JP2006024706A5 - - Google Patents
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- Publication number
- JP2006024706A5 JP2006024706A5 JP2004200917A JP2004200917A JP2006024706A5 JP 2006024706 A5 JP2006024706 A5 JP 2006024706A5 JP 2004200917 A JP2004200917 A JP 2004200917A JP 2004200917 A JP2004200917 A JP 2004200917A JP 2006024706 A5 JP2006024706 A5 JP 2006024706A5
- Authority
- JP
- Japan
- Prior art keywords
- optical surface
- substrate
- protection member
- exposure apparatus
- surface protection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004200917A JP4444743B2 (ja) | 2004-07-07 | 2004-07-07 | 露光装置及びデバイス製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004200917A JP4444743B2 (ja) | 2004-07-07 | 2004-07-07 | 露光装置及びデバイス製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2006024706A JP2006024706A (ja) | 2006-01-26 |
JP2006024706A5 true JP2006024706A5 (fr) | 2007-08-23 |
JP4444743B2 JP4444743B2 (ja) | 2010-03-31 |
Family
ID=35797772
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004200917A Expired - Fee Related JP4444743B2 (ja) | 2004-07-07 | 2004-07-07 | 露光装置及びデバイス製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4444743B2 (fr) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101547077B1 (ko) | 2003-04-09 | 2015-08-25 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
TWI360158B (en) | 2003-10-28 | 2012-03-11 | Nikon Corp | Projection exposure device,exposure method and dev |
TWI512335B (zh) | 2003-11-20 | 2015-12-11 | 尼康股份有限公司 | 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法 |
TWI609410B (zh) | 2004-02-06 | 2017-12-21 | 尼康股份有限公司 | 光學照明裝置、曝光裝置、曝光方法以及元件製造方法 |
EP3098835B1 (fr) * | 2004-06-21 | 2017-07-26 | Nikon Corporation | Dispositif d'exposition, procédé d'exposition et procédé de fabrication de dispositif |
JP4961709B2 (ja) * | 2004-10-13 | 2012-06-27 | 株式会社ニコン | 露光装置、露光方法及びデバイス製造方法 |
US7583357B2 (en) * | 2004-11-12 | 2009-09-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP1821337B1 (fr) | 2004-12-06 | 2016-05-11 | Nikon Corporation | Procédé de maintenance |
US7324185B2 (en) | 2005-03-04 | 2008-01-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8248577B2 (en) | 2005-05-03 | 2012-08-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR20140140648A (ko) | 2005-05-12 | 2014-12-09 | 가부시키가이샤 니콘 | 투영 광학계, 노광 장치 및 노광 방법 |
JP5267029B2 (ja) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | 照明光学装置、露光装置及びデバイスの製造方法 |
US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
US20110199591A1 (en) * | 2009-10-14 | 2011-08-18 | Nikon Corporation | Exposure apparatus, exposing method, maintenance method and device fabricating method |
JP2012078439A (ja) * | 2010-09-30 | 2012-04-19 | Olympus Corp | 液浸対物レンズ及びそれを用いた倒立顕微鏡 |
US9720331B2 (en) * | 2012-12-27 | 2017-08-01 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium |
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2004
- 2004-07-07 JP JP2004200917A patent/JP4444743B2/ja not_active Expired - Fee Related
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