JP2006216696A - Application liquid supply device and application processor - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an application liquid supply device where linearity of discharge pressure of application liquid is sufficient and maintenance is easy. <P>SOLUTION: A resist supply device 11 in one form of the application liquid supply device is provided with a tube 31 where hydraulic fluid filling space 34 is formed for filling hydraulic fluid 25 at an outer periphery of a flexible tube 33 with which resist liquid is filled; and a pump 32 which contracts the tube 33 by transmitting hydraulic fluid 25 to the hydraulic fluid filling space 34, and pushes out resist liquid with which an inner part is filled. The pump 32 is provided with a cylinder 36 which is arranged by making a longitudinal direction vertical so that an upper face is opened, and in which the inner part is filled with hydraulic fluid; a piston 37 inserted into the cylinder 36; and a piston driving mechanism 38 reciprocating the piston 37 in a lengthwise direction. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a coating liquid supply apparatus used for applying a predetermined coating liquid such as a resist liquid to a glass substrate or the like used for an FPD (flat panel display), and a coating processing apparatus including the coating liquid supply apparatus.

  For example, in a manufacturing process of a liquid crystal display device (LCD), a predetermined circuit pattern is formed on a glass substrate by using a photolithography technique. That is, a resist solution is supplied to a glass substrate to form a coating film, which is dried and heat-treated, and then subjected to exposure processing and development processing sequentially.

  Here, as an apparatus for forming a coating film by supplying a resist solution to a glass substrate, a mounting table that horizontally vacuum-sucks the glass substrate, and a resist coating nozzle that supplies the resist solution to the substrate held on the mounting table There is known a coating processing apparatus having a moving mechanism that relatively moves the mounting table and the resist coating nozzle in the horizontal direction (see, for example, Patent Document 1).

  In such a coating processing apparatus, it is required to maintain the resist discharge amount from the resist coating nozzle with high accuracy so that the thickness of the coating film to be formed is constant. Therefore, as a pump for sending the coating liquid to the resist coating nozzle, the coating liquid is stored in a flexible tube, and pressure is applied to the tube via hydraulic oil to tighten the tube. The thing of the structure where a coating liquid is sent out is used. Here, as a mechanism for generating pressure in the hydraulic oil, the hydraulic oil is stored in the bellows, the bellows is contracted and the hydraulic oil is pushed out from the bellows, or the hydraulic oil is stored in the cylinder, and the piston is There is known a structure in which hydraulic oil is inserted and pushed out from a cylinder (for example, Patent Document 2).

  Here, in the pump using the bellows, there is a problem that the linearity of the rising pressure of the hydraulic fluid is not sufficient due to the expansion of the bellows, and thus the linearity of the rising discharge pressure of the coating liquid is not sufficient. On the other hand, pumps using cylinders and pistons are characterized by a higher linearity of hydraulic oil pressure rise than pumps using bellows, but if bubbles exist in the hydraulic oil, the pressure will not be transmitted accurately. In order to make it easy to remove air bubbles from the oil, place the cylinder vertically and insert the piston from the lower side (that is, the opening end for inserting the piston is located at the lower side). It has a structure to remove.

However, a seal portion is provided at the open end of the cylinder to fit the piston, and this seal portion is deteriorated due to wear, so it is necessary to periodically replace (maintenance). As described above, the cylinder is arranged so that the opening end is on the lower side. Therefore, when replacing the seal part, it is necessary to drain the hydraulic oil, so the pump must be removed from the coating treatment apparatus. Don't be. Such removal work and assembly after replacement of the seal require a long time, and the coating treatment apparatus may be contaminated with hydraulic oil.
Japanese Patent Laid-Open No. 10-156255 JP-A-10-305256

  The present invention has been made in view of such circumstances, and provides a coating liquid supply apparatus that has sufficient linearity of the discharge pressure of the coating liquid, is easy to maintain, and has a very low risk of atmospheric contamination due to hydraulic oil. The purpose is to do. Another object of the present invention is to provide a coating processing apparatus provided with such a coating liquid supply apparatus.

