JP2006058336A - Method for manufacturing electro-optical device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an electro-optical device for preventing display failure due to dropping of a color layer by improving the adhesiveness between a metal film and a color layer. <P>SOLUTION: The method for manufacturing an electro-optical device comprising a substrate having a patterned metal film and a color layer layered on the patterned metal film and an electro-optical material held by the substrate includes steps of: depositing at least one metal material in chromium, tantalum and tungsten on the substrate; forming a patterned metal film by etching the metal material through a resist material patterned into a predetermined figure; stripping the resist material on the patterned metal film by using concentrated sulfuric acid; heat treating the substrate having the patterned metal film at 80 to 250°C; and forming a color layer on the substrate including the metal film. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a method for manufacturing an electro-optical device. In particular, a method of manufacturing an electro-optical device capable of preventing the occurrence of display defects due to lack of a colored layer by improving the adhesion between a metal film made of an inorganic material such as a light shielding film and a colored layer made of an organic material About.

  Conventionally, there is a color liquid crystal display device as a liquid crystal display device which is an embodiment of an electro-optical device. In such a color liquid crystal display device, a plurality of pixels arranged in a dot matrix are formed by planarly overlapping a plurality of electrodes formed on both of a pair of opposed substrates. Then, by selectively turning on and off the voltage applied to each pixel, light passing through the liquid crystal material in the pixel region is modulated to display an image such as an image or a character.

Here, in order to make a displayed image color display, RGB colored layers made of an organic material are formed on any of the substrates constituting the liquid crystal display device, corresponding to the pixel regions.
In addition, a light-shielding film made of an inorganic metal material such as chromium is formed in the inter-pixel region on the substrate on which the colored layer is formed in order to prevent color mixing between adjacent pixels in order to improve the contrast of image display. May be. Furthermore, in order to suppress power consumption to a low level, a light reflection film made of a metal material such as aluminum may be formed in order to enable partial or full reflection display.
When the colored layer is laminated so as to be in direct contact with these light-shielding film and light reflecting film due to the structure of the substrate, the adhesion between the metal film made of these inorganic materials and the colored layer made of the organic material Since the property is relatively low, the colored layer may be lost, such as burrs or peeling. In such a case, there is a problem that a short circuit occurs between the metal film such as a light-shielding film or a light reflecting film and the transparent electrode laminated on the colored layer through the missing portion.

In order to solve such a problem, a color filter for a liquid crystal display device has been proposed in which the driving of the liquid crystal material is not hindered even if a short circuit occurs due to a missing portion of the colored layer. ing.
More specifically, as shown in FIG. 11, on a substrate 611, at least a light reflection film 612 of a metal thin film, a colored layer 613 regularly arranged in a linear pattern or a rectangular pattern, and the like, and a transparent electrode 615 In the reflective liquid crystal display color filter formed by stacking in this order, at least the light reflection film 612 of the metal thin film is patterned as a rectangular pattern, and the light reflection films 612 are electrically independent from each other. A color filter for a reflective liquid crystal display device is disclosed (see, for example, Patent Document 1).

As a method for forming a light reflecting film or the like in a method for manufacturing a liquid crystal display device, photolithography using a resist material soluble in an alkaline solution is frequently used.
More specifically, as shown in FIG. 12, after forming the transparent conductive layer 703 on the substrate 701 on which the light reflecting film 702 is formed on the entire surface, the second resist layer 704 is used as a mask pattern with the predetermined resist layer 704 as a mask pattern. The transparent conductive layer 703 is patterned using an iron hydrochloric acid solution or the like. Next, a method is disclosed in which the predetermined resist layer 704 and the patterned transparent conductive layer 703 are used as a mask pattern to pattern the light reflecting film 702 using an alkaline solution having a predetermined concentration and simultaneously peel the predetermined resist layer 704. Yes.
JP-A-6-230364 (Claims, FIG. 1 etc.) JP 2001-91942 A (Claims, FIG. 1 etc.)

