JP2006156528A - Semiconductor device - Google Patents

Semiconductor device Download PDF

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Publication number
JP2006156528A
JP2006156528A JP2004341667A JP2004341667A JP2006156528A JP 2006156528 A JP2006156528 A JP 2006156528A JP 2004341667 A JP2004341667 A JP 2004341667A JP 2004341667 A JP2004341667 A JP 2004341667A JP 2006156528 A JP2006156528 A JP 2006156528A
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lid
semiconductor element
semiconductor device
recess
bonding material
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Japanese (ja)
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Takeshi Hasegawa
剛 長谷川
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Kyocera Corp
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Kyocera Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Abstract

<P>PROBLEM TO BE SOLVED: To provide a semiconductor device that is improved in the reliability of hermetically sealing by improving the parallelism of a lid to an insulating substrate and, at the same time, can prevent deposition of contamination to the utmost in a process, even when, for example, an optical semiconductor element is housed and can accurately receive light by preventing the occurrence of flaws and chips in a translucent lid when the lid is the translucent lid. <P>SOLUTION: The semiconductor device 9 is provided with the insulating substrate 1 having a recess 1a for housing a semiconductor element 3 on its top surface and, at the same time, first and second steps 1b and 1c sequentially formed from the inside of the recess 1a to the outside so that the heights of the steps 1b and 1c may become higher sequentially, wiring conductors 2 formed from the internal surface of the recess 1a to at least either the side face or bottom surface of the insulating substrate 1, and the semiconductor element 3 placed on the bottom face of the recess 1a and having electrodes 4 electrically connected to the wiring conductors 2. The semiconductor device 9 is also provided with the lid 5 arranged on the first step 1b. The insulating substrate 1 and lid 5 are bonded to each other with a bonding material 7 packed between the second step 1c and the side face of the lid 5. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、半導体素子収納用パッケージに半導体素子を収納し、蓋体により気密封止して成る半導体装置に関する。   The present invention relates to a semiconductor device in which a semiconductor element is accommodated in a semiconductor element accommodation package and hermetically sealed with a lid.

CPU(中央処理装置)やメモリ等に使用される半導体集積回路素子、フォトダイオード(PD),ラインセンサ,イメージセンサ等の受光素子である光半導体素子またはこれらの受光部を有する光半導体素子等の半導体素子を気密に収納するための半導体素子収納用パッケージは、半導体素子を収容するための凹部が上面に形成された絶縁基体と、絶縁基体の凹部の内側から外側に導出された配線導体とを具備した構造を有している。   Semiconductor integrated circuit elements used in CPUs (Central Processing Units), memories, etc., optical semiconductor elements that are light receiving elements such as photodiodes (PD), line sensors, image sensors, or optical semiconductor elements having these light receiving portions A package for housing a semiconductor element for housing a semiconductor element in an airtight manner includes an insulating base having a recess formed on the top surface for storing the semiconductor element, and a wiring conductor led out from the inside of the recess of the insulating base. It has a built-in structure.

半導体素子は絶縁基体の凹部の底面に載置され接着されており、半導体素子の上面外周部に電極が設けられている。半導体素子の電極と上記配線導体のうち凹部の内面に露出した部位とは、Au,Al等からなるボンディングワイヤにより電気的に接続される。   The semiconductor element is mounted and bonded to the bottom surface of the recess of the insulating base, and an electrode is provided on the outer periphery of the upper surface of the semiconductor element. The electrode of the semiconductor element and the portion of the wiring conductor exposed at the inner surface of the recess are electrically connected by a bonding wire made of Au, Al or the like.

また、セラミック、金属(Fe−Ni−Co合金や銅合金等)、ガラス、有機樹脂等から成る蓋体が絶縁基体の上面にエポキシ樹脂等の樹脂からなる接合材を介して接着固定されて凹部を塞ぐ形になっており、これによって絶縁基体と蓋体とで形成される容器の内部に半導体素子が気密封止される。   In addition, a lid made of ceramic, metal (Fe—Ni—Co alloy, copper alloy, etc.), glass, organic resin or the like is bonded and fixed to the upper surface of the insulating substrate via a bonding material made of resin such as epoxy resin, and the concave portion. As a result, the semiconductor element is hermetically sealed inside the container formed by the insulating base and the lid.

このように従来の半導体装置は、蓋体によって、半導体装置の内部空間にゴミなどの異物が侵入するのを防止するとともに、半導体装置の内部空間を密閉空間とすることで、外部雰囲気の湿気が半導体装置内に侵入するのを防ぎ、半導体素子の耐久性を向上させている。   As described above, the conventional semiconductor device prevents foreign matters such as dust from entering the internal space of the semiconductor device by the lid, and makes the internal space of the semiconductor device a sealed space, so that moisture in the external atmosphere can be prevented. Intrusion into the semiconductor device is prevented and the durability of the semiconductor element is improved.

なお、配線導体のうち凹部の外側に導出された部位は、外部接続用の導体として機能する。   Note that a portion of the wiring conductor led out to the outside of the recess functions as a conductor for external connection.

そして、例えば半導体素子として光半導体素子を用いる場合、蓋体は透光性材料により形成され、かかる透光性蓋体を介して外部の光が光半導体素子の受光面で受光されると、もに光半導体素子で電気信号に変換される。この電気信号は、配線導体、および配線導体と電気的に接続された外部の電気回路を経由して、半導体装置の外部に配置された各種の機器や素子などに送られる。   For example, when an optical semiconductor element is used as the semiconductor element, the lid is formed of a translucent material, and external light is received by the light receiving surface of the optical semiconductor element via the translucent lid. It is converted into an electrical signal by an optical semiconductor element. This electric signal is sent to various devices and elements arranged outside the semiconductor device via a wiring conductor and an external electric circuit electrically connected to the wiring conductor.

