JP2005210045A - Optical semiconductor device - Google Patents

Optical semiconductor device Download PDF

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Publication number
JP2005210045A
JP2005210045A JP2004087703A JP2004087703A JP2005210045A JP 2005210045 A JP2005210045 A JP 2005210045A JP 2004087703 A JP2004087703 A JP 2004087703A JP 2004087703 A JP2004087703 A JP 2004087703A JP 2005210045 A JP2005210045 A JP 2005210045A
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optical semiconductor
bonding material
semiconductor element
translucent lid
semiconductor device
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Takeshi Hasegawa
剛 長谷川
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Kyocera Corp
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Kyocera Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/30107Inductance

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  • Light Receiving Elements (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide an optical semiconductor device having a translucent lid and an insulating substrate that are firmly bonded with each other and superior air tightness of a hermetic space storing an optical semiconductor element, and capable of allowing the semiconductor element to receive outside light normally without causing distortion over a long period of time with high reliability. <P>SOLUTION: An optical semiconductor device 9 is provided with: an insulating substrate 1 having a recessed portion 1a for storing and mounting an optical semiconductor element 3 in an upper surface; a wiring conductor 2 led outside from the inside of the recessed portion 1a of the insulating substrate 1; the optical semiconductor element 3 that is mounted on the bottom surface of the recessed portion 1a of the insulating substrate 1 and having an electrode 4 connected with the wiring conductor 2 electrically; and a translucent lid 5 fitted onto the upper surface of the insulating substrate 1 through a bonding material 7 in such a manner as to close the recessed portion 1a. In the translucent lid 5, a groove 5a is formed at a location right above the inner surface of the recessed portion 1a of the lower surface, and the bonding material 7 enters the inside of the groove 5a. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、フォトダイオード,ラインセンサ,イメージセンサ等の受光素子である光半導体素子またはこれらの受光部を有する光半導体素子等を具備した光半導体装置に関する。   The present invention relates to an optical semiconductor device including an optical semiconductor element that is a light receiving element such as a photodiode, a line sensor, or an image sensor, or an optical semiconductor element having these light receiving portions.

従来のフォトダイオード(PD),ラインセンサ,イメージセンサ等の受光素子である光半導体素子またはこれらの受光部を有する光半導体素子を具備した光半導体装置を構成する絶縁基体は、上面に光半導体素子を収容するための凹部が形成されている。また、絶縁基体の凹部の内側から外側に配線導体が導出されている。   An insulating substrate constituting an optical semiconductor device that is a light receiving element such as a conventional photodiode (PD), line sensor, image sensor or the like, or an optical semiconductor element having these light receiving portions, has an optical semiconductor element on the upper surface. A recess is formed to accommodate the. A wiring conductor is led out from the inside to the outside of the recess of the insulating base.

光半導体素子は絶縁基体の凹部内に収容されるとともに凹部の底面に樹脂接着剤等により接合されて搭載されており、その光半導体素子の上面の外周部等には電極が設けられている。光半導体素子の電極と上記配線導体のうち凹部の内側に露出した部位とが、Au,Al等から成るボンディングワイヤにより電気的に接続される。また、透光性蓋体が絶縁基体の上面に凹部を塞ぐようにして接合材を介して取着されている。   The optical semiconductor element is accommodated in the recess of the insulating base and is mounted by being bonded to the bottom surface of the recess with a resin adhesive or the like, and an electrode is provided on the outer periphery of the upper surface of the optical semiconductor element. The electrode of the optical semiconductor element and the portion of the wiring conductor exposed inside the recess are electrically connected by a bonding wire made of Au, Al or the like. Moreover, the translucent lid is attached to the upper surface of the insulating base via a bonding material so as to close the recess.

このように従来の光半導体装置は、透光性蓋体を有することにより、光半導体装置の内部空間にゴミなどの異物が侵入することを防止するとともに、光半導体装置の内部空間を密閉空間とすることで、外部雰囲気の湿気が光半導体装置内に侵入するのを極力防ぐようにして、光半導体素子の耐久性を向上させるようにしている。   As described above, the conventional optical semiconductor device has the translucent lid to prevent foreign substances such as dust from entering the internal space of the optical semiconductor device, and the internal space of the optical semiconductor device as a sealed space. Thus, the durability of the optical semiconductor element is improved by preventing moisture in the external atmosphere from entering the optical semiconductor device as much as possible.

なお、一般的な光半導体装置では、外部機器との電気的接続を行うために絶縁基体の外周部に外部接続端子が配設されており、その外部接続端子は、配線導体のうち凹部の外側に導出された部位と接続され、配線導体等を介して電極パッドと接続されている。   In general optical semiconductor devices, an external connection terminal is disposed on the outer periphery of the insulating base in order to make an electrical connection with an external device, and the external connection terminal is outside the recess of the wiring conductor. And is connected to the electrode pad via a wiring conductor or the like.

そして、光半導体素子により透光性蓋体を通して外光を受光して変換されて生じた電気信号は、配線導体および外部接続端子を経由して光半導体装置の外部に配置された各種の機器や素子などに送られる。   The electrical signal generated by receiving and converting external light through the translucent lid by the optical semiconductor element is used for various devices and the like disposed outside the optical semiconductor device via the wiring conductor and the external connection terminal. Sent to the element.

