JP2006049262A - Plasma processing device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a plasma processing device capable of surely insulating an electrode. <P>SOLUTION: The electrode 31 of the plasma processing device is extended in a direction perpendicular to the direction extending from a plasma space 30a to a base material W. A metallic frame member 22L is arranged at a side opposite to the side where the plasma space 30a of the electrode 31 is formed. Insulating spacers 70, 75 are intermittently arranged between the electrode 31 and the frame member 22L in a longitudinal direction of the electrode 31. An electrically grounded conduction member 50 is interposed between the electrode 31 and an arrangement position of the base material W, and an L-shaped second side part 72 of the spacer 70 is interposed between the electrode 31 and the conduction member 50. An insulation space is formed between adjacent spacers 70, 75. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a so-called remote type plasma processing apparatus that converts a process gas into plasma and blows it toward a substrate, and more particularly to a plasma processing apparatus having a long electrode structure.

In this type of plasma processing apparatus, an electric field is applied between a pair of electrodes to cause glow discharge to create a plasma space between the electrodes, and a process gas is introduced into the space to activate it (activation, ionization). At the same time, the substrate is blown toward the substrate disposed outside the plasmatization space to perform surface treatment of the substrate.
For example, in the plasma processing apparatus described in Patent Document 1, the electrodes are elongated. Thereby, the surface treatment for the length of the electrode can be performed at a time, and the processing speed can be improved.
JP 2002-237480 A Japanese Patent Laid-Open No. 2003-1000064

  The electrode needs to be insulated from the metal frame. In the case where the electrode is long, it is conceivable that an insulating spacer having substantially the same length as this is buried between the metal frame and the electrode, but there are problems such as thermal deformation and creeping discharge.

The present invention provides a plasma processing apparatus in which a process gas is converted into plasma through a plasma formation space and blown out to a position where a substrate is to be disposed, and the plasma formation space is formed and the substrate arrangement position is formed from the plasma formation space. An electrode extending in a direction orthogonal to the direction toward the surface, a metal frame member provided on the opposite side (back part) of the electrode from the side forming the plasmatized space, and interposed between the electrode and the frame member A plurality of insulating spacers disposed intermittently in the longitudinal direction of the electrode (discontinuously over the entire length of the electrode (both at the end portion and at the central portion)), An insulating space that insulates the electrode from the frame is formed between adjacent ones.
Thereby, an electrode and a frame member can be insulated reliably. Further, creepage discharge can be suppressed and energy loss can be reduced. Furthermore, the influence of thermal deformation can be reduced. If the insulating space is connected to the outside, it is possible to secure heat removal.
The electrode is basically a hot electrode connected to a power source (electric field applying means), but may be applied to a grounded earth electrode. Of course, it may be applied to both electrodes.

It is desirable that an electrically grounded conductive member is interposed between the electrode and the substrate arrangement position. Thereby, plasma processing can be reliably performed while preventing electric field leakage to the base material.
In this case, at least a part of the plurality of spacers integrally includes a first side portion interposed between the electrode and the frame member and a second side portion interposed between the electrode and the conductive member. It is preferable that the insulating space is formed not only between the electrode and the frame member but also between the electrode and the conductive member. Accordingly, it is possible to reliably insulate not only between the electrode and the frame member but also between the electrode and the conductive member.
In addition, an opening between the electrode and the conductive member is provided with a blowing path forming member that closes the opening and forms a blowing path connected to the plasma space, and the second side portion of the spacer has the blowing path. It is desirable to arrange on the frame member side with respect to the path forming member. This prevents the process gas from entering the insulating space. It is desirable that this blowout path forming member has not only insulation but also plasma resistance.

It is desirable that a screw member that is engaged with the frame member and can push or pull the electrode is disposed at the same longitudinal position as the spacer. As a result, the distortion of the electrode can be prevented or corrected, and a sufficient insulating space can be secured.
The screw member capable of pulling the electrode has a head hooked on the frame member and a leg portion passing through the spacer and screwed into the electrode.
The screw member that can push the electrode is screwed into the frame member, and the front end abuts against the spacer, and the electrode can be pushed through the spacer.

