JP2006088260A - Method of perforating flexible resin substrate with adhesive layer - Google Patents
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- JP2006088260A JP2006088260A JP2004275488A JP2004275488A JP2006088260A JP 2006088260 A JP2006088260 A JP 2006088260A JP 2004275488 A JP2004275488 A JP 2004275488A JP 2004275488 A JP2004275488 A JP 2004275488A JP 2006088260 A JP2006088260 A JP 2006088260A
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Abstract
Description
本発明は、金属補強板を接合した半導体パッケージを得るために使用され、接着剤層が付与されたフレキシブル樹脂基板に、穴開け加工をする方法に関する。 The present invention relates to a method for punching a flexible resin substrate that is used to obtain a semiconductor package having a metal reinforcing plate bonded thereto and provided with an adhesive layer.
半導体装置などの電子デバイスの小型化、またはそれを組み付ける各種電子機器の小型化および薄型化を計るために、半導体パッケージにフレキシブル基板やTAB(Tape Automated Bonding)実装式薄型パッケージが用いられる。該半導体パッケージの基材としては、例えばテープなどの所望の形状で、ポリイミドなどよりなるフレキシブル樹脂基板が使用される。しかし、フレキシブル樹脂基板は、半導体チップやその他の電子部品を、その上に平坦性良く搭載できないという問題がある。 In order to reduce the size and thickness of electronic devices such as semiconductor devices or various electronic devices to which they are assembled, flexible substrates and TAB (Tape Automated Bonding) mounted thin packages are used as semiconductor packages. As a base material of the semiconductor package, for example, a flexible resin substrate made of polyimide or the like in a desired shape such as a tape is used. However, the flexible resin substrate has a problem that a semiconductor chip or other electronic components cannot be mounted on the flexible resin substrate with good flatness.
また、近年の多ピン化および高密度化に伴い、半導体パッケージの回路基板への実装が、従来のQFP(Quad Flat Package)を代表とする周辺リード型実装より、BGA(Ball Grid Array)に代表される格子端子配置型実装へと移行し、BGAの基材としても、前述のフレキシブル樹脂基板が広く使用されるようになってきている。 Also, with the recent increase in pin count and density, the mounting of semiconductor packages on circuit boards is more representative of BGA (Ball Grid Array) than the conventional lead-type mounting represented by QFP (Quad Flat Package). Accordingly, the above-described flexible resin substrate has been widely used as a base material for BGA.
格子端子配置型実装の場合、格子状に配置した半田ボールにより、マザーボードのような回路基板と半導体パッケージとのコンタクトを行う。このため、BGA半導体パッケージには、従来のQFP半導体パッケージ等以上に、良好な平坦性が求められる。なお、フレキシブル樹脂基板を用いたBGA半導体パッケージを、一般に、T−BGA(Tape-BGA)と呼ぶ。 In the case of grid terminal arrangement type mounting, a circuit board such as a mother board and a semiconductor package are contacted by solder balls arranged in a grid pattern. For this reason, the BGA semiconductor package is required to have better flatness than the conventional QFP semiconductor package or the like. A BGA semiconductor package using a flexible resin substrate is generally called T-BGA (Tape-BGA).
以上のように、電子部品をフレキシブル樹脂基板に搭載する場合に、良好な平坦性を付与するために、フレキシブル樹脂基板に金属補強板等を接合している。この接合は、通常、接着剤層を付与することにより行われ、接着剤としては、アクリル系感圧タイプ、エポキシ系熱硬化タイプ、ポリイミド系熱可塑タイプ等から、半導体パッケージに求められる種類や目的に応じて、適宜、選定されている。 As described above, when an electronic component is mounted on a flexible resin substrate, a metal reinforcing plate or the like is joined to the flexible resin substrate in order to provide good flatness. This bonding is usually performed by applying an adhesive layer. As the adhesive, the types and purposes required of semiconductor packages from acrylic pressure-sensitive types, epoxy-based thermosetting types, polyimide-based thermoplastic types, etc. Is selected as appropriate.
以下に、T−BGA用配線基板の製造方法の一例の概要を示す。 Below, the outline | summary of an example of the manufacturing method of the wiring board for T-BGA is shown.
(1)樹脂基板としてポリイミドテープを用い、ポリイミドテープの片面に接着剤を層状にラミネートする。 (1) A polyimide tape is used as a resin substrate, and an adhesive is laminated on one side of the polyimide tape in layers.
(2)得られた接着剤層の上に、銅箔をラミネートする。 (2) A copper foil is laminated on the obtained adhesive layer.
