JP2006171500A - Liquid crystal device and electronic appliance - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To prevent lowering of display quality by arranging an auxiliary capacitor and substantially enlarging the pixel capacitance. <P>SOLUTION: An element substrate and a color filter substrate are stuck to each other via a sealing material having a conduction member. A Y-driver IC, a scanning wire connected thereto, a resin scattering layer, a reflection layer, an insulating layer, a pixel electrode, etc. are formed on the element substrate. A coloring layer, a scanning electrode, etc. are formed on the color filter substrate. A reflection layer is formed on the resin scattering layer of a reflective display region on the element substrate. A transparent insulating layer is formed on the reflection layer, and the pixel electrode is formed on the transparent insulating layer. The scanning wire is formed on a picture frame region of the element substrate, an end portion of the scanning wire is extended to the inside of the sealing material, an end portion of the reflection layer is formed thereon, and an ITO is formed on the end portion of the reflection layer respectively, where the ITO is electrically connected to the scanning electrode via the conduction member. That is, there is continuity between the upper and the lower electrodes inside the sealing material. Thereby an identical electric potential is applied to the reflection layer and the scanning electrode, and an auxiliary capacitor, with the insulating layer between the pixel electrode and the reflection layer as a dielectric, is formed. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a liquid crystal device and an electronic apparatus suitable for use in displaying various information.

  Currently, liquid crystal devices are widely used in electronic devices such as mobile phones, personal digital assistants, PDAs (Personal Digital Assistants), and the like. For example, a liquid crystal device is used as a display unit for displaying various information related to electronic devices. As such a liquid crystal device, a transflective liquid crystal device having a display mode of both transmissive display and reflective display and having a two-terminal switching element such as a TFD (Thin Film Diode) element is known. Yes. In such a liquid crystal device, for example, a reflective film is formed on one of two substrates facing each other, a color filter is formed on the reflective film, and a scanning line is formed on the reflective film. A line, a two-terminal switching element, and a pixel electrode are formed, and liquid crystal is sealed between both substrates.

  When reflection type display is performed in such a liquid crystal device, the external light incident on the liquid crystal device passes through the region where the color filter is formed, is reflected by the reflective film below the color filter, and is again colored. The light passes through a filter or the like and is emitted on the display screen. Thereby, the display image which shows a predetermined hue and brightness is visually recognized by the observer. An example of such a transflective liquid crystal device is described in Patent Document 1.

JP 2003-57632 A

  However, the above-mentioned liquid crystal devices have been increasingly refined in recent years, and as a result, the area of the pixel electrode is reduced and the capacity of the pixel electrode is reduced. For example, the display quality such as contrast is deteriorated, burn-in, yield, and reliability. There is a risk of degrading the sex.

  The present invention has been made in view of the above points, and by providing an auxiliary capacitor, it is possible to substantially increase the pixel capacitance to prevent a reduction in display quality and to obtain a high-quality display image. It is an object to provide a liquid crystal device and an electronic device.

  In one aspect of the present invention, in a liquid crystal device including a liquid crystal between an element substrate and a counter substrate, the element substrate includes a signal line, a switching element connected to the signal line, and an extension from the switching element. A first capacitive electrode comprising a conductive film, an insulating layer covering at least a part of the signal line, a reflective layer provided on the insulating layer and reflecting light incident on the liquid crystal, and the first capacitor A dielectric layer provided on the electrode, and a second capacitor electrode formed on the dielectric layer and made of a pixel electrode connected to the conductive film, wherein the first capacitor electrode has a second capacitor A liquid crystal device characterized by overlapping with an electrode in a plane.

  The liquid crystal device includes a liquid crystal between an element substrate and a counter substrate. The element substrate is a first capacitor electrode as a switching element such as a signal line (data line) or a TFD (Thin Film Diode) element, a conductive film made of chromium or the like, an insulating layer made of acrylic resin or the like, or a reflective layer made of aluminum or the like. , A dielectric layer made of acrylic resin or the like, and a second capacitor electrode as a pixel electrode made of ITO or the like. The switching element is electrically connected to the signal line. The conductive film extends from the switching element. The insulating layer covers at least part of the signal line. The first capacitor electrode made of the reflective layer is provided on the insulating layer. Here, the reflection layer has a function as a reflection plate that reflects light and a function as an electrode (first capacitance electrode) that forms a capacitor in the dielectric layer. The function of the reflective layer as the first capacitor electrode can be realized by applying a signal to the reflective layer from, for example, a driver IC or a power supply IC. The dielectric layer is formed of the same material as the insulating layer. A second capacitor electrode made of a pixel electrode is provided on the dielectric layer and is electrically connected to the conductive film. As described above, this liquid crystal device is an active matrix liquid crystal device having two-terminal elements such as TFD elements. Since the liquid crystal device having such a configuration includes the first capacitor electrode as a reflective layer, it is possible to perform reflective display in that portion. In a preferred example, the insulating layer can be a scattering layer that forms irregularities on the reflective layer. Thereby, unevenness reflecting the unevenness of the scattering layer is formed on the reflective layer. Therefore, in the reflective display, the light reflected by the reflective layer is appropriately scattered.

  In particular, in this liquid crystal device, the first capacitor electrode overlaps the second capacitor electrode in a planar manner. For this reason, when the liquid crystal device is driven, an auxiliary capacitor is formed in the dielectric layer by applying a signal from the driver IC, the power supply IC, or the like to the reflective layer as the first capacitor electrode. Therefore, in this liquid crystal device, since the auxiliary capacitance is added to the pixel capacitance formed between the second capacitance electrode and the liquid crystal, the pixel capacitance can be substantially increased accordingly.

  In a preferred example, the element substrate has a transmission region at a position adjacent to the reflection region where the reflection layer is formed in the sub-pixel region, and the pixel electrode is formed in the transmission region. Thereby, transmissive display can be performed in the transmissive region in the sub-pixel. The dielectric layer may be a liquid crystal layer thickness adjusting layer (multi-gap layer) that changes a layer thickness of the liquid crystal corresponding to the reflective region and a layer thickness of the liquid crystal corresponding to the transmissive region. Thereby, display performance can be improved in both transmissive display and reflective display.

  In one embodiment of the above liquid crystal device, a scanning line is provided on the counter substrate, and the scanning line is connected to the first capacitor electrode.

  According to this aspect, the reflective layer serving as the first capacitor electrode is electrically connected to the scanning line formed on the counter substrate. Therefore, when the liquid crystal device is driven, the same potential can be applied from the driver IC or power supply IC to the reflective layer as the first capacitor electrode and the scanning electrode. Thereby, an auxiliary capacitor is formed in the dielectric layer, and the pixel capacitance can be substantially increased.

  In another aspect of the present invention, in a liquid crystal device including a liquid crystal between an element substrate and a counter substrate, the element substrate is provided corresponding to a signal line and a scanning line, and an intersection of the signal line and the scanning line. A switching element, a conductive film extending from the switching element, an insulating layer covering at least a part of the signal line or the scanning line, and reflecting light incident on the liquid crystal provided on the insulating layer A first capacitor electrode made of a reflective layer; a dielectric layer provided on the first capacitor electrode; a second capacitor electrode made of a pixel electrode provided on the dielectric layer and connected to the conductive film; The first capacitor electrode overlaps the second capacitor electrode in a plan view.

  The above-described liquid crystal device includes a liquid crystal between an element substrate and a counter substrate. The element substrate is a signal line (data line) and scanning line, a switching element such as a TFT (Thin Film Transistor) element, a conductive film made of chromium or the like, an insulating layer made of acrylic resin or the like, and a reflective layer made of aluminum or the like. A first capacitor electrode, a dielectric layer made of acrylic resin or the like, and a second capacitor electrode as a pixel electrode made of ITO or the like are provided. The switching element is provided at the intersection of the signal line and the scanning line. The conductive film extends from the switching element. The insulating layer covers at least part of the signal line or the scanning line. The first capacitor electrode made of the reflective layer is provided on the insulating layer. Here, the reflection layer has a function as a reflection plate that reflects light and a function as an electrode (first capacitance electrode) that forms a capacitor in the dielectric layer. The function of the reflective layer as the first capacitor electrode can be realized by applying a signal to the reflective layer from, for example, a driver IC or a power supply IC. The dielectric layer is formed of the same material as the insulating layer. A second capacitor electrode made of a pixel electrode is provided on the dielectric layer and is electrically connected to the conductive film. As described above, this liquid crystal device is an active matrix liquid crystal device having three terminal elements such as TFT elements. Since the liquid crystal device having such a configuration includes the first capacitor electrode as a reflective layer, it is possible to perform reflective display in that portion. In a preferred example, the insulating layer can be a scattering layer that forms irregularities on the reflective layer. Thereby, unevenness reflecting the unevenness of the scattering layer is formed on the reflective layer. Therefore, in the reflective display, the light reflected by the reflective layer is appropriately scattered.

  In particular, in this liquid crystal device, the first capacitor electrode overlaps the second capacitor electrode in a planar manner. For this reason, when the liquid crystal device is driven, an auxiliary capacitor is formed in the dielectric layer by applying a signal from the driver IC, the power supply IC, or the like to the reflective layer as the first capacitor electrode. Therefore, in this liquid crystal device, since the auxiliary capacitance is added to the pixel capacitance formed between the second capacitance electrode and the liquid crystal, the pixel capacitance can be substantially increased accordingly.

  In a preferred example, the element substrate has a transmission region at a position adjacent to the reflection region where the reflection layer is formed in the sub-pixel region, and the pixel electrode is formed in the transmission region. Thereby, transmissive display can be performed in the transmissive region in the sub-pixel. The dielectric layer may be a liquid crystal layer thickness adjusting layer (multi-gap layer) that changes a layer thickness of the liquid crystal corresponding to the reflective region and a layer thickness of the liquid crystal corresponding to the transmissive region. Thereby, display performance can be improved in both transmissive display and reflective display.

