JP2006212770A - 感光性ｍｅｍｓ構造 - Google Patents

感光性ｍｅｍｓ構造 Download PDF

Info

Publication number
JP2006212770A
JP2006212770A JP2006005642A JP2006005642A JP2006212770A JP 2006212770 A JP2006212770 A JP 2006212770A JP 2006005642 A JP2006005642 A JP 2006005642A JP 2006005642 A JP2006005642 A JP 2006005642A JP 2006212770 A JP2006212770 A JP 2006212770A
Authority
JP
Japan
Prior art keywords
plate
bars
bimorph
mems structure
capacitor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006005642A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006212770A5 (enExample
Inventor
Vladimir Anatolyevich Aksyuk
アナトリエヴィッチ アクシュク ウラディミール
Maria E Simon
エリーナ シモン マリア
Richart E Slusher
エリオット スラッシュー リチャート
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nokia of America Corp
Original Assignee
Lucent Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lucent Technologies Inc filed Critical Lucent Technologies Inc
Publication of JP2006212770A publication Critical patent/JP2006212770A/ja
Publication of JP2006212770A5 publication Critical patent/JP2006212770A5/ja
Withdrawn legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N10/00—Electric motors using thermal effects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/38—Radiation pyrometry, e.g. infrared or optical thermometry using extension or expansion of solids or fluids
    • G01J5/40—Radiation pyrometry, e.g. infrared or optical thermometry using extension or expansion of solids or fluids using bimaterial elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/02—Sensors
    • B81B2201/0292—Sensors not provided for in B81B2201/0207 - B81B2201/0285

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Micromachines (AREA)
  • Radiation Pyrometers (AREA)
JP2006005642A 2005-01-13 2006-01-13 感光性ｍｅｍｓ構造 Withdrawn JP2006212770A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/036,438 US7324323B2 (en) 2005-01-13 2005-01-13 Photo-sensitive MEMS structure

Publications (2)

Publication Number Publication Date
JP2006212770A true JP2006212770A (ja) 2006-08-17
JP2006212770A5 JP2006212770A5 (enExample) 2009-03-12

Family

ID=36652578

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006005642A Withdrawn JP2006212770A (ja) 2005-01-13 2006-01-13 感光性ｍｅｍｓ構造

Country Status (4)

Country Link
US (2) US7324323B2 (enExample)
JP (1) JP2006212770A (enExample)
CN (1) CN1821049A (enExample)
CA (1) CA2530252A1 (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1619495A1 (en) * 2004-07-23 2006-01-25 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO Method and Apparatus for inspecting a specimen surface and use of fluorescent materials
US7324323B2 (en) * 2005-01-13 2008-01-29 Lucent Technologies Inc. Photo-sensitive MEMS structure
US7495199B2 (en) * 2006-02-10 2009-02-24 Stmicroelectronics, Inc. MEMS radiometer
US20070246665A1 (en) * 2006-04-20 2007-10-25 Lafond Peter H Mechanical isolation for mems devices
US7485870B2 (en) * 2006-09-12 2009-02-03 Alcatel-Lucent Usa Inc. Pneumatic infrared detector
US7580175B2 (en) * 2007-06-21 2009-08-25 Alcatel-Lucent Usa Inc. Detector of infrared radiation having a bi-material transducer
US7851759B2 (en) * 2007-06-21 2010-12-14 Alcatel-Lucent Usa Inc. Infrared imaging apparatus
DE102008011175B4 (de) * 2008-02-26 2010-05-12 Nb Technologies Gmbh Mikromechanischer Aktuator und Verfahren zu seiner Herstellung
US7842923B2 (en) * 2008-07-28 2010-11-30 Alcatel-Lucent Usa Inc. Thermal actuator for an infrared sensor
TW201243287A (en) * 2011-04-28 2012-11-01 Hon Hai Prec Ind Co Ltd Laser range finder
JP6336904B2 (ja) 2011-08-17 2018-06-06 デジタルダイレクト・アイアール、インク 撮像システム用受動型検出装置
JP6892727B2 (ja) * 2016-09-26 2021-06-23 カンタツ株式会社 パターン製造装置、パターン製造方法およびパターン製造プログラム
US12089374B2 (en) 2018-08-10 2024-09-10 Frore Systems Inc. MEMS-based active cooling systems
US11464140B2 (en) 2019-12-06 2022-10-04 Frore Systems Inc. Centrally anchored MEMS-based active cooling systems
US10943850B2 (en) 2018-08-10 2021-03-09 Frore Systems Inc. Piezoelectric MEMS-based active cooling for heat dissipation in compute devices
CN114586479B (zh) 2019-10-30 2025-08-19 福珞尔系统公司 基于mems的气流系统
US11510341B2 (en) * 2019-12-06 2022-11-22 Frore Systems Inc. Engineered actuators usable in MEMs active cooling devices
US11796262B2 (en) 2019-12-06 2023-10-24 Frore Systems Inc. Top chamber cavities for center-pinned actuators
US12193192B2 (en) 2019-12-06 2025-01-07 Frore Systems Inc. Cavities for center-pinned actuator cooling systems
US12029005B2 (en) 2019-12-17 2024-07-02 Frore Systems Inc. MEMS-based cooling systems for closed and open devices
US12033917B2 (en) 2019-12-17 2024-07-09 Frore Systems Inc. Airflow control in active cooling systems
KR102809879B1 (ko) 2020-10-02 2025-05-22 프로리 시스템스 인코포레이티드 능동 방열판

