JP2006016289A - Method for sealing mating faces of glass and the like - Google Patents
Method for sealing mating faces of glass and the like Download PDFInfo
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- JP2006016289A JP2006016289A JP2004222623A JP2004222623A JP2006016289A JP 2006016289 A JP2006016289 A JP 2006016289A JP 2004222623 A JP2004222623 A JP 2004222623A JP 2004222623 A JP2004222623 A JP 2004222623A JP 2006016289 A JP2006016289 A JP 2006016289A
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Abstract
Description
本発明は、ガラスのシーリング部に蒸着鍍金又はスクリーン印刷により前処理を行い、ガラスに鉛を含まない金属を使用して接着あるいわガラスの周囲をシーリングしてテレビのブラウン管や真空容器又はガス封印容器を製作する技術分野に関するものである。 The present invention performs pre-treatment by vapor deposition plating or screen printing on the glass sealing portion, and seals the periphery of the so-called glass using a metal that does not contain lead in the glass, so that the cathode ray tube, vacuum vessel or gas seal of the television is sealed. It relates to the technical field of manufacturing containers.
従来の技術において、300℃付近での接着及びシーリングは、鉛を使用したハンダ又は鉛・ガラスフリットが主流であったが環境問題により鉛の使用ができなくなってきている。In the prior art, solder and lead / glass frit using lead are mainly used for bonding and sealing at around 300 ° C. However, lead cannot be used due to environmental problems.
最近では金属材料として金属シール材にインジウムが使用されるようになった。しかし資源が乏しく高価なために使用が限られている。Recently, indium has been used as a metal sealing material as a metal material. However, its use is limited due to scarce and expensive resources.
金属材料に変わるものとして樹脂を使用して接着やシールをする方法が開発されつつあるが、シールに用いると過熱によりガスが発生し、高真空度を要求される結合にはシール効果がなく,信頼性の高い金属によるシールに代わるには至っていない。A method of bonding and sealing using resin as an alternative to metallic materials is being developed, but when used for sealing, gas is generated due to overheating, and there is no sealing effect for bonds that require high vacuum, It has not yet replaced a highly reliable metal seal.
鍍金でシールを行う方法もあるが、鍍金する製品を鍍金液に浸すため製品に水分及び鍍金液の影響がでるため採用されていない。There is also a method of sealing with a plating, but since the product to be plated is immersed in the plating solution, it is not adopted because the product is affected by moisture and plating solution.
a.環境問題になっている鉛を含んだハンダ及びフィラの使用が困難になってきているがガラス等の接着に無鉛金属を使用する有効な接着方法が開発されていない。
b.有機系接着剤を用いた接着では水分などの発生により電子部品に不具合が発生する。
c.シリコン系を用いた接着では、シール面に気泡が生じやすく高度な接着技術が要求され一般化していない。
d.鍍金による接着及びシールは、ニッケル等の材質を選択すると鍍金厚みによりガラスが破損し枠等に採用できない。
e.鍍金によるシールを行う場合、電解槽を使用した電気鍍金を行うため容器内部に水が混入し容器内部に部品を組み込んだ状態でシールできない。
無電解鍍金は、加熱冷却すると材料の熱膨張係数の違いから冷却時ガラスが破損する。
f.ガラス及び金属の接合を鉛以外の物で行うと材料の熱膨張係数の違いから冷却時ガラスが破損する。
以上のような欠点を解決するために本発明をした。a. Although it has become difficult to use solder and filler containing lead, which is an environmental problem, an effective bonding method using lead-free metal for bonding glass or the like has not been developed.
b. Bonding using an organic adhesive causes problems in electronic components due to the generation of moisture and the like.
c. In bonding using a silicon system, bubbles are likely to be generated on the sealing surface, and an advanced bonding technique is required and is not generalized.
d. For the bonding and sealing by plating, if a material such as nickel is selected, the glass is damaged due to the thickness of the plating and cannot be used for the frame.
e. When sealing by plating, since electroplating is performed using an electrolytic cell, it is not possible to seal in a state where water is mixed inside the container and parts are incorporated inside the container.
When the electroless plating is heated and cooled, the glass is damaged during cooling due to the difference in thermal expansion coefficient of the material.
f. If glass and metal are joined with something other than lead, the glass will be damaged during cooling due to the difference in the coefficient of thermal expansion of the material.
The present invention has been made to solve the above drawbacks.
