JP2006041372A5

JP2006041372A5 -

Info

Publication number: JP2006041372A5
Application number: JP2004221998A
Authority: JP
Filing date: 2004-07-29
Publication date: 2008-02-07
Anticipated expiration: 2024-07-29

Claims

A liquid processing section for processing the substrate with the processing liquid;
A drying processing unit provided on the liquid processing unit and drying the substrate;
A substrate transfer device for transferring a substrate between the liquid processing unit and the drying processing unit;
A shutter that is movable in a horizontal direction so as to be able to open and close between the liquid processing unit and the drying processing unit, and has a drain port formed therein;
A suction mechanism connected to the drainage port;
A suction control member that is provided on the opening of the drainage port and generates a fluid flow that flows along the upper surface of the shutter and flows into the drainage port when the suction mechanism is operated;
A substrate processing apparatus comprising:

The substrate processing apparatus according to claim 1, wherein the drain port is formed substantially at the center of the shutter.

The suction control member substrate processing apparatus according to claim 1 or claim 2, characterized in that a substantially conical shape.

4. The substrate processing apparatus according to claim 3 , wherein a gap formed between an outer peripheral end of the substantially conical suction control member and an upper surface of the shutter is 0.5 mm or more and 1.0 mm or less.

The opening diameter of the drain port is a substrate processing apparatus according to claim 3 or claim 4, characterized in that shorter than the outer diameter of the suction control members of the substantially conical shape.

Upper surface of said shutter is substantially conical concave substrate processing according to any one of claims 1 to 5, wherein the drain port is characterized in that provided in the deepest portion of the concave surface apparatus.

The suction mechanism is a substrate processing apparatus according to any one of claims 1 to 6, characterized in that the aspirator.

A processing gas supply mechanism for supplying a processing gas to the drying processing unit;
The supply of the processing gas to the drying processing unit is started, the drainage from the drainage port is started after a predetermined time has elapsed, and then the supply of the processing gas is stopped after the predetermined time has passed, and then the drainage port A control device for controlling the processing gas supply mechanism and the suction mechanism so as to stop drainage from
The substrate processing device according to claim 1, wherein any one of claims 7, further comprising a.

An inert gas supply mechanism for supplying an inert gas to the drying processing unit;
The control device starts supplying inert gas to the drying processing unit substantially simultaneously with the start of supply of processing gas to the drying processing unit, and stops the drainage from the drainage port, and then deactivates the inert gas. Controlling the inert gas supply mechanism so as to stop the supply of gas to the drying processing unit;
The chemical treatment and water washing treatment of the substrate is performed in the liquid treatment section, and the drying treatment of the substrate after the water washing treatment is performed using isopropyl alcohol vapor as the processing gas in the drying treatment section. 9. The substrate processing apparatus according to 8 .

A step of liquid-treating the substrate in a liquid treatment section for treating the substrate with a predetermined treatment liquid;
A step of pulling up the substrate after the liquid processing to a drying processing unit provided above the liquid processing unit;
Isolating the liquid processing unit and the drying processing unit with a shutter;
Drying the substrate in the drying processing unit,
The substrate drying process includes:
Starting the supply of processing gas to the drying processing unit;
Starting suction and drainage of the liquid that has fallen to the shutter through a drainage port provided in the shutter after a lapse of a certain time from the start of supply of the processing gas;
A step of stopping the supply of the processing gas after elapse of a predetermined time after starting drainage from the drainage port;
A step of stopping suction and drainage from the drainage port after a lapse of a predetermined time after stopping the supply of the processing gas;
A substrate processing method comprising:

The liquid treatment of the substrate includes a water washing treatment with pure water,
In the drying step, isopropyl alcohol vapor is used as the processing gas, and the supply of the inert gas to the drying processing unit is further started substantially simultaneously with the start of the supply of isopropyl alcohol vapor to the drying processing unit, The substrate processing method according to claim 10 , wherein the supply of the inert gas to the drying processing unit is stopped after the suction and drainage from the drainage port is stopped.