JP2006036560A - Glass member with optical multilayer film and optical element using the glass member - Google Patents

Glass member with optical multilayer film and optical element using the glass member Download PDF

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JP2006036560A
JP2006036560A JP2004215338A JP2004215338A JP2006036560A JP 2006036560 A JP2006036560 A JP 2006036560A JP 2004215338 A JP2004215338 A JP 2004215338A JP 2004215338 A JP2004215338 A JP 2004215338A JP 2006036560 A JP2006036560 A JP 2006036560A
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film
optical multilayer
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glass member
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JP4447393B2 (en
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Katsunori Ishida
克則 石田
Hiroyuki Nakamura
浩之 中村
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Hoya Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a glass member with an optical multilayer film without peeling when the optical multilayer film is formed on a fluorophosphate glass. <P>SOLUTION: The glass member with an optical multilayer film is formed by forming an optical multilayer film (e.g. an antireflection film 3, an IR cut film 4, etc.) on a fluorophosphate glass substrate 1, where an adhesiveness reinforcing film 2 which contains fluorine (F) and improves the adhesiveness of the optical multilayer to the fluorophosphate glass substrate is formed between the fluorophosphate glass substrate 1 and the optical multilayer film (e.g. an antireflection film 3, an IR cut film 4, etc.). <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、デジタルカメラ、ビデオカメラなどに搭載されるCCDやCMOSなどの固体撮像素子の色感度補正フィルターや、CCDやCMOSなどの固体撮像素子をパッケージする際に使われるカバーガラス、ローパスフィルター、熱線フィルターや、それらに使われる光学多層膜付きガラス部材及び該ガラス部材を用いた光学素子に関する。   The present invention relates to a color sensitivity correction filter for a solid-state image pickup device such as a CCD or CMOS mounted in a digital camera or a video camera, a cover glass used when packaging a solid-state image pickup device such as a CCD or CMOS, a low-pass filter, The present invention relates to a heat ray filter, a glass member with an optical multilayer film used for them, and an optical element using the glass member.

デジタルカメラやビデオカメラに搭載されているCCDやCMOSなどの固体撮像素子の分光感度は、可視域から1100nm付近の近赤外域にわたる。従って、近赤外域を吸収するフィルターを用いて人間の視感度に近似させる画像を得ている。この目的で使用されるフィルターガラスとして、燐酸塩ガラスにCuOを添加したガラスが用いられてきたが、燐酸塩ガラスは耐候性が悪く、長時間高温高湿に曝すとガラス表面のあれや白濁が生じるという欠点があった。そのため弗素成分を含み耐候性に優れる弗燐酸塩ガラスを基本組成とした近赤外光吸収フィルターガラスが開発され、市販されている。
この種のガラスとしては、例えば、弗燐酸塩ガラスにCuOを添加した近赤外光吸収フィルターガラスが開示されている(特許文献1)。
特開平2−204342号公報
The spectral sensitivity of solid-state imaging devices such as CCDs and CMOSs mounted on digital cameras and video cameras ranges from the visible range to the near infrared range near 1100 nm. Therefore, an image approximated to human visibility is obtained using a filter that absorbs the near infrared region. As a filter glass used for this purpose, a glass in which CuO is added to a phosphate glass has been used. However, a phosphate glass has poor weather resistance, and if it is exposed to high temperature and high humidity for a long time, the glass surface may become rough or cloudy. There was a disadvantage that it occurred. Therefore, near-infrared light absorbing filter glass based on a fluorophosphate glass containing a fluorine component and excellent in weather resistance has been developed and is commercially available.
As this type of glass, for example, a near-infrared light absorbing filter glass in which CuO is added to a fluorophosphate glass is disclosed (Patent Document 1).
JP-A-2-204342

デジタルカメラやビデオカメラに搭載する光学素子としては、上述の近赤外光吸収フィルターガラス以外にも、可視領域の波長の光の反射を防止する反射防止機能や、CCDの解像限界を超えた空間周波数成分を除去するためのローパスフィルター等が必要であり、反射防止膜付き付き基板やローパスフィルターが必要とされ、それらの部材が接着剤等により接合されている。
ところで、近年、デジタルカメラやビデオカメラの小型化により、カメラの光学系も省スペース化が求められているが、従来の光学素子は、それぞれが単独部材として形成された、近赤外線吸収フィルターガラス、反射防止膜付き基板、ローパスフィルターの各部材が接合されていたため、省スペース化が図れなかった。
また、弗燐酸塩ガラスからなる近赤外光吸収フィルターガラスに光学多層膜を形成する技術も提案されているが、光学素子の小型化の要求により、洗浄工程時や高温高湿耐久試験等で光学多層膜の膜剥がれが発生し問題となっている。
本発明は、上述の問題点に鑑みてなされたものであり、その目的は、弗燐酸塩ガラスに光学多層膜を形成しても膜剥がれが発生しない光学多層膜付きガラス部材、及びこのガラス部材を用いた光学素子を提供することである。
In addition to the near-infrared light absorption filter glass described above, the optical elements mounted on digital cameras and video cameras exceeded the resolution limit of the CCD and the anti-reflection function that prevents reflection of light in the visible wavelength range. A low-pass filter or the like for removing the spatial frequency component is required, a substrate with an antireflection film or a low-pass filter is required, and these members are bonded together by an adhesive or the like.
By the way, in recent years, with the miniaturization of digital cameras and video cameras, the optical system of the camera is also required to save space, but the conventional optical elements are each formed as a single member, a near infrared absorption filter glass, Since each member of the substrate with the antireflection film and the low-pass filter were joined, it was not possible to save space.
In addition, a technique for forming an optical multilayer film on a near infrared light absorbing filter glass made of fluorophosphate glass has been proposed. The film peeling of the optical multilayer film is a problem.
The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a glass member with an optical multilayer film in which film peeling does not occur even when an optical multilayer film is formed on a fluorophosphate glass, and the glass member. It is providing the optical element using this.

