JP2006060150A - Manufacturing method of wiring board - Google Patents

Manufacturing method of wiring board Download PDF

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JP2006060150A
JP2006060150A JP2004243053A JP2004243053A JP2006060150A JP 2006060150 A JP2006060150 A JP 2006060150A JP 2004243053 A JP2004243053 A JP 2004243053A JP 2004243053 A JP2004243053 A JP 2004243053A JP 2006060150 A JP2006060150 A JP 2006060150A
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groove
via hole
sheet
conductor
manufacturing
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JP4443349B2 (en
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Tadatomo Suga
唯知 須賀
Katsuhide Tsukamoto
勝秀 塚本
Isamu Aokura
勇 青倉
Akito Yoshii
明人 吉井
Masahiro Kitamura
昌広 北村
Hiroshi Yamaguchi
博 山口
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Namics Corp
Panasonic Holdings Corp
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Namics Corp
Matsushita Electric Industrial Co Ltd
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  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide the manufacturing method of a wiring board capable of simply manufacturing the wiring board at a low cost with high reliability because of a few joints between different materials, with ease of minute wiring, and with less wire resistance because of employing a high groove aspect ratio. <P>SOLUTION: The manufacturing method adopts a step wherein grooves and through-via holes are formed to an insulator sheet on the surface of which an exfoliable sheet is formed, conductor paste is filled into the grooves and through-via holes, and the exfoliable sheet is exfoliated. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、各種の電子部品をその表面に搭載、あるいは内蔵して電気的に接続することにより電子回路を形成することができる配線基板の製造方法に関する。   The present invention relates to a method of manufacturing a wiring board capable of forming an electronic circuit by mounting or incorporating various electronic components on the surface thereof and electrically connecting them.

近年、電子機器の小型高密度化に伴い、配線基板の分野ではその構造が貫通スルー構造から層間の接続が自由なインナーバイア(inner via あるいは interstitial via)構造に移ってきている。   In recent years, as electronic devices have become smaller and more dense, in the field of wiring boards, the structure has shifted from a through-through structure to an inner via (interstitial via) structure in which connection between layers is free.

インナーバイアの製造方法にはいくつかの方法がある。
一つはデポジット型と呼ばれているものであり、絶縁体層に表面から内層の導体に届く穴(ブラインドビア)を開け、メッキなどして内層の導体と表層の導体を電気的に繋ぐ方法である。
There are several methods for manufacturing the inner via.
One is called the deposit type, and it is a method of opening holes (blind vias) from the surface to the inner layer conductor in the insulator layer and plating to electrically connect the inner layer conductor and the surface layer conductor. It is.

また、積層型と呼ばれているものがあり、独立した絶縁体シートに穴を開け、この穴に導電性ペーストを埋め込み、この導電性ペーストを2枚の銅箔で挟んで加熱加圧して上下の導体(銅箔)の電気的接続をとる方法である。   In addition, there is a so-called laminated type, in which a hole is made in an independent insulator sheet, a conductive paste is embedded in the hole, the conductive paste is sandwiched between two copper foils, and heated and pressed to move up and down. This is a method of establishing electrical connection of the conductor (copper foil).

その他に、絶縁体シートに溝と貫通穴をあけ、ここにペースト状の導電体を埋め込んで配線も貫通スルーも同時に作ってしまう簡単な工法のものがある。(特許文献1参照)
特開2003−8178公報
In addition, there is a simple construction method in which a groove and a through hole are made in an insulator sheet, and a paste-like conductor is embedded therein to simultaneously form wiring and through through. (See Patent Document 1)
JP 2003-8178 A

上述した第1の方法であるデポジット型は、ブラインドビアにメッキ液を確実に入れることが難しいためにアスペクト比の高い微細なビアの接続は難しい。また、メッキした後に凹みを埋めて平滑化し、その後に次の層を重ねなければビアオンビア(ビアの直上のビア)はできないなど工程が多くなるということがある。また、メッキ液を使うことから汚染対策も必要となる。   The deposit type, which is the first method described above, makes it difficult to connect a fine via with a high aspect ratio because it is difficult to reliably put the plating solution into the blind via. In addition, there are cases where the number of processes is increased, for example, a via-on-via (a via immediately above a via) cannot be formed unless the dent is filled and smoothed after plating and then the next layer is stacked. Further, since a plating solution is used, it is necessary to take measures against contamination.

第2の積層型は、微細なビアが必要なときにはどうしても薄い独立した絶縁体シートを用いる必要があり、製造時に取り扱い難く、寸法精度を保ち難く、微細化が難しい。また、ビア形成時に大きな加圧力がいることも部品の内蔵時などには問題を生じる。溝や貫通穴にペースト状の導電体を埋め込む方法は、埋め込む際にスキージで表層の余分なペースト状の導電体を十分にとりきれない。また、クリーニングするために研磨する工程や、そのクリーニング工程なども増える。   The second laminated type needs to use a thin independent insulator sheet when a fine via is necessary, and is difficult to handle at the time of manufacture, difficult to maintain dimensional accuracy, and difficult to miniaturize. In addition, a large pressure applied during via formation also causes a problem when components are built in. In the method of embedding the paste-like conductor in the groove or the through hole, the excess paste-like conductor on the surface layer cannot be sufficiently removed by the squeegee when embedding. In addition, a polishing process for cleaning and a cleaning process thereof are increased.

本発明は上記した課題を解決するものであり、簡単でコストが安く、且つ異なる材料間の接合が少ないために信頼性が良く、微細な配線が容易で、また溝のアスペクト比も大きく取れるために配線の抵抗も少なくできる配線基板の製造方法を提供することを目的とする。   The present invention solves the above-described problems, and is simple and low in cost, and has low reliability because it has few joints between different materials. Therefore, fine wiring is easy and the aspect ratio of the groove can be increased. Another object of the present invention is to provide a method of manufacturing a wiring board that can reduce the resistance of the wiring.

