JP2006091416A - Substrate for electrooptical device, electrooptical device, manufacturing method for substrate for electrooptical device, and electronic equipment - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate for an electrooptical device which can improve both color reproducibility and lightness of display with a simple structure by a simple method, a manufacturing method for the substrate for the electrooptical device, the electrooptical device, and electronic equipment using the electrooptical device. <P>SOLUTION: A scattering structure for scattering light emitted in a reflection region F is provided to scatter light emitted through a 1st region C corresponding to a colored region L wider than light emitted through a 2nd region D corresponding to a non-colored region K. When a coloring material of a transmission region E is used, for example, for a coloring material of the reflection region F, the light emitted through the 2nd region D corresponding to the non-colored region K is scattered narrower than the light emitted through the 1st region C corresponding to the colored region L and the scattered light becomes bright, thereby making the non-colored region K smaller correspondingly. Consequently, the colored region L becomes larger to improve color reproducibility. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a substrate for an electro-optical device used in a personal computer or a cellular phone, a method for manufacturing the substrate for the electro-optical device, an electro-optical device, and an electronic apparatus using the electro-optical device.

  2. Description of the Related Art Conventionally, there is an electro-optical device such as a liquid crystal display device as a display device of an electronic apparatus such as a personal computer or a cellular phone, and a reflective transflective liquid crystal display device using natural light, a backlight, or the like as a light source of the liquid crystal display device. There is.

  Further, for example, in a reflective transflective liquid crystal display device, reflection on the display screen may occur, and in order to prevent this, an uneven reflecting surface for scattering external light has been provided, The uneven reflective surface is not necessarily formed at random, which is insufficient for display quality of a reflective transflective liquid crystal display device.

In view of this, a method has been proposed for improving the display quality of a liquid crystal display device by forming the uneven reflecting surface in a more random and easy manner (see, for example, Patent Document 1).
Japanese Patent Laying-Open No. 2003-75987 (paragraphs [0007] to [0037], FIG. 13).

  However, the above method has made it possible to improve the display quality of the liquid crystal display device by making the shape of the uneven reflecting surface more random, but on the other hand, coloring on the reflective region in the liquid crystal display device such as a reflective transflective type There was a problem due to the difference between the optical path length of the layer and the optical path length of the colored layer on the transmission region.

  For example, if different color materials are used for the colored layer on the reflective region and the colored layer on the transmissive region, there is a problem that the manufacturing process increases, and the color material of the colored layer on the reflective region is used to solve the problem. The use of a coloring material for the colored layer on the transmissive region was also considered, but in this case, there was a problem that the colored layer on the reflective region was too dark.

  On the other hand, a region that is not colored in a part of the colored layer that is too dark and dark, for example, an opening that does not give color to light that has passed through the opening (hereinafter referred to as “non-colored region”). It was also conceivable to make the entire surface of the reflection area brighter by providing a light source.

  However, even though this method can increase the overall brightness on the reflective area, if the non-colored area is made too wide, there is a problem in that color reproducibility between the colored area and the colored area decreases. It was.

  The present invention has been made in view of the above-described problems, and is a substrate for an electro-optical device that can improve both color reproducibility and brightness during display with a simple structure and method, and the electro-optical device. An object of the present invention is to provide a manufacturing method of a substrate, an electro-optical device, and an electronic apparatus using the electro-optical device.

  In order to achieve the above object, an electro-optical device according to a main aspect of the present invention is provided in a sub-pixel of a first substrate and a second substrate that hold an electro-optical material therebetween, and the first substrate. A reflective region in which a transmissive region that transmits light and a reflective film that reflects light are formed; a colored layer formed in the transmissive region and the reflective region; and a colored layer that is provided in the reflective region and has the colored layer formed thereon A non-colored region, and a scattering structure for scattering emitted light is provided in the reflective region, and the light is emitted through a first region corresponding to the colored region where the colored layer is formed. The emitted light is scattered more widely than the light emitted through the second region corresponding to the non-colored region.

  Here, the “transmission region” refers to, for example, an opening formed in the reflective film. For example, the opening mentioned here is such that the reflection film remains in the opening so as to be thinner than the thickness of the other reflection film so that light can be transmitted, or the reflection film is not completely formed in the opening. It includes things. “Widely scattering” means, for example, a case where the reflection angle of reflected light from unevenness becomes large.

  The present invention provides a scattering structure for scattering the light emitted in the reflective region, and the light emitted through the first region corresponding to the colored region has a second region corresponding to the non-colored region. For example, even if a color material in the transmission region is used as the color material in the reflection region, a non-colored region can be provided to ensure the brightness of the color. The light emitted through the second region corresponding to the non-colored region is narrower than the light emitted through the first region corresponding to the colored region with respect to the decrease in color reproducibility due to the formation of the non-colored region. The scattered light becomes brighter and the non-colored area can be made smaller accordingly. As a result, the colored area is increased correspondingly, and the color reproducibility can be improved.

  According to an aspect of the present invention, a plurality of unevenness is formed as the scattering structure on the surface of the reflective film, and the plurality of unevenness is different between the first region and the second region. It is formed as follows. Accordingly, the average reflection angle of the reflected light emitted through the second region and the first region can be easily changed by changing the shape and density of the unevenness between the first region and the second region, for example. It is possible to make the average reflection angle of the reflected light emitted through the light source different from that of the non-colored region, and to make the emitted light brighter.

  According to an aspect of the present invention, the first substrate includes a scattering film formed to have a plurality of irregularities formed so as to be different between the first region and the second region. The plurality of projections and depressions of the reflective film are formed so as to correspond to the projections and depressions of the scattering film. Thus, for example, an unevenness as a scattering structure is first formed with an uneven shape of a scattering film, and a reflective film is formed thereon, and the uneven shape of the scattering film is reflected in the reflective film to make the unevenness in the reflective film. A shape can be formed.

  According to one aspect of the present invention, the average reflection angle of light due to the unevenness formed on the surface of the reflective film is greater in the second region than in the first region. The average reflection angle is formed so as to be smaller. Thereby, since the scattered light in the second region, that is, the non-colored region becomes bright, the non-colored region can be made smaller, and the color reproducibility of the entire colored layer is further improved.

  According to an aspect of the present invention, the average height difference of the unevenness formed on the surface of the reflective film is formed to be different between the first and second regions. As a result, the flatness is increased by reducing the average height difference of the unevenness in the second region, that is, the non-colored region, so that the reflected light is scattered in a narrow angle range and the scattered light becomes bright. The color reproducibility as the whole colored layer is further improved.

  According to one form of this invention, the average cross-sectional diameter of the unevenness | corrugation formed in the surface of the said reflecting film is formed so that it may differ in the said 1st area | region and 2nd area | region. Features. Accordingly, the flatness is increased by reducing the average cross-sectional diameter of the unevenness in the second region, that is, the non-colored region as compared with the first region, so that the reflected light is scattered in a narrow angle range and scattered light. Therefore, the non-colored area can be made smaller and the color reproducibility of the entire colored layer is further improved.

  According to an embodiment of the present invention, the average density of the unevenness formed on the surface of the reflective film is formed so as to be different between the first region and the second region. Accordingly, the flatness is increased by increasing the average density of, for example, the unevenness in the second region, that is, the non-colored region, as compared with the first region, so that the reflected light is scattered in a narrow angle range and the scattered light is Since it becomes bright, the non-colored area can be made smaller, and the color reproducibility of the entire colored layer is further improved.

  According to an aspect of the present invention, the shape of the unevenness formed on the surface of the reflective film is configured to be different between the first and second regions. Here, the “uneven shape” means, for example, a hemispherical shape or a pyramid shape. As a result, the unevenness formed in the first and second regions can be formed so that not only the average density and the average height difference but also the respective shapes themselves are different, and a wider variety of color reproducibility can be secured.

  An electro-optical device substrate according to another aspect of the present invention is formed on the substrate so as to have a plurality of irregularities that are different between the first and second regions in the subpixel. Corresponding to at least the first and second areas of the reflection area on the scattering film, a transmission area that transmits light, a reflection area that reflects light, and a reflection area provided in the sub-pixel. A reflection film formed to have a plurality of projections and depressions corresponding to the plurality of projections and depressions of the scattering film in the region, and a coloring region corresponding to the first region in the reflection region and the transmission region And a non-colored region provided so as to correspond to the second region at least in the reflective region.