ガラスのシーリング部に下地処理として蒸着鍍金により金、銀、ニッケルのいずれかを鍍金するか又はスクリーン印刷により銀ペイストを塗布、加熱処理する。蒸着鍍金及びスクリーン印刷に於いては鍍金厚が数ミクロン以下なので、ガラスに悪い影響を与えない、又電気鍍金に必要な電流を流すのに充分な厚さでもある。下地処理した二枚のガラスを重ね合わせ、銀、錫ハンダの溶解点である280〜300℃に加熱し、下地処理した表面を棒状の銀、錫ハンダを用いシーリングしたガラス。Either a gold paste, a silver paste, or a nickel paste is applied to the glass sealing portion as a base treatment by vapor deposition plating, or silver paste is applied by screen printing and heat-treated. In vapor deposition plating and screen printing, the thickness of the plating is less than a few microns so that it does not adversely affect the glass and is thick enough to pass the current required for electroplating. A glass in which two sheets of ground-treated glass are superposed, heated to 280 to 300 ° C., which is the melting point of silver and tin solder, and the ground-treated surface is sealed using rod-shaped silver and tin solder.
実施例1
図1は実施例1を示す断面図である。
二枚のガラス(1,2)のシーリング部に下地処理として蒸着鍍金により銀鍍金(3,4)する。下地処理した皮膜厚については特に限定はないが厚さが均一であり1アンペアの電流が流れれば充分である。鍍金の種類については、金、銀、ニッケルが下地処理として使用できることを確認している。なおスクリーン印刷は銀を確認の対象とした。下地処理した二枚の板ガラス(1,2)を重ね合わせ、銀錫ハンダの溶解点である280〜300℃に加熱する、この温度範囲以外でもよいが温度が低すぎるとハンダが溶けにくく、逆に高すぎると材料が酸化や気泡の発生原因となる、下地処理した表面を棒状の銀、錫ハンダを用いハンダ(5)付けする。使用したハンダは錫96.5%、銀3.5%から成る組成のものを用いた。配合割合を変えても接着は可能であり銀、錫を主成分とするものなら使用できる。
シーリングの方法として銀ロウ付けも行ったがガラスが破損した。Example 1
FIG. 1 is a cross-sectional view showing the first embodiment.
Silver plating (3, 4) is applied to the sealing part of the two glasses (1, 2) as a base treatment by vapor deposition plating. The thickness of the surface-treated film is not particularly limited, but it is sufficient if the thickness is uniform and a current of 1 ampere flows. As for the type of plating, it has been confirmed that gold, silver and nickel can be used as a base treatment. Screen printing was performed using silver. The two glass sheets (1, 2) that have been ground-treated are superposed and heated to 280 to 300 ° C., which is the melting point of silver tin solder. Other than this temperature range, if the temperature is too low, the solder is difficult to melt, If the surface is too high, the surface may be oxidized and bubbles may be generated, and the surface subjected to the ground treatment is soldered (5) using bar-shaped silver or tin solder. The solder used was composed of 96.5% tin and 3.5% silver. Adhesion is possible even if the blending ratio is changed, and any material containing silver or tin as a main component can be used.
Silver brazing was performed as a sealing method, but the glass was broken.
実施例2
図2は実施例2を示す断面図である。
容器(7)のシールに散気官を使用せず容器に3mm以下の穴を開けシーリング部に下地処理として蒸着鍍金により銀鍍金(3)する。又は、スクリーン印刷により銀を塗布する。3mm以下の穴を塞ぐ事ができる大きさの円盤状ガラス又は金属(8)に下地処理として蒸着鍍金により銀鍍金(4)する。又は、スクリーン印刷により銀を塗布する。円盤状ガラスまたは金属(8)に下地処理した表面を銀、錫ハンダで予めハンダ(6)付けする。容器(7)にオーバーコートした円盤(8)を重ね280〜300℃で加熱、接着する。使用したハンダは錫96.5%、銀3.5%から成る組成のものを用いた。配合割合を変えても接着は可能であり銀、錫を主成分とするものなら使用できる。Example 2
FIG. 2 is a cross-sectional view showing the second embodiment.
Without using an air diffuser to seal the container (7), a hole of 3 mm or less is made in the container, and silver plating (3) is performed by vapor deposition plating as a base treatment in the sealing portion. Alternatively, silver is applied by screen printing. Silver plating (4) is performed on the disk-shaped glass or metal (8) having a size capable of closing a hole of 3 mm or less by vapor deposition plating as a base treatment. Alternatively, silver is applied by screen printing. The surface of the disk-shaped glass or metal (8) that has been ground is preliminarily soldered (6) with silver or tin solder. The disc (8) overcoated on the container (7) is stacked and heated and bonded at 280 to 300 ° C. The solder used was composed of 96.5% tin and 3.5% silver. Adhesion is possible even if the blending ratio is changed, and any material containing silver or tin as a main component can be used.