上記目的を達成するために本発明においては、表面に剥離可能なシートを設けた絶縁体シートに溝や貫通ビア穴を作り、溝や貫通ビア穴にペースト状の導電体を埋め込み剥離可能なシートを剥離するという工程をとる。   In order to achieve the above object, in the present invention, a groove or a through via hole is formed in an insulating sheet provided with a peelable sheet on the surface, and a paste-like conductor is embedded in the groove or the through via hole and the sheet can be peeled off. The process of peeling is taken.

つまり、本発明の配線基板の製造方法は、少なくとも表面に剥離可能なシートを設けた絶縁体シートに溝又は貫通ビア穴を作る工程と、溝又は貫通ビア穴にペースト状の導電体を埋め込む工程と、該剥離可能なシートを剥離する工程とからなるものである。   That is, the method for manufacturing a wiring board according to the present invention includes a step of forming a groove or a through via hole in an insulator sheet provided with a peelable sheet at least on the surface, and a step of embedding a paste-like conductor in the groove or the through via hole. And a step of peeling the peelable sheet.

また、溝深さ:溝幅のアスペクト比が1より大きい溝を含むものである。
また、溝又は貫通ビア穴をレーザで作るものである。
本発明の多層基板の製造方法は、少なくとも表面に剥離可能なシートを設けた絶縁体シートに溝又は貫通ビア穴を作る工程と、溝又は貫通ビア穴にペースト状の導電体を埋め込む工程と、該剥離可能なシートを剥離する工程とにおいて第一の配線基板を製造し、この第一の配線基板の両面あるいは片面に、表面に剥離可能なシートを設けた新たな絶縁体シートを積層接着する工程と、その表面に溝又は第一の配線基板の導電体に届くビア穴を作る工程と、該溝又はビア穴にペースト状の導電体を埋め込む工程と、該剥離可能なシートを剥離する工程とを必要に応じて繰り返し施すものである。
Moreover, the groove depth: the groove width includes an aspect ratio larger than 1.
Moreover, a groove or a through via hole is made by a laser.
The method for producing a multilayer substrate of the present invention includes a step of forming a groove or a through via hole in an insulator sheet provided with a peelable sheet at least on the surface, a step of embedding a paste-like conductor in the groove or the through via hole, A first wiring board is manufactured in the step of peeling off the peelable sheet, and a new insulator sheet provided with a peelable sheet on the surface is laminated and bonded to both sides or one side of the first wiring board. A step, a step of forming a via hole reaching the conductor of the groove or the first wiring board on the surface, a step of embedding a paste-like conductor in the groove or the via hole, and a step of peeling the peelable sheet Are repeated as necessary.

また、溝深さ:溝幅のアスペクト比が1より大きい溝を含むものである。
また、積層した新たな絶縁体シートに溝又は下層の導電体に届くビア穴をレーザで作るものである。
Moreover, the groove depth: the groove width includes an aspect ratio larger than 1.
In addition, a via hole that reaches a groove or a lower conductor is formed by a laser in a new laminated insulating sheet.

本発明の部品内蔵基板の製造方法は、少なくとも電子部品を埋め込み表面に剥離可能なシートを設けた絶縁体シートに、溝又は貫通ビア穴並びに表面から電子部品の電極に届くビア穴を作る工程と、溝又は貫通ビア穴並びにビア穴にペースト状の導電体を埋め込む工程と、該剥離可能なシートを剥離する工程とからなるものである。   The method for manufacturing a component-embedded substrate of the present invention includes a step of forming a groove or a through-via hole and a via hole reaching the electrode of the electronic component from the surface in an insulator sheet provided with a sheet that can be embedded and peeled at least on the surface. And a step of embedding a paste-like conductor in the groove or through-via hole and the via hole, and a step of peeling the peelable sheet.

また、溝深さ:溝幅のアスペクト比が1より大きい溝を含むものである。
また、溝又はビア穴をレーザで作るものである。
本発明の部品内蔵多層基板の製造方法は、少なくとも電子部品を埋め込み表面に剥離可能なシートを設けた絶縁体シートに、溝又は貫通ビア穴並びに表面から電子部品の電極に届くビア穴を作る工程と、溝又は貫通ビア穴並びにビア穴にペースト状の導電体を埋め込む工程と、該剥離可能なシートを剥離する工程とにおいて第一の配線基板を製造し、この第一の配線基板の両面あるいは片面に、表面に剥離可能なシートを設けた新たな絶縁体シートあるいは表面に剥離可能なシートを設けた電子部品を埋め込んだ絶縁体シートを積層接着する工程と、その表面に溝又は第一の配線基板の導電体に届くビア穴並びに表面から電子部品の電極に届くビア穴を作る工程と、該溝やビア穴にペースト状の導電体を埋め込む工程と、該剥離可能なシートを剥離する工程とを必要に応じて繰り返し施すものである。
In addition, a groove having an aspect ratio of groove depth: groove width larger than 1 is included.
Moreover, a groove or a via hole is made with a laser.
The method for producing a multilayer board with built-in component according to the present invention includes a step of forming a groove or a through-via hole and a via hole reaching the electrode of the electronic component from the surface in an insulator sheet provided with a sheet on which at least an electronic component is embedded and can be peeled off. And manufacturing the first wiring board in the step of embedding the paste-like conductor in the groove or the through-via hole and the via hole, and the step of peeling off the peelable sheet, A step of laminating and bonding a new insulator sheet provided with a peelable sheet on one surface or an insulator sheet embedded with an electronic component provided with a peelable sheet on the surface, and a groove or a first on the surface Forming via holes reaching the conductor of the wiring board and via holes reaching the electrodes of the electronic component from the surface; embedding a paste-like conductor in the groove or via hole; and the peelable sheet It is intended to apply repeatedly if necessary a step of peeling.

