JP2005243724A - Plasma processing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a plasma processing apparatus which prevents a holder for insulatingly holding electrodes from being deformed due to the heat from electrodes or a heat from process gas at processing. <P>SOLUTION: The plasma processor M1 houses electrodes 31, 32 in its frame 21 via an electrode holder 70, composed of an insulating resin body 71 and ceramic pieces 74, 75 at the gas inlet and outlet sides. A clearance 70d from the electrodes is recessed in the inner surface of the electrode housing space 70a of the holder body 71, thereby forming a gap 20a between the electrodes and the electrode holder. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

The present invention relates to a plasma processing apparatus that converts a processing gas into plasma and applies it to a work (object to be processed) to perform surface treatment such as cleaning, film formation, etching, and surface modification.

For example, the plasma processing apparatus described in Patent Document 1 includes a pair of left and right electrodes that form a vertical flat plate shape. One electrode is connected to a high frequency power supply, and the other electrode is grounded.
These electrodes are housed and held in a ceramic holder.

Japanese Patent Laid-Open No. 9-92493 (first page)

If the entire electrode holder is made of ceramic, the material cost increases. On the other hand, when the electrode holder is made of resin, there is a risk of deformation such as warping and distortion due to heat of the electrode and processing gas during processing.

In order to solve the above problems, a plasma processing apparatus according to the present invention includes an electrode for converting a processing gas into plasma, and an insulating electrode holder having a space for accommodating the electrode,
The inner surface of the electrode housing space of the electrode holder is recessed from the electrode, whereby a gap is formed between the electrode and the electrode holder.
As a result, the contact area between the electrode and the electrode holder can be reduced, and the transfer of heat from the electrode to the electrode holder can be suppressed. Therefore, even if the electrode holder is made of resin, it is possible to suppress thermal deformation such as warpage and strain.

In a so-called remote type plasma processing apparatus in which a processing gas is introduced into a plasmatized space defined by the electrodes and blown out, the electrode holder includes a holder main body having the electrode accommodating space, and the holder main body. An introduction-side piece provided at the end of the processing gas introduction side, and the introduction-side piece is connected to the contact surface of the electrode with the surface on the processing gas introduction side and the upstream end of the plasmatization space. It is desirable to have a gas introduction path forming surface. Further, the electrode holder includes a blowing side piece provided at an end of the holder main body on the processing gas blowing side, and the blowing side piece is in contact with the blowing side surface of the electrode, and the plasma It is desirable to have a blow-off path forming surface connected to the downstream end of the gasification space. Thereby, when the introduction side piece or the blowout side piece is damaged by plasma or the like, it is only necessary to replace it, and there is no need to change the entire electrode holder.

It is desirable that the introduction side piece or the blowout side piece is made of a material having higher plasma resistance than the holder body. Thereby, damage due to plasma can be prevented.
Moreover, it is desirable that the introduction piece or the blowout piece is made of a material having higher heat resistance than the holder body. Thereby, deformation or damage due to heat can be prevented.
It is desirable that the holder main body is made of resin, and the introduction side piece or the blowout side piece is made of ceramic such as alumina or glass. Accordingly, the material cost of the entire electrode holder can be surely reduced, and the introduction side piece or the blowout side piece can be surely made to have plasma resistance and heat resistance.
The holder body is preferably made of a heat-resistant resin (for example, a resin mainly made of polyethylene terephthalate).

It is desirable that the conductive member is provided on the outlet side from the electrode holder in a state of being electrically grounded. As a result, arc discharge to the workpiece can be prevented, and the plasmaization space can be brought closer to the workpiece to increase the processing efficiency. In addition, the electric field can be prevented from leaking to the object to be processed, and the object to be processed can be prevented from being affected by the electric field.
It is desirable that a recess is formed on the blow-out side surface of the electrode holder, whereby a gap is formed between the electrode holder and the conductive member. Thereby, even if the conductive member is induction-heated by high-frequency power supply to the electrode, it is possible to suppress the heat from being transmitted from the conductive member to the electrode holder, and to reliably prevent the electrode holder from being thermally deformed.

