JP2006086153A - Flexible wiring board and its manufacturing method - Google Patents

Flexible wiring board and its manufacturing method Download PDF

Info

Publication number
JP2006086153A
JP2006086153A JP2004266338A JP2004266338A JP2006086153A JP 2006086153 A JP2006086153 A JP 2006086153A JP 2004266338 A JP2004266338 A JP 2004266338A JP 2004266338 A JP2004266338 A JP 2004266338A JP 2006086153 A JP2006086153 A JP 2006086153A
Authority
JP
Japan
Prior art keywords
film
wiring board
flexible wiring
processing
resin material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2004266338A
Other languages
Japanese (ja)
Inventor
Hidenobu Muranaka
秀信 村中
Shuichiro Yasuda
周一郎 安田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dexerials Corp
Original Assignee
Sony Chemicals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Chemicals Corp filed Critical Sony Chemicals Corp
Priority to JP2004266338A priority Critical patent/JP2006086153A/en
Publication of JP2006086153A publication Critical patent/JP2006086153A/en
Withdrawn legal-status Critical Current

Links

Images

Abstract

<P>PROBLEM TO BE SOLVED: To manufacture a flexible wiring board which is provided with a highly accurate projection. <P>SOLUTION: In the flexible wiring board 1a, a base film 11 is deformed together with a wiring film 15, and a projection 18 is formed in the wiring film 15. At the same time, a recess 17 is formed at the rear position of the projection 18 of the base film 11. A resin material 22 is arranged within the recess 17, of which space is made small. Thus, even if any load is applied to the projection 18 when an electric part 4 is connected to the flexible wiring board 1a, the flexible wiring board 1a is hard to be deformed. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明はフレキシブル配線板の技術分野に関し、特に、配線膜に突起が形成されたフレキシブル配線板に関する。   The present invention relates to the technical field of flexible wiring boards, and more particularly to a flexible wiring board having protrusions formed on a wiring film.

従来より、配線板と電気部品の接続には、突起を介して配線板と電気部品を電気的に接続する方法が広く用いられている。
従来の突起の形成方法には、配線膜の表面に半田ボールをボールマウンタで実装する方法が公知であるが、半田ボールを1つ1つ実装するため、作業時間が長くなってしまう。
Conventionally, a method of electrically connecting a wiring board and an electrical component via a protrusion has been widely used to connect the wiring board and the electrical component.
As a conventional method for forming protrusions, a method in which solder balls are mounted on the surface of the wiring film with a ball mounter is known. However, since each solder ball is mounted one by one, the operation time becomes long.

配線膜の表面にエッチング法で金属バンプを形成する方法も公知であるが、この方法ではエッチングむらが生じやすく、金属バンプの高さ精度が悪いという問題がある。   A method of forming metal bumps on the surface of the wiring film by an etching method is also known, but this method has a problem that etching unevenness is likely to occur and the height accuracy of the metal bumps is poor.

また、配線膜上にワイヤーボンディング法で金バンプを1つずつ形成することも公知であるが、この方法は金バンプを1つずつ形成するため手間がかかるだけではなく、形成された金バンプは高さ精度が悪く、各バンプの高さを揃える(レベリング)必要があり、突起形成の作業工程数が多くなってしまう。   In addition, it is also known to form gold bumps one by one on the wiring film by a wire bonding method, but this method is not only troublesome because it forms gold bumps one by one, The height accuracy is poor, and it is necessary to align the height of each bump (leveling), which increases the number of work steps for forming the protrusions.

加工用凹部が設けられた金型に配線板を押し当て、加熱しながら配線板を金型に向かって押圧することで、加工用凹部側に配線膜を膨出させ、配線膜に突起を形成する方法が公知である(例えば、特許文献1を参照)。   Press the wiring board against the mold with the recesses for processing, and press the wiring board toward the mold while heating, so that the wiring film bulges on the recesses for processing and forms protrusions on the wiring film. The method of doing is well-known (for example, refer patent document 1).

しかしながら、近年電気装置の精密化により、薄型のフレキシブル配線板(例えば、ベースフィルム及び配線の合計膜厚が12.5μm以上75μm以下)が求められており、そのようなフレキシブル配線板で、配線膜を押圧によって膨出させると、フレキシブル配線板全体が変形し、ベースフィルム側に大きな凹部が形成されてしまう。   However, in recent years, with the refinement of electric devices, a thin flexible wiring board (for example, the total film thickness of the base film and the wiring is 12.5 μm or more and 75 μm or less) is required. When the bulge is bulged by pressing, the entire flexible wiring board is deformed and a large recess is formed on the base film side.

ベースフィルムに凹部が形成された状態で、半導体素子等他の電気部品をマウントすると、凹部の空間の分だけ突起に係る荷重が逃げ、接続不良が生じたり、フレキシブル配線板が大きく変形する原因となる。   If other electrical components such as semiconductor elements are mounted in the state where the recess is formed in the base film, the load on the protrusion will escape by the space of the recess, causing connection failure or causing the flexible wiring board to be greatly deformed. Become.

また、突起を形成する際に、ベースフィルムを構成する樹脂のガラス転移温度以上に加熱を行うと、ベースフィルムの変形量が著しく多くなりすぎ、配線膜の位置ずれや、ベースフィルムの膜厚分布が不均一になる原因となる。
特開2000−490447号公報
Also, when forming the protrusions, if heating is performed at a temperature higher than the glass transition temperature of the resin constituting the base film, the amount of deformation of the base film becomes excessively large, resulting in misalignment of the wiring film and the film thickness distribution of the base film. Causes non-uniformity.
Japanese Unexamined Patent Publication No. 2000-4940447

本発明は上記従来技術の不都合を解決するために創作されたものであり、その目的は、フレキシブル配線板の金属バンプを精度良く形成することにある。   The present invention was created to solve the above-described disadvantages of the prior art, and an object thereof is to form metal bumps of a flexible wiring board with high accuracy.