また、溝深さ:溝幅のアスペクト比が1より大きい溝を含むものである。
また、溝又はビア穴をレーザで作るものである。
本発明のチップサイズパッケージの製造方法は、少なくとも回路を形成したシリコンウエファーを埋め込み表面に剥離可能なシートを設けた絶縁体シートに、表面から溝又はシリコンウエファーの電極に届くビア穴を作る工程と、溝又はビア穴にペースト状の導電体を埋め込む工程と、絶縁体シートをチップ毎に分離する工程とからなるものである。
Moreover, the groove depth: the groove width includes an aspect ratio larger than 1.
Moreover, a groove or a via hole is made with a laser.
The manufacturing method of the chip size package of the present invention includes a step of forming a via hole reaching from the surface to a groove or an electrode of a silicon wafer on an insulator sheet provided with a sheet on which a silicon wafer on which a circuit is formed is embedded and can be peeled on the surface. The method includes a step of embedding a paste-like conductor in the groove or the via hole and a step of separating the insulating sheet for each chip.

上記したように、本発明の製造方法に係る配線基板並びにパッケージは製造法が簡単でコストが安く、且つ異なる材料間の接合が少ないために信頼性がよい。またレーザ加工などを用いれば、微細な配線が容易で、また溝のアスペクト比も大きく取れるために配線の抵抗も少なくできる。   As described above, the wiring board and the package according to the manufacturing method of the present invention have a high reliability because the manufacturing method is simple, the cost is low, and bonding between different materials is small. If laser processing or the like is used, fine wiring is easy and the aspect ratio of the groove can be increased so that the resistance of the wiring can be reduced.

本発明の詳細を実施例を用いて説明する。
(実施例1)
図1(a)〜(e)は本発明の一実施例で両面配線基板の製造方法の工程を示す。図1(a)において、絶縁体101はシート状である。この絶縁体シート101の表面に薄い剥離可能なシート110を貼り付ける。これに加工を施し、図1(b)のように、溝102と貫通ビア穴103をもつ構造体104を作る。絶縁体101の材料は樹脂が加工しやすく好ましい。
Details of the present invention will be described with reference to examples.
Example 1
1A to 1E show steps of a method for manufacturing a double-sided wiring board according to an embodiment of the present invention. In FIG. 1A, the insulator 101 has a sheet shape. A thin peelable sheet 110 is attached to the surface of the insulating sheet 101. This is processed to form a structure 104 having a groove 102 and a through via hole 103 as shown in FIG. The insulator 101 is preferably made of a resin that is easy to process.

この加工はいろいろな方法で作ることができる。たとえば機械的に研削して作ることもできるし、レーザなどを使って作ることもできる。微細な加工の場合、たとえば100ミクロン以下の溝幅や貫通穴の場合はレーザがよい。特にエキシマレーザは都合がよい。レーザや研削で作る場合に、剥離可能なシート110は溝を加工するときに同時に除去されて、溝以外の部分111が残る。   This process can be made in various ways. For example, it can be made by mechanical grinding or by using a laser or the like. In the case of fine processing, for example, in the case of a groove width or a through hole of 100 microns or less, a laser is preferable. An excimer laser is particularly convenient. In the case of making by laser or grinding, the peelable sheet 110 is simultaneously removed when the groove is processed, and the portion 111 other than the groove remains.

金型を使って大量に安価に作ることも考えられるが、表面に剥離可能なシートが存在するために金型を使って図1(b)に示す構造体を作ることはできない。
次に、図1(c)に示すように、ペースト状の導電体105をスキージ106により埋め込む。この作業は構造体104の片側からでも良いが、本実施例では構造体104の両面からペースト状の導電体をスキージ106で刷り込んで行く。埋め込まれたペースト状の導電体107には気泡が含まれないことが望ましい。そのために図1(c)の工程を真空中で行うのがより好ましい。
Although it is conceivable to make a large amount at a low cost using a mold, the structure shown in FIG. 1B cannot be made using a mold because there is a peelable sheet on the surface.
Next, as shown in FIG. 1C, a paste-like conductor 105 is embedded with a squeegee 106. This operation may be performed from one side of the structure body 104, but in this embodiment, paste-like conductors are imprinted with the squeegee 106 from both surfaces of the structure body 104. It is desirable that the embedded paste-like conductor 107 does not contain bubbles. Therefore, it is more preferable to perform the process of FIG.1 (c) in a vacuum.

次に、図1(d)に示すように、加工されて穴の開いた剥離可能なシート111を剥離する。このようにすることにより、図1(c)に示す剥離可能なシート111上に残されたペースト状の導電体の残渣112を容易に除くことができる。ペースト状の導電体としては一般によく知られているものでは金や銀、銅などの微粉をエポキシ樹脂に混入したものが一般的である。また、溶剤を含んでいるものもあるし、含んでいないものもある。   Next, as shown in FIG.1 (d), the peelable sheet | seat 111 which was processed and opened the hole is peeled. By doing so, the paste-like conductor residue 112 left on the peelable sheet 111 shown in FIG. 1C can be easily removed. As a paste-like conductor, what is generally well known is one in which fine powders such as gold, silver and copper are mixed in an epoxy resin. Some of them contain a solvent and some do not.

埋め込まれた導電体107の表面の高さは剥離可能なシートの表面とほぼ同じであるために、ペースト状の導電体107は絶縁体シート101の表面から飛び出す。このまま硬化すれば、図1(e)に示すように、硬化した導電体108が表面から少し飛び出た両面配線基板109を得る。飛び出し量はペースト状の導電体の硬化収縮率に依存する。   Since the height of the surface of the embedded conductor 107 is substantially the same as the surface of the peelable sheet, the paste-like conductor 107 jumps out of the surface of the insulator sheet 101. If cured as it is, as shown in FIG. 1 (e), a double-sided wiring substrate 109 in which the cured conductor 108 slightly protrudes from the surface is obtained. The amount of protrusion depends on the curing shrinkage rate of the paste-like conductor.