  In the present invention, a plurality of scattering films are formed in a scattering film formed so as to have a plurality of irregularities that are different in the first and second regions, and in a region corresponding to the first and second regions of the reflection region. A reflective film formed to have a plurality of projections and depressions corresponding to the projections and depressions, a colored layer formed to have a colored region corresponding to the first region in the reflective region and the transmission region, and at least reflective Since the region includes a non-colored region provided so as to correspond to the second region, for example, even if the color material of the transmissive region is used as the color material of the reflective region, the non-colored region is provided. The light emitted through the second region corresponding to the non-colored region is emitted from the first region corresponding to the colored region with respect to the decrease in color reproducibility due to the formation of the non-colored region. Can be scattered more narrowly than the light emitted through the region That. As a result, the scattered light in the second region becomes brighter, the non-colored region can be made smaller by that amount, and the colored region is increased by that amount, thereby improving the color reproducibility.

  A method for manufacturing a substrate for an electro-optical device according to another aspect of the present invention includes a substrate in which a plurality of sub-pixels are defined and capable of holding an electro-optical material, and a transmission region that transmits light provided in the sub-pixels And a method of manufacturing a substrate for an electro-optical device having a reflective region for reflecting light, a step of applying a photosensitive resin on the substrate, and exposing and developing the photosensitive resin through a mask A step of forming a scattering film having a plurality of irregularities different between the first region and the second region in the sub-pixel, and at least the reflection region of the reflection region on the scattering film in the sub-pixel. Forming a reflective film so as to have a plurality of irregularities corresponding to a plurality of irregularities of the scattering film in a region corresponding to the first and second regions, and at least the reflection region and the transmission region, In the reflective region, the second And a step of forming a colored layer so as to provide a colored region corresponding to the first region while avoiding a non-colored region corresponding to the region, and the mask corresponds to a plurality of irregularities of the scattering film. It is provided with a plurality of light transmitting parts or light shielding parts, and the size of the light transmitting part or light shielding part in the first region is larger than the size of the light transmitting part or light shielding part in the second region. Features.

  The present invention includes a plurality of light-transmitting portions or light-shielding portions corresponding to the plurality of unevennesses of the scattering film, and the size of the light-transmitting portion or the light-shielding portion in the first region is the light-transmitting portion in the second region. A step of forming a scattering film having a plurality of unevenness in the first region and the second region by exposing and developing through a mask larger than the size of the light part or the light shielding part, and on the scattering film; Forming a reflective film so as to have a plurality of irregularities corresponding to the plurality of irregularities of the scattering film in at least a region corresponding to the first and second regions of the reflective region; and at least the reflective region And the step of forming the colored layer so as to provide the colored region corresponding to the first region while avoiding the non-colored region corresponding to the second region. The region having a plurality of irregularities that are different between the region and the second region A film can be formed, for example, the light emitted through the second region corresponding to the non-colored region can be scattered more narrowly than the light emitted through the first region corresponding to the colored region It becomes. Accordingly, the scattered light in the second region becomes brighter, the non-colored region can be made smaller by that amount, and the colored region is increased by that amount, thereby providing a liquid crystal display substrate with improved color reproducibility. Is possible.

  A method for manufacturing a substrate for an electro-optical device according to another aspect of the present invention includes a substrate in which a plurality of sub-pixels are defined and capable of holding an electro-optical material, and a transmission region that transmits light provided in the sub-pixels And a method of manufacturing a substrate for an electro-optical device having a reflective region for reflecting light, a step of applying a photosensitive resin on the substrate, and exposing and developing the photosensitive resin through a mask A step of forming a scattering film having a plurality of irregularities different between the first region and the second region in the sub-pixel, and at least the reflection region of the reflection region on the scattering film in the sub-pixel. Forming a reflective film so as to have a plurality of irregularities corresponding to a plurality of irregularities of the scattering film in a region corresponding to the first and second regions, and at least the reflection region and the transmission region, In the reflective region, the second And a step of forming a colored layer so as to provide a colored region corresponding to the first region while avoiding a non-colored region corresponding to the region, and the mask corresponds to a plurality of irregularities of the scattering film. A light transmitting portion or a light shielding portion, and an average density of the light transmitting portion or the light shielding portion in the first region is smaller than an average density of the light transmitting portion or the light shielding portion in the second region. Features.

  The present invention includes a plurality of light transmitting portions or light shielding portions corresponding to a plurality of irregularities of the scattering film, and the average density of the light transmitting portions or the light shielding portions in the first region is the average in the second region. A step of forming a scattering film having a plurality of irregularities different between the first region and the second region by exposing and developing through a mask having a lower density, and at least the reflection region on the scattering film; Forming a reflective film so as to have a plurality of irregularities corresponding to the plurality of irregularities of the scattering film in a region corresponding to the first and second regions, and at least the second region in the reflective region And a step of forming a colored layer so as to provide a colored region corresponding to the first region while avoiding a non-colored region corresponding to the first region and the second region. And forming a reflective film having a plurality of unevenness Can be, for example, light emitted through the second region corresponding to the non-colored area, through a first area corresponding to the colored region it is possible to scatter narrower than the light emitted. Accordingly, the scattered light in the second region becomes brighter, the non-colored region can be made smaller by that amount, and the colored region is increased by that amount, thereby providing a liquid crystal display substrate with improved color reproducibility. Is possible.

  An electronic apparatus according to another aspect of the invention includes the above-described electro-optical device.

  Since the present invention includes an electro-optical device that can achieve both color reproducibility and brightness during display with a simple structure and method, the reliability of the performance of the electronic apparatus can be easily increased.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following description of the embodiments, a liquid crystal display device as an example of an electro-optical device, specifically, an active matrix type liquid crystal using a reflective semi-transmissive type TFD (thin film diode) that is a two-terminal type switching element. Although a display device and an electronic apparatus using the liquid crystal display device will be described, the present invention is not limited to this. Moreover, in the following drawings, in order to make each structure easy to understand, the actual structure and the scale and number of each structure are different.

  (First embodiment)

  1 is a schematic exploded perspective view of a liquid crystal panel constituting a liquid crystal display device according to a first embodiment of the present invention, FIG. 2 is a schematic plan view of a counter substrate side of the liquid crystal panel, and FIG. 3 is an AA in FIG. FIG. 4 is a schematic partial cross-sectional view for explaining the difference in the scattering structure.

  (Configuration of liquid crystal display device)

  The liquid crystal display device 1 includes, for example, a liquid crystal panel 2, an illumination device 3 that emits light to the liquid crystal panel 2, and a circuit board (not shown) connected to the liquid crystal panel 2 as shown in FIGS. 1, 2, and 3. Other incidental mechanisms are attached as necessary.

  As shown in FIGS. 1, 2 and 3, the liquid crystal panel 2 includes a color filter substrate 4 and a counter substrate 5 which are opposite substrates, and the color filter substrate 4 and the counter substrate 5 are provided with a sealing material (not shown). And a liquid crystal layer 6 which is an electro-optical material, for example, a TN (Twist Nematic) type liquid crystal, which is bonded to each other and sealed in a gap between both substrates.

  Here, the color filter substrate 4 includes a first substrate 7 which is a transparent liquid crystal display device substrate formed of a glass plate or a synthetic resin plate, and the counter substrate 5 faces the color filter substrate 4. A second substrate 8 which is a substrate for a transparent liquid crystal display device formed from a glass plate or a synthetic resin plate is used as a body. Further, a phase difference plate 9 and a polarizing plate 10 are arranged on the opposite side of the first substrate 7 from the liquid crystal layer 6, and similarly, a phase difference plate 11 and a polarizing plate 12 are arranged on the opposite side of the second substrate 8 from the liquid crystal layer 6. Is arranged.