また、蓋体を絶縁基体に対して取着させるには、例えば、接合材として熱硬化性樹脂を用いるような場合、絶縁基体の凹部に半導体素子を収容した後、絶縁基体の上面の外周部に未硬化の樹脂を塗布するとともに、この樹脂を間に挟んで蓋体の下面と絶縁基体の上面とを位置決めセットし、樹脂を効果させることにより行なわれる。
特開2004−71938号公報
In order to attach the lid to the insulating substrate, for example, when a thermosetting resin is used as the bonding material, after the semiconductor element is accommodated in the recess of the insulating substrate, the outer peripheral portion of the upper surface of the insulating substrate An uncured resin is applied to the substrate, and the lower surface of the lid body and the upper surface of the insulating base are positioned and set with the resin interposed therebetween to effect the resin.
JP 2004-71938 A

しかしながら、このような従来の半導体装置においては、蓋体と絶縁基体との間に接合材が介在し、接合材の高さを一定に維持することが難しいことから、次のような不具合が生じるという問題があった。すなわち、絶縁基体に対して蓋体が傾いて取着されたり、接合材の厚さが部分的にばらついたりすることに起因して、蓋体の絶縁基体に対する接合強度がばらつき、蓋体の絶縁基体に対する接合の信頼性が低くなって気密封止の信頼性が劣化してしまう。   However, in such a conventional semiconductor device, since the bonding material is interposed between the lid and the insulating base and it is difficult to maintain the height of the bonding material constant, the following problems occur. There was a problem. That is, the bonding strength of the lid body to the insulating base varies due to the lid body being tilted and attached to the insulating base body, or the thickness of the bonding material partially varying, so that the lid body is insulated. The reliability of bonding to the substrate is lowered, and the reliability of hermetic sealing is deteriorated.

また、例えば半導体素子が光半導体素子である場合、蓋体が傾いた結果、光半導体素子の受光面と透光性の蓋体との間の距離がばらつき、受光面に入射する外部の光に歪が生じ、正確に受光させることができなくなってしまう。   For example, when the semiconductor element is an optical semiconductor element, the distance between the light receiving surface of the optical semiconductor element and the translucent cover varies as a result of the tilting of the lid, and external light incident on the light receiving surface is reflected. Distortion occurs and it becomes impossible to receive light accurately.

また、絶縁基体の凹部に半導体素子を収容した後、蓋体を絶縁基体に接合して凹部を塞ぐまでの間に、凹部内に外部環境中の異物(塵埃、ミスト等)が入り込む場合があり、その異物が導電性の異物の場合に、半導体素子の電極や配線導体、半導体素子と配線導体とを接続するボンディングワイヤ等に付着して電気的短絡等の不具合を発生させるという問題があった。また、半導体素子が光半導体素子の場合には、光半導体素子の受光部に異物が付着することにより、光半導体素子の受光特性が劣化する。   In addition, foreign materials (dust, mist, etc.) in the external environment may enter the recesses after the semiconductor element is accommodated in the recesses of the insulating base and before the lid is joined to the insulating base and the recesses are closed. In the case where the foreign matter is a conductive foreign matter, there is a problem in that it adheres to the electrode of the semiconductor element, the wiring conductor, the bonding wire connecting the semiconductor element and the wiring conductor, etc., and causes a problem such as an electrical short circuit. . In addition, when the semiconductor element is an optical semiconductor element, foreign matter adheres to the light receiving portion of the optical semiconductor element, so that the light receiving characteristics of the optical semiconductor element deteriorate.

なお、上記異物の凹部内への入り込みは、半導体装置の製造工程において、蓋体による封止前、外観検査工程や、封止工程までの取り扱い(滞留、搬送、位置決め作業等)の際に、凹部が開放されていることに起因して生じる。   In addition, the entry of the foreign matter into the concave portion is, in the manufacturing process of the semiconductor device, prior to sealing with the lid, during the appearance inspection process, and handling up to the sealing process (retention, transport, positioning work, etc.) This is caused by the opening of the recess.

したがって、本発明は上記の問題に鑑みて完成されたものであり、その目的は、絶縁基体に対する蓋体の平行度が良好で、気密封止の信頼性や、例えば半導体素子が光半導体素子の場合の受光特性等の特性に優れるとともに凹部内への異物の入り込みが効果的に防止された半導体装置を提供することである。   Therefore, the present invention has been completed in view of the above problems, and its purpose is that the parallelism of the lid body with respect to the insulating base is good, the reliability of hermetic sealing, and for example, the semiconductor element is an optical semiconductor element. Another object of the present invention is to provide a semiconductor device that is excellent in light receiving characteristics and the like and in which foreign substances are effectively prevented from entering the recesses.