  In one mode of the above liquid crystal device, the counter substrate is provided with a counter electrode, and the counter electrode is connected to the first capacitor electrode.

  According to this aspect, the reflective layer as the first capacitor electrode is electrically connected to the counter electrode formed on the counter substrate. Therefore, when the liquid crystal device is driven, the same potential can be applied from the driver IC or power supply IC to the reflective layer as the first capacitor electrode and the counter electrode. Thereby, an auxiliary capacitor is formed in the dielectric layer, and the pixel capacitance can be substantially increased.

  In another aspect of the present invention, a liquid crystal device including an element substrate having wiring and a counter substrate having a scanning electrode, and having a liquid crystal between the element substrate and the counter substrate, the element substrate includes a switching element, A first capacitor comprising a conductive film connected to the switching element, an insulating layer formed so as to cover a part of the conductive film and the switching element, and a reflective layer formed on a part of the insulating layer An electrode, a dielectric layer formed so as to cover a part of the conductive film, the insulating layer, and the reflective layer, and a second capacitor electrode formed of a pixel electrode formed on the dielectric layer. The pixel electrode is connected to a contact portion that is not covered by the insulating layer and the dielectric layer of the conductive film, and the reflective layer extends in the same direction as the scanning electrode extends. And before One end of the reflective layer, the vertical conducting portion is electrically connected to the wiring and the scanning electrode, the first capacitor electrode overlaps the second capacitor electrode in a plan view.

  The liquid crystal device includes an element substrate having wiring (leading wiring) and a counter electrode having a scanning electrode, and includes a liquid crystal between both substrates. The element substrate includes a switching element such as a TFD element, a first capacitor electrode including a conductive film, an insulating layer, and a reflective layer, and a second capacitor electrode including a dielectric layer and a pixel electrode. The insulating layer is formed so as to cover a part of the conductive film and the switching element. As a material of the insulating layer, for example, an insulating and transparent material such as an acrylic resin is preferable. The reflective layer serving as the first capacitor electrode is formed on a part of the insulating layer. As the material of the reflective layer, for example, a material such as aluminum is preferable. The dielectric layer is formed so as to cover a part of the conductive film, the insulating layer, and the reflective layer. As a material of the dielectric layer, for example, a material having insulation and transparency such as acrylic resin is preferable. The pixel electrode as the second capacitor electrode is formed on the dielectric layer. As a material for the pixel electrode, a transparent material such as ITO is suitable. The pixel electrode is connected to a contact portion that is not covered with the insulating layer and the dielectric layer of the conductive film, and is electrically connected to the switching element. As described above, this liquid crystal device is an active matrix liquid crystal device having two-terminal elements such as TFD elements.

  In the liquid crystal device having such a configuration, the reflective layer extends in the same direction as the scanning electrode extends. The reflective layer is preferably formed substantially parallel to the scan electrode. One end side of the reflective layer is electrically connected to the wiring and the scan electrode in the vertical conduction portion, and the first capacitor electrode overlaps the second capacitor electrode in a plane. In a preferred example, the liquid crystal device includes a drive circuit (driver IC) that applies the same potential (scanning signal) to the reflective layer and the scanning electrode through the wiring.

  Therefore, at the time of driving the liquid crystal device, the same potential can be applied from the drive circuit to the reflective layer serving as the first capacitor electrode and the scan electrode via the wiring. Thereby, an auxiliary capacitor is formed in the dielectric layer located between the pixel electrode as the second capacitor electrode and the reflective layer as the first capacitor electrode. That is, the reflection layer has a function as a reflection plate that reflects light and a function as an electrode that forms an auxiliary capacitance (first capacitance electrode). Therefore, in this liquid crystal device, since the auxiliary capacitance is added to the pixel capacitance formed between the second capacitance electrode and the liquid crystal, the pixel capacitance can be substantially increased accordingly. Here, the size of the auxiliary capacitance with respect to the pixel capacitance can be adjusted by appropriately changing, for example, the area of the reflective layer, the dielectric constant and thickness of the dielectric layer, based on a general capacitance equation. it can. Thereby, the pixel capacitance and the auxiliary capacitance can be set in a desired relationship according to the design specification.

  By the way, in a liquid crystal device having a recent high-definition panel, measures such as using a liquid crystal having a high dielectric constant to obtain a desired display image, or reducing a distance (cell gap) between an element substrate and a counter substrate, etc. Has been given. However, in a liquid crystal device using a liquid crystal with a high dielectric constant, a so-called burn-in display defect may occur if the same image is continuously displayed.

  In this respect, in this liquid crystal device, the pixel capacitance is substantially increased by the amount of addition of the auxiliary capacitance as described above. For this reason, in this liquid crystal device, the pixel capacity can be reduced by changing the distribution of the two without changing the total capacity of the pixel capacity and the auxiliary capacity according to the design specifications. In other words, in this liquid crystal device, a liquid crystal having a low dielectric constant can be used, or the cell gap can be increased. As a result, display defects such as burn-in can be prevented, and the yield can be improved.

  Further, in a general liquid crystal device, a storage capacitor is formed using a chromium film or a tantalum film having a light shielding property. On the other hand, in this liquid crystal device, an auxiliary capacitance is formed in a transparent dielectric layer positioned between the transparent pixel electrode and the reflective layer. Therefore, the position does not become a non-display area, and the reflective display can be appropriately performed at the position. Thereby, the fall of an aperture ratio can be prevented.

  In a preferred example, the vertical conduction part has a conduction member such as a plurality of metal particles, for example, and can electrically connect the reflective layer and the scan electrode via the conduction member. Further, another conductive film made of, for example, ITO (Indium-Tin Oxide) can be provided between the conductive member and the reflective layer. Furthermore, in order to further improve the vertical conduction between the reflective layer and another conductive film, an interlayer film having conductivity, such as molybdenum tungsten, may be interposed between the reflective layer and the conductive film. In order to achieve the purpose, instead of this, the other conductive film is formed of a material that does not easily react with the reflective layer, for example, IZO (indium zinc oxide), or vice versa. You may make it form with the material which does not react easily.

  In one aspect of the liquid crystal device, the element substrate has a transmission region at a position adjacent to the reflection region in which the reflection layer is formed in the sub-pixel region, and the pixel electrode is formed in the transmission region. Yes. Thereby, transmissive display can be performed in the transmissive region in the sub-pixel.

  In a preferred example, each of the pixel electrodes is formed in a sub-pixel region, the sub-pixel region has a reflective region and a transmissive region, and the reflective layer forms a column in the extending direction of the scan electrode. The plurality of pixel electrodes extend so as to traverse each reflective region.

  According to this aspect, each of the pixel electrodes is formed in the sub-pixel region. Since the sub-pixel region has a reflective region and a transmissive region, reflective display can be performed in the reflective region, and transmissive display can be performed in the transmissive region. In this aspect, the reflective layer can be extended so as to traverse each reflective region of the plurality of pixel electrodes forming a column in the extending direction of the scan electrode.

  In a preferred example, the insulating layer can be a scattering layer that forms irregularities on the reflective layer. Thereby, unevenness reflecting the unevenness of the scattering layer is formed on the reflective layer. Therefore, the light reflected by the reflective layer is scattered appropriately. In this aspect, the dielectric layer may include a liquid crystal layer thickness adjusting layer (multi-gap layer) that changes a layer thickness of the liquid crystal corresponding to the reflective region and a layer thickness of the liquid crystal corresponding to the transmissive region. can do. Thereby, display performance can be improved in both transmissive display and reflective display.

  In addition, an electronic device including the above liquid crystal device as a display portion can be formed.

  The best mode for carrying out the present invention will be described below with reference to the drawings. In the following embodiments, the present invention is applied to a liquid crystal display device. In the embodiment of the present invention, in order to improve reflection contrast, a reflective layer, an overcoat layer thereon, and a pixel electrode are formed on the element substrate side, while stripes are formed on the color filter substrate side. A scanning electrode and a colored layer are formed, and the reflective layer and the colored layer are separated. Based on such a configuration, in the present embodiment, in particular, the reflective layer is formed so as to extend in the extending direction of the scan electrode and to be substantially parallel to the scan electrode. One end side and one end side of the scanning electrode are electrically connected by a conducting member in the seal member. Then, when the liquid crystal display device is driven, the same potential is applied to the reflection layer and the scan electrode, thereby forming an auxiliary capacitor having an overcoat layer as a dielectric between the pixel electrode and the reflection layer. As a result, the capacitance of the pixel electrode is substantially increased to prevent display quality from deteriorating.

[Configuration of liquid crystal display device]
First, the configuration of the liquid crystal display device according to the embodiment of the present invention will be described. FIG. 1 is a plan view schematically showing a schematic configuration of a liquid crystal display device 100 of the present invention. In FIG. 1, the configuration of electrodes and wirings of the liquid crystal display device 100 is mainly shown as a plan view. Here, the liquid crystal display device 100 of the present invention is an active matrix driving method using a TFD element, and is a transflective liquid crystal display device. In the liquid crystal display device 100 of the present invention, the thickness of the liquid crystal layer in the reflective display region is set smaller than the thickness of the liquid crystal layer in the transmissive display region, and the display performance is improved in both the transmissive display and the reflective display. This is a liquid crystal display device having a so-called multi-gap structure. Furthermore, the liquid crystal display device of the present invention is a liquid crystal display device having a so-called overlayer structure in which a pixel electrode, a data line, and a TFD element are insulated by a resin scattering layer.

  FIG. 2 is a schematic cross-sectional view taken along a cutting line A-A ′ passing through the reflective display region of a plurality of pixel electrodes in one row in the liquid crystal display device 100 of FIG. 1. FIG. 3 is a schematic cross-sectional view taken along a cutting line B-B ′ passing through a transmissive display region of a plurality of pixel electrodes in one row in the liquid crystal display device 100 of FIG. 1.