A rigid metal housing for housing the electrode holder, an insulating bolt collar engaged with the housing in a state of being accommodated in a collar housing hole formed in the housing, and inserted into the bolt collar And a bolt that is joined to the back surface of the electrode opposite to the plasma space defining surface and can push or pull the electrode, and an inner peripheral surface of the housing hole of the housing and an outer peripheral surface of the bolt collar It is desirable that a gap be formed between the two. Thereby, when the electrode is long, the distortion can be corrected or prevented. Further, it is possible to reliably insulate between the bolt and the housing.

The bolt accommodated in the bolt collar is screwed to the electrode and can be pulled, and a bolt separate from the pulling bolt is screwed to the housing and pressed against the electrode holder, It is desirable that the electrode can be pushed through the electrode holder, and the space between the electrode holder and the electrode and the gap with the electrode is formed so as to avoid the portion corresponding to the push bolt. Accordingly, the separate push bolt can be insulated from the electrode, and a force for preventing or correcting the distortion can be reliably applied to the electrode.

The plasma treatment of the present invention is performed, for example, at a substantially normal pressure (pressure near atmospheric pressure). In addition, the substantially normal pressure (pressure near atmospheric pressure) in the present invention is 1.013 × 10 ^{4 to} 50.663 × 1.
In the range of 0 ⁴ Pa, considering the ease of pressure adjustment and the simplification of the device configuration, 1.333
× 10 ^{4 to} 10.664 × 10 ⁴ Pa is preferable, 9.331 × 10 ^{4 to} 10.9797 × 1
0 ⁴ Pa is more preferable.

ADVANTAGE OF THE INVENTION According to this invention, the transmission of the heat from an electrode to an electrode holder can be suppressed, and it can prevent that an electrode holder receives influence, such as a deformation | transformation by a heat | fever.

Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
As shown in FIGS. 1 and 2, the atmospheric pressure plasma processing apparatus M <b> 1 according to this embodiment includes a plasma nozzle head 1 supported by a gantry (not shown) and a processing gas source connected to the nozzle head 1. 2 (shown only in FIG. 1) and a power source 3 (shown only in FIG. 2). The workpiece W, which is an object to be processed of the apparatus M1, has a large area, and is sent to the left and right of the nozzle head 1 by a conveying means (not shown) to be subjected to atmospheric pressure plasma processing. Of course, the nozzle head 1 may be moved while the workpiece W is fixed.

The power source 3 outputs a pulsed high frequency voltage, for example. It is desirable that the rise time and / or fall time of this pulse is 10 μs or less, the electric field strength between electrodes 31 and 32 described later is 10 to 1000 kV / cm, and the frequency is 0.5 kHz or more. In addition,
The voltage shape may be a sine wave shape instead of a pulse shape.

The processing gas source 2 stores processing gas corresponding to the processing content. It may be stored in a liquid phase and vaporized in appropriate amounts. The processing gas from the processing gas source 2 is supplied to the gas supply pipe 2
It is introduced into the plasma nozzle head 1 via a.

The plasma nozzle head 1 of the plasma processing apparatus M1 will be described in detail.
The nozzle head 1 includes an upper gas rectifying unit 10 and a lower discharge processing unit 20, and extends long in the front-rear direction (a direction perpendicular to the paper surface in FIG. 1 and a vertical direction in FIG. 2). Although detailed illustration is omitted, the gas rectifying unit 10 is provided with a plurality of chambers extending in the front-rear direction,
These chambers communicate with each other through slits or a large number of small holes extending in the front-rear direction. The processing gas introduced into the gas rectifying unit 10 is made uniform in the longitudinal direction by passing through these chambers, slits or a large number of small holes one after the other.