(3)銅箔の表面にレジスト層を設け、所望のパターンを有するマスクを用いてパターニングし、エッチングマスクを作成し、銅箔の露出している部分を溶解除去し、残存するレジスト層を除去して、配線部を形成する。 (3) A resist layer is provided on the surface of the copper foil, patterning is performed using a mask having a desired pattern, an etching mask is created, the exposed portion of the copper foil is dissolved and removed, and the remaining resist layer is removed. Then, a wiring part is formed.
(4)得られた配線部の所望部に所望のメッキを施した後、ソルダーレジスト層を設ける。 (4) A desired resist portion of the obtained wiring portion is plated, and then a solder resist layer is provided.
(5)配線部に対して反対側のポリイミドテープの表面に、接着剤を層状に設け、ロールラミネータ等で圧力および温度をかけながら、得られた接着剤層を接合する。 (5) Adhesive is provided in layers on the surface of the polyimide tape opposite to the wiring portion, and the obtained adhesive layer is joined while applying pressure and temperature with a roll laminator or the like.
(6)半導体チップを収納するためのデバイスホールや、パターン周辺部に必要な穴を、パンチおよびダイからなるプレス機を用いて、開ける。 (6) A device hole for housing the semiconductor chip and a hole necessary for the peripheral portion of the pattern are opened using a press machine including a punch and a die.
(7)所定の大きさに切断し、前記(5)で得られた接着剤層に所定の大きさの金属補強板などを貼り合わせることにより、T−BGA用配線基板を完成させる。あるいは、デバイスホール等を設けた後、前記(5)で得られた接着剤層に金属補強板などを貼り合わせた後、所定の大きさに切断することにより、T−BGA用配線基板を完成させる。 (7) A T-BGA wiring board is completed by cutting into a predetermined size and attaching a metal reinforcing plate or the like of a predetermined size to the adhesive layer obtained in (5). Alternatively, after providing a device hole or the like, a metal reinforcing plate or the like is bonded to the adhesive layer obtained in (5) above, and then cut into a predetermined size to complete a T-BGA wiring board. Let
なお、T−BGA用配線基板の他の製造方法として、前記(5)〜(7)の代わりに、金属補強板の表面に接着剤層を設けておき、前記(1)〜(4)で得られた配線部を形成済みの樹脂基板と接合する場合もある。 In addition, as another manufacturing method of the wiring board for T-BGA, an adhesive layer is provided on the surface of the metal reinforcing plate instead of the above (5) to (7), and the above (1) to (4) The obtained wiring part may be joined to a resin substrate that has been formed.
前記(5)のように、樹脂基板と金属補強板との貼り合わせ用に設けられる接着剤層には、ロールラミネート等で圧力および温度をかけ、前記(6)のように、半導体チップを収納するためのデバイスホールや、パターン周辺部に必要な穴を、プレスにより開けたり、所定の大きさに切断する。この際、接着剤層は、ポリイミドフィルムなどの樹脂基板と比較して、極めて柔らかいので、接着剤層に切断不良が生じやすく、樹脂基板の被切断面にバリが発生したり、あるいは該被切断面にバリ屑といった付着物が発生するといった問題がある。 As described in (5) above, pressure and temperature are applied to the adhesive layer provided for bonding the resin substrate and the metal reinforcing plate by roll lamination or the like, and the semiconductor chip is stored as in (6) above. Device holes to be used and holes required in the periphery of the pattern are formed by pressing or cut into a predetermined size. At this time, the adhesive layer is extremely soft compared to a resin substrate such as a polyimide film, so that the adhesive layer is liable to be cut poorly, and burrs are generated on the cut surface of the resin substrate. There is a problem that deposits such as burrs are generated on the surface.
このような問題の対策として、例えば、特開2000−6096号公報等には、付着物を吸引除去する装置が記載されているが、接着剤等を含むバリ屑の除去は難しく、また、装置が大がかりで、運用および保守に費用がかかるという問題があった。 As a countermeasure against such a problem, for example, Japanese Patent Application Laid-Open No. 2000-6096 discloses an apparatus for removing the adhering matter by suction, but it is difficult to remove burrs including an adhesive and the like. However, there was a problem that operation and maintenance were expensive.
本発明は、接着剤層が付与されたフレキシブル樹脂基板に連続的に穴開け加工または切断加工をする際において、接着剤層に切断不良が生じず、バリ屑といった付着物が発生しない方法を提供することを目的とする。 The present invention provides a method in which, when continuously drilling or cutting a flexible resin substrate provided with an adhesive layer, the adhesive layer does not have cutting defects and does not generate deposits such as burrs. The purpose is to do.