本発明の半導体装置は、上面に半導体素子が収容される凹部を形成するとともに該凹部の周囲に凹部の内側から外側に向かって漸次高さが高くなるように、第1の段差部および第2の段差部が順次形成されている絶縁基体と、前記凹部の内面から前記絶縁基体の側面および下面の少なくとも一方にかけて形成された配線導体と、前記凹部の底面に載置され、前記配線導体に電気的に接続される電極を有した半導体素子と、前記第1の段差部上に配置される蓋体とを具備した半導体装置であって、前記絶縁基体及び前記蓋体を、前記第2の段差部と前記蓋体の側面との間に充填される接合材を介して接合したことを特徴とするものである。   In the semiconductor device of the present invention, the first stepped portion and the second stepped portion are formed so as to form a concave portion in which the semiconductor element is accommodated on the upper surface and gradually increase in height from the inner side to the outer side of the concave portion. An insulating base on which the step portions are sequentially formed, a wiring conductor formed from the inner surface of the concave portion to at least one of the side surface and the lower surface of the insulating base, and a bottom surface of the concave portion. A semiconductor device comprising a semiconductor element having an electrode to be connected electrically, and a lid disposed on the first step portion, wherein the insulating base and the lid are connected to the second step. It joins via the joining material with which it fills between a part and the side surface of the said cover body.

また本発明の半導体装置は、前記接合材の上端が、前記絶縁基体の上面および前記蓋体の上面よりも上方に位置するように凸状に形成されていることを特徴とするものである。   In the semiconductor device of the present invention, the bonding material is formed in a convex shape so that the upper end of the bonding material is positioned above the upper surface of the insulating base and the upper surface of the lid.

さらに本発明の半導体装置は、前記接合材が紫外線硬化型樹脂を硬化させて成ることを特徴とするものである。   Furthermore, the semiconductor device of the present invention is characterized in that the bonding material is formed by curing an ultraviolet curable resin.

またさらに本発明の半導体装置は、前記接合材が前記第1の段差部の外方にのみ配置されていることを特徴とするものである。   Furthermore, the semiconductor device of the present invention is characterized in that the bonding material is disposed only outside the first step portion.

本発明の半導体装置は、上面に半導体素子が収容される凹部を形成するとともに凹部の周囲に凹部の内側から外側に向かって漸次高さが高くなるように、第1の段差部および第2の段差部が順次形成されている絶縁基体と、凹部の内面から絶縁基体の側面および下面の少なくとも一方にかけて形成された配線導体と、凹部の底面に載置され、配線導体に電気的に接続される電極を有した半導体素子と、第1の段差部上に配置される蓋体とを具備した半導体装置であって、絶縁基体及び蓋体を、第2の段差部と蓋体の側面との間に充填される接合材を介して接合するようにしたことから、絶縁基体の上面(第1の段差部の上面)と蓋体の下面との間に接合材が介在することはなく、接合材の厚さのバラツキに起因する蓋体の傾きを有効に防止することができ、絶縁基体に対する蓋体の平行度が良好な半導体装置を得ることが可能となる。例えば、半導体素子が光半導体素子の場合であれば、蓋体と光半導体素子の受光面との平行度に優れ、光半導体素子の受光部で外部からの入射光を正確に受光することが可能な、受光特性に優れた光半導体装置とすることができる。   In the semiconductor device of the present invention, the first stepped portion and the second stepped portion are formed so that a recess for accommodating the semiconductor element is formed on the upper surface, and the height gradually increases from the inside of the recess toward the outside around the recess. An insulating base in which stepped portions are sequentially formed, a wiring conductor formed from the inner surface of the recess to at least one of the side surface and the lower surface of the insulating base, and placed on the bottom surface of the concave and electrically connected to the wiring conductor A semiconductor device comprising a semiconductor element having an electrode and a lid disposed on a first step portion, wherein the insulating base and the lid are disposed between the second step portion and a side surface of the lid. Since the bonding material is filled via the bonding material, the bonding material does not intervene between the upper surface of the insulating base (the upper surface of the first stepped portion) and the lower surface of the lid. Effectively prevent the tilting of the lid due to variations in thickness Therefore, it is possible to obtain a semiconductor device in which the parallelism of the lid to the insulating substrate is good. For example, when the semiconductor element is an optical semiconductor element, the parallelism between the lid and the light receiving surface of the optical semiconductor element is excellent, and the incident light from the outside can be accurately received by the light receiving portion of the optical semiconductor element. In addition, an optical semiconductor device having excellent light receiving characteristics can be obtained.

また、絶縁基体及び蓋体を、第2の段差部と蓋体の側面との間に充填される接合材を介して強固に接合することができるので、気密封止の信頼性を良好に確保することができる。   In addition, since the insulating base and the lid can be firmly bonded via a bonding material filled between the second stepped portion and the side of the lid, the reliability of hermetic sealing is ensured well. can do.

さらに、蓋体を絶縁基体に接合材で接合する工程において、蓋体の下面にあらかじめ接合材を塗布することなく、蓋体を第1の段差部の上面に仮置きして凹部を塞いでおくことができるので、半導体装置の製造工程において、蓋体による封止前、外観検査工程や、封止工程までの取り扱い(滞留、搬送、位置決め作業等)の際に、異物が凹部内に入るのを防止することができる。そのため、異物が半導体素子等に付着して、半導体素子の電極間等の電気的短絡や、例えば半導体素子が光半導体素子の場合にその受光面に付着して受光特性を劣化させるといった不具合の発生も有効に防止される。   Further, in the step of bonding the lid body to the insulating base with the bonding material, the lid body is temporarily placed on the upper surface of the first step portion to block the concave portion without applying the bonding material to the lower surface of the lid body in advance. In the semiconductor device manufacturing process, foreign matter enters the recesses before sealing with the lid, during the appearance inspection process, and during the handling up to the sealing process (retention, transport, positioning work, etc.). Can be prevented. For this reason, foreign matter adheres to the semiconductor element, etc., causing an electrical short circuit between the electrodes of the semiconductor element or the like, for example, when the semiconductor element is an optical semiconductor element, it adheres to the light receiving surface and degrades the light receiving characteristics. Is also effectively prevented.