The discharge processing unit 20 of the plasma nozzle head 1 will be described.
The discharge processing unit 20 includes a housing 21, an electrode holder 70, and electrodes 31 and 32, and extends long in the front-rear direction.

As shown in FIG. 1, the housing 21 includes a top plate 22 and a pair of left and right side plates 2.
3. These plates 22 and 23 are made of a rigid metal. The upper end of the side plate 23 is connected to the edge of the top plate 22 by bolting and is rigidly connected.
A gas introduction path 22 a is formed in the left and right central portion of the top plate 22. Introduction path 2
2a is slit-shaped and extends in the front-rear direction, and is continuous over the entire length of the downstream end of the gas rectifying unit 10.

As shown in FIGS. 1 and 2, a pair of left and right electrodes 31 and 32 are accommodated inside the housing 21 via an electrode holder 70. Each of the electrodes 31 and 32 is made of, for example, a conductive material such as stainless steel, and has a rectangular cross section and extends in a straight line in the front-rear direction. Left electrode 3
Reference numeral 1 is connected to a power source 3 through a feeder line 3a and serves as an electric field application electrode. Right electrode 3
2 is grounded via a grounding wire 3b and serves as a ground electrode. The pair of electrodes 31 and 32 are arranged in parallel to each other with a narrow interval (for example, 2 mm). These electrodes 31,
Between 32, a plasmatized space 30a extending in a slit shape in the front-rear direction is formed.
Although not shown, a solid dielectric made of alumina or the like is sprayed on the opposing surface, upper surface, and lower surface of the electrodes 31 and 32. In addition, a temperature control path through which a temperature control refrigerant is passed is formed inside the electrode.

As shown in FIG. 1, the electrodes 31 and 32 are insulated and held by an insulating electrode holder 70. The electrode holder 70 is housed in a pair of left and right inside the housing 21. Each electrode holder 70 includes a holder main body 71, a gas introduction side piece 74, and a blowout side piece 75. The holder main body 71 is divided into a base portion 72 having an L-shaped cross section and a cap portion 73 provided on the upper portion of the base portion 72. These holder main body constituting parts 72 and 73 are made of a heat-resistant insulating resin such as Unirate (registered trademark), for example.

A holder body 71 having a U-shaped cross section, and thus inside the electrode holder 70, the electrode 31 or 32
An accommodation space 70a is formed. Storage space 7 for the left electrode holder 70
The electric field application electrode 31 is accommodated in 0a. Storage space 70a for right electrode holder 70
An electric field applying electrode 31 is accommodated in the first electrode.

A gas introduction side piece 74 is provided at the lower corner of the inner end portion of the cap portion 73 of each electrode holder 70 (the end portion facing the other electrode holder 70). The gas introduction side piece 74 is made of an insulating material having higher plasma resistance and heat resistance than the resin holder body 71, for example, ceramic such as alumina. The gas introduction side piece 74 has a thin rod shape with a rectangular cross section extending in the front-rear direction along the inner end portion of the cap portion 73. The inner end surface of the gas introduction side piece 74 is flush with the lower side of the inner end surface of the cap portion 73. The lower surface of the left gas introduction side piece 74 is in contact with the inner portion of the upper surface of the electric field applying electrode 31. The lower surface of the right gas introduction side piece 74 is in contact with the inner portion of the upper surface of the ground electrode 32.

A processing gas introduction path 70 b is formed between the cap portions 73 of the pair of left and right electrode holders 70 and the inner end surfaces of the pieces 74. The introduction path 70b has a slit shape and extends in the front-rear direction. The upper end portion of the introduction path 70 b is connected to the introduction path 22 a of the top plate 22 in a straight line, and the lower end portion is connected to the upstream end of the plasmaization space 30 a between the electrodes 31 and 32 in a straight line.