According to the present invention, there is provided a coating liquid supply apparatus for feeding a certain amount of coating liquid,
A flexible tube filled with a coating solution;
A tubular member surrounding the outer periphery of the tube so that a working fluid filling space for filling the working fluid is formed on the outer periphery of the tube;
By sending the working fluid to the working fluid filling space, the tube contracts and the coating solution filled therein is pushed out, and the working fluid is recovered from the working fluid filling space to restore the tube. A pump for feeding and collecting the working fluid to the working fluid filling space so that a new coating solution is replenished inside
Comprising
The pump is
A cylinder in which the longitudinal direction is arranged substantially vertically so that the upper surface thereof is open, and the inside is filled with hydraulic fluid;
A piston fitted into the cylinder;
A piston drive mechanism for reciprocating the piston in its length direction;
The coating liquid supply apparatus characterized by comprising is provided.

  The piston used in this coating liquid supply device includes a through hole formed so as to penetrate the center in the longitudinal direction in order to fill the cylinder with hydraulic fluid and to remove air bubbles from the cylinder, A seal cap that is detachably provided to close the through-hole on the end face of the cylinder and a substantially conical recess formed on the end face on the side to be fitted into the cylinder are preferably used. In addition, the cylindrical member has a deaeration hole for removing bubbles from the working fluid filling space at the upper end portion thereof, and a structure in which a degassing pipe equipped with an open / close valve is attached to the deaeration hole. It is preferable that As a result, air bubbles can be easily removed from the hydraulic oil, and since the hydraulic oil is filled in a U-shaped space, the hydraulic oil is replenished to the cylinder so that the water surface is constant. By doing so, it becomes easy to manage the amount of hydraulic oil uniformly.

  The cylinder has a seal member for sealing the piston in the vicinity of its open end, and a position lower than the position where the seal member is disposed to discharge the working fluid flowing from the working fluid filling space when the piston is removed from the cylinder. It is preferable to have a structure having a drain hole formed in.

According to the present invention, there is provided a coating processing apparatus provided with the above coating liquid supply apparatus, that is, a coating processing apparatus that forms a coating film by applying a predetermined coating liquid to a substrate,
An application nozzle for discharging the application liquid onto the substrate;
A moving mechanism for relatively moving the coating nozzle and the substrate;
A coating solution supply device for feeding a certain amount of coating solution to the coating nozzle;
A coating liquid supply source for supplying the coating liquid to the coating liquid supply device,
The coating liquid supply device includes:
A flexible tube filled with the coating liquid, and a tubular member surrounding the outer periphery of the tube so as to form a working liquid filling space for filling the outer periphery of the tube with the working liquid, When the working fluid is fed into the working fluid filling space, the tube contracts and the coating solution filled therein is pushed out, and the working fluid is recovered from the working fluid filling space, so that the tube A tube frame that is restored and replenished with a new coating solution from the coating solution supply source;
The cylinder is arranged with its longitudinal direction substantially vertical so that its upper surface opens, and a cylinder filled with hydraulic fluid therein, a piston inserted into the cylinder, and a reciprocating motion of the piston in its length direction A pump having a piston drive mechanism, and for feeding and collecting the working fluid to and from the working fluid filling space;
There is provided a coating processing apparatus characterized by comprising:

  Here, as the application nozzle, one having a structure for discharging the application liquid in a substantially strip shape is preferably used, and as the moving mechanism, one that conveys the substrate linearly in a horizontal direction in a substantially horizontal posture is preferable. . When the application nozzle is moved, there is a risk that the discharge pressure will fluctuate because the vibration of the application nozzle is fed back to the application liquid supply device, but fixing the application nozzle can suppress the occurrence of such fluctuations in the discharge pressure. Therefore, it is possible to form a coating film with a uniform film thickness while keeping the discharge state of the coating liquid constant.

