JP2006066248A - Spontaneous light-emitting panel and its manufacturing method - Google Patents

Spontaneous light-emitting panel and its manufacturing method Download PDF

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JP2006066248A
JP2006066248A JP2004247998A JP2004247998A JP2006066248A JP 2006066248 A JP2006066248 A JP 2006066248A JP 2004247998 A JP2004247998 A JP 2004247998A JP 2004247998 A JP2004247998 A JP 2004247998A JP 2006066248 A JP2006066248 A JP 2006066248A
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self
lead
light
out wiring
metal
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Akihiko Yamaguchi
昭彦 山口
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Tohoku Pioneer Corp
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Tohoku Pioneer Corp
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • H10K50/842Containers
    • H10K50/8423Metallic sealing arrangements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/805Electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • H10K50/842Containers
    • H10K50/8426Peripheral sealing arrangements, e.g. adhesives, sealants
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12044OLED
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/82Interconnections, e.g. terminals
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/87Passivation; Containers; Encapsulations
    • H10K59/871Self-supporting sealing arrangements
    • H10K59/8721Metallic sealing arrangements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/87Passivation; Containers; Encapsulations
    • H10K59/871Self-supporting sealing arrangements
    • H10K59/8722Peripheral sealing arrangements, e.g. adhesives, sealants

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To prevent a short circuit of a draw-out wiring and a metallic sealing member, due to the occurrence of migration, and to make a selfluminous light-emitting panel operate normally. <P>SOLUTION: A photocurable adhesive layer 4 is formed at a bonding region La formed in the peripheral edge of the metallic sealing member 3 so as to form a sealing space M to cover the spontaneous light-emitting element part 2 on a transparent supporting substrate in which the selfluminous light emitting element part 2 has been formed, and the supporting substrate 1 and the sealing member 3 are pasted together. The layer is provided with the draw-out wiring 5 to be drawn-out outside the sealing space M from the selfluminous light-emitting element part 2, the draw-out wiring 5 is composed of a transparent conductive film 50 formed on the supporting substrate 1 and a metal electrode layer 51, containing a metal element easy to cause migration laminated on the transparent conductive film 50, and a water shut-off region 4h is formed at least at the outermost part of the adhesive layer 4 on the draw-out wiring 5 crossing the bonding region La. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、自発光パネル及びその製造方法に関するものである。   The present invention relates to a self-luminous panel and a method for manufacturing the same.

有機EL(Electroluminescence)パネルに代表される自発光パネルは、携帯電話や薄型テレビ、情報端末等のディスプレイは勿論のこと、車載用機能表示、例えばスピードメータ等のインパネや電化製品の機能表示部、フィルム状ディスプレイへの応用、屋外案内表示または照明への応用が期待され、盛んに開発・研究が進められている。このような自発光パネルは、自発光素子部の発光特性を維持するために自発光素子部を外気から遮断する封止構造が一般に採用されている。この封止構造は、自発光素子部が形成された支持基板上に自発光素子部を覆う封止空間を形成するように封止部材を貼り合わせる構造であり、封止部材としてはステンレス等の金属製封止部材が用いられ、その周縁に形成される接着領域に光硬化性の接着剤層を形成して、この封止部材と支持基板とを貼り合わせた状態で透明な支持基板側から光を照射して接着剤を硬化させることが行われている。   A self-luminous panel typified by an organic EL (Electroluminescence) panel is not only a display of a mobile phone, a flat-screen TV, an information terminal, but also an in-vehicle function display, such as an instrument panel such as a speedometer, or a function display unit of an electrical appliance, It is expected to be applied to film displays, outdoor guidance displays, or lighting, and is actively developed and researched. Such a self-light-emitting panel generally employs a sealing structure that blocks the self-light-emitting element part from the outside air in order to maintain the light emission characteristics of the self-light-emitting element part. This sealing structure is a structure in which a sealing member is bonded to form a sealing space that covers the self light emitting element portion on the support substrate on which the self light emitting element portion is formed. A metal sealing member is used, and a photocurable adhesive layer is formed in the bonding region formed on the periphery of the metal sealing member, and the sealing member and the support substrate are bonded together from the transparent support substrate side. The adhesive is cured by irradiating light.

このような自発光パネルにおいては、自発光素子部を駆動させるために、自発光素子部から封止空間の外に引き出された引出配線にCOF(Chip On Film)やCOG(Chip On Glass)等の端子を接続することがなされており、この構造上、引出配線は前述した接着領域を横切って封止空間の内側から外側に引き出される構造を取らざるを得ない。この際、引出配線としてITO等の透明導電膜が採用されている場合には、接着領域を横切る引出配線の存在とは無関係に透明な支持基板側から光を照射して接着領域全体の光硬化性接着剤を硬化させることができる。しかしながら、引出配線に光不透過性の金属又は合金を採用している場合には、透明な支持基板側から光を照射しても引出配線が横切る部分で光が遮断されてしまい、その部分で光硬化性接着剤を充分に硬化させることができず、封止空間の密封性を充分に確保することができないという問題が生じる。   In such a self-luminous panel, in order to drive the self-luminous element portion, COF (Chip On Film), COG (Chip On Glass) or the like is provided on the lead-out wiring drawn out of the sealing space from the self-luminous element portion. In view of this structure, it is necessary to take a structure in which the lead-out wiring is drawn from the inside of the sealing space to the outside across the above-described adhesion region. At this time, when a transparent conductive film such as ITO is adopted as the lead-out wiring, light is cured from the transparent support substrate side regardless of the presence of the lead-out wiring crossing the adhesion area, and the entire adhesion area is photocured. The adhesive can be cured. However, when light-impervious metal or alloy is used for the lead-out wiring, light is blocked at the part where the lead-out wiring crosses even if light is irradiated from the transparent support substrate side. There is a problem that the photocurable adhesive cannot be sufficiently cured, and the sealing property of the sealed space cannot be sufficiently ensured.