なお、従来のPD,ラインセンサ,イメージセンサ等の受光素子である光半導体素子またはこれらの受光部を有する光半導体素子を具備した光半導体装置において、絶縁基体と透光性蓋体とを接合する接合材としては、一般的にシリカフィラーを混入させたエポキシ樹脂やフェノール樹脂,クレゾール樹脂,カーボン粉体とシリコン樹脂粒子の混合体等が使用されている。また、接合材は、通常、透光性蓋体を絶縁基体の上面に接合し取着しておくのに必要な程度の量が用いられており、透光性蓋体と絶縁基体との間に介在するとともに、透光性蓋体と絶縁基体との接合面の外側から透光性蓋体の側面にかけてはみ出すようにして被着されている。
特開平10−116940号公報
In an optical semiconductor device having an optical semiconductor element which is a light receiving element such as a conventional PD, line sensor, image sensor or the like, or an optical semiconductor element having these light receiving portions, an insulating base and a translucent lid are bonded. As the bonding material, an epoxy resin, a phenol resin, a cresol resin, a mixture of carbon powder and silicon resin particles in which a silica filler is mixed is generally used. The bonding material is usually used in an amount necessary to bond and attach the translucent lid to the upper surface of the insulating base, and between the translucent lid and the insulating base. And is attached so as to protrude from the outside of the joint surface between the translucent lid and the insulating base to the side of the translucent lid.
JP 10-116940 A

しかしながら、従来の光半導体装置においては、絶縁基体と透光性蓋体とを接合している接合材が透光性蓋体と絶縁基体との間に介在するとともに、透光性蓋体と絶縁基体との接合面の外側から透光性蓋体の側面にかけてはみ出す程度であるため、絶縁基体と透光性蓋体との接合材を介しての接合を効果的に強固なものとすることが難しいこと、また近時、光半導体装置の小型化にともない絶縁基体と透光性蓋体との接合面積が小さくなってきていること等から、絶縁基体と透光性蓋体との接合強度が不十分になる傾向があるという問題があった。   However, in the conventional optical semiconductor device, the bonding material that joins the insulating base and the translucent lid is interposed between the translucent lid and the insulating base and is insulated from the translucent lid. Since it only protrudes from the outside of the bonding surface with the base to the side of the translucent lid, the bonding between the insulating base and the translucent lid can be effectively strengthened. The bonding strength between the insulating substrate and the light-transmitting lid has become difficult due to the difficulty and recently the bonding area between the insulating substrate and the light-transmitting lid has become smaller with the miniaturization of the optical semiconductor device. There was a problem of tending to be insufficient.

透光性蓋体の絶縁基体に対する接合が弱くなると、光半導体素子を収納する密閉空間の気密性が劣化し、密閉空間内に外部雰囲気の湿気等が侵入しやすくなって光半導体装置としての信頼性が低くなってしまう。   When the bonding of the light-transmitting lid to the insulating base is weakened, the airtightness of the sealed space for storing the optical semiconductor element deteriorates, and moisture in the external atmosphere easily enters the sealed space, so that it is reliable as an optical semiconductor device. It becomes low.

特に、近時、PD,ラインセンサ,イメージセンサ等の光半導体素子は、画像の精細化や、センサとしての検知精度の高精度化等の要求に応じて受光部が非常に精細に形成されているため、絶縁基体と透光性蓋体との接合強度のわずかな劣化によっても、このような信頼性の低下等の問題点を生じてしまう。   In particular, optical semiconductor elements such as PDs, line sensors, and image sensors have recently been formed with very fine light-receiving portions in response to demands for finer images and higher detection accuracy as sensors. Therefore, even a slight deterioration in the bonding strength between the insulating base and the translucent lid causes problems such as a decrease in reliability.

また、光の透過率をより高めたり、光半導体装置の薄型化のために透光性蓋体の厚みが薄くなる傾向にあるため、透光性蓋体と絶縁基体との熱膨張係数の差に起因する熱応力等の応力が透光性蓋体に作用したときに、透光性蓋体が破損しやすいという問題もあった。   In addition, since the thickness of the light-transmitting lid tends to be reduced in order to increase the light transmittance or reduce the thickness of the optical semiconductor device, the difference in thermal expansion coefficient between the light-transmitting lid and the insulating substrate There is also a problem that the translucent lid is likely to be damaged when a stress such as thermal stress is applied to the translucent lid.

従って、本発明は上記問題点に鑑みて完成されたものであり、その目的は、透光性蓋体と絶縁基体とが強固に接合されて、光半導体素子を収納する密閉空間の気密性に優れ、光半導体素子に外光を長期にわたって歪を生じることなく正常に受光させることができ、正常な電気信号を外部の機器や素子などに送ることが可能な信頼性の高い光半導体装置を提供することである。   Accordingly, the present invention has been completed in view of the above problems, and its purpose is to improve the airtightness of the sealed space in which the light-transmitting lid and the insulating base are firmly bonded, and the optical semiconductor element is accommodated. Providing a highly reliable optical semiconductor device that allows optical semiconductor elements to receive external light normally without causing distortion over a long period of time and can send normal electrical signals to external devices and elements It is to be.

本発明の光半導体装置は、上面に光半導体素子を収容し搭載するための凹部を有する絶縁基体と、該絶縁基体の前記凹部の内側から外側に導出された配線導体と、前記絶縁基体の前記凹部の底面に搭載されるとともに電極が前記配線導体に電気的に接続された光半導体素子と、前記絶縁基体の上面に前記凹部を塞ぐようにして接合材を介して取着された透光性蓋体とを具備しており、前記透光性蓋体は、その下面の前記凹部の内側面の直上の部位に溝が形成されているとともに該溝の内側に前記接合材が入り込んでいることを特徴とするものである。   The optical semiconductor device of the present invention includes an insulating base having a recess for accommodating and mounting an optical semiconductor element on an upper surface, a wiring conductor led out from the inside of the recess of the insulating base, and the insulating base An optical semiconductor element mounted on the bottom surface of the recess and having an electrode electrically connected to the wiring conductor, and a translucency attached via a bonding material so as to close the recess on the top surface of the insulating base The translucent lid has a groove formed in a portion of the lower surface of the lower surface immediately above the inner surface of the recess, and the bonding material enters the inside of the groove. It is characterized by.

また、本発明の光半導体装置は、好ましくは、前記接合材は、ヤング率が1000乃至10000MPaであることを特徴とするものである。   The optical semiconductor device of the present invention is preferably characterized in that the bonding material has a Young's modulus of 1000 to 10,000 MPa.

