JP2006187747A - Substrate processing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which is inexpensive, removes bacteria or the like without using any chemical, and can assure a sufficient washing function. <P>SOLUTION: A UV process liquid (cleaning fluid) irradiated with an ultraviolet ray by a UV irradiation device 103 inside a circulation pipeline and a dipping type UV irradiation device 105 inside a tank is supplied to a brush base 51 by a cleaning fluid supply unit 9. AT the brush base 51, the UV process liquid after the ultraviolet ray irradiation is discharged to a bristle bundle 50 from a discharge port 131 through a cleaning fluid guideway 13 to prevent a spread of the bacteria or the like on the bristle bundle 50. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  In the manufacturing process of a liquid crystal display device (LCD), a plasma display device (PDP), a semiconductor device, etc., the present invention performs various processes such as a cleaning process on a glass substrate for LCD or PDP, a semiconductor substrate, a printed circuit board, etc. The present invention relates to a substrate processing apparatus.

Conventionally, in a substrate manufacturing line such as a glass substrate for LCD or PDP, a substrate cleaning mechanism has been provided after a specific processing apparatus using a chemical solution such as an etching process to remove foreign matters such as thin films and particles remaining on the substrate surface. Washing and removal is performed. As a substrate processing apparatus having such a substrate cleaning mechanism, for example, as shown in Patent Document 1, a plurality of bar-shaped brushes are arranged at predetermined intervals on the upper surface side and lower surface side of a substrate to be transported, There has been proposed a cleaning apparatus that removes dust and the like on a substrate by reciprocating in a direction orthogonal to the substrate transport direction while supplying a cleaning liquid such as pure water from above the substrate.
JP 10-34090 A

  However, the cleaning device disclosed in Patent Document 1 causes propagation of bacteria such as bacteria contained in the pure water supplied as a cleaning solution within the flock of the rod-shaped brush while continuing to clean the substrate surface. There is. The bacteria that propagated in the brush flocks may become particles and contaminate the substrate or cause clogging of the filter provided in the cleaning liquid circulation path, which may lead to deterioration in cleaning performance. is there. In order to prevent this deterioration in cleaning performance, sterilization using chemicals such as hydrogen peroxide water, expensive fine filters capable of removing the above-mentioned germs are disposed and frequently replaced. However, in this case, there are problems such as adverse effects on the substrate due to the use of chemicals and high costs due to frequent filter replacement.

  The present invention was made to solve the above problems, is inexpensive, does not use chemicals, prevents the proliferation of germs contained in the cleaning liquid, and ensures a sufficient cleaning function. An object of the present invention is to provide a substrate processing apparatus that can be used.

The invention according to claim 1 of the present invention includes a brush portion in which brush hairs for substrate processing are erected on a brush base;
Cleaning liquid supply means for supplying a cleaning liquid for brush hair cleaning;
An irradiation means for irradiating the cleaning liquid with ultraviolet rays,
The cleaning liquid after being irradiated with ultraviolet rays by the irradiation means flows into the brush base from the cleaning liquid supply means, and the cleaning liquid guide path for guiding the cleaning liquid toward the brush bristles, and the cleaning liquid flowing through the cleaning liquid guide path as the brush. A discharge port for discharging from the raised surface to the brush bristles is provided.

  In this configuration, the cleaning liquid after being irradiated with ultraviolet rays by the irradiation means is supplied to the brush base by the cleaning liquid supply means, and the cleaning liquid after the ultraviolet irradiation is discharged from the discharge port to the brush hair through the cleaning liquid guide path. Then, miscellaneous bacteria growth on the brush hair is prevented.

The invention described in claim 2 is the substrate processing apparatus according to claim 1, further comprising a cleaning liquid recovery means for returning the cleaning liquid supplied to the brush bristles by the cleaning liquid supply means to the cleaning liquid supply means. ,
The irradiation means irradiates the cleaning liquid recovered by the cleaning liquid recovery means again with ultraviolet rays,
The cleaning liquid supply means supplies the cleaning liquid irradiated again with ultraviolet rays by the irradiation means to the cleaning liquid guide path of the brush base.