実施例3
図3は実施例3を示す断面図である。製品の使用温度が300℃以上の熱に曝される場合は、ガラス(1,2)のシーリング部両面に下地処理として蒸着鍍金により銀鍍金(3,4)する。又は、スクリーン印刷により銀を塗布する。下地処理したガラス(1,2)を重ね下地処理皮膜に電解槽を使用せずに電気鍍金(9)を行う。鍍金する金属は、電極に脱脂綿等の吸水性の布を巻き、布に高濃度の電解液を含ませ、電極から布を通して電導性の下地表面に電流を流し、下地表面に金属を析出させる。使用する電流は直流、電圧は7〜16ボルト、電流は0.5〜2.5アンペアである。この鍍金方法を採用することにより容器内部に鍍金液を入れることなく鍍金(9)できる。熱膨張の影響及び下地処理に影響を与えない材質として銀、ニッケル−コバルトを確認した。Example 3
FIG. 3 is a cross-sectional view showing the third embodiment. When the product is exposed to heat of 300 ° C. or higher, silver plating (3, 4) is performed on both surfaces of the sealing portion of the glass (1, 2) by vapor deposition plating as a base treatment. Alternatively, silver is applied by screen printing. The glass (1, 2) subjected to the ground treatment is overlapped and electroplating (9) is performed on the ground treatment film without using an electrolytic cell. The metal to be plated is formed by winding a water-absorbing cloth such as absorbent cotton around the electrode, containing a high concentration electrolytic solution in the cloth, and passing a current from the electrode through the cloth to the conductive base surface to deposit the metal on the base surface. The current used is direct current, the voltage is 7-16 volts, and the current is 0.5-2.5 amps. By adopting this plating method, plating (9) can be performed without putting a plating solution into the container. Silver and nickel-cobalt were confirmed as materials that do not affect the effects of thermal expansion and the surface treatment.
実施例4
図4は実施例4を示す断面図である。ガラス(1)の枠作成部分に下地処理として蒸着鍍金により金、銀、ニッケル又はその合金のいずれかを銀鍍金(3)する。又は、スクリーン印刷により銀を塗布する。下地処理した皮膜に電気鍍金(10)を行う。鍍金の材質は、銀を用い厚さ0.02〜2mmの範囲で形成させた金属枠付きガラス。Example 4
FIG. 4 is a cross-sectional view showing the fourth embodiment. Silver (3) is plated with gold, silver, nickel, or an alloy thereof by vapor deposition plating as a base treatment on the frame forming portion of glass (1). Alternatively, silver is applied by screen printing. Electroplating (10) is performed on the surface-treated film. The material of the plating is a glass with a metal frame made of silver and having a thickness of 0.02 to 2 mm.
ハンダ付け又は電気鍍金の前処理として、蒸着鍍金により金、銀、ニッケル、又はその合金のいずれかを鍍金するか、又は、スクリーン印刷により銀を塗布することで、
a.ハンダによる無鉛金属で、ガラスの接着が出来るようになったので環境問題が解決した。
b.有機系接着剤やシリコン系接着剤を使用する必要が無くなったので水分や気泡による不具合が解決した。
c.電解槽を使用しない電気鍍金が行えるため、容器内部に部品を組み込んだ状態で鍍金シール出来るようになった。又、鍍金の材料として銀、ニッケルーコバルトを使用することで熱膨張係数の違いによるガラスの破損を防止することが出来る。
d.厚さ2mm以上の銀鍍金が可能になり構造部材の一部として使えるようになった。As a pretreatment for soldering or electroplating, either gold, silver, nickel, or an alloy thereof is plated by vapor deposition plating, or silver is applied by screen printing,
a. The lead-free metal by soldering has made it possible to bond glass, thus solving environmental problems.
b. Since there is no need to use organic adhesives or silicon adhesives, the problems caused by moisture and bubbles have been solved.
c. Since the electroplating can be performed without using an electrolytic cell, the plating can be sealed in a state in which components are incorporated inside the container. Further, the use of silver or nickel-cobalt as the plating material can prevent the glass from being damaged due to the difference in thermal expansion coefficient.
d. Silver plating with a thickness of 2 mm or more is possible, and it can be used as a part of structural members.
1,2 板ガラス
3,4 銀鍍金
5,6 ハンダ
7 容器
8 ガラス叉は金属
9 鍍金
10 電気鍍金1, 2
Claims (5)
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JP2004222623A JP2006016289A (en) | 2004-07-01 | 2004-07-01 | Method for sealing mating faces of glass and the like |
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JP2004222623A JP2006016289A (en) | 2004-07-01 | 2004-07-01 | Method for sealing mating faces of glass and the like |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014088316A (en) * | 2009-11-27 | 2014-05-15 | Luoyang Landglass Technology Co Ltd | Sealing method and sealed structure of vacuum glass suction hole |
US8943662B2 (en) | 2011-01-28 | 2015-02-03 | Raytheon Company | Method for gold removal from electronic components |
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2004
- 2004-07-01 JP JP2004222623A patent/JP2006016289A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014088316A (en) * | 2009-11-27 | 2014-05-15 | Luoyang Landglass Technology Co Ltd | Sealing method and sealed structure of vacuum glass suction hole |
US8943662B2 (en) | 2011-01-28 | 2015-02-03 | Raytheon Company | Method for gold removal from electronic components |
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