JP2006112788A5 - - Google Patents

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Publication number
JP2006112788A5
JP2006112788A5 JP2004297158A JP2004297158A JP2006112788A5 JP 2006112788 A5 JP2006112788 A5 JP 2006112788A5 JP 2004297158 A JP2004297158 A JP 2004297158A JP 2004297158 A JP2004297158 A JP 2004297158A JP 2006112788 A5 JP2006112788 A5 JP 2006112788A5
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JP
Japan
Prior art keywords
substrate
optical detection
detection element
light
reticle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004297158A
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English (en)
Japanese (ja)
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JP2006112788A (ja
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Publication date
Application filed filed Critical
Priority to JP2004297158A priority Critical patent/JP2006112788A/ja
Priority claimed from JP2004297158A external-priority patent/JP2006112788A/ja
Priority to US11/249,295 priority patent/US7497111B2/en
Publication of JP2006112788A publication Critical patent/JP2006112788A/ja
Publication of JP2006112788A5 publication Critical patent/JP2006112788A5/ja
Pending legal-status Critical Current

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JP2004297158A 2004-10-12 2004-10-12 表面形状計測装置、表面計測方法、及び露光装置 Pending JP2006112788A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004297158A JP2006112788A (ja) 2004-10-12 2004-10-12 表面形状計測装置、表面計測方法、及び露光装置
US11/249,295 US7497111B2 (en) 2004-10-12 2005-10-12 Surface shape measuring apparatus, surface measuring method, and exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004297158A JP2006112788A (ja) 2004-10-12 2004-10-12 表面形状計測装置、表面計測方法、及び露光装置

Publications (2)

Publication Number Publication Date
JP2006112788A JP2006112788A (ja) 2006-04-27
JP2006112788A5 true JP2006112788A5 (https=) 2007-11-29

Family

ID=36144327

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004297158A Pending JP2006112788A (ja) 2004-10-12 2004-10-12 表面形状計測装置、表面計測方法、及び露光装置

Country Status (2)

Country Link
US (1) US7497111B2 (https=)
JP (1) JP2006112788A (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7355709B1 (en) * 2004-02-23 2008-04-08 Kla-Tencor Technologies Corp. Methods and systems for optical and non-optical measurements of a substrate
NL1036307A1 (nl) * 2007-12-21 2009-06-23 Asml Netherlands Bv Lithographic apparatus, method for levelling an object, and lithographic projection method.
US8214916B2 (en) * 2009-01-26 2012-07-03 Nanoink, Inc. Large area, homogeneous array fabrication including leveling with use of bright spots
EP2680012A1 (en) * 2012-06-28 2014-01-01 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO High throughput scanning probe microscopy device
KR101681231B1 (ko) * 2015-05-13 2016-12-02 서강대학교산학협력단 기능성 탐침을 갖는 미소 캔틸레버 제조방법

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4861162A (en) 1985-05-16 1989-08-29 Canon Kabushiki Kaisha Alignment of an object
GB8910566D0 (en) * 1989-05-08 1989-06-21 Amersham Int Plc Imaging apparatus and method
JP3074579B2 (ja) * 1992-01-31 2000-08-07 キヤノン株式会社 位置ずれ補正方法
JP3309927B2 (ja) * 1993-03-03 2002-07-29 株式会社ニコン 露光方法、走査型露光装置、及びデバイス製造方法
KR100300618B1 (ko) 1992-12-25 2001-11-22 오노 시게오 노광방법,노광장치,및그장치를사용하는디바이스제조방법
US5633455A (en) * 1993-10-05 1997-05-27 Board Of Trustees Of The Leland Stanford, Jr. University Method of detecting particles of semiconductor wafers
US6066265A (en) * 1996-06-19 2000-05-23 Kionix, Inc. Micromachined silicon probe for scanning probe microscopy
US5908981A (en) * 1996-09-05 1999-06-01 Board Of Trustees Of The Leland Stanford, Jr. University Interdigital deflection sensor for microcantilevers
JPH10312592A (ja) * 1997-05-13 1998-11-24 Canon Inc 情報処理装置および情報処理方法
JP3753215B2 (ja) * 1998-09-10 2006-03-08 セイコーインスツル株式会社 走査型プローブ顕微鏡
JP2001091441A (ja) * 1999-07-16 2001-04-06 Japan Science & Technology Corp ナノメートルオーダの機械振動子、その製造方法及びそれを用いた測定装置
US6545492B1 (en) * 1999-09-20 2003-04-08 Europaisches Laboratorium Fur Molekularbiologie (Embl) Multiple local probe measuring device and method
US6516528B1 (en) * 2000-10-24 2003-02-11 Advanced Micro Devices, Inc. System and method to determine line edge roughness and/or linewidth
JP4076792B2 (ja) * 2001-06-19 2008-04-16 独立行政法人科学技術振興機構 カンチレバーアレイ、その製造方法及びその装置
JP4444734B2 (ja) * 2004-06-07 2010-03-31 キヤノン株式会社 微細パターン形成装置

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