上記課題を解決するために請求項1記載の発明は、配線板の配線膜上に突起が形成されたフレキシブル配線板を製造するフレキシブル配線板の製造方法であって、ベースフィルム上にパターニングされた配線膜を配置し、前記配線膜と前記ベースフィルムが配置された部分の、前記ベースフィルムの所定位置に加工用突起を当接して、前記加工用突起で前記ベースフィルムを押圧し、前記配線膜を膨出させて前記突起を形成し、前記突起の裏面側に形成された前記ベースフィルムの凹部に樹脂材料を配置するフレキシブル配線板の製造方法である。
請求項2記載の発明は、配線板の配線膜上に突起が形成されたフレキシブル配線板を製造するフレキシブル配線板の製造方法であって、導電膜上に配置されたベースフィルムの所定位置に加工用突起を当接し、前記加工用突起で前記ベースフィルムを押圧し、前記導電膜を膨出させて前記突起を複数個形成し、前記突起の裏面側に形成された前記ベースフィルムの凹部に樹脂材料を配置した後、前記導電膜の前記突起が形成された側の面に、所定形状のレジスト層を配置し、前記導電膜の前記レジスト層から露出した部分を除去して、前記配線膜を形成するフレキシブル配線板の製造方法である。
請求項3記載の発明は、配線板の配線膜上に突起が形成されたフレキシブル配線板を製造するフレキシブル配線板の製造方法であって、導電膜上に配置されたベースフィルムの所定位置に加工用突起を当接し、前記加工用突起で前記ベースフィルムを押圧し、前記導電膜を膨出させて前記突起を複数個形成し、前記導電膜の前記突起が形成された側の面に、所定形状のレジスト層を配置し、前記導電膜の前記レジスト層から露出した部分を除去して、前記配線膜を形成し、前記突起の裏面側に形成された前記ベースフィルムの凹部に樹脂材料を配置するフレキシブル配線板の製造方法である。
請求項4記載の発明は、請求項1乃至請求項3のいずれか1項記載のフレキシブル配線板の製造方法であって、前記樹脂材料の配置は、前記ベースフィルムの主成分と同じ種類の樹脂を主成分とする前記樹脂材料を用いるフレキシブル配線板の製造方法である。
請求項5記載の発明は、配線板の配線膜上に突起が形成されたフレキシブル配線板を製造するフレキシブル配線板の製造方法であって、キャリアフィルム上に配置された導電膜の所定位置に、加工用突起を接触させ、前記各加工用突起で前記導電膜を押圧し、前記導電膜を膨出させて前記突起を複数形成し、前記導電膜の前記突起が形成された側の面とは反対側の面に、所定形状のレジスト層を配置し、前記導電膜の前記レジスト層から露出する部分をエッチング除去して前記配線膜を形成し、レジスト層を除去した後、前記突起の裏面側に形成された前記配線膜の凹部に樹脂材料を配置し、前記配線膜と密着するベースフィルムを形成した後、前記キャリアフィルムを除去するフレキシブル配線板の製造方法である。
請求項6記載の発明は、配線板の配線膜上に突起が形成されたフレキシブル配線板を製造するフレキシブル配線板の製造方法であって、導電膜の所定位置に加工用突起を接触させ、前記各加工用突起で前記導電膜を押圧し、前記導電膜を膨出させて前記突起を複数形成し、前記導電膜の前記突起が形成された側の面にキャリアフィルムを配置し、前記導電膜の前記突起が形成された側の面とは反対側の面に所定形状のレジスト層を配置し、前記導電膜の前記レジスト層から露出する部分をエッチング除去して前記配線膜を形成し、レジスト層を除去した後、前記突起の裏面側に形成された前記配線膜の凹部に樹脂材料を配置し、前記配線膜と密着するベースフィルムを形成した後、前記キャリアフィルムを除去するフレキシブル配線板の製造方法である。
請求項7記載の発明は、配線板の配線膜上に突起が形成されたフレキシブル配線板を製造するフレキシブル配線板の製造方法であって、導電膜の所定部分を加工用突起で押圧し、前記導電膜を膨出させて前記突起を複数形成した後、前記突起の裏面側に形成された前記導電膜の凹部に樹脂材料を配置してベースフィルムを形成し、前記導電膜の前記突起が形成された側の面に、所定形状のレジスト層を配置した後、前記導電膜の前記レジスト層から露出する部分をエッチング除去し、前記配線膜を形成するフレキシブル配線板の製造方法である。
請求項8記載の発明は、請求項1乃至請求項7のいずれか1項記載のフレキシブル配線板の製造方法であって、前記樹脂材料の配置は、基材シート上に配置された樹脂材料を、前記凹部に密着させるフレキシブル配線板の製造方法である。
請求項9記載の発明は、請求項8記載のフレキシブル配線板の製造方法であって、前記樹脂材料を前記凹部に密着させた後、前記基材シートを前記樹脂材料から剥離するフレキシブル配線板の製造方法。
請求項10記載の発明は、請求項1乃至請求項7のいずれか1項記載のフレキシブル配線板の製造方法であって、前記樹脂材料の配置は、前記凹部に樹脂材料を塗布するフレキシブル配線板の製造方法である。
請求項11記載の発明は、請求項1乃至請求項10記載のいずれか1項記載のフレキシブル配線板の製造方法であって、前記凹部に前記樹脂材料を配置した後、前記樹脂材料を硬化させるフレキシブル配線板の製造方法である。
請求項12記載の発明は、フレキシブル配線板の製造方法であって、第一の加工用突起と、第一の加工用凹部が形成された第一の金型と、前記第一の加工用突起と嵌合する位置に第二の加工用凹部が形成され、前記第一の加工用凹部と嵌合する位置に第二の加工用突起が形成された第二の金型との間に、積層体を配置し、前記積層体の前記ベースフィルムの表面に位置する第一の導電膜を前記第一の加工用突起と前記第二の加工用凹部の間に位置させ、前記ベースフィルムの裏面に位置する第二の導電膜を前記第二の加工用突起と前記第一の加工用凹部の間に位置させて、前記第一、第二の金型で前記積層体を挟み込み、前記積層体の表面に凸部と凹部を形成し、かつ、前記積層体の裏面に凸部と凹部を形成するフレキシブル配線板の製造方法である。
請求項13記載の発明は、請求項12記載のフレキシブル配線板の製造方法であって、前記ベースフィルムに貫通孔を形成しておき、前記貫通孔に充填した導電材料で前記第一、第二の導電膜を電気的に接続した後、前記第一、第二の金型で前記積層体を挟み込むフレキシブル配線板の製造方法である。
請求項14記載の発明は、請求項12又は請求項13のいずれか1項記載のフレキシブル配線板の製造方法であって、前記積層体の表面に形成された凹部と、前記積層体の裏面に形成された凹部に樹脂材料を配置するフレキシブル配線板の製造方法である。
請求項15記載の発明は、ベースフィルムと、前記ベースフィルム上に配置され、所定形状にパターニングされた配線膜とを有し、前記配線膜には突起が形成されたフレキシブル配線板であって、前記ベースフィルムの前記配線膜とは反対側の面には、前記突起が位置する部分に凹部が形成され、前記凹部には樹脂材料が配置されたフレキシブル配線板である。
請求項16記載の発明は、請求項15記載のフレキシブル配線板の製造方法であって、前記ベースフィルムと前記樹脂材料は、同じ種類の樹脂を主成分とするフレキシブル配線板である。
請求項17記載の発明は、ベースフィルムと、前記ベースフィルム上に配置され、所定パターニングされた配線膜とを有し、前記配線膜の表面には突起が形成されたフレキシブル配線板であって、前記配線膜の前記突起の裏面側には凹部が設けられ、前記凹部には樹脂材料が配置されたフレキシブル配線板である。
請求項18記載の発明は請求項17記載のフレキシブル配線板であって、前記樹脂材料は前記ベースフィルムの一部分で構成されたフレキシブル配線板である。
請求項19記載の発明は、請求項15乃至請求項18のいずれか1項記載のフレキシブル配線板であって、前記ベースフィルムは可撓性を有する樹脂フィルムで構成されたフレキシブル配線板である。
請求項20記載の発明は、請求項19記載のフレキシブル配線板であって、前記ベースフィルムはガラス転移温度が300℃以上の樹脂を主成分とするフレキシブル配線板である。
請求項21記載の発明は、請求項19又は請求項20のいずれか1項記載のフレキシブル配線板であって、前記ベースフィルムはポリイミド樹脂を主成分とするフレキシブル配線板である。
請求項22記載の発明は、請求項15乃至請求項21のいずれか1項記載のフレキシブル配線板であって、前記ベースフィルムの膜厚は8μm以上25μm以下であるフレキシブル配線板である。
請求項23記載の発明は、請求項15乃至請求項22のいずれか1項記載のフレキシブル配線板であって、前記配線膜の膜厚は8μm以上35μm以下であるフレキシブル配線板である。
請求項24記載の発明は、請求項15乃至請求項23のいずれか1項記載のフレキシブル配線板であって、前記接続部の先端の、前記配線膜の他の部分の表面からの高さは10μm以上20μm以下であるフレキシブル配線板である。
In order to solve the above-mentioned problems, the invention according to claim 1 is a method for manufacturing a flexible wiring board for manufacturing a flexible wiring board having protrusions formed on a wiring film of the wiring board, and is patterned on a base film. A wiring film is disposed, a processing protrusion is brought into contact with a predetermined position of the base film at a portion where the wiring film and the base film are disposed, and the base film is pressed by the processing protrusion, and the wiring film Bulges to form the projections, and a method of manufacturing a flexible wiring board in which a resin material is disposed in a recess of the base film formed on the back side of the projections.
The invention according to claim 2 is a method of manufacturing a flexible wiring board for manufacturing a flexible wiring board having protrusions formed on the wiring film of the wiring board, wherein the base film disposed on the conductive film is processed into a predetermined position. A plurality of projections are formed by pressing the base film with the processing projections, bulging the conductive film, and resin is formed in the recesses of the base film formed on the back side of the projections. After the material is disposed, a resist layer having a predetermined shape is disposed on the surface of the conductive film on which the protrusion is formed, and a portion exposed from the resist layer of the conductive film is removed, and the wiring film is formed. It is a manufacturing method of the flexible wiring board to form.
The invention according to claim 3 is a method for manufacturing a flexible wiring board for producing a flexible wiring board having protrusions formed on the wiring film of the wiring board, wherein the base film disposed on the conductive film is processed at a predetermined position. A plurality of projections are formed by pressing the base film with the processing projections and bulging the conductive film, and a predetermined surface is formed on the surface of the conductive film where the projections are formed. A resist layer having a shape is disposed, a portion exposed from the resist layer of the conductive film is removed, the wiring film is formed, and a resin material is disposed in a recess of the base film formed on the back surface side of the protrusion. This is a method for manufacturing a flexible wiring board.
Invention of Claim 4 is a manufacturing method of the flexible wiring board of any one of Claim 1 thru | or 3, Comprising: The arrangement | positioning of the said resin material is the same kind of resin as the main component of the said base film This is a method for manufacturing a flexible wiring board using the resin material containing as a main component.
Invention of Claim 5 is a manufacturing method of a flexible wiring board which manufactures a flexible wiring board by which a projection was formed on a wiring film of a wiring board, and in a predetermined position of a conductive film arranged on a carrier film, A processing projection is brought into contact, the conductive film is pressed by each of the processing projections, the conductive film is bulged to form a plurality of the projections, and the surface of the conductive film on the side where the projections are formed is A resist layer having a predetermined shape is disposed on the opposite surface, and the wiring film is formed by etching away a portion of the conductive film exposed from the resist layer. After removing the resist layer, the back side of the protrusion A method of manufacturing a flexible wiring board, in which a resin material is disposed in a recess of the wiring film formed on the substrate, a base film that is in close contact with the wiring film is formed, and then the carrier film is removed.
The invention according to claim 6 is a method for manufacturing a flexible wiring board for manufacturing a flexible wiring board having protrusions formed on the wiring film of the wiring board, wherein the processing protrusion is brought into contact with a predetermined position of the conductive film, The conductive film is pressed by each processing protrusion, the conductive film is expanded to form a plurality of protrusions, a carrier film is disposed on the surface of the conductive film on which the protrusion is formed, and the conductive film A resist layer having a predetermined shape is disposed on a surface opposite to the surface on which the protrusion is formed, and a portion of the conductive film exposed from the resist layer is removed by etching to form the wiring film. After removing the layer, a resin material is disposed in the concave portion of the wiring film formed on the back surface side of the protrusion, and after forming a base film in close contact with the wiring film, the carrier film is removed. Manufacturing It is the law.
The invention according to claim 7 is a method for manufacturing a flexible wiring board for manufacturing a flexible wiring board having protrusions formed on the wiring film of the wiring board, wherein a predetermined portion of the conductive film is pressed with a processing protrusion, After forming a plurality of the protrusions by expanding the conductive film, a resin film is disposed in the concave portion of the conductive film formed on the back surface side of the protrusions to form a base film, and the protrusions of the conductive film are formed. After the resist layer having a predetermined shape is disposed on the surface of the conductive film, a portion of the conductive film exposed from the resist layer is removed by etching to form the wiring film.
Invention of Claim 8 is a manufacturing method of the flexible wiring board of any one of Claim 1 thru | or 7, Comprising: The arrangement | positioning of the said resin material is the resin material arrange | positioned on a base material sheet. A method of manufacturing a flexible wiring board in close contact with the recess.
Invention of Claim 9 is a manufacturing method of the flexible wiring board of Claim 8, Comprising: After making the said resin material closely_contact | adhere to the said recessed part, the flexible wiring board which peels the said base material sheet from the said resin material Production method.
Invention of Claim 10 is a manufacturing method of the flexible wiring board of any one of Claim 1 thru | or 7, Comprising: The arrangement | positioning of the said resin material is a flexible wiring board which apply | coats the resin material to the said recessed part. It is a manufacturing method.
Invention of Claim 11 is a manufacturing method of the flexible wiring board of any one of Claim 1 thru | or 10, Comprising: After arrange | positioning the said resin material in the said recessed part, the said resin material is hardened. It is a manufacturing method of a flexible wiring board.
The invention according to claim 12 is a method for manufacturing a flexible wiring board, wherein the first processing projection, the first mold having the first processing recess formed therein, and the first processing projection. A second processing recess is formed at a position where the second processing protrusion is formed, and a second mold is formed between the first processing recess and a position where the second processing protrusion is formed. A first conductive film positioned on the surface of the base film of the laminate is positioned between the first processing protrusion and the second processing recess, and on the back surface of the base film A second conductive film is positioned between the second processing protrusion and the first processing recess, and the stacked body is sandwiched between the first and second molds. A method for producing a flexible wiring board, wherein convex portions and concave portions are formed on the front surface, and convex portions and concave portions are formed on the back surface of the laminate. It is.
A thirteenth aspect of the present invention is the method for manufacturing a flexible wiring board according to the twelfth aspect, wherein a through hole is formed in the base film, and the first and second conductive materials are filled with the through hole. This is a method for manufacturing a flexible wiring board in which the laminated body is sandwiched between the first and second molds after electrically connecting the conductive films.
Invention of Claim 14 is a manufacturing method of the flexible wiring board of any one of Claim 12 or Claim 13, Comprising: On the recessed part formed in the surface of the said laminated body, and the back surface of the said laminated body This is a method for manufacturing a flexible wiring board in which a resin material is disposed in a formed recess.
The invention according to claim 15 is a flexible wiring board having a base film and a wiring film disposed on the base film and patterned into a predetermined shape, wherein a protrusion is formed on the wiring film, On the surface of the base film opposite to the wiring film, a concave portion is formed in a portion where the protrusion is located, and a flexible wiring board in which a resin material is disposed in the concave portion.
A sixteenth aspect of the present invention is the method for manufacturing a flexible wiring board according to the fifteenth aspect, wherein the base film and the resin material are flexible wiring boards mainly composed of the same type of resin.
The invention according to claim 17 is a flexible wiring board having a base film and a wiring film disposed on the base film and patterned in a predetermined manner, and a protrusion is formed on the surface of the wiring film, It is a flexible wiring board in which a recess is provided on the back side of the projection of the wiring film, and a resin material is disposed in the recess.
The invention according to claim 18 is the flexible wiring board according to claim 17, wherein the resin material is a part of the base film.
The invention according to claim 19 is the flexible wiring board according to any one of claims 15 to 18, wherein the base film is a flexible wiring board made of a flexible resin film.
The invention according to claim 20 is the flexible wiring board according to claim 19, wherein the base film is a flexible wiring board whose main component is a resin having a glass transition temperature of 300 ° C. or higher.
The invention according to claim 21 is the flexible wiring board according to any one of claim 19 or claim 20, wherein the base film is a flexible wiring board mainly composed of a polyimide resin.
A twenty-second aspect of the invention is the flexible wiring board according to any one of the fifteenth to twenty-first aspects, wherein the base film has a thickness of 8 μm or more and 25 μm or less.
A twenty-third aspect of the present invention is the flexible wiring board according to any one of the fifteenth to twenty-second aspects, wherein the wiring film has a thickness of 8 μm to 35 μm.
Invention of Claim 24 is the flexible wiring board of any one of Claim 15 thru | or 23, Comprising: The height from the surface of the other part of the said wiring film of the front-end | tip of the said connection part is It is a flexible wiring board having a size of 10 μm or more and 20 μm or less.

本発明は上記のように構成されており、配線膜や導電膜を加工用突起で直接又は間接的に押圧することで、突起が形成される。
フレキシブル配線板の膜厚(例えば膜厚12.5μm以上75μm以下)に対して、配線膜の他の部分からの高さが0.27倍以上0.8倍以下と高い突起(例えば高さ10μm以上20μm以下)が形成されるように、フレキシブル配線板を変形させると、その変形によって突起の裏面に大きい凹部が形成されるが、本発明では突起を形成した後、その凹部に樹脂材料が配置されるので、凹部内部の空間が小さくなる。
The present invention is configured as described above, and the protrusion is formed by directly or indirectly pressing the wiring film or the conductive film with the processing protrusion.
Protrusion (for example, 10 μm in height) that is 0.27 times or more and 0.8 times or less in height from the other part of the wiring film with respect to the film thickness of the flexible wiring board (for example, film thickness of 12.5 μm or more and 75 μm or less) When the flexible wiring board is deformed so that a thickness of 20 μm or less is formed, a large recess is formed on the back surface of the protrusion by the deformation. In the present invention, after forming the protrusion, a resin material is disposed in the recess. As a result, the space inside the recess is reduced.

金型の一面に複数の加工用突起を設け、該金型の加工用突起が配置された面を導電膜又は配線膜に押し当てれば、複数の加工用突起で同時に複数の部分が押圧されることになるので、複数の突起が同時に形成される。   By providing a plurality of processing projections on one surface of the mold and pressing the surface of the mold on which the processing projections are disposed against the conductive film or the wiring film, a plurality of portions are pressed simultaneously by the plurality of processing projections. As a result, a plurality of protrusions are formed simultaneously.

導電膜又は配線膜を挟み込んだ状態で、加工用突起と加工用凹部を嵌合させれば、導電膜又は配線膜は加工用加工用凹部の形状に応じた形状に膨出されるので、高さ精度の良い突起が形成される。各加工用凹部の形状と大きさを同一にし、各加工用突起の形状と大きさを同一にすれば、同じ形状で同じ大きさの複数の突起が同時に形成されることになり、突起の高さを揃える工程が不要になる。   If the processing projection and the processing recess are fitted with the conductive film or the wiring film sandwiched therebetween, the conductive film or the wiring film swells into a shape corresponding to the shape of the processing processing recess, so that the height Accurate protrusions are formed. If the shape and size of each processing recess are the same and the shape and size of each processing projection are the same, multiple projections of the same shape and size are formed at the same time. The process of aligning the thickness becomes unnecessary.

本発明によれば、配線膜を加工用突起で押圧するだけで突起が形成されるので、突起を形成する工程が容易である。また、突起を形成する時に、突起の真裏位置に生じる凹部には、樹脂材料が配置されるので、突起を他の電気部品のランド部分に押し当てる時に、突起に係る荷重によってベースフィルムが変形し難い。   According to the present invention, since the protrusion is formed simply by pressing the wiring film with the processing protrusion, the process of forming the protrusion is easy. In addition, since the resin material is disposed in the recess that is formed at the position directly behind the protrusion when the protrusion is formed, the base film is deformed by the load applied to the protrusion when the protrusion is pressed against the land portion of another electrical component. hard.

図1(a)の符号10は本発明に用いる積層体の一例を示しており、積層体10はベースフィルム11と、ベースフィルム11上に配置された配線膜15とを有している。   Reference numeral 10 in FIG. 1A shows an example of a laminate used in the present invention. The laminate 10 includes a base film 11 and a wiring film 15 disposed on the base film 11.

配線膜15は、細長の配線部(ここでは不図示)と、配線部よりも幅広の接続部16とを複数有している。ここでは、接続部16は円形であって、その直径は
100μm以上200μm以下にされており、各接続部16は配線板の長手方向の端部にそれぞれ接続されている。
The wiring film 15 includes a plurality of elongated wiring portions (not shown here) and a plurality of connection portions 16 wider than the wiring portions. Here, the connection part 16 is circular, and the diameter is set to 100 μm or more and 200 μm or less, and each connection part 16 is connected to an end part in the longitudinal direction of the wiring board.