In each electrode holder 70, a blow-out side piece 75 is provided at the inner end portion of the lower side portion of the L-shaped base portion 72. The blow-out side piece 75 is made of an insulating material having higher plasma resistance and heat resistance than the resin holder main body 71, for example, Pyrex (registered trademark) glass. The blow-out side piece 75 has a thin bar shape with an inverted L-shaped cross section extending in the front-rear direction along the inner end portion of the lower side portion of the base portion 72. The upper surface of the left blowing side piece 75 is in contact with the inner portion of the lower surface of the electric field applying electrode 31. The upper surface of the right blowing side piece 75 is in contact with the inner portion of the lower surface of the ground electrode 32.

Between the inner end surfaces of the blowing side pieces 75 of the pair of left and right electrode holders 70, a processing gas blowing path 70c is formed. The blow-out path 70c is slit-shaped and extends in the front-rear direction. The upper end part of the blowing path 70c is connected to the downstream end of the plasmatizing space 30a between the electrodes 31 and 32 in a straight line.

A conductive member 27 made of a metal plate is placed over the entire bottom of the discharge processing unit 20 (the left and right electrodes 31 and 32, the holders 70 and 70, and the lower surfaces of the side plates 23 and 23). A blowout port 27 b is formed in the left and right central portion of the conductive member 27. The outlet 27b has a slit shape and extends in the front-rear direction, and continues to the outlet path 70c.

The conductive member 27 is insulated from the electrodes 31 and 32 by the electrode holder 70 and is electrically grounded via the ground wire 3d.
In addition, the casing 21 is electrically grounded via the conductive member 27 when the conductive member 27 and the side plate 23 come into contact with each other. Thereby, leakage from the plasma nozzle head 1 to the outside is prevented.

The plasma nozzle head 1 is provided with strain preventing means or strain correcting means for the elongated electrodes 31 and 32. That is, as shown in FIG. 2, the left and right side plates 23 are alternately formed with a plurality of screw holes 23 a and collar accommodating holes 23 b that are spaced apart in the front-rear direction. A collar housing hole 72b is formed to be continuous with each housing hole 23b of the side plate 23.

In each screw hole 23a, a push bolt 40 made of a metal braid screw is screwed. The push bolt 40 is made of a metal such as steel having a required strength. A washer 41 is provided at the tip of the push bolt 40, and this washer 41 is abutted against a recess 72 c on the back surface of the base portion 72 of the electrode holder 70.

A bolt collar 60 is accommodated in each of the accommodation holes 23b and 72b. Bolt collar 60
Is made of an insulating resin such as polytetrafluoroethylene, and has a stepped cylindrical shape with the axis oriented in the horizontal direction. At the outer end portion of the bolt collar 60, a flange 60f (an engagement portion to the housing) is provided. This flange 60f is the receiving hole 23b of the side plate 23.
Is hooked from the outside to the step 23c.

A bolt insertion hole 60a is formed through the bolt collar 60 along the axis thereof. The bolt insertion hole 60a has a large diameter on the outer end side and a small diameter on the back end side, and a step 60d (bolt hooking portion) is formed between the large diameter hole portion 60b and the small diameter hole portion 60c. Yes. The thickness of the bolt collar 60 (thickness from the inner peripheral surface of the bolt insertion hole 60a to the outer peripheral surface of the bolt collar 60) is set to a sufficient thickness so that the dielectric strength is sufficiently large and the capacitance is sufficiently small. It has become.

The pulling bolt 50 is inserted into the bolt insertion hole 60 a of the bolt collar 60. The pull bolt 50 is made of a metal such as steel having a required strength. The head of the pull bolt 50 has rounded corners, and the entire surface is smooth. The head of the pull bolt 50
The bolt is inserted into the large-diameter hole 60b of the bolt insertion hole 60a and is caught by the step 60d. The leg portion of the pulling bolt 50 passes through the small diameter hole portion 60c of the bolt insertion hole 60a and is screwed into the screw hole 30d formed in the corresponding electrodes 31 and 32. That is, the left pulling bolt 50 is screwed into the electric field applying electrode 31, and the right pulling bolt 50 is screwed into the ground electrode 32.