  An insulating back insulating member extending over substantially the entire length of the electrode is applied to the back surface of the electrode facing the frame member, and the spacer is sandwiched between the back insulating member and the frame member, and the back insulating member and the frame The insulating space is preferably defined by a member and a spacer. As a result, in the unlikely event that dielectric breakdown occurs between the electrode and the frame for some reason, the electrode can be prevented from being damaged even if the back insulating member is damaged. Therefore, it is only necessary to replace the relatively inexpensive back insulating member, and there is no need to replace the expensive long electrode.

The back insulating member may be formed integrally with the spacer, or may be divided into a plurality of back insulating portions in the longitudinal direction. Further, it may be formed integrally with the spacer and divided in the longitudinal direction. That is, insulating pieces made of a plurality of insulating materials are arranged in the longitudinal direction of the electrode between the electrode and the frame, and each insulating piece is directed to the back surface of the electrode, and the back insulating portion. The back insulating member may be configured by integrally including the spacer protruding from the back surface of the plurality of insulating pieces and connecting back insulating portions of a plurality of insulating pieces. As a result, it is possible to cope with electrodes having different lengths by increasing or decreasing the number of insulating pieces, and the insulating pieces can be used in common regardless of the electrode length, thereby reducing costs. it can. Further, the contact surface between the back insulating member and the spacer can be eliminated, and the dimensional accuracy can be improved.
The electrode may be housed in a dielectric case, and the wall on the plasma forming space forming side of the case may be provided as a solid dielectric layer on the electrode. You may comprise the wall on the opposite side to the plasma formation space formation side of this case with the said back part insulation member or several insulation pieces.

The present invention is applied to, for example, atmospheric pressure plasma processing performed in an environment of substantially normal pressure (pressure near atmospheric pressure). Here, “substantially normal pressure” refers to a range of 1.013 × 10 ^{4 to} 50.663 × 10 ⁴ Pa, and considering the ease of pressure adjustment and the simplification of the apparatus configuration, 1.333 × 10 ⁴ to 10.664 × 10 ⁴ Pa is preferable, and 9.331 × 10 ^{4 to} 10.9797 × 10 ⁴ Pa is more preferable.

  According to the present invention, the insulating space can be formed by securing the distance between the electrode and the frame member by the insulating spacer, and the electrode and the frame member can be reliably insulated.

Hereinafter, a first embodiment of the present invention will be described with reference to the drawings.
As shown in FIG. 3, the atmospheric pressure plasma processing apparatus includes a plasma nozzle head 1 supported on a gantry (not shown). Below the plasma nozzle head 1, a large-area base material W is passed left and right to perform plasma surface treatment such as film formation. Of course, while fixing the base material W, the plasma nozzle head 1 may be moved. The position through which the base material W passes is the “base material placement position where the base material is to be placed” in the claims.

  The plasma nozzle head 1 includes an upper gas rectifying unit 10 and a lower discharge processing unit 20, and extends long in the front-rear direction (a direction orthogonal to the paper surface of FIG. 3). Although detailed illustration is omitted, the gas rectifying unit 10 is provided with a chamber and a slit so that a process gas from a process gas source (not shown) is made uniform in the longitudinal direction.

The discharge processing unit 20 includes a pair of long electrodes 31 and 32 and a frame 21 that accommodates the electrodes 31 and 32.
As shown in FIGS. 1 to 3, the electrodes 31 and 32 are made of, for example, a conductive material such as stainless steel, and have a square cross-sectional shape and are orthogonal to the front-rear direction (the direction from the plasmalized space 30a to the substrate arrangement position described later). It extends in a straight line in the direction (left and right direction in FIG. 1). As shown in FIG. 3, these electrodes 31 and 32 are arranged in parallel on the left and right sides. The left electrode 31 is connected to a power source (not shown) to be a hot electrode (electric field applying electrode), and the right electrode 32 is grounded to be an earth electrode (ground electrode). A narrow slit-like gap is formed between the opposing surfaces of the electrodes 31 and 32. This gap is a plasmatized space 30a. The power supply outputs a pulse voltage, for example. It is desirable that the rise time and / or fall time of this pulse is 10 μs or less, the electric field strength in the plasmaization space 30a between the electrodes is 10 to 1000 kV / cm, and the frequency is 0.5 kHz or more. A continuous wave such as a sine wave may be used instead of the pulse wave.
Although not shown, a solid dielectric made of alumina or the like is sprayed on the opposing surfaces (surfaces forming the plasmatizing space 30a), the upper surface, and the lower surface of the electrodes 31, 32.
The fixed dielectric made of alumina or the like may be sprayed on the back surface of the electrode. Further, instead of the thermal spray coating, the electrode may be housed in a case made of a solid dielectric, and this case may be used as a solid dielectric layer covering the opposing surface, upper surface, lower surface and back surface of the electrode.

