JP2006093428A5 - - Google Patents
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- Publication number
- JP2006093428A5 JP2006093428A5 JP2004277496A JP2004277496A JP2006093428A5 JP 2006093428 A5 JP2006093428 A5 JP 2006093428A5 JP 2004277496 A JP2004277496 A JP 2004277496A JP 2004277496 A JP2004277496 A JP 2004277496A JP 2006093428 A5 JP2006093428 A5 JP 2006093428A5
- Authority
- JP
- Japan
- Prior art keywords
- outside air
- heat
- light source
- exposure apparatus
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004277496A JP2006093428A (ja) | 2004-09-24 | 2004-09-24 | 温調チャンバおよびこれを用いた露光装置 |
| US11/233,034 US7262830B2 (en) | 2004-09-24 | 2005-09-23 | Exposure apparatus, and device manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004277496A JP2006093428A (ja) | 2004-09-24 | 2004-09-24 | 温調チャンバおよびこれを用いた露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006093428A JP2006093428A (ja) | 2006-04-06 |
| JP2006093428A5 true JP2006093428A5 (cg-RX-API-DMAC7.html) | 2007-11-08 |
Family
ID=36098649
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004277496A Withdrawn JP2006093428A (ja) | 2004-09-24 | 2004-09-24 | 温調チャンバおよびこれを用いた露光装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7262830B2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP2006093428A (cg-RX-API-DMAC7.html) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080310113A1 (en) * | 2007-06-13 | 2008-12-18 | Asml Netherlands B.V. | Electronics rack and lithographic apparatus comprising such electronics rack |
| JP5594597B2 (ja) * | 2008-09-02 | 2014-09-24 | 株式会社ラスコ | 冷却装置 |
| JP2010192779A (ja) * | 2009-02-20 | 2010-09-02 | Orion Mach Co Ltd | 冷却装置 |
| WO2010150366A1 (ja) * | 2009-06-24 | 2010-12-29 | Ｎｅｃディスプレイソリューションズ株式会社 | 光源装置およびこれを備えた投写型表示装置 |
| US8596826B2 (en) * | 2010-08-23 | 2013-12-03 | Abl Ip Holding Llc | Active cooling systems for optics |
| CN103256769B (zh) * | 2012-02-20 | 2017-04-26 | 竞陆电子(昆山)有限公司 | 产热设备冬季用换热节能系统 |
| US9331430B2 (en) | 2013-10-18 | 2016-05-03 | JTech Solutions, Inc. | Enclosed power outlet |
| US10205283B2 (en) | 2017-04-13 | 2019-02-12 | JTech Solutions, Inc. | Reduced cross-section enclosed power outlet |
| USD843321S1 (en) | 2018-03-26 | 2019-03-19 | JTech Solutions, Inc. | Extendable outlet |
| USD841592S1 (en) | 2018-03-26 | 2019-02-26 | JTech Solutions, Inc. | Extendable outlet |
| USD999742S1 (en) | 2021-04-01 | 2023-09-26 | JTech Solutions, Inc. | Safety interlock outlet box |
| US12368293B2 (en) | 2022-01-11 | 2025-07-22 | JTech Solutions, Inc. | Safety interlocks for outlets |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DD160756A3 (de) * | 1981-04-24 | 1984-02-29 | Gudrun Dietz | Anordnung zur verbesserung fotochemischer umsetzungsprozesse in fotoresistschichten |
| US4690528A (en) * | 1983-10-05 | 1987-09-01 | Nippon Kogaku K. K. | Projection exposure apparatus |
| US6002987A (en) * | 1996-03-26 | 1999-12-14 | Nikon Corporation | Methods to control the environment and exposure apparatus |
| JPH11329951A (ja) | 1998-05-15 | 1999-11-30 | Canon Inc | 光源装置及び露光装置 |
| JP2004128213A (ja) * | 2002-10-02 | 2004-04-22 | Canon Inc | 温調システム及びそれを組み込んだ露光装置 |
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2004
- 2004-09-24 JP JP2004277496A patent/JP2006093428A/ja not_active Withdrawn
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2005
- 2005-09-23 US US11/233,034 patent/US7262830B2/en not_active Expired - Fee Related