However, the color filter described in Patent Document 1 does not hinder liquid crystal driving even when a short circuit occurs between a transparent electrode and a metal film such as a light reflecting film due to a lack of a colored layer. No attempt was made to prevent the missing color layer itself. Therefore, for example, when a missing color layer occurs in a portion where adjacent pixel regions overlap, the light that has passed through the overlapping portion is not colored, so that the recognizability and contrast of color image display are reduced. The problem of doing was seen.
In addition, when the method for manufacturing a liquid crystal display device described in Patent Document 2 is used, a predetermined etching characteristic must be exhibited in alkali development, and the type of metal constituting the light reflection film or the like is excessive. The problem of being restricted to Further, in the case of alkali development, not only a thin film metal such as aluminum tends to remain, but also a residual phenomenon of the resist layer was observed. Therefore, due to these residues, there has been a problem that the recognizability of color image display in the liquid crystal display device and the contrast property are liable to deteriorate.

Accordingly, the inventors of the present invention diligently tried to remove the resist material using concentrated sulfuric acid in a method of manufacturing an electro-optical device such as a liquid crystal display device, and then heat-treated the patterned metal film, thereby increasing the concentration. Sulfuric acid can sufficiently remove resist material and metal film residues, promote passivation on the surface of the metal film, and provide excellent adhesion even when a colored layer is formed on it. And the present invention has been completed.
That is, according to the present invention, in the method of manufacturing an electro-optical device, the recognizability of color image display due to the lack of a colored layer is improved by improving the adhesion between the metal film including a passivated portion on the surface and the colored layer. Another object of the present invention is to provide a method of manufacturing an electro-optical device that can prevent the occurrence of display defects.

According to the present invention, there is provided a method for manufacturing an electro-optical device comprising a substrate including a patterned metal film and a colored layer laminated on the metal film, and an electro-optical material held by the substrate. And a step of laminating at least one metal material of chromium, tantalum and tungsten on the substrate, and etching the metal material through a resist material patterned into a predetermined shape, thereby patterning the metal film , A step of peeling the resist material on the patterned metal film using concentrated sulfuric acid, and a heat treatment of the substrate on which the patterned metal film is formed at a temperature in the range of 80 to 250 ° C. And a process for forming a colored layer on a substrate including a metal film. It is possible to solve the problem.
That is, by removing the resist material laminated on the patterned metal film using concentrated sulfuric acid, it is possible to sufficiently remove the residue of the resist material and the metal film, and after removing the resist material, By heat-treating the patterned metal film at a predetermined temperature, passivation on the surface of the patterned metal film can be promoted. Therefore, the resist material can be reliably stripped, and even when the colored layer is formed after the resist material is stripped, the surface between the metal film including the passivated portion and the colored layer Excellent adhesion can be obtained, and it is possible to effectively prevent the deterioration of the recognizability of color image display and the occurrence of display defects due to the lack of the colored layer.
In the present invention, the concentrated sulfuric acid means sulfuric acid having a concentration of 80% or more, more preferably sulfuric acid having a concentration of 98% or more. The sulfuric acid is reduced to the value of

In carrying out the electro-optical device manufacturing method of the present invention, it is preferable to set the heat treatment time within a range of 5 to 45 minutes.
By carrying out in this way, an oxide film as a passivation can be efficiently and reliably formed on the metal film, and the adhesion between the metal film and the colored layer can be effectively improved.

In carrying out the method of manufacturing the electro-optical device according to the present invention, the patterned metal film is preferably a light-shielding film, a light reflecting film, or an electrode.
By carrying out in this way, it is possible to realize image display excellent in contrast and visibility in reflective display while effectively preventing display failure due to missing colored layers.

In carrying out the method for manufacturing the electro-optical device of the present invention, it is preferable to apply hexamethyldisilazane (HMDS) to the surface of the patterned metal film.
By carrying out in this way, the adhesion between the metal film and the colored layer can be further improved.