またさらに、蓋体がガラスから成る場合でも、ガラスの破片が剥離しやすいエッジ部が、第2の段差部と蓋体の側面に充填される接合材で被覆されることになるため、エッジ部でガラスの破片が剥離することを効果的に防止することができる。   Furthermore, even when the lid is made of glass, the edge portion where the glass fragments are easily peeled is covered with the bonding material filled in the second step portion and the side surface of the lid, so that the edge portion Thus, it is possible to effectively prevent the glass fragments from peeling off.

さらにまた本発明の半導体装置によれば、接合材の上端を、絶縁基体の上面および蓋体の上面よりも上方に位置するように凸状に形成することにより、蓋体を透光性のガラス等で形成する場合であっても、外部の装置等と接触しやすい蓋体の外周部分が接合材で保護されることとなり、光半導体装置の取り扱いの際に誤って蓋体にキズが付くのを有効に防止することができる。   Further, according to the semiconductor device of the present invention, the upper end of the bonding material is formed in a convex shape so as to be positioned above the upper surface of the insulating base and the upper surface of the lid, so that the lid is made of translucent glass. Even if it is formed by, etc., the outer peripheral part of the lid that is easy to come into contact with external devices etc. will be protected with a bonding material, and the lid will be accidentally scratched when handling the optical semiconductor device Can be effectively prevented.

またこの場合、蓋体上面の外周部を覆う接合材の上端部分が、蓋体の上面よりも高い位置にあることから、光半導体装置が外部の装置,治具等に接触するときには、まず蓋体の上面の外周部を覆う接合材の上端部分に接触するようになっており、これによっても蓋体の上面にキズが付くのを有効に防止することができる。   In this case, since the upper end portion of the bonding material covering the outer peripheral portion of the upper surface of the lid body is located higher than the upper surface of the lid body, when the optical semiconductor device comes into contact with an external device, jig, etc., first the lid The upper end portion of the bonding material covering the outer peripheral portion of the upper surface of the body is brought into contact with the upper surface of the body, and this can effectively prevent the upper surface of the lid from being scratched.

さらにまた本発明の半導体装置によれば、紫外線硬化型樹脂を硬化させて接合材とすることより、半導体素子、および絶縁基体に余計な熱履歴を付加させることがなく、半導体素子の信頼性低下を有効に防止することができ、半導体素子と絶縁基体の接着、及び接続信頼性の低下も有効に防止することができる。   Furthermore, according to the semiconductor device of the present invention, since the ultraviolet curable resin is cured to form a bonding material, the semiconductor element and the insulating base are not added with an excessive heat history, and the reliability of the semiconductor element is reduced. It is possible to effectively prevent the adhesion of the semiconductor element and the insulating base and the deterioration of the connection reliability.

またさらに本発明の半導体装置によれば、接合材を第1の段差部の外方にのみ配置させておくことにより、接合材の蓋体の中央部への広がりをなくすことができる。したがって、半導体素子として光半導体素子を用いた上、蓋体を透光性材料で形成する場合に、接合材により外光の受光を阻害されることが殆どなく、受光特性をさらに向上させることができる。   Furthermore, according to the semiconductor device of the present invention, by disposing the bonding material only outside the first step portion, it is possible to eliminate the bonding material from spreading to the center of the lid. Therefore, when an optical semiconductor element is used as the semiconductor element and the lid is formed of a light-transmitting material, the bonding material hardly interferes with the reception of external light, and the light receiving characteristics can be further improved. it can.

以下、本発明を添付図面に基づいて詳細に説明する。図1は本発明の半導体装置の実施の形態の一例を示す断面図であり、図1において、1は絶縁基体、2は配線導体、3は半導体素子、5は蓋体、7は接合材である。この絶縁基体1、配線導体2、半導体素子3、蓋体5および接合材7により、半導体装置9が主に構成されている。   Hereinafter, the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a sectional view showing an example of an embodiment of a semiconductor device of the present invention. In FIG. 1, 1 is an insulating substrate, 2 is a wiring conductor, 3 is a semiconductor element, 5 is a lid, and 7 is a bonding material. is there. A semiconductor device 9 is mainly composed of the insulating base 1, the wiring conductor 2, the semiconductor element 3, the lid 5 and the bonding material 7.

絶縁基体1の上面に形成された凹部1aには半導体素子3が収容され、凹部1aの底面に接着剤6により接合される。   The semiconductor element 3 is accommodated in the recess 1 a formed on the upper surface of the insulating substrate 1, and is bonded to the bottom surface of the recess 1 a by the adhesive 6.

半導体素子3は、CPU(中央処理装置)やメモリ等に使用される半導体集積回路素子、フォトダイオード(PD),ラインセンサ,イメージセンサ等の受光素子である光半導体素子またはこれらの受光部を有する光半導体素子等である。   The semiconductor element 3 includes a semiconductor integrated circuit element used in a CPU (central processing unit), a memory, and the like, an optical semiconductor element that is a light receiving element such as a photodiode (PD), a line sensor, and an image sensor, or a light receiving portion thereof. An optical semiconductor element or the like.