剥離可能なシートを剥離した後でペースト状の導電体を硬化するか、硬化してから剥離するかは選択できる。硬化した後で剥離する場合は体積収縮して体積減少したペースト状の導電体を補給することができる。硬化には加熱したり紫外線を照射したり、あるいは常温放置という方法などがあるが一般的には加熱の手段が材料の選択巾が広いことから好ましい。   It is possible to select whether the paste-like conductor is cured after the peelable sheet is peeled off or peeled after being cured. In the case of peeling after curing, a paste-like conductor whose volume has shrunk and reduced in volume can be supplied. Curing includes heating, irradiating with ultraviolet rays, or leaving at room temperature, but generally heating means are preferred because of a wide selection of materials.

この配線基板の製造方法の特徴は絶縁体が厚くても、すなわち貫通ビア穴が深くアスペクト比が大きいものでも容易に接続できることである。従来の工法ではビア穴径が100ミクロン以下という小さな径ではアスペクト比が1以上は接続の歩留まりが悪く製造は困難であった。また、従来基板のように金属箔と、ペーストというような異なった材料の接続ではなく、同一材料(ペースト状導電体の硬化物)による一体化構造のためにより信頼性も高い。また、絶縁体を樹脂のみだけでなくフィラーを入れる場合は、硬化した導電体の熱膨張係数を合わせやすく貫通ビアの接続安定性が得られる。   A feature of this method of manufacturing a wiring board is that it can be easily connected even if the insulator is thick, that is, even if the through via hole is deep and the aspect ratio is large. In the conventional method, when the via hole diameter is as small as 100 microns or less, an aspect ratio of 1 or more has a poor connection yield and is difficult to manufacture. In addition, the metal foil is not connected to a different material such as a paste as in the conventional substrate, but is more reliable because of an integrated structure made of the same material (cured material of a paste-like conductor). Moreover, when not only a resin but also a filler is used as the insulator, it is easy to match the thermal expansion coefficient of the cured conductor, and connection stability of the through via can be obtained.

通常において回路基板は部品の搭載に半田を使うのであるが、この基板の場合は導電性接着剤を使うのが簡単であり、コストも安い。しかし、従来の半田を使う実装法にも適用できるように、硬化した導電体108の表層にのみ銅などのメッキを施すこともできる。
(実施例2)
図2(a)〜(e)は本発明の別の実施例であり、4層基板用工程を示す。まず、図2(a)に示すように、実施例1で作った両面基板109(第一の配線基板)の両面に、剥離可能なシート210を設けた絶縁体シート201を重ねる。絶縁体シート201の材料は樹脂が加工しやすく好ましい。絶縁体シート201の製法はいくらもあるが、コーティング、あるいは積層が一般的である。コーティングの場合は液状の樹脂、積層の場合はB−ステージのシート状樹脂あるいは接着剤付きの樹脂シートなどが使える。剥離可能なシート210は絶縁体シート201を重ねた後で作ってもよい。
Normally, the circuit board uses solder for mounting components, but in this case, it is easy to use a conductive adhesive and the cost is low. However, copper or the like can be plated only on the surface layer of the cured conductor 108 so that it can be applied to a conventional mounting method using solder.
(Example 2)
FIGS. 2A to 2E show another embodiment of the present invention, which shows a four-layer substrate process. First, as shown in FIG. 2A, an insulator sheet 201 provided with a peelable sheet 210 is placed on both sides of a double-sided board 109 (first wiring board) made in Example 1. The material of the insulator sheet 201 is preferable because the resin is easily processed. There are various methods for manufacturing the insulator sheet 201, but coating or lamination is common. In the case of coating, a liquid resin can be used, and in the case of lamination, a B-stage sheet-like resin or a resin sheet with an adhesive can be used. The peelable sheet 210 may be formed after the insulating sheets 201 are stacked.

次に、図2(b)に示すように、表面から溝202や下層の導電体に届くビア穴203をレーザ加工で作る。エキシマレーザの場合は一本のビームで描画して行くのでなく、マスクを通してパターンで剥離可能なシート210並びに絶縁体シート201を彫ってゆくことが可能である。10ミクロンの穴や溝巾は容易である。また、溝深さについてもアスペクト比10ぐらいも容易に得られる。他のレーザではアスペクト比の高い穴や溝加工は難しい。剥離可能なシート210は溝の部分が削られてそれ以外のところが残った穴の開いたシート211として残る。   Next, as shown in FIG. 2B, via holes 203 reaching the grooves 202 and the underlying conductor from the surface are formed by laser processing. In the case of an excimer laser, it is possible to carve the sheet 210 and the insulator sheet 201 that can be peeled off by a pattern through a mask, instead of drawing with one beam. A 10 micron hole or groove width is easy. Further, an aspect ratio of about 10 can be easily obtained for the groove depth. Other lasers are difficult to drill holes and grooves with high aspect ratios. The peelable sheet 210 remains as a sheet 211 having a hole in which the groove portion is cut and the remaining portions are left.