  Since the coating liquid supply apparatus and the coating processing apparatus according to the present invention have sufficient linearity of the discharge pressure of the coating liquid, a coating film having a uniform film thickness can be formed. Moreover, since maintenance is easy, it contributes to the improvement of productivity. In addition, since the possibility of atmospheric contamination due to hydraulic oil is extremely small, the quality of the substrate (product) can be maintained high.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. Here, the case where the present invention is applied to an apparatus for forming a resist film on the surface of a glass substrate for LCD (hereinafter referred to as “LCD substrate”) will be described.

  FIG. 1 is a plan view showing a schematic structure of the resist coating apparatus 10. The resist coating apparatus 10 includes a coating processing unit (CT) 10a for applying a coating liquid to the LCD substrate G to form a resist film, and a vacuum drying unit (VD) 10b for drying the formed resist film under reduced pressure. And. Control of the resist coating apparatus 10 is performed by the control unit 24.

  The application processing unit 10a includes a stage 12 provided with a plurality of gas injection ports 16 for injecting a predetermined gas to a predetermined position on the surface in order to float and hold the LCD substrate G in a substantially horizontal posture. In order to clean the resist nozzle 14, a substrate transport mechanism 13 for transporting the LCD substrate G in the X direction, a resist nozzle 14 for applying a resist solution to the surface of the LCD substrate G moving on the stage 12, and the like. Nozzle cleaning unit 15, and a resist supply device 11 for supplying a resist solution to the resist nozzle 14.

  The reduced pressure drying unit (VD) 10 b includes a mounting table 17 for mounting the LCD substrate G, and a chamber 18 for storing the mounting substrate 17 and the LCD substrate G mounted on the mounting table 17. Further, the resist coating apparatus 10 is provided with a substrate transport arm 19 for transporting the LCD substrate G from the coating processing unit 10a to the vacuum drying unit 10b.

  The stage 12 is roughly divided into an introduction stage portion 12a, a coating stage portion 12b, and a carry-out stage portion 12c from the upstream to the downstream in the transport direction of the LCD substrate G. An LCD substrate G is carried into the introduction stage unit 12a by a substrate conveyance mechanism (not shown), and the LCD substrate G is conveyed from here to the coating stage unit 12b. The introduction stage portion 12a is provided with lift pins 64a for receiving the LCD substrate G carried in from the outside. A resist nozzle 14 is disposed in the coating stage portion 12b. Here, a resist solution is supplied to the LCD substrate G to form a resist film. The carry-out stage unit 12c is an area for carrying out the LCD substrate G on which the resist film is formed to the reduced-pressure drying unit 10b. The carry-out stage unit 12 c is provided with lift pins 64 b that lift the LCD substrate G in order to deliver the LCD substrate G transferred to the carry-out stage unit 12 c to the substrate transfer arm 19.

  In order to increase the flatness (flatness) of the LCD substrate G on the stage 12, it is preferable to increase the number of gas injection ports 16 arranged. Further, if the stage 12 is provided with an intake port for sucking gas from its surface and the gas injection amount from the gas injection port 16 and the gas suction amount from the intake port are balanced, the floating accuracy of the LCD substrate G is improved. Can be preferred.

  The substrate transport mechanism 13 sucks and holds the two linear guides 61 arranged to extend in the X direction on the Y direction side of the stage 12 and the Y direction end of the lower surface (back surface) of the LCD substrate G. A substrate holding member 62 fitted to the linear guide 61 so as to be movable in the X direction, a belt driving mechanism for reciprocating the substrate holding member 62 in the X direction, And a horizontal conveyance mechanism 63 such as a ball screw or an air slider. The LCD substrate G held on the substrate holding member 62 is transported in the X direction on the stage 12 in a state where the LCD substrate G is lifted from the surface of the stage 12 in a substantially horizontal posture by a gas injected from the gas injection port 16.