また、本発明の光半導体装置は、好ましくは、前記接合材は、光の透過率が50%以下であることを特徴とするものである。   In the optical semiconductor device of the present invention, preferably, the bonding material has a light transmittance of 50% or less.

本発明の光半導体装置によれば、透光性蓋体は、その下面の凹部の内側面の直上の部位に溝が形成されているとともに溝の内側に接合材が入り込んでいることから、絶縁基体と透光性蓋体との間に介在する接合材の量が多くなるとともに、溝の部位において接合材が水平面と垂直面とが組み合わされた入り組んだ面を形成することができ、透光性蓋体を絶縁基体に接合材を介して強固に接合することができる。その結果、光半導体装置が小型化されたとしても、絶縁基体と透光性蓋体とから成る密閉空間の気密性を良好に確保し、光半導体素子に外光を長期にわたって正常に受光させることができ、正常な電気信号を外部の機器や素子などに送ることが可能な信頼性の高い光半導体装置を作製することができる。   According to the optical semiconductor device of the present invention, the translucent lid is insulated because the groove is formed at a position immediately above the inner surface of the recess on the lower surface and the bonding material enters the groove. The amount of the bonding material interposed between the base and the translucent lid increases, and the bonding material can form an intricate surface in which the horizontal surface and the vertical surface are combined at the groove portion. The flexible lid can be firmly bonded to the insulating substrate via a bonding material. As a result, even if the optical semiconductor device is miniaturized, the airtightness of the sealed space composed of the insulating base and the translucent lid is ensured well, and the optical semiconductor element can receive external light normally over a long period of time. Thus, a highly reliable optical semiconductor device capable of sending a normal electrical signal to an external device or element can be manufactured.

また、絶縁基体と透光性蓋体との熱膨張係数の差に起因する熱応力等の応力が透光性蓋体に作用したときに、接合材が入り込んだ溝部分で透光性蓋体がわずかに変形することによりその熱応力を緩和することができるので、透光性蓋体の破損等の不具合も効果的に防止することができる。   Further, when stress such as thermal stress due to the difference in thermal expansion coefficient between the insulating base and the light-transmitting lid is applied to the light-transmitting lid, the light-transmitting lid is formed in the groove portion where the bonding material enters. Since the thermal stress can be relaxed by slightly deforming, it is possible to effectively prevent problems such as breakage of the translucent lid.

また、本発明の光半導体装置は好ましくは、接合材は、ヤング率が1000乃至10000MPであり、わずかな変形は可能であるが大きく位置ずれするような変形を起こすことのない適度な弾性を有するものであることから、接合材により絶縁基体と透光性蓋体とを、接合材を介してより確実に強固に接合することができるとともに、接合材がわずかに変形することにより絶縁基体と透光性蓋体との間に生じる熱応力を接合材により吸収、緩和することができ、透光性蓋体の破損等を長期にわたってより効果的に防止することが可能な、長期信頼性の高い光半導体装置とすることができる。   In the optical semiconductor device of the present invention, preferably, the bonding material has a Young's modulus of 1000 to 10,000 MP, and has a moderate elasticity that can be slightly deformed but does not cause significant deformation. Therefore, the insulating base and the translucent lid can be more firmly and firmly joined to each other through the joining material by the joining material, and the insulating base and the transparent base can be slightly deformed by the slight deformation of the joining material. The thermal stress generated between the optical lid can be absorbed and alleviated by the bonding material, and it is possible to prevent damage to the translucent lid more effectively over a long period of time. High long-term reliability. An optical semiconductor device can be obtained.

また、本発明の光半導体装置は好ましくは、接合材は、光の透過率が50%以下であることから、接合材を通して外部の光が凹部内に入射することをより確実に防止することができ、より確実に正常な受光を行うことが可能な、受光の精度に優れた光半導体装置を提供することができる。   In the optical semiconductor device of the present invention, preferably, since the bonding material has a light transmittance of 50% or less, it is possible to more reliably prevent external light from entering the recess through the bonding material. Therefore, it is possible to provide an optical semiconductor device that can perform normal light reception more reliably and has excellent light reception accuracy.

本発明の光半導体装置について以下に詳細に説明する。図1は本発明の光半導体装置について実施の形態の例を示す断面図である。図1において、1は絶縁基体、2は配線導体、3は光半導体素子、4は光半導体素子3の電極、5は透光性蓋体、5aは透光性蓋体5の下面に形成された溝、6は光半導体素子3を絶縁基体1に接合し搭載するための接着剤、7は接合材、8はボンディングワイヤである。これらの絶縁基体1、配線導体2、光半導体素子3、透光性蓋体5、接合材7およびボンディングワイヤ8により、光半導体装置9が主に構成されている。   The optical semiconductor device of the present invention will be described in detail below. FIG. 1 is a cross-sectional view showing an example of an embodiment of an optical semiconductor device of the present invention. In FIG. 1, 1 is an insulating substrate, 2 is a wiring conductor, 3 is an optical semiconductor element, 4 is an electrode of the optical semiconductor element 3, 5 is a translucent lid, and 5a is formed on the lower surface of the translucent lid 5. 6 is an adhesive for bonding and mounting the optical semiconductor element 3 to the insulating substrate 1, 7 is a bonding material, and 8 is a bonding wire. An optical semiconductor device 9 is mainly composed of the insulating base 1, the wiring conductor 2, the optical semiconductor element 3, the translucent lid 5, the bonding material 7, and the bonding wire 8.