有機EL素子等のように電流駆動によって発光輝度が得られる自発光素子においては、引出配線の抵抗をできる限り低抵抗化することが望ましいので、ユーザニーズに合った良好な発光性能を確保するために、引出配線に低抵抗な銀(Ag),錫(Sn),鉛(Pb)等の金属やその合金からなる金属補助電極層を積層することが欠かせない状況になりつつある。その際には、前述した封止空間における密封性欠如の問題が重要な問題として顕在化することになる。   In a self-luminous element such as an organic EL element that can obtain light emission luminance by current drive, it is desirable to reduce the resistance of the lead wiring as much as possible. Therefore, in order to ensure good light emission performance that meets user needs In addition, it is becoming indispensable to laminate a metal auxiliary electrode layer made of a metal such as low resistance silver (Ag), tin (Sn), lead (Pb), or an alloy thereof on the lead-out wiring. In that case, the above-mentioned problem of lack of sealing performance in the sealed space becomes apparent as an important problem.

そこで、このような問題を解消するために下記特許文献1に記載された従来技術が提案されている。図1はこの従来技術を説明する説明図であって、有機EL装置の平面図とX−X'及びY−Y'断面図を示している。この有機EL装置は、透明基板J1上に透明電極J2,J2が形成され、この透明電極J2上に金属補助電極J3を積層して成る引出配線J4が形成されると共に透明電極J2上に有機薄膜J5が形成され、有機薄膜J5上に透明電極J2と対向して背面電極J6が積層されることにより有機EL素子を形成するものであって、この有機EL素子を覆うように位置する封止部材J7を透明基板J1及び引出配線J4上に光硬化性の接着剤J8にて接着して、封止部材J7と透明基板J1との間に自発光素子部となる有機EL素子を封止する封止空間Mを形成したものであり、特に、封止部材J7との接着領域に位置する引出配線部分に透明電極J2の露出部分(又は金属補助電極J3の不連続部分)Stが、引出配線J4の両端を結ぶように形成されている。 In order to solve such a problem, a conventional technique described in Patent Document 1 below has been proposed. FIG. 1 is an explanatory diagram for explaining this prior art, and shows a plan view of an organic EL device and sectional views taken along lines XX ′ and YY ′. The organic EL device is a transparent electrode on a transparent substrate J1 J2, J2 0 is formed, on the transparent electrode J2 with lead wirings J4 formed by laminating a metal auxiliary electrode J3 on the transparent electrode J2 0 is formed An organic thin film J5 is formed, and a back electrode J6 is laminated on the organic thin film J5 so as to face the transparent electrode J2. Thus, an organic EL element is formed, and the sealing is positioned so as to cover the organic EL element. The stop member J7 is bonded to the transparent substrate J1 and the lead-out wiring J4 with a photocurable adhesive J8, and the organic EL element that becomes the self-light emitting element portion is sealed between the sealing member J7 and the transparent substrate J1. In particular, the exposed portion of the transparent electrode J2 (or the discontinuous portion of the metal auxiliary electrode J3) St is drawn in the lead-out wiring portion located in the adhesion region with the sealing member J7. Connect both ends of wiring J4 It is sea urchin formation.

特開2002−198186号公報JP 2002-198186 A

このような従来技術によると、封止部材J7の接着領域を横切る引出配線部分に透明電極J2の露出部分Stを形成しているので、透明な支持基板J1側から光を照射した場合に、この露出部分Stを通過した光によって接着剤J8を硬化させることができ、封止空間Mの密封性欠如を解消することが可能になる。 According to the prior art, since forming the exposed portion St of the transparent electrode J2 0 to the extraction wiring portion across the bonding area of the sealing member J7, when irradiated with light from the transparent supporting substrate J1 side, The adhesive J8 can be cured by the light that has passed through the exposed portion St, and the lack of sealing performance of the sealing space M can be eliminated.

しかしながら、このような従来技術を採用した自発光パネルであっても、接着領域を横切る引出配線部分の影響によって、別の重大な問題が生じる可能性がある。この問題は、引出配線の金属補助電極層にマイグレーションを生じ易い金属元素を含む場合であって、封止部材として導電性のある金属製の封止部材を用いる場合に生じるもので、マイグレーションを生じ易い金属元素を含む金属補助電極層と金属製封止部材間に生じるマイグレーション現象に起因するものである。ここでいうマイグレーションを生じ易い金属元素とは、銀(Ag),銅(Cu),錫(Sn),鉛(Pb)等であり、特には銀又は銀合金を含む金属補助電極層を用いた場合にマイグレーション現象が生じ易い。   However, even a self-luminous panel employing such a conventional technique may cause another serious problem due to the influence of the lead-out wiring portion that crosses the adhesion region. This problem occurs when the metal auxiliary electrode layer of the lead-out wiring contains a metal element that easily undergoes migration, and occurs when a conductive metal sealing member is used as the sealing member. This is due to the migration phenomenon that occurs between the metal auxiliary electrode layer containing the metal element and the metal sealing member. Here, the metal elements that are likely to cause migration are silver (Ag), copper (Cu), tin (Sn), lead (Pb), and the like, and in particular, a metal auxiliary electrode layer containing silver or a silver alloy was used. In some cases, a migration phenomenon is likely to occur.

このマイグレーション現象は、特に銀又は銀合金に絶縁材が接している場合に、水分の付加等によって絶縁材を介して銀イオンが移動し、更に進行すると銀イオンが連なった導電経路が絶縁材中に形成される現象として知られている。マイグレーションを引き起こす原因としては様々な要因が考えられているが、大きな要因の一つとして水分の存在があることは否定できない。   This migration phenomenon is caused by the movement of silver ions through the insulating material due to the addition of moisture, etc., especially when the insulating material is in contact with silver or a silver alloy. It is known as a phenomenon that is formed. Various factors are considered as causes of migration, but it cannot be denied that moisture exists as one of the major factors.