(構成1)弗燐酸塩ガラス基板上に光学多層膜が形成された光学多層膜付きガラス部材であって、
前記弗燐酸塩ガラス基板と前記光学多層膜との間に、弗素(F)を含み前記弗燐酸塩ガラス基板に対する前記光学多層膜の密着性を向上させる密着強化膜が形成されていることを特徴とする光学多層膜付きガラス部材。
(構成2)前記密着強化膜は、弗化マグネシウム(MgF)、弗化カルシウム(CaF)、弗化ランタン(LaF)、弗化ネオジウム(NdF)、弗化セリウム(CeF)の何れかから選ばれる材料であることを特徴とする構成1記載の光学多層膜付きガラス部材。
(構成3)前記密着強化膜の膜厚は、前記ガラス基板の主表面を覆うことが可能な膜厚以上であって、前記光学多層膜の光学特性に影響を与えない膜厚以下であることを特徴とする構成1又は2記載の光学多層膜付きガラス部材。
(構成4)前記弗燐酸塩ガラス基板は、カチオン%表示で、P5+が20〜40%含まれる材料からなることを特徴とする構成1乃至3の何れか一に記載の光学多層膜付きガラス部材。
(構成5)構成1乃至4の何れか一に記載の光学多層膜付きガラス部材を所定の大きさに切断してなる光学素子。
(Configuration 1) A glass member with an optical multilayer film in which an optical multilayer film is formed on a fluorophosphate glass substrate,
An adhesion reinforcing film containing fluorine (F) and improving the adhesion of the optical multilayer film to the fluorophosphate glass substrate is formed between the fluorophosphate glass substrate and the optical multilayer film. A glass member with an optical multilayer film.
(Configuration 2) The adhesion reinforcing film is made of magnesium fluoride (MgF 2 ), calcium fluoride (CaF 2 ), lanthanum fluoride (LaF 3 ), neodymium fluoride (NdF 3 ), cerium fluoride (CeF 3 ). The glass member with an optical multilayer film according to Configuration 1, which is a material selected from any one of the above.
(Structure 3) The film thickness of the adhesion enhancing film is not less than a film thickness that can cover the main surface of the glass substrate and does not affect the optical characteristics of the optical multilayer film. The glass member with an optical multilayer film according to Configuration 1 or 2, wherein:
(Configuration 4) The glass with an optical multilayer film according to any one of configurations 1 to 3, wherein the fluorophosphate glass substrate is made of a material containing 20 to 40% of P 5+ in terms of cation%. Element.
(Configuration 5) An optical element formed by cutting the glass member with an optical multilayer film according to any one of Configurations 1 to 4 into a predetermined size.

本発明によれば、弗燐酸塩ガラスに光学多層膜を形成しても膜剥がれが発生しない光学多層膜付きガラス部材、及びこのガラス部材を用いた光学素子(例えば光学フィルターなど)を提供できる。   ADVANTAGE OF THE INVENTION According to this invention, even if an optical multilayer film is formed in a fluorophosphate glass, the glass member with an optical multilayer film which does not generate | occur | produce film | membrane, and the optical element (for example, optical filter etc.) using this glass member can be provided.

本発明は、弗燐酸塩ガラス基板などの弗燐酸塩ガラス部材上に光学多層膜が形成された光学多層膜付きガラス部材であって、前記弗燐酸塩ガラス基板(弗燐酸塩ガラス部材)と前記光学多層膜との間に、弗素(F)を含み前記弗燐酸塩ガラス基板(弗燐酸塩ガラス部材)に対する前記光学多層膜の密着性を向上させる密着強化膜が形成されていることを特徴とする。
本発明において、弗燐酸塩ガラスとは、ガラス形成酸化物として燐酸(酸化リン)を含むガラスのうち、弗素(F)を含むガラスをいう。この弗燐酸塩ガラスは、弗燐酸塩系ガラス又は弗燐酸系ガラスと呼ばれることがある。
The present invention relates to a glass member with an optical multilayer film in which an optical multilayer film is formed on a fluorophosphate glass member such as a fluorophosphate glass substrate, the fluorophosphate glass substrate (fluorophosphate glass member) and the above-mentioned An adhesion reinforcing film containing fluorine (F) and improving the adhesion of the optical multilayer film to the fluorophosphate glass substrate (fluorophosphate glass member) is formed between the optical multilayer film and the optical multilayer film. To do.
In the present invention, the fluorophosphate glass means a glass containing fluorine (F) among glasses containing phosphoric acid (phosphorus oxide) as a glass forming oxide. This fluorophosphate glass is sometimes referred to as fluorophosphate glass or fluorophosphate glass.

光学多層膜としては、反射防止機能を有する反射防止膜(AR膜:Anti Reflection膜)、波長選択機能を有するダイクロイックフィルター、赤外線遮断膜(IRカット膜)などの光学多層膜が挙げられる。
具体的には、反射防止膜の場合、基板側から、Al/ZrO/MgFの積層膜、TiO/SiO…の積層膜、Ta/SiO…の積層膜、Si−Sn−O/TiO/SiOの積層膜、Si−Sn−O/Nb/SiOの積層膜などが挙げられる。
また、IRカット膜の場合、基板側から、TiO/SiO…の積層膜、Ta/SiO…の積層膜、ZrO/SiO…の積層膜などが挙げられる。
光学多層膜の成膜方法としては、真空蒸着法、スパッタリング法、CVD法、イオンビーム蒸着法などが挙げられる。
上記光学多層膜は、弗燐酸塩ガラス基板の片面又は両面に形成することができる。
具体的には、弗燐酸塩ガラス基板/AR膜、弗燐酸塩ガラス基板/IRカット膜、AR膜/弗燐酸塩ガラス基板/AR膜、AR膜/弗燐酸塩ガラス基板/IRカット膜、などのように形成することができる。
Examples of the optical multilayer film include optical multilayer films such as an antireflection film (AR film: Anti Reflection film) having an antireflection function, a dichroic filter having a wavelength selection function, and an infrared shielding film (IR cut film).
Specifically, in the case of an antireflection film, from the substrate side, a laminated film of Al 2 O 3 / ZrO 2 / MgF 2, a laminated film of TiO 2 / SiO 2 ..., A laminated film of Ta 2 O 5 / SiO 2 . , Si—Sn—O / TiO 2 / SiO 2 laminated film, Si—Sn—O / Nb 2 O 5 / SiO 2 laminated film, and the like.
In the case of the IR cut film, a laminated film of TiO 2 / SiO 2 ..., A laminated film of Ta 2 O 5 / SiO 2 ... And a laminated film of ZrO 2 / SiO 2 .
Examples of the method for forming the optical multilayer film include a vacuum deposition method, a sputtering method, a CVD method, and an ion beam deposition method.
The optical multilayer film can be formed on one side or both sides of a fluorophosphate glass substrate.
Specifically, a fluorophosphate glass substrate / AR film, a fluorophosphate glass substrate / IR cut film, an AR film / fluorophosphate glass substrate / AR film, an AR film / fluorophosphate glass substrate / IR cut film, etc. It can be formed as follows.