  In this configuration, the irradiation means again irradiates the cleaning liquid collected by the cleaning liquid recovery means, and the cleaning liquid supply means again supplies the cleaning liquid after the re-irradiation to the cleaning liquid guide path of the brush base. Yes.

  The invention according to claim 3 is the substrate processing apparatus according to claim 1 or 2, wherein the irradiation means irradiates the cleaning liquid in a circulating state with the ultraviolet rays. Means are provided.

  In this configuration, the germs contained in the cleaning liquid are sterilized by irradiating the cleaning liquid in a circulating state with ultraviolet rays by the circulating irradiation means.

  Further, the invention according to claim 4 is the substrate processing apparatus according to any one of claims 1 to 3, wherein the irradiation means includes a cleaning liquid storage means for storing the cleaning liquid, and the cleaning liquid storage means. And a storage type irradiation means for irradiating the cleaning liquid stored by the ultraviolet light.

  In this configuration, germs contained in the cleaning liquid are sterilized by irradiating the cleaning liquid stored in the cleaning liquid storing means with ultraviolet rays by the storage type irradiation means.

  Further, the invention according to claim 5 is the substrate processing apparatus according to claim 4, wherein the cleaning liquid storage means includes a stainless steel cleaning liquid storage tank, and the cleaning liquid is stored in the storage tank. Ultraviolet rays are irradiated by the storage type irradiation means.

  In this configuration, in the cleaning liquid storage means, germs contained in the cleaning liquid are sterilized by irradiating the cleaning liquid stored in the stainless steel cleaning liquid storage tank with ultraviolet rays by the storage type irradiation means.

  The invention according to claim 6 is the substrate processing apparatus according to any one of claims 1 to 5, wherein the ultraviolet rays irradiated by the irradiation means are 254 nm rays.

  In this configuration, since the wavelength of the ultraviolet ray irradiated by the irradiation means is set to 254 nm, germs can be sterilized efficiently at a relatively low cost. For example, a light source with a wavelength shorter than that of the 254 nm line facilitates ozone generation and requires a local exhaust facility. However, if the light source is a 254 nm line, such a facility is unnecessary, and bacteria such as Particularly effective in sterilization.

  The invention according to claim 7 is the substrate processing apparatus according to any one of claims 1 to 6, wherein the cleaning liquid for cleaning the bristle supplied by the cleaning liquid supply means is for substrate cleaning. It is also used as a cleaning liquid.

  In this configuration, the cleaning liquid for cleaning the bristle supplied from the cleaning liquid supply unit is also used as the cleaning liquid for cleaning the substrate, the cleaning liquid irradiated with the ultraviolet rays is supplied to the substrate surface, and the substrate surface is removed by the brush unit. By brushing, not only the cleaning efficiency of the brush hair but also the cleaning efficiency of the substrate surface is enhanced.

  According to the first aspect of the present invention, the cleaning liquid after ultraviolet irradiation is discharged to the bristle to prevent the propagation of germs on the bristle, so that bacteria such as bacteria do not increase in the cleaning liquid. Further, it is possible to prevent clogging of the filter provided in the cleaning liquid circulation path. In addition, since a situation such as re-adhesion of particles due to various germs does not occur on the substrate surface, sufficient cleaning performance can be ensured. In addition, since a sterilization method using ultraviolet irradiation is employed, there is no adverse effect on the substrate as in the case of using chemicals, and sterilization can be performed at low cost.

  According to the invention described in claim 2, since the cleaning liquid once used is irradiated again with ultraviolet rays and reused, the bristles can be sterilized at low cost. In addition, even if bacteria such as bacteria are mixed in the collected cleaning liquid, it can be reliably sterilized and supplied again to the brush hair. By repeating these collection, sterilization and resupply, the brush hair The cleaning performance can be further improved.