In carrying out the method of manufacturing the electro-optical device of the present invention, it is preferable that the thickness of the patterned metal film is set to a value in the range of 1 to 5 μm.
By carrying out in this way, it is possible to effectively prevent a missing portion from being formed in a part of the metal film due to the concentrated sulfuric acid used for the etching treatment liquid or resist stripping, and the light shielding property in the inter-pixel region and the reflection region can be prevented. Can be secured.

In carrying out the method of manufacturing the electro-optical device of the present invention, it is preferable that the concentration of concentrated sulfuric acid is 80% or more.
By carrying out in this way, it is possible to prevent the metal film from being dissolved by concentrated sulfuric acid. That is, in dilute sulfuric acid having a concentration of less than 80%, a metal film such as chromium may be dissolved, but by using such concentrated sulfuric acid, oxidation can be performed without dissolving chromium or the like.

In carrying out the method of manufacturing the electro-optical device of the present invention, when removing the resist material using concentrated sulfuric acid, the substrate on which the resist material is laminated is immersed in concentrated sulfuric acid, or concentrated sulfuric acid is showered. It is preferable to do.
By carrying out in this way, the resist material on the metal film can be easily peeled off, and other foreign matters can also be reliably removed.

In carrying out the method for manufacturing the electro-optical device of the present invention, it is preferable to apply vibration when the resist material is peeled off using concentrated sulfuric acid.
By carrying out in this way, the resist material and other foreign matters on the metal film can be rapidly peeled off or removed.

  Embodiments relating to a method of manufacturing an electro-optical device according to the invention will be specifically described below with reference to the drawings. However, this embodiment shows one aspect of the present invention and does not limit the present invention, and can be arbitrarily changed within the scope of the present invention.

As shown in the flow of FIG. 1, the present embodiment includes a substrate including a patterned metal film and a colored layer laminated on the metal film, and an electro-optic material held by the substrate. A method for manufacturing an electro-optical device, comprising:
Laminating at least one metal material of chromium, tantalum and tungsten on a substrate;
Forming a patterned metal film by etching a metal material through a resist material patterned into a predetermined shape;
Removing the resist material on the patterned metal film using concentrated sulfuric acid;
A step of heat-treating the substrate on which the patterned metal film is formed at a temperature in the range of 80 to 250 ° C .;
Forming a colored layer on a substrate including a metal film;
A method for manufacturing an electro-optical device.
1 to 10, a first substrate (color filter substrate) 30 having a light shielding film (metal film) 39 and a colored layer 37 and a second substrate (element substrate) 60 were provided. A method for manufacturing a liquid crystal display device, in which the adhesion between the light shielding film 39 and the colored layer 37 is improved, will be described as an example.
The electro-optical device of the present invention is an active matrix type liquid crystal display device having a TFD element (Thin Film Diode) or a TFT element (Thin Film Transistor), or a passive matrix type liquid crystal display device. It can be applied even if it exists.

1. Overall Outline and Manufacturing Process of First Substrate First, an overall outline and a manufacturing process of a first substrate (sometimes referred to as a color filter substrate) constituting a part of the liquid crystal display device will be described.

(1) Overall Overview As an example, as shown in FIG. 2, the first substrate 30 includes a light shielding film 39, a colored layer 37, a surface protective layer 41, and a first electrode on a transparent substrate 31 such as a glass substrate. 33 and a first alignment film 45 are sequentially stacked.
When the electro-optical device according to this embodiment is, for example, an active matrix type liquid crystal display device including a TFD element, the first electrode 33 means a scanning electrode.
According to the present invention, the adhesion between the colored film 37 and the metal film such as the light-shielding film 39 can be improved, so that the loss of the colored layer 37 is prevented and the display characteristics of the image are improved. Can do.

(2) Metal Material Application Step First, as shown in FIG. 3A, a metal material 39X made of at least one of chromium, tantalum and tungsten is sputtered on the entire surface of the first glass substrate 31. Laminate by the method.
At this time, the metal material 39X is preferably laminated so that the thickness of the metal material 39X is in the range of 1 to 5 μm. The reason for this is that when the thickness of the metal material 39X is less than 1 μm, the light shielding property cannot be secured and the contrast is lowered, or when the resist material is peeled off using concentrated sulfuric acid in the subsequent process, the metal material This is because a missing portion may occur in the (light shielding film) 39. On the other hand, if the thickness of the metal material 39X exceeds 5 μm, the substrate surface may not be flattened, resulting in uneven display and it may be difficult to reduce the thickness of the liquid crystal display device. It is.