The inner diameter of each collar receiving hole 23b of the side plate 23 excluding the hooked portion on the flange 60f is sufficiently larger than the outer diameter of the back side portion of the bolt collar 60 from the flange 60f. Thus, an annular gap 20 c is formed between the inner peripheral surface of the collar housing hole 23 b and the outer peripheral surface of the bolt collar 60. The collar housing hole 72b of the electrode holder 70 has the same diameter as the collar housing hole 23b of the side plate 23. However, the collar housing hole 72b may have a larger diameter than the collar housing hole 23b. .

The most characteristic part of the present invention will be described.
The inner surface of the accommodation space 70a of the electrode holder 70 is counterbored. Thereby, the space | interval part 70d from an electrode is recessedly provided. The spacing portion 70d avoids the portion 72e corresponding to the push bolt 40 of the base portion 72, and is connected to the collar accommodating hole 72b so as to connect the inner surface of the vertical side portion and the upper surface of the lower side portion of the base portion 72, and the cap portion 73. It extends over the lower surface. As a result, only the push bolt-corresponding portion 72e of the base portion 72 is in contact with the back surfaces of the electrodes 31, 32 (the surface opposite to the surface facing the other electrode), and the upper surfaces of the electrodes 31, 32 are Only the introduction side piece 74 is in contact with the lower surface of the electrodes 31 and 32, and the blowing side piece 7
Only 5 is in contact. A gap 20 a, that is, an air layer is formed between the back surface, the top surface, and the bottom surface of the electrodes 31 and 32 excluding these contact portions and the electrode holder 70.

A recess 72 a is formed on the lower surface of the base portion 72 of each of the left and right electrode holders 70. As a result, the gap 2 is formed between the inner surface of the recess 72 a of the electrode holder 70 and the conductive member 27.
0b, that is, an air layer is formed.

The operation of the atmospheric pressure plasma processing apparatus M1 configured as described above will be described.
The processing gas from the processing gas source 2 is introduced into the rectifying unit 10 through the pipe 2a.
After being uniformed in the longitudinal direction at 0, it is introduced into the plasmaization space 30a between the electrodes via the introduction paths 22a and 70b. Then, by applying a voltage from the power source 3 to the electrode 31, a pulse electric field is formed in the space 30a and a glow discharge occurs, whereby the processing gas is turned into plasma. This plasma-ized processing gas passes through the blowout path 27b and blows out the outlet 20b.
Is blown downward and applied to the work W. Thereby, plasma surface treatment such as cleaning of the workpiece W can be performed.

The bottom surface of the nozzle head 1, that is, the surface to be opposed to the workpiece W is covered with the electrically grounded conductive member 27, so that an arc is prevented from dropping from the electrode 31 to the workpiece W,
The nozzle head 1 can be brought close to the workpiece W. Thereby, the plasma can reliably reach the workpiece W even under normal pressure. As a result, processing efficiency can be improved reliably. Further, it is possible to prevent the electric field from leaking to the workpiece W, and to prevent the workpiece W from being affected by the electric field.
The conductive member 27 and the electrode 31 can be insulated by the electrode holder 70. Further, the electrode holder 70
By forming the gap 20b between the conductive member 27 and the conductive member 27, the dielectric strength between the members 70 and 27 can be increased.

The push bolt 40 can push the electrodes 31 and 32 in a direction approaching the other electrode via the base portion 72 of the electrode holder 70, while the pulling bolt 50 pushes the electrodes 31 and 32 from the other electrode. Can be pulled away. Therefore, when the long electrodes 31 and 32 are distorted, the distortion of the electrodes 31 and 32 can be corrected by adjusting the screwing amounts of these bolts 40 and 50.
The push bolt 40 can prevent the electrodes 31 and 32 from moving away from the other electrode, while the pulling bolt 50 can prevent the electrodes 31 and 32 from approaching the other electrode. Therefore, it is possible to prevent the long electrodes 31 and 32 from being distorted by the Coulomb force or from being distorted by the difference in thermal expansion coefficient between the metal body of the electrode and the solid dielectric layer on the surface. As a result, the width of the plasmified space 30a can be made constant over the entire length in the front and rear directions, and the processing gas can be reliably blown out uniformly along the longitudinal direction in the front and rear directions. As a result, the workpiece W can be surely and uniformly subjected to plasma treatment.