  FIG. 2 is a perspective view showing a schematic structure of the resist nozzle 14. The resist nozzle 14 has a structure in which a slit-like resist discharge port 14b for discharging a resist solution in a substantially strip shape is provided in a long box body 14a that is long in one direction, as shown in FIG. The box body 14a is arranged such that the longitudinal direction thereof coincides with the Y direction. The length of the resist nozzle 14 is shorter than the width of the LCD substrate G (the length in the Y direction), and a resist film is not formed in a certain region on the periphery of the LCD substrate G.

  FIG. 3 is a side view showing a schematic structure of the resist supply apparatus 11 that sends the resist solution to the resist nozzle 14. 4A to 4C are schematic cross-sectional views of the resist supply apparatus 11, respectively, showing (a) a maintenance position, (b) a home position, and (c) a pressure position. Further, FIG. 5A shows a partially enlarged view of the range A shown in FIG. 4A, and FIG. 5B shows a partially enlarged view of the range B shown in FIG. 4B.

  The resist supply device 11 includes a tube frame 31 and a pump 32. The tube frame 31 has an outer periphery of the tube 33 so that a flexible tube 33 in which the resist solution is filled and a working oil filling space 34 for filling the working oil 25 on the outer periphery of the tube 33 are formed. The tube 33 is connected to a resist solution supply source 65 for storing the resist solution.

  The pump 32 feeds and collects the hydraulic oil 25 to and from the hydraulic oil filling space 34, and is arranged with the longitudinal direction thereof substantially vertical so that the upper surface thereof is open, and the hydraulic oil 25 is provided therein. , A piston 37 fitted into the cylinder 36, and a piston drive mechanism 38 for reciprocating the piston 37 in its length direction (that is, for raising and lowering). . As the piston drive mechanism 38, for example, an air cylinder or an electromagnetic linear motor is suitably used, and the piston 37 is attached to a slider 39 such as such a linear motor.

  The inside of the cylinder 36 and the hydraulic oil filling space 34 formed in the tube frame 31 are communicated with each other by a connecting pipe 40, and a pressure sensor 51 for detecting the pressure of the hydraulic oil 25 is attached to the lower end of the cylinder 36. Yes. The inner surface of the cylinder 36 is preferably coated with fluorine so that bubbles do not easily adhere. The control unit 24 performs feedback control of the lifting / lowering operation of the piston drive mechanism 38 based on the pressure measured by the pressure sensor 51.

  In the resist supply device 11, when the state shown in FIG. 4B is shifted to the state shown in FIG. 4C, that is, the working oil 25 is filled in the cylinder 36 and the working oil filling space 34, and When the piston 37 is pushed into the cylinder 36 in a state where the tube 33 is filled with the resist solution, the hydraulic oil 25 is sent to the hydraulic oil filling space 34 formed in the tube frame 31 and the tube 33 contracts. The resist solution filled in the tube 33 is pushed out toward the resist nozzle 14. Thereafter, when the state shown in FIG. 4C is returned to the state shown in FIG. 4B, the hydraulic oil 25 is recovered from the hydraulic oil filling space 34 into the cylinder 36, and the tube 33 is restored. A new resist solution is replenished into the tube 33 from the resist solution supply source 65.

  A through hole 41 is formed in the piston 37 so as to penetrate the center in the longitudinal direction. A substantially conical recess 42 is formed in the end surface (lower end surface) of the piston 37 that is fitted into the cylinder 36, and the end surface (upper end surface) on the air exposure side of the piston 37 is closed. For this purpose, a seal cap 43 is detachably provided. In order to attach the seal cap 43, the upper portion of the through hole 41 has a long diameter. In addition, it is preferable that the inner surface of the through hole 41 and the surface of the recess 42 are coated with fluorine so that bubbles do not easily adhere.