図2は、前述した従来技術における接着領域付近を拡大して示した模式図である(符号は図1のものを引用する)。接着領域Laにおける接着剤J8は、引出配線J4が横切った部分では、透明電極J2の露出部分Stが形成されたところにだけ透明基板J1側から照射されたUVが当たって完全硬化部分J8が形成されることになるが、その他の部分では半硬化状態の部分J8S1,J8S2が形成されることになる。そして、この接着剤J8における半硬化状態の部分J8S1,J8S2は水分等を遮断する機能が低いので、外気に接する側の部分J8S1中には外気の水分が進入することなり、この箇所でマイグレーションの発生しやすい状態が形成されることになる。 FIG. 2 is a schematic view showing the vicinity of the adhesion region in the above-described prior art in an enlarged manner (the reference is quoted from FIG. 1). Adhesive J8 on bonding region La is in a portion where the lead wire J4 crosses, completely cured portions UV exposed portion St of the transparent electrode J2 0 is irradiated only from the transparent substrate J1 side was formed hits J8 h However, semi-cured portions J8 S1 and J8 S2 are formed in the other portions. Since the semi-cured portions J8 S1 and J8 S2 of the adhesive J8 have a low function of blocking moisture and the like, the moisture of the outside air enters the portion J8 S1 on the side in contact with the outside air. Thus, a state in which migration is likely to occur is formed.

また、この状態が継続されると銀を含む金属補助電極J3の表面から接着剤中に金属イオンが移動・析出して導電経路が形成され、最終的には配線電極J4と金属製の封止部材J7が短絡状態に至ってしまい、これによって隣接する引出配線間の絶縁性が確保できない状態になるという問題がある。   When this state continues, metal ions move and precipitate from the surface of the metal auxiliary electrode J3 containing silver into the adhesive to form a conductive path, and finally the wiring electrode J4 and the metal seal are formed. There is a problem that the member J7 is short-circuited, and this makes it impossible to ensure insulation between adjacent lead wires.

本発明は、このような問題に対処することを課題の一例とするものである。すなわち、自発光素子部が形成された透明な支持基板上にこの自発光素子部を覆う封止空間を形成するように、金属製の封止部材の周縁に形成される接着領域に光硬化性の接着剤層を形成して、支持基板と封止部材とを貼り合わせた自発光パネルにおいて、マイグレーションの発生による引出配線と金属封止部材との短絡を未然に防いで、自発光パネルを正常に稼働させることが本発明の目的である。   This invention makes it an example of a subject to cope with such a problem. That is, the adhesive region formed on the periphery of the metal sealing member is photocurable so as to form a sealing space that covers the self-light-emitting element portion on the transparent support substrate on which the self-light-emitting element portion is formed. In the self-luminous panel in which the adhesive layer is formed and the support substrate and the sealing member are bonded together, the short circuit between the lead-out wiring and the metal sealing member due to the occurrence of migration is prevented in advance, and the self-luminous panel is normal It is an object of the present invention to operate the system.

このような目的を達成するために、本発明による自発光パネル及びその製造方法は、以下の各独立請求項に係る構成を少なくとも具備するものである。   In order to achieve such an object, the self-luminous panel and the manufacturing method thereof according to the present invention include at least the configurations according to the following independent claims.

[請求項1]自発光素子部が形成された透明な支持基板上に前記自発光素子部を覆う封止空間を形成するように、金属製の封止部材の周縁に形成される接着領域に光硬化性の接着剤層を形成して、前記支持基板と前記封止部材とを貼り合わせた自発光パネルであって、前記自発光素子部から前記封止空間の外に引き出される引出配線を備え、該引出配線は、前記支持基板上に形成された透明導電膜と該透明導電膜上に積層されたマイグレーションを生じ易い金属元素を含む金属電極層とからなり、前記接着領域を横切る前記引出配線上で、前記接着剤層の少なくとも最外部分に水分遮断領域を形成したことを特徴とする自発光パネル。   [Claim 1] In an adhesive region formed at the periphery of a metal sealing member so as to form a sealing space that covers the self-light-emitting element part on a transparent support substrate on which the self-light-emitting element part is formed. A self-luminous panel in which a photocurable adhesive layer is formed and the support substrate and the sealing member are bonded to each other, and a lead-out wiring led out of the sealing space from the self-luminous element portion And the lead-out wiring is composed of a transparent conductive film formed on the support substrate and a metal electrode layer containing a metal element that is likely to cause migration laminated on the transparent conductive film, and the lead-out wiring crosses the adhesion region. A self-luminous panel, wherein a moisture blocking region is formed on at least an outermost portion of the adhesive layer on the wiring.

[請求項4]自発光素子部が形成された透明な支持基板上に前記自発光素子部を覆う封止空間を形成するように、金属製の封止部材の周縁に形成される接着領域に光硬化性の接着剤層を形成して、前記支持基板と前記封止部材とを貼り合わせた状態で前記支持基板側から光を照射する自発光パネルの製造方法であって、前記支持基板上に、透明導電膜と該透明導電膜上に積層されたマイグレーションを生じ易い金属元素を含む金属電極層からなり、前記自発光素子部から前記封止空間の外に引き出される引出配線を形成し、前記接着領域を横切る前記引出配線上で、前記接着剤層の少なくとも最外部分に水分遮断領域を形成することを特徴とする自発光パネルの製造法。   [Claim 4] In an adhesive region formed at the periphery of the metal sealing member so as to form a sealing space covering the self-light-emitting element part on a transparent support substrate on which the self-light-emitting element part is formed. A method of manufacturing a self-luminous panel in which a photocurable adhesive layer is formed and light is irradiated from the support substrate side in a state where the support substrate and the sealing member are bonded to each other. In addition, a transparent conductive film and a metal electrode layer containing a metal element that is likely to cause migration laminated on the transparent conductive film, and forming a lead-out wiring led out of the sealing space from the self-light emitting element portion, A method of manufacturing a self-luminous panel, wherein a moisture blocking region is formed in at least an outermost portion of the adhesive layer on the lead-out wiring crossing the adhesive region.