(3) Resist Material Application and Metal Material Etching Process Next, a resist material is applied over the entire surface of the metal material 39X laminated on the first glass substrate 31, and through a predetermined pattern mask. After the exposure, development is performed to pattern the resist material 125 so as to match the shape of the light shielding film 39 to be formed, as shown in FIG.
Next, as shown in FIG. 3C, the light shielding film 39 made of a metal film patterned into a predetermined shape is formed by etching the metal material 39X in a portion not covered with the resist material 125.
Here, the etching treatment of the metal material 39X can be appropriately performed by a wet etching method using a hydrofluoric acid solution, a fluorinated sulfuric acid solution, or the like, or a dry etching method using an etching gas such as O ₂ or CF _4. .

(4) Resist Stripping Step Next, as shown in FIG. 3D, the resist material 125 on the patterned light shielding film 39 is stripped using concentrated sulfuric acid 90. That is, by using concentrated sulfuric acid 90 to strip the resist material 125, it can be efficiently decomposed and stripped, and foreign substances such as metal material residues adhering to the first glass substrate 31 can be easily removed. Can be removed.
The concentrated sulfuric acid 90 is preferably sulfuric acid having a concentration of 80% or more. The reason for this is that sulfuric acid having a high concentration does not contain much water and cannot be ionized, and thus shows weak acidity and does not dissolve the light shielding film 39. On the other hand, when dilute sulfuric acid having a concentration of less than 80% and showing strong acidity is used, for example, when chromium is used as the metal material 39X, the chromium is dissolved, and the light shielding film 39 has a missing portion. This is because it may occur.
Accordingly, the concentrated sulfuric acid 90 used for resist stripping is more preferably sulfuric acid having a concentration of 90% or more, and further preferably concentrated sulfuric acid having a concentration of 96% or more.

Here, with reference to FIGS. 5A and 5B, the effect of the concentration of sulfuric acid used for resist stripping on resist stripping property and the adhesion between the heat-treated metal film and the colored layer will be described later. explain. In FIG. 5A, the horizontal axis indicates the sulfuric acid concentration (%), and the vertical axis indicates the resist peelability (relative value). In FIG. 5B, the horizontal axis indicates the sulfuric acid concentration (%), and the vertical axis indicates the adhesion (relative value) between the metal film and the colored layer.
From FIGS. 5 (a) and 5 (b), when the concentration of sulfuric acid used for resist stripping is 80% or more, a predetermined resist stripping property is exhibited, and as the sulfuric acid concentration increases, the metal film and the colored layer It can be understood that the adhesion with the gradual improvement.

In removing the resist material 125, it is preferable to immerse the first glass substrate 31 on which the light shielding film 39 and the resist material 125 are laminated in concentrated sulfuric acid 90, as shown in FIG.
The reason for this is that the concentrated sulfuric acid 90 can be reliably brought into contact with the resist material 39 to efficiently peel the resist material 39, and the foreign matter adhering to the entire first glass substrate 31 can be removed. This is because it can be done.
In addition, when the resist material 125 is peeled off by immersing the first glass substrate 31 in the concentrated sulfuric acid 90, the ultrasonic vibration is applied to the first glass substrate 31 or the concentrated sulfuric acid 90. It is preferable to do. This is because the resist material 125 can be peeled off and the efficiency of removing foreign matters can be significantly improved.