本発明の絶縁基体1は、その上面に形成された凹部1aに光半導体素子3が収容されて凹部1aの底面に接着剤6により接合されて搭載される。この光半導体素子3は上面に受光部が設けられており、光半導体素子3の上面の外周部には電源用や信号用等の電極4が設けられている。また、凹部1aの内側から外側に配線導体2が導出されており、凹部1aの内側に露出した配線導体2と光半導体素子3の電極4とがAu,Al等から成るボンディングワイヤ8で電気的に接続されている。さらに、絶縁基体1の上面の凹部1aの周囲の全周に樹脂接着剤等から成る接合材7を塗布し、ガラス,石英,サファイア,透明樹脂等から成る透光性蓋体5が接合されて取着される。   The insulating substrate 1 of the present invention is mounted with the optical semiconductor element 3 accommodated in a recess 1a formed on the upper surface thereof and bonded to the bottom surface of the recess 1a with an adhesive 6. The optical semiconductor element 3 is provided with a light receiving portion on the upper surface, and electrodes 4 for power supply and signals are provided on the outer peripheral portion of the upper surface of the optical semiconductor element 3. The wiring conductor 2 is led out from the inside to the outside of the recess 1a, and the wiring conductor 2 exposed to the inside of the recess 1a and the electrode 4 of the optical semiconductor element 3 are electrically connected by a bonding wire 8 made of Au, Al or the like. It is connected to the. Further, a bonding material 7 made of a resin adhesive or the like is applied to the entire circumference around the recess 1a on the upper surface of the insulating base 1, and the translucent lid 5 made of glass, quartz, sapphire, transparent resin, or the like is bonded. To be attached.

本発明における絶縁基体1は、アルミナ質焼結体(アルミナセラミックス),窒化アルミニウムセラミックス,炭化珪素セラミックス,窒化珪素セラミックス,ガラスセラミックス等のセラミックス、樹脂等から成る。そして、絶縁基体1はその底板部の上面の外周部に別体の枠状の側壁部が設けられているか、または絶縁基体1の底板部と側壁部とが一体的に形成されていてもよい。   The insulating substrate 1 in the present invention is made of an alumina sintered body (alumina ceramics), aluminum nitride ceramics, silicon carbide ceramics, silicon nitride ceramics, glass ceramics or other ceramics, resin, or the like. The insulating substrate 1 may be provided with a separate frame-shaped side wall portion on the outer peripheral portion of the upper surface of the bottom plate portion, or the bottom plate portion and the side wall portion of the insulating substrate 1 may be integrally formed. .

絶縁基体1は、例えばアルミナ質焼結体から成る場合、アルミナ,ガラス等の原料粉末を有機溶剤,バインダー等とともにシート状に成形して複数のセラミックグリーンシート(以下、グリーンシートともいう)を作製し、次に、グリーンシートのうち所定のものに打ち抜き加工を施して枠状に成形し、その後、枠状のグリーンシートが上層に位置するようにして複数のグリーンシートを積層するとともに約1300乃至1600℃の温度で焼成することにより形成される。   When the insulating substrate 1 is made of, for example, an alumina sintered body, raw powders such as alumina and glass are formed into a sheet shape together with an organic solvent, a binder and the like to produce a plurality of ceramic green sheets (hereinafter also referred to as green sheets). Next, a predetermined one of the green sheets is punched into a frame shape, and then a plurality of green sheets are laminated so that the frame-shaped green sheet is positioned in the upper layer and about 1300 to It is formed by firing at a temperature of 1600 ° C.

絶縁基体1の上面には、光半導体素子3を収容し底面に載置するための凹部1aが形成されており、配線導体2が凹部1aの内側から外側に導出されるとともに、この配線導体2のうち凹部1aの内側に露出した部位に光半導体素子3の電極4がボンディングワイヤ8を介して接続されることにより、絶縁基体1に搭載された光半導体素子3は、電極4、ボンディングワイヤ8および配線導体2を介して外部電気回路に電気的に接続される。   On the top surface of the insulating base 1, a recess 1a for accommodating the optical semiconductor element 3 and placing it on the bottom surface is formed. The wiring conductor 2 is led out from the inside of the recess 1a. The electrode 4 of the optical semiconductor element 3 is connected to the part exposed inside the recess 1a through the bonding wire 8, so that the optical semiconductor element 3 mounted on the insulating base 1 has the electrode 4 and the bonding wire 8 And electrically connected to an external electric circuit via the wiring conductor 2.

この配線導体2は、タングステン,モリブデン,銅,銀等のメタライズ導体等により形成されている。そして、配線導体2は、例えば絶縁基体1となるグリーンシートに予め所定のスルーホールを形成し、タングステン,モリブデン,銅,銀等の金属ペーストをグリーンシートの表面およびスルーホールの内面に印刷塗布したり充填しておくことにより形成される。   The wiring conductor 2 is formed of a metallized conductor such as tungsten, molybdenum, copper, or silver. For the wiring conductor 2, for example, a predetermined through hole is formed in advance on a green sheet to be the insulating base 1, and a metal paste such as tungsten, molybdenum, copper, silver is printed and applied to the surface of the green sheet and the inner surface of the through hole. It is formed by filling.

また、光半導体素子3は、その上面の中央部に受光部が設けられており、その上面の受光部の周囲である外周部には、電源用や信号用の電極4が設けられている。光半導体素子3は、PD,ラインセンサ,イメージセンサ,CCD(Charge Coupled Devices)、EPROM(Erasable Programmable ROM)等の受光素子、またはこれらの受光部を有する光半導体素子からなるものである。   In addition, the optical semiconductor element 3 is provided with a light receiving portion at the center of the upper surface thereof, and an electrode 4 for power supply or signal is provided on the outer peripheral portion around the light receiving portion on the upper surface. The optical semiconductor element 3 includes a light receiving element such as a PD, a line sensor, an image sensor, a CCD (Charge Coupled Device), an EPROM (Erasable Programmable ROM), or an optical semiconductor element having these light receiving portions.