かかる半導体素子3は、例えば光半導体素子の場合、上面の中央部に受光部が設けられ、また上面の外周部には信号の入出力用の電極が設けられている。   For example, in the case of an optical semiconductor element, the semiconductor element 3 is provided with a light receiving portion at the center of the upper surface and an electrode for signal input / output at the outer peripheral portion of the upper surface.

また、絶縁基体1は、アルミナセラミックス,窒化アルミニウムセラミックス,炭化珪素セラミックス,窒化珪素セラミックス,ガラスセラミックス等のセラミックス等からなり、平板状の底板部の上面の外周部に別体の枠状の側壁部が設けられているか、または絶縁基体1の底板部と側壁部とは一体的に形成されていてもよい。これらの底板部と側壁部とにより、絶縁基体1の上面には、半導体素子3を収容するための凹部1aが形成されている。   The insulating substrate 1 is made of ceramics such as alumina ceramics, aluminum nitride ceramics, silicon carbide ceramics, silicon nitride ceramics, glass ceramics, and the like, and a separate frame-shaped side wall portion on the outer peripheral portion of the upper surface of the flat plate-like bottom plate portion. May be provided, or the bottom plate portion and the side wall portion of the insulating substrate 1 may be integrally formed. The bottom plate portion and the side wall portion form a recess 1 a for housing the semiconductor element 3 on the upper surface of the insulating base 1.

このような絶縁基体1の凹部1aの内側から絶縁基体1の側面および下面に少なくとも一方にかけて配線導体2が形成されている。   A wiring conductor 2 is formed from the inside of the recess 1a of the insulating base 1 to at least one of the side surface and the lower surface of the insulating base 1.

配線導体2のうち凹部1aの内面に露出した部位が半導体素子3の電極にボンディングワイヤ8を介して接続されていることにより、凹部1aに収容された半導体素子3が、電極4、ボンディングワイヤ8および配線導体2を介して、凹部1aの外側に導出されている。この配線導体2の導出部分を外部電気回路に接続することにより、半導体素子3が外部電気回路に電気的に接続される。   The portion of the wiring conductor 2 exposed on the inner surface of the recess 1 a is connected to the electrode of the semiconductor element 3 via the bonding wire 8, so that the semiconductor element 3 accommodated in the recess 1 a is connected to the electrode 4 and the bonding wire 8. And, it is led out to the outside of the recess 1 a through the wiring conductor 2. By connecting the lead-out portion of the wiring conductor 2 to an external electric circuit, the semiconductor element 3 is electrically connected to the external electric circuit.

なお、配線導体2は、図1において凹部1aの内側面と底面との間に形成された段状部の上面で凹部1aの内面に露出しているが、凹部1aの底面で露出するようにしてもよい。   The wiring conductor 2 is exposed on the inner surface of the recess 1a on the top surface of the stepped portion formed between the inner surface and the bottom surface of the recess 1a in FIG. 1, but is exposed on the bottom surface of the recess 1a. May be.

上述した配線導体2は、タングステン,モリブデン,銅,銀等のメタライズ導体により形成されている。そして、配線導体2は、例えば絶縁基体1となるセラミックグリーンシート(以下、グリーンシートともいう)に予め所定のスルーホールを形成し、タングステン,モリブデン,銅,銀等の金属ペーストを、グリーンシートの表面や、スルーホールの内面に印刷塗布したり充填しておくことにより形成される。   The wiring conductor 2 described above is formed of a metallized conductor such as tungsten, molybdenum, copper, or silver. The wiring conductor 2 is formed with a predetermined through hole in advance in a ceramic green sheet (hereinafter also referred to as a green sheet) to be the insulating base 1, for example, and a metal paste such as tungsten, molybdenum, copper, or silver is used for the green sheet. It is formed by printing or filling the surface or the inner surface of the through hole.

そして、半導体素子3が収容されている凹部1aは蓋体5によって塞がれ、絶縁基体1と蓋体5とから成る容器の内部に半導体素子が気密に収納されて半導体装置9が構成される。   Then, the recess 1 a in which the semiconductor element 3 is accommodated is closed by the lid 5, and the semiconductor element is hermetically accommodated in a container made up of the insulating base 1 and the lid 5 to constitute the semiconductor device 9. .

蓋体5は、光学用ガラス、ソーダ石灰ガラス、鉛ガラス、ほうけい酸ガラス等のガラスや、アクリル樹脂、エポキシ樹脂、ポリイミド樹脂等の樹脂材料、酸化アルミニウム質焼結体,ガラスセラミック焼結体等のセラミック材料、鉄−ニッケル−コバルト合金,鉄−ニッケル合金等の金属材料により形成される。   The lid 5 is made of glass such as optical glass, soda lime glass, lead glass, borosilicate glass, resin materials such as acrylic resin, epoxy resin, polyimide resin, aluminum oxide sintered body, and glass ceramic sintered body. Or a metal material such as an iron-nickel-cobalt alloy or iron-nickel alloy.

また、蓋体5は、例えば半導体素子3が光半導体素子であれば、ガラスや樹脂等の透光性の材料で形成される。   The lid 5 is formed of a light-transmitting material such as glass or resin if the semiconductor element 3 is an optical semiconductor element, for example.

またさらに、上述した絶縁基体1の凹部1aの周囲には、凹部1aの内側から外側に向かって漸次高さが高くなるように、第1の段差部1bおよび第2の段差部1cが順次形成されている。   Furthermore, the first step portion 1b and the second step portion 1c are sequentially formed around the recess 1a of the insulating base 1 so that the height gradually increases from the inside to the outside of the recess 1a. Has been.