  According to the invention described in claim 3, since the cleaning liquid in a circulating state is irradiated with ultraviolet rays and sterilization is performed without the cleaning liquid staying in one place, the mechanism required for irradiation of the cleaning liquid is made small. It becomes possible to do.

  According to the fourth aspect of the present invention, since the cleaning liquid is sterilized by irradiating the stored cleaning liquid with ultraviolet rays, the ultraviolet irradiation can be reliably performed and the sterilizing action can be improved. .

  According to the fifth aspect of the present invention, since the cleaning liquid stored in the stainless steel cleaning liquid storage tank is sterilized by irradiating it with ultraviolet rays, the irradiation efficiency is improved by reflecting the ultraviolet rays in the tank during irradiation. Further, even when used for a long time, it is possible to prevent the tank from being transformed by the irradiation of ultraviolet rays.

  According to the invention described in claim 6, since the ultraviolet rays irradiated by the irradiation means are 254 nm rays, germs can be efficiently sterilized at a relatively easy cost. For example, a light source with a wavelength shorter than that of the 254 nm line facilitates ozone generation and requires a local exhaust facility. However, if the light source is a 254 nm line, such a facility is unnecessary, and bacteria such as Particularly effective in sterilization.

  According to the invention described in claim 7, since the cleaning liquid irradiated with the ultraviolet rays is supplied to the substrate surface, by brushing the substrate surface with the brush portion, not only the cleaning efficiency of the brush hair but also the substrate surface Cleaning efficiency is also increased.

  Hereinafter, a substrate processing apparatus according to an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a schematic view showing an etching processing apparatus E to which the substrate processing apparatus according to the present invention is preferably applied. This etching processing apparatus E is an apparatus that performs processing for etching a thin film formed on a glass substrate for a liquid crystal display, for example, and stocks a loader E1 and an unloader E2 and a substrate to be processed or a substrate after processing. A transfer robot E3 having a robot hand for carrying in and out the substrate to and from the cassette C, and a substrate for carrying out various processes on the substrate while carrying the substrate to be processed by a substrate carrying means (not shown). It is comprised from the process part E4, ie, the board | substrate process part E4 which consists of the etching unit E41, the water washing process unit E42, and the drying unit E43.

  The etching unit E41 of the substrate processing unit E4 is a unit that performs an etching process on the substrate to be processed. For example, an etching solution is supplied from the nozzle to the surface of the substrate being transferred, and the etching solution is allowed to act on the substrate surface. The substrate is etched. The water washing processing unit E42 (substrate cleaning apparatus) supplies pure water or the like to the substrate surface to clean the substrate in order to clean the surface of the substrate that has been subjected to the etching process. The drying unit E43 supplies warm air or the like to the substrate after washing with water to dry the front and back surfaces of the substrate. The substrate processing apparatus according to the present invention can be suitably used as the water washing processing unit E42 (substrate cleaning apparatus) in such an etching processing apparatus E, for example. Hereinafter, specific embodiments of the present invention applied to such a substrate cleaning apparatus will be described.

  FIG. 2 is a configuration diagram simply showing the brush portion and its drive mechanism provided in the water washing processing unit E42. The brush unit 221 provided in the water washing processing unit E42 includes a brush bristle bundle 50 for cleaning the surface of the substrate B and a flat brush base 51 on which the brush bristle bundle 50 is erected (planted). The brush portion 221 including the brush bristle bundle 50 and the brush base portion 51 has a shape extending in a long shape in a direction perpendicular to or in the direction perpendicular to the conveyance direction of the substrate B and parallel to the upper surface of the substrate B. ing. Each of the bristles constituting the bristle bundle 50 is made of, for example, nylon, Teflon (registered trademark), or vinyl chloride (PVC), and has a diameter of 0.05 to 0.2 (mm). The