A voltage is applied to the left pulling bolt 50 via the electrode 31, but it can be insulated from the casing 21 by the insulating bolt collar 60. In addition, since the annular gap 20c, that is, the air layer, is provided between the collar 60 and the casing 21, the insulation can be ensured.

According to the plasma processing apparatus M1, the main body 71 that occupies most of the electrode holder 70 that insulates and holds the electrodes 31 and 32 is made of resin, so that the material cost can be reduced as compared with the case where the whole is made of ceramic or the like. it can. On the other hand, the formation surface of the processing gas introduction path 70b and the blowout path 7
By forming the 0c formation surface with ceramic pieces 74 and 75, plasma resistance can be secured, and plasma damage can be prevented.
In addition, the ceramic pieces 74 and 75 have sufficiently high heat resistance, and can be prevented from being altered or deformed even through a high-temperature processing gas.

The main body 71 occupying most of the electrode holder 70 is made of unilate (registered trademark) having high heat resistance among the resins, thereby reducing the influence of heat deformation from the electrodes 31 and 32. .
In addition, a gap 20a, that is, a heat insulating layer is interposed between the electrodes 31 and 32 and the holder main body 71, and the contact area between these members is reduced, so that heat is transferred from the electrodes 31 and 32 to the holder main body 71. Can be suppressed. Therefore, the holder body 71 is connected to the electrode 3.
It is possible to more reliably prevent the heat from 1 and 32 from being affected by deformation and the like.
Moreover, the dielectric strength between the electrode 31 and the holder main body 71 can be raised, and discharge can be suppressed.

Furthermore, even if the conductive member 27 is induction-heated by high-frequency power supply to the electrodes 31 and 32, the gap 20b, that is, the heat insulating layer is interposed between the conductive member 27 and the electrode holder 70.
It is possible to suppress heat from being transmitted from the conductive member 27 to the electrode holder 70. Thereby, it is possible to more reliably prevent the resin main body 71 of the electrode holder 70 from being thermally deformed.

The present invention is not limited to the above embodiment, and various modifications can be made.
For example, the base part 72 and the cap part 73 having an L-shaped cross section of the electrode holder 70 may be integrated. The vertical side portion and the lower side portion of the base portion 72 may be separated, and the vertical side portion and the cap portion 73 may be integrated.
In the above-described embodiment, the electrodes 31 and 32 have a substantially square cross-sectional shape. However, the electrodes 31 and 32 may have a rectangular cross-section that is vertically long (for example, the height is twice the width). Of course, in this case, the side plate 23 and the electrode holder 70 are also vertically long.
The pulling bolt for the ground electrode may not be accommodated in the collar, and the head may be directly attached to the housing.
The push bolt may directly push against the electrode. In this case, at least the push bolt corresponding to the electric field application electrode is housed in an insulating bolt collar and insulated from the housing. A female screw for screwing the push bolt is provided on the inner peripheral surface of the bolt receiving hole of the push bolt collar. The collar for the push bolt is caught on the housing from the inside.
At least the outer end opening of the bolt housing hole of the bolt collar corresponding to the electric field applying electrode may be closed with a cap. Thereby, even if the inner peripheral surface of the bolt accommodation hole is burnt by electric discharge, it is possible to prevent particles from being scattered and mixed in the processing atmosphere around the head.
The plasma treatment of the present invention is applicable not only to the so-called remote type in which the object to be processed is arranged outside the plasmaization space between the electrodes, but also to the so-called direct type in which the object to be processed is arranged inside the plasmaization space between the electrodes. Is done.
The present invention can be applied not only to atmospheric pressure but also to plasma treatment under reduced pressure, and not only to glow discharge, but also to plasma treatment by corona discharge or creeping discharge, cleaning, film formation, surface modification, etching It can be applied to various plasma treatments such as ashing.