この光半導体素子3は絶縁基体1の凹部1aの底面に載置され、樹脂接着剤,ろう材,低融点ガラス等から成る接着剤6によって接着されており、光半導体素子3の上面の外周部には電極4が設けられている。光半導体素子3の電極4と、配線導体2の凹部1aの内側に露出している部分とは、Au,Al等からなるボンディングワイヤ8により電気的に接続される。   This optical semiconductor element 3 is placed on the bottom surface of the recess 1a of the insulating substrate 1 and is bonded by an adhesive 6 made of resin adhesive, brazing material, low melting point glass or the like. Is provided with an electrode 4. The electrode 4 of the optical semiconductor element 3 and the portion exposed inside the recess 1a of the wiring conductor 2 are electrically connected by a bonding wire 8 made of Au, Al or the like.

なお、ボンディングワイヤ8は、その長さを0.3乃至3mmとすることが好ましい。0.3mm未満では、ボンディングワイヤ8が短すぎて十分なループを形成することが難しくなるため、光半導体素子3の電極4と配線導体2とを確実に接続することが難しくなり、接続不良が生じやすくなる。3mmを超えると、ボンディングワイヤ8が長くなりすぎてループが不要に高くなる傾向があり、ボンディングワイヤ8に不要なインダクタンスが発生して高周波信号の伝送性が劣化しやすくなるとともにコスト高となる。   The bonding wire 8 preferably has a length of 0.3 to 3 mm. If it is less than 0.3 mm, the bonding wire 8 is too short and it is difficult to form a sufficient loop, so that it is difficult to reliably connect the electrode 4 of the optical semiconductor element 3 and the wiring conductor 2, resulting in poor connection. It tends to occur. If it exceeds 3 mm, the bonding wire 8 tends to be too long and the loop tends to become unnecessarily high. Unnecessary inductance is generated in the bonding wire 8, and high-frequency signal transmission is likely to deteriorate and the cost is increased.

また、光半導体素子3の電極4と配線導体2との接続は、ボンディングワイヤ8により行うものに限らず、いわゆるリボン等の帯状の接続線等を用いてもよい。   Further, the connection between the electrode 4 of the optical semiconductor element 3 and the wiring conductor 2 is not limited to the bonding wire 8, and a strip-shaped connection line such as a so-called ribbon may be used.

また、透光性蓋体5が樹脂接着剤等からなる接合材7を介して絶縁基体1の上面に接合されて取着されており、これにより、光半導体素子3を収容し搭載した凹部1aが気密封止される。この接合材7は、例えば樹脂接着剤からなる場合、アクリル系樹脂,エポキシ系樹脂,フェノール系樹脂,クレゾール系樹脂,シリコーン系樹脂,ポリエーテルアミド系樹脂等から成る。また接合材7は、余計な外光の入射を遮断するために、黒色,茶褐色,暗褐色,暗緑色,濃青色等の暗色系の顔料や染料を混入させてもよい。また、接合材7は、ガラス等の無機材料からなるものや、無機材料からなるフィラー粉末を樹脂接着剤に添加したものでもよい。   Further, the translucent lid 5 is bonded and attached to the upper surface of the insulating substrate 1 via a bonding material 7 made of a resin adhesive or the like, whereby the recess 1a in which the optical semiconductor element 3 is accommodated and mounted. Is hermetically sealed. For example, when the bonding material 7 is made of a resin adhesive, the bonding material 7 is made of an acrylic resin, an epoxy resin, a phenol resin, a cresol resin, a silicone resin, a polyether amide resin, or the like. The bonding material 7 may be mixed with a dark pigment or dye such as black, brown, dark brown, dark green, or dark blue in order to block the extraneous light from entering. Further, the bonding material 7 may be made of an inorganic material such as glass or a filler powder made of an inorganic material added to a resin adhesive.

また、透光性蓋体5の上下面の少なくとも一方に、紫外線を遮断するための光学膜を形成してもよい。   Further, an optical film for blocking ultraviolet rays may be formed on at least one of the upper and lower surfaces of the translucent lid 5.

この光半導体装置9は、画像認識装置,センサ等の光学機器や電子機器の部品として使用される。例えば、光学機器や電子機器を構成する電気回路基板の所定位置に実装され、外光を受光するとともに光半導体素子3で電気信号に変換し、その電気信号を光学機器や電子機器を構成する電気回路基板に供給する。   The optical semiconductor device 9 is used as a part of an optical device such as an image recognition device or a sensor or an electronic device. For example, it is mounted at a predetermined position on an electric circuit board constituting an optical device or an electronic device, receives external light and converts it into an electric signal by the optical semiconductor element 3, and the electric signal constitutes an electric device constituting the optical device or the electronic device. Supply to the circuit board.

なお、光半導体装置9の外部電気回路基板への実装の際には、複数の光半導体装置9を搬送用トレイ等に収納し、まとめて実装用の装置まで搬送する必要があり、また、光半導体装置9をチャック等の保持装置で保持し、外部電気回路基板の所定位置に位置合わせする必要がある。また、光半導体装置9のトレイへの出し入れは、手作業による方法や自動搬送装置等の設備を用いる方法により行われる。   When mounting the optical semiconductor device 9 on the external electric circuit board, it is necessary to store a plurality of optical semiconductor devices 9 in a transfer tray or the like and transfer them to the mounting device together. It is necessary to hold the semiconductor device 9 with a holding device such as a chuck and align it with a predetermined position on the external electric circuit board. In addition, the optical semiconductor device 9 is put into and out of the tray by a manual method or a method using equipment such as an automatic transfer device.

本発明の光半導体装置9において、透光性蓋体5は、その下面の凹部1aの内側面の直上の部位に溝5aが形成されているとともに溝5aの内側に接合材7が入り込んでいる。   In the optical semiconductor device 9 of the present invention, the translucent lid 5 has a groove 5a formed in a portion immediately below the inner surface of the recess 1a on the lower surface thereof, and a bonding material 7 has entered the groove 5a. .