次に、図2(c)に示すように、スキージ206でペースト状の導電体205を溝並びにビア穴に埋め込んでペースト状の導電体のパターン207を得る。このときパターン以外の部分にペースト状の導電体の残渣212が残ることがある。この残渣は、図2(d)に示すように、穴の開いたシート211を剥離することにより簡単に且つ完全に取り除くことができる。これを加熱して絶縁体シート201を第一の配線基板109に固着させると同時にペースト状の導電体を硬化させる。そして、図2(e)に示すように、硬化した導電体208が表面から少し飛び出した4層配線基板209を得る。   Next, as shown in FIG. 2C, the paste-like conductor 205 is embedded in the groove and the via hole with the squeegee 206 to obtain a paste-like conductor pattern 207. At this time, a paste-like conductor residue 212 may remain in a portion other than the pattern. As shown in FIG. 2D, this residue can be easily and completely removed by peeling off the sheet 211 having holes. This is heated to fix the insulator sheet 201 to the first wiring substrate 109 and at the same time to cure the paste-like conductor. Then, as shown in FIG. 2E, a four-layer wiring board 209 is obtained in which the cured conductor 208 protrudes slightly from the surface.

実施例1と同じくペースト状の導電体の充填を2回繰り返したり、研磨して表面を平にしたり、あるいは表面に銅メッキを施すなどもできる。もちろんアスペクト比の大きいビア穴も接続が同じ導電体であるので信頼性のいい物が得られる。従来の工法でビアの底にある電極が銅箔の表面の場合には安定した接続や高い歩留まりを得るために充填前に科学的な処理を施すのが常であったけれども、本発明では同一の導電体同士の接続になるのでそのような処理は必要がない。4層以上の多層配線基板についても同様に図2のプロセスを繰り返すことで得られる。
(実施例3)
図3(a)〜(e)は部品内蔵配線基板の実施例で、電子部品を内蔵する配線基板の製造工程を示す。図3(a)に示すように、内蔵部品321を埋め込んだ絶縁体シート301の表面に、剥離可能なシート310を貼り付ける。電子部品を絶縁体の中に内蔵するにはモールドしたり、コーティングしたり、薄い部品の場合には未硬化の樹脂シートの間に挟んで硬化させるなどいろいろの方法がある。
As in Example 1, the filling of the paste-like conductor can be repeated twice, the surface can be flattened by polishing, or the surface can be plated with copper. Of course, a via hole with a large aspect ratio is also the same conductor, so that a reliable one can be obtained. In the conventional method, when the electrode at the bottom of the via is a copper foil surface, it was usual to perform a scientific treatment before filling in order to obtain a stable connection and a high yield. Such a treatment is not necessary because the conductors are connected to each other. Similarly, a multilayer wiring board having four or more layers can be obtained by repeating the process of FIG.
(Example 3)
FIGS. 3A to 3E show an example of a wiring board with a built-in component, and shows a manufacturing process of the wiring board with a built-in electronic component. As shown in FIG. 3A, a peelable sheet 310 is attached to the surface of the insulator sheet 301 in which the built-in component 321 is embedded. There are various methods for embedding an electronic component in an insulator, such as molding or coating, and in the case of a thin component, it is cured by being sandwiched between uncured resin sheets.

図3(b)に示すように、剥離可能なシート310の表面からレーザで溝302や貫通ビア303あるいは内蔵部品の電極に届くビア穴304を作る。表面の剥離可能なシート310はレーザで加工した穴のあるシート311として残る。   As shown in FIG. 3B, a via hole 304 reaching the groove 302, the through via 303 or the electrode of the built-in component from the surface of the peelable sheet 310 is formed by a laser. The peelable sheet 310 on the surface remains as a sheet 311 having holes processed by a laser.

次に、図3(c)に示すように、ペースト状の導電体305をスキージ306で溝や貫通穴、ビア穴に刷り込んでペースト状の導電体のパターン307を得る。この時、剥離可能なシート311の表面にスキージで掻き取れずにペースト状の導電体の残留物312が残ることが多い。この残留物312は、図3(d)に示すように、剥離可能なシート311を剥ぎ取ることで容易に取り除くことができる。その後、ペースト状の導電体を硬化させて、図3(e)に示すように、硬化した導電体308が表面から少し飛び出した部品内蔵配線基板309を得る。   Next, as shown in FIG. 3C, the paste-like conductor 305 is imprinted into the grooves, through holes, and via holes with a squeegee 306 to obtain a paste-like conductor pattern 307. At this time, the paste-like conductor residue 312 often remains on the surface of the peelable sheet 311 without being scraped off with a squeegee. This residue 312 can be easily removed by peeling off the peelable sheet 311 as shown in FIG. Thereafter, the paste-like conductor is cured to obtain a component built-in wiring board 309 in which the cured conductor 308 slightly protrudes from the surface as shown in FIG.

電子部品は図ではLSIチップとして描いたがチップ容量やチップ抵抗、チップインダクターであってもよい。貫通ビア穴は必然ではない。半導体パッケージのように片面の配線だけでよい場合には背面の配線や貫通ビア穴はいらない、後述するように部品全体を絶縁体樹脂で包む必要もない。   Although the electronic component is depicted as an LSI chip in the figure, it may be a chip capacitor, a chip resistor, or a chip inductor. The through via hole is not inevitable. When only one side of the wiring is required as in a semiconductor package, no wiring on the back side or through via hole is required, and there is no need to wrap the entire part with an insulating resin as will be described later.

コンタクトビア穴でのペースト状の導電体とLSIチップ上のパッド322の電気的結合にはパッド322の表面を金などにしておくとよい。通常のLSIのパッドはAlであり表面が酸化している。この酸化膜を除去しないと良好な電気的結合が得られない。この問題を回避するためにAl電極の表面にNi/Auの変換(積層)をしておくと良い。この変換の方法は一般によく知られている。
(実施例4)
図4(a)〜(e)は電子部品を多層に内蔵する4層配線基板の製造方法の工程図を示す。図4(a)に示すように、実施例3で説明した部品内蔵の両面配線基板309を第一の配線基板とし、この上下面に更に部品421を内蔵した絶縁体シート401を積層し、更にその上に剥離できるシート410を貼り付ける。
For electrical connection between the paste-like conductor in the contact via hole and the pad 322 on the LSI chip, the surface of the pad 322 is preferably made of gold or the like. A normal LSI pad is Al, and the surface is oxidized. If this oxide film is not removed, good electrical coupling cannot be obtained. In order to avoid this problem, Ni / Au conversion (lamination) is preferably performed on the surface of the Al electrode. This conversion method is generally well known.
Example 4
4A to 4E show process diagrams of a manufacturing method of a four-layer wiring board in which electronic components are built in multiple layers. As shown in FIG. 4A, the double-sided wiring board 309 with built-in components described in the third embodiment is used as a first wiring board, and an insulator sheet 401 with further built-in parts 421 is laminated on the upper and lower surfaces. A peelable sheet 410 is attached thereon.