On the other hand, when the resist material 125 is peeled off, the first glass substrate 31 on which the resist material 125 or the like is laminated is preferably shower-washed with concentrated sulfuric acid 90 as shown in FIG.
This is because the concentrated sulfuric acid 90 can be brought into contact with the resist material 125 while applying a predetermined pressure, so that the resist material 125 can be efficiently peeled off.
In addition, when the resist material 125 is peeled off by shower-washing the first glass substrate 31 with concentrated sulfuric acid 90, the ultrasonic vibration is applied to the first glass substrate 31. It is preferable.
This is because the resist material 125 peeling and foreign matter removal efficiency can be significantly improved.

(5) Heat Treatment Step Next, as shown in FIG. 4A, the first glass substrate 31 on which the light shielding film 39 made of a patterned metal film is formed is heat treated. That is, when the concentrated sulfuric acid 90 used to peel the resist material 125 is heat-treated while adhering to the light-shielding film 39, the concentrated sulfuric acid 90 is heated and exhibits an oxidizing action, and FIG. As shown in FIG. 3, the passivation film 39a can be formed on the surface of the light shielding film 39 entirely or partially. Therefore, even when the surface state of the light shielding film 39 is modified and the colored layer 37 made of an organic material is formed on the light shielding film 39 made of an inorganic material, the adhesion can be remarkably improved. Therefore, it is possible to effectively prevent the occurrence of display defects in the liquid crystal display device or the like by effectively preventing the colored layer from being blurred or peeled off.

Moreover, it is preferable to make heat processing temperature into the value within the range of 80-250 degreeC. This is because when the heat treatment temperature is less than 80 ° C., the surface of the light shielding film is not sufficiently oxidized, and the effect may not be exhibited. On the other hand, if the heat treatment temperature exceeds 250 ° C., the light shielding film 39 may be dissolved.
Therefore, the heat treatment temperature is more preferably set to a value within the range of 100 to 230 ° C, and further preferably set to a value within the range of 120 to 210 ° C.
Here, FIG. 7 shows the relationship between the heat treatment temperature and the adhesion between the heat-treated metal film and the colored layer. In FIG. 7, the horizontal axis indicates the heat treatment temperature (° C.), and the vertical axis indicates the adhesion (relative value) between the metal film and the colored layer. From FIG. 7, by setting the heat treatment temperature to 80 ° C. or higher, adhesion between the predetermined metal film and the colored layer can be obtained, and in particular, when the temperature exceeds about 150 ° C., the adhesion is rapidly improved. Can understand.
Such a heat treatment process also serves as a drying process for the first glass substrate 31.

Moreover, it is preferable to make heat processing time into the range for 5-45 minutes.
This is because if the heat treatment time is less than 5 minutes, the surface of the light shielding film 39 may not be sufficiently oxidized. On the other hand, if the heat treatment time exceeds 45 minutes, the light shielding film 39 is excessively oxidized, and a missing portion may be generated.
Therefore, the heat treatment time is more preferably set to a value within the range of 10 to 35 minutes, and further preferably set to a value within the range of 15 to 30 minutes.

(6) HMDS Application Step Next, as a subsequent step of the resist stripping step, it is preferable to apply hexamethyldisilazane (HMDS) 91 to the surface of the light shielding film 39 as shown in FIG.
This is because the wettability of the surface of the light-shielding film 39 made of an inorganic material can be improved, and the adhesion with the colored layer made of an organic material can be further improved.
In addition, as a coating method of the hexamethyldisilazane 91, nozzle spraying, brush coating, or the like can be appropriately employed.

(7) Colored Layer Forming Step Next, as shown in FIG. 4D, a colored layer 37 is formed on the substrate so as to partially overlap the light shielding film 39. That is, it is for coloring the light that is visible through the pixel region, and for preventing a decrease in contrast due to the formation of a gap between the light-shielding film 39 and the colored layer 37 and viewing the light that is not colored. .
The colored layer 37 has a predetermined color pattern by applying a colored resist made of a photosensitive resin containing a coloring material such as a pigment or a dye on the surface of the substrate, and removing unnecessary portions by photolithography. Can be formed. And when forming the colored layer of a some color tone, the said process is repeated.
In addition, a stripe arrangement is often used as the arrangement pattern of the colored layers, but various pattern shapes such as an oblique mosaic arrangement and a delta arrangement can be adopted in addition to the stripe arrangement.