  As shown in FIGS. 1 and 3, the color filter substrate 4 has a scattering film 13 formed on the surface of the first substrate 7 on the liquid crystal layer side, and the scattering film 13 has a reflection area that is a light transmission region described later. A reflection film 14 having a film opening and a light shielding layer 15 for shielding light are formed. Further, a colored layer 16 having a colored layer opening, which is a non-colored area, which will be described later, is formed in a region separated by the light shielding layer 15 on the liquid crystal layer side of the reflective film 14 including the reflective film opening. Yes. As a result, the colored layer 16 is directly laminated on the scattering film 13 in the reflection film opening.

  The color filter substrate 4 is formed with an overcoat layer 17 that protects the surfaces of the colored layer 16 and the light shielding layer 15 so as to cover the surfaces of the colored layer 16 and the light shielding layer 15. A scanning electrode 18 made of a transparent conductor such as ITO (indium tin oxide) is formed on the liquid crystal layer 17 side. An alignment film 19 made of, for example, polyimide resin is formed on the liquid crystal layer side of the scanning electrode 18.

  Here, the scattering film 13 is made of a resin material, and has a fine scattering structure having, for example, unevenness as shown in FIGS. 1 and 3 on its surface. The scattering structure 13 is formed on the surface in a sub-pixel described later. Have first and second regions C and D different from each other. Further, the second region D is formed so that the first and second regions C and D overlap in a plane with the colored layer opening of the colored layer 16, and the first region is formed in the other regions of the scattering film 13. Region C is formed.

  Specifically, for example, as shown in FIG. 4A, the first and second regions C and D having different scattering structures have a second difference from the average height difference of the irregularities formed in the first region C. The unevenness formed in the region D is formed so as to have a smaller average height difference.

  Further, the reflecting film 14 is a single metal film such as aluminum or silver, and the scattering film 13 is covered with the reflecting film 14 at the approximate center of each sub-pixel as shown in FIGS. 1, 2 and 3, for example. A substantially rectangular reflection film opening 20 that is not formed is formed, and a region of the reflection film opening 20 is a transmission region E.

  Further, as shown in FIGS. 2 and 3, a reflection region F for reflecting light incident from the outside is formed by the reflection film 14 around the reflection film opening 20. Accordingly, light incident from the first substrate 7 such as a backlight described later can be transmitted from the transmission region E to the liquid crystal layer 6 and external light can be reflected by the reflection region F.

  Note that the reflective film opening 20 is not limited to this example, and may be, for example, a circular hole, a plurality of holes, or a substantially central portion. Thereby, the best display quality can be provided by various liquid crystal display devices 1.

  Further, for example, as shown in FIGS. 1, 3, and 4, the reflecting film 14 has the scattering structure of the scattering film reflected substantially as it is on the surface of the reflecting film 14 due to the unevenness of the scattering structure on the surface of the scattering film.

  Specifically, the reflective film 14 is formed on the first region C in the regions on the first and second regions C and D having different scattering structures as shown in FIG. 4A, for example. The average height difference (H1 in FIG. 4A) of the unevenness on the surface of the reflective film formed on the second region D is greater than the average height difference of the surface unevenness (G1 in FIG. 4A). It is formed to be small (G1> H1).

  Thereby, the unevenness | corrugation of the reflective film surface on a 2nd area | region is planarized entirely, and the average reflection angle (J1 in FIG. 4A) of the light reflected by the unevenness | corrugation is reflection on a 1st area | region. The average reflection angle due to the unevenness of the film surface (I1 in FIG. 4A) becomes smaller (I1> J1), and the scattering becomes narrower. Therefore, the reflected light in the second region D is reflected in the first region. Brighter than the reflected light, the color intensity of the reflected light can be adjusted without changing the size of the non-colored area of the colored layer 16 to be described later, and the overall color reproducibility can be adjusted to the most suitable state. It becomes.

  The colored layer 16 is formed so as to cover the transmissive region E and the reflective region F around the transmissive region by applying a negative photosensitive resin containing a coloring material such as a pigment or a dye, for example. The primary color filter is composed of one of three colors such as R (red) 16R, G (green) 16G, and B (blue) 16B.

  Further, the colored layer 16 has a colored layer opening 21 formed in the approximate center of each sub-pixel on the reflective region F as shown in FIGS. 1, 3, and 4, for example. 21 is the non-colored region K. Thereby, for example, even if the color material on the reflective area F is the same as the color material on the transmissive area E and the light reflected by the reflective area F becomes darker and darker than the light transmitted by the transmissive area E, The brightness as a whole can be improved by the bright light obtained from the non-colored region K.

  Further, the non-colored region K is formed so as to overlap the second region D of the scattering film 13 in a planar manner, for example, as compared with the scattering structure of the first region C as shown in FIG. If the average height difference H1 of the unevenness is reduced, the scattering can be narrowed, and the brightness of light from that region can be further increased.

  For example, the colored layer 16 is a region on the reflective region F that gives a predetermined color to light corresponding to the first region C of the scattering film 13 as shown in FIGS. 1, 2, 3, and 4, for example. The colored region L is formed around the non-colored region K.

  1 and 2 adopt the stripe arrangement as the arrangement pattern of the colored layer 16, but is not limited to this, and may be, for example, an oblique mosaic arrangement or a digital arrangement.

  The light shielding layer 15 is for shielding the boundary region between the sub-pixels, and the longitudinal direction (X direction in FIG. 2) of the scanning electrode 18 of the first substrate 7 and the direction intersecting with the boundary region. For example, as shown in FIG. 3, the colored layer 16B is disposed in the lowermost layer, and the colored layer 16R and the colored layer 16G are in that order. To form.

  Further, the overcoat layer 17 is formed so as to cover the colored layer 16 and the light shielding layer 15 as shown in FIGS. 1 and 3, for example. Thereby, for example, the overcoat layer 17 enters the colored layer opening 21 which is the non-colored region K. The overcoat layer 17 is formed of, for example, silicon oxide, titanium oxide, or a mixture thereof.

  Further, the scanning electrode 18 is formed in a strip shape extending in a predetermined direction (X direction in FIGS. 1, 2 and 3), and a plurality of scanning electrodes 18 are formed in a stripe shape in parallel with each other.

  Further, the alignment film 19 is an organic thin film such as polyimide, and is subjected to a rubbing process to define the alignment state of the liquid crystal layer 6.

  Next, the counter substrate 5 includes, for example, a plurality of pixel electrodes 22 arranged in a matrix on the surface of the second substrate 8 on the liquid crystal layer side, as shown in FIGS. In the region, a plurality of data lines 23 extending in a band shape in a direction intersecting the above-described scanning electrode 18 (Y direction in FIG. 2), and the pixel electrode 22 and the TFD 24 electrically connected to the data line 23 are arranged. An alignment film 25 is formed on the liquid crystal layer side.

  Here, the pixel electrode 22 is formed of, for example, a transparent conductor such as ITO, and a region specified by the scanning electrode 18 and the pixel electrode 22 is a sub-pixel 26.

  Further, the TFD 24 is formed on the base layer 27 formed on the surface of the second substrate 8 as shown in FIG. 3, for example, and is formed on the surface of the first metal film 28 and the first metal film 28. And the second metal film 30 formed on the insulating film 29.

  The first metal film 28 is formed of, for example, a Ta single film or a Ta alloy film having a thickness of about 100 to 500 nm, and is electrically connected to the data line 23.

  The insulating film 29 is made of, for example, tantalum oxide having a thickness of about 10 to 35 nm. The second metal film 30 is formed with a thickness of about 50 to 300 nm by a metal film such as chromium (Cr), and is electrically connected to the pixel electrode 22.

  Further, the alignment film 25 is an organic thin film similar to the alignment film 19 of the first substrate 7 and is subjected to a rubbing process.

  Next, for example, as shown in FIG. 3, the illumination device 3 includes a light source (not shown), a light guide plate 31, two prism sheets 32 and 33, a diffusion sheet 34, a reflection sheet 35, and the like.

  Here, for example, an LED (Light Emitting Diode) is used as the light source, the light guide plate 31 irradiates the entire diffusion sheet 34 with light emitted from the light source, and the prism sheets 32 and 33 are provided from the light guide plate 31. The brightness of the emitted light is improved.

  Further, the reflection sheet 35 returns light emitted from the side surface opposite to the first substrate 7 of the light guide plate 31 to the light guide plate 31 so that the light can be used effectively.

