JP2006073906A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2006073906A5 JP2006073906A5 JP2004257844A JP2004257844A JP2006073906A5 JP 2006073906 A5 JP2006073906 A5 JP 2006073906A5 JP 2004257844 A JP2004257844 A JP 2004257844A JP 2004257844 A JP2004257844 A JP 2004257844A JP 2006073906 A5 JP2006073906 A5 JP 2006073906A5
- Authority
- JP
- Japan
- Prior art keywords
- pipe
- liquid
- processed
- exposure apparatus
- projection optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000007788 liquid Substances 0.000 claims 14
- 230000003287 optical effect Effects 0.000 claims 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 6
- 239000007789 gas Substances 0.000 claims 6
- 229910052786 argon Inorganic materials 0.000 claims 3
- 239000001307 helium Substances 0.000 claims 3
- 229910052734 helium Inorganic materials 0.000 claims 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims 3
- 239000001257 hydrogen Substances 0.000 claims 3
- 229910052739 hydrogen Inorganic materials 0.000 claims 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 3
- 229910052754 neon Inorganic materials 0.000 claims 3
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims 3
- 229910052757 nitrogen Inorganic materials 0.000 claims 3
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 239000002184 metal Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004257844A JP2006073906A (ja) | 2004-09-06 | 2004-09-06 | 露光装置、露光システム及びデバイス製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004257844A JP2006073906A (ja) | 2004-09-06 | 2004-09-06 | 露光装置、露光システム及びデバイス製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006073906A JP2006073906A (ja) | 2006-03-16 |
| JP2006073906A5 true JP2006073906A5 (enrdf_load_stackoverflow) | 2007-10-18 |
Family
ID=36154169
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004257844A Withdrawn JP2006073906A (ja) | 2004-09-06 | 2004-09-06 | 露光装置、露光システム及びデバイス製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2006073906A (enrdf_load_stackoverflow) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4661322B2 (ja) * | 2005-04-22 | 2011-03-30 | 株式会社ニコン | 露光装置、デバイスの製造方法及び液体供給方法 |
| JP5040653B2 (ja) * | 2005-08-23 | 2012-10-03 | 株式会社ニコン | 露光装置及び露光方法、並びにデバイス製造方法 |
| JP2007180450A (ja) | 2005-12-28 | 2007-07-12 | Canon Inc | 露光装置 |
| JP4845668B2 (ja) * | 2006-10-17 | 2011-12-28 | 東京エレクトロン株式会社 | 複合配管及び複合配管を備える塗布・現像処理装置 |
| JP4490459B2 (ja) | 2007-06-29 | 2010-06-23 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
| KR101712219B1 (ko) * | 2009-03-10 | 2017-03-03 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법, 및 디바이스 제조 방법 |
| NL2005655A (en) | 2009-12-09 | 2011-06-14 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
-
2004
- 2004-09-06 JP JP2004257844A patent/JP2006073906A/ja not_active Withdrawn
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW200731335A (en) | Exposure apparatus and device manufacturing method | |
| JP2005085789A5 (enrdf_load_stackoverflow) | ||
| JP2006523026A5 (enrdf_load_stackoverflow) | ||
| SG145780A1 (en) | Exposure apparatus and device fabricating method | |
| JP2007134729A5 (enrdf_load_stackoverflow) | ||
| JP2006222165A5 (enrdf_load_stackoverflow) | ||
| JP2016053721A5 (enrdf_load_stackoverflow) | ||
| EP1653501A4 (en) | EXPOSURE DEVICE, COMPONENT MANUFACTURING METHOD AND CONTROL METHOD FOR AN EXPOSURE DEVICE | |
| JP2006270057A5 (enrdf_load_stackoverflow) | ||
| TWI268544B (en) | Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof | |
| JP2006073906A5 (enrdf_load_stackoverflow) | ||
| SG2012087615A (en) | Exposure apparatus, exposure method, and method for producing device | |
| TW200503071A (en) | Exposure device and device manufacturing method | |
| TW200511470A (en) | Method and apparatus for monitoring and controlling imaging in immersion lithography systems | |
| TW200636399A (en) | Exposure device, manufacturing method for exposure device and micro-device | |
| SG128552A1 (en) | Methods and system for inhibiting immersion lithography defect formation | |
| SG111237A1 (en) | Use of a top layer on a mirror for use in a lithographic apparatus, mirror for use in a lithographic apparatus, lithographic apparatus comprising such a mirror and device manufacturing method | |
| SG141385A1 (en) | Lithographic apparatus and device manufacturing method | |
| TWI278056B (en) | Lithographic apparatus and device manufacturing method | |
| JP2006190997A5 (enrdf_load_stackoverflow) | ||
| SG143284A1 (en) | Lithographic apparatus and device manufacturing method | |
| TW200802538A (en) | Exposure apparatus, exposure method, and device manufacturing method | |
| TW200623234A (en) | Exposure device, exposure method, and device manufacture method | |
| ATE490548T1 (de) | Belichtungsvorrichtung, belichtungsverfahren und verfahren zur bauelementeherstellung | |
| JP2008300702A5 (enrdf_load_stackoverflow) |