JP2006092717A - Manufacturing method and apparatus for glass substrate for magnetic recording medium - Google Patents
Manufacturing method and apparatus for glass substrate for magnetic recording medium Download PDFInfo
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- JP2006092717A JP2006092717A JP2005239660A JP2005239660A JP2006092717A JP 2006092717 A JP2006092717 A JP 2006092717A JP 2005239660 A JP2005239660 A JP 2005239660A JP 2005239660 A JP2005239660 A JP 2005239660A JP 2006092717 A JP2006092717 A JP 2006092717A
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- cleaning
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- recording medium
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- magnetic recording
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Abstract
Description
本発明は、磁気記録媒体用ガラス基板の製造方法および装置に関する。より詳しくは、本発明は、ガラス基板を研磨後、テクスチャー処理前に、洗浄を行うことからなる磁気記録媒体用ガラス基板の製造方法およびその装置に関する。 The present invention relates to a method and apparatus for manufacturing a glass substrate for a magnetic recording medium. More specifically, the present invention relates to a method for manufacturing a glass substrate for a magnetic recording medium and an apparatus therefor, comprising washing after the glass substrate is polished and before texture treatment.
ハードディスク等の磁気記録媒体に用いるためのガラス基板には、高度の平坦性や平滑性が求められる。そのため、ガラス基板は、その表面の研磨のための工程とそれに続く洗浄工程に付される。そして、これによって得られた磁気記録媒体用ガラス基板は、表面処理のためのテクスチャー工程に付される。 A glass substrate for use in a magnetic recording medium such as a hard disk is required to have a high degree of flatness and smoothness. Therefore, the glass substrate is subjected to a process for polishing the surface and a subsequent cleaning process. And the glass substrate for magnetic recording media obtained by this is attached | subjected to the texture process for surface treatment.
ガラス基板表面を効率よく研磨するためには、研磨剤として、酸化セリウムを酸化ジルコニウム等の研磨砥粒が用いられるが、これらの研磨砥粒はガラス表面に付着するという問題がある。そのため、研磨工程で付着した研磨砥粒やガラスの削り屑等を、テクスチャー処理の前に、洗浄により除去することが必要になる。 In order to polish the glass substrate surface efficiently, abrasive grains such as cerium oxide and zirconium oxide are used as an abrasive, but there is a problem that these abrasive grains adhere to the glass surface. Therefore, it is necessary to remove the abrasive grains and glass shavings adhering in the polishing step by washing before the texture treatment.
磁気記録媒体用ガラス基板の製造において、ガラス基板を蓚酸等の有機酸やフッ酸、硫酸、硝酸、燐酸、塩酸等の無機酸の水溶液または強アルカリ水溶液を用いて洗浄することは知られている(例えば、特許文献1〜3参照)。かかる洗浄は、一般に、洗浄槽を設置した洗浄装置内にその上部からクリーンエアを送り込みながら、研磨後のガラス基板を多数枚(通常約50〜100枚)まとめて洗浄用の基板キャリアに装填した状態で洗浄槽に充填された洗浄液中に浸漬し、所定時間後に洗浄槽から引き上げることにより行われる。この場合、かかる洗浄槽は通常洗浄装置内に複数槽が、場合によっては数槽から数十槽が設置され、洗浄液での洗浄や水洗が繰り返して行われるのが普通である。 In the production of a glass substrate for a magnetic recording medium, it is known to wash the glass substrate with an organic acid such as oxalic acid, an aqueous solution of an inorganic acid such as hydrofluoric acid, sulfuric acid, nitric acid, phosphoric acid, hydrochloric acid, or a strong alkaline aqueous solution. (For example, see Patent Documents 1 to 3). In general, such cleaning is performed by feeding a large number of polished glass substrates (usually about 50 to 100) into a cleaning substrate carrier while sending clean air from above into a cleaning apparatus provided with a cleaning tank. It is performed by immersing in a cleaning liquid filled in the cleaning tank in a state and pulling up from the cleaning tank after a predetermined time. In this case, such a cleaning tank is usually provided with a plurality of tanks in the cleaning apparatus, and in some cases several to several tens of tanks, and the cleaning with the cleaning liquid and the water washing are usually repeated.