  In the above description, the scattering structure such as the scattering film 13 and the reflection film 14 having unevenness has been described as having both concave and convex portions as shown in FIG. 4A. However, the scattering structure is not limited to this. For example, as shown in FIGS. 4B and 4C, only a convex portion or a concave portion may be provided on a planar surface.

  Even in this case, for example, the reflection film 14 has an average height difference of the unevenness on the surface of the reflection film formed on the first region C in the regions on the first and second regions C and D having different scattering structures (see FIG. The average height difference (H2 in FIGS. 4B and 4C) of the unevenness of the surface of the reflective film formed on the second region D is smaller than G2 in 4B and 4C (G2). > H2).

  Thereby, the unevenness on the surface of the reflective film on the second region is flattened as a whole, and the average reflection angle (J2 in the figure) of the light reflected by the unevenness is the unevenness on the surface of the reflective film on the first region. Is smaller than the average reflection angle (I2 in FIGS. 4B and 4C) (I2> J2), and the scattering is narrowed, so that the reflected light in the second region D is reflected by the first region. It becomes brighter than light and the color intensity of the reflected light can be adjusted without changing the size of the non-colored area of the colored layer 16, and the overall color reproducibility can be adjusted to the most suitable state.

  Of course, the scattering structure is not limited to the shapes shown in FIGS. 4 (a), 4 (b), and 4 (c).

  (Manufacturing method of liquid crystal display device)

  Next, a manufacturing method of the liquid crystal display device 1 will be described focusing on the scattering film.

  FIG. 5 is a flowchart of a manufacturing process of the liquid crystal display device, FIG. 6 is a schematic plan view of an exposure mask for one subpixel, FIG. 7 is a schematic partial sectional view for explaining the manufacturing process of the scattering film, and FIG. It is a general | schematic fragmentary sectional view for demonstrating the manufacturing process of a film | membrane and a colored layer.

  First, as shown in FIG. 5, for example, a negative photosensitive resin 36 for a scattering film is uniformly applied on the first substrate 7 by spin coating or the like as shown in FIG. 7A (ST101).

  Then, exposure is performed as shown in FIG. 7B from the top of the halftone mask 37 corresponding to the stripe arrangement of the sub-pixels 26, and further development is performed, for example, as shown in FIG. A scattering film 13 having a scattering structure different from that of the second region D is formed (ST102).

  Here, for example, as shown in FIG. 6A, in the halftone mask 37, in a region corresponding to one sub-pixel 26, a half-exposure region M in which the amount of light shielding is about half that of a normal mask and its surroundings are usually present. A normal exposure region N having a light-shielding amount is formed, the first region C of the scattering film 13 corresponds to the normal exposure region N, and the second region D corresponds to the half exposure region M. Yes.

  As a result, the photosensitive resin 36 in the second region D receives less light than the photosensitive resin 36 in the first region C as shown in FIG. After the development, as shown in FIG. 7C, the second region D has a smaller average height difference than the unevenness of the first region C and is flattened, so that the scattering is narrowed.

  Next, aluminum or the like is formed into a thin film by a vapor deposition method, a sputtering method, or the like on the scattering film 13 in which the unevenness as shown in FIG. By forming a film and patterning it using a photolithography method, for example, as shown in FIGS. 2 and 3, a rectangular reflection film opening 20 that is a transmission region E is provided at the approximate center of each sub-pixel 26. At the same time, a reflective film 14 having a reflective region F around it is formed as shown in FIG. 8A (ST103).

  At this time, for example, as shown in FIGS. 1, 3, and 4, the reflecting film 14 reflects the scattering structure of the scattering film on the surface of the reflecting film 14 as it is due to the unevenness of the scattering structure on the surface of the scattering film.

  Specifically, the reflective film 14 is formed on the first region C in the regions on the first and second regions C and D having different scattering structures as shown in FIG. 4A, for example. The average height difference (H1 in FIG. 4A) of the unevenness on the surface of the reflective film formed on the second region D is greater than the average height difference of the surface unevenness (G1 in FIG. 4A). It is formed to be small (G1> H1).

  Thereby, the unevenness | corrugation of the reflective film surface on a 2nd area | region is planarized entirely, and the average reflection angle (J1 in FIG. 4A) of the light reflected by the unevenness | corrugation is reflection on a 1st area | region. The average reflection angle due to the unevenness of the film surface (I1 in FIG. 4A) becomes smaller (I1> J1), and the scattering becomes narrower. Therefore, the reflected light in the second region D is reflected in the first region. It becomes brighter than the reflected light, the color intensity of the reflected light can be adjusted without changing the size of the non-colored area of the colored layer 16, and the overall color reproducibility can be adjusted to the most suitable state. .

  Further, a negative photosensitive resin 38 in which, for example, a blue photosensitive coloring material among three colors is dispersed is applied on the formed reflective film 14 by spin coating or the like as shown in FIG. 8B. Then, the blue colored layer 16B provided with the colored layer openings 21 as shown in FIG. 8C is formed by exposure and development (ST104). In addition, the colored layer 16B is also formed in the portion that becomes the light shielding layer 15. By repeating this step ST104 in the same manner as the red colored layer 16R and the green colored layer 16G, the three-color colored layer 16 is finally formed. Further, the light shielding layer 15 is also provided with a three-color colored layer so that light can be shielded.

  Next, the overcoat layer 17 is formed on the three-colored colored layer 16 and the light shielding layer 15 formed in the third ST104 (ST105).

  Further, ITO or the like, which is a material for the scanning electrode 18, is deposited on the overcoat layer 17 formed in ST105 by sputtering, and patterned by photolithography, as shown in FIG. 1, FIG. 2, and FIG. The scanning electrodes 18 are formed in a stripe shape with a predetermined width in the X-axis direction. Further, the alignment film 19 is formed on the scan electrode 18, and a rubbing process is performed to complete the manufacture on the first substrate side (ST106).

  Next, the TFD 24, the data line 23, and the pixel electrode 22 are formed on the second substrate 8 (ST107).

  Here, the TFD 24 is formed by depositing Ta oxide or the like on the second substrate 8 with a uniform thickness to form the underlayer 27, and depositing Ta or the like on the second substrate 8 with a uniform thickness by sputtering. The data line 23 and the first metal film 28 are simultaneously formed by photolithography. At this time, the data line 23 and the first metal film 28 are connected by a bridge.

  Further, an insulating film 29 having a uniform thickness is formed on the first metal film 28 to form an insulating film 29, and Cr is further formed on the first metal film 28 by a sputtering method so as to have a uniform thickness. Then, the second metal film 30 is formed using a photolithography method.

  Further, after removing the base layer 27 in the region where the pixel electrode 22 is to be formed, ITO is deposited to a uniform thickness by sputtering or the like, and a pixel having a predetermined shape close to the size of one sub-pixel by photolithography or the like. The electrode 22 is formed so as to partially overlap the second metal film 30. Through the series of processes, the TFD 24 and the pixel electrode 22 are formed. Further, an alignment film 25 is formed thereon, and a rubbing process is performed to complete the manufacture on the second substrate side (ST108).

  Next, a gap material (not shown) is sprayed on the alignment film 25 on the second substrate side by dry spraying or the like, and the above-described first substrate 7 and second substrate 8 are bonded together via a sealing material (ST109). ). Thereafter, liquid crystal is injected from the opening of the sealing material (ST110), and the opening of the sealing material is sealed with a sealing material such as an ultraviolet curable resin. Further, the retardation plates 9 and 11 and the polarizing plates 10 and 12 are attached to the outer surfaces of the first substrate 7 and the second substrate 8 by a method such as sticking (ST111).

  Finally, necessary wiring, illumination device 3, case body and the like are attached, and liquid crystal display device 1 is completed (ST112).

  Above, description of the manufacturing method of the liquid crystal display device 1 is complete | finished.

  In the above description, the negative type photosensitive resin 36 is used to form the scattering film 13, but the present invention is not limited to this. For example, a positive type photosensitive resin may be used.

  In this case, the mask used for exposure is a mask on which a pattern in which the black circle in FIG. 6A and its background are reversed is formed.