  First, a cross-sectional configuration of the liquid crystal display device 100 taken along a cutting line AA ′ passing through the reflective display region of the pixel electrode 10 will be described with reference to FIG. 2, and subsequently, with reference to FIG. A cross-sectional configuration of the liquid crystal display device 100 taken along a cutting line BB ′ passing through the ten transmissive display areas will be described. After that, the configuration of the electrodes and wirings of the liquid crystal display device 100 will be described.

  In FIG. 2, the liquid crystal display device 100 includes an element substrate 91 and a color filter substrate 92 disposed so as to face the element substrate 91, with a frame-shaped sealing member 3 attached thereto, and liquid crystal is sealed inside. Thus, the liquid crystal layer 4 is formed. In a preferred example, the dielectric constant of the liquid crystal layer 4 can be set to about 6, for example. The frame-shaped seal member 3 is mixed with a conductive member 7 such as a plurality of metal particles.

  On the inner surface of the lower substrate 1, data lines 32 are formed at appropriate intervals, and TFD elements 21 are formed for each sub-pixel region SG. On the inner surface of the lower substrate 1, the data line 32, and the TFD element 21, a resin scattering layer 25 having fine irregularities is formed on the surface. As a material of the resin scattering layer 25, an insulating and translucent material such as acrylic resin is preferable. On the inner surface of the resin scattering layer 25 and the like, a substantially striped reflective layer 5 extending in a direction substantially orthogonal to the direction in which the data lines 32 extend is formed. One end side (hereinafter also referred to as “connecting portion 5x”) of the reflective layer 5 extends into the seal member 3 and overlaps with a connecting portion 31x of a scanning line 31 to be described later. For this reason, the reflective layer 5 is electrically connected to the scanning line 31. On the other hand, the other end side of the reflective layer 5 extends to a boundary portion between the effective display area V and the frame area 38. The reflective layer 5 reflects the fine irregularities of the resin scattering layer 25, and fine irregularities are formed on the inner surface of the reflective layer 5. The reflective layer 5 can be formed of a thin film such as aluminum, an aluminum alloy, or a silver alloy. Further, a conductive film 9 made of ITO, which is formed in the same process as the pixel electrode 10, is formed on the connection portion 5 x of the reflective layer 5 located in the seal member 3.

  On the inner surfaces of the resin scattering layer 25 and the reflection layer 5, an overcoat layer 26 (dielectric layer) made of a material substantially the same as that of the resin scattering layer 25 is formed. In a preferred example, the dielectric constant of the overcoat layer 26 can be set to about 3. The overcoat layer 26 has a function of protecting the reflective layer 5 and the like from corrosion and contamination by chemicals used during the manufacturing process of the liquid crystal display device 100. On the inner surface of the overcoat layer 26, the pixel electrode 10 is formed for each sub-pixel region SG. An alignment film (not shown) is formed on the inner surface of the pixel electrode 10 or the like.

  Further, scanning lines 31 (wiring or routing wiring) are formed on the left and right peripheral edge portions on the inner surface of the lower substrate 1. One end portion of the scanning line 31 extends into the seal member 3, and one end portion (connecting portion 31 x) of the scanning line 31 passes through the reflective layer 5 and the conductive film 9 located in the seal member 3. 7 is electrically connected.

  On the other hand, at the position on the inner surface of the upper substrate 2 and facing the pixel electrode 10, colored layers 6R, 6G, and 6B made of any of the three colors R, G, and B are provided for each sub-pixel region SG. Is formed. A color filter is constituted by the colored layers 6R, 6G, and 6B. A pixel G indicates a region for one color pixel composed of R, G, and B sub-pixels. In the following description, when a colored layer is specified regardless of color, it is simply referred to as “colored layer 6”, and when a colored layer is specified by distinguishing colors, it is described as “colored layer 6R”.

  Further, a black light-shielding layer BM is formed between the sub-pixel regions SG so as to prevent light from being mixed from one sub-pixel region SG to the other sub-pixel region SG with the adjacent sub-pixel region SG being separated. ing. The black light shielding layer BM can be made of a black resin material, for example, a black pigment dispersed in a resin. In the present invention, instead of this, an overlapping light shielding layer (not shown) formed by overlapping R, G, and B colored layers may be used.

  An overcoat layer 18 made of acrylic resin or the like is formed on the inner surfaces of the colored layer 6 and the black light shielding layer BM. The overcoat layer 18 has a function of protecting the colored layer 6 and the like from corrosion and contamination due to chemicals and the like used during the manufacturing process of the liquid crystal display device 100. A transparent electrode (scanning electrode) 8 made of ITO or the like having a stripe shape is formed on the inner surface of the overcoat layer 18. The scanning electrode 8 extends in the same direction as the direction in which the reflective layer 5 extends. One end of the scanning electrode 8 extends into the seal member 3 and is electrically connected to the conducting member 7 in the seal member 3.

  An alignment film (not shown) is formed on the inner surface of the scan electrode 8. Further, on the inner surface of the scan electrode 8, a photo spacer 27 formed by a method such as photolithography and having a columnar shape is formed. The photo spacer 27 keeps the thickness of the liquid crystal layer 4 in the reflective display region at a constant thickness D1. The material of the photo spacer is preferably made of a thermosetting resin material having photosensitivity such as an acrylic film or a polyimide film, or an inorganic material such as a silicon oxide film or a silicon nitride film.

  A retardation plate (¼ wavelength plate) 13 and a polarizing plate 14 are disposed on the outer surface of the lower substrate 1, and a retardation plate (¼ wavelength plate) on the outer surface of the upper substrate 2. 11 and a polarizing plate 12 are arranged. A backlight 15 is disposed below the polarizing plate 14. The backlight 15 is preferably a point light source such as an LED (Light Emitting Diode) or a combination of a linear light source such as a cold cathode fluorescent tube and a light guide plate.

  The scanning electrode 8 (scanning line) of the color filter substrate 92 and the reflective layer 5 of the element substrate 91 are vertically connected through the conductive film 9 and the conductive member 7 located in the seal member 3, respectively.

  Now, when reflective display is performed in the liquid crystal display device 100 of the present embodiment, the external light incident on the liquid crystal display device 100 travels along the path R shown in FIG. That is, the external light incident on the liquid crystal display device 100 is reflected by the reflective layer 5 and reaches the observer. In this case, the external light passes through the region where the colored layer 6, the pixel electrode 10, the overcoat layer 26, and the like are formed, and is reflected by the reflective layer 5 below the overcoat layer 26, and again. A predetermined hue and brightness are exhibited by passing through the overcoat layer 26, the pixel electrode 10, the colored layer 6, and the like. Thus, a desired color display image is visually recognized by the observer.

  Next, a cross-sectional configuration of the liquid crystal display device 100 along a straight line B-B ′ passing through the transmissive display region of the pixel electrode 10 will be described with reference to FIG. 3. In the following, description of the same configuration as in FIG. 2 will be omitted or simplified.

  In FIG. 3, data lines 32 are formed on the inner surface of the lower substrate 1 at an appropriate interval. In addition, a resin scattering layer 25 is formed on the inner surface of the lower substrate 1 located in the vicinity of the left and right peripheral edge portions of the data line 32 and on the inner surface of the data line 32. For this reason, the data line 32 is covered with the resin scattering layer 25. Further, the pixel electrode 10 is formed for each subpixel SG on the inner surface of the lower substrate 1, and the left and right peripheral portions of the pixel electrode 10 are formed on the inner surfaces of the left and right peripheral portions of the resin scattering layer 25. ing. For this reason, the pixel electrode 10 and the data line 32 are insulated by the resin scattering layer 25. The other components formed or mounted on the lower substrate 1 are the same as those in FIG.

  On the other hand, colored layers 6R, 6G, and 6B are formed for each sub-pixel region SG at a position on the inner surface of the upper substrate 2 and facing the pixel electrode 10. A black light-shielding layer BM is formed at a position between the sub-pixel regions SG and facing the data line 32. An overcoat layer 18 made of acrylic resin or the like is formed on the inner surfaces of the colored layer 6 and the black light shielding layer BM. A scanning electrode 8 is formed on the inner surface of the overcoat layer 18. The other components formed on the upper substrate 2 are the same as those in FIG.

  When the transmissive display is performed in the liquid crystal display device 100 of the present invention, the illumination light emitted from the backlight 15 travels along the path T shown in FIG. 3 and passes through the pixel electrode 10 and the colored layer 6 and the like. To the observer. In this case, the illumination light has a predetermined hue and brightness by passing through the colored layer 6. Thus, a desired color display image is visually recognized by the observer.

  Next, with reference to FIG. 1, FIG. 4, and FIG. 5, the configuration of the electrodes and wirings of the element substrate 91 and the color filter substrate 92 of the present invention will be described. FIG. 4 is a plan view showing configurations of electrodes and wirings of the element substrate 91 when the element substrate 91 is observed from the front direction (that is, the upper side in FIGS. 2 and 3). FIG. 5 is a plan view showing the configuration of the electrodes of the color filter substrate 92 when the color filter substrate 92 is observed from the front direction (that is, the lower side in FIGS. 2 and 3). 4 and 5, other elements other than the electrodes and wiring are not shown for convenience of explanation.

  In FIG. 1, a region where the pixel electrode 10 of the element substrate 91 and the scanning electrode 8 of the color filter substrate 92 intersect constitute a sub-pixel region SG which is the minimum unit of display. An area in which a plurality of sub-pixel areas SG are arranged in a matrix in the vertical direction and the horizontal direction in the drawing is an effective display area V (area surrounded by a two-dot chain line). In the effective display area V, images such as letters, numbers, and figures are displayed. 1 and 4, a region defined by the outer periphery of the liquid crystal display device 100 and the effective display region V is a frame region 38 that does not contribute to image display.

(Electrode and wiring configuration)
First, with reference to FIG. 4, the structure of the electrode of the element substrate 91 and wiring will be described. The element substrate 91 includes a TFD element 21, a pixel electrode 10, a plurality of scanning lines 31, a plurality of data lines 32, a Y driver IC 33, an X driver IC 34, a plurality of external connection terminals 35, the reflective layer 5, and the conductive film 9. ing.