  A support member 60 that supports the brush portion 221 in a suspended manner is attached to the upper surface portion 511 side of the brush base portion 51, and the brush portion 221 is attached to a brush attachment base 61 made of a rigid member by the support member 60. . A swing mechanism 8 is attached to the brush mounting base 61, and the brush mounting base 61 is parallel to the upper surface of the substrate B perpendicular to the transport direction of the substrate B by the vibration driving force applied from the swing mechanism 8. The tip 50H of the bristle bundle 50 of the brush portion 221 attached to the brush attachment base 61 is swung in a direction parallel to the upper surface of the substrate B by being swung in the left-right direction (for example, the left-right direction in FIG. 2). Is done. The swing mechanism 8 includes a vibrator 81 whose output shaft is coupled to the brush mounting base 61, and a drive source 82 composed of an electric motor, a pneumatic device and the like for driving the vibrator 81. . In FIG. 2, these configurations are illustrated in a simplified manner, and a specific configuration example will be described with reference to FIG. The support member 60 is provided so as to be movable with respect to the brush mounting base 61 so that the distance G shown in FIG.

  A UV treatment liquid irradiated with pure water or the like with ultraviolet (UV) is supplied from the cleaning liquid supply unit 9 to the brush base part 51 of the brush part 221 as a cleaning liquid. The cleaning liquid supply unit 9 includes a cleaning liquid storage tank 91 that stores the cleaning liquid, a supply path 92 that sends the cleaning liquid from the cleaning liquid storage tank 91 to the brush base 51, and a supply pump 93 that is provided in the middle of the supply path 92. A mechanism for generating UV treatment liquid (cleaning liquid) by irradiating pure water or the like with ultraviolet light (UV) will be described later.

  A cleaning liquid guide path 13 through which the cleaning liquid is circulated is installed inside the brush base 51, and an end portion of the supply path 92 is connected to the opening end 13 </ b> E of the cleaning liquid guide path 13. It is designed to accept the cleaning solution that is sent. In order to discharge the cleaning liquid to the surface of the substrate B via the brush bristle bundle 50, a large number of cleaning liquid discharge ports 131 are provided at the standing position of the brush bristle bundle 50 in the brush base 51.

  The operation of the substrate cleaning apparatus 10 configured as described above will be described. First, the height position of the brush base 51 is set. In consideration of the diameter and material of each bristles constituting the bristle bundle 50 and the particle size of the particles to be cleaned, the height position is determined by the pressure of the brush bristles on the upper surface of the substrate B to be cleaned. It is determined from the viewpoint of whether the tip 50H of the bundle 50 is brought into contact. The operation of finely adjusting the position of the tip 50H of the bristle bundle 50 with respect to the upper surface of the substrate B is made possible by adjusting the position of the support member 60 with respect to the brush mounting base 61. For example, when the brush base 51 has a long shape corresponding to a large substrate, the substantially central portion in the longitudinal direction of the brush base 51 is easily bent downward. In such a case, by adjusting the position of the support member 60 near the bent portion with respect to the brush mounting base 61 and lifting the bent portion upward, the substrate B of the tip 50H of the brush bristle bundle 50 is lifted. The positional relationship with respect to the upper surface can be made uniform in the longitudinal direction of the brush portion 221.

  Thus, the cleaning process of the substrate B is performed after the positional relationship of the tip 50H of the bristle bundle 50 with respect to the upper surface of the substrate B is adjusted. In this cleaning process, the supply pump 93 of the cleaning liquid supply unit 9 is operated to discharge the cleaning liquid from the cleaning liquid discharge port 131 provided in the brush base 51 toward the substrate B, while the vibrator 81 is driven by the drive source 82. Drive to swing the brush mounting base 61. As a result, the tip 50H of the brush bristle bundle 50 comes into rocking contact with the substrate B in the presence of the cleaning liquid, and the brush bristle bundle 50 acts on the substrate B. Particles and the like are removed.

  The above is the overall schematic configuration and schematic operation of the substrate cleaning apparatus 1 according to the present embodiment. Subsequently, the mode of each main part will be described in detail. FIG. 3 is a partially cutaway side view showing in detail the main part of the simple configuration diagram shown in FIG. 2, particularly the brush part 221 and the support material 60. FIG. 4 is a side sectional view showing an outline of the internal configuration of the brush portion 221.