  (Operation of liquid crystal display)

  Next, the operation of the liquid crystal display device 1 configured as described above will be briefly described focusing on the progress of light.

  First, when a scanning signal is supplied to the scanning electrode 18 formed on the first substrate 7 and a data signal is supplied from the data line 23 to the predetermined pixel electrode 22 via the TFD 24 formed on the second substrate 8. Only the liquid crystal held in the region where the predetermined scanning electrode 18 and the predetermined pixel electrode 22 face each other can be driven.

  Therefore, for example, as shown in FIG. 3, the external light transmitted through the second substrate 8 and the pixel electrode 22 and incident on the liquid crystal layer 6 is optically modulated for each sub-pixel 26 by the liquid crystal layer 6, and the overcoat layer 17 is formed. When it passes through and enters the colored layer 16 (16B) in the colored region L, it is colored by the colored layer 16 and reflected by the reflective film 14 in the reflective region F. Thereafter, it passes through the colored layer 16 and the overcoat layer 17 in the colored region L again, passes through the pixel electrode 22 and the second substrate 8, and is emitted from the display screen.

  On the other hand, when entering the non-colored region K, it passes through the overcoat layer 17 and is not colored by the colored layer 16 but is reflected by the reflective film 14 in the reflective region F. Thereafter, it passes through the non-colored region K of the overcoat layer 17 again, passes through the pixel electrode 22 and the second substrate 8, and is emitted from the display screen.

  Therefore, the light reflected from the non-colored region K can increase the brightness of the entire colored layer 16 without a decrease in brightness due to coloring.

  The light emitted from the illumination device 3 passes through the first substrate 7 and the reflective film opening 20 which is the reflective film 14 in the transmissive region E, passes through the colored layer 16 and the overcoat layer 17, and the liquid crystal layer 6. Then, the liquid crystal layer 6 modulates the light for each sub-pixel 26, passes through the pixel electrode 22 and the second substrate 8, and is emitted from the display screen.

  Above, description of operation | movement of the liquid crystal display device 1 is complete | finished.

  As described above, according to the present embodiment, the scattering structure for scattering the light emitted in the reflective region F is provided, and the light emitted through the first region C corresponding to the colored region L is non-colored. Since the light is scattered more widely than the light emitted through the second region D corresponding to the region K, for example, even if the color material of the transmission region E is used as the color material of the reflection region F, the non-colored region K can ensure the brightness of the color and the light emitted through the second region D corresponding to the non-colored region K against the decrease in color reproducibility due to the formation of the non-colored region K, The light scattered through the first region C corresponding to the colored region L is more narrowly scattered and the scattered light becomes brighter, and the non-colored region K can be reduced accordingly. As a result, the colored region L is increased correspondingly, and the color reproducibility can be improved.

  Further, the reflection film 14 has an average reflection angle of light on at least one of the irregularities formed on the surface thereof, and the average reflection angle on the second region as compared with the average reflection angle on the first region. Since the angle is smaller, the scattered light in the second region D, that is, the non-colored region K becomes brighter, so the non-colored region K can be made smaller. Color reproducibility is further improved.

  Further, the reflection film 14 is formed so that the average height difference of at least one of the irregularities formed on the surface thereof is smaller on the second region than on the first region. Since the flatness on the area, that is, the non-colored area K is increased, the reflected light is scattered in a narrow angle range and the scattered light becomes brighter, so the non-colored area can be made smaller, and the color reproducibility of the entire colored layer is further improved. To do.

  In addition, since the difference in level of the unevenness between the first and second regions is simultaneously formed using, for example, the halftone mask 37, the manufacturing process can be reduced and the cost can be reduced.

  (Second Embodiment)

  Next, a second embodiment of the liquid crystal display device according to the present invention will be described. This embodiment is different from the first embodiment in that the difference in scattering structure between the first and second regions of the scattering film of the liquid crystal display device is that the average cross-sectional diameter in the planar direction of the unevenness is different. The explanation will focus on the points. In addition, about the component which is common in the component of 1st Embodiment, the code | symbol same as the component of 1st Embodiment is attached | subjected, and the description is abbreviate | omitted.

  FIG. 9 is a schematic partial cross-sectional view illustrating the scattering structure of the liquid crystal display device according to the second embodiment of the present invention.

  (Configuration of liquid crystal display device)

  The liquid crystal display device 101 includes, for example, a liquid crystal panel 102, an illuminating device 3 that emits light to the liquid crystal panel 102, a circuit board (not shown) connected to the liquid crystal panel 102, as shown in FIGS. Other incidental mechanisms are attached as necessary.

  As shown in FIGS. 1, 2 and 3, the liquid crystal panel 102 includes a color filter substrate 104 and a counter substrate 5 which are opposite substrates, and the color filter substrate 104 and the counter substrate 5 are provided with a sealing material (not shown). And a liquid crystal layer 6 which is an electro-optical material, for example, a TN (Twist Nematic) type liquid crystal, which is bonded to each other and sealed in a gap between both substrates.

  Here, the color filter substrate 104 includes a first substrate 7 which is a substrate for a transparent liquid crystal display device formed of a glass plate or a synthetic resin plate, and the counter substrate 5 faces the color filter substrate 4. A second substrate 8 which is a substrate for a transparent liquid crystal display device formed from a glass plate or a synthetic resin plate is used as a body.

  As shown in FIGS. 1 and 3, the color filter substrate 104 has a scattering film 113 formed on the surface of the first substrate 7 on the liquid crystal layer side, and the surface of the scattering film 113 is for a reflection film that is a light transmission region. A reflective film 114 having an opening and a light shielding layer 15 that shields light are formed. Further, on the liquid crystal layer side of the reflective film 114 including the reflective film opening, a colored layer 16 having a colored layer opening which is a non-colored area is formed in a region separated by the light shielding layer 15. As a result, the colored layer 16 is directly laminated on the scattering film 113 in the reflection film opening.

  The color filter substrate 104 is formed with an overcoat layer 17 that protects the surfaces of the colored layer 16 and the light shielding layer 15 so as to cover the surfaces of the colored layer 16 and the light shielding layer 15, and further the overcoat layer. A scanning electrode 18 made of a transparent conductor such as ITO (indium tin oxide) is formed on the liquid crystal layer 17 side. An alignment film 19 made of, for example, polyimide resin is formed on the liquid crystal layer side of the scanning electrode 18.

  Here, the scattering film 113 is made of a resin material, and a scattering structure having fine irregularities, for example, is formed on the surface thereof as shown in FIGS. 1 and 3, and the scattering structure is different on the surface in the sub-pixel. And have first and second regions C and D. Further, the second region D is formed so that the first and second regions C and D overlap in a planar manner with the colored layer opening of the colored layer 16, and the first region is formed in the other regions of the scattering film 113. Region C is formed.

  Specifically, for example, as shown in FIG. 9, the first and second regions C and D having different scattering structures are in the planar direction of the unevenness formed in the first region C (the Y-axis direction in FIG. 9). The average cross-sectional diameter in the plane direction (Y-axis direction in FIG. 9) of the irregularities formed in the second region D is smaller than the average cross-sectional diameter (average cross-sectional diameter).

  Further, the reflective film 114 is a single metal film such as aluminum or silver, and the scattering film 113 is covered by the reflective film 114 at the approximate center of each sub-pixel as shown in FIGS. 1, 2, and 3, for example. A substantially rectangular reflection film opening 20 that is not formed is formed, and a region of the reflection film opening 20 is a transmission region E.

  As shown in FIGS. 2 and 3, a reflection region F that reflects light incident from the outside is formed by the reflection film 114 around the reflection film opening 20. Accordingly, light incident from the first substrate 7 such as a backlight can be transmitted from the transmission region E to the liquid crystal layer 6 and external light can be reflected by the reflection region F.

  Further, for example, as shown in FIGS. 1, 3, and 9, the reflection film 114 reflects the scattering structure of the scattering film substantially as it is on the surface of the reflection film 114 due to the unevenness of the scattering structure on the surface of the scattering film.

