addition, the horizontal conveyance of the board | substrate W is assisted by the roller-shaped auxiliary member at the time of pinching, and it is prevented that it curves by own weight.

  When the substrate W is sandwiched between the upper surface cleaning unit 10a and the lower surface cleaning unit 10b, the substrate W is cleaned.

  On the downstream side of the cleaning brush 2, the cleaning liquid L is supplied to the upper and lower surfaces of the substrate W by the liquid supply units 4 of the upper surface cleaning unit 10 a and the lower surface cleaning unit 10 b formed independently of the brush case 3.

  The operation of the cleaning brush 2 is the same as that in the first embodiment. However, the rotation direction of the cleaning brush 2 may be the same direction as the transport direction S1 of the substrate W on the surface of the substrate W, or may be the opposite direction. The downstream water repellent portion 7a prevents the cleaning liquid L from flowing out downstream from the cleaning region of the cleaning brush 2. Further, the cleaning liquid L supplied to the upper surface of the substrate W is from the end of the substrate W (the end in the direction intersecting the transport direction S1 of the substrate W or the upstream end) on the upstream side of the cleaning region. leak.

[Modification of Second Embodiment]
In the above operation mode, the cleaning brush 2 is stored in the concave portion Q formed in the brush case 3, but the external shape of the brush case 3 can be changed. For example, it may be a hollow cylindrical shape instead of the box shape as shown in FIG. In this case, however, it is necessary to provide an opening so that the cleaning brush 2 can come into contact with the substrate W. Further, for example, a cover that covers only a predetermined side surface of the cleaning brush 2, for example, a side surface facing the downstream side of the transport path PL and the upper surface side may be used.

<Third Embodiment>
〔Device configuration〕
FIG. 7 is a side view showing a substrate cleaning apparatus 100 according to the third embodiment of the present invention.

  As in the first embodiment, the substrate cleaning apparatus 100 is installed on the upper surface cleaning unit 10a installed on the upper surface side of the substrate W and the lower surface side of the substrate W across the transport path PL formed by the transport roller 1. The lower surface cleaning unit 10b is formed.

  The difference from the first embodiment is that a brush case that covers the entire outer periphery of the cleaning brush 2 is not provided. Accordingly, the discharge nozzle 41 of the liquid supply unit 4, the suction nozzle 51 of the liquid recovery unit 5, and the water repellent unit 7 are formed independently without being integrally formed with the brush case 3, but the transport path PL of the substrate W and The relative positional relationship with respect to the cleaning brush 2 is the same as in the first embodiment. In addition, the drainage part 6 is not provided. The other points are the same as in the first embodiment.

[Cleaning operation]
Next, a cleaning process of the substrate cleaning apparatus 100 having the above configuration will be described with reference to FIG. The substrate W is subjected to the following cleaning process while being transported in a predetermined direction by the transport roller 1.

  The substrate W is transported in the predetermined direction S1 by the transport roller 1 and is sandwiched between the upper surface cleaning unit 10a and the lower surface cleaning unit 10b. In addition, the horizontal conveyance of the substrate W is assisted by the auxiliary water repellent portion 7c at the time of insertion, and the substrate W is prevented from being bent by its own weight.

  When the substrate W is sandwiched between the upper surface cleaning unit 10a and the lower surface cleaning unit 10b, the substrate W is cleaned.

  On the downstream side of the cleaning brush 2, the cleaning liquid L is supplied to the upper and lower surfaces of the substrate W by the liquid supply units 4 of the upper surface cleaning unit 10a and the lower surface cleaning unit 10b. About operation | movement of the liquid supply part 4, it is the same as that of 1st Embodiment.

  The operation of the cleaning brush 2 and the function of the water repellent part 7 are also the same as in the first embodiment.

  On the upstream side of the cleaning brush 2, the liquid recovery units 5 of the upper surface cleaning unit 10 a and the lower surface cleaning unit 10 b collect the cleaning liquid L after the cleaning process by the cleaning brush 2, that is, the cleaning liquid L including the removed particles. Is done. About operation | movement of the liquid collection | recovery part 5, it is the same as that of 1st Embodiment.

[Modification of Third Embodiment]
In the above operation mode, the cleaning brush 2 is rotationally driven on the surface of the substrate W in the direction opposite to the transport direction S1 of the substrate W, but in the opposite direction, that is, on the surface of the substrate W. You may rotationally drive in the same direction as the conveyance direction S1 of W. Further, as described above, the supply and recovery directions of the cleaning liquid L may be reversed, and the cleaning liquid L may be supplied from the upstream side and recovered from the downstream side.