第1の段差部1bは、その上面に蓋体5が配置され、蓋体5を支持する機能を有する。   The first step portion 1b has a function of supporting the lid body 5 with the lid body 5 disposed on the upper surface thereof.

また、第2の段差部1cは、第1の段差部1c上に配置される蓋体5の側面との間に接合材7を充填させる機能を有し、その接合材7で蓋体5と絶縁基体1とが接合される。   In addition, the second step portion 1c has a function of filling the bonding material 7 between the side surface of the lid body 5 disposed on the first step portion 1c, and the bonding material 7 The insulating substrate 1 is joined.

上述した第1の段差部1bに蓋体5を搭載、位置決めし、その後、蓋体5の外周部の側面と絶縁基体1の第2の段差部1cで囲まれたスペースに接合材7を充填し、硬化等の所定の処理を施すことにより、接合材7を介して蓋体5の側面と絶縁基体1(第2の段差部1c)とが接合され、半導体素子3を搭載し収容した凹部1aが気密封止される。   The lid 5 is mounted and positioned on the first step portion 1b described above, and then the bonding material 7 is filled in the space surrounded by the side surface of the outer peripheral portion of the lid 5 and the second step portion 1c of the insulating base 1. Then, by applying a predetermined treatment such as curing, the side surface of the lid body 5 and the insulating base 1 (second stepped portion 1c) are bonded via the bonding material 7, and the recess in which the semiconductor element 3 is mounted and accommodated 1a is hermetically sealed.

また、接合材7としては、アクリル系樹脂,エポキシ系樹脂,シリコーン系樹脂,ポリエーテルアミド系樹脂等の樹脂材料や、AuSn、PbSn等の半田材や、低融点ガラス材等が用いられる。   As the bonding material 7, a resin material such as an acrylic resin, an epoxy resin, a silicone resin, or a polyetheramide resin, a solder material such as AuSn or PbSn, a low melting point glass material, or the like is used.

この接合材7には、半導体素子3が光半導体素子の場合、不要な外光の入射を遮断するために、黒色,茶褐色,暗緑色,濃青色等の暗色系の顔料や染料を混入させてもよい。   When the semiconductor element 3 is an optical semiconductor element, the bonding material 7 is mixed with dark pigments or dyes such as black, brown, dark green, and dark blue in order to block unnecessary external light. Also good.

なお、接合材7の充填については、例えば、未硬化の上記樹脂材料をディスペンス法やスクリーン印刷法等で塗布,充填することにより行なうことができる。   The bonding material 7 can be filled by, for example, applying and filling the uncured resin material by a dispensing method, a screen printing method, or the like.

この場合、第2の凹部1は、内側面を垂直な面とする必要はなく、内側や外側に傾斜した面としてもよい。例えば、第2の段差部1cの内側面を、上端から下端にかけて漸次内側に傾斜させた場合、接合材7の充填をより容易に行なうことができる。   In this case, the 2nd recessed part 1 does not need to make an inner surface a perpendicular | vertical surface, and is good also as a surface inclined inside or outside. For example, when the inner side surface of the second stepped portion 1c is gradually inclined inward from the upper end to the lower end, the bonding material 7 can be filled more easily.

また、第2の段差部1cの内側面を、上端から下端にかけて漸次外側に傾斜させた場合、接合材7の充填される容積をより大きく確保できるととともに、傾斜した内側に接合材が入り込むことによりアンカー効果を得ることができ、蓋体5の接合をより強固なものとすることができる。傾斜させる方向は、使用する接合材7や蓋体5の性質(蓋体5に対する接合材7の濡れやすさ、接合強度等)、蓋体5および第2の段差部1cの大きさ,形状、半導体装置に要求される特性等(気密封止の信頼性のレベルや、気密封止の作業性への要求等)に応じて適宜決定すればよい。   Further, when the inner side surface of the second step portion 1c is gradually inclined outward from the upper end to the lower end, a larger volume can be secured for the bonding material 7 and the bonding material enters the inclined inner side. Thus, the anchor effect can be obtained, and the joining of the lid 5 can be made stronger. The direction of inclination is the properties of the bonding material 7 and the lid 5 to be used (easiness of wetting of the bonding material 7 with respect to the lid 5, bonding strength, etc.), the size and shape of the lid 5 and the second stepped portion 1 c, What is necessary is just to determine suitably according to the characteristic etc. which are requested | required of a semiconductor device (The level of the reliability of airtight sealing, the request | requirement for workability of airtight sealing, etc.).

以上のような本形態の半導体装置9によれば、上述したように、第1の段差部1b上に蓋体5が配置され、絶縁基体1及び蓋体5を、第2の段差部1cと蓋体5の側面との間に充填される接合材7を介して接合するようにしたことから、絶縁基体1の上面(第1の段差部1bの上面)と蓋体5の下面との間に接合材7が介在されることはなく、接合材7の厚さのバラツキに起因する蓋体5の傾きを有効に防止することができ、絶縁基体1に対する蓋体5の平行度が良好な半導体装置9を得ることができる。例えば、半導体素子3が光半導体素子の場合、蓋体5と光半導体素子の受光面との平行度に優れ、光半導体素子の受光部で外部からの入射光を正確に受光することが可能な、受光特性に優れた光半導体装置が得られる。   According to the semiconductor device 9 of this embodiment as described above, as described above, the lid body 5 is disposed on the first step portion 1b, and the insulating base 1 and the lid body 5 are connected to the second step portion 1c. Since bonding is performed via the bonding material 7 filled between the side surfaces of the lid body 5, the gap between the upper surface of the insulating base 1 (the upper surface of the first step portion 1 b) and the lower surface of the lid body 5. In this case, the bonding material 7 is not interposed, and the inclination of the lid 5 due to the variation in the thickness of the bonding material 7 can be effectively prevented, and the parallelism of the lid 5 with respect to the insulating substrate 1 is good. The semiconductor device 9 can be obtained. For example, when the semiconductor element 3 is an optical semiconductor element, the parallelism between the lid 5 and the light receiving surface of the optical semiconductor element is excellent, and incident light from outside can be accurately received by the light receiving portion of the optical semiconductor element. An optical semiconductor device having excellent light receiving characteristics can be obtained.

