JP2006093428A - 温調チャンバおよびこれを用いた露光装置 - Google Patents

温調チャンバおよびこれを用いた露光装置 Download PDF

Info

Publication number
JP2006093428A
JP2006093428A JP2004277496A JP2004277496A JP2006093428A JP 2006093428 A JP2006093428 A JP 2006093428A JP 2004277496 A JP2004277496 A JP 2004277496A JP 2004277496 A JP2004277496 A JP 2004277496A JP 2006093428 A JP2006093428 A JP 2006093428A
Authority
JP
Japan
Prior art keywords
temperature control
temperature
control medium
heat
exhaust
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2004277496A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006093428A5 (enExample
Inventor
Toshiyuki Shigaraki
俊幸 信楽
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004277496A priority Critical patent/JP2006093428A/ja
Priority to US11/233,034 priority patent/US7262830B2/en
Publication of JP2006093428A publication Critical patent/JP2006093428A/ja
Publication of JP2006093428A5 publication Critical patent/JP2006093428A5/ja
Withdrawn legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004277496A 2004-09-24 2004-09-24 温調チャンバおよびこれを用いた露光装置 Withdrawn JP2006093428A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004277496A JP2006093428A (ja) 2004-09-24 2004-09-24 温調チャンバおよびこれを用いた露光装置
US11/233,034 US7262830B2 (en) 2004-09-24 2005-09-23 Exposure apparatus, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004277496A JP2006093428A (ja) 2004-09-24 2004-09-24 温調チャンバおよびこれを用いた露光装置

Publications (2)

Publication Number Publication Date
JP2006093428A true JP2006093428A (ja) 2006-04-06
JP2006093428A5 JP2006093428A5 (enExample) 2007-11-08

Family

ID=36098649

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004277496A Withdrawn JP2006093428A (ja) 2004-09-24 2004-09-24 温調チャンバおよびこれを用いた露光装置

Country Status (2)

Country Link
US (1) US7262830B2 (enExample)
JP (1) JP2006093428A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008311646A (ja) * 2007-06-13 2008-12-25 Asml Netherlands Bv 電子機器ラック及びそのような電子機器ラックを備えるリソグラフィ装置
JP2010192779A (ja) * 2009-02-20 2010-09-02 Orion Mach Co Ltd 冷却装置

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101960239B (zh) * 2008-09-02 2014-03-12 株式会社拉斯科 换热装置
JP5201612B2 (ja) * 2009-06-24 2013-06-05 Ｎｅｃディスプレイソリューションズ株式会社 光源装置およびこれを備えた投写型表示装置
US8596826B2 (en) * 2010-08-23 2013-12-03 Abl Ip Holding Llc Active cooling systems for optics
CN103256769B (zh) * 2012-02-20 2017-04-26 竞陆电子(昆山)有限公司 产热设备冬季用换热节能系统
US9331430B2 (en) 2013-10-18 2016-05-03 JTech Solutions, Inc. Enclosed power outlet
US10205283B2 (en) 2017-04-13 2019-02-12 JTech Solutions, Inc. Reduced cross-section enclosed power outlet
USD841592S1 (en) 2018-03-26 2019-02-26 JTech Solutions, Inc. Extendable outlet
USD843321S1 (en) 2018-03-26 2019-03-19 JTech Solutions, Inc. Extendable outlet
USD999742S1 (en) 2021-04-01 2023-09-26 JTech Solutions, Inc. Safety interlock outlet box
US12368293B2 (en) 2022-01-11 2025-07-22 JTech Solutions, Inc. Safety interlocks for outlets

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD160756A3 (de) * 1981-04-24 1984-02-29 Gudrun Dietz Anordnung zur verbesserung fotochemischer umsetzungsprozesse in fotoresistschichten
US4690528A (en) * 1983-10-05 1987-09-01 Nippon Kogaku K. K. Projection exposure apparatus
US6002987A (en) * 1996-03-26 1999-12-14 Nikon Corporation Methods to control the environment and exposure apparatus
JPH11329951A (ja) 1998-05-15 1999-11-30 Canon Inc 光源装置及び露光装置
JP2004128213A (ja) * 2002-10-02 2004-04-22 Canon Inc 温調システム及びそれを組み込んだ露光装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008311646A (ja) * 2007-06-13 2008-12-25 Asml Netherlands Bv 電子機器ラック及びそのような電子機器ラックを備えるリソグラフィ装置
JP2010192779A (ja) * 2009-02-20 2010-09-02 Orion Mach Co Ltd 冷却装置

Also Published As

Publication number Publication date
US7262830B2 (en) 2007-08-28
US20060066825A1 (en) 2006-03-30

Similar Documents

Publication Publication Date Title
JP2006093428A (ja) 温調チャンバおよびこれを用いた露光装置
KR100572098B1 (ko) 반사미러장치, 노광장치 및 디바이스제조방법
JP4737809B2 (ja) 半導体製造装置及び半導体製造方法
US6224248B1 (en) Light-source device and exposure apparatus
EP1521121B1 (en) Cooling technique
JP3954498B2 (ja) 排熱利用システム、排熱利用方法及び半導体製造設備
US7317505B2 (en) Exposure apparatus and device manufacturing method
JPH0845827A (ja) 投影露光装置及びそれを用いた半導体デバイスの製造方法
US20020124993A1 (en) Apparatus with air-conditioning system, and device manufacturing method using the same
US7319505B2 (en) Exposure apparatus and device fabrication method
US7652748B2 (en) Exposure apparatus and device manufacturing method
JP2004259829A (ja) プラズマ処理装置
JPH07142356A (ja) レジスト・パターン形成方法およびこれに用いるレジスト・パターン形成システム
JP2005197471A (ja) 基板処理装置及び温度調節方法
JPH10149970A (ja) 処理装置及びデバイス生産方法
JP2001244179A (ja) 温度調節装置を備えた露光装置およびデバイス製造方法
JP2004134566A (ja) デバイス製造装置
JP2001023890A (ja) 露光装置およびこれを用いたデバイス製造方法
JPH1116818A (ja) ベーキング装置
JP2023122431A (ja) 基板処理装置及び物品の製造方法
JP2005353967A (ja) 半導体製造装置
JP2006041251A (ja) 露光装置
JP3967606B2 (ja) 処理装置
JPH10125592A (ja) 温度制御装置及びその方法
JP2003007600A (ja) 基板処理装置及び基板処理装置の空調方法

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070925

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070925

RD01 Notification of change of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7421

Effective date: 20090406

A761 Written withdrawal of application

Free format text: JAPANESE INTERMEDIATE CODE: A761

Effective date: 20100129

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20100201