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4241045C1 (de) * 1992-12-05 1994-05-26 Bosch Gmbh Robert Verfahren zum anisotropen Ätzen von Silicium
US5629790A (en) * 1993-10-18 1997-05-13 Neukermans; Armand P. Micromachined torsional scanner
US5880921A (en) * 1997-04-28 1999-03-09 Rockwell Science Center, Llc Monolithically integrated switched capacitor bank using micro electro mechanical system (MEMS) technology
US6392221B1 (en) * 1997-12-22 2002-05-21 Agere Systems Guardian Corp. Micro-electro-mechanical optical device
US6242989B1 (en) * 1998-09-12 2001-06-05 Agere Systems Guardian Corp. Article comprising a multi-port variable capacitor
US6140646A (en) * 1998-12-17 2000-10-31 Sarnoff Corporation Direct view infrared MEMS structure
US6201631B1 (en) * 1999-10-08 2001-03-13 Lucent Technologies Inc. Process for fabricating an optical mirror array
US6229684B1 (en) * 1999-12-15 2001-05-08 Jds Uniphase Inc. Variable capacitor and associated fabrication method
US6708491B1 (en) * 2000-09-12 2004-03-23 3M Innovative Properties Company Direct acting vertical thermal actuator
US6698201B1 (en) * 2001-08-16 2004-03-02 Zyvex Corporation Cascaded bimorph rotary actuator
US6858911B2 (en) * 2002-02-21 2005-02-22 Advanced Micriosensors MEMS actuators
DE60332007D1 (de) * 2002-02-26 2010-05-20 Univ Michigan Tungen auf mems-basis und lc-tankvorrichtung zur verwendung darin
US7146014B2 (en) * 2002-06-11 2006-12-05 Intel Corporation MEMS directional sensor system
US7015885B2 (en) * 2003-03-22 2006-03-21 Active Optical Networks, Inc. MEMS devices monolithically integrated with drive and control circuitry
US6781744B1 (en) * 2003-06-11 2004-08-24 Lucent Technologies Inc. Amplification of MEMS motion
US7324323B2 (en) * 2005-01-13 2008-01-29 Lucent Technologies Inc. Photo-sensitive MEMS structure

Also Published As

Publication number Publication date
US20060152105A1 (en) 2006-07-13
CN1821049A (zh) 2006-08-23
US20080068123A1 (en) 2008-03-20
US7324323B2 (en) 2008-01-29
CA2530252A1 (en) 2006-07-13
US7616425B2 (en) 2009-11-10

Similar Documents

Publication Publication Date Title
US7616425B2 (en) Photo-sensitive MEMS structure
US7969639B2 (en) Optical modulator
US6876484B2 (en) Deformable segmented MEMS mirror
US6201243B1 (en) Microbridge structure and method for forming the microbridge structure
US7755049B2 (en) Tunable microcantilever infrared sensor
JP5291859B2 (ja) 懸架状態に固定された吸収膜を備えた熱電磁放射検出器
WO2010138968A2 (en) Method and apparatus for providing high-fill-factor micromirror/micromirror arrays with surface mounting capability
CN106629578B (zh) 具有微桥结构的红外探测器及其制造方法
JP2006258815A (ja) ボロメータ検出器、そのような検出器を使用して赤外線を検出するための装置、およびこの検出器の製造方法
US20090321644A1 (en) Bolometer and method of producing a bolometer
KR100517428B1 (ko) 적외선 볼로메타
PL176509B1 (pl) Układ zwierciadeł cienkowarstwowych ruchomych do optycznego urządzenia projekcyjnego i sposób wytwarzania układu zwierciadeł cienkowarstwowych ruchomych, zwłaszcza do optycznego urządzenia projekcyjnego
TW201432233A (zh) 用於輻射熱測定器的懸架以及吸收器結構
US6781744B1 (en) Amplification of MEMS motion
US7741603B2 (en) Microcantilever infrared sensor array
KR100988477B1 (ko) 마이크로 히터 및 그 제조방법
RU2489688C2 (ru) Тепловой детектор с повышенной изоляцией
US7842923B2 (en) Thermal actuator for an infrared sensor
KR101408905B1 (ko) 고 응답 멤스 디바이스 및 그 제조방법
US20080169522A1 (en) Moving element and method of manufacturing the same
US8842353B2 (en) Microstructure and method of manufacturing the same
US8183079B2 (en) Semiconductor device and method of manufacturing the same
US7159397B1 (en) Tensile-stressed microelectromechanical apparatus and tiltable micromirrors formed therefrom
JPH11258056A (ja) 放射検出装置
KR100643708B1 (ko) 높은 응답도를 갖는 볼로 미터 구조

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090109

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20090109

A761 Written withdrawal of application

Free format text: JAPANESE INTERMEDIATE CODE: A761

Effective date: 20101217