本発明の光半導体装置によれば、透光性蓋体5の下面の凹部1aの内側面の直上の部位に溝5aを形成するとともに溝5aの内側に接合材7を入り込ませていることから、絶縁基体1と透光性蓋体5との間に介在する接合材7の量が多くなるとともに、溝5aの部位において接合材7が水平面と垂直面とが組み合わされた入り組んだ面を形成することができ、透光性蓋体5を絶縁基体1に接合材7を介して強固に接合することができる。その結果、光半導体装置9が小型化されたとしても、絶縁基体1と透光性蓋体5とから成る密閉空間の気密性を良好に確保し、光半導体素子3に外光を長期にわたって正常に受光させることができ、正常な電気信号を外部の機器や素子などに送ることが可能な信頼性の高い光半導体装置9を作製することができる。 According to the optical semiconductor device of the present invention, the groove 5a is formed at a position immediately above the inner surface of the recess 1a on the lower surface of the translucent lid 5, and the bonding material 7 is inserted inside the groove 5a. Further, the amount of the bonding material 7 interposed between the insulating base 1 and the translucent lid 5 is increased, and the bonding material 7 forms an intricate surface in which the horizontal surface and the vertical surface are combined at the portion of the groove 5a. The translucent lid 5 can be firmly bonded to the insulating substrate 1 via the bonding material 7. As a result, even if the optical semiconductor device 9 is reduced in size, the hermeticity of the sealed space composed of the insulating base 1 and the translucent lid 5 is ensured, and external light is normally supplied to the optical semiconductor element 3 over a long period of time. It is possible to manufacture a highly reliable optical semiconductor device 9 that can receive light and transmit a normal electrical signal to an external device or element.

また、絶縁基体1と透光性蓋体5との熱膨張係数の差に起因する熱応力等の応力が透光性蓋体5に作用したときに、接合材7が入り込んだ溝5a部分で透光性蓋体5がわずかに変形することによりその熱応力を緩和することができるので、透光性蓋体5の破損等の不具合も効果的に防止することができる。   Further, when stress such as thermal stress due to the difference in thermal expansion coefficient between the insulating base 1 and the translucent lid 5 acts on the translucent lid 5, the groove 5 a portion into which the bonding material 7 has entered. Since the thermal stress can be relieved when the translucent lid 5 is slightly deformed, problems such as breakage of the translucent lid 5 can be effectively prevented.

この場合、溝5aの内側に接合材7が入り込んでいるので、溝5aが形成されている部位で透光性蓋体5の機械的な強度が低下して変形しやすくなり過ぎたり、割れやすくなったりすることを防止でき、透光性蓋体5が溝5aの部位で破損するようなことは効果的に防止することができる。例えば、単に溝5aを設けただけでは、上記のような応力の吸収緩和は効果的に行えるものの、溝5aが形成されている部位で透光性蓋体5に破損,破断等の不具合が生じやすくなるおそれがある。   In this case, since the bonding material 7 enters the inside of the groove 5a, the mechanical strength of the translucent lid 5 is lowered at the portion where the groove 5a is formed, so that it is easily deformed or easily broken. It is possible to effectively prevent the translucent lid 5 from being damaged at the site of the groove 5a. For example, although simply providing the groove 5a can effectively absorb and relax the stress as described above, the translucent lid 5 has problems such as breakage and breakage at the portion where the groove 5a is formed. May be easier.

このような溝5aを有する透光性蓋体5は、透光性のガラス,樹脂,石英,サファイア等からなり、例えばガラスからなる場合、板状のガラス材を所定の透光性蓋体5の寸法に切断した後、その下面の、絶縁基体1の凹部1aの内側面の直上の部位に研磨加工を施して溝5aを形成する方法等の方法により作製することができる。   The translucent lid 5 having such a groove 5a is made of translucent glass, resin, quartz, sapphire, or the like. When the translucent lid 5 is made of glass, for example, a plate-like glass material is used as the predetermined translucent lid 5. After being cut into the above dimensions, it can be manufactured by a method such as a method of forming a groove 5a by polishing the lower surface of the insulating substrate 1 immediately above the inner surface of the recess 1a.

溝5aは、その内側の端が凹部1aの内側面の直上の部位から内側に0.1乃至0.5mmにあるように形成するのがよい。0.1mm未満では、接合材7が十分に溝5aに入り込まないため、凹部1aの内側面の上部における接着力が低下する。0.5mmを超えると、接合材7が部分的に透光性蓋体5の下面の中央部側に流れ出易くなり、外光が透光性蓋体5を通ることの妨げになるおそれがある。   The groove 5a is preferably formed so that its inner end is 0.1 to 0.5 mm inward from the portion directly above the inner surface of the recess 1a. If it is less than 0.1 mm, the bonding material 7 does not sufficiently enter the groove 5a, so that the adhesive force at the upper part of the inner surface of the recess 1a is reduced. If the thickness exceeds 0.5 mm, the bonding material 7 is likely to partially flow out to the central portion side of the lower surface of the translucent lid 5, which may hinder the passage of external light through the translucent lid 5. .

また、溝5aの幅は0.5mm以上が好ましい。溝5aの幅が0.5mm未満では、接合材7の透光性蓋体5に対する接合性を効果的に向上させることが難しくなる傾向がある。なお、溝5aの幅は、透光性蓋体5の下面全周にわたって同じ幅とする必要は無く、透光性蓋体5の角部で幅を広くして接合材7をより多く入り込ませて、より強固に接合させるようにしてもよい。   The width of the groove 5a is preferably 0.5 mm or more. If the width of the groove 5a is less than 0.5 mm, it tends to be difficult to effectively improve the bonding property of the bonding material 7 to the translucent lid 5. The width of the groove 5a does not need to be the same over the entire lower surface of the translucent lid 5, and the width is widened at the corners of the translucent lid 5 to allow more bonding material 7 to enter. Thus, it may be more strongly bonded.