図3が本発明の実施形態に係る自発光パネルを示す説明図である(同図(a)が平面B−B断面図、同図(b)がA−A断面図を示している)。この自発光パネル10は、透明な支持基板1と、この支持基板1上に形成された自発光素子部2と、この自発光素子部2を覆う封止空間Mを形成するステンレス等の金属製の封止部材3を備え、封止部材3の周縁に形成される接着領域Laに光硬化性の接着剤層4を形成して、支持基板1と封止部材3とを貼り合わせたものである。自発光素子部2は、例えば有機EL素子等の自発光素子が平面的に配列することによって形成され、透明な支持基板1側から光を放出して発光パネル(或いは表示パネル)を形成する。   FIG. 3 is an explanatory view showing a self-luminous panel according to an embodiment of the present invention (FIG. 3 (a) is a plane BB cross-sectional view, and FIG. 3 (b) is an AA cross-sectional view). The self-light-emitting panel 10 is made of a transparent support substrate 1, a self-light-emitting element portion 2 formed on the support substrate 1, and a metal such as stainless steel that forms a sealing space M that covers the self-light-emitting element portion 2. The sealing member 3 is provided, the photocurable adhesive layer 4 is formed in the adhesive region La formed at the periphery of the sealing member 3, and the support substrate 1 and the sealing member 3 are bonded together. is there. The self-light-emitting element unit 2 is formed by, for example, planar arrangement of self-light-emitting elements such as organic EL elements, and emits light from the transparent support substrate 1 side to form a light-emitting panel (or display panel).

また、この自発光パネル10は、自発光素子部2から封止空間Mの外に引き出される引出配線5を備えている。この引出配線5は、自発光素子部2を駆動するために封止空間Mの外に引き出された配線部分にCOF(Chip On Film)やCOG(Chip On Glass)等の端子が接続されるものであり、支持基板1上に形成された透明電極膜50とこの透明電極膜50上に積層される金属電極層51とからなり、所望の配線パターンを形成している。金属電極層51は、自発光素子部2の発光性能を向上させるために、可能な限り低電気抵抗が得られる材料として銀を含む金属材料(金属又は合金)が採用されている。以下、マイグレーションを生じ易い金属元素として銀についての説明を行うが、本発明は、これに限定されるものではなく、銅(Cu),錫(Sn),鉛(Pb)等を含むその他のマイグレーションを生じ易い金属元素についても適用可能である。   The self-light-emitting panel 10 includes a lead-out wiring 5 that is led out of the sealing space M from the self-light-emitting element portion 2. The lead-out wiring 5 is such that a terminal such as COF (Chip On Film) or COG (Chip On Glass) is connected to a wiring portion led out of the sealing space M to drive the self-light-emitting element portion 2. The transparent electrode film 50 formed on the support substrate 1 and the metal electrode layer 51 laminated on the transparent electrode film 50 form a desired wiring pattern. For the metal electrode layer 51, a metal material (metal or alloy) containing silver is employed as a material capable of obtaining as low an electrical resistance as possible in order to improve the light emitting performance of the self light emitting element portion 2. Hereinafter, silver will be described as a metal element that easily causes migration. However, the present invention is not limited to this, and other migrations including copper (Cu), tin (Sn), lead (Pb), and the like. The present invention can also be applied to metal elements that are likely to cause oxidization.

そして、この自発光素子部2では、引出配線5が接着領域Laを横切って封止空間Mの内から外に引き出されているが、この接着領域Laを横切る引出配線上で、接着剤層4の少なくとも最外部分に水分遮断領域4hが形成される構造になっている。すなわち、この実施形態では、接着領域Laの最外部分で引出配線5の金属電極層51を切り欠いた切り欠き部51tを形成し、この切り欠き部51tからの光照射によって接着剤層4が完全硬化状態になる水分遮断領域4hが形成されている。   And in this self-light-emitting element part 2, the lead-out wiring 5 is drawn out from the inside of the sealing space M across the adhesion region La. On the lead-out wiring crossing the adhesion region La, the adhesive layer 4 In this structure, the moisture blocking region 4h is formed at least at the outermost part. That is, in this embodiment, a notch 51t is formed by notching the metal electrode layer 51 of the lead-out wiring 5 at the outermost portion of the adhesion region La, and the adhesive layer 4 is formed by light irradiation from the notch 51t. A moisture blocking region 4h that is completely cured is formed.

このような自発光パネル10の製造方法について説明すると、自発光素子部2が形成された透明な支持基板1上に自発光素子部2を覆う封止空間Mを形成するように、封止部材3の周縁に形成される接着領域Laに光硬化性の接着剤層4を形成して、支持基板1と封止部材3とを貼り合わせた状態で支持基板1側から光(紫外線等)を照射することで、接着剤層4を硬化させる。   The manufacturing method of such a self-light-emitting panel 10 will be described. A sealing member is formed so as to form a sealing space M that covers the self-light-emitting element portion 2 on the transparent support substrate 1 on which the self-light-emitting element portion 2 is formed. The photocurable adhesive layer 4 is formed in the adhesion region La formed on the periphery of the substrate 3, and light (ultraviolet rays or the like) is emitted from the support substrate 1 side in a state where the support substrate 1 and the sealing member 3 are bonded together. The adhesive layer 4 is cured by irradiation.

この際に、引出配線5には光不透過性の金属電極層51が積層されているので、接着領域Laを横切る引出配線上では光が照射されないところができて接着剤層4に半硬化状態の部分4sが形成されることになるが、その他の接着領域Laでは支持基板1を介して接着剤層4に光が照射され接着剤層4が完全に硬化された状態になる。そこで、この実施形態においては、接着領域Laの最外部分に引出配線5の金属電極層51を切り欠いた切り欠き部51tを形成して、この切り欠き部51tから接着剤層4に光が照射されるようにして、接着領域Laを横切る引出配線5上に、接着剤層4の最外部分に接着剤層4が完全に硬化された水分遮断領域4hを形成する。   At this time, since the light-impermeable metal electrode layer 51 is laminated on the lead-out wiring 5, there is a place where light is not irradiated on the lead-out wiring crossing the adhesion region La, and the adhesive layer 4 is in a semi-cured state. The portion 4s is formed, but in the other adhesive region La, the adhesive layer 4 is irradiated with light through the support substrate 1 so that the adhesive layer 4 is completely cured. Therefore, in this embodiment, a notch 51t is formed by notching the metal electrode layer 51 of the lead-out wiring 5 in the outermost part of the adhesion region La, and light is transmitted from the notch 51t to the adhesive layer 4. The moisture blocking region 4 h in which the adhesive layer 4 is completely cured is formed on the outermost part of the adhesive layer 4 on the lead-out wiring 5 that crosses the adhesive region La so as to be irradiated.