A back insulating member 43 made of an insulating resin is assigned to the back surface of each electrode 31, 32 (the surface opposite to the surface forming the plasmatizing space 30a). The back insulating member 43 extends back and forth over the entire length of the electrodes 31 and 32. A lower end portion of the back insulating member 43 is bent in an L shape, and a corner portion of the electrode 31 is placed thereon.
The back insulating member 43 is damaged when the back of the electrode breaks down, and is preferably provided regardless of the presence or absence of the sprayed film on the back surface of the electrode. However, the back insulating member 43 is omitted if the breakdown can be reliably prevented. You may decide.
In FIG. 3, reference numeral 30 c denotes a temperature adjustment path through which a temperature adjustment medium for electrode temperature adjustment formed inside the electrode is passed.

  The frame 21 has a pair of left and right frame members 22L, 22R made of a rigid metal. These frame members 22L and 22R have a plate shape extending in the front-rear direction with the width direction being directed up and down. The left frame member 22L is disposed on the back of the hot electrode 31 (on the side opposite to the side on which the plasmatization space 30a is formed). Similarly, the right frame member 22 </ b> R is disposed behind the ground electrode 32. An upper plate 23 made of a rigid metal is bridged between the upper ends of the left and right frame members 22L and 22R, and is rigidly connected by bolting.

  A pair of left and right first upper insulating members 41 made of an insulating resin is provided between the upper plate 23 and the electrodes 31 and 32. These upper insulating members 41 have a long plate shape extending over the entire length of the electrodes 31 and 32 and insulate the upper plate 23 and the electrodes 31 from each other. A stepped notch is formed in the lower corner of the inner end portion of each upper insulating member 41 (the end portion facing the other upper insulating member 41), and the second upper insulating member 42 is fitted therein. The second upper insulating member 42 is made of an insulating material having higher plasma resistance and heat resistance than the first upper insulating member 41, for example, ceramic such as alumina, and has a thin square bar shape so as to extend to the entire length of the first upper insulating member 41. It extends.

  A slit-like gas introduction path 20 a is formed between the left and right central portions of the upper plate 23 and the left and right upper insulating members 41 and 42. The upper end portion of the gas introduction path 20a is connected to the downstream end of the gas rectifying unit 10, and the lower end portion is connected to the entire length of the upper end portion of the plasmaization space 30a between the electrodes 31 and 32 in a straight line.

  A pair of left and right conductive members 50 are provided at the lower end of the discharge processing unit 20. The conductive member 50 is a thin metal plate made of aluminum or the like, and extends forward and backward so as to cover the substantially entire length of the discharge processing unit 20. The outer edge portion of the conductive member 50 is connected and fixed to the frame 21 with bolts or the like. A ground line (not shown) extends from the conductive member 50 or the frame 21, and both the conductive member 50 and the frame 21 are electrically grounded via the ground line.

  The conductive member 50 is disposed sufficiently below the electrodes 31 and 32 so that no discharge occurs between the conductive member 50 and the electrode 31. The conductive member 50 is interposed between the electrodes 31 and 32 and the base material arrangement position. A blowing path forming member 46 is provided between the left and right electrodes 31 and 32 and the conductive member 50. The blow-out path forming member 46 is made of an insulating material having high plasma resistance and heat resistance, such as Pyrex (registered trademark) glass, has an inverted L-shaped cross section, and extends back and forth over the entire length of the electrodes 31 and 32 (the paper surface of FIG. 3). Elongate in the orthogonal direction). The opening between the left electrode 31 and the conductive member 50 is blocked by the left blowing path forming member 46, and the opening between the right electrode 32 and the conductive member 50 is blocked by the right blowing path forming member 46. It is.