  Specifically, the reflective film 114 has unevenness on the surface of the reflective film formed on the first region C in the regions on the first and second regions C and D having different scattering structures as shown in FIG. Plane direction of the reflecting film formed on the second region D (average cross-sectional diameter) (O in FIG. 9) in the plane direction (Y-axis direction in FIG. 9) 9, the average cross-sectional diameter (P in FIG. 9) in the Y-axis direction) is smaller (O> P).

  As a result, the unevenness on the surface of the reflective film on the second region is flattened as a whole, and the average reflection angle (R1 in FIG. 9) of the light reflected by the unevenness is that of the surface of the reflective film on the first region. The average reflection angle due to the unevenness (Q1 in FIG. 9) becomes smaller (Q1> R1) and the scattering becomes narrower, so the reflected light in the second region D becomes brighter than the reflected light in the first region, The color intensity of the reflected light can be adjusted without changing the size of the non-colored region K of the colored layer 16, and the overall color reproducibility can be adjusted to the most suitable state.

  In the above description, the scattering structure such as the uneven scattering film 113 and the reflection film 114 has been described as having a concave portion and a convex portion as shown in FIG. 9, but the scattering structure is not limited to this. Alternatively, for example, as shown in FIGS. 4B and 4C, only a convex portion or a concave portion may be provided on the planar surface.

  (Manufacturing method of liquid crystal display device)

  Next, a manufacturing method of the liquid crystal display device 101 will be described focusing on the scattering film.

  FIG. 10 is a schematic partial cross-sectional view for explaining the manufacturing process of the scattering film.

  First, as shown in FIG. 5, for example, a negative photosensitive resin 36 for a scattering film is uniformly applied on the first substrate 7 by, for example, spin coating as shown in FIG. 10A (ST101).

  Then, exposure is performed as shown in FIG. 10B from a mask 137 as shown in FIG. 6B according to the stripe arrangement of the sub-pixels 26, and further development is performed, for example, as shown in FIG. 10C. In addition, the scattering film 113 having a different scattering structure is formed in the first region C and the second region D (ST102).

  Here, for example, as shown in FIG. 6B, the mask 137 has an average cross-sectional diameter in the plane direction in the first region C of the scattering film 113 in the region corresponding to one sub-pixel 26. The light shielding pattern is formed so as to be larger than the average cross-sectional diameter in the plane direction at D (non-colored region K).

  That is, as shown in FIG. 6B, the size of the light-shielding portion indicated by a black circle in the area of the mask 137 corresponding to the first area C is the area of the mask 137 corresponding to the second area D. It is formed larger than the size of the light shielding portion indicated by the black circle. In the figure, the light shielding pattern is represented by a black circle, but it is actually formed more finely and the shape is not limited to the black circle.

  Next, a thin film of aluminum or the like is deposited on the scattering film 113 having unevenness as shown in FIG. 10C, for example, by vapor deposition or sputtering, on the first region C and the second region D. By forming a film in the shape of a film and patterning it using a photolithography method, for example, as shown in FIG. 2 and FIG. 20 and a reflection film 114 having a reflection region F around it is formed (ST103).

  At this time, for example, as shown in FIGS. 1, 3, and 9, the reflection film 114 reflects the scattering structure of the scattering film 113 almost as it is on the surface of the reflection film 114 due to the unevenness of the scattering structure on the surface of the scattering film. .

  Since it is the same as that of the manufacturing method of 1st Embodiment until ST111 below, the description is abbreviate | omitted.

  Finally, necessary wiring, illumination device 3, case body, and the like are attached, and liquid crystal display device 101 is completed (ST112).

  Above, description of the manufacturing method of the liquid crystal display device 1 is complete | finished.

  In the above description, the negative photosensitive resin 36 is used to form the scattering film 113, but the present invention is not limited to this. For example, a positive photosensitive resin may be used.

  Further, the mask used for exposure is not limited to FIG. 6B, and for example, a mask formed with a pattern in which the black circle in FIG. 6B and its background are reversed may be used. In this case, for example, a mask having a plurality of round holes is received. The through hole pattern is formed so that the size of the through hole portion in the region corresponding to the first region C is larger than the size in the second region D.

  (Operation of liquid crystal display)

  Next, since the operation of the liquid crystal display device 101 configured as described above is substantially the same as the operation of the liquid crystal display device 1 of the first embodiment, the description thereof is omitted.

  As described above, according to the present embodiment, the reflective film 114 is formed so that the average cross-sectional diameter in the planar direction of the unevenness formed on the surface thereof is different between the first and second regions C and D. Therefore, for example, the average cross-sectional diameter of the unevenness in the second region, that is, the non-colored region K is smaller than that in the first region, and the flatness is increased, and the reflected light on the surface has a narrow angle. Since the scattered light is scattered in the range and the scattered light becomes bright, the non-colored region K can be made smaller, and the color reproducibility of the entire colored layer is further improved. Further, the color reproducibility can be adjusted by making the average cross-sectional diameters of the scattering structures of the first and second regions C and D of the scattering film 113 different regardless of the shape of the colored layer 16.

  Furthermore, a plurality of light transmitting portions or light shielding portions corresponding to the plurality of unevennesses of the scattering film 113 are provided, and the size of the light transmitting portions or light shielding portions in the first region C is the same as that in the second region D. Since the exposure and development are performed through a mask larger than the size of the light part or the light-shielding part, it is very easy to form the scattering film 113 having a plurality of unevenness in the first region C and the second region D. can do.

  (Modification)

  Next, a modification of the liquid crystal display device according to the present invention will be described. In this modification, the difference in the scattering structure between the first and second regions of the scattering film of the liquid crystal display device is different from the first embodiment in that the average density of the unevenness is different. explain. In addition, about the component which is common in the component of 1st Embodiment, the code | symbol same as the component of 1st Embodiment is attached | subjected, and the description is abbreviate | omitted.

  FIG. 11 is a schematic partial cross-sectional view illustrating the scattering structure of this modification.

  (Structure of the liquid crystal display device)

  As shown in FIGS. 1 and 3, a scattering film 213 is formed on the surface of the first substrate 7 on the liquid crystal layer side, and the scattering film is formed on the liquid crystal panel 202 of the liquid crystal display device 201 which is the liquid crystal display device of this modification. As shown in FIGS. 1 and 3, a fine scattering structure having, for example, a convex portion is formed on the surface of 213, and the first and second regions C, D.

  In addition, the second region D is formed so that the first and second regions C and D of the scattering film 213 are planarly overlapped with the coloring layer opening 21 of the coloring layer 16, and the other scattering films 213 of the scattering layer 213 are formed. A first region C is formed in the region.

  Specifically, for example, as shown in FIG. 11, the first and second regions C and D having different scattering structures are changed to the second region D by the average density of the convex portions formed in the first region C. It is formed so that the average density of the formed protrusions is larger.

  Further, for example, as shown in FIGS. 1, 3, and 11, the reflecting film 214 reflects the scattering structure of the scattering film on the surface of the reflecting film 214 as it is due to the unevenness of the scattering structure on the surface of the scattering film.

  Specifically, the reflective film 214 is formed on the first and second regions C and D having different scattering structures as shown in FIG. The average density of the convex portions 215 on the surface of the reflective film formed on the second region D is larger than the average density of the portions 215.

  As a result, the unevenness on the surface of the reflective film on the second region is flattened as a whole, and the average reflection angle (R2 in FIG. 11) of the light reflected by the unevenness is that of the surface of the reflective film on the first region. The average reflection angle due to the unevenness (Q2 in FIG. 11) becomes smaller (Q2> R2) and the scattering becomes narrower, so the reflected light in the second region D becomes brighter than the reflected light in the first region, The color intensity of the reflected light can be adjusted without changing the size of the non-colored region K of the colored layer 16, and the overall color reproducibility can be adjusted to the most suitable state.

  In the above description, the scattering structure is considered based on the density of the projections, but the present invention is not limited to this. For example, the density of the depressions and projections may be used.

  (Manufacturing method of liquid crystal display device)

  Next, a manufacturing method of the liquid crystal display device 201 will be described focusing on the scattering film.

  First, as shown in FIG. 5, a positive photosensitive resin 36 for a scattering film is uniformly applied on the first substrate 7 by, for example, spin coating (ST101).