引出配線5の形成は、支持基板1上に自発光素子部2を形成する自発光素子形成工程と同時又はその前後に形成される。一例としては、下地となる透明導電膜50を自発光素子の透明電極形成と同時に行い、その上の引出配線形成領域に金属電極層51を形成する金属膜を成膜して、これをパターニングする。このパターニング時又はその後に、一本の引出配線5を横断するように切り欠き部51tをパターニングする。ここで切り欠き部51tは、接着領域Laの最外部分が包含されるように正確に位置決めすることが要求される。   The lead-out wiring 5 is formed at the same time as or before and after the self-light-emitting element forming step for forming the self-light-emitting element portion 2 on the support substrate 1. As an example, a transparent conductive film 50 serving as a base is formed simultaneously with the formation of a transparent electrode of a self-luminous element, a metal film for forming a metal electrode layer 51 is formed on the lead wiring formation region, and this is patterned. . At the time of this patterning or after that, the notch 51t is patterned so as to traverse one lead wire 5. Here, the notch 51t is required to be accurately positioned so that the outermost part of the adhesion region La is included.

このような実施形態に係る自発光パネル及びその製造方法によると、接着領域Laを横切る引出配線5上で、接着剤層4の最外部分に水分遮断領域4hを形成するので、その水分遮断領域4hの内側に接着剤層4の半硬化状態の部分4sが形成されたとしても、この半硬化状態の部分4sに水分が進入することはなく、金属電極層51の表面と金属製の封止部材3の表面が接着剤層4を介して対面する接着領域Laの全体で、水分の進入を防いでマイグレーションが発生しやすい状態を回避することができる。   According to the self-luminous panel and the manufacturing method thereof according to such an embodiment, the moisture blocking region 4h is formed on the outermost portion of the adhesive layer 4 on the lead-out wiring 5 that crosses the bonding region La. Even if the semi-cured portion 4s of the adhesive layer 4 is formed inside 4h, moisture does not enter the semi-cured portion 4s, and the surface of the metal electrode layer 51 and the metal seal are sealed. It is possible to avoid a state in which migration is likely to occur by preventing moisture from entering the entire bonding region La where the surface of the member 3 faces through the adhesive layer 4.

また、当然ながら従来技術と同様に、水分遮断領域4hの存在によって封止空間M内に進入する水分を遮断することができるので、封止空間Mの密封性を充分に確保して自発光素子部2の発光特性を実用的に問題のない範囲で維持することが可能になる。   Of course, as in the prior art, the moisture that enters the sealed space M can be blocked by the presence of the moisture blocking region 4h, so that the sealing property of the sealed space M is sufficiently secured and the self-light emitting element is secured. It becomes possible to maintain the light emission characteristics of the portion 2 within a practically acceptable range.

なお、前述の実施形態では、金属電極層51に切り欠き部51tを形成することで、接着剤層4の最外部分に水分遮断領域4hを形成しているが、これに限らず、接着剤層4の外側の側方から直接光(紫外線)を照射するなどして、直接的に水分遮断領域4hを形成することもできる。   In the above-described embodiment, the moisture blocking region 4h is formed in the outermost part of the adhesive layer 4 by forming the notch 51t in the metal electrode layer 51. However, the present invention is not limited to this. The moisture blocking region 4h can also be formed directly by irradiating light (ultraviolet rays) directly from the outside of the layer 4 or the like.

以下に、図4によって、本発明の更に具体的な実施例として、有機EL素子によって表示部となる自発光素子部2を形成した有機ELパネルの構造を説明する。   Hereinafter, as a more specific embodiment of the present invention, the structure of an organic EL panel in which a self-luminous element portion 2 serving as a display portion is formed of an organic EL element will be described with reference to FIG.

有機ELパネル100の基本構成は、第1電極102と第2電極103との間に有機発光機能層を含む有機材料層104を挟持して支持基板101上に複数の有機EL素子110を形成したものである。図示の例では、支持基板101上にシリコン被覆層101aを形成しており、その上に形成される第1電極102をITO等の透明電極からなる陽極に設定し、第2電極103をAl等の金属材料からなる陰極に設定して、透明な支持基板101側から光を取り出すボトムエミッション方式を構成している。また、有機材料層104としては、正孔輸送層104A,発光層104B,電子輸送層104Cの3層構造の例を示している。そして、支持基板101と封止部材105とを接着剤層106を介して貼り合わせることによって支持基板101上に封止空間Mを形成し、この封止空間M内に有機EL素子110からなる表示部を形成している。   The basic configuration of the organic EL panel 100 is that a plurality of organic EL elements 110 are formed on a support substrate 101 with an organic material layer 104 including an organic light emitting functional layer interposed between a first electrode 102 and a second electrode 103. Is. In the illustrated example, a silicon coating layer 101a is formed on a support substrate 101, the first electrode 102 formed thereon is set as an anode made of a transparent electrode such as ITO, and the second electrode 103 is made of Al or the like. The bottom emission method is configured such that light is extracted from the transparent support substrate 101 side by setting the cathode made of the above metal material. Further, as the organic material layer 104, an example of a three-layer structure of a hole transport layer 104A, a light emitting layer 104B, and an electron transport layer 104C is shown. Then, a sealing space M is formed on the support substrate 101 by bonding the support substrate 101 and the sealing member 105 via the adhesive layer 106, and a display including the organic EL element 110 is formed in the sealing space M. Forming part.