The colored layer 37 usually has a predetermined color tone by dispersing a coloring material such as an organic pigment or a dye in a transparent resin. An example of the color tone of the colored layer is a primary color filter composed of a combination of three colors R (red), G (green), and B (blue), but is not limited to this. ), M (magenta), C (cyan), etc., and other various color tones.
In the electro-optical device manufacturing method of the present invention, since the oxide film 39a is formed on the surface of the light shielding film 39 and the surface state is modified, the colored layer 37 made of an organic material and the inorganic metal material Adhesion with the light shielding film 39 made of is improved. Therefore, it is possible to effectively prevent the occurrence of display defects such as color loss due to scratches or peeling of the colored layer 37.

(8) Formation of surface protective layer and first electrode Next, the entire surface of the first substrate 30 is made of an electrically insulating resin such as an acrylic resin, an epoxy resin, an imide resin, or a fluororesin. The translucent resin layer to be applied is applied using a known spin coating method, printing method, or the like, and is patterned by a photolithography method to form the surface protective layer 41 limited to the display region A.
Next, a first electrode patterned into a predetermined shape is formed by a photolithography method using a transparent conductive material such as ITO (indium tin oxide), and an alignment film 45 is formed using a polyimide resin or the like. By forming the first substrate 30, the first substrate 30 can be manufactured.

2. Manufacturing Process of Second Substrate Next, a manufacturing process of a second substrate (sometimes referred to as an element substrate or a counter substrate) that constitutes a part of the liquid crystal display device will be described.
As an example, as shown in FIG. 2, the second substrate 60 includes a second electrode (not shown), a switching element (not shown), an electric field in a display area A in a transparent substrate 61 such as a glass substrate. A wiring 65, a surface protective layer (not shown), a second alignment film 75, and the like are formed. When the electro-optical device according to this embodiment is, for example, an active matrix type liquid crystal display device including a TFD element, the second electrode is a pixel electrode, the switching element is a TFD element, Means a data line, respectively.

First, as shown in FIGS. 8A to 8B, a first metal film 71 ′ is formed on the glass substrate 61 of the second substrate. The first metal film 71 ′ is made of, for example, tantalum and can be formed using a sputtering method or an electron beam evaporation method.
In addition, the adhesion of the first metal film 71 ′ to the second glass substrate 61 can be remarkably improved before the first metal film 71 ′ is formed. It is also preferable to form an insulating film made of tantalum oxide (Ta ₂ O ₅ ) or the like on the second glass substrate 61 because the diffusion of impurities into the metal film 71 ′ can be efficiently suppressed.

  Next, as shown in FIG. 8C, an oxide film 72 is formed by oxidizing the surface of the first metal film 71 ′ by an anodic oxidation method. More specifically, after immersing the glass substrate 61 on which the first metal film 71 ′ is formed in an electrolytic solution such as a citric acid solution, between the electrolytic solution and the first metal film 71 ′. A predetermined voltage can be applied to the surface to oxidize the surface of the first metal film 71 '. Thereafter, the first metal film 71 ′ on which the oxide film 72 is formed can be patterned by etching to form the element first electrode 71.

Next, again, a second metal film is formed on the entire surface of the element first electrode 71 by sputtering or the like, and is patterned by etching. As shown in FIG. Element second electrodes 73 and 74 and electric wiring (data line) 65 are formed.
Next, after forming a transparent conductive layer made of a transparent conductive material such as ITO (indium tin oxide or the like) by sputtering or the like, and then patterning by photolithography or the like, as shown in FIG. Then, the pixel electrode 63 is formed.
Further, a second substrate is manufactured by forming a surface protective layer made of an insulating material and an alignment film made of polyimide resin or the like on the device electrodes 73 and 74, the data line 65, and the pixel electrode 63. Can do.