It is front sectional drawing which shows the atmospheric pressure plasma processing apparatus which concerns on one Embodiment of this invention along the II line | wire of FIG. It is a plane sectional view showing the above-mentioned atmospheric pressure plasma processing device along the II-II line of Drawing 1.

Explanation of symbols

M1 atmospheric pressure plasma processing apparatus 20a gap 20b between electrode and electrode holder gap 20c between electrode holder and conductive member gap 21 between bolt collar and casing 21 casing 23a color accommodation hole 27 conductive members 31, 32 electrode 30a Plasmaization space 40 Push bolt 50 Pull bolt 60 Bolt collar 60a Bolt insertion hole 70 Electrode holder 70a Electrode accommodation space 70b Process gas introduction path 70c Blowout path 70d Spacing part 71 from electrode 71 Holder main body 72a Recessed part 72e 74 Inlet side piece 75 Outlet side piece

Claims (9)

An electrode for converting the processing gas into plasma;
An insulating electrode holder having a space for accommodating the electrode,
A plasma processing apparatus, wherein a space from the electrode is recessed in the inner surface of the electrode housing space of the electrode holder, whereby a gap is formed between the electrode and the electrode holder. Process gas is introduced into the plasmatized space defined by the electrodes and blown out.
The electrode holder includes a holder main body having the electrode housing space, and an introduction side piece provided at an end of the holder main body on the processing gas introduction side,
The said introduction side piece has the contact surface to the surface by the side of the process gas introduction in an electrode, and the formation surface of the process gas introduction path connected to the upstream end of the said plasmaization space, It is characterized by the above-mentioned. 2. The plasma processing apparatus according to 1. Process gas is introduced into the plasmatized space defined by the electrodes and blown out.
The electrode holder includes a holder main body having the electrode accommodation space, and a blowing side piece provided at an end of the holder main body on the processing gas blowing side,
The said blowing side piece has the contact surface to the surface of the blowing side in an electrode, and the formation surface of the blowing path connected to the downstream end of the said plasmaization space, The Claim 1 characterized by the above-mentioned. Plasma processing equipment. The plasma processing apparatus according to claim 2, wherein the piece is made of a material having higher plasma resistance than the holder body. The plasma processing apparatus according to claim 2, wherein the piece is made of a material having higher heat resistance than the holder body. The plasma processing apparatus according to claim 2, wherein the holder main body is made of resin, and the piece is made of ceramic. The conductive member is provided in a state of being electrically grounded to the outlet side from the electrode holder,
The plasma processing apparatus according to any one of claims 1 to 6, wherein a concave portion is formed on a blow-off surface of the electrode holder, whereby a gap is formed between the electrode holder and the conductive member. . A rigid metal housing for housing the electrode holder;
An insulating bolt collar engaged with the housing in a state of being accommodated in a collar housing hole formed in the housing;
A bolt that is inserted into the bolt collar and joined to the back surface opposite to the plasma space defining surface of the electrode, and can push or pull the electrode;
The plasma processing apparatus according to claim 1, wherein a gap is formed between an inner peripheral surface of the collar housing hole of the housing and an outer peripheral surface of the bolt collar. . The bolt accommodated in the bolt collar can be screwed into the electrode and pulled.
A bolt that is separate from the pulling bolt is screwed into the housing and pressed against the electrode holder, so that the electrode can be pressed through the electrode holder.
The plasma processing apparatus according to claim 8, wherein a separation portion from the electrode of the electrode holder is formed so as to avoid a portion corresponding to the push bolt.

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