図1(b)の符号31、32は第一、第二の金型を示しており、第一の金型31の一面には円錐状の加工用突起36が複数形成され、第二の金型32の一面には加工用突起36と対応する位置に、加工用突起36と相似形の加工用凹部37が複数設けられている。   Reference numerals 31 and 32 in FIG. 1B denote first and second molds. A plurality of conical processing projections 36 are formed on one surface of the first mold 31, and the second mold On one surface of the mold 32, a plurality of processing concave portions 37 similar to the processing projections 36 are provided at positions corresponding to the processing projections 36.

第一、第二の金型31、32を加工用突起36が配置された面と、加工用凹部37が配置された面とが対向するように配置し、積層体10をベースフィルム11側の面が加工用突起36が配置された面と対向し、配線膜15側の面が加工用凹部37が配置された面と対向するように、第一、第二の金型31、32の間に配置する。   The first and second molds 31 and 32 are arranged so that the surface on which the processing protrusion 36 is disposed and the surface on which the processing recess 37 is disposed are opposed to each other, and the laminate 10 is disposed on the base film 11 side. Between the first and second molds 31 and 32 so that the surface faces the surface where the processing projections 36 are arranged and the surface on the wiring film 15 side faces the surface where the processing recesses 37 are arranged. To place.

第一、第二の金型31、32と積層体10を、加工用突起36と加工用凹部37とが互いに対向し、各接続部16が互いに対向する加工用突起36と、加工用凹部37との間に位置するように位置合わせを行った後(図1(b))、第一、第二の金型31、32で積層体10を挟み込むと、加工用突起36の先端が、ベースフィルム11の接続部16の真裏位置に押し当てられ、ベースフィルム11が加工用突起36で押圧される。   The first and second molds 31 and 32 and the laminated body 10 are formed such that the processing projections 36 and the processing recesses 37 face each other and the connection portions 16 face each other. After positioning so as to be positioned between the first and second molds 31 and 32 (FIG. 1 (b)), when the laminated body 10 is sandwiched, the tip of the processing projection 36 becomes the base. The base film 11 is pressed by the processing projections 36 by being pressed against the position directly behind the connecting portion 16 of the film 11.

ベースフィルム11はポリイミド樹脂のような柔軟性を有する樹脂で構成されており、その膜厚はベースフィルム11が可撓性を有する程度の厚さ(8μm以上25μm)になっているので、押圧によってベースフィルム11は接続部16に向かって押し曲げられ、各接続部16がベースフィルム11を介して加工用突起36で押圧される。   The base film 11 is made of a flexible resin such as a polyimide resin, and the film thickness is such that the base film 11 has flexibility (8 μm to 25 μm). The base film 11 is pushed and bent toward the connection portions 16, and each connection portion 16 is pressed by the processing projections 36 through the base film 11.

配線膜15は銅箔のような金属箔で構成されており、その膜厚は押圧によって変形する程度の厚さ(8μm以上35μm以下)になっているので、加工用突起36で各接続部16を押圧すると、各接続部16がベースフィルム11と反対側にそれぞれ盛り上がり、加工用凹部37内で膨出する。   The wiring film 15 is made of a metal foil such as a copper foil, and has a thickness that can be deformed by pressing (8 μm or more and 35 μm or less). , Each connecting portion 16 rises to the opposite side of the base film 11 and bulges in the processing recess 37.

加工用凹部37の容積は加工用突起36の体積よりも大きく、加工用凹部37の形状は、ベースフィルム11と配線膜15を一緒に挟んだ状態で、加工用突起36を加工用凹部37に嵌合させた時に、接続部16が配線膜15の他の部分から10μm以上20μm以下の高さで膨出し、膨出した接続部16の表面と、加工用凹部37の内壁との間に隙間が生じないようになっている。   The volume of the processing recess 37 is larger than the volume of the processing projection 36, and the shape of the processing recess 37 is such that the processing projection 36 is placed in the processing recess 37 while the base film 11 and the wiring film 15 are sandwiched together. When fitted, the connection portion 16 bulges from the other portion of the wiring film 15 at a height of 10 μm or more and 20 μm or less, and a gap is formed between the surface of the bulged connection portion 16 and the inner wall of the processing recess 37. Does not occur.

従って、各接続部16には、配線膜15の他の部分の表面から先端までの高さが10μm以上20μm以下であって、加工用凹部37の形状に応じた形状の突起18が同時に形成される(図1(c))。   Accordingly, each connection portion 16 is simultaneously formed with a protrusion 18 having a height from 10 μm to 20 μm from the surface of the other part of the wiring film 15 to the tip and corresponding to the shape of the processing recess 37. (FIG. 1C).

図1(d)は第一、第二の金型31、32の間から積層体10を取り出し、加工用突起36による荷重を無くした状態を示しており、接続部16は塑性変形し、突起18が形成された状態が維持されている。
ベースフィルム11の突起18の真裏部分は、接続部16に密着しているため、接続部16と一緒に変形した状態が維持され、凹部17が形成されている。
FIG. 1 (d) shows a state in which the laminate 10 is taken out between the first and second molds 31, 32 and the load due to the processing projections 36 is eliminated. The state where 18 is formed is maintained.
Since the back portion of the protrusion 18 of the base film 11 is in close contact with the connecting portion 16, the deformed state is maintained together with the connecting portion 16, and the concave portion 17 is formed.

図1(d)の符号20は積層フィルムを示しており、積層フィルム20は基材シート21と、基材シート21の表面に配置された層状の樹脂材料22とを有している。積層フィルム20の樹脂材料22が配置された側の面を、積層体10のベースフィルム11側の面に押し当てると、ベースフィルム11の凹部17が形成された側の面に樹脂材料22が密着する。   Reference numeral 20 in FIG. 1D indicates a laminated film, and the laminated film 20 includes a base sheet 21 and a layered resin material 22 disposed on the surface of the base sheet 21. When the surface of the laminated film 20 on which the resin material 22 is disposed is pressed against the surface of the laminated body 10 on the base film 11 side, the resin material 22 is in close contact with the surface of the base film 11 on which the concave portion 17 is formed. To do.

その状態で全体を加熱し、加熱によって樹脂材料22の復元力を減少させた状態で、積層フィルム20を積層体21に向かって押圧すると、ベースフィルム11表面の凹部17と凹部17の間の部分に樹脂材料21が密着すると同時に、凹部17内に樹脂材料22の一部が入り込み、凹部17内が隙間無く充填される。   In this state, the whole is heated, and when the laminated film 20 is pressed toward the laminated body 21 in a state where the restoring force of the resin material 22 is reduced by heating, the portion between the concave portion 17 and the concave portion 17 on the surface of the base film 11 At the same time as the resin material 21 comes into close contact, a part of the resin material 22 enters the recess 17 and the recess 17 is filled with no gap.

樹脂材料22の膜厚は、凹部17に樹脂材料22の一部が充填されても樹脂材料22全体が殆ど変形しない程度に厚くなっているので、樹脂材料22のベースフィルム11の反対側の面には新たな凹部は形成されず、平坦なまま維持される(図2(e))。   The film thickness of the resin material 22 is so thick that the entire resin material 22 is hardly deformed even when the recess 17 is partially filled with the resin material 22, so the surface of the resin material 22 on the opposite side of the base film 11. In this case, no new recess is formed and is kept flat (FIG. 2E).

樹脂材料22は熱硬化性の樹脂であるポリイミド前駆体を主成分としており、凹部17が樹脂材料22で充填された状態で、ポリイミド前駆体が重合する重合温度以上に加熱すると、ポリイミド前駆体が重合し、樹脂材料22が凹部17を充填した状態で硬化する。   The resin material 22 is mainly composed of a polyimide precursor, which is a thermosetting resin, and when the recess 17 is filled with the resin material 22 and heated above the polymerization temperature at which the polyimide precursor is polymerized, the polyimide precursor becomes Polymerization is performed and the resin material 22 is cured in a state where the recess 17 is filled.

上述したように、ベースフィルム11はポリイミド樹脂で構成されている。従って、硬化した樹脂材料22はベースフィルム11と同じ種類の樹脂を含有することになるので、硬化した樹脂材料22のベースフィルム11に対する親和性は高く、硬化した樹脂材料22はベースフィルム11に強固に接着される。   As described above, the base film 11 is made of a polyimide resin. Accordingly, since the cured resin material 22 contains the same type of resin as the base film 11, the affinity of the cured resin material 22 to the base film 11 is high, and the cured resin material 22 is firmly attached to the base film 11. Glued to.

ここでは、基材シート21は剥離フィルムで構成されており、基材シート21と硬化した後の樹脂材料22との間の接着力は、硬化した樹脂材料22とベースフィルム11との間の接着力に比べて弱いので、基材シート21を引き剥がすと、基材シート21と樹脂材料22との界面で剥離が起こって基材シート21が除去され、硬化した樹脂材料22はベースフィルム11上に残る。   Here, the base material sheet 21 is composed of a release film, and the adhesive force between the base material sheet 21 and the cured resin material 22 is the adhesion between the cured resin material 22 and the base film 11. Since it is weaker than the force, when the base sheet 21 is peeled off, peeling occurs at the interface between the base sheet 21 and the resin material 22, the base sheet 21 is removed, and the cured resin material 22 remains on the base film 11. Remain in.

図2(f)の符号1aは基材シート21を剥離した後の本発明第一例のフレキシブル配線板を示している。次に、このフレキシブル配線板1aに電気部品を接続する工程を説明する。   The code | symbol 1a of FIG.2 (f) has shown the flexible wiring board of this invention 1 example after peeling the base material sheet 21. FIG. Next, a process for connecting an electrical component to the flexible wiring board 1a will be described.

図3(a)の符号4は半導体チップのような電気部品を示しており、電気部品4は部品本体41を有している。部品本体41の一面にはランド部42が配置されており、ランド部42は部品本体41の内部回路に接続されている。   Reference numeral 4 in FIG. 3A denotes an electrical component such as a semiconductor chip, and the electrical component 4 has a component body 41. A land portion 42 is disposed on one surface of the component main body 41, and the land portion 42 is connected to an internal circuit of the component main body 41.

フレキシブル配線板1aの突起18が形成された側の面に異方導電性接着フィルム45を配置し、ランド部42と突起18とが対向するように、電気部品4とフレキシブル配線板1aの位置合わせを行う。   An anisotropic conductive adhesive film 45 is disposed on the surface of the flexible wiring board 1a on which the projections 18 are formed, and the electrical component 4 and the flexible wiring board 1a are aligned so that the land portions 42 and the projections 18 face each other. I do.

次いで、電気部品4を異方導電性接着フィルム45に密着させ、加熱押圧すると、異方導電性接着フィルム45のバインダー樹脂46が昇温して軟化し、押圧によって突起18が軟化したバインダー樹脂46を押し退け、バインダー樹脂46中に分散された導電性粒子47が突起18の先端とランド部42の間に挟みこまれる。   Next, when the electrical component 4 is brought into close contact with the anisotropic conductive adhesive film 45 and heated and pressed, the binder resin 46 of the anisotropic conductive adhesive film 45 is heated and softened, and the binder resin 46 in which the protrusions 18 are softened by the pressing. The conductive particles 47 dispersed in the binder resin 46 are sandwiched between the tips of the protrusions 18 and the land portions 42.

積層体10は膜厚が16μm以上60μm以下と薄いにも関わらず、突起18の高さが10μm以上20μm以下になるように大きく変形しており、突起18の真裏位置に空間(ボイド)がある状態で、突起18をランド部42に押し付けると、フレキシブル配線板1aが変化してしまうが、上述したように凹部17は樹脂材料22で隙間無く充填されているので、フレキシブル配線板1aが変形しない。   Despite the thin film thickness of 16 μm to 60 μm, the laminate 10 is greatly deformed so that the height of the protrusion 18 is 10 μm to 20 μm, and there is a space (void) directly behind the protrusion 18. When the protrusion 18 is pressed against the land portion 42 in this state, the flexible wiring board 1a changes. However, since the recess 17 is filled with the resin material 22 with no gap as described above, the flexible wiring board 1a is not deformed. .

バインダー樹脂46はエポキシ樹脂のような熱硬化性の樹脂を有しており、更に加熱押圧を続けると、導電性粒子47が突起18とランド部42で挟み込まれた状態でバインダー樹脂46が硬化する。   The binder resin 46 includes a thermosetting resin such as an epoxy resin. When the heating and pressing are further continued, the binder resin 46 is cured in a state where the conductive particles 47 are sandwiched between the protrusions 18 and the land portions 42. .

図3(b)の符号2はバインダー樹脂が硬化した状態の電気装置を示している。この電気装置2は、突起18とランド部42とで導電性粒子47を挟み込むことでフレキシブル配線板1aの配線膜が、電気部品4の内部回路に電気的に接続されており、硬化したバインダー樹脂46によって機械的にも接続されている。   Reference numeral 2 in FIG. 3B denotes an electric device in a state where the binder resin is cured. In this electrical device 2, the conductive film 47 is sandwiched between the protrusion 18 and the land portion 42 so that the wiring film of the flexible wiring board 1 a is electrically connected to the internal circuit of the electrical component 4. 46 is also mechanically connected.