  On the projecting region 36 of the element substrate 91, a Y driver IC 33 and an X driver IC 34 are mounted via, for example, an ACF (Anisotropic Conductive Film). In FIG. 4, the direction from the side 91a on the projecting region 36 side of the element substrate 91 to the side 91c on the opposite side is the Y direction, and the direction from the side 91d to the side 91b is the X direction.

  A plurality of external connection terminals 35 are formed on the overhang region 36. Each input terminal (not shown) of the Y driver IC 33 and the X driver IC 34 is connected to the plurality of external connection terminals 35 through conductive bumps. The external connection terminal 35 is connected to a wiring board (not shown) such as a flexible printed board via ACF or solder. Thereby, for example, signals and power are supplied to the liquid crystal display device 100 from an electronic device such as a mobile phone or an information terminal.

  The output terminal (not shown) of the X driver IC 34 is connected to the plurality of data lines 32 through conductive bumps. On the other hand, the output terminal (not shown) of each Y driver IC 33 is connected to the plurality of scanning lines 31 via conductive bumps. Thus, each Y driver IC 33 outputs a scanning signal to the plurality of scanning lines 31, and the X driver IC 34 outputs a data signal to the plurality of data lines 32.

  The plurality of data lines 32 are linear wirings extending in the vertical direction on the paper surface, and are formed in the Y direction from the overhanging area 36 to the effective display area V. Each data line 32 is formed at regular intervals. Each data line 32 is electrically connected to a plurality of TFD elements 21 at appropriate intervals, and each TFD element 21 has a light-shielding conductive film 28 having a function as a contact portion (see FIG. 7). And the corresponding pixel electrode 10 is electrically connected.

  The plurality of scanning lines 31 are configured to include a main line portion 31a, a bent portion 31b that is bent substantially at right angles to the main line portion 31a, and a connection portion 31x on the terminal end side of the bent portion 31b. Each main line portion 31 a is formed in the Y direction from the projecting region 36 in the frame region 38. Each main line portion 31a is formed substantially parallel to each data line 32 and at a predetermined interval. Each bent portion 31 b extends to the inside of the seal member 3 located on the left and right in the frame region 38. The connection portion 31 x (rectangular region) is electrically connected to the connection portion 5 x of the reflective layer 5 within the seal member 3.

  The reflective layer 5 has a substantially stripe shape. That is, the reflective layer 5 extends in the same direction as the scanning electrode 8 extends, and is substantially parallel to the scanning electrode 8. The reflective layer 5 extends so as to cross each reflective display region E1 (see FIG. 9 and the like) of the plurality of pixel electrodes 10 that are arranged in a row in the extending direction of the scanning electrodes 8. The left end portion (connecting portion 5x) of one reflecting layer 5 and the right end portion (connecting portion 5x) of the reflecting layer 5 adjacent to the one reflecting layer 5 in the Y direction have substantially the same area as the connecting portion 31x. And is electrically connected to the connection part 31x of the scanning line 31 and the conductive film 9 in the vertical conduction part, that is, in the seal member 3. Each conductive film 9 has substantially the same area as the connection portion 31 x and is electrically connected to the conduction member 7 in the vertical conduction portion, that is, the seal member 3.

  Next, the configuration of the electrodes of the color filter substrate 92 will be described. As shown in FIG. 5, stripe-shaped scanning electrodes 8 extending in the X direction are formed on the color filter substrate 92. The left end or right end of each scanning electrode 8 extends into the seal member 3, and the corresponding right end or left end of each scanning electrode 8 extends to the boundary between the effective display region V and the frame region 38. is doing. Further, the left end portion or the right end portion of each scanning electrode 8 is electrically connected to the conductive member 7 mixed in the seal member 3 as shown in FIGS. 1 and 5.

  FIG. 1 shows a state where the color filter substrate 92 and the element substrate 91 described above are bonded together via the seal member 3. As shown in the figure, each scanning electrode 8 of the color filter substrate 92 is orthogonal to each data line 32 of the element substrate 91 and overlaps the plurality of pixel electrodes 10 forming a row in a plane. Thus, the region where the scanning electrode 8 and the pixel electrode 10 overlap constitutes the sub-pixel region SG.

  Further, the scanning electrode 8 of the color filter substrate 92 (that is, the scanning line on the color filter substrate 92 side) and the scanning line 31 of the element substrate 91 alternately overlap between the left side and the right side as shown in the figure. The scanning electrode 8 and the scanning line 31 are vertically conductive through the vertical conductive portion, that is, the connection portion 5x of the reflective layer 5 in the seal member 3, the conductive film 9, and the conductive member 7. That is, conduction between each scanning line of the color filter substrate 92 as the scanning electrode 8 and each scanning line 31 of the element substrate 91 is alternately realized between the left side and the right side as shown in the figure. Further, the conduction between each reflection layer 5 of the element substrate 91 and each scanning line 31 is realized alternately between the left side and the right side. As a result, the scanning electrodes 8 of the color filter substrate 92 and the reflection layer 5 of the element substrate 91 are electrically connected to the Y driver ICs 33 located on the left and right sides of the paper via the scanning lines 31 of the element substrate 91 and the like. Has been.

(Equivalent circuit configuration)
Next, the electrical configuration of the liquid crystal display device 100, that is, the configuration of an equivalent circuit will be described with reference to FIG. FIG. 6 is a block diagram showing an equivalent circuit of the liquid crystal display device 100. As shown in FIG. 6, in the liquid crystal display device 100, a plurality of scanning lines 31 and scanning electrodes 8 (hereinafter simply referred to as “scanning lines” for convenience) are formed extending in the vertical direction on the paper surface. A plurality of data lines 32 are formed extending in the horizontal direction of the drawing. One subpixel region SG is formed corresponding to each intersection of the scanning line and the data line 32. In the liquid crystal display device 100, the reflective layer 5 (auxiliary capacitance electrode) is formed to extend in the same direction as the scanning line.

In each sub-pixel region SG, the capacitor C _TFD of the TFD element 21 and the capacitor C _LC (pixel capacitor C _LC ) of the pixel electrode 10 are connected in series. Each pixel capacitor _CLC has a configuration in which the liquid crystal layer 4 is sandwiched between the scanning line and the pixel electrode 10. In each sub-pixel region SG, an auxiliary capacitor C _OVC that characterizes the present invention is formed. Each auxiliary capacitor C _OVC has a configuration in which an overcoat layer 26 is sandwiched between the reflective layer 5 and the pixel electrode 10 described above. In the sub-pixel region SG, the pixel capacitor _CLC and the auxiliary capacitor C _OVC are connected in parallel. The TFD element 21 has one end connected to the data line 32 and the other end connected to the pixel electrode 10 via a light-shielding conductive film 28 (not shown). On / off is controlled according to the potential difference.

  The Y driver IC 33 is responsible for driving the scanning lines and the reflective layer 5. That is, the Y driver IC 33 sequentially selects one scanning line and one reflective layer 5 one by one in one vertical scanning period, and a scanning signal of a selection voltage is supplied to the selected scanning line and reflective layer 5. On the other hand, the scanning signal of the non-selection voltage is supplied to the other non-selection scanning lines and the reflection layer 5.

  The X driver IC 34 supplies a data signal corresponding to the display content to the scanning line selected by the Y driver IC 33 and the pixel electrode 10 located on the reflection layer 5 through the corresponding data line 32. It is.

  The current value of the TFD element 21 changes based on the potential difference applied to the scanning line and the data line 32, and the liquid crystal layer 4 is charged / discharged. As a result, the display state of the liquid crystal layer 4, that is, the non-display state or The intermediate display state is switched. Thereby, the display operation of the liquid crystal layer 4 is controlled.

(Configuration of element substrate)
Next, the configuration of the element substrate 91 having the auxiliary capacitance of the present invention will be described with reference to FIGS. FIG. 7 is a partial plan view showing a layout for one pixel in the element substrate 91 when observed from above in FIGS. 2 and 3. In FIG. 7, the area between the data lines 32 and the area facing the scanning electrode 8 on the color filter substrate 92 side is a sub-pixel area SG (area surrounded by a one-dot chain line). . The sub-pixel area SG includes a reflective display area E1, a light shielding area E3, and a transmissive display area E2. The reflective display area E1 is an area where reflective display is performed, and is a rectangular area having a length W1 in the Y direction and a length W2 in the X direction. The light shielding area E3 is an area that does not contribute to image display, and is a rectangular area having a length W4 in the Y direction and a length W2 in the X direction. The light shielding region E3 further includes a rectangular contact region E4 having a length W5 in the Y direction and a length W2 in the X direction. The transmissive display area E2 is an area for performing transmissive display, and is an area having a length W3 in the Y direction and a length W2 in the X direction.

  In FIG. 7, linear data lines 32 are formed on the lower substrate 1 in the Y direction at appropriate intervals. A TFD element 21 is formed in the reflective display area E1 on the lower substrate 1. A rectangular light-shielding conductive film 28 made of a material such as chromium is formed in the light-shielding region E3 on the lower substrate 1. The light-shielding conductive film 28 mainly functions to prevent light leakage from occurring in the resin scattering layer 25 and the overcoat layer 26 formed in a tapered shape thereon. The data line 32, the TFD element 21, and the light-shielding conductive film 28 are electrically connected.

  Here, with reference to FIG. 8A, configurations of the data line 32, the TFD element 21, and the light-shielding conductive film 28 will be described. FIG. 8A is a cross-sectional view taken along the cutting line X1-X2 in FIG. In FIG. 8A, the elements formed on the inner surfaces of the data line 32, the TFD element 21, and the light-shielding conductive film 28, and the elements formed or mounted on the outer surface of the lower substrate 1 are illustrated for convenience. Is omitted.