  First, the brush portion 221 will be described. On the surface of the brush base 51 facing the substrate B, a large number of bristles 50 in which a predetermined number of bristles are bundled are planted. For this flocking, a method is adopted in which the root portion 50B of the brush bristle bundle 50 is inserted into a housing recess provided on the surface of the brush base 51. The brush bristle bundle 50 planted in this way forms a planar brush tip 50H on the hair tip side. A pattern drawn on the surface of the substrate B when the brush tip H comes into contact with the substrate B conveyed in the direction of arrow a in the figure by the conveying roller 21 (FIG. 5) for a predetermined length. Foreign matter such as particles adhering to the groove or the like is swept out.

  The cleaning liquid guide path 13 for circulating the cleaning liquid provided in the brush base 51 includes a relatively large-diameter reservoir 132 and a relatively small-diameter cleaning liquid discharge port formed so as to communicate with the reservoir 132. 131. The storage part 132 and the cleaning liquid discharge port 131 are in a relationship of a main pipe and a branch pipe and have a so-called manifold structure. The cleaning liquid discharge port 131 is provided, for example, in the hair interstitial portion of the brush hair bundle 50.

  By disposing the cleaning liquid discharge port 131 between the bristle bundles 50 in this way, as shown in FIG. 4, most of the cleaning liquid discharged from the cleaning liquid discharge port 131 passes through the brush bristles forming the brush bristle bundle 50. And supplied to the surface of the substrate B. Moreover, it is good also as a hole shape which orient | assigns the discharge direction of the washing | cleaning liquid discharge outlet 131 to the said root part 50B so that a washing | cleaning liquid may be supplied to the root part 50B of the bristle bundle 50 more reliably. By adopting such a cleaning liquid supply mode, a fresh cleaning liquid is always supplied to the root portion 50B of the brush bristle bundle 50 to keep it clean. Therefore, the problem that the cleaning liquid stays in the bristle bundle 50 (brush bristle) and the bacteria propagate is solved.

  Next, a specific aspect of the support member 60 will be described. The support member 60 includes a suspension bolt 600 whose one end is fixed to the brush base 51, an adjustment nut 601, and a washer 603. The suspension bolt 600 is provided with a large-diameter threaded portion 604 on one end side, and a threaded portion 600N is formed on the body trunk. The large-diameter screw portion 604 is screwed into a screw recess 112 provided on the back surface 511 side of the brush base 51. The suspension bolt 600 is fastened with an adjusting nut 605 for retaining the bolt, so that the main body body portion 600 protrudes from the brush base portion 51 toward the back surface, and one end side of the suspension bolt 600 is fixed to the brush base portion 51. It is set as the structure.

  The other end side of the suspension bolt 600 passes through a through hole 610 provided in the brush mounting base 61 and protrudes to the upper surface side of the brush mounting base 61. The adjustment nut 601 is screwed into the threaded portion 600N on the upper surface side of the brush mounting base 61. The lower surface of the adjustment nut 601 is in contact with the upper surface side of the brush mounting base 61 via a washer 603, and the suspension bolt 600 is locked at the corresponding contact surface, whereby the brush base 51 (brush portion 221) is suspended. Stopped and supported.

  According to such a mounting structure of the suspension bolt 600, the length of the gap G between the lower surface of the brush mounting base 61 and the back surface 511 of the brush base 51 can be adjusted by rotating the adjustment nut 601. That is, it functions as a gap adjusting mechanism for the gap G. Therefore, if there is a portion where the brush base 51 is bent downward, the adjustment nut 601 of the suspension bolt 600 attached in the vicinity thereof is rotated in the tightening direction so that the portion is lifted upward. This makes it possible to correct the “deflection”.