しかるに、この場合、基板キャリアを1つの洗浄槽から引き上げて次の洗浄槽まで移送して再び浸漬を行うまでに相当の時間を要する場合があり、その間に基板表面が乾燥し、液中に含まれていた異物の粒子が凝集して処理中の基板の表面に新たな欠陥が発生することがある。 However, in this case, it may take a considerable time for the substrate carrier to be lifted from one cleaning tank, transferred to the next cleaning tank, and immersed again, during which time the substrate surface dries and is contained in the liquid. In some cases, the particles of the foreign matter that have been aggregated may cause new defects on the surface of the substrate being processed.
本発明は、ガラス基板を研磨後、洗浄液中に浸漬して洗浄するに当たり、処理中の基板に洗浄液の乾燥による新たな欠陥が生じるのを防止することのできる磁気記録媒体用ガラス基板の製造方法および装置を提供しようとするものである。 The present invention provides a method for producing a glass substrate for a magnetic recording medium, which can prevent a new defect caused by drying of the cleaning liquid on the substrate being processed when the glass substrate is polished and then immersed in the cleaning liquid for cleaning. And to provide a device.
本発明者らは、上記課題を解決するため鋭意検討の結果、ガラス基板の研磨後の洗浄液による浸漬洗浄する際に、洗浄液を収納する洗浄槽を設置した洗浄装置内を加湿することにより基板表面に新たに欠陥が生じるのを防止することができることを見出し、この知見に基づき本発明を完成させるに至ったものである。 As a result of intensive studies to solve the above-mentioned problems, the present inventors have determined that the surface of the substrate by humidifying the inside of the cleaning apparatus in which the cleaning tank for storing the cleaning liquid is installed when the glass substrate is immersed and cleaned with the cleaning liquid after polishing. The inventors have found that new defects can be prevented, and have completed the present invention based on this finding.
よって、本発明は、例えば、下記の事項からなる。 Therefore, this invention consists of the following matters, for example.
〔1〕 ガラス基板を研磨砥粒を用いて研磨した後、洗浄装置内に設置した洗浄槽中の洗浄液に浸漬して洗浄するに当たり、洗浄装置内を加湿して洗浄処理操作を行うことを特徴とする磁気記録媒体用ガラス基板の製造方法。 [1] After polishing a glass substrate with abrasive grains and then immersing it in a cleaning solution in a cleaning tank installed in the cleaning device, the cleaning device is humidified to perform a cleaning operation. A method for producing a glass substrate for a magnetic recording medium.
〔2〕 ガラス基板を研磨砥粒を用いて研磨した後、洗浄液に浸漬して洗浄するための洗浄液を含む洗浄槽が設置された洗浄装置内を加湿するための加湿装置を設けたことを特徴とする磁気記録媒体用ガラス基板の製造装置。 [2] A humidifying device for humidifying the inside of the cleaning device provided with a cleaning tank containing a cleaning solution for cleaning by immersing the glass substrate in the cleaning solution after polishing the glass substrate is provided. An apparatus for manufacturing a glass substrate for a magnetic recording medium.
本発明によれば、研磨後のガラス基板を洗浄するに当たり、基板表面に新たな欠陥を生じさせることなく磁気記録媒体用ガラス基板を製造することができる。 According to the present invention, a glass substrate for a magnetic recording medium can be produced without causing new defects on the substrate surface when cleaning the polished glass substrate.
以下、本発明の好ましい実施の形態につき説明する。ただし、これらの説明は本発明を実施する場合の好ましい例を具体的に説明することを主眼とするものであって、これによって本発明に何らの限定を加えようとするものではないことを理解されたい。 Hereinafter, preferred embodiments of the present invention will be described. However, it is understood that these explanations are intended to specifically describe preferred examples for carrying out the present invention, and are not intended to limit the present invention in any way. I want to be.
本発明においては、好ましくは、ガラス基板として通常の板状ガラスが用いられる。 In the present invention, an ordinary plate glass is preferably used as the glass substrate.