As shown in FIG. 8A, the TFD element 21 includes a first TFD element 21a and a second TFD element 21b. The first TFD element 21a and the second TFD element 21b are formed by anodizing the island-shaped first metal film 322 made of TaW (tantalum tungsten) and the surface of the first metal film 322. An insulating film 323 made of Ta ₂ O ₅ or the like and second metal films 316 and 336 formed on the surface and spaced apart from each other are included. Among these, the second metal films 316 and 336 are formed by patterning the same conductive film such as chromium, and the former second metal film 316 is branched from the data line 32 in a T shape. On the other hand, the latter second metal film 336 is electrically connected to the light-shielding conductive film 28.

  Here, among the TFD elements 21, the first TFD element 21 a becomes the second metal film 316 / insulating film 323 / first metal film 322 in order when viewed from the data line 32 side. Due to the body / metal structure, the current-voltage characteristics are nonlinear in both positive and negative directions. On the other hand, when viewed from the data line 32 side, the second TFD element 21b becomes a first metal film 322 / insulating film 323 / second metal film 336 in the order opposite to the first TFD element 21a. The structure of For this reason, the current-voltage characteristics of the second TFD element 21b are obtained by making the current-voltage characteristics of the first TFD element 21a point-symmetric with respect to the origin. As a result, the TFD element 21 has a shape in which two TFDs are connected in series in opposite directions. Therefore, the current-voltage nonlinear characteristic is symmetric in both positive and negative directions compared to the case of using one element. become. As described above, the data line 32, the TFD element 21, and the light-shielding conductive film 28 are electrically connected.

  In FIG. 8A, a part of the second metal film 336 of the TFD element 21 and the light-shielding conductive film 28 are both formed on the lower substrate 1, and they are in the same layer. Instead, in the present invention, as shown in FIG. 8B, the light-shielding conductive film 28 and the second metal film 336 of the TFD element 21 may be configured as separate layers. . That is, as shown in FIG. 8B, the light-shielding conductive film 28 is formed on a part of the second metal film 336 of the TFD element 21 and on the lower substrate 1 in the vicinity thereof to form the light-shielding conductive film. A part of the film 28 may be configured to overlap a part of the second metal film 336. Here, according to the configuration of FIG. 8A, the second metal film 336 and the light-shielding conductive film 28 of the TFD element 21 can be manufactured in the same manufacturing process, whereas FIG. According to the configuration, after forming the second metal film 336 of the TFD element 21 on the lower substrate 1, it is necessary to form the light-shielding conductive film 28 in a subsequent process. Therefore, it can be said that the former configuration is more preferable than the latter configuration in terms of reducing man-hours.

  Returning to the plan view of FIG. 7, various elements are formed on the lower substrate 1, the data line 32, the TFD element 21, the light-shielding conductive film 28, and the like. The laminated structure will be described with reference to a cross-sectional view. FIG. 9 is a cross-sectional view taken along the cutting line X3-X4 in FIG. 7, specifically, a cross-sectional view when the pixel electrode 10 in one sub-pixel region SG is cut in the Y direction. 9 also shows a cross-sectional view of the color filter substrate 92 disposed to face the element substrate 91 for convenience of explanation.

  A phase difference plate 13, a polarizing plate 14, and a backlight 15 are disposed on the outer surface of the lower substrate 1. On the other hand, a TFD element 21, a light-shielding conductive film 28, a resin scattering layer 25, and a pixel electrode 10 are formed on the inner surface of the lower substrate 1.

  Specifically, a TFD element 21 is formed in the reflective display region E1 on the lower substrate 1. A light-shielding conductive film 28 is formed in the light-shielding region E3 on the lower substrate 1. On the lower substrate 1 corresponding to the black light-shielding layer BM, on the lower substrate 1 and the TFD element 21 corresponding to the reflective display region E1, and on a part of the light-shielding conductive film 28, a fine surface is formed. A resin scattering layer 25 in which various irregularities are formed is formed. At least the peripheral edge of the resin scattering layer 25 located on the light-shielding conductive film 28 is formed in a tapered shape. In order to keep the liquid crystal layer 4 in the reflective display region E1 at a constant thickness D1, the resin scattering layer 25 is preferably set to a thickness of about 1 to 2 μm. In the reflective display region E1 on the resin scattering layer 25, the reflective layer 5 reflecting the fine irregularities of the resin scattering layer 25 is formed. For this reason, when performing reflective display, the reflected light is made uniform because the external light is reflected in a state of being appropriately scattered by the uneven shape. In addition, the reflective layer 5 extends from the front side of the paper in FIG. 9 to the back side of the paper. That is, as shown in FIG. 7, the reflective layer 5 is formed so as to extend in the same direction as the scanning electrode 8 extends, and more preferably to extend substantially parallel to the scanning electrode 8. Has been. An overcoat layer 26 is formed on the resin scattering layer 25 and the reflective layer 5 and on a part of the region of the light-shielding conductive film 28. In order to keep the liquid crystal layer 4 in the reflective display region E1 at a constant thickness D1, the overcoat layer 26 is preferably set to a thickness of about 0.5 to 2.5 μm. At least the peripheral portion of the overcoat layer 26 located on the light-shielding conductive film 28 is formed in a tapered shape. Note that the other part of the light-shielding conductive film 28 on the transmissive display region E2 side, that is, the contact region E4 is a region for connection to the pixel electrode 10, and therefore the light-shielding conductive film corresponding to the contact region E4. On 28, the resin scattering layer 25 and the overcoat layer 26 are not formed.

  The pixel electrode 10 is formed in the sub-pixel region SG. Specifically, the pixel electrode 10 is formed on the lower substrate 1 corresponding to the transmissive display region E2, the light-shielding conductive film 28 corresponding to the contact region E4, and the overcoat layer 26 corresponding to a part of the light-shielding region E3. And on the overcoat layer 26 corresponding to the reflective display region E1. Therefore, the pixel electrode 10 is electrically connected to the light-shielding conductive film 28 having conductivity such as chromium in the contact region E4. Thereby, the pixel electrode 10 is electrically connected to the data line 32 and the TFD element 21 via the light-shielding conductive film 28.

In the element substrate 91 having such a configuration, an auxiliary capacitor C _OVC having the overcoat layer 26 as a dielectric is formed between the reflective layer 5 and the pixel electrode 10, and between the pixel electrode 10 and the scan electrode 8. A pixel capacitor C _LC using the liquid crystal layer 4 as a dielectric is formed.

  Next, the configuration of one subpixel SG on the element substrate 91, the configuration of the color filter substrate 92 facing the subpixel SG, and the positional relationship between the elements will be described.

  A phase difference plate 11 and a polarizing plate 12 are disposed on the outer surface of the upper substrate 2. On the other hand, a colored layer 6 and a black light shielding layer BM are formed on the inner surface of the upper substrate 2. Specifically, the colored layer 6 is formed at a position corresponding to the pixel electrode 10. The black light shielding layer BM is formed around the pixel electrode 10, in other words, between the adjacent sub pixel regions SG. An overcoat layer 18 is formed on the inner surfaces of the colored layer 6 and the black light shielding layer BM, and a scanning electrode 8 is formed on the inner surface of the overcoat layer 18. Photo spacers 27 are formed on the inner surface of the scanning electrode 8 corresponding to the reflective display region E1.

  In a state where the element substrate 91 and the color filter substrate 92 are bonded together via the seal member 3 (see FIGS. 2 and 3, not shown), the liquid crystal layer 4 has a certain thickness by the photo spacer 27. Is held in. Specifically, the liquid crystal layer 4 is held at a constant thickness D1 in the reflective display region E1, and the liquid crystal layer 4 is held at a constant thickness D2 (> D1) in the transmissive display region E2. As a result, a multi-gap is formed.

  In one sub-pixel region SG having the above configuration, transmissive display is performed in the transmissive display region E2, and reflective display is performed in the reflective display region E1. However, since the light-shielding conductive film 28 is formed of chromium or the like having a light-shielding property, display is not performed in the light-shielding region E3 where the light-shielding conductive film 28 is formed. In general, in a region where the resin scattering layer 25 and the overcoat layer 26 are formed in a tapered shape such as the light shielding region E3, there is a possibility that light leakage may occur due to liquid crystal alignment abnormality. In this respect, in this embodiment, since the portion having such a tapered shape is disposed on the light-shielding conductive film 28, there is an advantage that light leakage can be prevented. In general, the end portion of the reflective layer 5 is easily peeled off. However, in this embodiment, the reflective layer 5 is covered with the overcoat layer 26, so that the end portion of the reflective layer 5 is prevented from peeling off. You can also.

  Returning to the plan view of FIG. 7, the laminated structure of the cross section taken along the cutting line X5-X6 will be described with reference to FIG. FIG. 10 shows a cross-sectional configuration near the data line 32.

  Data lines 32 are formed on the inner surface of the lower substrate 1. A resin scattering layer 25 is formed on the data line 32 and on the lower substrate 1 near the left and right peripheral edges. For this reason, the data line 32 is covered with the resin scattering layer 25. On the left and right peripheral portions of the resin scattering layer 25 formed in such a region, the left peripheral portion of one pixel electrode 10a and the right peripheral portion of the adjacent pixel electrode 10b with the data line 32 interposed therebetween are formed. ing. For this reason, the pixel electrodes 10 a and 10 b are insulated from the data line 32 through the resin scattering layer 25.

  Next, the function and effect of the liquid crystal display device 100 of the present invention will be described with reference to the appropriate drawings.

  In particular, in the liquid crystal display device 100 of the present invention, in the element substrate 91, the reflective layer 5 is formed so as to extend in the same direction as the direction in which the scanning electrode 8 of the color filter substrate 92 extends. An overcoat layer 26 for forming a multi-gap is formed on 5. In this embodiment, in the vertical conduction part, that is, in the seal member 3, the connection part 5 x formed at the right end part or the left end part of the reflective layer 5 and the scanning line electrode 8 are connected to the conductive film 9 and the conduction member 7. Is electrically connected. In the present embodiment, the connection portion 5x and the scan electrode 8 are electrically connected to the scan line 31 connected to the Y driver IC 33.