3. Bonding Step Next, a step of bonding the first substrate and the second substrate to form a liquid crystal display device will be described.
For example, this bonding step is performed by applying the sealing material 23 mainly composed of an epoxy resin or the like on the second substrate 60 by patterning so as to surround the display area A by screen printing or a dispenser. be able to. Moreover, as the sealing material 23 used for this bonding process, a thermosetting adhesive can be used, for example.
Next, after the first substrate 30 and the second substrate 60 are aligned in a plane, the cell structure is assembled and formed by pressure bonding and bonding.

4). Subsequent Step Next, although not shown in the drawing, a liquid crystal material is injected into the space formed by the first substrate 30 and the second substrate 60 and into the inner portion of the sealing material 23, and then sealed with a sealing material or the like Seal.
Furthermore, a liquid crystal display device can be manufactured by disposing a predetermined polarizing plate on the outer surface of each of the first substrate 30 and the second substrate 60 and incorporating it in a housing together with a backlight or the like.

5. Other Application Examples As shown in FIG. 9, the method for manufacturing an electro-optical device according to the present invention includes a light reflection film 35, a light shielding film on a transparent substrate 31 such as a glass substrate instead of the first substrate 30 described above. Also when manufacturing the electro-optical device 11 having a reflective function, which includes the first substrate 30 configured by sequentially laminating the film 39, the colored layer 37, the surface protective layer 41, the first electrode 33, and the like. Can be applied.
That is, a metal film is formed using at least one of chromium, tantalum, and tungsten, and a patterned light reflecting film 35 is formed by performing an etching process through a resist material patterned in a predetermined shape. To do. Next, after removing the resist material using concentrated sulfuric acid, the substrate on which the light reflecting film 35 is formed is heat-treated at a temperature in the range of 80 to 250 ° C.
By carrying out in this way, it is possible to improve the adhesion between the metal film as the light reflection film 35 and the colored layer 37 laminated thereon, so that the loss of the colored layer 37 is prevented, Image display characteristics can be improved.

Further, as shown in FIG. 10, the method for manufacturing the electro-optical device according to the present invention has a light reflection film 35, a surface protective layer 41, a first electrode 33, a first electrode on a transparent substrate 31 such as a glass substrate. In the display area A of the first substrate 30 configured by sequentially laminating the alignment films 45 and the transparent substrate 61 such as a glass substrate, the electric wiring 65, the switching element 69, the second electrode 63, the coloring layer 78, The present invention can also be applied when manufacturing the electro-optical device 12 including the second substrate 60 formed by forming the surface protective layer 76, the second alignment film 75, and the like.
That is, a metal film is formed using at least one of chromium, tantalum, and tungsten, and the patterned second electrode 63 is formed by performing an etching process through a resist material patterned into a predetermined shape. Form. Next, after removing the resist material using concentrated sulfuric acid, the substrate on which the second electrode 63 is formed is heat-treated at a temperature in the range of 80 to 250 ° C.
By carrying out in this way, the adhesion between the metal film as the second electrode 63 and the colored layer 78 laminated thereon can be improved. The display characteristics of the image can be improved.

  According to the present invention, when a patterned metal film is formed, a passivating process is formed on the surface of the metal film by including a resist stripping process using concentrated sulfuric acid and a heat treatment process. The adhesion between the laminated colored layers can be improved, and the occurrence of display defects due to the lack of the colored layers can be effectively prevented. Therefore, the present invention is suitable for any electro-optical device including a substrate including a structure in which a colored layer is laminated on a metal film formed using a predetermined material, such as a light shielding film and electric wiring. Can be used. As a result, the adhesion between the metal film and the colored layer can be improved, and the occurrence of display defects due to the lack of the colored layer can be effectively prevented.