有機EL素子110からなる表示部は、図示の例では、第1電極102を絶縁層107で区画しており、区画された第1電極102の下に各有機EL素子110による単位表示領域(110R,110G,110B)を形成している。また、封止空間Mを形成する封止部材105の内面には乾燥手段108が取り付けられて、湿気による有機EL素子110の劣化を防止している。   In the example shown in the figure, the display unit composed of the organic EL elements 110 has a first electrode 102 partitioned by an insulating layer 107, and a unit display area (110R) by each organic EL element 110 under the partitioned first electrode 102. , 110G, 110B). In addition, a drying means 108 is attached to the inner surface of the sealing member 105 that forms the sealing space M to prevent deterioration of the organic EL element 110 due to moisture.

また、支持基板101の端部には、第1電極10と同材料,同工程で形成される第1の電極層109Aが、第1電極102とは絶縁層107で絶縁された状態でパターン形成されている。第1の電極層109Aの引出部分には、銀合金を含む低抵抗配線部分を形成する第2の電極層109Bが形成されており、更にその上に、必要に応じてIZO等の保護被膜109Cが形成されて、第1の電極層109A,第2の電極層109B,保護被膜109Cからなる引出配線109が形成されている。そして、封止空間M内端部で第2電極103の端部103aが引出配線109に接続されている。   In addition, a pattern is formed on the end portion of the support substrate 101 in a state where the first electrode layer 109A formed by the same material and in the same process as the first electrode 10 is insulated from the first electrode 102 by the insulating layer 107. Has been. A second electrode layer 109B for forming a low resistance wiring portion containing a silver alloy is formed on the lead portion of the first electrode layer 109A, and a protective coating 109C such as IZO is further formed thereon as necessary. Is formed, and the lead-out wiring 109 made of the first electrode layer 109A, the second electrode layer 109B, and the protective film 109C is formed. The end portion 103 a of the second electrode 103 is connected to the lead wire 109 at the inner end portion of the sealing space M.

第1電極102の引出配線は、図示省略しているが、第1電極102を延出して封止空間M外に引き出すことによって形成することができる。この引出配線においても、前述した第2電極103の場合と同様に、Ag等を含む低抵抗配線部分を形成する電極層を形成することもできる。   Although the drawing wiring of the first electrode 102 is omitted in the drawing, it can be formed by extending the first electrode 102 and pulling it out of the sealing space M. Also in this lead wiring, as in the case of the second electrode 103 described above, an electrode layer for forming a low resistance wiring portion containing Ag or the like can be formed.

第1電極102,第2電極103は、通常は、一方が陰極側、他方が陽極側に設定される。陽極側は陰極側より仕事関数の高い材料で構成され、クロム(Cr)、モリブデン(Mo)、ニッケル(Ni)、白金(Pt)等の金属膜やITO、IZO等の酸化金属膜等の透明導電膜が用いられる。逆に陰極側は陽極側より仕事関数の低い材料で構成され、アルカリ金属(Li,Na,K,Rb,Cs)、アルカリ土類金属(Be,Mg,Ca,Sr,Ba)、希土類金属等、仕事関数の低い金属、その化合物、又はそれらを含む合金、ドープされたポリアニリンやドープされたポリフェニレンビニレン等の非晶質半導体、Cr、NiO、Mn等の酸化物を使用できる。この実施例では、前述したように、ボトムエミッション方式を採用するために、第1電極102を透明導電膜で形成して陽極とし,第2電極103を金属電極等から成る陰極に設定している。 One of the first electrode 102 and the second electrode 103 is usually set on the cathode side and the other is set on the anode side. The anode side is made of a material having a higher work function than the cathode side, and is transparent such as a metal film such as chromium (Cr), molybdenum (Mo), nickel (Ni), platinum (Pt), or a metal oxide film such as ITO or IZO. A conductive film is used. Conversely, the cathode side is made of a material having a lower work function than the anode side, such as alkali metals (Li, Na, K, Rb, Cs), alkaline earth metals (Be, Mg, Ca, Sr, Ba), rare earth metals, etc. , Metal having a low work function, a compound thereof, or an alloy containing them, amorphous semiconductors such as doped polyaniline and doped polyphenylene vinylene, and oxides such as Cr 2 O 3 , NiO, and Mn 2 O 5 are used. it can. In this embodiment, as described above, in order to adopt the bottom emission method, the first electrode 102 is formed of a transparent conductive film as an anode, and the second electrode 103 is set as a cathode made of a metal electrode or the like. .

引出配線(図示の引出配線109及び第1電極102の引出配線)には、有機ELパネル100を駆動する駆動回路部品やフレキシブル配線基板が接続されるが、可能な限り低抵抗に形成することが好ましく、前述したように、Agを含む低抵抗金属電極層からなる第2の電極層109Bを透明導電膜からなる第1の電極層109A上に積層する。そして、接着領域Laの最外部分で第2の電極層109Bと保護被膜109Cを部分的に除去した切り欠き部tが形成されている。   A drive circuit component and a flexible wiring board for driving the organic EL panel 100 are connected to the lead wiring (the lead wiring 109 and the lead wiring of the first electrode 102 shown in the drawing). Preferably, as described above, the second electrode layer 109B made of a low-resistance metal electrode layer containing Ag is laminated on the first electrode layer 109A made of a transparent conductive film. A cutout portion t is formed by partially removing the second electrode layer 109B and the protective coating 109C at the outermost portion of the adhesion region La.