  Then, by exposing and developing the mask 237 as shown in FIG. 6C according to the stripe arrangement of the sub-pixels 26, for example, the first region C and the second region D have different scattering structures. A scattering film 213 is formed (ST102).

  Here, in the mask 237, for example, as shown in FIG. 6C, in the region corresponding to one sub-pixel 26, the average density in the first region C of the scattering film 213 is the second region D (non-colored). The light shielding pattern is formed so as to be smaller than the average density in the region K).

  That is, as shown in FIG. 6C, the average density of the light-shielding portions indicated by black circles in the area of the mask 237 corresponding to the first area C is the area of the mask 237 corresponding to the second area D. It is formed smaller than the average density of the light-shielding portions indicated by black circles. In the figure, the light shielding pattern is represented by a black circle, but it is actually formed more finely and the shape is not limited to the black circle.

  Next, aluminum or the like is formed into a thin film by a vapor deposition method, a sputtering method, or the like on a scattering film 213 in which unevenness is formed in the first region and the second region, for example, with unevenness formed thereon, and photolithography is performed thereon. By patterning using the method, for example, as shown in FIGS. 2 and 3, a rectangular reflection film opening 20 as a transmission region E is provided at the approximate center of each sub-pixel 26, and the reflection region is formed around the rectangular reflection film opening 20. A reflective film 214 having F is formed (ST103).

  At this time, for example, as shown in FIGS. 1, 3, and 11, the reflecting film 214 reflects the scattering structure of the scattering film on the surface of the reflecting film 214 substantially as it is due to the unevenness of the scattering structure on the surface of the scattering film.

  Since it is the same as that of the manufacturing method of 1st Embodiment until ST111 below, the description is abbreviate | omitted.

  Finally, necessary wiring, lighting device 3, case body and the like are attached, and liquid crystal display device 201 is completed (ST112).

  Above, description of the manufacturing method of the liquid crystal display device 1 is complete | finished.

  In the above description, the positive photosensitive resin 36 is used to form the scattering film 213, but the present invention is not limited to this. For example, a negative photosensitive resin may be used. In this case, the scattering structure is considered by the density of the recesses.

  Further, the mask used for the exposure is not limited to FIG. 6C, and for example, a mask in which a pattern in which the black circle in FIG. 6C and its background are reversed is formed may be used. In this case, for example, a mask having a plurality of round holes is received. The through hole pattern is formed so that the average density in the region corresponding to the first region C is smaller than the average density in the second region D.

  (Operation of liquid crystal display)

  Next, since the operation of the liquid crystal display device 201 configured as described above is substantially the same as the operation of the liquid crystal display device 1 of the first embodiment, the description thereof is omitted.

  As described above, according to the present modification, the flatness is increased by increasing the average density of, for example, the convex portions 215 in the second region, that is, in the non-colored region K, as compared with the first region. Since the reflected light is scattered in a narrow angle range and the scattered light becomes bright, the non-colored region can be made smaller, and the color reproducibility of the entire colored layer is further improved. Further, the color reproducibility can be adjusted by making the average cross-sectional diameters of the scattering structures of the first and second regions C and D of the scattering film 213 different regardless of the shape of the colored layer 16.

  In addition, a plurality of light transmitting portions or light shielding portions corresponding to the plurality of irregularities of the scattering film 213 are provided, and the average density of the light transmitting portions or light shielding portions in the first region C is the average in the second region D. Since the exposure and development are performed through a mask having a smaller density, the scattering film 213 having a plurality of irregularities that are different in the first region C and the second region D can be formed very easily.

  (Third Embodiment / Electronic Device)

  Next, an electronic apparatus according to the third embodiment of the present invention including the liquid crystal display devices 1, 101, 201 described above will be described. In addition, about the component which is common in the component of 1st Embodiment, 2nd Embodiment, and a modification, the code | symbol same as the component of 1st Embodiment, 2nd Embodiment, and a modification is attached | subjected. The description is omitted.

  FIG. 12 is a schematic configuration diagram showing an overall configuration of a display control system of an electronic apparatus according to the third embodiment of the present invention.

  The electronic device 300 includes, for example, a liquid crystal panel 2 and a display control circuit 390 as a display control system as shown in FIG. 12. The display control circuit 390 includes a display information output source 391, a display information processing circuit 392, a power supply circuit 393, and the like. A timing generator 394 and the like are included.

  Further, the liquid crystal panel 2 has a drive circuit 361 for driving the display area S.

  The display information output source 391 includes a memory such as a ROM (Read Only Memory) or a RAM (Random Access Memory), a storage unit such as a magnetic recording disk or an optical recording disk, and a tuning circuit that tunes and outputs a digital image signal. It has. Further, the display information output source 391 is configured to supply display information to the display information processing circuit 392 in the form of a predetermined format image signal or the like based on various clock signals generated by the timing generator 394.

  The display information processing circuit 392 includes various well-known circuits such as a serial-parallel conversion circuit, an amplification / inversion circuit, a rotation circuit, a gamma correction circuit, and a clamp circuit, and executes processing of input display information to display the image. Information is supplied to the drive circuit 361 together with the clock signal CLK. The power supply circuit 393 supplies a predetermined voltage to each component described above.

  As described above, according to the present embodiment, the electronic device 300 is provided with the scattering structure for scattering the light emitted in the reflection region F of the liquid crystal panel 2, for example, and the first region C corresponding to the coloring region L is provided. The light emitted through the second region D is scattered more widely than the light emitted through the second region D corresponding to the non-colored region K. Even if the color material is used, the non-colored region K can be provided to ensure the brightness of the color and the second color corresponding to the non-colored region K against the decrease in color reproducibility due to the formation of the non-colored region K. The light emitted through the region D is scattered more narrowly than the light emitted through the first region C corresponding to the colored region L, the scattered light becomes brighter, and the non-colored region K can be reduced accordingly. It becomes possible. As a result, the colored region L is increased correspondingly, and the color reproducibility can be improved.

  In particular, recent electronic devices are required to exhibit a low-cost and high-quality display function, and it can be said that the present invention that provides a high display quality at a low cost is significant.

  Specific electronic equipment includes touch panels, projectors, liquid crystal televisions, viewfinder type, monitor direct view type video tape recorders, car navigation systems, pagers, electronic notebooks that are equipped with liquid crystal display devices in addition to mobile phones and personal computers. Calculators, word processors, workstations, videophones, POS terminals and the like. Needless to say, for example, the above-described liquid crystal display devices 1, 101, and 201 can be applied as display units of these various electronic devices.

  Note that the electro-optical device and the electronic apparatus of the present invention are not limited to the above-described examples, and it is needless to say that various modifications can be made without departing from the gist of the present invention. In addition, the above embodiments can be combined without departing from the scope of the present invention.

  Although the present invention has been described above with the preferred embodiment, the present invention is not limited to any of the above-described embodiments, and can be implemented with appropriate modifications within the scope of the technical idea of the present invention.

  For example, in the above-described embodiments and modifications, the thin film diode element active matrix type liquid crystal display device has been described. However, the present invention is not limited to this. For example, the thin film transistor element active matrix type and passive matrix type liquid crystal display devices may be used. Good. As a result, it is possible to improve both the color reproducibility and brightness when displaying a variety of liquid crystal display devices with a simple structure and method.

  Moreover, in the above-described embodiment and modification, for example, the average height difference such as unevenness, the average cross-sectional diameter, and the average density in the first and second regions are separately made different as the scattering structure, but the present invention is not limited to this. For example, the average reflection angle of the reflected light from the first region C may be larger than the average reflection angle of the reflected light from the second region D by combining the average height difference and the average cross-sectional diameter or average density. . As a result, it is possible to improve both the color reproducibility and brightness when displaying a variety of liquid crystal display devices with a simple structure and method. Further, the average reflection angle of the reflected light from the first region C may be made larger than the average reflection angle of the reflected light from the second region D by changing the shape of the unevenness. Further, the unevenness on the surface of the reflective film may be formed using other means such as a shot blasting method or a pressing method.