また、絶縁基体1及び蓋体5を、第2の段差部1cと蓋体5の側面との間に充填される接合材7を介して強固に接合することができるので、気密封止の信頼性を良好に確保することができる。   In addition, since the insulating substrate 1 and the lid 5 can be firmly bonded via the bonding material 7 filled between the second stepped portion 1c and the side surface of the lid 5, the reliability of hermetic sealing is achieved. Good properties can be secured.

さらにこの場合、蓋体5を絶縁基体1に接合材7で接合する工程において、蓋体5の下面にあらかじめ接合材を塗布することなく、蓋体5を第1の段差部1bの上面に仮置きして凹部1aを塞いでおくことができるので、半導体装置9の製造工程において、蓋体5による封止前、外観検査工程や、封止工程までの取り扱い(滞留、搬送、位置決め作業等)の際に、異物が凹部1a内に入ることを防止できる。そのため、異物が半導体素子3等に付着して、半導体素子3の電極間等の電気的短絡や、例えば半導体素子3が光半導体素子の場合にその受光面に付着して受光特性を劣化させること等の不具合を防ぐことができる。   Further, in this case, in the step of bonding the lid 5 to the insulating base 1 with the bonding material 7, the lid 5 is temporarily applied to the upper surface of the first step portion 1 b without applying the bonding material to the lower surface of the lid 5 in advance. Since the recess 1a can be placed and closed, in the manufacturing process of the semiconductor device 9, before the sealing by the lid 5, the appearance inspection process, and the handling up to the sealing process (retention, transport, positioning work, etc.) In this case, foreign matter can be prevented from entering the recess 1a. For this reason, foreign matters adhere to the semiconductor element 3 or the like, and an electrical short circuit between the electrodes of the semiconductor element 3 or the like, for example, when the semiconductor element 3 is an optical semiconductor element, adhere to the light receiving surface and deteriorate light receiving characteristics. Etc. can be prevented.

また、本発明の半導体装置9は、接合材7の上端が、絶縁基体1の上面および蓋体5の上面よりも上方に位置するように凸状に形成されていることが好ましい。この場合、半導体素子3として光半導体素子を用いた上、蓋体5をガラス等の透光性材料で形成しても、蓋体のうち外部の装置等と接触しやすい外周部分が接合材7で保護されることになり、半導体装置9(光半導体装置)の取り扱いの際に誤って透光性蓋体にキズが付くのを有効に防止することができる。   The semiconductor device 9 of the present invention is preferably formed in a convex shape so that the upper end of the bonding material 7 is positioned above the upper surface of the insulating base 1 and the upper surface of the lid 5. In this case, even if an optical semiconductor element is used as the semiconductor element 3 and the lid 5 is formed of a light-transmitting material such as glass, the outer peripheral portion of the lid that is easily in contact with an external device or the like is the bonding material 7. Thus, it is possible to effectively prevent the transparent cover from being accidentally damaged when the semiconductor device 9 (optical semiconductor device) is handled.

さらに、蓋体の上面の外周部を覆う接合材7の上端部分が、透光性蓋体の上面よりも高い位置にあることから、光半導体装置が外部の装置,治具等に接触するときには、まず蓋体の上面の外周部を覆う接合材7の上端部分に接触するようになっており、これによってもガラス等から成る蓋体の上面にキズが付くのを有効に防止することができる。   Further, since the upper end portion of the bonding material 7 covering the outer peripheral portion of the upper surface of the lid body is at a position higher than the upper surface of the translucent lid body, when the optical semiconductor device comes into contact with an external device, jig, or the like First, it comes into contact with the upper end portion of the bonding material 7 covering the outer peripheral portion of the upper surface of the lid, and this can also effectively prevent the upper surface of the lid made of glass or the like from being scratched. .

また、上述した半導体装置9は、接合材7を紫外線硬化型樹脂を硬化させて形成するのが好ましい。この場合、半導体素子3、および絶縁基体1に余計な熱履歴を付加させることがなく、半導体素子3の信頼性低下を有効に防止することができ、半導体素子3と絶縁基体1の接着、及び接続信頼性の低下も有効に防止される。   In the semiconductor device 9 described above, it is preferable to form the bonding material 7 by curing an ultraviolet curable resin. In this case, an excessive heat history is not added to the semiconductor element 3 and the insulating base 1, and a decrease in the reliability of the semiconductor element 3 can be effectively prevented. A decrease in connection reliability is also effectively prevented.