有機材料層104は、少なくとも有機EL発光機能層を含む単層又は多層の有機化合物材料層からなるが、層構成はどのように形成されていても良い。一般には、図4に示すように、陽極側から陰極側に向けて、正孔輸送層104A、発光層104B、電子輸送層104Cを積層させたものを用いることができるが、発光層104B、正孔輸送層104A、電子輸送層104Cはそれぞれ1層だけでなく複数層積層して設けても良く、正孔輸送層104A、電子輸送層104Cについてはどちらかの層を省略しても、両方の層を省略しても構わない。また、正孔注入層、電子注入層等の有機材料層を用途に応じて挿入することも可能である。正孔輸送層104A、発光層104B、電子輸送層104Cは従来の使用されている材料(高分子材料、低分子材料を問わない)を適宜選択して採用できる。発光層104Bを形成する発光材料においては、1重項励起状態から基底状態に戻る際の発光(蛍光)と3重項励起状態から基底状態に戻る際の発光(りん光)のどちらを採用しても良い。   The organic material layer 104 is composed of a single-layer or multilayer organic compound material layer including at least an organic EL light emitting functional layer, but the layer structure may be formed in any manner. In general, as shown in FIG. 4, a layer in which a hole transport layer 104A, a light emitting layer 104B, and an electron transport layer 104C are stacked from the anode side to the cathode side can be used. The hole transport layer 104A and the electron transport layer 104C may be provided not only as a single layer but also as a plurality of layers, and both the hole transport layer 104A and the electron transport layer 104C may be omitted. The layer may be omitted. It is also possible to insert an organic material layer such as a hole injection layer or an electron injection layer depending on the application. For the hole transport layer 104A, the light emitting layer 104B, and the electron transport layer 104C, conventionally used materials (regardless of polymer materials or low molecular materials) can be appropriately selected and employed. The light emitting material forming the light emitting layer 104B employs either light emission (fluorescence) when returning from the singlet excited state to the ground state or light emission (phosphorescence) when returning from the triplet excited state to the ground state. May be.

封止部材105としては、ここでは、ステンレス等の金属製による板状部材又は容器状部材を用いる。また、接着剤層106を形成する接着剤は、光(紫外線)硬化型の接着剤を使用し、材料としてアクリル樹脂,エポキシ樹脂,ポリエステル,ポリオレフィン等を用いることができる。   Here, a plate-like member or a container-like member made of metal such as stainless steel is used as the sealing member 105. Further, as the adhesive forming the adhesive layer 106, a light (ultraviolet) curable adhesive is used, and acrylic resin, epoxy resin, polyester, polyolefin, or the like can be used as a material.

乾燥手段108は、ゼオライト,シリカゲル,カーボン,カーボンナノチューブ等の物理的乾燥剤、アルカリ金属酸化物,金属ハロゲン化物,過酸化塩素等の化学的乾燥剤、有機金属錯体をトルエン,キシレン,脂肪族有機溶剤等の石油系溶媒に溶解した乾燥剤、乾燥剤粒子を透明性を有するポリエチレン,ポリイソプレン,ポリビニルシンナエート等のバインダに分散させた乾燥剤により形成することができる。   The drying means 108 is a physical desiccant such as zeolite, silica gel, carbon or carbon nanotube, a chemical desiccant such as alkali metal oxide, metal halide or chlorine peroxide, or an organometallic complex in toluene, xylene or aliphatic organic. It can be formed with a desiccant dissolved in a petroleum solvent such as a solvent, a desiccant in which desiccant particles are dispersed in a binder such as polyethylene, polyisoprene, and polyvinyl cinnaate having transparency.

また、有機ELパネル100は単色表示であっても複数色表示であっても良く、複数色表示を実現するためには、塗り分け方式を含むことは勿論のこと、白色や青色等の単色の発光機能層にカラーフィルタや蛍光材料による色変換層を組み合わせた方式(CF方式、CCM方式)、単色の発光機能層の発光エリアに電磁波を照射する等して複数発光を実現する方式(フォトブリーチング方式)、2色以上の単位表示領域を縦に積層し一つの単位表示領域を形成した方式(SOLED(transparent Stacked OLED)方式)等を採用することができる。   Further, the organic EL panel 100 may be a single color display or a multi-color display. In order to realize the multi-color display, the organic EL panel 100 includes a single color display method as well as a single color display such as white or blue. A method in which a color filter or a color conversion layer made of a fluorescent material is combined with a light emitting functional layer (CF method, CCM method), a method for realizing multiple light emission by irradiating an electromagnetic wave to a light emitting area of a single color light emitting functional layer (photo bleach A method in which unit display areas of two or more colors are stacked vertically to form one unit display area (SOLED (transparent stacked OLED) system) or the like can be employed.

また、有機EL素子の製造方法は、従来から知られている方法で形成することができる。これらの方法を例示すると、低分子有機材料を真空蒸着にて成膜する方法、高分子有機材料を印刷法にて成膜する方法、予め形成した有機ELフィルムをレーザで基板側に転写させるレーザ熱転写法(LITI(Laser-induced Thermal Imaging)法)等を挙げることができる。   Moreover, the manufacturing method of an organic EL element can be formed by a conventionally known method. Examples of these methods include a method for forming a low molecular organic material by vacuum deposition, a method for forming a high molecular organic material by a printing method, and a laser for transferring a pre-formed organic EL film to the substrate side by a laser. Examples thereof include a thermal transfer method (LITI (Laser-induced Thermal Imaging) method).

以上説明したように、本発明の実施形態に係る自発光パネル及びその製造方法によると、マイグレーションの発生による引出配線と金属封止部材との短絡を未然に防いで、自発光パネルを正常に稼働させることができる。   As described above, according to the self-light-emitting panel and the manufacturing method thereof according to the embodiment of the present invention, the short-circuit between the lead-out wiring and the metal sealing member due to the occurrence of migration is prevented and the self-light-emitting panel operates normally. Can be made.

従来技術の説明図である。It is explanatory drawing of a prior art. 本発明の課題を説明する説明図である。It is explanatory drawing explaining the subject of this invention. 本発明の実施形態に係る自発光パネル及びその製造方法を説明する説明図である(同図(a)が平面B−B断面図、同図(b)がA−A断面図)。It is explanatory drawing explaining the self-light-emitting panel which concerns on embodiment of this invention, and its manufacturing method (the figure (a) is plane BB sectional drawing, the figure (b) is AA sectional drawing). 本発明の実施例に係る有機ELパネルを示す説明図である。It is explanatory drawing which shows the organic electroluminescent panel which concerns on the Example of this invention.