以上は、積層フィルム20を積層体10に貼付した後、基材シート21を剥離する場合について説明したが、本発明はこれに限定されるものではなく、上述した工程で凹部17を樹脂材料22で充填した後、樹脂材料22から基材シート21を剥離せずに、基材シート21を樹脂材料22と一緒に積層体10に貼付したまま残してもよい。   Although the above demonstrated the case where the base film 21 was peeled after sticking the laminated | multilayer film 20 to the laminated body 10, this invention is not limited to this, The recessed part 17 is resin material 22 by the process mentioned above. After the filling, the base material sheet 21 may be left attached to the laminate 10 together with the resin material 22 without peeling off the base material sheet 21 from the resin material 22.

図4の符号1bは、基材シート21が樹脂材料22と一緒に積層体10に貼付された本発明第2例のフレキシブル配線板を示している。この場合、基材シート21は剥離フィルムではなく、硬化した樹脂材料22に対して密着性の高いものを用いることが好ましい。   4 indicates a flexible wiring board according to a second example of the present invention in which the base sheet 21 is attached to the laminate 10 together with the resin material 22. In this case, the substrate sheet 21 is preferably not a release film but a material having high adhesion to the cured resin material 22.

また、凹部17の充填方法は、樹脂材料22を貼付する場合に限定されるものではない。例えば、ポリイミド樹脂前駆体である充填用樹脂と、溶媒とを混合して液状の樹脂材料を作成し、図1(a)〜(c)の工程で突起18が形成された状態の積層体10の凹部17側の面に該樹脂材料を塗布すると、凹部17が樹脂組成物で充填され、ベースフィルム11上に樹脂材料の塗布層が形成される。   Moreover, the filling method of the recessed part 17 is not limited to the case where the resin material 22 is stuck. For example, a laminate 10 in a state in which a filling resin which is a polyimide resin precursor and a solvent are mixed to create a liquid resin material and the protrusions 18 are formed in the steps of FIGS. When the resin material is applied to the surface of the concave portion 17, the concave portion 17 is filled with the resin composition, and an application layer of the resin material is formed on the base film 11.

次いで塗布層を加熱し、余分な溶媒を塗布層から蒸発させると共に、塗布層中のポリイミド前駆体を重合させると、塗布層を構成する樹脂材料が硬化する。図5の符号1cは、ベースフィルム11上で液状の樹脂材料39が硬化した状態の本発明第3例のフレキシブル配線板を示している。   Next, when the coating layer is heated to evaporate excess solvent from the coating layer and polymerize the polyimide precursor in the coating layer, the resin material constituting the coating layer is cured. Reference numeral 1 c in FIG. 5 indicates the flexible wiring board of the third example of the present invention in a state where the liquid resin material 39 is cured on the base film 11.

以上は、パターニング後の配線膜15を膨出させる場合について説明したが、本発明はこれに限定されるものではない。図6(a)の符号50は本発明に用いる積層体の第2例を示しており、積層体50はベースフィルム51と、ベースフィルム51上に配置され、銅箔のような金属箔で構成された導電膜52とを有している。   The case where the wiring film 15 after patterning is expanded has been described above, but the present invention is not limited to this. Reference numeral 50 in FIG. 6A shows a second example of the laminate used in the present invention. The laminate 50 is arranged on the base film 51 and the base film 51 and is made of a metal foil such as a copper foil. The conductive film 52 is provided.

上述した第一、第二の金型31、32を加工用突起36が配置された面と加工用凹部37が配置された面とが互いに対向するように配置し、積層体50をベースフィルム51側の面が加工用突起36が配置された面と対向し、導電膜52側の面が加工用凹部37が配置された面と対向するように第一、第二の金型31、32の間に配置する。   The first and second molds 31 and 32 described above are arranged so that the surface on which the processing protrusions 36 are disposed and the surface on which the processing recesses 37 are disposed are opposed to each other, and the laminate 50 is formed on the base film 51. Of the first and second molds 31 and 32 so that the surface on the side faces the surface on which the processing protrusions 36 are arranged and the surface on the conductive film 52 side faces the surface on which the processing recesses 37 are arranged. Place between.

第一、第二の金型31、32と積層体50を、加工用突起36と加工用凹部37とが互いに対向し、導電膜52の後述する接続部が形成される部分が互いに対向する加工用突起36と、加工用凹部37との間に位置するように位置合わせを行う(図6(b))。   The first and second molds 31 and 32 and the laminated body 50 are processed such that the processing projections 36 and the processing recesses 37 face each other, and the portions of the conductive film 52 where the connection portions described later are formed face each other. Positioning is performed so as to be positioned between the projection 36 and the processing recess 37 (FIG. 6B).

上述した第一例の積層体10の場合と同様に、この積層体50のベースフィルム51は柔軟性を有しており、導電膜は押圧によって変形可能になっているので、第一、第二の金型31、32で積層体50を挟み込むと、導電膜52がベースフィルム11を介して加工用突起36で押圧されて、加工用凹部37側へ膨出する。   As in the case of the laminated body 10 of the first example described above, the base film 51 of the laminated body 50 has flexibility, and the conductive film can be deformed by pressing. When the laminated body 50 is sandwiched between the molds 31 and 32, the conductive film 52 is pressed by the processing projection 36 through the base film 11 and bulges toward the processing recess 37.

加工用凹部37と加工用突起36の大きさは、導電膜52を挟んで嵌合したときに、導電膜52の表面が他の部分の表面から10μm以上20μm以下の高さに盛り上がるようになっており、その盛り上がった部分と加工用凹部37の内壁との間に隙間が生じないようになっている。   The size of the processing recesses 37 and the processing protrusions 36 is such that when the conductive film 52 is fitted therebetween, the surface of the conductive film 52 rises to a height of 10 μm or more and 20 μm or less from the surface of the other part. Thus, no gap is formed between the raised portion and the inner wall of the processing recess 37.

従って、積層体50を挟み込んだ状態で加工用凹部37と加工用突起36が嵌合すると、導電膜52に高さ10μm以上20μm以下であって、加工用凹部37の形状に応じた形の突起58が形成される。   Therefore, when the processing concave portion 37 and the processing projection 36 are fitted with the laminated body 50 being sandwiched, the height of the conductive film 52 is 10 μm or more and 20 μm or less, and the projection has a shape corresponding to the shape of the processing concave portion 37. 58 is formed.

図6(d)は第一、第二の金型31、32の間から積層体50を取り出した状態を示している。導電膜52は塑性変形し、突起58が形成された状態が維持されており、ベースフィルム51の突起58の真裏部分は導電膜52と一緒に変形し、凹部57が形成されている。   FIG. 6D shows a state in which the stacked body 50 is taken out between the first and second molds 31 and 32. The conductive film 52 is plastically deformed and the state where the protrusions 58 are formed is maintained, and the portion directly behind the protrusions 58 of the base film 51 is deformed together with the conductive film 52 to form the recesses 57.

次に、上述した図1(d)〜図2(f)、図4、図5に示したいずれかの方法で凹部57に樹脂材料22を充填した後、導電膜52の突起58が形成された側の面にレジスト層25を形成する(図6(e))。   Next, after filling the recess 57 with the resin material 22 by any of the methods shown in FIGS. 1D to 2F, 4 and 5, the projection 58 of the conductive film 52 is formed. A resist layer 25 is formed on the opposite surface (FIG. 6E).

導電膜52の所定位置に細長のレジスト層25が残留し、細長のレジスト層25の長手方向の端部であって、突起58上の位置に幅広のレジスト層25が残留するように、レジスト層25の露光、現像する(パターニング)。   The resist layer 25 is left so that the elongated resist layer 25 remains at a predetermined position of the conductive film 52, and the wide resist layer 25 remains at a position on the protrusion 58 at the longitudinal end of the elongated resist layer 25. 25 exposure and development (patterning).

図7(f)はパターニングされたレジスト層25が導電膜52上に配置された状態を示しており、パターニングされたレジスト層25の間に露出する導電膜52をエッチング除去すると、導電膜52の幅広のレジスト層25が残留した部分が接続部56として残り、細長のレジスト層25が残留した部分が配線部として残り、接続部56と配線部とを有する配線膜55が形成される。図7(g)の符号1dは配線膜55上からレジスト層25を除去した状態の本発明第4例のフレキシブル配線板を示している。   FIG. 7F shows a state in which the patterned resist layer 25 is disposed on the conductive film 52. When the conductive film 52 exposed between the patterned resist layers 25 is removed by etching, the conductive film 52 is removed. The portion where the wide resist layer 25 remains is left as the connection portion 56, the portion where the elongated resist layer 25 remains is left as the wiring portion, and the wiring film 55 having the connection portion 56 and the wiring portion is formed. Reference numeral 1d in FIG. 7G shows the flexible wiring board of the fourth example of the present invention in a state where the resist layer 25 is removed from the wiring film 55.

以上は、樹脂材料22で凹部57を充填した後に、導電膜55のパターニングを行う場合について説明したが、本発明はこれに限定されるものではなく、例えば、図6(a)〜(d)に示した工程で導電膜52に突起58を形成した後、凹部57を充填する前に、導電膜52上にレジスト層25を配置し、上述した図6(e)、図7(f)に示した工程でレジスト層25を露光、現像する(図8(a))。   Although the case where the conductive film 55 is patterned after filling the recess 57 with the resin material 22 has been described above, the present invention is not limited to this. For example, FIGS. After forming the protrusions 58 on the conductive film 52 in the process shown in FIG. 6 and before filling the recess 57, the resist layer 25 is disposed on the conductive film 52, and the above-described FIG. 6 (e) and FIG. The resist layer 25 is exposed and developed in the steps shown (FIG. 8A).

レジスト層25の間に露出する導電膜52をエッチング除去し、レジスト層25を除去した後、図1(d)〜図2(f)、図4、図5に示したいずれかの方法で凹部57に樹脂材料22を充填すれば、図8(c)の符号1eに示すような本発明第5例のフレキシブル配線板が得られる。   After the conductive film 52 exposed between the resist layers 25 is removed by etching and the resist layer 25 is removed, the concave portions are formed by any of the methods shown in FIGS. 1 (d) to 2 (f), FIG. 4, and FIG. If the resin material 22 is filled in 57, the flexible wiring board of the fifth example of the present invention as shown by reference numeral 1e in FIG.

以上は、ベースフィルム11を介して加工用突起36で導電膜52を押圧する場合について説明したが、本発明はこれに限定されるものではない。
図9(a)は本発明に用いる第3例の積層体60を示しており、この積層体60はキャリアフィルム61と、キャリアフィルム61上に配置された導電膜62とを有している。
Although the above has described the case where the conductive film 52 is pressed by the processing projection 36 via the base film 11, the present invention is not limited to this.
FIG. 9A shows a laminated body 60 of a third example used in the present invention, and this laminated body 60 has a carrier film 61 and a conductive film 62 disposed on the carrier film 61.

この積層体60を、導電膜62側の面と加工用突起36が配置された側の面と対向し、キャリアフィルム61側の面が加工用凹部37が配置された側の面と対向するように、上述した第一、第二の金型31、32の間に配置し、加工用突起36と加工用凹部37が互いに対向し、導電膜62の後述する接続部が形成される部分が対向する加工用突起36と加工用凹部37の間に位置するように位置あわせをし、第一、第二の金型31、32で積層体60を挟み込むと、導電膜62に加工用突起36に押し当てられ、導電膜62がキャリアフィルム61側に押し曲げられ、導電膜62がキャリアフィルム61側に膨出して突起68が形成されると同時に、突起68の真裏位置が窪み、凹部67が形成される(図9(b))。   The laminated body 60 is opposed to the surface on the conductive film 62 side and the surface on the side where the processing projections 36 are disposed, and the surface on the carrier film 61 side is opposed to the surface on the side where the processing recesses 37 are disposed. Are disposed between the first and second molds 31 and 32 described above, the processing projection 36 and the processing recess 37 are opposed to each other, and a portion of the conductive film 62 where a connection portion described later is formed is opposed. When the laminated body 60 is sandwiched between the first and second molds 31 and 32 so as to be positioned between the processing projection 36 and the processing recess 37, the conductive projection 62 has the processing projection 36. The conductive film 62 is pushed and bent to the carrier film 61 side, and the conductive film 62 bulges to the carrier film 61 side to form the protrusion 68. At the same time, the position directly behind the protrusion 68 is depressed, and the recess 67 is formed. (FIG. 9B).

キャリアフィルム61は柔軟性を有する樹脂で構成されており、その膜厚はキャリアフィルム61が可撓性を有する程度に薄くされているので、導電膜62が変形すると、キャリアフィルム61も一緒に変形する。   The carrier film 61 is made of a resin having flexibility, and the thickness thereof is thin enough to make the carrier film 61 flexible. Therefore, when the conductive film 62 is deformed, the carrier film 61 is also deformed together. To do.

図9(c)は第一、第二の金型31、32の間から取り出し、加工用突起36による荷重を無くした状態を積層体60を示している。導電膜62は塑性変形し、キャリアフィルム61側に膨出した突起68が形成され、突起68の真裏位置に凹部67が形成された状態が維持されており、キャリアフィルム61は導電膜62と一緒に変形している。   FIG. 9C shows the laminated body 60 in a state where the load is removed from between the first and second molds 31 and 32 and the load by the processing projections 36 is eliminated. The conductive film 62 is plastically deformed to form a protrusion 68 that bulges toward the carrier film 61, and maintains a state in which a recess 67 is formed at a position directly behind the protrusion 68. Is deformed.