Therefore, when the liquid crystal display device 100 of the present invention is driven, the same potential can be applied to the reflective layer 5 and the scan electrode 8 from the Y driver IC 33 side via the scan line 31 and the like. Thereby, an auxiliary capacitor C _OVC using the overcoat layer 26 as a dielectric is formed between the pixel electrode 10 and the reflective layer 5. That is, the reflective layer 5 has a function as an auxiliary capacitance electrode. Therefore, in the liquid crystal display device 100, since the auxiliary capacitance _{C OVC} is added to the pixel capacitance _{C LC,} which makes it possible to substantially increase the pixel capacitance _{C LC.} Here, the size of the auxiliary capacitor C _OVC with respect to the pixel capacitor C _LC is appropriately changed based on, for example, the general capacitance equation, for example, the area of the reflective layer 5 and the dielectric constant and thickness of the overcoat layer 26. Can be adjusted. Thereby, according to various forms and design specifications of the liquid crystal display device 100, the pixel capacitance _CLC and the auxiliary capacitance C _OVC can be set in a desired relationship, respectively.

  By the way, in recent liquid crystal display devices having a high-definition panel, measures such as using a liquid crystal having a high dielectric constant or reducing a cell gap are taken in order to obtain a desired display image. However, in a liquid crystal display device using a liquid crystal having a high dielectric constant, a display defect called so-called burn-in may occur if the same image is continuously displayed.

In this regard, in the liquid crystal display device 100 of the present invention, the partial auxiliary capacitance C _OVC in the pixel capacitor C _LC as described above is added, the pixel capacitance C _LC becomes substantially larger. Therefore, in the liquid crystal display device 100, according to design specifications, without reducing the total capacitance of the storage capacitor C _OVC pixel capacitance C _LC, to reduce the pixel capacitance C _LC by changing the allocation of both be able to. In other words, in the liquid crystal display device 100, a liquid crystal having a low dielectric constant can be used, or the cell gap can be increased. As a result, display defects such as burn-in can be prevented, and the yield can be improved.

Further, in a general liquid crystal display device, the auxiliary capacitor is formed using a chromium film or a tantalum film having a light shielding property. On the other hand, in the liquid crystal display device 100 of the present invention, the auxiliary capacitance C _OVC is formed in the transparent overcoat layer 26 located between the pixel electrode 10 having transparency and the reflective layer 5. . Therefore, the position, that is, the reflective display area E1 does not become a non-display area, and the reflective display can be appropriately performed in the reflective display area E1. Thereby, the fall of an aperture ratio can be prevented.

  Furthermore, the liquid crystal display device 100 of the present invention also has the following effects.

  First, as a comparative example, in a liquid crystal display device having an element substrate in which a colored layer is formed on a reflective layer, external light incident on the liquid crystal display device proceeds along the following path during reflective display. . External light incident on the liquid crystal display device passes through the region where the colored layer or the like is formed, is reflected by the reflective layer formed thereunder, and passes through the colored layer or the like again to reach the observer. . However, in such a liquid crystal display device, when the external light travels along such a path, the reflectance decreases due to the influence of the refractive index of the colored layer (in other words, the light extraction efficiency deteriorates). ) And the like, a phenomenon in which reflection characteristics such as reflection contrast deteriorates occurs.

  On the other hand, in the liquid crystal display device 100 of the present invention, the reflective layer 5 is formed on the element substrate 91 side, the colored layer 6 is formed on the opposite color filter substrate 92 side, and the reflective layer 5 and the colored layer 6 are formed. Separated configuration. For this reason, when the reflective display is performed in the liquid crystal display device 100, even if the external light travels along the path R shown in FIG. 2, the change in the refractive index of the light due to the colored layer 6 is small, and the reflectance decreases. Can be prevented. Therefore, it is possible to improve reflection characteristics such as reflection contrast.

  In the liquid crystal display device 100 of the present invention, as shown in FIGS. 2, 3, 9, and 10, the pixel electrode 10, the data line 32, and the like are included in the resin scattering layer 25 in the element substrate 91. Insulated. In other words, the element substrate 91 has a so-called overlayer structure. Therefore, it is possible to prevent a parasitic capacitance from being generated between the data line 32 and the pixel electrode 10, and it is possible to prevent the occurrence of vertical crosstalk. Further, with the above structure, the pixel electrode can be formed in a state where the left and right peripheral edge portions of the pixel electrode 10 are as close as possible to the data lines 32 adjacent thereto. Therefore, the aperture ratio can be improved.

  As a comparative example, in a liquid crystal display device having a so-called overlayer structure, generally, a contact hole is formed in an insulating layer (corresponding to the resin scattering layer 25 or the overcoat layer 26 of the present invention), and the position of the contact hole is The pixel electrode is electrically connected to the data line and the TFD element. In such a liquid crystal display device, the aperture ratio is reduced by the area where the contact hole is formed.

  On the other hand, in the liquid crystal display device 100 of the present invention, as shown in FIG. 9, the light-shielding region E3 (multi-gap) of the resin scattering layer 25 and the overcoat layer 26 formed in a tapered shape, particularly in the element substrate 91. The pixel electrode 10 and the contact region E4 (the region E4 of the light-shielding conductive film 28) are connected by effectively using the taper-light-shielding region, whereby the pixel electrode 10, the data line 32, and the TFD element 21 are connected. Are connected electrically. Therefore, the aperture ratio can be improved by the amount that the contact hole is not formed as described above.

  Further, as a comparative example, in a liquid crystal display device having a TFD element, in general, a part of a pixel electrode region is removed, a TFD element is disposed in the part, and the pixel electrode and the data line are connected via the TFD element. The structure which connects electrically is employ | adopted.

  On the other hand, in the liquid crystal display device 100 of the present invention, as shown in FIG. 9, the TFD element 21 is formed at a position overlapping the reflective layer 5 on the element substrate 91. Therefore, it is not necessary to remove part of the region of the pixel electrode 10 as described above, and the aperture ratio can be improved accordingly.

  Further, in the liquid crystal display device 100 of the present invention, in the element substrate 91, the light-shielding property is provided below the light-shielding region E3 (multi-gap taper-light-shielding region) of the resin scattering layer 25 and the overcoat layer 26 formed in a tapered shape. A conductive film 28 is formed. As a result, it is possible to prevent light leakage from occurring in the light shielding region E3, and a high-quality display image can be obtained.

  Further, in the liquid crystal display device 100 of the present invention, the light-shielding conductive film 28 formed in the light-shielding region E3 is formed of chromium or the like having a low reflectance instead of aluminum having a high reflectance. Therefore, when a reflective display is performed, the amount of light reflected by the light-shielding conductive film 28 can be suppressed, and a high-quality display image can be obtained.

  Further, in the liquid crystal display device 100 of the present invention, the resin scattering layer 25 and the overcoat layer 26 are formed in the reflective display region E1, and these elements are not formed in the transmissive display region E2, thereby corresponding to the reflective display region E1. The liquid crystal layer 4 is set to a constant thickness D1, while the liquid crystal layer 4 corresponding to the transmissive display region E2 is set to a constant thickness D2 (> D1). That is, the liquid crystal display device 100 of the present invention has a multi-gap structure in which the thickness of the liquid crystal layer corresponding to the reflective display region E1 and the thickness of the liquid crystal layer corresponding to the transmissive display region E2 are optimally set. Therefore, a high-quality display image can be obtained in both the transmissive display and the reflective display.

[Method of manufacturing liquid crystal display device]
Next, with reference to FIG. 11 thru | or FIG. 21, etc., the manufacturing method of the liquid crystal display device 100 of this invention is demonstrated. FIG. 11 shows a flowchart of a manufacturing method of the liquid crystal display device 100.

  First, the color filter substrate 92 shown in FIGS. 2, 3 and 5 is manufactured by a known method (step S1). In step S1, when the panel structure of the liquid crystal display device 100 is completed, a photo spacer is formed by a known method at a position on the scan electrode 8 corresponding to the reflective display region E1 (broken line portion).

  Next, the element substrate 91 is manufactured (step S2). FIG. 12 is a flowchart showing a method for manufacturing an element substrate. FIGS. 13 to 15 and FIGS. 16 to 21 are plan views corresponding to steps P1 to P5 in FIG. 12, respectively. 15 is a plan view corresponding to FIG. 7, and therefore, in the manufacturing process of FIGS. 13 to 15, refer to FIG. 9 and the like as appropriate in order to grasp the corresponding cross-sectional configuration. In FIGS. 14 and 15, the reflective display area E1, the transmissive display area E2, the light-shielding area E3, and the contact area E4 are omitted for convenience. For the positional relationship of these areas, refer to FIG. 13 as appropriate. I want to be. FIGS. 16A to 21A are partial plan views showing manufacturing steps in the vicinity of the broken line region E30 in FIG. 16 (b) to 21 (b) are partial cross-sectional views corresponding to the respective manufacturing steps of FIGS. 16 (a) to 21 (a), and show the manufacturing steps near the broken line region E31 in FIG. It is a fragmentary sectional view. 16 to 20, the region surrounded by the alternate long and short dash line indicates a region 3x where the seal member 3 is to be formed (seal member formation scheduled region 3x), and a two-point difference in the plan view of FIG. In the area surrounded by the line or the cross-sectional view of FIG.

  A method for manufacturing the element substrate 91 will be described.

  First, the data line 32, the TFD element 21, the light-shielding conductive film 28, and the scanning line 31 are formed on the lower substrate 1 made of a material such as glass or plastic (process P1). Specifically, as shown in FIG. 13A, each data line 32 is formed on the lower substrate 1 so as to extend in the Y direction at an appropriate interval. Each TFD element 21 is formed on the lower substrate 1 corresponding to the reflective display region E1. Each light-shielding conductive film 28 is formed on the lower substrate 1 corresponding to a region between the transmissive display region E2 (broken line portion) and the reflective display region E1, that is, the light-shielding region E3 (broken line portion). FIG. 13A shows a state in which the data line 32, the TFD element 21 and the light-shielding conductive film 28 are formed on the lower substrate 1.