図4(b)に示すように、シート410の表面から溝402や貫通穴ビア403、内蔵部品421の電極422に届くビア穴404を作る。表面の剥離シート410はレーザで加工した穴のあるシート411として残る。   As shown in FIG. 4B, via holes 404 that reach the grooves 402, the through-hole vias 403, and the electrodes 422 of the built-in component 421 from the surface of the sheet 410 are formed. The release sheet 410 on the surface remains as a sheet 411 having holes processed by a laser.

図4(c)に示すように、ペースト状の導電体405をスキージ406で埋め込んでペースト状の導電体のパターン407を得る。この時、スキージで掻き取れずに表面に残るペースト状の導電体の残留物412は、図4(d)に示すように、剥離可能なシート411を剥離することにより容易に取り除ける。その後ペースト状の導電体を硬化させて、図4(e)に示すように、硬化した導電体408が表面から少し飛び出した部品内蔵多層配線基板409を得る。   As shown in FIG. 4C, a paste-like conductor 405 is embedded with a squeegee 406 to obtain a paste-like conductor pattern 407. At this time, the paste-like conductor residue 412 remaining on the surface without being scraped off by the squeegee can be easily removed by peeling the peelable sheet 411 as shown in FIG. Thereafter, the paste-like conductor is cured to obtain a component built-in multilayer wiring board 409 in which the cured conductor 408 slightly protrudes from the surface as shown in FIG.

この実施例ではコアーの部品内蔵両面配線基板の上下面に更に部品を内蔵した絶縁体シートを積層したが、部品を内蔵しない絶縁体シートを積層することも可能である。すなわち、部品内蔵層数が一層の部品内蔵多層配線基板ができる。   In this embodiment, the insulating sheet containing the components is further laminated on the upper and lower surfaces of the core-containing double-sided wiring board. However, it is also possible to laminate an insulating sheet that does not contain the components. That is, a component built-in multilayer wiring board having one component built-in layer can be formed.

部品内蔵基板の場合は部品の厚さのために貫通穴のアスペクト比が高くなるが、本発明ではエキシマレーザなどが利用できるので、微細で且つアスペクト比(厚み/穴径)が1以上の貫通穴接続も容易である。
(実施例5)
図5(a)〜(f)は実施例3の部品内蔵基板の製造方法の応用で半導体パッケージCSP(Chip Scale Package)の製造方法である。図5(a)に示すように、複数個の半導体回路を作ったシリコンウエファー521を内蔵する絶縁シート501に剥離可能なシート511を貼り付ける。この実施例ではシリコンウエファーには電極522の側に絶縁体があるだけで背面にはない。もちろん背面にも絶縁体があってもよい。
In the case of a component-embedded substrate, the aspect ratio of the through-hole is increased due to the thickness of the component. However, since an excimer laser or the like can be used in the present invention, the through-hole is fine and has an aspect ratio (thickness / hole diameter) of 1 or more. Hole connection is also easy.
(Example 5)
5A to 5F show a method for manufacturing a semiconductor package CSP (Chip Scale Package) as an application of the method for manufacturing a component-embedded substrate according to the third embodiment. As shown in FIG. 5A, a peelable sheet 511 is attached to an insulating sheet 501 containing a silicon wafer 521 having a plurality of semiconductor circuits. In this embodiment, the silicon wafer has an insulator on the electrode 522 side and not the back side. Of course, there may also be an insulator on the back.

図5(a)に示すように、剥離可能なシート511の表面からレーザなどを使って電極522に届くビア穴504と溝502を作る。溝502は、図5(f)に示すように、最終のCSPパッケージのバンプ(導電体)514になる導電体を形成するためのものである。ペースト状の導電体505をスキージ506で埋め込んでペースト状の導電体のパターン507を得る。図5(c)には、この時表面に残る残留物は描いてない。   As shown in FIG. 5A, via holes 504 and grooves 502 reaching the electrodes 522 are made from the surface of the peelable sheet 511 using a laser or the like. As shown in FIG. 5F, the groove 502 is for forming a conductor to be a bump (conductor) 514 of the final CSP package. A paste-like conductor 505 is embedded with a squeegee 506 to obtain a paste-like conductor pattern 507. In FIG. 5C, the residue remaining on the surface at this time is not drawn.

ペースト状の導電体を硬化させて、図5(d)に示すように、電極にバンプ(導電体)514つきのシリコンウエファー509を得る。図5(e)に示すように、これをカッター513で単位のチップに分割し、表面の剥離可能なシート511を剥離すればこのシート511の厚みによる出っ張りのあるバンプ514付きCSPパッケージ510が得られる。   The paste-like conductor is cured to obtain a silicon wafer 509 with bumps (conductors) 514 on the electrodes as shown in FIG. As shown in FIG. 5E, if this is divided into unit chips with a cutter 513 and the peelable sheet 511 on the surface is peeled off, a CSP package 510 with bumps 514 with protrusions depending on the thickness of the sheet 511 is obtained. It is done.