次に、導電膜62のキャリアフィルム61とは反対側の面にレジスト層25を形成する(図9(d))。導電膜62の所定位置に細長のレジスト層25が残留し、細長のレジスト層25の長手方向の端部であって、凹部67上に幅広のレジスト層25が残留するように、レジスト層25のパターニングを行う(図9(e))。   Next, a resist layer 25 is formed on the surface of the conductive film 62 opposite to the carrier film 61 (FIG. 9D). The elongated resist layer 25 remains at a predetermined position of the conductive film 62, and the wide resist layer 25 remains on the recess 67 at the longitudinal end of the elongated resist layer 25. Patterning is performed (FIG. 9E).

パターニングされたレジスト層25の間に露出する導電膜62をエッチング除去すると、導電膜62の幅広のレジスト層25が残留する部分が幅広の接続部66として残り、細長のレジスト層25が残留する部分が細長の配線部として残り、接続部66と配線部とを有する配線膜が形成される。   When the conductive film 62 exposed between the patterned resist layers 25 is removed by etching, a portion of the conductive film 62 where the wide resist layer 25 remains remains as a wide connection portion 66, and a portion where the elongated resist layer 25 remains. Remains as an elongated wiring portion, and a wiring film having a connection portion 66 and a wiring portion is formed.

図9(f)は配線膜65が形成された状態を示しており、レジスト層25をパターニングする工程と、導電膜62をエッチング除去する工程では、キャリアフィルム61は除去されないので、配線膜65はキャリアフィルム61によって支持されている。   FIG. 9F shows a state in which the wiring film 65 is formed. Since the carrier film 61 is not removed in the process of patterning the resist layer 25 and the process of removing the conductive film 62 by etching, the wiring film 65 is It is supported by the carrier film 61.

ポリイミド前駆体である充填用樹脂と、溶媒とを混合して液状の樹脂材料を作成し、キャリアフィルム61の配線膜65が形成された側の面に塗布すると、配線膜65の間と、接続部66に形成された凹部67に樹脂材料が充填され、配線膜65に密着する樹脂材料の塗布層が形成される。   A liquid resin material is prepared by mixing a filling resin that is a polyimide precursor and a solvent, and is applied to the surface of the carrier film 61 on which the wiring film 65 is formed. The recess 67 formed in the portion 66 is filled with a resin material, and a coating layer of the resin material that is in close contact with the wiring film 65 is formed.

次いで、塗布層を加熱すると、充填用樹脂が熱重合し、樹脂材料が凹部67を充填した状態で硬化し、効果した樹脂材料からなるベースフィルム63が形成される(図10(g))。
次いで、キャリアフィルム61を除去し、突起68を露出させると、図10(h)に示すような本発明第6例のフレキシブル配線1dが得られる。
Next, when the coating layer is heated, the filling resin is thermally polymerized, the resin material is cured in a state where the recess 67 is filled, and the base film 63 made of the effective resin material is formed (FIG. 10G).
Next, when the carrier film 61 is removed and the protrusions 68 are exposed, the flexible wiring 1d of the sixth example of the present invention as shown in FIG. 10 (h) is obtained.

上述したように、配線膜65の間と、凹部67に充填された樹脂材料が硬化してベースフィルム63が形成されているので、配線膜65の間と凹部67内にはベースフィルム63が配置された状態になっている。   As described above, since the base film 63 is formed between the wiring films 65 and the resin material filled in the recesses 67 is cured, the base film 63 is disposed between the wiring films 65 and in the recesses 67. It is in the state that was done.

以上は、導電膜を、ベースフィルムやキャリアフィルムと一緒に変形させて突起を形成する場合について説明したが、本発明はこれに限定されるものではない。
図11(a)の符号62は金属箔からなる導電膜を示しており、この導電膜62を、第一の金型31の加工用突起36が形成された面と、第二の金型32の加工用凹部37が形成された面の間に配置し、第一、第二の金型31、32と、導電膜62を、加工用突起36と加工用凹部37が互いに対向し、導電膜62の後述する接続部が形成される部分が、互いに対向する加工用突起36と加工用凹部37の間に位置するよう位置合わせを行った後、第一、第二の金型31、32で導電膜62を挟み込むと、導電膜62が各加工用突起36で直接押圧され、加工用凹部37側に膨出する。
Although the above has described the case where the conductive film is deformed together with the base film and the carrier film to form the protrusions, the present invention is not limited to this.
Reference numeral 62 in FIG. 11A denotes a conductive film made of a metal foil. The conductive film 62 includes a surface on which the processing protrusions 36 of the first mold 31 are formed and a second mold 32. Between the first and second molds 31 and 32 and the conductive film 62, the processing projection 36 and the processing recess 37 face each other, and the conductive film After performing alignment so that a portion of a connecting portion 62 to be described later is formed between the processing protrusion 36 and the processing recess 37 facing each other, the first and second molds 31 and 32 are used. When the conductive film 62 is sandwiched, the conductive film 62 is directly pressed by the respective processing protrusions 36 and bulges toward the processing concave portion 37 side.

加工用凹部37と加工用突起36の大きさは、導電膜62を挟み込んで嵌合したときに、導電膜62の表面が他の部分の表面から10μm以上20μm以下の高さに加工用凹部37側に盛り上がり、その盛り上がった部分と加工用凹部37の内壁との間に隙間が生じないようになっている。   The size of the processing recess 37 and the processing protrusion 36 is such that when the conductive film 62 is sandwiched and fitted, the surface of the conductive film 62 has a height of 10 μm to 20 μm from the surface of the other part. It swells to the side, and no gap is formed between the raised part and the inner wall of the processing recess 37.

従って、導電膜62の加工用突起36で押圧された部分には、高さが10μm以上20μ以下であって、加工用突起36と対応した形状の突起68が形成されると同時に、突起68の真裏位置に加工用突起36と対応した形状の凹部67が形成される。   Accordingly, at the portion pressed by the processing projection 36 of the conductive film 62, a projection 68 having a height of 10 μm or more and 20 μm or less and having a shape corresponding to the processing projection 36 is formed. A concave portion 67 having a shape corresponding to the processing projection 36 is formed at the true back position.

第一、第二の金型31、32から突起68と凹部67が形成された状態の導電膜62を取り出し、導電膜62の凹部67が形成された側の面にキャリアフィルム61を配置する。図9(c)〜図(f)に示した工程で導電膜72の所定部分をエッチング除去して接続部と配線部とを有する配線膜を形成し、図10(g)、(h)に示した工程でベースフィルムを形成すると、図10(h)に示したようなフレキシブル配線板1dが得られる。   The conductive film 62 in which the protrusions 68 and the recesses 67 are formed is taken out of the first and second molds 31 and 32, and the carrier film 61 is disposed on the surface of the conductive film 62 on the side where the recesses 67 are formed. A predetermined portion of the conductive film 72 is removed by etching in the steps shown in FIGS. 9C to 9F to form a wiring film having a connection portion and a wiring portion. FIGS. When the base film is formed in the process shown, a flexible wiring board 1d as shown in FIG. 10 (h) is obtained.

以上は、導電膜72をパターニングした後、ベースフィルムを形成する場合について説明したが、本発明はこれに限定されるものではない。
図12(a)は図11(a)、(b)に示した工程で、導電膜62に突起68と凹部67が形成された状態を示しており、この導電膜62の凹部67が形成された側の面に、図10(g)、(h)に示した工程でベースフィルム71を形成すると、凹部67がベースフィルム71を構成する樹脂材料で充填される(図12(b))。
The above describes the case where the base film is formed after the conductive film 72 is patterned, but the present invention is not limited to this.
FIG. 12A shows a state in which the protrusion 68 and the recess 67 are formed in the conductive film 62 in the process shown in FIGS. 11A and 11B, and the recess 67 of the conductive film 62 is formed. When the base film 71 is formed on the surface on the other side in the steps shown in FIGS. 10G and 10H, the recesses 67 are filled with the resin material constituting the base film 71 (FIG. 12B).

次に、図6(e)、図7(f)、(g)に示した工程で、導電膜62の所定部分をエッチング除去すると、突起68が位置する部分に形成された幅広の接続部66と、該接続部に接続された細長の配線部からなる配線膜65が形成され、図12(c)に示すようなフレキシブル配線板1eが得られる。このフレキシブル配線板1eでは、配線膜65の凹部67がベースフィルム71の樹脂材料で充填されている。   Next, when a predetermined portion of the conductive film 62 is removed by etching in the steps shown in FIGS. 6E, 7F, and 7G, the wide connection portion 66 formed in the portion where the protrusion 68 is located. Then, a wiring film 65 composed of an elongated wiring portion connected to the connection portion is formed, and a flexible wiring board 1e as shown in FIG. 12C is obtained. In this flexible wiring board 1 e, the recess 67 of the wiring film 65 is filled with the resin material of the base film 71.

以上は、ベースフィルム71を構成する樹脂材料で凹部67が充填される場合について説明したが、本発明はこれに限定されるものではない。
図13の符号1fに示すフレキシブル配線板は、配線膜44の突起48が形成された側の面がベースフィルム40に密着して配置されており、ベースフィルム40の突起48上に位置する部分はエッチング除去され、突起48の先端部分がベースフィルム40表面から突き出されている。
The case where the recess 67 is filled with the resin material constituting the base film 71 has been described above, but the present invention is not limited to this.
The flexible wiring board denoted by reference numeral 1f in FIG. 13 is arranged such that the surface of the wiring film 44 on which the protrusion 48 is formed is in close contact with the base film 40, and the portion located on the protrusion 48 of the base film 40 is Etching is removed, and the tip of the protrusion 48 protrudes from the surface of the base film 40.

配線膜44には上述した図1(b)、(c)又は図6(b)、(c)で示した工程で突起48が形成される時に、突起48の真裏位置に凹部49が形成されている。ベースフィルム40の配線膜44が配置された面には、上述した図1(d)、図2(e)、(f)に示した工程、図4で示した工程又は図5で示した工程で樹脂材料69が配置され、凹部49内部が樹脂材料69で充填されている。   When the projection 48 is formed in the wiring film 44 in the steps shown in FIGS. 1B and 1C or FIGS. 6B and 6C described above, a recess 49 is formed at a position directly behind the projection 48. ing. On the surface of the base film 40 on which the wiring film 44 is disposed, the steps shown in FIGS. 1D, 2E, and 2F, the step shown in FIG. 4, or the step shown in FIG. The resin material 69 is disposed, and the inside of the recess 49 is filled with the resin material 69.

以上は、フレキシブル配線板の片面に突起を形成する場合について説明したが、本発明はこれに限定されるものではない。
図14(a)の符号80は積層体を示している。この積層体80はベースフィルム81を有しており、ベースフィルム81の表面と裏面には、パターニングされた金属膜からなる第一、第二の配線膜85a、85bが配置されている。ベースフィルム81には導電材料83が充填された貫通孔82が設けられ、第一、第二の配線膜85a、85bはその導電材料83によって電気的に接続されている。
The above describes the case where the protrusion is formed on one surface of the flexible wiring board, but the present invention is not limited to this.
The code | symbol 80 of Fig.14 (a) has shown the laminated body. The laminate 80 has a base film 81, and first and second wiring films 85 a and 85 b made of a patterned metal film are arranged on the front and back surfaces of the base film 81. The base film 81 is provided with a through hole 82 filled with a conductive material 83, and the first and second wiring films 85 a and 85 b are electrically connected by the conductive material 83.

図14(a)の符号91、92はそれぞれ第一、第二の金型を示している。
第一の金型91の一面には、第一、第二の金型91、92で積層体90を挟み込んだ時に、積層体80の表面に突起を形成すべき位置に第一の加工用凹部98が形成され、積層体80の裏面に突起を形成すべき位置に第一の加工用突起96が形成されている。
Reference numerals 91 and 92 in FIG. 14A indicate first and second molds, respectively.
On one surface of the first mold 91, when the laminate 90 is sandwiched between the first and second molds 91 and 92, the first processing recess is formed at a position where a projection should be formed on the surface of the laminate 80. 98 is formed, and a first processing projection 96 is formed at a position where a projection is to be formed on the back surface of the laminate 80.

他方、第二の金型92の一面には、第一、第二の金型91、92で積層体80を挟み込んだ時に、積層体80の表面に突起を形成すべき位置に第二の加工用突起97が形成され、積層体80の裏面に突起を形成すべき位置に第二の加工用凹部99が形成されている。   On the other hand, when the laminated body 80 is sandwiched between the first and second molds 91 and 92 on one surface of the second mold 92, the second processing is performed at a position where a protrusion should be formed on the surface of the laminated body 80. A projection 97 is formed, and a second processing recess 99 is formed at a position where the projection is to be formed on the back surface of the laminate 80.

第一の加工用凹部98は第二の加工用突起97と相似形であって、その容積は第二の加工用突起97の体積よりも大きく、また、第二の加工用凹部99は第一の加工用突起96と相似形であって、その容積は第一の加工用突起96の体積よりも大きくされているので、第一、第二の金型91、92の間に上述した積層体80を配置し、第一、第二の金型91、92で積層体80を挟み込み、積層体80をプレスすると、第一の加工用突起96と、第二の加工用凹部99が積層体80を挟んだ状態で嵌合し、第二の加工用突起97と第一の加工用凹部98とが積層体80を挟んだ状態で嵌合する。   The first machining recess 98 is similar in shape to the second machining projection 97, and its volume is larger than the volume of the second machining projection 97, and the second machining recess 99 is the first machining recess 99. And the volume thereof is larger than the volume of the first processing projection 96, so that the laminate described above between the first and second molds 91, 92. When the laminated body 80 is sandwiched between the first and second molds 91 and 92 and the laminated body 80 is pressed, the first processing protrusion 96 and the second processing recess 99 are formed in the laminated body 80. The second processing projection 97 and the first processing recess 98 are fitted in a state where the laminate 80 is sandwiched.