密着強化膜としては、弗素(F)を含有している材料が好ましい。具体的には、弗化マグネシウム(MgF)、弗化カルシウム(CaF)、弗化ランタン(LaF)、弗化ネオジウム(NdF)、弗化セリウム(CeF)などが挙げられる。中でも密着強化膜上に形成する光学多層膜の光学特性に対して影響を与えないためには、なるべく屈折率が低い材料が好ましく、さらに、容易に形成しやすいという点から、弗化マグネシウム(MgF)が好ましい。
密着強化膜の膜厚は、密着性を強化できる程度の膜厚であれば良いが、好ましくはガラス基板の主表面を覆うことが可能な膜厚以上(連続膜)であって、その上に形成する光学多層膜の光学特性に影響を与えない膜厚以下であることが望ましい。具体的には、密着強化膜の下限は、10nm以上とすること(最低10nmとすること)が好ましい。10nm未満だと成膜時の膜厚制御性が悪化し、膜厚ばらつきによる密着強化膜のむらが発生しやすいからである。
弗燐酸塩ガラス基板上に光学多層膜が形成された光学多層膜付きガラス部材は、水溶液で処理される。例えば、洗浄処理やガラス部材を所定の大きさに切断する場合などである。これらの水溶液の処理を行っても本発明の如く密着強化膜を介在させれば、光学多層膜との密着性は良好であり膜剥がれは発生しない。
As the adhesion reinforcing film, a material containing fluorine (F) is preferable. Specific examples include magnesium fluoride (MgF 2 ), calcium fluoride (CaF 2 ), lanthanum fluoride (LaF 3 ), neodymium fluoride (NdF 3 ), and cerium fluoride (CeF 3 ). In particular, in order not to affect the optical properties of the optical multilayer film formed on the adhesion reinforcing film, a material having a refractive index as low as possible is preferable, and further, magnesium fluoride (MgF) is preferable because it can be easily formed. 2 ) is preferred.
The film thickness of the adhesion strengthening film may be a film thickness that can enhance the adhesion, but is preferably a film thickness that can cover the main surface of the glass substrate (continuous film) or more. It is desirable that the thickness be less than that which does not affect the optical characteristics of the optical multilayer film to be formed. Specifically, the lower limit of the adhesion reinforcing film is preferably 10 nm or more (at least 10 nm). If the thickness is less than 10 nm, the film thickness controllability at the time of film formation deteriorates, and unevenness of the adhesion reinforcing film due to film thickness variations is likely to occur.
The glass member with an optical multilayer film in which the optical multilayer film is formed on the fluorophosphate glass substrate is treated with an aqueous solution. For example, it is a case where a cleaning process or a glass member is cut into a predetermined size. Even if these aqueous solutions are treated, if an adhesion enhancing film is interposed as in the present invention, the adhesion with the optical multilayer film is good and film peeling does not occur.

弗燐酸塩ガラス基板は、近赤外光吸収フィルター(色補正フィルター)等としての機能を重視する場合においては、カチオン成分の含有量をカチオン%により表示することとした場合、カチオン%表示で、P5+が20〜40%含まれる弗燐酸塩ガラス材料からなることが好ましい。P5+は弗燐酸系ガラスの基本成分であり、近赤外域の吸収をもたらす重要な成分である。20%未満では色補正機能が悪化して緑色を帯びてしまうので好ましくなく、40%を超えると耐候性、耐失透性が悪化するので好ましくない。より好ましくは、25〜35%である。 In the case where the function as a near-infrared light absorption filter (color correction filter) is regarded as important, the fluorophosphate glass substrate is expressed as cation% when the content of the cation component is expressed as cation%. It is preferably made of a fluorophosphate glass material containing 20 to 40% of P 5+ . P 5+ is a basic component of fluorophosphate glass and is an important component that brings about absorption in the near infrared region. If it is less than 20%, the color correction function deteriorates and becomes greenish, and it is not preferable, and if it exceeds 40%, weather resistance and devitrification resistance deteriorate, which is not preferable. More preferably, it is 25 to 35%.