  In the vicinity of the open end (upper end) of the cylinder 36, a seal member 44 for sealing the piston 37 and a detachable stopper 44a for fixing the seal member 44 are provided. The cylinder 36 further has a drain hole 45 for discharging the hydraulic oil 25 flowing from the hydraulic oil filling space 34 when the piston 37 is removed from the cylinder 36 (in FIG. 3 and FIG. 4 at different positions for understanding). Is formed below the position where the seal member 44 is disposed. A drain pipe 46 is attached to the drain hole 45, and the other end of the drain pipe 46 is inserted into the drain tank 47. The drain hole 45 is kept closed by the piston 37 at the positions shown in FIGS. 4B and 4C.

  A defoaming hole 48 for removing bubbles from the hydraulic oil filling space 34 is formed at the upper end portion of the cylindrical member 35. This defoaming hole 48 (in FIGS. 3 and 4 has different positions for the sake of understanding). Is attached with a bubble removing pipe 50 provided with an opening / closing valve 49. The other end of the bubble removal pipe 50 is inserted into the drain tank 47. It is preferable that the inner surface of the cylindrical member 35 is coated with fluorine so that bubbles do not easily adhere.

  The replacement of the seal member 44 in the resist supply apparatus 11 having such a configuration is performed at the maintenance position shown in FIG. When the piston 37 is in a state of being extracted from the cylinder 36, the hydraulic oil 25 flows into the cylinder 36 from the hydraulic oil filling space 34 because the upper end of the hydraulic oil filling space 34 is higher than the upper end of the cylinder 36. Since the drain hole 45 is formed in the cylinder 36, the hydraulic oil 25 is discharged to the drain tank 47 through the drain hole 45. The hydraulic oil 25 does not spill out from the upper end of the cylinder 36, and the seal member 44 can be easily replaced.

  The replenishment of the hydraulic oil 25 in the resist supply device 11 is performed at the home position shown in FIG. In this home position, the upper end of the through hole 41 and the upper end of the hydraulic oil filling space 34 are located at the same height, and the drain hole 45 is maintained in a state of being closed by the piston 37. The procedure for refilling the hydraulic oil 25 is roughly as follows: (a) setting the piston 37 to the home position; (b) removing the seal cap 43 closing the through hole 41; and (c) opening and closing the opening / closing valve 49. The opening of the bubble hole 48), (d) the replenishment of the hydraulic oil 25 through the through hole 41 from the upper end of the through hole 41, and (d) the closing of the on-off valve 49 and the attachment of the seal cap 43 are performed in this order. . When the hydraulic oil 25 is replenished, the drain hole 45 is closed by the piston 37 as described above, so that the hydraulic oil 25 does not flow out of the drain hole 45.

  In the pump 32, the through hole 41 formed in the piston 37, the inside of the cylinder 36, and the hydraulic oil filling space 34 communicate with each other. Therefore, if air bubbles exist in these spaces, the hydraulic pressure of the hydraulic oil 25 is accurately adjusted to the tube. Therefore, it is necessary to replenish the hydraulic oil 25 by removing bubbles from this space. In the home position shown in FIG. 4B, the space for replenishing the hydraulic fluid has a U-shaped tube structure. Therefore, when the hydraulic oil 25 is replenished into the cylinder 36 through the through hole 41, the tube frame 31 is naturally formed. The hydraulic oil 25 flows out into the hydraulic oil filling space 34, and the height of the upper surface of the hydraulic oil 25 is the same on the pump 32 side and the tube frame 31 side.

  Therefore, if the height at which the deaeration hole 48 is formed (that is, the upper end of the hydraulic oil filling space 34) and the height of the upper end of the through hole 41 are matched in advance, the hydraulic oil 25 overflows from the deaeration hole 48. In anticipation of this, if the replenishment of the hydraulic oil 25 is stopped, the on-off valve 49 is closed and the seal cap 43 is attached, bubbles can be prevented from entering the space for replenishing the hydraulic fluid.