また、溝5aの深さは、0.1乃至0.5mm確保することが好ましい。深さが0.1mm未満では、十分な接合材7が得られないため強固に接合できず、0.5mmを超えると、透光性蓋体5の機械的強度が弱くなるおそれがある。なお、透光性蓋体5の厚みは0.5乃至1.2mm程度である。   The depth of the groove 5a is preferably 0.1 to 0.5 mm. If the depth is less than 0.1 mm, sufficient bonding material 7 cannot be obtained, so that it cannot be firmly bonded. If it exceeds 0.5 mm, the mechanical strength of the translucent lid 5 may be weakened. The translucent lid 5 has a thickness of about 0.5 to 1.2 mm.

なお、溝5aは、縦断面形状が円弧状や楕円弧状のものに形成しておくことが好ましい。溝5aについて、縦断面形状を円弧状や楕円弧状等としておくと、溝5aの内面が連続した滑らかな曲面で構成されるため、溝5a内に接合材7が、溝5aと接合材7との間に空隙部等の欠陥を生じることなく入り込みやすく、絶縁基体1と透光性蓋体5との接合、取着の信頼性をより一層良好とすることができる。   In addition, it is preferable to form the groove | channel 5a so that a longitudinal cross-sectional shape may be circular arc shape or elliptical arc shape. If the longitudinal cross-sectional shape of the groove 5a is an arc shape, an elliptical arc shape, or the like, the inner surface of the groove 5a is formed by a smooth curved surface, so that the bonding material 7 is formed in the groove 5a. It is easy to enter without causing defects such as voids, and the reliability of bonding and attachment between the insulating substrate 1 and the translucent lid 5 can be further improved.

この場合、接合材7は、ヤング率が1000乃至10000MPaであることがよい。接合材7について、ヤング率が1000乃至10000MPaと、わずかな変形は可能であるが大きく位置ずれするような変形を起こすことのない適度な弾性を有するものとした場合には、接合材7により絶縁基体1と透光性蓋体5とを、接合材7を介してより確実に強固に接合することができるとともに、接合材7がわずかに変形することにより絶縁基体1と透光性蓋体5との間に生じる熱応力を接合材7により吸収、緩和することができ、透光性蓋体5の破損等を長期にわたってより効果的に防止することが可能な、長期信頼性の高い光半導体装置9とすることができる。   In this case, the bonding material 7 may have a Young's modulus of 1000 to 10,000 MPa. When the bonding material 7 has a Young's modulus of 1000 to 10,000 MPa and has a moderate elasticity that can be slightly deformed but does not cause a large displacement, it is insulated by the bonding material 7. The base body 1 and the translucent lid body 5 can be firmly and firmly bonded via the bonding material 7, and the insulating base body 1 and the translucent lid body 5 can be obtained by slightly deforming the bonding material 7. The optical semiconductor with high long-term reliability that can absorb and relieve the thermal stress generated between them and the bonding material 7 and can more effectively prevent the translucent lid 5 from being damaged over a long period of time. It can be the device 9.

接合材7のヤング率が1000MPa未満では、接合材7が柔軟過ぎて十分な機械的強度を得ることができなくなるおそれがある。ヤング率が10000MPaを超えると、接合材7が硬くなりすぎる傾向があるので、熱応力等の応力を吸収する作用が低下する傾向がある。   If the Young's modulus of the bonding material 7 is less than 1000 MPa, the bonding material 7 may be too flexible to obtain sufficient mechanical strength. If the Young's modulus exceeds 10,000 MPa, the bonding material 7 tends to be too hard, and thus the action of absorbing stress such as thermal stress tends to be reduced.

また、本発明の光半導体装置9は好ましくは、接合材7は、光の透過率が50%以下であることが好ましい。これにより、接合材7を通して外部の光が凹部1a内に入射することをより確実に防止することができ、より確実に正常な受光を行うことが可能な、受光の精度に優れた光半導体装置9を提供することができる。接合材7の光の透過率が50%を超える場合、例えば、応力の緩和をより効果的に行わせるために接合材7の厚さを厚くしたような場合、外部の光が凹部1a内に入射しやすくなるおそれがある。   Further, the optical semiconductor device 9 of the present invention is preferably such that the bonding material 7 has a light transmittance of 50% or less. Thereby, it is possible to more reliably prevent external light from entering the recess 1a through the bonding material 7, and to perform normal light reception more reliably, and an optical semiconductor device excellent in light reception accuracy. 9 can be provided. When the light transmittance of the bonding material 7 exceeds 50%, for example, when the thickness of the bonding material 7 is increased in order to more effectively relieve stress, external light enters the recess 1a. There is a risk of incident light.

また、接合材7が透明な樹脂接着剤から成る場合、接合材7の屈折率が透光性蓋体5と同じであってもよい。この場合、接合材7と透光性蓋体5との界面で光の反射や散乱等が発生するのを効果的に抑制することができ、光半導体素子3に余分な反射光や散乱光が入射するのを防ぐことができる。また、接合材7が透明な樹脂接着剤から成る場合、その内部に含まれる気泡の体積が30体積%以下であることがよい。30体積%を超えると、接合材7の接合力が低下するとともに、気泡によって光が散乱され光半導体素子3に余分な散乱光が入射する場合がある。接合材7に含まれる気泡の割合を小さくするには、減圧室や真空装置内で接合材7を使用する方法、予め接合材7に含まれる気泡を真空脱泡する方法等がある。   Further, when the bonding material 7 is made of a transparent resin adhesive, the refractive index of the bonding material 7 may be the same as that of the translucent lid 5. In this case, it is possible to effectively suppress the occurrence of light reflection or scattering at the interface between the bonding material 7 and the translucent lid 5, and extra reflected light or scattered light is generated in the optical semiconductor element 3. The incident can be prevented. Moreover, when the joining material 7 consists of a transparent resin adhesive, it is good for the volume of the bubble contained in the inside to be 30 volume% or less. If the volume exceeds 30% by volume, the bonding force of the bonding material 7 may be reduced, and light may be scattered by bubbles to cause extra scattered light to enter the optical semiconductor element 3 in some cases. In order to reduce the ratio of bubbles contained in the bonding material 7, there are a method of using the bonding material 7 in a decompression chamber or a vacuum apparatus, a method of previously degassing bubbles contained in the bonding material 7, and the like.