光学多層膜付きガラス部材を所定の大きさに切断することで光学フィルターなどの光学素子が得られる。
ガラス部材から所定の大きさに切断して光学フィルターなどの光学素子を製造する方法の概要について説明する。
例えば、精密研磨してなる大きさ90mm×90mm、厚さ0.5mmの弗燐酸塩ガラス上に各種光学薄膜を形成したガラス基板を、50枚程度準備し、これらを紫外線硬化樹脂(水で剥がれる接着剤)で互いに接着して積層した積層ラージブロックとする。次いで、この積層ラージブロックを、積層方向に縦横にクロス切断(例えば、4.5mm×4.5mm、14mm×14mm、20mm×20mm、にクロス切断)して、多数の積層スモールブロックを得る。次に、得られた各積層スモールブロックについて、積層スモールブロックの状態で、一括して、面取り加工を施した後、水に必要時間浸して紫外線硬化樹脂を膨潤させ、1枚1枚が剥がれる状態にし、各基板を分離した後、洗浄を行い、全数検査を行う。これにより、所定の大きさに切断された光学フィルターなどの光学素子が得られる。
An optical element such as an optical filter can be obtained by cutting the glass member with an optical multilayer film into a predetermined size.
An outline of a method for manufacturing an optical element such as an optical filter by cutting the glass member into a predetermined size will be described.
For example, about 50 glass substrates on which various optical thin films are formed on a fluorophosphate glass having a size of 90 mm × 90 mm and a thickness of 0.5 mm prepared by precision polishing are prepared, and these are UV curable resin (peeled with water). Laminated large blocks are laminated by being bonded to each other with an adhesive). Next, this laminated large block is cross-cut in the stacking direction vertically and horizontally (for example, 4.5 mm × 4.5 mm, 14 mm × 14 mm, 20 mm × 20 mm, cross-cut) to obtain a large number of stacked small blocks. Next, for each of the obtained laminated small blocks, in a state of the laminated small block, after chamfering all at once, the ultraviolet cured resin is swollen by immersing in water for a required time, and each piece is peeled off Then, after separating each substrate, cleaning is performed and 100% inspection is performed. Thereby, an optical element such as an optical filter cut to a predetermined size is obtained.

光学フィルターなどの光学素子の用途としては、携帯電話、デジタルカメラ、ビデオカメラ等で使用することができる。
光学フィルターなどの光学素子のサイズは、携帯電話用途の場合4〜7mm×4〜7mm程度、小型デジタルカメラ用途の場合8〜14mm×8〜14mm程度が一般的である。
Applications of optical elements such as optical filters can be used in mobile phones, digital cameras, video cameras, and the like.
The size of an optical element such as an optical filter is generally about 4 to 7 mm × 4 to 7 mm for mobile phone use, and about 8 to 14 mm × 8 to 14 mm for small digital camera use.

次に、本発明の実施例について説明する。
(実施例1)(反射防止膜付き近赤外光吸収フィルター)
精密研磨してなる大きさ90mm×90mm、厚さ0.5mmの複数枚の弗燐酸塩ガラス上に、それぞれ、真空蒸着法により密着強化膜である弗化マグネシウム(MgF)を膜厚18nm形成した後、同じく真空蒸着法により酸化アルミニウム(Al)(膜厚67nm)/酸化ジルコニウム(ZrO)(膜厚130nm)/弗化マグネシウム(MgF)(膜厚98nm)を基板側から順次積層してなる反射防止膜を形成して、反射防止膜付きガラス基板を複数枚得た。この光学特性は、図1に示すように約430nm〜約640nmの可視領域での反射率が0.1%以下と良好であった。また、図1に示すように、密着強化膜を形成しない比較例1と比べ、密着強化膜を介在させているにもかかわらず、反射率が僅かながらも低下し反射率の増加などの悪影響はないことがわかった。
得られた複数枚の反射防止膜付きガラス基板を積層して、大きさ5mm×5mmに切断した後、超音波洗浄を行い携帯電話用途に使用する反射防止膜付き近赤外光吸収フィルター(反射防止膜付き色補正用フィルター)を980枚得た。
この得られた反射防止膜付き近赤外光吸収フィルターについて全数検査したところ、基板に大きな反りを生じていたが膜剥がれは確認されなかった。また、密着強度試験(JISZ1522に規定された粘着テープで幅12〜19mmのものを、反射防止膜に貼り付ける。次にこの粘着テープを反射防止膜の膜面と垂直になように強く引っ張り、粘着テープを瞬間に引き剥がす試験方法)をした後においても膜剥がれは確認されなかった。
さらに、高温高湿耐久試験(条件;温度:60℃×湿度:90%×時間:1000時間)をした後においても膜剥がれは確認されなかった。また、再現性の確認として、蒸着ロットの異なるガラス基板を用いて同じ高温高湿耐久試験を5回行っても膜剥がれは確認されなかった。
Next, examples of the present invention will be described.
(Example 1) (Near-infrared light absorption filter with antireflection film)
Forming 18 nm thick magnesium fluoride (MgF 2 ), which is an adhesion-strengthening film, on a plurality of fluorophosphate glasses 90 mm × 90 mm in size and 0.5 mm in thickness by precision polishing, respectively, by vacuum deposition After that, aluminum oxide (Al 2 O 3 ) (film thickness: 67 nm) / zirconium oxide (ZrO 2 ) (film thickness: 130 nm) / magnesium fluoride (MgF 2 ) (film thickness: 98 nm) are similarly applied from the substrate side by vacuum deposition. A plurality of glass substrates with antireflection films were obtained by sequentially forming an antireflection film formed by laminating. As shown in FIG. 1, this optical characteristic was good with a reflectance of 0.1% or less in a visible region of about 430 nm to about 640 nm. In addition, as shown in FIG. 1, compared with Comparative Example 1 in which no adhesion enhancing film is formed, although the adhesion enhancing film is interposed, the reflectance is slightly decreased and adverse effects such as an increase in reflectance are not caused. I knew it was n’t there.
The obtained glass substrates with antireflection films are laminated, cut into a size of 5 mm x 5 mm, and then subjected to ultrasonic cleaning to use a near infrared light absorption filter with an antireflection film (reflection) for use in mobile phones. 980 sheets of color correction filters with a protective film were obtained.
When all the obtained near-infrared light absorbing filters with antireflection films were inspected, the substrate was greatly warped, but no film peeling was confirmed. Adhesion strength test (adhesive tape specified in JISZ1522 having a width of 12 to 19 mm is attached to the antireflection film. Next, the adhesive tape is pulled strongly so as to be perpendicular to the film surface of the antireflection film. Even after the test method of peeling the adhesive tape instantly), no film peeling was confirmed.
Furthermore, even after the high temperature and high humidity durability test (conditions: temperature: 60 ° C. × humidity: 90% × time: 1000 hours), no film peeling was confirmed. Moreover, as confirmation of reproducibility, film peeling was not confirmed even when the same high-temperature and high-humidity durability test was performed 5 times using glass substrates with different deposition lots.