A blowing path 46 a is formed between the opposing surfaces of the left and right blowing path forming members 46. The blow-out path 46a continues to the entire length of the lower end portion of the plasmatized space 30a between the electrodes 31 and 32.
Between the opposing end surfaces of the left and right conductive members 50, a blowout port 50 b that is continuous with the entire length of the blowout path 46 a is formed.

  As shown in FIGS. 1 and 2, two types of spacers 70 and 75 are intermittently provided in the front and rear directions on the upper surface of the conductive member 50 on the hot electrode 31 side (left side). The spacers 70 and 75 are made of a hard insulating material such as polycarbonate containing glass fiber. As shown in FIGS. 2 and 3, one type of spacer 70 has a first side portion 71 that is vertical and a second side portion 72 that is horizontal, and has an L shape. As shown in FIGS. 2 and 4, the other type of spacer 75 has a vertical flat plate shape. Hereinafter, the spacer 70 is referred to as “L-shaped spacer 70” and the spacer 75 is referred to as “flat spacer 75” as appropriate.

  As shown in FIG. 3, the vertical first side 71 of the L-shaped spacer 70 is sandwiched between the insulating member 43 and the frame member 22 </ b> L at the back of the hot electrode 31. As a result, a distance between the back insulating member 43 and the frame member 22L, and hence a distance between the electrode 31 and the frame member 21, is ensured.

  The horizontal second side portion 72 of the L-shaped spacer 70 is inserted below the electrode 31 along the upper surface of the conductive member 50 and is interposed between the conductive member 50 and the electrode 31. Thereby, a space between the electrode 31 and the conductive member 50 is secured. A lower end portion of the back insulating member 43 is applied to the second side portion 72 of the L-shaped spacer 70 and is fixed by an insulating pin 44.

  The second side portion 72 of the L-shaped spacer 70 is disposed closer to the frame member 22 </ b> L than the blowing path forming member 46. A shallow step is formed at the tip of the second side portion 72 of the L-shaped spacer 70. An inverted L-shaped blowout passage forming member 46 is put on the step so as to be hooked. As a result, the blowout path forming member 46 is supported by the L-shaped spacer 70.

  A collar housing hole 71 c is formed in the first side portion 71 of the L-shaped spacer 70. The frame member 22L is provided with a collar accommodating hole 22c at a position corresponding to the collar accommodating hole 71c. A bolt collar 61 made of an insulating resin is housed in the collar housing holes 71c and 22c. A step is formed on the inner peripheral surface of the collar housing hole 22c of the frame member 22L, and the flange 61f of the outer end portion of the bolt collar 61 is hooked on this step. A pull screw member 60 is accommodated in the bolt collar 61. The head portion of the screw member 60 is hooked on the inner bottom surface of the bolt collar 61, and as a result, is hooked on the frame member 22 via the bolt collar 61. The leg portion of the screw member 60 passes through the bolt collar 61 and the back insulating member 43 and is screwed into the back portion of the hot electrode 31.

As shown in FIGS. 1 and 4, the flat spacer 75 is disposed between the adjacent L-shaped spacers 70 and is sandwiched between the left frame member 22 and the back insulating member 43, and is pinned to the frame member 22. Stopped at 45.
A screw hole 22b is formed at a position corresponding to the flat spacer 75 of the frame member 22L, and a push screw member 63 made of a metal steel screw is screwed into the screw hole 22b. The front end of the push screw member 63 is abutted against a washer 64 embedded in the surface of the flat spacer 75 on the frame member 22L side.

  As shown in FIG. 5, an insulating space 49 is formed by the spacers 70 and 75. The insulating space 49 includes a first insulating space 49a on the back of the electrode 31 and a second insulating space 49b on the lower side of the electrode 31, and these space portions 49a and 49b are integrally connected. The first insulating space 49 a is defined between the frame member 22 </ b> L, the insulating member 43 at the back of the electrode 31, the first side 71 of the spacer 70, and the flat spacer 75. The second insulating space 49b includes the lower surface of the electrode 31, the insulating member 43 on the lower side of the electrode 31, the blowing path forming member 46, the conductive member 50, and the second side portions 72, 72 of the adjacent spacers 70, 70. It is defined in between.