  Therefore, according to the manufacturing method of the present invention, an electro-optical device excellent in durability, display characteristics, and the like can be efficiently provided. Therefore, in addition to a liquid crystal display device, an organic electroluminescence device, an inorganic electroluminescence device, a plasma Display devices, FED (field emission display) devices, LED (light emitting diode) display devices, electrophoretic display devices, devices equipped with electron-emitting devices (FED: Field Emission Display, SCEED: Surface-Conduction Electron-Emitter Display), etc. Can be mentioned. The electro-optical device includes, for example, a mobile phone, a personal computer, a liquid crystal television, a viewfinder type / monitor direct view type video tape recorder, a car navigation device, a pager, an electrophoresis device, an electronic notebook, a calculator, The present invention can be suitably applied to a word processor, a workstation, a video phone, a POS terminal, an electronic device equipped with a touch panel, and the like.

It is a figure which shows the flow of the manufacturing method of the electro-optical apparatus which concerns on this invention. It is a schematic sectional drawing which shows the liquid crystal display device which can be manufactured by this invention. (A)-(d) is a figure provided in order to demonstrate the manufacturing process of the 1st board | substrate (the 1). (A)-(d) is a figure where it uses in order to demonstrate the manufacturing process of the 1st board | substrate (the 2). (A) is a figure which shows the relationship between the temperature of the sulfuric acid used for resist peeling, and resist peelability, (b) is a figure which shows the relationship between the temperature of sulfuric acid, and the adhesiveness of a metal film and a colored layer. . (A)-(b) is a figure provided in order to demonstrate the resist peeling method using concentrated sulfuric acid, respectively. It is a figure which shows the relationship between heat processing temperature and the adhesiveness of a metal film and a colored layer. (A)-(e) is a figure provided in order to demonstrate the manufacturing process of a 2nd board | substrate. It is a schematic sectional drawing which shows another electro-optical apparatus which can apply this invention. FIG. 10 is a schematic cross-sectional view showing still another electro-optical device to which the present invention can be applied. It is sectional drawing provided in order to demonstrate the conventional liquid crystal display device. It is a figure provided in order to demonstrate the manufacturing method of the conventional liquid crystal display device.

Explanation of symbols

10.11.12: electro-optical device, 21: liquid crystal material, 23: sealing material, 30: first substrate, 33: first electrode, 35: light reflecting film, 37: colored layer, 39: light shielding film, 39X: Metal film, 41: Surface protective layer, 60: Second substrate, 63: Second electrode, 65: Electric wiring, 65X: Metal film, 69: Switching element, 76: Surface protective layer, 78: Colored layer , 90: concentrated sulfuric acid, 125: resist material

Claims (8)

A method for manufacturing an electro-optical device, comprising: a substrate including a patterned metal film and a colored layer laminated on the metal film; and an electro-optical material held by the substrate,
Laminating at least one metal material of chromium, tantalum and tungsten on the substrate;
Etching the metal material through a resist material patterned into a predetermined shape to form the patterned metal film;
Removing the resist material on the patterned metal film using concentrated sulfuric acid;
Heat-treating the substrate on which the patterned metal film is formed at a temperature in the range of 80 to 250 ° C .;
Forming a colored layer on the substrate including the metal film;
A method for manufacturing an electro-optical device.   2. The method of manufacturing an electro-optical device according to claim 1, wherein the heat treatment time of the substrate is set to a value within a range of 5 to 45 minutes.   3. The method of manufacturing an electro-optical device according to claim 1, wherein the patterned metal film is a light shielding film, a light reflecting film, or an electrode.   The electro-optical device according to claim 1, wherein hexamethyldisilazane (HMDS) is applied to a surface of the patterned metal film before forming the colored layer. Manufacturing method.   5. The method of manufacturing an electro-optical device according to claim 1, wherein a thickness of the patterned metal film is set to a value in a range of 1 to 5 μm.   6. The method of manufacturing an electro-optical device according to claim 1, wherein the concentration of the concentrated sulfuric acid is set to a value of 80% or more.   When stripping the resist material using the concentrated sulfuric acid, the substrate on which the resist material is laminated is immersed in concentrated sulfuric acid or concentrated sulfuric acid is showered. A method for manufacturing the electro-optical device according to the item.   The method for manufacturing an electro-optical device according to claim 1, wherein vibration is applied when the resist material is stripped using the concentrated sulfuric acid.

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