  In addition, if there is a part where the brush base 51 is warped upward due to factors such as molding habit and heat history, the adjustment nut 601 is rotated in the direction to loosen contrary to the above case, and a pressing force is applied to the part. This makes it possible to correct the “warp” and the like. In particular, when there is no “deflection” or “warp”, the suspension bolt at a minimum part necessary for stably supporting the brush part 221 (for example, a part located at a corner part of the brush mounting base 2). The adjustment nut 601 may be screwed only to 600, and the adjustment nut 601 may not be screwed to the other suspension bolts 600. The plurality of support members 60 function as correction means for correcting the downward deflection of the brush base 51.

  Next, a mechanism for generating UV treatment liquid (cleaning liquid) by irradiating pure water or the like with ultraviolet rays will be described. FIG. 5 is a diagram showing an outline of the cleaning mechanism for the substrate B by the brush unit 221, the cleaning liquid supply unit 9, and the UV processing liquid generation mechanism. The washing unit E42 (substrate cleaning device) receives and cleans the transport roller 21 that receives and transports the substrate B that has been etched by the etching unit E41, and the upper surface of the substrate B that is transported by the transport roller 21. A cleaning liquid (including various processing liquids used for substrate cleaning, pure water, etc.) is supplied to the brush part 221, the brush part 222 that contacts and cleans the lower surface of the substrate B, and the upper surface of the substrate B. A cleaning liquid supply nozzle (liquid supply unit) 231 and a cleaning liquid supply nozzle 232 for supplying the cleaning liquid to the lower surface of the substrate B are provided. A plurality of brush portions 221 and 222 and a plurality of cleaning liquid supply nozzles 231 and 232 are provided. The brush part 222 has the same structure as the brush part 221. The cleaning liquid supply nozzles 231 and 232 are connected to a cleaning liquid supply source (not shown).

  The cleaning liquid supply unit 9 described above includes the cleaning liquid storage tank 91, the supply path 92, and the supply pump 93 described above. The UV processing liquid generation mechanism 100 includes an underwater pump 101, a cleaning liquid circulation pipe 102, a UV irradiation device 103 in the circulation pipe, A circulation path 104, an in-tank UV irradiation device 105, a cleaning liquid recovery pipe 106, and a pure water distribution pipe 107 are provided. In addition, the cleaning liquid storage tank 91 reflects the ultraviolet rays in the tank at the time of ultraviolet irradiation to improve the irradiation efficiency, and even when used for a long time, to prevent the tank from being transformed by the irradiation of ultraviolet rays. It is preferably made of stainless steel. The cleaning liquid storage tank 91 of the cleaning liquid supply unit 9 also functions as a part of the UV processing liquid generation mechanism 100 (cleaning liquid storage means, stainless steel cleaning liquid storage tank).

  The pure water distribution pipe 107 of the UV processing liquid generation mechanism 100 supplies the cleaning liquid storage tank 91 with pure water supplied in a timely manner as necessary from a pure water supply source (not shown). The submersible pump 101 pumps pure water (UV treatment liquid) collected in the cleaning liquid storage tank 91 and guides it to the UV irradiation device 103 in the circulation pipe through the cleaning liquid circulation pipe 102. The UV irradiation device 103 in the circulation pipe is for ultraviolet light (for example, ultraviolet light having a wavelength of 254 nm line, but limited to ultraviolet light having a wavelength of 254 nm, with respect to pure water (UV treatment liquid) pumped from the cleaning liquid storage tank 91 by the submersible pump 101. (It is also possible to use ultraviolet rays of other wavelengths.) In other words, the UV irradiation device 103 in the circulation pipe irradiates the pure water (UV treatment liquid) that is pumped up from the cleaning liquid storage tank 91 by the submersible pump 101 and circulates in the cleaning liquid circulation pipe 102 with ultraviolet rays.