また、上述した半導体装置は、接合材を第1の段差部の外方にのみ配置させておくことが好ましい。この場合、接合材7の蓋体5の中央部への広がりをなくすことができるため、半導体素子3として光半導体素子を用いた上、蓋体5を透光性材料で形成する場合であっても、接合材7により外光の受光を阻害されることが少なく、受光特性をさらに向上させることができる。   In the above-described semiconductor device, it is preferable that the bonding material is disposed only outside the first step portion. In this case, since it is possible to eliminate the spread of the bonding material 7 to the center portion of the lid body 5, an optical semiconductor element is used as the semiconductor element 3 and the lid body 5 is formed of a translucent material. However, the bonding material 7 is less likely to inhibit the reception of external light, and the light receiving characteristics can be further improved.

なお、本発明は上記実施の形態に限定されるものではなく、本発明の要旨を逸脱しない範囲内において種々の変更、改良等が可能である。   The present invention is not limited to the above-described embodiment, and various changes and improvements can be made without departing from the scope of the present invention.

本発明の半導体装置の実施の形態の一例を示す断面図である。It is sectional drawing which shows an example of embodiment of the semiconductor device of this invention.

符号の説明Explanation of symbols

1・・・絶縁基体
1a・・凹部
1b・・第1の段差部
1c・・第2の段差部
2・・・配線導体
3・・・半導体素子
4・・・電極
5・・・蓋体
6・・・接着剤
7・・・接合材
8・・・ボンディングワイヤ
9・・・半導体装置
DESCRIPTION OF SYMBOLS 1 ... Insulation base | substrate 1a .... Recessed part 1b .... 1st level | step difference part 1c .... 2nd level | step difference part 2 ... Wiring conductor 3 ... Semiconductor element 4 ... Electrode 5 ... Cover body 6 ... Adhesive 7 ... Joint material 8 ... Bonding wire 9 ... Semiconductor device

Claims (4)

上面に半導体素子が収容される凹部を形成するとともに該凹部の周囲に凹部の内側から外側に向かって漸次高さが高くなるように、第1の段差部および第2の段差部が順次形成されている絶縁基体と、
前記凹部の内面から前記絶縁基体の側面および下面の少なくとも一方にかけて形成された配線導体と、
前記凹部の底面に載置され、前記配線導体に電気的に接続される電極を有した半導体素子と、
前記第1の段差部上に配置される蓋体とを具備した半導体装置であって、
前記絶縁基体及び前記蓋体を、前記第2の段差部と前記蓋体の側面との間に充填される接合材を介して接合したことを特徴とする半導体装置。
A recess for accommodating a semiconductor element is formed on the upper surface, and a first step portion and a second step portion are sequentially formed around the recess so that the height gradually increases from the inside to the outside of the recess. An insulating substrate,
A wiring conductor formed from the inner surface of the recess to at least one of the side surface and the lower surface of the insulating base;
A semiconductor element mounted on the bottom surface of the recess and having an electrode electrically connected to the wiring conductor;
A semiconductor device comprising a lid disposed on the first step portion,
A semiconductor device characterized in that the insulating base and the lid are bonded via a bonding material filled between the second stepped portion and a side surface of the lid.
前記接合材の上端が、前記絶縁基体の上面および前記蓋体の上面よりも上方に位置するように凸状に形成されていることを特徴とする請求項1に記載の半導体装置。 2. The semiconductor device according to claim 1, wherein an upper end of the bonding material is formed in a convex shape so as to be positioned above the upper surface of the insulating base and the upper surface of the lid. 前記接合材が紫外線硬化型樹脂を硬化させて成ることを特徴とする請求項1または請求項2に記載の半導体装置。 The semiconductor device according to claim 1, wherein the bonding material is formed by curing an ultraviolet curable resin. 前記接合材が前記第1の段差部の外方にのみ配置されていることを特徴とする請求項1乃至請求項3のいずれかに記載の半導体装置。 The semiconductor device according to claim 1, wherein the bonding material is disposed only outside the first step portion.
JP2004341667A 2004-11-26 2004-11-26 Semiconductor device Pending JP2006156528A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010278176A (en) * 2009-05-28 2010-12-09 Ricoh Co Ltd Optical device, optical scanner, and image formation device
JP2017215352A (en) * 2016-05-30 2017-12-07 株式会社リコー Electronic component device and method of manufacturing the same, and light deflection device
US10141487B1 (en) 2017-05-26 2018-11-27 Shinko Electric Industries Co., Ltd. Cover for light emitter
KR20190115093A (en) * 2017-03-21 2019-10-10 발레오 샬터 운트 센소렌 게엠베아 Light emitting devices, optical sensing devices and automotive for optical sensing devices in automobiles with specific pre-assembled modules

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010278176A (en) * 2009-05-28 2010-12-09 Ricoh Co Ltd Optical device, optical scanner, and image formation device
JP2017215352A (en) * 2016-05-30 2017-12-07 株式会社リコー Electronic component device and method of manufacturing the same, and light deflection device
KR20190115093A (en) * 2017-03-21 2019-10-10 발레오 샬터 운트 센소렌 게엠베아 Light emitting devices, optical sensing devices and automotive for optical sensing devices in automobiles with specific pre-assembled modules
KR102262690B1 (en) * 2017-03-21 2021-06-10 발레오 샬터 운트 센소렌 게엠베아 Light emitting devices for optical sensing devices in automobiles, optical sensing devices and automobiles with specific pre-assembled modules
US10141487B1 (en) 2017-05-26 2018-11-27 Shinko Electric Industries Co., Ltd. Cover for light emitter
EP3407395A1 (en) 2017-05-26 2018-11-28 Shinko Electric Industries Co. Ltd. Cover for light emitter
JP2018200946A (en) * 2017-05-26 2018-12-20 新光電気工業株式会社 Lid for light-emitting device

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