図5(d)に示す状態の後に、実施例2で説明したような多層配線を行いパッド電極の再配列を行うこともできる。バンプ514のマザーボードへの接合には導電性接着剤が好ましいけれど、半田付け等に適応するためにバンプ514にメッキすることも可能である。あるいは図5d)の後、剥離シートを剥離した後に銅箔を貼り付けてペースト状の導電体を硬化させ、化学エッチングにより銅箔を電極の形に形成することも可能である。図5においてペースト状の導電体を硬化させずにチップに分割し、実装現場で剥離シート511を剥離し、マザーボードに搭載し、ペースト状の導電体を硬化させる等の低コストなCSPパッケージも可能である。   After the state shown in FIG. 5D, the multilayer wiring as described in the second embodiment can be performed to rearrange the pad electrodes. A conductive adhesive is preferable for bonding the bumps 514 to the mother board, but the bumps 514 can be plated to adapt to soldering or the like. Or after FIG. 5 d), after peeling a peeling sheet, a copper foil can be affixed and a paste-form conductor can be hardened, and a copper foil can be formed in the shape of an electrode by chemical etching. In FIG. 5, a low-cost CSP package is possible, such as dividing the paste-like conductor into chips without curing, peeling the release sheet 511 on the mounting site, mounting it on the motherboard, and curing the paste-like conductor. It is.

以上、本発明を実施例をあげて説明したが、他にも多くの変形が考えられる。剥離シートを付けた絶縁体シートに溝や貫通ビア穴を作りこれにペースト状の導電体を埋め込んで絶縁体シートを剥離して配線基板やパッケージを作る限り本発明から逸脱するものではない。   Although the present invention has been described with reference to the embodiments, many other modifications are conceivable. It does not deviate from the present invention as long as a groove or a through via hole is formed in an insulating sheet with a release sheet, a paste-like conductor is embedded in the insulating sheet, and the insulating sheet is peeled to form a wiring board or package.

本発明の実施の形態における実施例1を示す両面配線基板の製造方法の工程図Process drawing of the manufacturing method of the double-sided wiring board which shows Example 1 in embodiment of this invention 本発明の実施の形態における実施例2を示す4層配線基板の製造方法の工程図Process drawing of the manufacturing method of the four-layer wiring board which shows Example 2 in embodiment of this invention 本発明の実施の形態における実施例3を示す部品を内蔵する配線基板の製造方法の工程図Process drawing of the manufacturing method of the wiring board which incorporates components which show Example 3 in embodiment of this invention 本発明の実施の形態における実施例4を示す電子部品を多層に内蔵する4層配線基板の製造方法の工程図Process drawing of the manufacturing method of the 4-layer wiring board which incorporates the electronic component which shows Example 4 in embodiment of this invention in multiple layers 本発明の実施の形態における実施例5を示すCSPの製造方法の工程図Process drawing of the manufacturing method of CSP which shows Example 5 in embodiment of this invention

符号の説明Explanation of symbols

101 絶縁体
102 溝
103 貫通ビア穴
104 構造体
105 ペースト状の導電体
106 スキージ
107 埋め込まれたペースト状の導電体
108 硬化した導電体
109 両面配線基板
110 剥離可能なシート
111 加工されて穴の開いた剥離可能なシート
112 ペースト状の導電体の残渣
DESCRIPTION OF SYMBOLS 101 Insulator 102 Groove 103 Through-via hole 104 Structure 105 Paste-like conductor 106 Squeegee 107 Embedded paste-like conductor 108 Cured conductor 109 Double-sided wiring board 110 Peelable sheet 111 Processed and opened a hole Removable sheet 112 Residue of paste-like conductor

Claims (13)