1 is a side view showing a substrate cleaning apparatus 100 according to a first embodiment of the present invention. 4 is a side view showing the vicinity of a brush case 3 in the substrate cleaning apparatus 100. FIG. 1 is a front view showing a substrate cleaning apparatus 100 according to a first embodiment of the present invention. It is a perspective view which shows the brush case 3 in the upper surface washing | cleaning part 10a. It is a perspective view which shows the brush case 3 in the upper surface washing | cleaning part 10a. It is a side view which shows the substrate cleaning apparatus 100 which concerns on the 2nd Embodiment of this invention. It is a side view which shows the substrate cleaning apparatus 100 which concerns on the 3rd Embodiment of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Conveyance roller 2 Cleaning brush 3 Brush case 4 Liquid supply part 5 Liquid recovery part 6 Drainage part 7 Water repellent part 10a Upper surface cleaning part 10b Lower surface cleaning part 41 Discharge nozzle (1st through-hole)
44 Cleaning liquid tank 51 Suction nozzle (second through hole)
54 Recovery liquid tank 61 Drainage groove 411 Discharge port 511 Suction port

Claims (15)

A substrate cleaning apparatus that transports a substrate in a predetermined direction and performs a predetermined cleaning process on the substrate,
Transport means for transporting the substrate;
Brush means for cleaning the treated surface of the substrate;
Cover means for covering the brush means;
A substrate cleaning apparatus comprising: The substrate cleaning apparatus according to claim 1,
When the direction perpendicular to the substrate transport direction is defined as the width direction,
The substrate cleaning apparatus, wherein the brush means has a roller shape having a length equal to or larger than a size in the width direction of the substrate, and abuts on the entire length in the width direction of the substrate. The substrate cleaning apparatus according to claim 2,
The cover means comprises
A recess having an opening facing the surface to be processed of the substrate;
With
The substrate cleaning apparatus, wherein the brush means is stored in the recess, and a part of the brush means is exposed from the opening to brush the surface to be processed. The substrate cleaning apparatus according to claim 3,
The cover means is formed with a first through hole having a hole near the opening,
The substrate cleaning apparatus, wherein the processing liquid supplied through the first through hole is discharged onto the surface to be processed. The substrate cleaning apparatus according to claim 4,
When defining the upstream side and the downstream side based on the transport direction of the substrate,
The first through hole is formed on the downstream side of the opening,
The substrate cleaning apparatus, wherein a hole axis of the first through hole is inclined to the downstream side. The substrate cleaning apparatus according to claim 5,
The substrate cleaning apparatus, wherein a portion of the cover means downstream of the first through hole has a surface made of a water repellent material. The substrate cleaning apparatus according to claim 4,
The cover means is formed with a second through hole having a hole on the side opposite to the hole of the first through hole across the opening,
A substrate cleaning apparatus, wherein the processing liquid supplied to the substrate from the first through-hole and passing through a brushing portion by the brush means is collected through the second through-hole. The substrate cleaning apparatus according to claim 7,
When defining the upstream side and the downstream side based on the transport direction of the substrate,
The second through hole is formed on the upstream side of the opening,
The substrate cleaning apparatus, wherein a hole axis of the second through hole is inclined upstream. The substrate cleaning apparatus according to claim 8,
Drive means for brushing the surface to be processed in a direction opposite to the transport direction by rotating the brush means;
With
The substrate cleaning apparatus, wherein a hole opening of the second through hole communicates with the recess. The substrate cleaning apparatus according to claim 9,
The substrate cleaning apparatus, wherein the hole axis of the second through hole is substantially perpendicular to the direction of the radius of rotation of the brush means in the vicinity of the hole opening of the second through hole. A substrate cleaning apparatus according to any one of claims 7 to 10,
The substrate cleaning apparatus, wherein a portion of the cover means upstream of the second through hole has a surface made of a water repellent material. A combination structure of the brush means and the cover means is respectively disposed on both upper and lower surfaces of the substrate to be horizontally conveyed,
A substrate cleaning apparatus, wherein the combination structures are arranged to face each other with the upper and lower surfaces of the substrate being treated surfaces, respectively. A substrate cleaning apparatus that transports a substrate in a predetermined direction and performs a predetermined cleaning process on the substrate,
Transport means for transporting the substrate;
Brush means for cleaning the treated surface of the substrate;
Liquid supply means for supplying a processing liquid to the surface to be processed;
A liquid recovery means for recovering the processing liquid from the surface to be processed;
With
The liquid supply means supplies the processing liquid from the downstream side to the upstream side in the substrate transport direction with respect to the contact portion between the brush means and the surface to be processed,
The substrate cleaning apparatus, wherein the liquid recovery means recovers the processing liquid from the upstream side of the contact portion. The substrate cleaning apparatus according to claim 13,
When the direction perpendicular to the substrate transport direction is defined as the width direction,
The substrate cleaning apparatus, wherein the brush means has a roller shape having a length equal to or larger than a size in the width direction of the substrate, and abuts on the entire length in the width direction of the substrate. The substrate cleaning apparatus according to claim 14,
Driving means for rotating the brush means;
With
The liquid recovery means is
Liquid suction nozzle,
Have
The substrate cleaning apparatus, wherein the hole axis of the liquid suction nozzle portion is substantially perpendicular to the direction of the radius of rotation of the brush means in the vicinity of the suction port of the liquid suction nozzle portion.

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