(実施例2)(IRカット膜付き近赤外光吸収フィルター)
精密研磨してなる大きさ90mm×90mm、厚さ0.5mmの弗燐酸塩ガラス上に、真空蒸着法により密着強化膜である弗化マグネシウム(MgF)を膜厚18nm形成した後、同じく真空蒸着法によりTiO/SiOを積層単位とし、これを13層積層してなる赤外線遮断膜(IRカット膜)を形成して、IRカット膜付きガラス基板を得た。尚、このIRカット膜は、50%透過率の半値波長が650nmのIRカット膜である。
この光学特性は、図2に示すように約700nm〜約900nmの赤外域の光を極力遮断する(透過率約0.1%以下)ものであった。また、図2に示すように、密着強化膜を形成しない比較例2と比べ、透過率特性に実質的な差異はなく(実施例2と比較例2の透過率曲線は実質的に重なり違いが認められない)、密着強化膜の介在による透過率特性への影響は全く認められなかった。
得られた近赤外線遮断膜付きガラス基板を、大きさ7.5mm×7.5mmに切断した後、超音波洗浄を行いIRカット膜付き近赤外光吸収フィルター(IRカット膜付き色補正用フィルター)を500枚得た。
この得られたIRカット膜付き近赤外光吸収フィルターについて全数検査したところ、基板に大きな反りを生じていたが膜剥がれは確認されなかった。また、上述の実施例1と同様に密着強度試験、高温高湿耐久試験を行ったが、膜剥がれは確認されなかった。また、再現性の確認として、蒸着ロットの異なるガラス基板を用いて同じ高温高湿耐久試験を5回行っても膜剥がれは確認されなかった。
(Example 2) (Near-infrared absorption filter with IR cut film)
A magnesium fluoride (MgF 2 ) film, which is an adhesion-strengthening film, is formed on a 90 mm × 90 mm, 0.5 mm thick fluorophosphate glass that has been precisely polished by vacuum deposition, and then vacuumed. An infrared shielding film (IR cut film) formed by laminating 13 layers of TiO 2 / SiO 2 as a lamination unit by a vapor deposition method was formed to obtain a glass substrate with an IR cut film. This IR cut film is an IR cut film having a half-value wavelength of 50% transmittance and 650 nm.
As shown in FIG. 2, this optical characteristic was such that light in the infrared region of about 700 nm to about 900 nm was blocked as much as possible (transmittance of about 0.1% or less). Further, as shown in FIG. 2, there is no substantial difference in transmittance characteristics as compared with Comparative Example 2 in which no adhesion enhancing film is formed (the transmittance curves of Example 2 and Comparative Example 2 are substantially different from each other). No effect was observed on the transmittance characteristics due to the presence of the adhesion enhancing film.
The obtained glass substrate with a near-infrared shielding film was cut into a size of 7.5 mm × 7.5 mm, and then subjected to ultrasonic cleaning, and a near-infrared light absorption filter with an IR-cut film (color correction filter with an IR-cut film) ) Was obtained.
When the obtained near-infrared light-absorbing filter with an IR cut film was inspected 100%, the substrate was greatly warped, but no film peeling was confirmed. Moreover, although the adhesion strength test and the high-temperature, high-humidity durability test were conducted in the same manner as in Example 1, no film peeling was confirmed. Moreover, as confirmation of reproducibility, film peeling was not confirmed even when the same high-temperature and high-humidity durability test was performed 5 times using glass substrates with different deposition lots.

(比較例1、2)
上述の実施例において、密着強化膜である弗化マグネシウム(MgF)を形成しなかったこと以外は実施例1、2と同様にして近赤外光吸収フィルターを作製した。
得られた近赤外光吸収フィルターについて、製造過程(切断、超音波洗浄工程)において、1000枚中50枚が光学多層膜の膜剥がれが発生した。また、上述の実施例1と同様に密着強度試験、高温高湿耐久試験を行ったが、膜剥がれが多数確認された。
(Comparative Examples 1 and 2)
A near-infrared light absorbing filter was produced in the same manner as in Examples 1 and 2 except that magnesium fluoride (MgF 2 ), which is an adhesion enhancing film, was not formed in the above-described Examples.
Regarding the obtained near-infrared light absorbing filter, in the manufacturing process (cutting, ultrasonic cleaning step), 50 of 1000 sheets were peeled off from the optical multilayer film. Further, an adhesion strength test and a high temperature and high humidity durability test were conducted in the same manner as in Example 1 above, and many film peelings were confirmed.