ガラス基板表面の研磨には、研磨剤として、酸化セリウムや酸化ジルコニウム、酸化アルミニウム、酸化珪素などの研磨砥粒を用いることができる。なかでも、研磨効率等の観点から、酸化セリウムからなる研磨砥粒を用いるのが好ましい。研磨剤は、これらの砥粒を水に懸濁させて懸濁液として用いられるのがよい。 For polishing the surface of the glass substrate, abrasive grains such as cerium oxide, zirconium oxide, aluminum oxide, and silicon oxide can be used as an abrasive. Among these, from the viewpoint of polishing efficiency and the like, it is preferable to use polishing abrasive grains made of cerium oxide. The abrasive is preferably used as a suspension by suspending these abrasive grains in water.
研磨されたガラス基板は、次いで、洗浄工程に付される。洗浄は、一般に、洗浄槽を設置した洗浄装置内にその上部からクリーンエアを送り込みながら、研磨後のガラス基板を多数枚(通常約50〜100枚)まとめて洗浄用の基板キャリアに装填した状態で洗浄槽に充填された洗浄液中に浸漬し、所定時間後に洗浄槽から引き上げることにより行われる。この場合、かかる洗浄槽は通常洗浄装置内に複数槽が、場合によっては数槽から数十槽が設置され、洗浄液での洗浄や水洗が繰り返して行われるのが普通である。 The polished glass substrate is then subjected to a cleaning process. Cleaning is generally performed by feeding a large number of polished glass substrates (usually about 50 to 100) onto a cleaning substrate carrier while sending clean air from above into a cleaning device with a cleaning tank. Is immersed in the cleaning liquid filled in the cleaning tank and pulled up from the cleaning tank after a predetermined time. In this case, such a cleaning tank is usually provided with a plurality of tanks in the cleaning apparatus, and in some cases several to several tens of tanks, and the cleaning with the cleaning liquid and the water washing are usually repeated.
本発明においては、かかる洗浄装置に加湿装置を設けて、洗浄装置内を加湿することを特徴とする。これによって、基板キャリアを1つの洗浄槽から引き上げて次の洗浄槽まで移送して再び浸漬を行うまでの間に基板表面が乾燥し、液中に含まれていた異物の粒子が凝集して処理中の基板の表面に新たな欠陥が発生することを防止するものである。 In the present invention, a humidifier is provided in such a cleaning device, and the inside of the cleaning device is humidified. As a result, the substrate surface is dried while the substrate carrier is pulled up from one cleaning tank, transferred to the next cleaning tank and dipped again, and foreign particles contained in the liquid are aggregated and processed. This prevents a new defect from occurring on the surface of the substrate inside.
加湿は、洗浄装置内の湿度が50〜99%となる程度に行われるのが好ましく、70〜90%であるのがさらに好ましい。 The humidification is preferably performed to such an extent that the humidity in the cleaning apparatus is 50 to 99%, and more preferably 70 to 90%.
本発明においては、洗浄液による浸漬洗浄を行う前に、ガラス基板は、通常のブラシスクラブ洗浄等の機械的洗浄に付されるのが好ましい。 In the present invention, the glass substrate is preferably subjected to mechanical cleaning such as normal brush scrub cleaning before performing immersion cleaning with the cleaning liquid.
本発明は、基板の研磨後の洗浄液による浸漬洗浄の間に基板表面に新たな欠陥を生じさせることなく磁気記録媒体用ガラス基板を製造することを可能にするので、産業上極めて有用である。 Since the present invention makes it possible to manufacture a glass substrate for a magnetic recording medium without causing new defects on the substrate surface during immersion cleaning with a cleaning liquid after polishing the substrate, it is extremely useful industrially.
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JP2005239660A JP2006092717A (en) | 2004-08-27 | 2005-08-22 | Manufacturing method and apparatus for glass substrate for magnetic recording medium |
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06178967A (en) * | 1992-12-15 | 1994-06-28 | Olympus Optical Co Ltd | Cleaning device |
JP2003141717A (en) * | 2001-10-31 | 2003-05-16 | Nippon Sheet Glass Co Ltd | Method of manufacturing glass substrate for information recording medium |
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06178967A (en) * | 1992-12-15 | 1994-06-28 | Olympus Optical Co Ltd | Cleaning device |
JP2003141717A (en) * | 2001-10-31 | 2003-05-16 | Nippon Sheet Glass Co Ltd | Method of manufacturing glass substrate for information recording medium |
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