  The circulation path 104 is for returning the UV treatment liquid after the ultraviolet irradiation by the UV irradiation device 103 in the circulation pipe to the cleaning liquid storage tank 91. The in-tank UV irradiation apparatus 105 irradiates, for example, ultraviolet light of 254 nm line to pure water (UV treatment liquid) stored in the cleaning liquid storage tank 91. Accordingly, the cleaning liquid storage tank 91 stores the UV processing liquid irradiated with ultraviolet rays by the UV irradiation device 103 in the circulation pipe and the immersion UV irradiation device 105 in the tank. The UV processing liquid stored in the cleaning liquid storage tank 91 is pumped up by the supply pump 93 of the cleaning liquid supply section 9 and guided to the opening end 13E of the cleaning liquid guide path 13 of the brush sections 221 and 222 through the supply path 92. Is done.

  The UV processing liquid pumped up by the supply pump 93 of the cleaning liquid supply unit 9 is used as a cleaning liquid for both the bristle bundle 50 (brush hair) of the brush part 221 and the substrate B, and the cleaning liquid guide for the brush part 221 in the brush base 51 is used. The ink is discharged from the discharge port 131 toward the bristle bundle 50 through the passage 13. The UV treatment liquid discharged toward the bristle bundle 50 reaches the upper surface of the substrate B through the bristle bundle 50 (brush bristle), and the upper surface of the substrate B moves while moving in the transport direction. The brush bristles 50 are brushed and cleaned by the tip 50H. The cleaning liquid (UV processing liquid) after the brushing cleaning is recovered by the cleaning liquid recovery pipe 106 and returned to the cleaning liquid storage tank 91.

  Next, a specific aspect of the swing mechanism 8 will be described. FIG. 6 shows that the vibrator mounting base 61 (brush tip 50H) is linearly moved in a direction (indicated by an arrow b in the figure) perpendicular to the traveling direction of the substrate B (indicated by the arrow b in the figure). It is a top view which shows the outline of the rocking | fluctuation mechanism 8 which makes a reciprocating motion.

  The vibrator 81 is driven by an electric motor (drive source) 82, and a shaft support pin 812 projects from the vicinity of the outer peripheral portion of a rotating disk 811 coupled to the rotating shaft 821 of the driving source 82. A connecting hole provided on one end side of the drive shaft 813 is loosely fitted to the shaft support pin 812. The connecting shaft provided on the other end side of the drive shaft 813 and the shaft support portion 611 protruding from the side edge of the brush mounting base 61 are connected to each other by a connecting pin 612 so as to be rotatable. .

  On the other hand, the brush mounting base 61 is supported by a linear guide 613 so as to be capable of linear reciprocation in the direction of arrow c in the figure. Instead of the linear guide 613, a linear bush or the like may be used.

  In such a configuration, when the driving source 82 is driven, the rotating disk 811 coupled to the rotating shaft 821 of the driving source 82 is rotated, and the shaft support pin 812 projecting from the rotating disk 811 is rotated. The drive shaft 813 to which one end side is connected performs a crank operation in the horizontal direction of the drawing. By this crank operation, the brush mounting base 61 connected to the drive shaft 813 by the connecting pin 612 reciprocates (vibrates) in the direction of the arrow c in the figure while being guided by the linear guide 613. That is, the brush portion 221 scrapes off dirt on the surface of the substrate B by the tip 50H of the brush bristle bundle 50 contacting the upper surface of the substrate B and reciprocating (vibrating) in the direction of arrow c in the figure. Wash. Instead of the linear reciprocating mechanism using the vibrator 81 having such a crank mechanism and the drive source 82, a linear reciprocating mechanism using an air cylinder or the like may be adopted. A similar configuration is applied to the brush unit 222.

  In addition, this invention is not limited to said each embodiment, The aspect described below can be employ | adopted. For example, in the above embodiment, the UV treatment liquid generation mechanism 100 includes both the UV irradiation device 103 in the circulation pipe and the immersion UV irradiation device 105 in the tank, but only one of the irradiation devices is used. It may be provided.

  Furthermore, as shown in the above embodiment, the ultraviolet rays by the UV irradiation device 103 in the circulation pipe and the immersion UV irradiation device 105 in the tank are preferably 254 nm lines, but other ultraviolet rays can also be applied. is there.