  As shown in FIGS. 2 and 3, L-shaped spacers 70 </ b> X are intermittently provided on the upper surface of the conductive member 50 on the side of the ground electrode 32 (on the right side). A space 49 is formed between them. A flat spacer is not provided. Further, a screw member 65 slightly longer than the screw members 60 and 63 is provided on the ground side. The screw member 65 passes through the frame member 22 </ b> R, the L-shaped spacer 70 </ b> X, and the back insulating member 43 and is screwed into the ground electrode 32. The electrode 32 is attracted to the frame member 22R via the L-shaped spacer 70 and the back insulating member 43 by the screw member 65, and the position is fixed.

The operation of the atmospheric pressure plasma processing apparatus configured as described above will be described.
The process gas from the process gas source is made uniform in the longitudinal direction in the rectifying unit 10, and then introduced into the plasmaization space 30 a between the electrodes 31 and 32 through the gas introduction path 20 a of the discharge processing unit 20. Then, by applying a voltage from the power source to the electrode 31, a pulse electric field is formed in the space 30a and a glow discharge occurs, whereby the process gas is turned into plasma. The plasma-processed process gas is blown downward from the blowout port 50 b through the blowout path 46 a and is applied to the substrate W. Thereby, plasma surface treatment such as cleaning can be performed.
By disposing plasma-resistant members 42 and 46 immediately above and below the plasmatizing space 30a, alteration and deformation can be prevented.

  Since the grounded conductive member 50 is interposed between the electrode 31 and the base material W, it is possible to prevent an arc from dropping from the electrode 31 to the base material W, and to connect the plasma nozzle head 1 to the base material W. Can be close enough. Thereby, the plasma can reliably reach the substrate W even under normal pressure. As a result, processing efficiency can be improved reliably. In addition, the electric field can be prevented from leaking to the base material W, and the base material W can be prevented from being affected by the electric field.

The hot electrode 31 and the frame member 22L can be reliably separated by the first side portion 71 of the L-shaped spacer 70 and the flat spacer 75, and the insulating space 49a can be formed on the back portion of the electrode 31. In addition, the electrode 31 and the conductive member 50 can be reliably separated by the second side portion 72 of the L-shaped spacer 70, and the insulating space portion 49 b can be formed below the electrode 31. Thereby, the insulation of the electrode 31 can be improved.
The spacers 70, 75, and 70X can be manufactured more easily and cost can be reduced than a long shape over the entire length of the electrodes 31 and 32, and the degree of deformation due to heat can be sufficiently reduced.
Even if the electrodes 31 and 32 generate heat, the heat can be easily removed through the space 49.
Further, since the L-shaped spacer 70 has a small area, creeping discharge can be suppressed and energy loss can be reduced.
In the unlikely event that dielectric breakdown occurs between the electrodes 31 and 32 and the frames 22L and 22R for some reason, it is only the back insulating member 43 that is damaged, and the electrodes 31 and 32 are not damaged. Therefore, only the relatively inexpensive back insulating member 43 needs to be replaced, and there is no need to replace the expensive long electrodes 31 and 32, and the maintenance cost can be reduced.

The electrode 31 can be pulled away from the electrode 32 by the pull screw member 60, and can be pushed toward the electrode 32 by the push screw member 63. As a result, the distortion of the electrode 31 can be corrected, and the thickness of the plasmatized space 30a can be adjusted. Further, the pulling screw member 60 can prevent the electrode 31 from being distorted so as to approach the electrode 32 due to a Coulomb force or a thermal expansion difference, and the push screw member 63 causes the electrode 31 to move away from the electrode 31. Can be prevented from being distorted. As a result, the width of the plasmified space 30a can be made constant over the entire length in the front-rear direction, and the process gas can be reliably blown out along the longitudinal direction in the front-rear direction. As a result, the substrate W can be surely and uniformly subjected to plasma treatment.
By disposing the spacers 70 and 75 only at the positions where the screw members 60 and 63 are disposed, the insulating space 49 can be sufficiently secured while the screw members 60 and 63 are reliably insulated.