  There is a possibility that bubbles may be generated in the cylinder 36 when the hydraulic oil 25 is replenished. However, if a step of temporarily stopping the replenishment of the hydraulic oil 25 and waiting for a predetermined time is provided when the hydraulic oil 25 is replenished, The bubbles rise and are collected by the recess 42 formed at the lower end of the piston 37 and discharged from the through hole 41. Further, if the hydraulic oil 25 is filled to the extent that the hydraulic oil 25 overflows from the side surface of the seal cap 43 when the seal cap 43 is attached, bubbles may enter the through hole 41 when the seal cap 43 is attached. Absent. The overflowing hydraulic oil 25 may be removed by means such as suction.

  Further, as a method of completely discharging bubbles at the upper end of the hydraulic oil filling space 34 on the tube diaphragm 31 side, a pressure start position for contracting the tube 33 slightly from the home position is set in advance (reversely The home position is set slightly above the pressurization start position), the piston 37 is pushed from the home position to the pressurization start position, and air bubbles and excess hydraulic oil 25 are discharged from the hydraulic oil filling space 34 through the defoaming hole 48. May be used.

  The resist nozzle 14 can be moved by the nozzle moving mechanism 20 between a position where the resist solution is supplied to the LCD substrate G and each position where the cleaning process or the like is performed in the nozzle cleaning unit 15. The nozzle moving mechanism 20 includes a Z-axis drive mechanism 21 that raises and lowers the registration nozzle 14 in the Z direction, a support member 22 that holds the Z-axis drive mechanism 21, and a ball screw that moves the support member 22 in the X direction. And an X-axis drive mechanism 23.

  A sensor (not shown) for measuring the distance between the resist discharge port 14b and the LCD substrate G is attached to the resist nozzle 14, and the Z-axis drive mechanism 21 registers the resist on the LCD substrate G based on the measured value of this sensor. The resist nozzle 14 for supplying the liquid is moved up and down. This sensor is also used to adjust the position of the resist nozzle 14 when accessing each part of the nozzle cleaning unit 15.

  The nozzle cleaning unit 15 is attached to the column member 26 and is provided above the coating stage unit 12b. The nozzle cleaning unit 15 preliminarily discharges the resist solution from the resist nozzle 14 before supplying the resist solution to the LCD substrate G, so-called dummy dispensing unit 27 for performing dummy dispensing, and the resist discharge port of the resist nozzle 14 A nozzle bath 28 for holding the resist discharge port in a vapor atmosphere of a solvent (for example, thinner) so as not to dry, a nozzle cleaning mechanism 29 for removing the resist adhering to the vicinity of the resist discharge port of the resist nozzle 14, It has.

  Proximity pins (not shown) that support the LCD substrate G are provided at predetermined positions on the surface of the mounting table 17 provided in the vacuum drying unit 10b. The chamber 18 has a vertically divided structure composed of a fixed lower container and an upper lid that can be raised and lowered. The substrate transfer arm 19 is movable in the X direction, the Y direction, and the Z direction (vertical direction).

  Next, a process for processing the LCD substrate G in the resist coating apparatus 23 configured as described above will be described. First, the substrate holding member 62 is put on standby at a predetermined position (for example, near the left end in FIG. 1) of the introduction stage portion 12a, and the stage 12 is in a state where the LCD substrate G can be floated to a predetermined height at each portion. Next, when the LCD substrate G is carried into the introduction stage unit 12a by a substrate transport mechanism or the like (not shown), the lift pins 64a are raised to support the LCD substrate G. After the substrate transfer device or the like is retracted from the introduction stage unit 12 a, the lift pins 64 a are lowered and transferred to the substrate holding member 62. As a result, the LCD substrate G is floated and held on the stage 12 in a substantially horizontal posture.

  Then, when the substrate holding member 62 is slid toward the unloading stage portion 12c at a predetermined speed, the resist solution is transferred from the resist nozzle 14 when the LCD substrate G passes under the resist nozzle 14 disposed in the coating stage portion 12b. Is supplied to the surface of the LCD substrate G to form a resist film. As described above, the resist liquid is discharged from the resist nozzle 14 by feeding the hydraulic oil 25 from the cylinder 36 to the hydraulic oil filling space 34 using the resist supply device 11. The raising / lowering operation of the piston 37 at that time is controlled so that, for example, the value indicated by the pressure sensor 51 rises linearly with a constant gradient and thereafter becomes constant. By performing such resist liquid discharge control, a resist film having a uniform film thickness can be formed.

