JP2006061862A - 超臨界流体中に連続的に低圧の気体を添加する方法およびそのための装置 - Google Patents

超臨界流体中に連続的に低圧の気体を添加する方法およびそのための装置 Download PDF

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JP2006061862A
JP2006061862A JP2004249487A JP2004249487A JP2006061862A JP 2006061862 A JP2006061862 A JP 2006061862A JP 2004249487 A JP2004249487 A JP 2004249487A JP 2004249487 A JP2004249487 A JP 2004249487A JP 2006061862 A JP2006061862 A JP 2006061862A
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Prior art keywords
gas
supercritical fluid
low
pressure
fluid
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JP2004249487A
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English (en)
Japanese (ja)
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JP2006061862A5 (enExample
Inventor
Hidekazu Kondo
英一 近藤
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University of Yamanashi NUC
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University of Yamanashi NUC
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Priority to JP2004249487A priority Critical patent/JP2006061862A/ja
Priority to US11/574,438 priority patent/US7651671B2/en
Priority to PCT/JP2005/015660 priority patent/WO2006025325A1/ja
Publication of JP2006061862A publication Critical patent/JP2006061862A/ja
Publication of JP2006061862A5 publication Critical patent/JP2006061862A5/ja
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/008—Processes carried out under supercritical conditions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • H10P14/40—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/50—Improvements relating to the production of bulk chemicals
    • Y02P20/54—Improvements relating to the production of bulk chemicals using solvents, e.g. supercritical solvents or ionic liquids
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/86493—Multi-way valve unit
    • Y10T137/86863—Rotary valve unit

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
JP2004249487A 2004-08-30 2004-08-30 超臨界流体中に連続的に低圧の気体を添加する方法およびそのための装置 Pending JP2006061862A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004249487A JP2006061862A (ja) 2004-08-30 2004-08-30 超臨界流体中に連続的に低圧の気体を添加する方法およびそのための装置
US11/574,438 US7651671B2 (en) 2004-08-30 2005-08-29 Method of adding low-pressure gas continuously to supercritical fluid and apparatus therefor
PCT/JP2005/015660 WO2006025325A1 (ja) 2004-08-30 2005-08-29 超臨界流体中に連続的に低圧の気体を添加する方法およびそのための装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004249487A JP2006061862A (ja) 2004-08-30 2004-08-30 超臨界流体中に連続的に低圧の気体を添加する方法およびそのための装置

Publications (2)

Publication Number Publication Date
JP2006061862A true JP2006061862A (ja) 2006-03-09
JP2006061862A5 JP2006061862A5 (enExample) 2007-10-11

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JP2004249487A Pending JP2006061862A (ja) 2004-08-30 2004-08-30 超臨界流体中に連続的に低圧の気体を添加する方法およびそのための装置

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Country Link
US (1) US7651671B2 (enExample)
JP (1) JP2006061862A (enExample)
WO (1) WO2006025325A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010277984A (ja) * 2009-05-27 2010-12-09 Emprie Technology Development LLC ナノワイヤの形成方法、導電性構造及びコンピュータ読み取り可能媒体
JP2013049005A (ja) * 2011-08-30 2013-03-14 Toyota Motor Corp 触媒製造方法、当該方法により製造される燃料電池用電極触媒、及び、触媒製造装置
JP2022189567A (ja) * 2021-06-11 2022-12-22 岩谷産業株式会社 ガスカートリッジおよび水素炭酸水の製造装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011149456A1 (en) * 2010-05-26 2011-12-01 Berger Terry A Efficient chiller for a supercritical fluid chromatography pump
JP5896861B2 (ja) * 2012-08-10 2016-03-30 株式会社デンソー 成膜装置及び成膜方法
US10221488B2 (en) * 2015-09-18 2019-03-05 General Electric Company Supercritical water method for treating internal passages

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003024763A (ja) * 2001-07-16 2003-01-28 Nikkiso Co Ltd 超臨界微粉化装置
JP2003062446A (ja) * 2001-08-27 2003-03-04 National Institute Of Advanced Industrial & Technology 高圧反応システム
JP2003213425A (ja) * 2002-01-24 2003-07-30 Utec:Kk 成膜装置及び成膜方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19700530B4 (de) * 1997-01-09 2007-09-06 Perkin Elmer Bodenseewerk Zweigniederlassung Der Berthold Gmbh & Co. Kg Vorrichtung zur Durchführung naßchemischer Reaktionen unter Druck
JPH11197494A (ja) 1998-01-13 1999-07-27 Kenji Mishima 超臨界流体を用いた微小粒子コーティング
EP1234063A2 (en) 1999-11-02 2002-08-28 University of Massachusetts Chemical fluid deposition for the formation of metal and metal alloy films on patterned and unpatterned substrates
JP2003024793A (ja) 2001-07-13 2003-01-28 Toyota Motor Corp 排ガス浄化用触媒及びＮＯｘ吸蔵材の担持方法
JP2004228526A (ja) 2003-01-27 2004-08-12 Tokyo Electron Ltd 基板処理方法および半導体装置の製造方法
JP2004225152A (ja) 2003-01-27 2004-08-12 Tokyo Electron Ltd 基板処理方法および半導体装置の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003024763A (ja) * 2001-07-16 2003-01-28 Nikkiso Co Ltd 超臨界微粉化装置
JP2003062446A (ja) * 2001-08-27 2003-03-04 National Institute Of Advanced Industrial & Technology 高圧反応システム
JP2003213425A (ja) * 2002-01-24 2003-07-30 Utec:Kk 成膜装置及び成膜方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010277984A (ja) * 2009-05-27 2010-12-09 Emprie Technology Development LLC ナノワイヤの形成方法、導電性構造及びコンピュータ読み取り可能媒体
JP2013049005A (ja) * 2011-08-30 2013-03-14 Toyota Motor Corp 触媒製造方法、当該方法により製造される燃料電池用電極触媒、及び、触媒製造装置
JP2022189567A (ja) * 2021-06-11 2022-12-22 岩谷産業株式会社 ガスカートリッジおよび水素炭酸水の製造装置
JP7651381B2 (ja) 2021-06-11 2025-03-26 岩谷産業株式会社 ガスカートリッジおよび水素炭酸水の製造装置

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US20090003124A1 (en) 2009-01-01
WO2006025325A1 (ja) 2006-03-09
US7651671B2 (en) 2010-01-26

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