第一の配線膜85aは積層体80の表面に位置し、第二の配線膜85bは積層体80の裏面に位置しており、第一、第二の配線膜85a、85bは所定形状にパターニングされ、該パターニングによって突起を形成すべき部分は幅広にされ、第一、第二の接続部86a、86bが形成されている。   The first wiring film 85a is located on the front surface of the laminate 80, the second wiring film 85b is located on the back surface of the laminate 80, and the first and second wiring films 85a and 85b are patterned into a predetermined shape. The portion where the protrusion is to be formed is widened by the patterning, and the first and second connection portions 86a and 86b are formed.

従って、第一の加工用突起96と第二の加工用凹部99が嵌合すると、第一の加工用突起96が第一の接続部86aの真裏に位置するベースフィルム81又は第二の配線膜85bを押し上げ、第一の接続部86aが第二の加工用凹部99側へ膨出し、第二の加工用突起97が第一の加工用凹部98に嵌合すると、第二の加工用突起97が第二の接続部86bの真裏位置でベースフィルム81又は第一の配線膜85aを押し上げ、第二の接続部86bが第一の加工用凹部98側へ膨出される。   Accordingly, when the first processing projection 96 and the second processing recess 99 are fitted, the first processing projection 96 is located directly behind the first connecting portion 86a or the second wiring film. When 85b is pushed up, the first connecting portion 86a bulges toward the second processing recess 99, and the second processing projection 97 is fitted into the first processing recess 98, the second processing projection 97. Pushes up the base film 81 or the first wiring film 85a at a position directly behind the second connection portion 86b, and the second connection portion 86b bulges toward the first processing recess 98 side.

第一の加工用突起96と第一の加工用凹部98は同じ第一の金型91に形成され、第二の加工用突起97と第二の加工用凹部99は同じ第二の金型に形成されているので、1回のプレスで積層体80の表面側の第一の接続部86aと、裏面側の第二の接続部86bが一緒に膨出し、第一、第二の突起88a、88bが形成される(図14(b))。   The first processing projection 96 and the first processing recess 98 are formed in the same first mold 91, and the second processing projection 97 and the second processing recess 99 are formed in the same second mold. Since it is formed, the first connection portion 86a on the front surface side of the laminate 80 and the second connection portion 86b on the back surface side bulge together in one press, and the first and second protrusions 88a, 88b is formed (FIG. 14B).

図14(c)は積層体80を第一、第二の金型91、92から取り出し、第一、第二の加工用突起96、97が積層体80から取り払われた後の状態を示している。第一、第二の配線膜85a、85bは金属膜のような展性を有する導電膜で構成されているので、第一、第二の接続部86a、86bの膨出された部分は塑性変形し、第一、第二の突起88a、88bが形成された状態が維持されている。   FIG. 14C shows a state after the laminated body 80 is taken out from the first and second molds 91 and 92 and the first and second processing projections 96 and 97 are removed from the laminated body 80. Yes. Since the first and second wiring films 85a and 85b are formed of a conductive film having malleability such as a metal film, the bulged portions of the first and second connection portions 86a and 86b are plastically deformed. However, the state in which the first and second protrusions 88a and 88b are formed is maintained.

第一、第二の突起88a、88bの真裏に位置するベースフィルム81や第一、第二の配線膜85a、85bは第一、第二の突起88a、88bが形成される時に一緒に窪み、第一、第二の加工用突起96、97が取り払われた後も窪んだ状態が維持され、第一、第二の凹部87a、87bが形成されている。   The base film 81 and the first and second wiring films 85a and 85b located directly behind the first and second protrusions 88a and 88b are recessed together when the first and second protrusions 88a and 88b are formed, Even after the first and second processing projections 96 and 97 are removed, the depressed state is maintained, and the first and second recesses 87a and 87b are formed.

従って、第一、第二の金型91、92から取り出した状態では、積層体80の表面には第一の突起88aと第一の凹部87aの両方が形成され、裏面には第二の突起88bと第二の凹部87bの両方が形成されている。   Therefore, in the state where it is taken out from the first and second molds 91 and 92, both the first protrusion 88a and the first recess 87a are formed on the surface of the laminate 80, and the second protrusion is formed on the back surface. Both 88b and the second recess 87b are formed.

次に、積層体80の表面及び裏面に、上述した図1(d)、図2(e)、(f)に示した工程、図4で示した工程又は図5で示した方法で樹脂材料95を配置し、第一、第二の凹部87a、87b内に樹脂材料95を充填した後、第一、第二の突起88a、88bの先端部分が露出し、かつ、第一、第二の凹部87a、87b内に充填された樹脂材料95が残る程度に、樹脂材料95のエッチングを行うと、フレキシブル配線板1gが得られる(図14(d))。   Next, a resin material is applied to the front and back surfaces of the laminate 80 by the steps shown in FIGS. 1D, 2E, and 2F, the step shown in FIG. 4, or the method shown in FIG. 95, and the first and second recesses 87a and 87b are filled with the resin material 95, then the tip portions of the first and second protrusions 88a and 88b are exposed, and the first and second protrusions 88a and 88b are exposed. If the resin material 95 is etched to such an extent that the resin material 95 filled in the recesses 87a and 87b remains, a flexible wiring board 1g is obtained (FIG. 14D).

以上は、予めパターニングされた第一、第二の配線膜85a、85bに第一、第二の突起88a、88bを形成する場合について説明したが、本発明はこれに限定されるものではない。例えば、ベースフィルムの表面及び裏面にパターニング前の第一、第二の導電膜が配置して積層体を作成し、該積層体を上述した第一、第二の金型91、92で挟み込んで、その表面に第一の突起と第一の凹部を形成すると同時に、その裏面に第二の突起と第二の凹部を形成した後、第一、第二n導電膜を所定形状にパターニングした後、上述した図14(c)、(d)で説明した工程で、第一、第二の凹部内部に樹脂材料を充填した場合も、図14(d)に示すようなフレキシブル配線板が得られる。   The above describes the case where the first and second protrusions 88a and 88b are formed on the first and second wiring films 85a and 85b that are patterned in advance, but the present invention is not limited to this. For example, first and second conductive films before patterning are arranged on the front and back surfaces of the base film to create a laminate, and the laminate is sandwiched between the first and second molds 91 and 92 described above. After the first protrusion and the first recess are formed on the surface, the second protrusion and the second recess are formed on the back surface, and then the first and second n conductive films are patterned into a predetermined shape. The flexible wiring board shown in FIG. 14 (d) can be obtained even when the resin material is filled in the first and second recesses in the steps described in FIGS. 14 (c) and 14 (d). .

両面に突起を有するフレキシブル配線板を製造する場合も、配線膜(第一、第二の配線膜)や導電膜の膜厚が8μm以上35μm以下と薄く、ベースフィルムの膜厚が8μm以上25μm以下と薄ければ、積層体80が容易に変形するので、第一、第二の加工用突起96、97で押圧する時の荷重が少なくて済む。   When manufacturing flexible wiring boards having protrusions on both sides, the thickness of the wiring film (first and second wiring films) and the conductive film is as thin as 8 μm to 35 μm, and the thickness of the base film is 8 μm to 25 μm. If it is thin, the laminate 80 is easily deformed, so that the load when pressing with the first and second processing projections 96 and 97 can be reduced.

以上は、第一、第二の加工用突起96、97が第一、第二の配線膜85a、85b又はベースフィルムに直接接触する場合について説明したが、本発明はこれに限定されず、例えば積層体80の表面及び裏面にカバーフィルムを貼付し、第一、第二の加工用突起96、97を、カバーフィルムの第一、第二の接続部の裏面側の位置に押し当てれば、第一、第二の突起を形成する時に、第一、第二の配線膜やベースフィルムに第一、第二の加工用突起96、97が直接接触せず、第一、第二の加工用突起96、97にかける荷重を大きくしても、第一、第二の配線膜やベースフィルムが破損しない。   The above describes the case where the first and second processing projections 96 and 97 are in direct contact with the first and second wiring films 85a and 85b or the base film, but the present invention is not limited to this. If a cover film is affixed to the front surface and the back surface of the laminate 80 and the first and second processing projections 96 and 97 are pressed against the positions on the back surface side of the first and second connecting portions of the cover film, When the first and second protrusions are formed, the first and second processing protrusions 96 and 97 are not in direct contact with the first and second wiring films and the base film. Even if the load applied to 96 and 97 is increased, the first and second wiring films and the base film are not damaged.

以上は、予めパターニングされた第一、第二の配線膜85a、85bに突起をそれぞれ形成する場合について説明したが、本発明はこれに限定されるものではなく、ベースフィルムの両面にパターニング前の第一、第二の導電膜を配置し、第一、第二の突起を第一、第二の導電膜にそれぞれ形成した後、第一、第二の導電膜をパターニングすれば、第一、第二の突起が形成された状態の第一、第二の配線膜が得られる。   The above has described the case where the protrusions are formed on the first and second wiring films 85a and 85b that have been patterned in advance. However, the present invention is not limited to this, and the pattern before patterning is formed on both surfaces of the base film. After arranging the first and second conductive films and forming the first and second protrusions on the first and second conductive films, respectively, the first and second conductive films are patterned, The first and second wiring films with the second protrusions formed are obtained.

以上は、第一、第二の配線膜が貫通孔内の導電性材料によって電気的に接続された場合について説明したが、本発明はこれに限定されるものではなく、第一、第二の配線膜が電気的に接続されていない場合も本発明には含まれる。   The above describes the case where the first and second wiring films are electrically connected by the conductive material in the through hole, but the present invention is not limited to this, and the first and second The case where the wiring film is not electrically connected is also included in the present invention.

以上は、導電膜や配線膜の表面及び裏面のうち、いずれか一方又は両方が、加工用突起36や加工用凹部37に直接接触させて突起を形成する場合について説明したが、本発明はこれに限定されるものではない。   The above has described the case where one or both of the front and back surfaces of the conductive film and wiring film are in direct contact with the processing protrusions 36 and the processing recesses 37 to form the protrusions. It is not limited to.

上述した積層体、又は導電膜のうち、導電膜表面が露出する部分に保護フィルムを貼付した後、加工用突起36で押圧すれば、導電膜や配線膜が加工用突起36や加工用凹部37に直接接触させずに、突起を形成することができるので、導電膜や配線膜の損傷を防御することができる。   If a protective film is affixed to the exposed portion of the conductive film surface of the laminate or conductive film described above and then pressed by the processing protrusions 36, the conductive film and the wiring film become the processing protrusions 36 and the processing recesses 37. Since the protrusions can be formed without being in direct contact with each other, damage to the conductive film and the wiring film can be prevented.

以上はベースフィルム11にポリイミド樹脂を含有するものを用いる場合について説明したが、本発明はこれに限定されるものではなく、可撓性を有するベースフィルムを形成可能な樹脂であれば、ポリエステル樹脂、ポリアミド樹脂等種々のものを用いることが可能であり、これらの樹脂は単独で用いてもよいし、2種類以上混合して用いてもよい。   The above is a case where a base film 11 containing a polyimide resin is used. However, the present invention is not limited to this, and a polyester resin can be used as long as it is a resin capable of forming a flexible base film. Various resins such as polyamide resin can be used, and these resins may be used alone or in combination of two or more.

フレキシブル配線板と電気部品を接続する際に、熱硬化性の接着剤を用いる場合には、ベースフィルムの主成分である樹脂のガラス転移温度が低いと、フレキシブル配線板が変形する原因となるので、そのガラス転移温度は300℃以上であることが好ましい。また、可撓性を有しない範囲であれば、2枚以上の樹脂フィルムを張り合わせてベースフィルム11としてもよい。   When using a thermosetting adhesive to connect the flexible wiring board and electrical components, if the glass transition temperature of the resin that is the main component of the base film is low, the flexible wiring board may be deformed. The glass transition temperature is preferably 300 ° C. or higher. Moreover, as long as it is a range which does not have flexibility, it is good also as the base film 11 by bonding together 2 or more resin films.

突起を形成するときには、積層体又は導電膜を加熱しながら加工用突起36で押圧することもできる。本発明に用いるベースフィルムは膜厚が8μm以上25μm以下と薄く、高い温度で加熱されるとベースフィルムが破断する場合があるので、加工用突起36で押圧するときの温度は、ベースフィルムの主成分である樹脂のガラス転移温度未満であることが好ましい。   When forming the protrusion, the laminate or the conductive film can be pressed with the processing protrusion 36 while being heated. The base film used in the present invention has a thin film thickness of 8 μm or more and 25 μm or less, and when heated at a high temperature, the base film may be broken. It is preferable that it is less than the glass transition temperature of resin which is a component.

導電膜や配線膜を構成する導電材料も銅に限定されるものではなく、アルミニウム等種々の導電材料を用いることができる。
凹部を充填する樹脂材料の樹脂もポリイミド樹脂に限定されるものではなく、凹部が形成された対象物(ベースフィルムや導電膜)に対して接着性が高い樹脂であれば、エポキシ樹脂、アクリル樹脂等種々の樹脂を含有するものを用いることができる。
The conductive material constituting the conductive film and the wiring film is not limited to copper, and various conductive materials such as aluminum can be used.
The resin of the resin material that fills the recess is not limited to the polyimide resin, and an epoxy resin or an acrylic resin can be used as long as the resin has high adhesion to the object (base film or conductive film) in which the recess is formed. Those containing various resins can be used.