  The height at which the resist nozzles 14 are arranged is usually substantially the same in the transport state of the plurality of LCD substrates G. Therefore, the height of the resist nozzles 14 is adjusted by the LCD substrate G or dummy substrate to be processed first. The position may be stored in the control unit 24. Further, the timing of the start / end of the discharge of the resist solution from the resist nozzle 14 may be determined using a measurement signal of a sensor attached to the resist nozzle 14 or for detecting the position of the LCD substrate G. A sensor may be provided separately and determined based on a signal from the sensor.

  The LCD substrate G on which the resist film is formed is transferred to the carry-out stage portion 12c, where the holding by the substrate holding member 62 is released and the lift pins 64b are raised. Next, when the substrate transfer arm 19 accesses the LCD substrate G lifted by the lift pins 64b and the substrate transfer arm 19 grips the LCD substrate G at the end in the Y direction of the LCD substrate G, the lift pins 64b are lowered.

  The substrate transfer arm 19b places the gripped LCD substrate G on the placement table 17 of the reduced-pressure drying unit 10b. Thereafter, the chamber 18 is sealed and the inside thereof is decompressed to dry the resist film under reduced pressure. On the other hand, the substrate holding member 62 after delivering the LCD substrate G to the lift pins 64b is returned to the introduction stage portion 12a side in order to convey the LCD substrate G to be processed next.

  When the processing in the vacuum drying unit 10b of the LCD substrate G is completed, the chamber 18 is opened, the substrate transfer arm 19 is accessed to the LCD substrate G placed on the mounting table 17, the LCD substrate G is gripped, and then the resist film Is transferred to a heat treatment apparatus (not shown in FIG. 1) for pre-baking.

  Thereafter, the transfer of the LCD substrate G is repeated as described above, and a coating film is formed on the LCD substrate G. Meanwhile, the cleaning process of the resist nozzle 14 is performed, for example, by dummy dispensing in the dummy dispensing unit 27, The resist film formation on the LCD substrate G, the cleaning process of the resist nozzle 14 by the nozzle cleaning mechanism 29, and the drying suppression of the resist discharge port in the nozzle bus 28 are appropriately performed as one set.

  As mentioned above, although embodiment of this invention has been described, this invention is not limited to such a form. For example, in the above description, the hydraulic oil is replenished at the home position shown in FIG. 4B, but the upper end of the through hole 41 formed in the piston 37 is the hydraulic oil at the tube frame 31 and the pump 32. If the piston 37 can be disposed at a position higher than the upper end of the filling space 34 and the drain hole 45 is closed by the piston 37, the hydraulic oil can be replenished in such a state. It can also be done.

  In the above description, the resist film is taken as the coating film. However, the coating film is not limited to this, and may be an antireflection film, an insulating film having no photosensitivity, or the like. Further, the substrate is not limited to the LCD substrate, and may be a semiconductor wafer, a reticle substrate, or the like. Furthermore, although the resist film is formed while the substrate is conveyed in the horizontal direction, a coating film may be formed by a so-called spin coating method.

  The present invention can be applied to various coating processing apparatuses in which it is desired to precisely control the discharge amount of the coating liquid. In particular, a resist such as a resist film or an antireflection film is applied to a large substrate such as an LCD glass substrate. It is suitable for a resist film forming apparatus for forming a film.