本発明の方法は、パンチおよびダイからなるプレス機を用いて、接着剤層が付与されたフレキシブル樹脂基板に連続的に穴開け加工をする方法であり、該パンチによる前記樹脂基板の切断完了点から、前記ダイの挿通穴におけるパンチの下死点までの距離を、0.5mm〜1.0mmとする。 The method of the present invention is a method of continuously drilling a flexible resin substrate provided with an adhesive layer using a press machine comprising a punch and a die, and the cutting completion point of the resin substrate by the punch The distance from the bottom dead center of the punch in the insertion hole of the die to 0.5 mm to 1.0 mm.
さらに、所定の打ち抜き回数後、前記切断完了点からパンチの下死点までの距離を長くすることにより、ダイの挿通穴の中に残存している切断物をパンチにより除去することが望ましい。 Furthermore, it is desirable to remove the cut material remaining in the insertion hole of the die with the punch by increasing the distance from the cutting completion point to the bottom dead center of the punch after a predetermined number of punches.
本発明により、接着剤層が付与されたフレキシブル樹脂基板に連続的に穴開け加工または切断加工をする際に、接着剤層に切断不良が生じず、樹脂基板の被切断面にバリが生じたり、またはバリ屑などが付着することを防止できる。 According to the present invention, when the flexible resin substrate provided with the adhesive layer is continuously drilled or cut, the adhesive layer does not have a cutting failure, and the cut surface of the resin substrate has a burr. , Or burrs can be prevented from adhering.
切断不良によるバリは、基本的に、金型の切れ刃の状態、およびダイとパンチのクリアランスにより、発生する。すなわち、適正なクリアランスを確保できれば、あるいは、リグラインドなどにより切れ刃の状態を適正に保持できれば、問題のない良好な状態に維持することが可能である。 Burr due to defective cutting basically occurs due to the state of the cutting edge of the mold and the clearance between the die and the punch. In other words, if a proper clearance can be secured, or if the state of the cutting edge can be properly maintained by regrinding or the like, it is possible to maintain a good state with no problems.
しかし、樹脂基板の被切断面へのバリ屑の付着は、本発明者の観察によれば、パンチ下降時にパンチ側面によって削り取られた接着剤がパンチ側面に付着し、パンチ上昇時に該被切断面に再付着することにより発生することが判明した。従って、バリ屑の付着を防止するためには、パンチが接着剤に接触する時間や距離を短くすればよいことを見出し、本発明を完成するに至った。 However, according to the observation of the present inventor, the adhesive scraped by the side surface of the punch when the punch is lowered adheres to the side surface of the punch, and the surface to be cut when the punch is lifted up. It was found that it occurs by reattaching to the surface. Accordingly, it has been found that the time and distance at which the punch contacts the adhesive may be shortened in order to prevent the sticking of burrs, and the present invention has been completed.
本発明の方法は、パンチおよびダイからなるプレス機を用いて、接着剤層が付与されたフレキシブル樹脂基板に、連続的に穴開け加工をする際に、該パンチによる前記樹脂基板の切断完了点から、前記ダイの挿通穴におけるパンチの下死点までの距離を、0.5mm〜1.0mmとする。0.5mmより短くすると、切断が不完全になることが多く、不適となる。一方、1.0mmより長くすると、バリ屑付着の発生が顕著となる。 In the method of the present invention, when a punching and die press machine is used to continuously drill a hole in a flexible resin substrate provided with an adhesive layer, the cutting completion point of the resin substrate by the punch is determined. The distance from the bottom dead center of the punch in the insertion hole of the die to 0.5 mm to 1.0 mm. If it is shorter than 0.5 mm, the cutting is often incomplete and unsuitable. On the other hand, when the length is longer than 1.0 mm, the occurrence of burr dust adhesion becomes significant.
本発明の方法の実施においては、切断物がダイの挿通穴の中に残存するといういわゆるカスつまりが発生しやすい。従って、カス屑による打ち抜き部の払い出し口のつまりを防止するため、所定の打ち抜き回数の後、パンチを前記設定より深く入れ、ダイの挿通穴の中に残存している切断物を除去する。所定の打ち抜き回数を、何回とするかは、打ち抜かれる接着剤の性質にも影響されるため、予め調べた上で、適宜、設定する。 In the implementation of the method of the present invention, so-called clogging is likely to occur in which the cut material remains in the insertion hole of the die. Therefore, in order to prevent clogging of the discharge port of the punched portion due to the scrap, after a predetermined number of punches, the punch is inserted deeper than the above setting, and the cut material remaining in the through hole of the die is removed. The number of times the predetermined punching is performed is also affected by the properties of the adhesive to be punched, and is set as appropriate after checking in advance.