凹部内に樹脂材料を配置した後、加熱によって樹脂材料を硬化させる場合には、その加熱温度はベースフィルムの主成分であるガラス転移温度未満であることが好ましい。また、該樹脂材料を硬化させる方法は加熱に限定されず、例えば樹脂材料に光重合性樹脂を含有させた場合には、光照射によって樹脂材料を硬化させることができる。   In the case where the resin material is cured by heating after the resin material is disposed in the recess, the heating temperature is preferably lower than the glass transition temperature that is the main component of the base film. Further, the method of curing the resin material is not limited to heating. For example, when a resin material contains a photopolymerizable resin, the resin material can be cured by light irradiation.

ベースフィルムの凹部に樹脂材料を配置する場合には、ベースフィルムの主成分と同じ種類の樹脂を含有する樹脂材料を用いれば、樹脂材料とベースフィルムの密着性が高くなる。   When the resin material is disposed in the recess of the base film, the adhesion between the resin material and the base film is enhanced by using a resin material containing the same type of resin as the main component of the base film.

また、以上はベースフィルムや配線膜の凹部に、樹脂材料を隙間無く充填する場合について説明したが、本発明はこれに限定されず、突起がランド部に押し当てられる時にフレキシブル配線板が変形しない程度であれば、樹脂材料を配置した後の凹部に多少の空間(ボイド)が残ってもよい。   Moreover, although the above demonstrated the case where the resin material was filled in the recessed part of a base film or a wiring film without gap, this invention is not limited to this, A flexible wiring board does not deform | transform when a protrusion is pressed on a land part. If it is about a degree, some space (void) may remain in the recess after the resin material is disposed.

樹脂材料の配置に用いる基材シートの種類は特に限定されるものではないが、基材シートを樹脂材料から剥離せずに、フレキシブル配線板に残す場合には、柔軟性を有する樹脂フィルムを用いることが好ましい。   The kind of the base material sheet used for the arrangement of the resin material is not particularly limited, but when the base material sheet is left on the flexible wiring board without being peeled from the resin material, a flexible resin film is used. It is preferable.

樹脂材料を塗布する場合には、その塗布方法は特に限定されるものではなく、ワイヤバー、グラビアコーター等種々の塗布装置を用いて塗布することができる。 樹脂材料は積層体の凹部が形成された面全部に配置してもよいし、凹部が形成された部分だけに配置してもよい。また、インクジェットプリンタ等の塗布装置に液状の樹脂材料を充填し、該塗布装置のノズルから樹脂材料を凹部に向けて吐出し、凹部が位置する部分だけに樹脂材料を配置してもよい。   When the resin material is applied, the application method is not particularly limited, and it can be applied using various application devices such as a wire bar and a gravure coater. The resin material may be disposed on the entire surface of the laminate where the recesses are formed, or may be disposed only on the portion where the recesses are formed. Alternatively, a liquid resin material may be filled in a coating apparatus such as an ink jet printer, and the resin material may be discharged from the nozzle of the coating apparatus toward the concave portion, and the resin material may be disposed only in a portion where the concave portion is located.

本発明のフレキシブル配線板に接続される電気部品は半導体素子に限定されず、本発明のフレキシブル配線板には他のフレキシブル配線板、リジッド基板、抵抗器等種々のものを接続することができる。   The electrical component connected to the flexible wiring board of the present invention is not limited to a semiconductor element, and various flexible wiring boards, rigid boards, resistors, and the like can be connected to the flexible wiring board of the present invention.

(a)〜(d):本発明のフレキシブル配線板の製造工程の第一例の前半を説明する断面図(A)-(d): Sectional drawing explaining the first half of the 1st example of the manufacturing process of the flexible wiring board of this invention. (e)、(f):本発明のフレキシブル配線板の製造工程の第一例の後半を説明する断面図(E), (f): Sectional drawing explaining the latter half of the 1st example of the manufacturing process of the flexible wiring board of this invention. (a)、(b):本発明のフレキシブル配線板と電気部品とを接続する工程を説明する断面図(A), (b): Sectional drawing explaining the process of connecting the flexible wiring board of this invention and an electrical component. 本発明第二例の製造方法で作成されたフレキシブル配線板を説明する断面図Sectional drawing explaining the flexible wiring board created with the manufacturing method of the 2nd example of this invention 本発明第三例の製造方法で作成されたフレキシブル配線板を説明する断面図Sectional drawing explaining the flexible wiring board created with the manufacturing method of this invention 3rd example (a)〜(e):本発明のフレキシブル配線板の製造工程の第四例の前半の断面図(A)-(e): Sectional drawing of the first half of the 4th example of the manufacturing process of the flexible wiring board of this invention. (f)、(g):本発明のフレキシブル配線板の製造工程の第四例の後半の断面図(F), (g): Cross-sectional view of the latter half of the fourth example of the manufacturing process of the flexible wiring board of the present invention. (a)〜(c):本発明のフレキシブル配線板の製造工程の第五例を説明する断面図(A)-(c): Sectional drawing explaining the 5th example of the manufacturing process of the flexible wiring board of this invention. (a)〜(f):本発明のフレキシブル配線板の製造工程の第六例の前半の断面図(A)-(f): Sectional drawing of the first half of the 6th example of the manufacturing process of the flexible wiring board of this invention. (g)、(h):本発明のフレキシブル配線板の製造工程の第六例の後半の断面図(G), (h): Cross-sectional view of the latter half of the sixth example of the manufacturing process of the flexible wiring board of the present invention. (a)〜(c):本発明のフレキシブル配線板の製造工程の第七例を説明する断面図(A)-(c): Sectional drawing explaining the 7th example of the manufacturing process of the flexible wiring board of this invention. (a)〜(c):本発明のフレキシブル配線板の製造工程の第八例を説明する断面図(A)-(c): Sectional drawing explaining the 8th example of the manufacturing process of the flexible wiring board of this invention. 本発明の第九例の製造方法で作成されたフレキシブル配線板を説明する断面図Sectional drawing explaining the flexible wiring board created with the manufacturing method of the 9th example of this invention (a)〜(d):本発明のフレキシブル配線板の製造工程の第十例を説明する断面図(A)-(d): Sectional drawing explaining the 10th example of the manufacturing process of the flexible wiring board of this invention.

符号の説明Explanation of symbols

1a、1b、1c、1d、1e、1f、1g……フレキシブル配線板 10、50、60、80……積層体 11、51、63、71……ベースフィルム 15、65、55、85a、85b……配線膜 17、57、67……凹部 18、58、68……突起 36……加工用突起 37……加工用凹部 20……積層フィルム 21……基材シート 22、39……樹脂材料 25……レジスト層 52、62……導電膜 61……キャリアフィルム   1a, 1b, 1c, 1d, 1e, 1f, 1g ... Flexible wiring board 10, 50, 60, 80 ... Laminate 11, 51, 63, 71 ... Base film 15, 65, 55, 85a, 85b ... ... Wiring films 17, 57, 67 ... Recesses 18, 58, 68 ... Protrusions 36 ... Processing protrusions 37 ... Processing recesses 20 ... Laminated film 21 ... Base sheet 22, 39 ... Resin material 25 …… Resist layer 52, 62 …… Conductive film 61 …… Carrier film

Claims (24)