The top view which shows schematic structure of a resist coating apparatus. The perspective view which shows schematic structure of a resist nozzle. The side view which shows schematic structure of a resist supply apparatus. Sectional drawing which shows the schematic structure of a resist supply apparatus divided into (a) maintenance position, (b) home position, and (c) pressurization position. Each enlarged view of range A and range B shown in FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10; Resist coating apparatus 10a; Coating process part 10b; Vacuum-drying part 11; Resist supply apparatus 12; Stage 13; Substrate conveyance mechanism 14; Resist nozzle 25; Hydraulic oil 31; 34; Hydraulic oil filling space 35; Cylindrical member 36; Cylinder 37; Piston 38; Piston drive mechanism 41; Through hole 42; Recess 43; Seal cap 44; Seal member 45; Drain hole 48; Defoaming hole 65; supply source

Claims (7)

A coating liquid supply apparatus for feeding a certain amount of coating liquid,
A flexible tube filled with a coating solution;
A tubular member surrounding the outer periphery of the tube so that a working fluid filling space for filling the working fluid is formed on the outer periphery of the tube;
By sending the working fluid to the working fluid filling space, the tube contracts and the coating solution filled therein is pushed out, and the working fluid is recovered from the working fluid filling space to restore the tube. A pump for feeding and collecting the working fluid to the working fluid filling space so that a new coating solution is replenished inside
Comprising
The pump is
A cylinder in which the longitudinal direction is arranged substantially vertically so that the upper surface thereof is open, and the inside is filled with hydraulic fluid;
A piston fitted into the cylinder;
A piston drive mechanism for reciprocating the piston in its length direction;
A coating solution supply apparatus comprising:   The piston has a through hole formed so as to penetrate the center in the longitudinal direction in order to fill the cylinder with the working fluid and to remove air bubbles from the cylinder, and to the end surface on the atmosphere exposure side, the through hole The coating liquid according to claim 1, further comprising: a seal cap that is detachably provided to close the nozzle, and a substantially conical recess formed on an end surface of the cylinder that is fitted into the cylinder. Feeding device.   The cylindrical member has a degassing hole for removing bubbles from the working fluid filling space at an upper end portion thereof, and a degassing pipe having an opening / closing valve is attached to the degassing hole. The coating solution supply apparatus according to claim 1 or 2.   The cylinder is provided with a seal member for sealing the piston in the vicinity of an open end thereof, and the seal member for discharging the working fluid flowing from the working fluid filling space when the piston is removed from the cylinder. The coating liquid supply apparatus according to any one of claims 1 to 3, further comprising a drain hole formed below the position. A coating processing apparatus that forms a coating film by applying a predetermined coating solution to a substrate,
An application nozzle for discharging the application liquid onto the substrate;
A moving mechanism for relatively moving the coating nozzle and the substrate;
A coating solution supply device for feeding a certain amount of coating solution to the coating nozzle;
A coating liquid supply source for supplying the coating liquid to the coating liquid supply device,
The coating liquid supply device includes:
A flexible tube filled with the coating liquid, and a tubular member surrounding the outer periphery of the tube so as to form a working liquid filling space for filling the outer periphery of the tube with the working liquid, When the working fluid is fed into the working fluid filling space, the tube contracts and the coating solution filled therein is pushed out, and the working fluid is recovered from the working fluid filling space, so that the tube A tube frame that is restored and replenished with a new coating solution from the coating solution supply source;
The cylinder is arranged with its longitudinal direction substantially vertical so that its upper surface opens, and a cylinder filled with hydraulic fluid therein, a piston inserted into the cylinder, and a reciprocating motion of the piston in its length direction A pump having a piston drive mechanism, and for feeding and collecting the working fluid to and from the working fluid filling space;
A coating treatment apparatus comprising:   The piston has a through hole formed so as to penetrate the center in the longitudinal direction in order to fill the cylinder with the working fluid and to remove air bubbles from the cylinder, and to the end surface on the atmosphere exposure side, the through hole The coating process according to claim 5, further comprising: a seal cap that is detachably provided to close the nozzle, and a substantially conical recess formed on an end surface of the cylinder that is fitted into the cylinder. apparatus. The application nozzle has a structure for discharging the application liquid in a substantially strip shape,
The coating processing apparatus according to claim 5, wherein the moving mechanism transports the substrate linearly in the horizontal direction in the substantially horizontal posture.

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