JP2006133255A - 三次元形状形成マスクおよび光学素子 - Google Patents

三次元形状形成マスクおよび光学素子 Download PDF

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Publication number
JP2006133255A
JP2006133255A JP2004318778A JP2004318778A JP2006133255A JP 2006133255 A JP2006133255 A JP 2006133255A JP 2004318778 A JP2004318778 A JP 2004318778A JP 2004318778 A JP2004318778 A JP 2004318778A JP 2006133255 A JP2006133255 A JP 2006133255A
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Prior art keywords
pattern
basic shape
resolution limit
pitch
shape
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JP2004318778A
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Japanese (ja)
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JP2006133255A5 (https=
Inventor
Makoto Ogusu
誠 小楠
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Canon Inc
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Canon Inc
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Priority to JP2004318778A priority Critical patent/JP2006133255A/ja
Publication of JP2006133255A publication Critical patent/JP2006133255A/ja
Publication of JP2006133255A5 publication Critical patent/JP2006133255A5/ja
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  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2004318778A 2004-11-02 2004-11-02 三次元形状形成マスクおよび光学素子 Withdrawn JP2006133255A (ja)

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JP2004318778A JP2006133255A (ja) 2004-11-02 2004-11-02 三次元形状形成マスクおよび光学素子

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JP2004318778A JP2006133255A (ja) 2004-11-02 2004-11-02 三次元形状形成マスクおよび光学素子

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JP2006133255A true JP2006133255A (ja) 2006-05-25
JP2006133255A5 JP2006133255A5 (https=) 2007-12-06

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010169720A (ja) * 2009-01-20 2010-08-05 Toppan Printing Co Ltd 濃度分布マスクとその設計装置及び微小立体形状配列の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010169720A (ja) * 2009-01-20 2010-08-05 Toppan Printing Co Ltd 濃度分布マスクとその設計装置及び微小立体形状配列の製造方法

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