配線板の配線膜上に突起が形成されたフレキシブル配線板を製造するフレキシブル配線板の製造方法であって、
ベースフィルム上にパターニングされた配線膜を配置し、
前記配線膜と前記ベースフィルムが配置された部分の、前記ベースフィルムの所定位置に加工用突起を当接して、前記加工用突起で前記ベースフィルムを押圧し、前記配線膜を膨出させて前記突起を形成し、
前記突起の裏面側に形成された前記ベースフィルムの凹部に樹脂材料を配置するフレキシブル配線板の製造方法。
A method of manufacturing a flexible wiring board for manufacturing a flexible wiring board having protrusions formed on a wiring film of the wiring board,
Place the patterned wiring film on the base film,
A processing projection is brought into contact with a predetermined position of the base film at a portion where the wiring film and the base film are disposed, the base film is pressed by the processing projection, and the wiring film is bulged to Forming protrusions,
The manufacturing method of the flexible wiring board which arrange | positions resin material in the recessed part of the said base film formed in the back surface side of the said protrusion.
配線板の配線膜上に突起が形成されたフレキシブル配線板を製造するフレキシブル配線板の製造方法であって、
導電膜上に配置されたベースフィルムの所定位置に加工用突起を当接し、前記加工用突起で前記ベースフィルムを押圧し、前記導電膜を膨出させて前記突起を複数個形成し、
前記突起の裏面側に形成された前記ベースフィルムの凹部に樹脂材料を配置した後、
前記導電膜の前記突起が形成された側の面に、所定形状のレジスト層を配置し、前記導電膜の前記レジスト層から露出した部分を除去して、前記配線膜を形成するフレキシブル配線板の製造方法。
A method of manufacturing a flexible wiring board for manufacturing a flexible wiring board having protrusions formed on a wiring film of the wiring board,
A processing protrusion is brought into contact with a predetermined position of the base film disposed on the conductive film, the base film is pressed with the processing protrusion, the conductive film is bulged to form a plurality of protrusions,
After placing a resin material in the recess of the base film formed on the back side of the protrusion,
A flexible wiring board that forms a wiring film by disposing a resist layer having a predetermined shape on a surface of the conductive film on which the protrusion is formed, and removing a portion of the conductive film exposed from the resist layer. Production method.
配線板の配線膜上に突起が形成されたフレキシブル配線板を製造するフレキシブル配線板の製造方法であって、
導電膜上に配置されたベースフィルムの所定位置に加工用突起を当接し、前記加工用突起で前記ベースフィルムを押圧し、前記導電膜を膨出させて前記突起を複数個形成し、
前記導電膜の前記突起が形成された側の面に、所定形状のレジスト層を配置し、前記導電膜の前記レジスト層から露出した部分を除去して、前記配線膜を形成し、
前記突起の裏面側に形成された前記ベースフィルムの凹部に樹脂材料を配置するフレキシブル配線板の製造方法。
A method of manufacturing a flexible wiring board for manufacturing a flexible wiring board having protrusions formed on a wiring film of the wiring board,
A processing protrusion is brought into contact with a predetermined position of the base film disposed on the conductive film, the base film is pressed with the processing protrusion, the conductive film is bulged to form a plurality of protrusions,
A resist layer having a predetermined shape is disposed on the surface of the conductive film on which the protrusion is formed, and a portion exposed from the resist layer of the conductive film is removed to form the wiring film,
The manufacturing method of the flexible wiring board which arrange | positions resin material in the recessed part of the said base film formed in the back surface side of the said protrusion.
前記樹脂材料の配置は、前記ベースフィルムの主成分と同じ種類の樹脂を主成分とする前記樹脂材料を用いる請求項1乃至請求項3のいずれか1項記載のフレキシブル配線板の製造方法。   The method for manufacturing a flexible wiring board according to any one of claims 1 to 3, wherein the resin material is arranged using the resin material mainly composed of the same kind of resin as a main component of the base film. 配線板の配線膜上に突起が形成されたフレキシブル配線板を製造するフレキシブル配線板の製造方法であって、
キャリアフィルム上に配置された導電膜の所定位置に、加工用突起を接触させ、前記各加工用突起で前記導電膜を押圧し、前記導電膜を膨出させて前記突起を複数形成し、
前記導電膜の前記突起が形成された側の面とは反対側の面に、所定形状のレジスト層を配置し、
前記導電膜の前記レジスト層から露出する部分をエッチング除去して前記配線膜を形成し、レジスト層を除去した後、
前記突起の裏面側に形成された前記配線膜の凹部に樹脂材料を配置し、前記配線膜と密着するベースフィルムを形成した後、前記キャリアフィルムを除去するフレキシブル配線板の製造方法。
A method of manufacturing a flexible wiring board for manufacturing a flexible wiring board having protrusions formed on a wiring film of the wiring board,
Forming a plurality of the protrusions by bringing a processing protrusion into contact with a predetermined position of the conductive film disposed on the carrier film, pressing the conductive film with each of the processing protrusions, and expanding the conductive film.
A resist layer having a predetermined shape is disposed on the surface of the conductive film opposite to the surface on which the protrusion is formed,
Etching and removing the portion of the conductive film exposed from the resist layer to form the wiring film, after removing the resist layer,
A method for manufacturing a flexible wiring board, comprising: disposing a resin material in a concave portion of the wiring film formed on the back surface side of the protrusion, forming a base film in close contact with the wiring film, and then removing the carrier film.
配線板の配線膜上に突起が形成されたフレキシブル配線板を製造するフレキシブル配線板の製造方法であって、
導電膜の所定位置に加工用突起を接触させ、前記各加工用突起で前記導電膜を押圧し、前記導電膜を膨出させて前記突起を複数形成し、
前記導電膜の前記突起が形成された側の面にキャリアフィルムを配置し、前記導電膜の前記突起が形成された側の面とは反対側の面に所定形状のレジスト層を配置し、
前記導電膜の前記レジスト層から露出する部分をエッチング除去して前記配線膜を形成し、レジスト層を除去した後、
前記突起の裏面側に形成された前記配線膜の凹部に樹脂材料を配置し、前記配線膜と密着するベースフィルムを形成した後、前記キャリアフィルムを除去するフレキシブル配線板の製造方法。
A method of manufacturing a flexible wiring board for manufacturing a flexible wiring board having protrusions formed on a wiring film of the wiring board,
A plurality of protrusions are formed by bringing a processing protrusion into contact with a predetermined position of the conductive film, pressing the conductive film with each of the processing protrusions, and expanding the conductive film;
A carrier film is disposed on a surface of the conductive film on which the protrusion is formed, and a resist layer having a predetermined shape is disposed on a surface opposite to the surface of the conductive film on which the protrusion is formed,
Etching and removing the portion of the conductive film exposed from the resist layer to form the wiring film, after removing the resist layer,
A method for manufacturing a flexible wiring board, comprising: disposing a resin material in a concave portion of the wiring film formed on the back surface side of the protrusion, forming a base film in close contact with the wiring film, and then removing the carrier film.
配線板の配線膜上に突起が形成されたフレキシブル配線板を製造するフレキシブル配線板の製造方法であって、
導電膜の所定部分を加工用突起で押圧し、前記導電膜を膨出させて前記突起を複数形成した後、
前記突起の裏面側に形成された前記導電膜の凹部に樹脂材料を配置してベースフィルムを形成し、
前記導電膜の前記突起が形成された側の面に、所定形状のレジスト層を配置した後、前記導電膜の前記レジスト層から露出する部分をエッチング除去し、前記配線膜を形成するフレキシブル配線板の製造方法。
A method of manufacturing a flexible wiring board for manufacturing a flexible wiring board having protrusions formed on a wiring film of the wiring board,
After pressing a predetermined portion of the conductive film with a processing protrusion, the conductive film is expanded to form a plurality of the protrusions,
A base material is formed by disposing a resin material in the concave portion of the conductive film formed on the back side of the protrusion,
A flexible wiring board that forms a wiring film by arranging a resist layer having a predetermined shape on the surface of the conductive film on which the protrusion is formed, and then etching away a portion of the conductive film exposed from the resist layer. Manufacturing method.
前記樹脂材料の配置は、基材シート上に配置された樹脂材料を、前記凹部に密着させる請求項1乃至請求項7のいずれか1項記載のフレキシブル配線板の製造方法。   The method for producing a flexible wiring board according to any one of claims 1 to 7, wherein the resin material is disposed in such a manner that the resin material disposed on the base sheet is in close contact with the recess. 前記樹脂材料を前記凹部に密着させた後、前記基材シートを前記樹脂材料から剥離する請求項8記載のフレキシブル配線板の製造方法。   The method for producing a flexible wiring board according to claim 8, wherein the base material sheet is peeled from the resin material after the resin material is brought into close contact with the recess. 前記樹脂材料の配置は、前記凹部に樹脂材料を塗布する請求項1乃至請求項7のいずれか1項記載のフレキシブル配線板の製造方法。   The method for manufacturing a flexible wiring board according to claim 1, wherein the resin material is disposed by applying a resin material to the recess. 前記凹部に前記樹脂材料を配置した後、前記樹脂材料を硬化させる請求項1乃至請求項10のいずれか1項記載のフレキシブル配線板の製造方法。   The method for manufacturing a flexible wiring board according to claim 1, wherein the resin material is cured after the resin material is disposed in the recess. 第一の加工用突起と、第一の加工用凹部が形成された第一の金型と、前記第一の加工用突起と嵌合する位置に第二の加工用凹部が形成され、前記第一の加工用凹部と嵌合する位置に第二の加工用突起が形成された第二の金型との間に、積層体を配置し、
前記積層体の前記ベースフィルムの表面に位置する第一の導電膜を前記第一の加工用突起と前記第二の加工用凹部の間に位置させ、前記ベースフィルムの裏面に位置する第二の導電膜を前記第二の加工用突起と前記第一の加工用凹部の間に位置させて、前記第一、第二の金型で前記積層体を挟み込み、
前記積層体の表面に凸部と凹部を形成し、かつ、前記積層体の裏面に凸部と凹部を形成するフレキシブル配線板の製造方法。
A first processing projection, a first mold formed with the first processing recess, and a second processing recess formed at a position where the first processing projection is fitted to the first processing projection, The laminate is disposed between the second mold in which the second processing projection is formed at a position where it fits with the one processing recess,
A first conductive film positioned on the surface of the base film of the laminate is positioned between the first processing protrusion and the second processing recess, and the second conductive film is positioned on the back surface of the base film. Positioning the conductive film between the second processing projection and the first processing recess, sandwiching the laminate with the first and second molds,
The manufacturing method of the flexible wiring board which forms a convex part and a recessed part in the surface of the said laminated body, and forms a convex part and a recessed part in the back surface of the said laminated body.
前記ベースフィルムに貫通孔を形成しておき、前記貫通孔に充填した導電材料で前記第一、第二の導電膜を電気的に接続した後、前記第一、第二の金型で前記積層体を挟み込む請求項12記載のフレキシブル配線板の製造方法。   A through-hole is formed in the base film, and the first and second conductive films are electrically connected with a conductive material filled in the through-hole, and then the first and second molds are used to stack the laminate. The manufacturing method of the flexible wiring board of Claim 12 which pinches | interposes a body. 前記積層体の表面に形成された凹部と、前記積層体の裏面に形成された凹部に樹脂材料を配置する請求項12又は請求項13のいずれか1項記載のフレキシブル配線板の製造方法。   The manufacturing method of the flexible wiring board of any one of Claim 12 or Claim 13 which arrange | positions a resin material in the recessed part formed in the surface of the said laminated body, and the recessed part formed in the back surface of the said laminated body. ベースフィルムと、前記ベースフィルム上に配置され、所定形状にパターニングされた配線膜とを有し、
前記配線膜には突起が形成されたフレキシブル配線板であって、
前記ベースフィルムの前記配線膜とは反対側の面には、前記突起が位置する部分に凹部が形成され、前記凹部には樹脂材料が配置されたフレキシブル配線板。
A base film, and a wiring film disposed on the base film and patterned into a predetermined shape;
A flexible wiring board having protrusions formed on the wiring film,
A flexible wiring board in which a recess is formed in a portion where the projection is located on a surface of the base film opposite to the wiring film, and a resin material is disposed in the recess.
前記ベースフィルムと前記樹脂材料は、同じ種類の樹脂を主成分とする請求項15記載のフレキシブル配線板。   The flexible wiring board according to claim 15, wherein the base film and the resin material are mainly composed of the same type of resin. ベースフィルムと、前記ベースフィルム上に配置され、所定パターニングされた配線膜とを有し、
前記配線膜の表面には突起が形成されたフレキシブル配線板であって、
前記配線膜の前記突起の裏面側には凹部が設けられ、前記凹部には樹脂材料が配置されたフレキシブル配線板。
A base film, and a wiring film disposed on the base film and patterned in a predetermined manner;
A flexible wiring board having protrusions formed on the surface of the wiring film,
A flexible wiring board in which a recess is provided on the back side of the protrusion of the wiring film, and a resin material is disposed in the recess.
前記樹脂材料は前記ベースフィルムの一部分で構成された請求項17記載のフレキシブル配線板。   The flexible wiring board according to claim 17, wherein the resin material is constituted by a part of the base film. 前記ベースフィルムは可撓性を有する樹脂フィルムで構成された請求項15乃至請求項18のいずれか1項記載のフレキシブル配線板。   The flexible wiring board according to claim 15, wherein the base film is made of a resin film having flexibility. 前記ベースフィルムはガラス転移温度が300℃以上の樹脂を主成分とする請求項19記載のフレキシブル配線板。   The flexible wiring board according to claim 19, wherein the base film is mainly composed of a resin having a glass transition temperature of 300 ° C. or higher. 前記ベースフィルムはポリイミド樹脂を主成分とする請求項19又は請求項20のいずれか1項記載のフレキシブル配線板。   The flexible wiring board according to claim 19, wherein the base film has a polyimide resin as a main component. 前記ベースフィルムの膜厚は8μm以上25μm以下である請求項15乃至請求項21のいずれか1項記載のフレキシブル配線板。   The flexible wiring board according to any one of claims 15 to 21, wherein a film thickness of the base film is 8 µm or more and 25 µm or less. 前記配線膜の膜厚は8μm以上35μm以下である請求項15乃至請求項22のいずれか1項記載のフレキシブル配線板。   The flexible wiring board according to any one of claims 15 to 22, wherein a thickness of the wiring film is not less than 8 µm and not more than 35 µm. 前記接続部の先端の、前記配線膜の他の部分の表面からの高さは10μm以上20μm以下である請求項15乃至請求項23のいずれか1項記載のフレキシブル配線板。   The flexible wiring board according to any one of claims 15 to 23, wherein a height of a tip of the connection portion from a surface of another portion of the wiring film is 10 µm or more and 20 µm or less.
JP2004266338A 2004-09-14 2004-09-14 Flexible wiring board and its manufacturing method Withdrawn JP2006086153A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004266338A JP2006086153A (en) 2004-09-14 2004-09-14 Flexible wiring board and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004266338A JP2006086153A (en) 2004-09-14 2004-09-14 Flexible wiring board and its manufacturing method

Publications (1)

Publication Number Publication Date
JP2006086153A true JP2006086153A (en) 2006-03-30

Family

ID=36164437

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004266338A Withdrawn JP2006086153A (en) 2004-09-14 2004-09-14 Flexible wiring board and its manufacturing method

Country Status (1)

Country Link
JP (1) JP2006086153A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008118056A (en) * 2006-11-07 2008-05-22 Seiko Epson Corp Method for manufacturing wiring board, and electronic apparatus
JP2008183880A (en) * 2007-01-31 2008-08-14 Brother Ind Ltd Recording apparatus and its wiring connection method
JP2009224451A (en) * 2008-03-14 2009-10-01 Dainippon Printing Co Ltd Conductive bump and method of forming the same, and printed wiring board having the conductive bump
JP2010028051A (en) * 2008-07-24 2010-02-04 Dainippon Printing Co Ltd Method of manufacturing multilayered printed wiring board
JP2010028058A (en) * 2008-07-24 2010-02-04 Dainippon Printing Co Ltd Printing method
JP2010067699A (en) * 2008-09-09 2010-03-25 Dainippon Printing Co Ltd Method for manufacturing substrate sheet with conductive bump
JP2010067703A (en) * 2008-09-09 2010-03-25 Dainippon Printing Co Ltd Method for manufacturing substrate sheet with conductive bump
JP2010076149A (en) * 2008-09-24 2010-04-08 Dainippon Printing Co Ltd Printer
JP2015020294A (en) * 2013-07-17 2015-02-02 セイコーエプソン株式会社 Liquid spray head

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008118056A (en) * 2006-11-07 2008-05-22 Seiko Epson Corp Method for manufacturing wiring board, and electronic apparatus
JP2008183880A (en) * 2007-01-31 2008-08-14 Brother Ind Ltd Recording apparatus and its wiring connection method
JP2009224451A (en) * 2008-03-14 2009-10-01 Dainippon Printing Co Ltd Conductive bump and method of forming the same, and printed wiring board having the conductive bump
JP2010028051A (en) * 2008-07-24 2010-02-04 Dainippon Printing Co Ltd Method of manufacturing multilayered printed wiring board
JP2010028058A (en) * 2008-07-24 2010-02-04 Dainippon Printing Co Ltd Printing method
JP2010067699A (en) * 2008-09-09 2010-03-25 Dainippon Printing Co Ltd Method for manufacturing substrate sheet with conductive bump
JP2010067703A (en) * 2008-09-09 2010-03-25 Dainippon Printing Co Ltd Method for manufacturing substrate sheet with conductive bump
JP2010076149A (en) * 2008-09-24 2010-04-08 Dainippon Printing Co Ltd Printer
JP2015020294A (en) * 2013-07-17 2015-02-02 セイコーエプソン株式会社 Liquid spray head

Similar Documents

Publication Publication Date Title
JP4291279B2 (en) Flexible multilayer circuit board
US8419884B2 (en) Method for manufacturing multilayer wiring substrate
JP5093353B2 (en) Manufacturing method of component built-in module and component built-in module
JP4055768B2 (en) Multilayer circuit board manufacturing method
JP6291738B2 (en) CIRCUIT BOARD, CIRCUIT BOARD MANUFACTURING METHOD, AND ELECTRONIC DEVICE
US7678612B2 (en) Method of manufacturing semiconductor device
KR20010087268A (en) Method for producing printed wiring board
US8042724B2 (en) Method for electrically connecting to a contact of a microelectronic component on a circuit board or substrate
US20120175162A1 (en) Printed circuit board
US20070143992A1 (en) Method for manufacturing wiring board
JP2006086153A (en) Flexible wiring board and its manufacturing method
JP4939519B2 (en) Multilayer circuit board manufacturing method
JP4825784B2 (en) Package for semiconductor device and method for manufacturing the same
KR20120046602A (en) Printed circuit board and method for manufacturing the same
JP2001217548A (en) Method of manufacturing wiring board
JP2011222962A (en) Print circuit board and method of manufacturing the same
JP2012169486A (en) Base material, wiring board, production method of base material and production method of wiring board
JP5406241B2 (en) Wiring board manufacturing method
JPH11112150A (en) Multilayered substrate and its manufacture
JP3856733B2 (en) Wiring board manufacturing method
JP2005101075A (en) Method of manufacturing board with built-in electronic part
JP4590088B2 (en) Flexible substrate piece and multilayer flexible wiring board
JP2006319255A (en) Process for manufacturing multilayer wiring board
JP5232893B2 (en) Wiring board manufacturing method
WO2004043120A1 (en) Method for manufacturing resin substrate, method for manufacturing multilayer resin substrate, and resin substrate

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070713

A761 Written withdrawal of application

Free format text: JAPANESE INTERMEDIATE CODE: A761

Effective date: 20090805