少なくとも表面に剥離可能なシートを設けた絶縁体シートに溝又は貫通ビア穴を作る工程と、溝又は貫通ビア穴にペースト状の導電体を埋め込む工程と、該剥離可能なシートを剥離する工程とからなることを特徴とする配線基板の製造方法。 A step of forming a groove or a through via hole in an insulator sheet provided with a peelable sheet on at least a surface, a step of embedding a paste-like conductor in the groove or the through via hole, and a step of peeling the peelable sheet A method for manufacturing a wiring board, comprising: 溝深さ:溝幅のアスペクト比が1より大きい溝を含むことを特徴とする請求項1に記載の配線基板の製造方法。 The method for manufacturing a wiring board according to claim 1, wherein a groove depth: a groove having an aspect ratio of groove width greater than 1 is included. 溝又は貫通ビア穴をレーザで作ることを特徴とする請求項1または2に記載の配線基板の製造方法。 The method for manufacturing a wiring board according to claim 1, wherein the groove or the through via hole is formed by a laser. 少なくとも表面に剥離可能なシートを設けた絶縁体シートに溝又は貫通ビア穴を作る工程と、溝又は貫通ビア穴にペースト状の導電体を埋め込む工程と、該剥離可能なシートを剥離する工程とにおいて第一の配線基板を製造し、この第一の配線基板の両面あるいは片面に、表面に剥離可能なシートを設けた新たな絶縁体シートを積層接着する工程と、その表面に溝又は第一の配線基板の導電体に届くビア穴を作る工程と、該溝又はビア穴にペースト状の導電体を埋め込む工程と、該剥離可能なシートを剥離する工程とを必要に応じて繰り返し施すことを特徴とする多層基板の製造方法。 A step of forming a groove or a through via hole in an insulator sheet provided with a peelable sheet on at least a surface, a step of embedding a paste-like conductor in the groove or the through via hole, and a step of peeling the peelable sheet Manufacturing a first wiring board and laminating and bonding a new insulator sheet provided with a peelable sheet on both sides or one side of the first wiring board, and grooves or first on the surface. A step of forming a via hole reaching the conductor of the wiring board, a step of embedding a paste-like conductor in the groove or via hole, and a step of peeling the peelable sheet are repeated as necessary. A method for producing a multilayer substrate, which is characterized. 溝深さ:溝幅のアスペクト比が1より大きい溝を含むことを特徴とする請求項4に記載の多層基板の製造方法。 5. The method for producing a multilayer substrate according to claim 4, wherein a groove depth: a groove having an aspect ratio of groove width larger than 1 is included. 積層した新たな絶縁体シートに溝又は下層の導電体に届くビア穴をレーザで作ることを特徴とする請求項4又は5に記載の多層基板の製造方法。 6. The method of manufacturing a multi-layer substrate according to claim 4, wherein a via hole reaching a groove or a lower conductor is formed by laser in a new laminated insulating sheet. 少なくとも電子部品を埋め込み表面に剥離可能なシートを設けた絶縁体シートに、溝又は貫通ビア穴並びに表面から電子部品の電極に届くビア穴を作る工程と、溝又は貫通ビア穴並びにビア穴にペースト状の導電体を埋め込む工程と、該剥離可能なシートを剥離する工程とからなることを特徴とする部品内蔵基板の製造方法。 At least a step of making a groove or a through-via hole and a via hole reaching the electrode of the electronic component from the surface and a paste in the groove or the through-via hole and the via hole in an insulating sheet provided with a sheet that can be embedded and peeled off on the surface. A component-embedded substrate manufacturing method comprising a step of embedding a conductive material and a step of peeling the peelable sheet. 溝深さ:溝幅のアスペクト比が1より大きい溝を含むことを特徴とする請求項7に記載の部品内蔵基板の製造方法。 The method for manufacturing a component-embedded substrate according to claim 7, comprising grooves having an aspect ratio of groove depth: groove width greater than 1. 9. 溝又はビア穴をレーザで作ることを特徴とする請求項7又は8に記載の部品内蔵基板の製造方法。 9. The method for manufacturing a component-embedded board according to claim 7, wherein the groove or the via hole is formed by a laser. 少なくとも電子部品を埋め込み表面に剥離可能なシートを設けた絶縁体シートに、溝又は貫通ビア穴並びに表面から電子部品の電極に届くビア穴を作る工程と、溝又は貫通ビア穴並びにビア穴にペースト状の導電体を埋め込む工程と、該剥離可能なシートを剥離する工程とにおいて第一の配線基板を製造し、この第一の配線基板の両面あるいは片面に、表面に剥離可能なシートを設けた新たな絶縁体シートあるいは表面に剥離可能なシートを設けた電子部品を埋め込んだ絶縁体シートを積層接着する工程と、その表面に溝又は第一の配線基板の導電体に届くビア穴並びに表面から電子部品の電極に届くビア穴を作る工程と、該溝やビア穴にペースト状の導電体を埋め込む工程と、該剥離可能なシートを剥離する工程とを必要に応じて繰り返し施すことを特徴とする部品内蔵多層基板の製造方法。 At least a step of making a groove or a through-via hole and a via hole reaching the electrode of the electronic component from the surface and a paste in the groove or the through-via hole and the via hole in an insulating sheet provided with a sheet that can be embedded and peeled off on the surface. The first wiring board was manufactured in the step of embedding the conductive material and the step of peeling off the peelable sheet, and a peelable sheet was provided on both surfaces or one surface of the first wiring board. A process of laminating and bonding a new insulator sheet or an insulator sheet embedded with an electronic component provided with a peelable sheet on the surface, and a via hole reaching the groove or the conductor of the first wiring board on the surface and the surface Repeating the process of creating via holes reaching the electrodes of the electronic component, embedding paste-like conductors in the grooves and via holes, and peeling the peelable sheet as necessary Method for manufacturing a component-embedded multilayer substrate according to claim Succoth. 溝深さ:溝幅のアスペクト比が1より大きい溝を含むことを特徴とする請求項10に記載の部品内蔵多層基板の製造方法。 The method for producing a multilayer board with built-in components according to claim 10, comprising grooves having an aspect ratio of groove depth: groove width greater than 1. 11. 溝又はビア穴をレーザで作ることを特徴とする請求項10又は11に記載の部品内蔵多層基板の製造方法。 The method for producing a multilayer board with built-in components according to claim 10 or 11, wherein the groove or the via hole is formed by a laser. 少なくとも回路を形成したシリコンウエファーを埋め込み表面に剥離可能なシートを設けた絶縁体シートに、表面から溝又はシリコンウエファーの電極に届くビア穴を作る工程と、溝又はビア穴にペースト状の導電体を埋め込む工程と、絶縁体シートをチップ毎に分離する工程とからなることを特徴とするチップサイズパッケージの製造方法。 A step of forming a via hole reaching the groove or the electrode of the silicon wafer from the surface in an insulator sheet provided with a sheet on which at least a silicon wafer in which a circuit is formed is embedded and peeled off on the surface; and a paste-like conductor in the groove or via hole A method of manufacturing a chip size package, comprising: a step of embedding a semiconductor substrate; and a step of separating an insulator sheet for each chip.
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JP2011528502A (en) * 2008-07-15 2011-11-17 ネーデルランツ オルガニサティー フォール トゥーゲパストナトゥールヴェテンシャッペリーク オンデルズーク テーエンオー Method for forming high-density structure
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US8262917B2 (en) 2007-07-10 2012-09-11 Samsung Electro-Mechanics Co., Ltd. Fabricating method for multilayer printed circuit board
US8574444B2 (en) 2007-07-10 2013-11-05 Samsung Electro-Mechanics Co., Ltd. Fabricating method for multilayer printed circuit board
JP2011528502A (en) * 2008-07-15 2011-11-17 ネーデルランツ オルガニサティー フォール トゥーゲパストナトゥールヴェテンシャッペリーク オンデルズーク テーエンオー Method for forming high-density structure
JP2020035896A (en) * 2018-08-30 2020-03-05 日亜化学工業株式会社 Method of manufacturing wiring board and wiring board
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