  The scattering structure of the reflective region includes a transparent resin in a region corresponding to the reflective region and a light scattering film made of a scattering material dispersed in the transparent resin, and the light scattering film corresponds to a region corresponding to the non-colored region. A structure having different scattering characteristics may be used in the region corresponding to the colored region. In this case, the reflected light of the region corresponding to the non-colored region is scattered narrowly (strong directivity), and the reflected light of the region corresponding to the colored region is widely scattered (low directivity).

  Furthermore, in the above-described embodiment and modification, one circular shape is provided for each subpixel as the colored layer opening 21 that is the non-colored region K. However, the present invention is not limited to this and may be, for example, a plurality. The shape may be rectangular or polygonal. As a result, it is possible to improve both color reproducibility and brightness during display with a simple structure and method for a wider variety of liquid crystal display devices, and color unevenness in color reproducibility occurs. The possibility can be further reduced. In addition, as a colored layer opening, a structure in which a colored layer is simply not present in the reflective region, or a colored layer having a smaller thickness than other regions is disposed in the colored layer opening. It may be a structure. Even in the openings formed in the reflective film, there is simply a structure where there is no reflective film in the reflective area, or a reflective film that is thin enough to transmit light is disposed in the reflective film opening. It may be a structure.

1 is a schematic exploded perspective view of a liquid crystal panel according to a first embodiment. It is a schematic plan view by the side of the opposing board | substrate of the liquid crystal panel which concerns on 1st Embodiment. It is a schematic sectional drawing of the AA line and BB line in FIG. It is a general | schematic fragmentary sectional view explaining the difference of the scattering structure which concerns on 1st Embodiment. It is a flowchart figure of the manufacturing process of the liquid crystal display device which concerns on 1st Embodiment. It is a schematic plan view of the exposure mask for one subpixel. It is a schematic fragmentary sectional view of the manufacturing process of the scattering film concerning a 1st embodiment. It is a schematic fragmentary sectional view for demonstrating the manufacturing process of a reflecting film and a colored layer. It is a general | schematic fragmentary sectional view explaining the scattering structure which concerns on 2nd Embodiment. It is a schematic fragmentary sectional view of the manufacturing process of the scattering film concerning a 2nd embodiment. It is a general | schematic fragmentary sectional view explaining the scattering structure of a modification. It is a schematic block diagram of the display control system of the electronic device which concerns on 3rd Embodiment.

Explanation of symbols

  1, 101, 201 Liquid crystal display device, 2, 102, 202 Liquid crystal panel, 3 Illumination device, 4, 104, 204 Color filter substrate, 5 Counter substrate, 6 Liquid crystal layer, 7 First substrate, 8 Second substrate, 9, 11 retardation plate, 10, 12 polarizing plate, 13, 113, 213 scattering film, 14, 114, 214 reflecting film, 15 light shielding layer, 16 colored layer, 17 overcoat layer, 18 scan electrode, 19, 25, orientation Film, 20 reflective film opening, 21 colored layer opening, 22 pixel electrode, 23 data line, 24 TFD, 26 subpixel, 27 underlayer, 28 first metal film, 29 insulating film, 30 second metal film , 31 Light guide plate, 32, 33 Prism sheet, 34 Diffusion sheet, 35 Reflective sheet, 36, 38 Photosensitive resin, 37 C -Tone mask, 137,237 mask, 215 convex portion, 300 electronic device, 361 drive circuit, 390 display control circuit, C first region, D second region, E transmission region, F reflection region, G1, G2, H1, H2 average height difference, I1, I2, J1, J2, Q1, Q2, R1, R2 average reflection angle, K non-colored area, L colored area, M half-exposure area, N normal exposure area, O, P average cross-sectional diameter

Claims (12)

A first substrate and a second substrate holding an electro-optic material therebetween;
A reflective region on the first substrate, in which a transmissive region that transmits light provided in the sub-pixel and a reflective film that reflects light are formed;
A colored layer formed in the transmissive region and the reflective region;
A non-colored region provided in the reflective region, wherein the colored layer is not formed,
In the reflection region, a scattering structure for scattering emitted light is provided, and the light emitted through the first region corresponding to the colored region where the colored layer is formed is the non-colored region. An electro-optical device that scatters more widely than the light emitted through the second region corresponding to. On the surface of the reflective film, a plurality of irregularities are formed as the scattering structure,
The electro-optical device according to claim 1, wherein the plurality of irregularities are formed so as to be different between the first region and the second region. The first substrate comprises a scattering film formed to have a plurality of irregularities formed so as to be different between the first region and the second region,
The electro-optical device according to claim 2, wherein the plurality of projections and depressions of the reflection film are formed to correspond to the projections and depressions of the scattering film.   The average reflection angle of light due to the unevenness formed on the surface of the reflection film is smaller in the average reflection angle in the second region than in the first region. The electro-optical device according to claim 2, wherein the electro-optical device is formed as described above.   The average height difference of the unevenness formed on the surface of the reflective film is formed so as to be different between the first and second regions. The electro-optical device according to one item.   The average cross-sectional diameter in the planar direction of the unevenness formed on the surface of the reflective film is formed so as to be different between the first region and the second region. The electro-optical device according to any one of the above.   The average density of the unevenness formed on the surface of the reflection film is formed so as to be different between the first region and the second region. The electro-optical device according to claim 1.   The uneven shape formed on the surface of the reflective film is configured to be different between the first and second regions. 8. The electro-optical device according to 1. A substrate,
A scattering film formed on the substrate so as to have a plurality of projections and depressions that are different between the first and second regions in the sub-pixel;
A transmissive region that transmits light and a reflective region that reflects light provided in the sub-pixel;
A reflection film formed on the scattering film so as to have a plurality of irregularities corresponding to the plurality of irregularities of the scattering film in at least a region corresponding to the first and second regions of the reflection region;
A colored layer formed to have a colored region corresponding to the first region in the reflective region and the transmissive region;
An electro-optical device substrate comprising: a non-colored region provided so as to correspond to the second region at least in the reflective region. Manufacture of an electro-optical device substrate comprising a substrate in which a plurality of sub-pixels are defined and capable of holding an electro-optical material, a transmission region that transmits light provided in the sub-pixels, and a reflection region that reflects light In the method
Applying a photosensitive resin on the substrate;
Forming a scattering film having a plurality of projections and depressions different between the first region and the second region in the sub-pixel by exposing and developing the photosensitive resin through a mask; and
A reflective film is formed on the scattering film in the sub-pixel so as to have a plurality of irregularities corresponding to the plurality of irregularities of the scattering film in at least a region corresponding to the first and second regions of the reflective region. Forming a film;
A colored layer is formed in the reflective region and the transmissive region so as to provide a colored region corresponding to the first region while avoiding a non-colored region corresponding to the second region in at least the reflective region. Comprising steps,
The mask includes a plurality of light-transmitting portions or light-shielding portions corresponding to the plurality of unevennesses of the scattering film, and the size of the light-transmitting portion or the light-shielding portion in the first region is the second region. A method of manufacturing a substrate for an electro-optical device, wherein the size is larger than the size of the light transmitting portion or the light shielding portion. Manufacture of an electro-optical device substrate comprising a substrate in which a plurality of sub-pixels are defined and capable of holding an electro-optical material, a transmission region that transmits light provided in the sub-pixels, and a reflection region that reflects light In the method
Applying a photosensitive resin on the substrate;
Forming a scattering film having a plurality of projections and depressions different between the first region and the second region in the sub-pixel by exposing and developing the photosensitive resin through a mask; and
A reflective film is formed on the scattering film in the sub-pixel so as to have a plurality of irregularities corresponding to the plurality of irregularities of the scattering film in at least a region corresponding to the first and second regions of the reflective region. Forming a film;
A colored layer is formed in the reflective region and the transmissive region so as to provide a colored region corresponding to the first region while avoiding a non-colored region corresponding to the second region in at least the reflective region. Comprising steps,
The mask includes a plurality of light-transmitting portions or light-shielding portions corresponding to the plurality of irregularities of the scattering film, and an average density of the light-transmitting portions or the light-shielding portions in the first region is the second region. A method for manufacturing a substrate for an electro-optical device, wherein the density is smaller than an average density of the light transmitting portion or the light shielding portion.   An electronic apparatus comprising the electro-optical device according to any one of claims 1 to 8.

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