符号の説明Explanation of symbols

10 自発光パネル
1 支持基板
2 自発光素子部
3 封止部材
4 接着剤層
4h 水分遮断領域
5 引出電極
50 透明導電膜
51 金属電極層
51t,t 切り欠き部
M 封止空間
La 接着領域
DESCRIPTION OF SYMBOLS 10 Self-light-emitting panel 1 Support substrate 2 Self-light-emitting element part 3 Sealing member 4 Adhesive layer 4h Moisture blocking area 5 Extraction electrode 50 Transparent conductive film 51 Metal electrode layer 51t, t Notch M Sealing space La Adhesive area

Claims (7)

自発光素子部が形成された透明な支持基板上に前記自発光素子部を覆う封止空間を形成するように、金属製の封止部材の周縁に形成される接着領域に光硬化性の接着剤層を形成して、前記支持基板と前記封止部材とを貼り合わせた自発光パネルであって、
前記自発光素子部から前記封止空間の外に引き出される引出配線を備え、
該引出配線は、前記支持基板上に形成された透明導電膜と該透明導電膜上に積層されたマイグレーションを生じ易い金属元素を含む金属電極層とからなり、
前記接着領域を横切る前記引出配線上で、前記接着剤層の少なくとも最外部分に水分遮断領域を形成したことを特徴とする自発光パネル。
Photo-curing adhesion to an adhesive region formed at the periphery of a metal sealing member so as to form a sealing space that covers the self-luminous element part on a transparent support substrate on which the self-luminous element part is formed. A self-luminous panel in which an agent layer is formed and the support substrate and the sealing member are bonded together,
With a lead-out wiring that is drawn out of the sealed space from the self-luminous element part,
The lead-out wiring is composed of a transparent conductive film formed on the support substrate and a metal electrode layer containing a metal element that is easily formed on the transparent conductive film,
A self-luminous panel, wherein a moisture blocking region is formed at least at an outermost portion of the adhesive layer on the lead-out wiring crossing the adhesive region.
前記水分遮断領域は前記接着剤層の完全硬化状態によって形成されることを特徴とする請求項1に記載された自発光パネル。   The self-luminous panel according to claim 1, wherein the moisture blocking region is formed by a completely cured state of the adhesive layer. 前記接着領域の最外部分で前記引出配線の金属電極層を切り欠いた切り欠き部を形成し、該切り欠き部からの光照射によって前記水分遮断領域が形成されることを特徴とする請求項1又は2に記載された自発光パネル。   The cutout portion formed by cutting out the metal electrode layer of the lead-out wiring is formed at the outermost portion of the adhesion region, and the moisture blocking region is formed by light irradiation from the cutout portion. The self-luminous panel described in 1 or 2. 前記金属元素は、銀(Ag),銅(Cu),錫(Sn),鉛(Pb)のいずれかであることを特徴とする請求項1〜3のいずれかに記載された自発光パネル。   The self-luminous panel according to claim 1, wherein the metal element is any one of silver (Ag), copper (Cu), tin (Sn), and lead (Pb). 自発光素子部が形成された透明な支持基板上に前記自発光素子部を覆う封止空間を形成するように、金属製の封止部材の周縁に形成される接着領域に光硬化性の接着剤層を形成して、前記支持基板と前記封止部材とを貼り合わせた状態で前記支持基板側から光を照射する自発光パネルの製造方法であって、
前記支持基板上に、透明導電膜と該透明導電膜上に積層されたマイグレーションを生じ易い金属元素を含む金属電極層からなり、前記自発光素子部から前記封止空間の外に引き出される引出配線を形成し、
前記接着領域を横切る前記引出配線上で、前記接着剤層の少なくとも最外部分に水分遮断領域を形成することを特徴とする自発光パネルの製造法。
Photo-curing adhesion to an adhesive region formed at the periphery of a metal sealing member so as to form a sealing space that covers the self-luminous element part on a transparent support substrate on which the self-luminous element part is formed. A method for producing a self-luminous panel in which an agent layer is formed and light is emitted from the support substrate side in a state in which the support substrate and the sealing member are bonded together,
A lead-out wiring made of a transparent conductive film and a metal electrode layer containing a metal element that is likely to cause migration laminated on the support substrate, and is drawn out of the sealed space from the self-luminous element portion Form the
A method of manufacturing a self-luminous panel, wherein a moisture blocking region is formed in at least an outermost portion of the adhesive layer on the lead-out wiring crossing the adhesive region.
前記水分遮断領域は、前記接着剤層の最外部分に光を照射することによって形成することを特徴とする請求項5に記載された自発光パネルの製造方法。   The method for manufacturing a self-luminous panel according to claim 5, wherein the moisture blocking region is formed by irradiating light to an outermost part of the adhesive layer. 前記水分遮断領域は、前記接着領域の最外部分で前記引出配線の金属電極層を切り欠いた切り欠き部を形成し、該切り欠き部からの光照射によって形成することを特徴とする請求項5又は6に記載された自発光パネルの製造方法。   The moisture blocking region is formed by forming a cutout portion in which the metal electrode layer of the lead-out wiring is cut out at an outermost portion of the adhesion region, and light irradiation from the cutout portion. A method for producing a self-luminous panel described in 5 or 6.
JP2004247998A 2004-08-27 2004-08-27 Spontaneous light-emitting panel and its manufacturing method Pending JP2006066248A (en)

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JP2007250519A (en) * 2006-03-14 2007-09-27 Samsung Sdi Co Ltd Organic electroluminescent display device
WO2014181540A1 (en) * 2013-05-10 2014-11-13 パナソニックIpマネジメント株式会社 Organic electroluminescent element
JP2015149137A (en) * 2014-02-05 2015-08-20 パイオニア株式会社 light-emitting device

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KR101212225B1 (en) 2010-05-06 2012-12-13 삼성디스플레이 주식회사 Organic light emitting diode display

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007250519A (en) * 2006-03-14 2007-09-27 Samsung Sdi Co Ltd Organic electroluminescent display device
WO2014181540A1 (en) * 2013-05-10 2014-11-13 パナソニックIpマネジメント株式会社 Organic electroluminescent element
JP2015149137A (en) * 2014-02-05 2015-08-20 パイオニア株式会社 light-emitting device

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