  Further, as shown in FIG. 16, the main line portion 31a of each scanning line 31 is formed on the lower substrate 1 corresponding to the frame region 38 so as to extend in the Y direction at an appropriate interval. The bent portion 31b of each scanning line 31 is formed so as to extend in the X direction from the terminal portion of the corresponding main line portion 31a. The connection portion 31x of each scanning line 31 is formed from the terminal portion of the corresponding bent portion 31 to the seal member formation scheduled region 3x. In order to ensure vertical connection between the connection portion 31x and other elements in the seal member 3, the connection portion 31x is formed in, for example, a substantially rectangular shape so as to have a certain area. Here, the main line portion 31a, the bent portion 31b, and the connection portion 31x are simultaneously formed in the process P1. FIG. 16 shows a state in which the scanning line 31 including the main line portion 31a, the bent portion 31b, and the connection portion 31x is formed on the lower substrate 1.

  Next, the resin scattering layer 25 is formed in a region inside the seal member formation planned region 3x (step P2). Specifically, as shown in FIGS. 13B and 17, the upper substrate 1, the main line portion 31 a and the bent portion 31 b of the scanning line 31, the data line 32, the TFD element 21, and the light-shielding conductive film 28. In addition, a photosensitive acrylic resin or the like is applied to a uniform thickness, for example, about 1 to 2 μm, and then exposed, developed, and patterned to form a large number of fine irregularities on the surface, The resin layer applied on part of the transmissive display area E2 and the light shielding area E3 is removed. At this time, the peripheral portion of the resin scattering layer 25 is formed in a tapered shape, and at least the resin scattering layer 25 formed in the contact region E4 (hatched region) of the light-shielding conductive film 28 is removed. FIG. 13B and FIG. 17 show a state where the resin scattering layer 25 is formed.

  Next, the reflective layer 5 is formed (process P3). Specifically, as shown in FIGS. 14A and 18, a metal such as aluminum, an aluminum alloy, or a silver alloy is deposited or sputtered on the connection portion 31 x of each scanning line 31 and the resin scattering layer 25. A substantially striped reflective layer 5 is formed by forming a thin film by a method or the like and patterning the thin film by a photolithography method. Thereby, each reflective layer 5 is formed so as to cross each reflective display region E1 of the plurality of pixel electrodes 10 in a row in the X direction (see also FIGS. 1 and 2). Further, the connection portion 5x (right end portion or left end portion) of each reflective layer 5 is formed so as to overlap the connection portion 31x in the seal member formation scheduled region 3x. Thereby, the connection part 31x of each scanning line 31 and the connection part 5x of each corresponding reflective layer 5 are electrically connected. In addition, fine irregularities of the resin scattering layer 25 are reflected on the surface of the reflective layer 5. FIG. 14A shows a state in which the reflective layer 5 is formed on the resin scattering layer 25 corresponding to the reflective display region E1, and FIG. 18 shows the state on the connection portion 31x of each scanning line 31. A state in which the connection portion 5x of the reflective layer 5 is formed so as to overlap is shown.

Next, the overcoat layer 26 is formed in a region inside the seal member formation scheduled region 3x (step P4). Specifically, a photosensitive acrylic resin or the like is formed on the light-shielding conductive film 28 excluding the contact region E4 and on the reflective layer 5 excluding the resin scattering layer 25 and the connection portion 5x corresponding to the reflective display region E1. After the insulating film is applied to a uniform thickness, it is exposed and developed into a predetermined pattern and patterned to form the overcoat layer 26. At this time, the peripheral edge portion of the overcoat layer 26 is formed in a tapered shape. As the material of the overcoat layer 26, for example, an insulating material having a dielectric constant of about 3 is preferably used. Further, by forming the overcoat layer 26 on the reflective layer 5 excluding the connection portion 5x, it is possible to prevent problems such as peeling off of the edge of the reflective layer 5 in the manufacturing process. Further, the following effects can be obtained by forming the overcoat layer 26 to a predetermined thickness. First, a desired multigap can be formed together with the resin scattering layer 25. That is, when the panel structure of the liquid crystal display device 100 is completed, the thickness of the liquid crystal layer corresponding to the reflective display region E1 is set to be a predetermined thickness smaller than the thickness of the liquid crystal layer corresponding to the transmissive display region E2. be able to. Further, the auxiliary capacitance C _OVC formed between the reflective layer 5 and the overcoat layer 26 can be set to a desired size. FIG. 14B and FIG. 19 show a state in which the overcoat layer 26 is formed on the reflective layer 5 and the like.

  Next, the pixel electrode 10 and the conductive film 9 are formed (process P5). Specifically, in the sub-pixel region SG, specifically on the lower substrate corresponding to the transmissive display region E2, on the light-shielding conductive film 28 corresponding to the contact region E4, corresponding to the light-shielding region E3 and the reflective display region E1. A transparent electrode made of ITO or the like is formed into a thin film by sputtering or the like on the overcoat layer 26 and the connection portion 5x of each reflective layer 5, and this is patterned by photolithography. Thereby, the substantially rectangular pixel electrode 10 is formed in each sub-pixel region SG, and the conductive film 9 is formed on the connection portion 5x of each reflective layer 5. The former electrically connects the pixel electrode 10 and the light-shielding conductive film 28 in the contact region E4, and the latter electrically connects the connection portion 5x of the reflective layer 5 and the conductive film 9. Note that the conductive film 9 is substantially the same as the connection part 31x of the scanning line 31 and the connection part 5x of the reflective layer 5 in order to ensure vertical conduction between the conductive film 9 and other elements in the seal member 3. It is preferable to form so that it may have an area. 15 and 20 show a state in which the pixel electrode 10 is formed in each sub-pixel region SG, and the conductive film 9 is formed on the connection portion 5x of each reflective layer 5.

  Next, other components, specifically, the phase difference plate 13, the polarizing plate 14, the backlight 15 and the like are mounted (process P6). Thus, the element substrate 91 shown in FIGS. 2 to 4 is manufactured.

  Returning to FIG. 11, the element substrate 91 and the color filter substrate 92 are bonded to each other via the seal member 3 in which the plurality of conductive members 7 are mixed, and then the panel structure is configured. Thereafter, the seal member 3 is not illustrated. Liquid crystal is injected from the opening, and the opening is sealed with a sealing material such as an ultraviolet curable resin (step S3). For example, a liquid crystal material having a dielectric constant of about 6 is preferably used. In this way, the element substrate 91 and the color filter substrate 92 are bonded together so as to have a substantially prescribed substrate interval (that is, a cell gap). That is, as a result, as shown in FIGS. 2, 3 and 9, the thickness of the liquid crystal layer 4 corresponding to the transmissive display area E2 is D2, and the thickness of the liquid crystal layer 4 corresponding to the reflective display area E1 is Each is set to D1 (<D2), and a multi-gap is formed. Further, as shown in FIG. 21, the scanning electrode 8 of the color filter substrate 92 and the scanning line 31 of the element substrate 91 are connected to the conductive member 7, the conductive film 9, the connecting portion 5 x of the reflective layer 5, and the scanning in the seal member 3. It is electrically connected via the connection part 31x of the line 31.

  Next, by attaching other components (step S4), the liquid crystal display device 100 shown in FIGS. 1 to 3 is completed.

[Modification]
In the above embodiment, the example using the TFD (thin film diode) element 21 as the active element has been described, but the application of the present invention is not limited to this. That is, the present invention can use an amorphous TFT as another example of the active element instead of the TFD element 21. FIG. 22A shows a cross-sectional view of the amorphous TFT. FIG. 22B is an enlarged cross-sectional view of a broken line region E10 in FIG. 9 when an amorphous TFT is applied to the present invention.

In FIG. 22A, a TFT 450 is provided with a gate insulating film 403 on a gate electrode 402 branched from a gate line (not shown) so as to cover it. An a-Si layer 405 is provided on the gate insulating film 403 so as to overlap the gate electrode 402. On the a-Si layer 405, n ⁺ -a-Si layers 406a and 406b divided into two are provided. ^Further, a source electrode 408 branched from the source lines (not shown) on the n + -a-Si layer 406a is ^provided, the drain electrode 409 is provided on the n + -a-Si layer 406b. A light-shielding conductive film 28 is provided on the drain electrode 409 so as to partially overlap.

  As shown in FIG. 22B, the present invention can also be applied to a connection portion between the drain electrode 409 of the above amorphous TFT and the light-shielding conductive film 28 as an active element. Accordingly, the TFT 450 is electrically connected to the pixel electrode 10 and the data line 32 through the light-shielding conductive film 28.

  In the above embodiment, the conductive film 9 made of ITO is formed on the connection portion 5x of the reflective layer 5 made of aluminum or the like, and the connection portion 5x and the conductive film 9 are vertically connected. did. Instead of this, in the present invention, in order to further improve the vertical conduction between the connection portion 5x and the conductive film 9, an interlayer film having conductivity between the connection portion 5x of the reflective layer 5 and the conductive film 9, For example, molybdenum tungsten or the like may be interposed. In the present invention, in order to achieve the object, instead, the conductive film 9 is formed of a material that does not easily react with the reflective layer 5, for example, IZO, or conversely, the reflective layer 5 reacts with the conductive film 9. You may make it form with the material which is hard to do.

In the above embodiment, the scanning electrode 8 and the reflective layer 5 are electrically connected via the conducting member 7 in the seal member 3, and the same signal or the like is applied to both from the Y driver IC 33. The auxiliary capacity C _OVC is formed in the overcoat layer 26. The present invention is not limited to this. In the present invention, the scanning electrode 8 and the reflective layer 5 are not connected, and the Y driver IC 33, another driver IC (not shown), or a power supply IC (not shown) is directly connected to the reflective layer 5. The auxiliary capacitance C _OVC may be formed in the overcoat layer 26 by applying a signal.