(実施例3)(反射防止膜/弗燐酸塩ガラス基板/IRカット膜の構造の光学素子)
図3に示すように、精密研磨してなる大きさ90mm×90mm、厚さ0.5mmの弗燐酸塩ガラス基板1の一方の面上に、真空蒸着法により密着強化膜2である弗化マグネシウム(MgF)を膜厚18nm形成した後、同じく真空蒸着法により酸化アルミニウム(Al)(膜厚67nm)/酸化ジルコニウム(ZrO)(膜厚130nm)/弗化マグネシウム(MgF)(膜厚98nm)を基板側から順次積層してなる反射防止膜3を形成した。更に、この反射防止膜3を形成した弗燐酸塩ガラス基板1の他方の面(反射防止膜3を形成した面とは反対側の面)上に、真空蒸着法により密着強化膜2である弗化マグネシウム(MgF)を膜厚18nm形成した後、同じく真空蒸着法によりTiO/SiOを積層単位とし、これを13層積層してなるIRカット膜4を形成して、弗燐酸塩ガラス基板の一方の面に反射防止膜を形成し他方の面にIRカット膜を形成したガラス基板を50枚得た。
得られたガラス基板(反射防止膜/密着強化膜/弗燐酸塩ガラス基板/密着強化膜/IRカット膜)50枚を、紫外線硬化樹脂(水で剥がれる接着剤)で互いに接着して積層した積層ラージブロックとする。次いで、この積層ラージブロックを、積層方向に縦横にクロス切断(7.5mm×7.5mm)して、多数の積層スモールブロックを得る。次に、得られた各積層スモールブロックについて、積層スモールブロックの状態で、一括して、面取り加工を施した後、水に必要時間浸して紫外線硬化樹脂を膨潤させ、1枚1枚が剥がれる状態にし、各基板を分離した後、超音波洗浄を行い、反射防止膜及びIRカット膜付き近赤外光吸収フィルター(色補正用フィルター)を5000枚得た。
なお、上記反射防止膜及びIRカット膜をそれぞれ形成した時点で、基板に反り量と反りの方向が異なる反りが生じたが、各時点で膜剥がれは確認されず、基板の反りに起因する膜剥がれは確認されなかった。
上記で得られた反射防止膜及びIRカット膜付き近赤外光吸収フィルターについて全数検査したところ、基板に大きな反りを生じていたがいずれの面においても膜剥がれは確認されなかった。また、上述の実施例1と同様に密着強度試験、高温高湿耐久試験を行ったが、いずれの面においても膜剥がれは確認されなかった。
Example 3 (Optical element having a structure of antireflection film / fluorophosphate glass substrate / IR cut film)
As shown in FIG. 3, on one surface of a fluorinated glass substrate 1 having a size of 90 mm × 90 mm and a thickness of 0.5 mm obtained by precision polishing, magnesium fluoride as an adhesion strengthening film 2 is formed by vacuum deposition. after the (MgF 2) with a thickness of 18nm formed, aluminum oxide by vacuum deposition similarly (Al 2 O 3) (thickness 67 nm) / zirconium oxide (ZrO 2) (film thickness 130 nm) / magnesium fluoride (MgF 2) An antireflection film 3 was formed by sequentially laminating (film thickness 98 nm) from the substrate side. Further, the fluorine fluoride glass substrate 1 on which the antireflection film 3 is formed is formed on the other surface of the fluorophosphate glass substrate 1 (the surface opposite to the surface on which the antireflection film 3 is formed) by the vacuum deposition method. After forming magnesium oxide (MgF 2 ) to a thickness of 18 nm, an IR cut film 4 is formed by laminating 13 layers of TiO 2 / SiO 2 in the same manner by vacuum deposition, and a fluorophosphate glass 50 glass substrates having an antireflection film formed on one surface of the substrate and an IR cut film formed on the other surface were obtained.
A laminate in which 50 glass substrates (antireflection film / adhesion-enhancement film / fluorophosphate glass substrate / adhesion-enhancement film / IR cut film) obtained were adhered and laminated together with an ultraviolet curable resin (adhesive that peels off with water). Large block. Next, this laminated large block is cross-cut (7.5 mm × 7.5 mm) vertically and horizontally in the laminating direction to obtain a large number of laminated small blocks. Next, for each of the obtained laminated small blocks, in a state of the laminated small block, after chamfering all at once, the ultraviolet cured resin is swollen by immersing in water for a required time, and each piece is peeled off After separating each substrate, ultrasonic cleaning was performed to obtain 5000 near-infrared light absorption filters (color correction filters) with an antireflection film and an IR cut film.
In addition, when the antireflection film and the IR cut film were respectively formed, warpage in which the warpage amount and the warpage direction were different occurred in the substrate, but film peeling was not confirmed at each time point, and the film was caused by warpage of the substrate. No peeling was confirmed.
When 100% inspection was performed on the near-infrared light absorbing filter with the antireflection film and IR cut film obtained above, the substrate was greatly warped, but no film peeling was observed on any surface. Moreover, although the adhesion strength test and the high-temperature, high-humidity durability test were conducted in the same manner as in Example 1 above, no film peeling was confirmed on any surface.