一方、切断物が半導体パッケージとなる場合には、適宜、従来からある任意の回収手段を採用すればよい。 On the other hand, when the cut product is a semiconductor package, any conventional collecting means may be employed as appropriate.
(実施例1)
以下のように、一般的なT−BGA材料を準備し、直径0.5mmの穴を連続的に開けた。図1は、接着剤層が付与されたフレキシブル樹脂基板に穴開け加工をする様子を示す断面図である。
Example 1
A general T-BGA material was prepared as follows, and a hole having a diameter of 0.5 mm was continuously formed. FIG. 1 is a cross-sectional view showing a state in which a punching process is performed on a flexible resin substrate provided with an adhesive layer.
厚さ75μmのポリイミドフィルム(宇部興産社製、ユーピレックスS)(3)に、厚さ38μmのPETフィルム(5)と、厚さ50μmの接着剤(4)とからなる接着シート(東レ社製、TSA61)をラミネートした。 A 75 μm thick polyimide film (Ube Industries, Upilex S) (3), a 38 μm thick PET film (5) and a 50 μm thick adhesive (4) (Toray Industries, Inc. TSA61) was laminated.
次いで、パンチ(1)とダイ(2)とからなるクリアランス片側3μmの金型を用い、リグラインド直後に、切断完了点から下死点までの距離(D)を0.5mmとし、100pcsの連続加工で、8時間、打ち抜きを行った。 Next, using a 3 μm clearance mold consisting of a punch (1) and a die (2), immediately after regrind, the distance (D) from the cutting completion point to the bottom dead center is set to 0.5 mm, and 100 pcs continuous. In the processing, punching was performed for 8 hours.
加工開始から終了までの間、未切断ピースがなく、樹脂基板の被切断面へバリ屑が付着しなかった。 There was no uncut piece from the start to the end of processing, and no burr was attached to the cut surface of the resin substrate.
(実施例2)
切断完了点から下死点までの距離(D)を1.0mmとした以外は、実施例1と同様にして、打ち抜きを行った。加工開始から終了までの間、未切断ピースがなく、樹脂基板の被切断面へバリ屑が付着しなかった。
(Example 2)
Punching was performed in the same manner as in Example 1 except that the distance (D) from the cutting completion point to the bottom dead center was 1.0 mm. There was no uncut piece from the start to the end of processing, and no burr was attached to the cut surface of the resin substrate.
(比較例1)
切断完了点から下死点までの距離(D)を0.4mmとした以外は、実施例1と同様にして、打ち抜きを行った。加工開始から終了までの間、約20%の未切断ピースが見られた。
(Comparative Example 1)
Punching was performed in the same manner as in Example 1 except that the distance (D) from the cutting completion point to the bottom dead center was 0.4 mm. About 20% of uncut pieces were seen from the start to the end of processing.
(比較例2)
切断完了点から下死点までの距離(D)を1.1mmとした以外は、実施例1と同様にして、打ち抜きを行った。加工開始から終了までの間、樹脂基板の被切断面へバリ屑の付着が顕著であった。
(Comparative Example 2)
Punching was performed in the same manner as in Example 1 except that the distance (D) from the cutting completion point to the bottom dead center was 1.1 mm. From the start to the end of processing, the adhesion of burrs to the cut surface of the resin substrate was remarkable.
1 パンチ
2 ダイ
3 樹脂基板
4 接着剤層
5 カバーフィルム
A 下死点
B 上死点
D 切断完了点から下死点までの距離
1
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009023017A (en) * | 2007-07-17 | 2009-02-05 | Nippon Mektron Ltd | Composite sheet member punching method |
JP2018015784A (en) * | 2016-07-28 | 2018-02-01 | 三星ダイヤモンド工業株式会社 | Laser processing apparatus |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60228099A (en) * | 1984-04-20 | 1985-11-13 | 株式会社日立製作所 | Punching working method |
JP2001353536A (en) * | 2000-06-12 | 2001-12-25 | Hitachi Cable Ltd | Tape carrier punching die |
-
2004
- 2004-09-22 JP JP2004275488A patent/JP2006088260A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60228099A (en) * | 1984-04-20 | 1985-11-13 | 株式会社日立製作所 | Punching working method |
JP2001353536A (en) * | 2000-06-12 | 2001-12-25 | Hitachi Cable Ltd | Tape carrier punching die |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009023017A (en) * | 2007-07-17 | 2009-02-05 | Nippon Mektron Ltd | Composite sheet member punching method |
JP2018015784A (en) * | 2016-07-28 | 2018-02-01 | 三星ダイヤモンド工業株式会社 | Laser processing apparatus |
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