また本発明の光半導体装置9は、接合材7は、その下面が透光性蓋体5の下面に連続した面とされていることが好ましい。この場合、接合材7が透光性蓋体5の下面に広がって外光の正常な通過を妨げ光半導体素子3の受光特性を劣化させるのを防ぐことができる。   In the optical semiconductor device 9 of the present invention, it is preferable that the bonding material 7 has a lower surface continuous with the lower surface of the translucent lid 5. In this case, it is possible to prevent the bonding material 7 from spreading on the lower surface of the translucent lid 5 and preventing the normal passage of external light and deteriorating the light receiving characteristics of the optical semiconductor element 3.

なお、上述の光は、波長が380乃至770nmの可視光である。   Note that the above-described light is visible light having a wavelength of 380 to 770 nm.

なお、本発明は上記実施の形態に限定されるものではなく、本発明の要旨を逸脱しない範囲内であれば種々の変更は可能である。例えば、透光性蓋体5は、その全面が一様に透光性を有するものである必要は無く、光半導体素子3の受光部に受光される外光が通る部分を透光性に優れたものとするとともに、接合材7で上面が覆われる外周部分を、接合材7との接合が強固となるようなセラミックスや樹脂,金属等からなるものとしてもよい。   The present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the gist of the present invention. For example, the translucent lid 5 does not have to be uniformly translucent on the entire surface, and the portion through which external light received by the light receiving portion of the optical semiconductor element 3 passes is excellent in translucency. In addition, the outer peripheral portion whose upper surface is covered with the bonding material 7 may be made of ceramics, resin, metal, or the like that makes the bonding with the bonding material 7 strong.

本発明の光半導体装置の実施の形態の一例を示す断面図である。It is sectional drawing which shows an example of embodiment of the optical semiconductor device of this invention.

符号の説明Explanation of symbols

1・・・絶縁基体
1a・・・凹部
2・・・配線導体
3・・・光半導体素子
4・・・電極
5・・・透光性蓋体
5a・・・溝
7・・・接合材
9・・・光半導体装置
DESCRIPTION OF SYMBOLS 1 ... Insulating base | substrate 1a ... Recessed part 2 ... Wiring conductor 3 ... Optical semiconductor element 4 ... Electrode 5 ... Translucent cover 5a ... Groove 7 ... Bonding material 9 ... Optical semiconductor devices

Claims (3)

上面に光半導体素子を収容し搭載するための凹部を有する絶縁基体と、該絶縁基体の前記凹部の内側から外側に導出された配線導体と、前記絶縁基体の前記凹部の底面に搭載されるとともに電極が前記配線導体に電気的に接続された光半導体素子と、前記絶縁基体の上面に前記凹部を塞ぐようにして接合材を介して取着された透光性蓋体とを具備しており、前記透光性蓋体は、その下面の前記凹部の内側面の直上の部位に溝が形成されているとともに該溝の内側に前記接合材が入り込んでいることを特徴とする光半導体装置。 An insulating base having a recess for accommodating and mounting an optical semiconductor element on the top surface, a wiring conductor led out from the inside of the recess of the insulating base, and mounted on the bottom surface of the recess of the insulating base An optical semiconductor element in which an electrode is electrically connected to the wiring conductor; and a translucent lid attached to the upper surface of the insulating base via a bonding material so as to close the recess. In the optical semiconductor device, a groove is formed in a portion of the translucent lid body immediately above the inner side surface of the concave portion, and the bonding material enters the groove. 前記接合材は、ヤング率が1000乃至10000MPaであることを特徴とする請求項1記載の光半導体装置。 The optical semiconductor device according to claim 1, wherein the bonding material has a Young's modulus of 1000 to 10,000 MPa. 前記接合材は、光の透過率が50%以下であることを特徴とする請求項1または請求項2記載の光半導体装置。 The optical semiconductor device according to claim 1, wherein the bonding material has a light transmittance of 50% or less.
JP2004087703A 2003-12-24 2004-03-24 Optical semiconductor device Pending JP2005210045A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007150283A (en) * 2005-11-23 2007-06-14 Taiwan Semiconductor Manufacturing Co Ltd Back-illuminated image sensor, and method for providing same with extended metal part
JP2011054597A (en) * 2009-08-31 2011-03-17 Kyocera Kinseki Corp Electronic device
KR101265642B1 (en) 2007-07-23 2013-05-22 엘지전자 주식회사 Light emitting device package and method of making the same
JPWO2015151514A1 (en) * 2014-03-31 2017-04-13 ナガセケムテックス株式会社 CIRCUIT MEMBER HAVING HOLLOW PART, MOUNTING STRUCTURE, AND METHOD FOR PRODUCING MOUNTING STRUCTURE

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007150283A (en) * 2005-11-23 2007-06-14 Taiwan Semiconductor Manufacturing Co Ltd Back-illuminated image sensor, and method for providing same with extended metal part
KR101265642B1 (en) 2007-07-23 2013-05-22 엘지전자 주식회사 Light emitting device package and method of making the same
JP2011054597A (en) * 2009-08-31 2011-03-17 Kyocera Kinseki Corp Electronic device
JPWO2015151514A1 (en) * 2014-03-31 2017-04-13 ナガセケムテックス株式会社 CIRCUIT MEMBER HAVING HOLLOW PART, MOUNTING STRUCTURE, AND METHOD FOR PRODUCING MOUNTING STRUCTURE

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