(実施例4)
上述の実施例3において、弗燐酸塩ガラス基板として、特開2004−83290公報記載の弗燐酸塩ガラス基板であって、カチオン%表示でP5が20〜40%含まれる弗燐酸塩ガラス基板(具体的には、図4に示す各組成を有し、熱膨張係数が150〜180×10−7/℃(0〜300℃)の範囲内の5点、具体的には150×10−7/℃、160×10−7/℃、165×10−7/℃、170×10−7/℃、180×10−7/℃、であるガラス基板)を使用したこと、以外は、実施例3と同様にして、反射防止膜/弗燐酸塩ガラス基板/IRカット膜の構造の反射防止膜及びIRカット膜付き近赤外光吸収フィルター(色補正用フィルター)を、各熱膨張係数についてそれぞれ5000枚作製した。
なお、各熱膨張係数のそれぞれについて、上記反射防止膜及びIRカット膜をそれぞれ形成した時点で、基板に反り量と反りの方向が異なる反りが生じたが、各時点で膜剥がれは確認されず、基板の反りに起因する膜剥がれは確認されなかった。
上記で得られた反射防止膜及びIRカット膜付き近赤外光吸収フィルターについて全数検査したところ、各熱膨張係数のそれぞれについて、いずれの面においても膜剥がれは確認されなかった。また、上述の実施例1と同様に密着強度試験、高温高湿耐久試験を行ったが、各熱膨張係数のそれぞれについて、いずれの面においても膜剥がれは確認されなかった。
なお、本実施例で使用した弗燐酸塩ガラス基板は、熱膨張係数が高い場合(具体的には熱膨張係数:165〜180×10−7/℃(0〜300℃)の場合)が含まれるにもかかわらず、このような熱膨張係数が高い場合においても膜剥がれが全く生じないことがわかった。このように熱膨張係数が高い場合においても膜剥がれが全く生じないことから、上記組成の弗燐酸塩ガラス基板は、本願発明の密着強化膜との密着力に特に優れることがわかる。この理由は、本実施例で使用した組成の弗燐酸塩ガラス基板のガラス組成やガラス界面(基板と膜との結合力に影響を及ぼす因子、例えば分子間力、官能基等)に基づく因子が本願発明の密着強化膜との密着力強化に寄与しているからでなないかと考えられる。
なお、上述の実施例3及び4において、それぞれ、真空蒸着法によりTiO/SiOを積層単位とし、これを40層又は60層積層してなるIRカット膜4をそれぞれ形成したこと、以外は、実施例3と同様にして、反射防止膜及びIRカット膜付き近赤外光吸収フィルター(色補正用フィルター)を作成し、同様の試験を行った結果、上述の実施例3及び4と同様の結果が得られ、40層、更には60層の光学多層膜を形成した場合であっても、光学多層膜の膜剥がれが生じないことが、確認された。
Example 4
In Example 3 described above, as a fluorophosphate glass substrate, a fluorophosphate glass substrate described in JP-A-2004-83290, which contains 20 to 40% of P5 + in terms of cation% ( Specifically, it has each composition shown in FIG. 4, and has a thermal expansion coefficient of 150 to 180 × 10 −7 / ° C. (0 to 300 ° C.), specifically, 150 × 10 −7. Except for using a glass substrate that is / 10 ° C, 160 × 10 −7 / ° C., 165 × 10 −7 / ° C., 170 × 10 −7 / ° C., 180 × 10 −7 / ° C. In the same manner as in No. 3, an antireflection film having an antireflection film / fluorophosphate glass substrate / IR cut film structure and a near infrared light absorption filter (color correction filter) with an IR cut film for each thermal expansion coefficient 5000 sheets were produced.
For each thermal expansion coefficient, when the antireflection film and the IR cut film were formed, the substrate was warped in a different amount and direction, but no film peeling was confirmed at each time point. The film peeling due to the warpage of the substrate was not confirmed.
When the antireflection film and the near-infrared light absorbing filter with an IR cut film obtained above were inspected, no film peeling was confirmed on any surface for each coefficient of thermal expansion. Further, the adhesion strength test and the high temperature and high humidity durability test were performed in the same manner as in Example 1 described above, but no film peeling was observed on any surface for each of the thermal expansion coefficients.
The fluorophosphate glass substrate used in this example includes a case where the thermal expansion coefficient is high (specifically, the case where the thermal expansion coefficient is 165 to 180 × 10 −7 / ° C. (0 to 300 ° C.)). Nevertheless, it has been found that even when such a thermal expansion coefficient is high, film peeling does not occur at all. Thus, even when the thermal expansion coefficient is high, film peeling does not occur at all. Thus, it can be seen that the fluorophosphate glass substrate having the above composition is particularly excellent in adhesion with the adhesion reinforcing film of the present invention. This is because the glass composition of the fluorophosphate glass substrate having the composition used in this example and the factor based on the glass interface (factors affecting the bonding force between the substrate and the film, such as intermolecular forces, functional groups, etc.) It is thought that this is because it contributes to the enhancement of adhesion with the adhesion-strengthening film of the present invention.
In Examples 3 and 4 described above, except that each of the IR cut films 4 was formed by stacking 40 or 60 layers of TiO 2 / SiO 2 as a stack unit by vacuum deposition. In the same manner as in Example 3, a near-infrared light absorption filter (color correction filter) with an antireflection film and an IR cut film was prepared, and the same test was performed. As a result, the same as in Examples 3 and 4 above. As a result, it was confirmed that even when 40 or 60 optical multilayer films were formed, the optical multilayer film did not peel off.

(実施例5〜8)
上述の実施例1、2における密着強化膜を、弗化カルシウム(CaF)(実施例5)、弗化ランタン(LaF)(実施例6)、弗化ネオジウム(NdF)(実施例7)、弗化セリウム(CeF)(実施例8)にし、膜厚を18nmにしたこと以外は、実施例1、2と同様にして色補正用フィルターを作製した。尚、密着強化膜上に形成する光学多層膜は、密着強化膜材料の屈折率と膜厚を考慮し、適宜膜厚を調整して作製した。
上述と同様の密着強度試験、高温高湿耐久試験を行ったが、いずれの試験においても膜剥がれは確認されず良好な結果が得られた。
(Examples 5 to 8)
The adhesion-strengthening films in Examples 1 and 2 are calcium fluoride (CaF 2 ) (Example 5), lanthanum fluoride (LaF 2 ) (Example 6), neodymium fluoride (NdF 3 ) (Example 7). ), Cerium fluoride (CeF 3 ) (Example 8), and a film for color correction was prepared in the same manner as in Examples 1 and 2 except that the film thickness was 18 nm. The optical multilayer film formed on the adhesion reinforcing film was prepared by appropriately adjusting the film thickness in consideration of the refractive index and film thickness of the adhesion reinforcing film material.
The adhesion strength test and the high-temperature and high-humidity durability test similar to those described above were performed, but no film peeling was confirmed in any of the tests, and good results were obtained.

本発明の光学多層膜付きガラス部材及び該ガラス部材を用いた光学素子は、デジタルカメラ、ビデオカメラなどに搭載されるCCDやCMOSなどの固体撮像素子の色感度補正フィルターや、CCDやCMOSなどの固体撮像素子をパッケージする際に使われるカバーガラス、ローパスフィルター、熱線フィルターや、その他の光学多層膜光部品などの高耐久性を要求される光学素子等に、利用できる。   The glass member with an optical multilayer film of the present invention and the optical element using the glass member include a color sensitivity correction filter of a solid-state imaging device such as a CCD or CMOS mounted on a digital camera, a video camera, or the like, a CCD or CMOS, etc. It can be used for optical elements that require high durability, such as cover glasses, low-pass filters, heat ray filters, and other optical multilayer optical components used when packaging solid-state imaging elements.