  In the above embodiment, the resin scattering layer 25 and the overcoat layer 26 are formed on the TFD element 21 (or TFT 450) and the conductive film 8. However, the present invention is not limited to this. The resin scattering layer 25 and the overcoat layer 26 may not be formed on 21 (or TFT 450) and the conductive film 8. For example, in the present invention, the TFD element 21 (or TFT 450) and the conductive film 6 are formed on the lower substrate 1 corresponding to the transmissive display region E2, and both are electrically connected to the pixel electrode 10. It doesn't matter.

[Electronics]
Next, an embodiment in which the liquid crystal display device 100 according to the present invention is used as a display device of an electronic apparatus will be described.

  FIG. 23 is a schematic configuration diagram showing the overall configuration of the present embodiment. The electronic apparatus shown here includes the liquid crystal display device 100 and a control unit 410 that controls the liquid crystal display device 100. Here, the liquid crystal display device 100 is conceptually divided into a panel structure 403 and a drive circuit 402 composed of a semiconductor IC or the like. Further, the control means 410 includes a display information output source 411, a display information processing circuit 412, a power supply circuit 413, and a timing generator 414.

  The display information output source 411 includes a memory such as a ROM (Read Only Memory) or a RAM (Random Access Memory), a storage unit such as a magnetic recording disk or an optical recording disk, and a tuning circuit that tunes and outputs a digital image signal. The display information is supplied to the display information processing circuit 412 in the form of an image signal of a predetermined format based on various clock signals generated by the timing generator 414.

  The display information processing circuit 412 includes various well-known circuits such as a serial-parallel conversion circuit, an amplification / inversion circuit, a rotation circuit, a gamma correction circuit, and a clamp circuit, and executes processing of input display information to obtain image information. Are supplied to the drive circuit 402 together with the clock signal CLK. The driving circuit 402 includes a scanning line driving circuit, a data line driving circuit, and an inspection circuit. The power supply circuit 413 supplies a predetermined voltage to each of the above-described components.

  Next, specific examples of electronic devices to which the liquid crystal display device 100 according to the present invention can be applied will be described with reference to FIG.

  First, an example in which the liquid crystal display device 100 according to the present invention is applied to a display unit of a portable personal computer (so-called notebook personal computer) will be described. FIG. 24A is a perspective view showing the configuration of this personal computer. As shown in the figure, the personal computer 710 includes a main body 712 having a keyboard 711 and a display 713 to which the liquid crystal display panel according to the present invention is applied.

  Next, an example in which the liquid crystal display device 100 according to the present invention is applied to a display unit of a mobile phone will be described. FIG. 24B is a perspective view showing the configuration of this mobile phone. As shown in the figure, the cellular phone 720 includes a plurality of operation buttons 721, a reception port 722, a transmission port 723, and a display unit 724 to which the liquid crystal display device 100 according to the present invention is applied.

  Electronic devices to which the liquid crystal display device 100 according to the present invention can be applied include a liquid crystal television, a viewfinder, in addition to the personal computer shown in FIG. 24A and the cellular phone shown in FIG. Type / monitor direct-view type video tape recorder, car navigation device, pager, electronic notebook, calculator, word processor, workstation, videophone, POS terminal, digital still camera, etc.

  Further, the present invention is not limited to a liquid crystal display device, but also an electroluminescence device, an organic electroluminescence device, a plasma display device, an electrophoretic display device, and a device using an electron-emitting device (Field Emission Display and Surface-Conduction Electron-Emitter Display). The present invention can be similarly applied to various electro-optical devices such as the above.

FIG. 3 is a plan view showing a configuration of electrodes and wirings of the liquid crystal display device of the present invention. Sectional drawing corresponding to the reflective display area | region of the liquid crystal display device of this invention. Sectional drawing corresponding to the transmissive display area | region of the liquid crystal display device of this invention. The top view which shows the structure of the electrode of the element substrate of this invention, wiring, etc. FIG. The top view which shows the structure of the electrode of the color filter substrate of this invention. 1 is a block diagram showing an equivalent circuit of a liquid crystal display device of the present invention. The partial top view which shows the layout of the some pixel electrode etc. in an element substrate. The expanded sectional view which shows the structure of the TFD element formed in the element substrate. FIG. 5 is a cross-sectional view of one subpixel including a reflective display area, a transmissive display area, and the like. FIG. 3 is a cross-sectional view near the data line on the element substrate. 3 is a flowchart showing a method for manufacturing a liquid crystal display device of the present invention. The flowchart which shows the manufacturing method of the element substrate of this invention. The top view corresponding to each manufacturing process of the element substrate in FIG. The top view corresponding to each manufacturing process of the element substrate in FIG. The top view corresponding to each manufacturing process of the element substrate in FIG. The top view and sectional drawing corresponding to each manufacturing process of the element substrate in FIG. The top view and sectional drawing corresponding to each manufacturing process of the element substrate in FIG. The top view and sectional drawing corresponding to each manufacturing process of the element substrate in FIG. The top view and sectional drawing corresponding to each manufacturing process of the element substrate in FIG. The top view and sectional drawing corresponding to each manufacturing process of the element substrate in FIG. The top view and sectional drawing corresponding to each manufacturing process of the element substrate in FIG. An application example to a liquid crystal display device using a TFT element will be described. 1 is a circuit block diagram of an electronic apparatus to which a liquid crystal display device of the present invention is applied. 6 shows examples of electronic devices to which the liquid crystal display device of the present invention is applied.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 Lower substrate, 2 Upper substrate, 3 Seal member, 5 Reflective layer, 6 Colored layer, 7 Conductive member, 8 Scan electrode, 9 Conductive film, 10 Pixel electrode, 21 TFD element, 25 Resin scattering layer, 26 Overcoat layer , 27 photo spacer, 31 scanning line, 5x, 31x connecting part, 32 data line, 91 element substrate, 92 color filter substrate, 100 liquid crystal display device

Claims (15)

A liquid crystal device comprising a liquid crystal between an element substrate and a counter substrate,
The element substrate is
A signal line;
A switching element connected to the signal line;
A conductive film extending from the switching element;
An insulating layer covering at least a part of the signal line;
A first capacitance electrode comprising a reflective layer provided on the insulating layer and reflecting light incident on the liquid crystal;
A dielectric layer provided on the first capacitor electrode;
A second capacitor electrode formed on the dielectric layer and made of a pixel electrode connected to the conductive film,
The liquid crystal device, wherein the first capacitor electrode overlaps the second capacitor electrode in a plan view. The counter substrate is provided with a scanning line,
The liquid crystal device according to claim 1, wherein the scanning line is connected to the first capacitor electrode. A liquid crystal device comprising a liquid crystal between an element substrate and a counter substrate,
The element substrate is
Signal lines and scanning lines;
Switching elements provided corresponding to the intersections of the signal lines and the scanning lines;
A conductive film extending from the switching element;
An insulating layer covering at least a part of the signal line or the scanning line;
A first capacitance electrode comprising a reflective layer provided on the insulating layer and reflecting light incident on the liquid crystal;
A dielectric layer provided on the first capacitor electrode;
A second capacitor electrode formed on the dielectric layer and made of a pixel electrode connected to the conductive film,
The liquid crystal device, wherein the first capacitor electrode overlaps the second capacitor electrode in a plan view. The counter substrate is provided with a counter electrode,
The liquid crystal device according to claim 3, wherein the counter electrode is connected to the first capacitor electrode. A liquid crystal device comprising an element substrate having wiring and a counter substrate having scan electrodes, and having a liquid crystal between the element substrate and the counter substrate,
The element substrate is
A switching element;
A conductive film connected to the switching element;
An insulating layer formed so as to cover a part of the conductive film and the switching element;
A first capacitance electrode formed on a part of the insulating layer and made of a reflective layer that reflects light incident on the liquid crystal;
A dielectric layer formed to cover a part of the conductive film, the insulating layer and the reflective layer;
A second capacitor electrode made of a pixel electrode formed on the dielectric layer,
The pixel electrode is connected to a contact portion that is not covered by the insulating layer and the dielectric layer of the conductive film,
The reflective layer extends in the same direction as the scanning electrode extends, and one end side of the reflective layer is electrically connected to the wiring and the scanning electrode at a vertical conduction portion,
The liquid crystal device, wherein the first capacitor electrode overlaps the second capacitor electrode in a plan view. The element substrate has a transmission region at a position adjacent to the reflection region in which the reflection layer is formed in the sub-pixel region,
The liquid crystal device according to claim 1, wherein the pixel electrode is formed in the transmission region.   The liquid crystal device according to claim 6, wherein the insulating layer is a scattering layer that forms irregularities on the reflective layer.   The liquid crystal according to claim 6, wherein the dielectric layer is a liquid crystal layer thickness adjusting layer that changes a layer thickness of the liquid crystal corresponding to the reflective region and a layer thickness of the liquid crystal corresponding to the transmissive region. apparatus. The vertical conduction part has a conduction member,
The liquid crystal device according to claim 5, wherein the reflective layer and the scan electrode are electrically connected via the conductive member.   The liquid crystal device according to claim 9, wherein another conductive film is provided between the conductive member and the reflective layer.   The liquid crystal device according to claim 10, further comprising an interlayer film having conductivity between the reflective layer and the other conductive film.   The liquid crystal device according to claim 5, wherein the reflective layer is formed substantially parallel to the scan electrode. Each of the pixel electrodes is formed in the sub-pixel region,
The sub-pixel region has a reflective region and a transmissive region,
6. The liquid crystal device according to claim 5, wherein the reflective layer extends so as to cross each reflective region of the plurality of pixel electrodes forming a column in the extending direction of the scan electrodes.   The liquid crystal device according to claim 5, further comprising a drive circuit that applies the same potential to the reflective layer and the scan electrode through the wiring.   An electronic apparatus comprising the liquid crystal device according to claim 1 as a display unit.

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