  In the above embodiment, the cleaning liquid (UV processing liquid) after the brushing cleaning is recovered by the cleaning liquid recovery pipe 106 and returned to the cleaning liquid storage tank 91. However, such a used cleaning liquid recovery mechanism is provided. It does not matter if it is not.

  The cleaning liquid storage tank 91 is preferably made of stainless steel as shown in the above embodiment, but a tank made of a material other than stainless steel can also be applied.

It is the schematic which shows the etching processing apparatus with which the substrate processing apparatus which concerns on this invention is applied suitably. It is a block diagram which shows simply the brush part with which the water washing process unit is provided, and its drive mechanism. It is a partially broken side view which shows the principal part of the simple block diagram shown in FIG. 2, especially the part of a brush part and a support material in detail. It is a sectional side view which shows the outline of the internal structure of a brush part. It is a figure which shows the outline of the washing | cleaning mechanism of the board | substrate by a brush part, a washing | cleaning liquid supply part, and a UV process liquid production | generation mechanism. A swing mechanism that causes a brush mounting base (brush tip) to linearly reciprocate in a direction (indicated by an arrow c in the figure) perpendicular to a substrate traveling direction (indicated by an arrow b in the figure) using a vibrator. It is a top view which shows an outline.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Substrate cleaning apparatus 3 Brush part 9 Cleaning liquid supply part 10 Substrate cleaning apparatus 13 Cleaning liquid guide path 13E Open end 21 Conveyance roller 50H Brush tip 50 Brush bundle 91 Cleaning liquid storage tank 92 Supply path 93 Supply pump 100 Process liquid generation part 101 Submersible pump DESCRIPTION OF SYMBOLS 102 Cleaning liquid circulation piping 103 Irradiation apparatus 104 Circulation path 105 Irradiation apparatus 106 Cleaning liquid collection pipe 107 Pure water distribution pipe 131 Discharge port 132 Storage part 221 Brush part 222 Brush part

Claims (7)

A brush portion in which brush hairs for substrate processing are erected on the brush base; and
Cleaning liquid supply means for supplying a cleaning liquid for brush hair cleaning;
An irradiation means for irradiating the cleaning liquid with ultraviolet rays,
The cleaning liquid after being irradiated with ultraviolet rays by the irradiation means flows into the brush base from the cleaning liquid supply means, and the cleaning liquid guide path for guiding the cleaning liquid toward the brush bristles, and the cleaning liquid flowing through the cleaning liquid guide path as the brush. The substrate processing apparatus provided with the discharge outlet discharged to the said bristle from the hair standing surface. A cleaning liquid recovery means for returning the cleaning liquid supplied to the bristles by the cleaning liquid supply means to the cleaning liquid supply means;
The irradiation means irradiates the cleaning liquid recovered by the cleaning liquid recovery means again with ultraviolet rays,
The substrate processing apparatus according to claim 1, wherein the cleaning liquid supply unit supplies the cleaning liquid irradiated with ultraviolet rays again by the irradiation unit to the cleaning liquid guide path of the brush base.   The substrate processing apparatus according to claim 1, wherein the irradiation unit includes a circulation type irradiation unit that irradiates the cleaning liquid in a circulating state with the ultraviolet rays.   The said irradiation means is provided with the washing | cleaning liquid storage means which stores the said washing | cleaning liquid, and the storage type irradiation means which irradiates the said ultraviolet-ray with respect to the washing | cleaning liquid stored by this cleaning liquid storage means. The substrate processing apparatus as described.   The substrate processing apparatus according to claim 4, wherein the cleaning liquid storage unit includes a stainless steel cleaning liquid storage tank, and the cleaning liquid stored in the storage tank is irradiated with ultraviolet rays by the storage type irradiation unit.   6. The substrate processing apparatus according to claim 1, wherein the ultraviolet ray irradiated by the irradiation unit is a 254 nm line.   The substrate processing apparatus according to claim 1, wherein the cleaning liquid for brush cleaning supplied by the cleaning liquid supply unit is also used as a cleaning liquid for substrate cleaning.

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