実施例1及び比較例1で得られた反射防止膜付き近赤外光吸収フィルターの光学特性(波長−反射率)を示す図である。It is a figure which shows the optical characteristic (wavelength-reflectance) of the near-infrared-light absorption filter with an antireflection film obtained in Example 1 and Comparative Example 1. 実施例2及び比較例2で得られたIRカット膜付き近赤外光吸収フィルターの光学特性(波長−透過率)を示す図である。It is a figure which shows the optical characteristic (wavelength-transmittance) of the near-infrared-light absorption filter with an IR cut film obtained in Example 2 and Comparative Example 2. 実施例3で作製した反射防止膜及びIRカット膜付き近赤外光吸収フィルターの構造を説明するための模式図である。It is a schematic diagram for demonstrating the structure of the near-infrared-light absorption filter with an antireflection film and IR cut film which were produced in Example 3. FIG. 実施例4で使用した弗燐酸塩ガラス基板の組成及び熱膨張係数を示す図である。It is a figure which shows the composition and thermal expansion coefficient of a fluorophosphate glass substrate used in Example 4.

符号の説明Explanation of symbols

1 弗燐酸塩ガラス基板
2 密着強化膜
3 反射防止膜
4 IRカット膜
DESCRIPTION OF SYMBOLS 1 Fluorophosphate glass substrate 2 Adhesion reinforcement film 3 Antireflection film 4 IR cut film

Claims (5)

弗燐酸塩ガラス基板上に光学多層膜が形成された光学多層膜付きガラス部材であって、
前記弗燐酸塩ガラス基板と前記光学多層膜との間に、弗素(F)を含み前記弗燐酸塩ガラス基板に対する前記光学多層膜の密着性を向上させる密着強化膜が形成されていることを特徴とする光学多層膜付きガラス部材。
A glass member with an optical multilayer film in which an optical multilayer film is formed on a fluorophosphate glass substrate,
An adhesion reinforcing film containing fluorine (F) and improving the adhesion of the optical multilayer film to the fluorophosphate glass substrate is formed between the fluorophosphate glass substrate and the optical multilayer film. A glass member with an optical multilayer film.
前記密着強化膜は、弗化マグネシウム(MgF)、弗化カルシウム(CaF)、弗化ランタン(LaF)、弗化ネオジウム(NdF)、弗化セリウム(CeF)の何れかから選ばれる材料であることを特徴とする請求項1記載の光学多層膜付きガラス部材。 The adhesion reinforcing film is selected from any of magnesium fluoride (MgF 2 ), calcium fluoride (CaF 2 ), lanthanum fluoride (LaF 3 ), neodymium fluoride (NdF 3 ), and cerium fluoride (CeF 3 ). The glass member with an optical multilayer film according to claim 1, wherein the glass member is a material to be manufactured. 前記密着強化膜の膜厚は、前記ガラス基板の主表面を覆うことが可能な膜厚以上であって、前記光学多層膜の光学特性に影響を与えない膜厚以下であることを特徴とする請求項1又は2記載の光学多層膜付きガラス部材。 The adhesion reinforcing film has a film thickness that is not less than a film thickness that can cover the main surface of the glass substrate and that does not affect the optical characteristics of the optical multilayer film. The glass member with an optical multilayer film according to claim 1 or 2. 前記弗燐酸塩ガラス基板は、カチオン%表示で、P5+が20〜40%含まれる材料からなることを特徴とする請求項1乃至3の何れか一に記載の光学多層膜付きガラス部材。 4. The glass member with an optical multilayer film according to claim 1, wherein the fluorophosphate glass substrate is made of a material containing 20 to 40% of P 5+ in terms of cation%. 5. 請求項1乃至4の何れか一に記載の光学多層膜付きガラス部材を所定の大きさに切断してなる光学素子。 An optical element formed by cutting the glass member with an optical multilayer film according to any one of claims 1 to 4 into a predetermined size.
JP2004215338A 2004-07-23 2004-07-23 Glass member with optical multilayer film, and optical element using the glass member Expired - Lifetime JP4447393B2 (en)

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JP2008249923A (en) * 2007-03-30 2008-10-16 Agc Techno Glass Co Ltd Glass member with optical multilayer film, and method for manufacturing glass member with optical multilayer film
JP2010269389A (en) * 2009-05-20 2010-12-02 Shoda Techtron Corp End face machining method of plate glass
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JP2007039287A (en) * 2005-08-04 2007-02-15 Fujinon Sano Kk Method for chamfering substrate and method for manufacturing optical component
JP2008249923A (en) * 2007-03-30 2008-10-16 Agc Techno Glass Co Ltd Glass member with optical multilayer film, and method for manufacturing glass member with optical multilayer film
JP2010269389A (en) * 2009-05-20 2010-12-02 Shoda Techtron Corp End face machining method of plate glass
US20100330378A1 (en) * 2009-06-26 2010-12-30 Asahi Glass Company, Limited Optical element and method for producing the same
JP2011008076A (en) * 2009-06-26 2011-01-13 Asahi Glass Co Ltd Optical element and method for producing the same
US8652614B2 (en) * 2009-06-26 2014-02-18 Asahi Glass Company, Limited Optical element and method for producing the same
JPWO2013077375A1 (en) * 2011-11-21 2015-04-27 旭硝子株式会社 Glass member with optical multilayer film and near infrared cut filter glass
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CN103403584A (en) * 2011-11-21 2013-11-20 旭硝子株式会社 Glass member with optical multilayer film, and near-infrared cut filter glass
WO2014084288A1 (en) * 2012-11-30 2014-06-05 富士フイルム株式会社 Curable resin composition, and image-sensor-chip production method and image sensor chip using same
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CN105204448A (en) * 2014-06-11 2015-12-30 北大方正集团有限公司 Monitoring system and method
CN105204448B (en) * 2014-06-11 2018-02-16 北大方正集团有限公司 A kind of monitoring system and method

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