Next, another embodiment of the present invention will be described. In the following embodiments, the same components as those in the first embodiment are denoted by the same reference numerals and description thereof is omitted.
6 to 8 show a second embodiment of the present invention. In the second embodiment, the back insulating member of the hot electrode 31 is integrally formed with the spacer and is divided into a plurality in the longitudinal direction.

  Specifically, as shown in FIG. 6, a plurality of insulating pieces 80 are arranged in the longitudinal direction of the electrode 31 between the hot electrode 31 and the frame member 22 </ b> L (see FIG. 3 and the like). These insulating pieces 80 are formed of an insulating resin. As shown in FIGS. 7 and 8, each insulating piece 80 has a short plate-like back insulating portion 81, and a spacer 82 is integrally projected on the back surface of the back insulating portion 81. The spacer 82 of each insulating piece 80 has an L-shaped cross section that is substantially the same shape as the L-shaped spacer 70 of the first embodiment. The spacer 82 of the insulating piece 80 is formed with a collar accommodating hole 82c for the pull screw member 60 (not shown) (FIGS. 8A and 8B), and the washer 64 (not shown) of the push screw member 63. There are two types, one in which an accommodation recess 82d is formed (FIGS. 8C and 8D). In the drawing, “A” is added to the end of the reference numerals of the insulating piece 80 for the pull screw and the spacer 82, and “B” is added to the end of the reference numerals of the insulating piece 80 for the push screw and the spacer 82.

  The length of the insulating piece 80 and the back insulating portion 81 is, for example, about 20 to 30 cm. The back insulating portion 81 is assigned to the back surface of the electrode 31. As shown in FIG. 6, the back insulating portions 81 of adjacent insulating pieces 80 are abutted against each other. A “back insulating member” is configured by the back insulating portions 81 of a plurality (several to several dozen) insulating pieces 80 extending over the entire length of the electrode 31 in a row. In other words, the back insulating member is divided into a plurality of back insulating portions 81 in the longitudinal direction.

As shown in FIG. 7 and FIGS. 8B and 8D, the lower end portion of each back insulating portion 81 is bent in an L shape like the back insulating member 43 of the first embodiment, and the electrode 31 The corner of can be put on.
Each back insulating portion 81 is formed with an insertion hole 81c. A resin bolt (not shown) is inserted into the insertion hole 81 c and screwed into the electrode 31. Thereby, the insulating piece 80 is fixed to the electrode 31. As shown in FIGS. 8A and 8B, a pull screw member insertion hole 81d connected to the collar accommodating hole 82c of the spacer 82 is formed in the back insulating portion 81 of the pull screw member insulating piece 80A. .
In addition, although illustration is abbreviate | omitted, the insulation piece which has an electric power feeding terminal connection port is arrange | positioned at one of the both ends of the electrode 31, and the temperature control path 30c (refer FIG. 3) of the electrode 31 is arranged at the other end. An insulating piece having a temperature control pipe connection port is arranged.

According to the second embodiment, the back insulating member can be spread over the entire length of the back surface of the electrode 31 by arranging several to ten or more insulating pieces 80 of the same size. It is possible to cope with the electrodes 31 having different lengths by adjusting the number of the insulating pieces 80. As a result, the insulating piece 80 can be shared regardless of the length of the electrode 31, and the cost can be reduced.
Further, since the spacer 82 is integrated with the back insulating portion 81, there is no contact surface between them, and the assembly accuracy can be improved.

The present invention is not limited to the above embodiment, and various modifications can be made.
For example, in the first embodiment, the insulating member 43 on the back portion of the electrode 31 is omitted, the first side portion 71 of the L-shaped spacer 70 directly contacts the electrode 31, and at a portion other than the location where the L-shaped spacer 70 is disposed, The electrode 31 and the frame member 22 may face each other through the insulating space 49.
On the ground side, the spacer 70X, the back insulating member 43, and the conductive member 50 may not be provided, and the electrode 32 and the frame member 22R may be in direct contact with each other or may be integrated.
In the second embodiment, a relatively long (for example, 80 to 100 cm) insulating piece and a relatively short (for example, 20 to 30 cm) insulating piece 80 are prepared, and the longer insulating piece is mainly used as the electrode 31. Several pieces may be arranged in the longitudinal direction, and the longer insulating piece may be filled with the shorter insulating piece.
The present invention can be applied not only to atmospheric pressure but also to plasma treatment under reduced pressure, and not only to glow discharge, but also to plasma treatment by corona discharge or creeping discharge, cleaning, film formation, surface modification, etching It can be applied to various plasma treatments such as ashing.

It is a side view which shows the electrode part of the atmospheric pressure plasma processing apparatus which concerns on 1st Embodiment of this invention. It is a perspective view which shows a part of said electrode part. It is front sectional drawing of the said normal pressure plasma processing apparatus which follows the III-III line of FIG. It is front sectional drawing of the said normal pressure plasma processing apparatus which follows the IV-IV line of FIG. It is front sectional drawing of the said normal pressure plasma processing apparatus which follows the VV line of FIG. It is a side view which shows the electrode part of the atmospheric pressure plasma processing apparatus which concerns on 2nd Embodiment of this invention. It is the perspective view which looked at two types of insulation pieces of Drawing 6 from the outside (frame member side). It is the perspective view which looked at the above-mentioned two kinds of insulating pieces from the inside (electrode side). It is a plane sectional view of an insulating piece for a drawing screw member. It is a longitudinal cross-sectional view of the said insulation piece for pulling screw members which follows the BB line of Fig.8 (a). It is a plane sectional view of an insulating piece for a push screw member. It is a longitudinal cross-sectional view of the said insulating piece for set screw members which follows the DD line | wire of FIG.8 (c).

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Plasma nozzle head 20 Discharge process part 22L Frame member 30a of hot electrode back part Plasmaization space 31 Hot electrode 43 Back part insulation member 49 Insulation space 49a First insulation space part 49b Second insulation space part 50 Conductive member 60 Pulling screw member 63 Push screw member 70 L-shaped spacer 71 First side portion 72 Second side portion 75 Flat spacer 80 Insulation piece 80A Insulation piece 80B for pull screw member Insulation piece 81 for push screw member Back insulation portion 82 Spacer 82A For pull screw Spacer 82B Spacer for set screw

Claims (6)

In a plasma processing apparatus in which a process gas is converted into plasma through a plasma generation space and blown out to a position where a substrate is to be disposed,
An electrode that forms the plasmatized space and extends in a direction orthogonal to the direction from the plasmatized space toward the substrate arrangement position;
A metal frame member provided on the side opposite to the side that forms the plasma space of the electrode;
A plurality of insulating spacers interposed between the electrodes and the frame member and intermittently disposed in the longitudinal direction of the electrodes;
And an insulating space for insulating the electrode and the frame is formed between adjacent ones of the spacers. A conductive member interposed between the electrode and the substrate arrangement position and electrically grounded;
At least a part of the plurality of spacers has a first side portion interposed between the electrode and the frame member and a second side portion interposed between the electrode and the conductive member, and is generally L. Shape,
The plasma processing apparatus according to claim 1, wherein an insulating space is formed not only between the electrode and the frame member but also between the electrode and the conductive member.   The opening between the electrode and the conductive member is provided with a blow-off path forming member that closes the opening and forms a blow-off path that is continuous with the plasma space, and the second side portion of the L-shaped spacer is connected to the blow-out path. The plasma processing apparatus according to claim 2, wherein the plasma processing apparatus is disposed closer to the frame member than the path forming member.   The plasma processing according to any one of claims 1 to 3, wherein a screw member that is engaged with the frame member and can push or pull an electrode is disposed at the same longitudinal position as the spacer. apparatus.   An insulating back insulating member extending over substantially the entire length of the electrode is applied to the back surface of the electrode facing the frame member, and the spacer is sandwiched between the back insulating member and the frame member, and the back insulating member and the frame The plasma processing apparatus according to claim 1, wherein the insulating space is defined by a member and a spacer.   Insulation pieces made of a plurality of insulating materials are arranged in the longitudinal direction of the electrode between the electrode and the frame, and each insulation piece is directed to the back surface of the electrode, and the back surface of the back insulation portion The plasma processing apparatus according to claim 5, wherein the back insulating member is configured by integrally including the spacer projecting on the back and connecting back insulating portions of a plurality of insulating pieces.

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