JP2006005276A - Arraying mask of conductive ball, and arraying apparatus using thereof - Google Patents

Arraying mask of conductive ball, and arraying apparatus using thereof Download PDF

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JP2006005276A
JP2006005276A JP2004182245A JP2004182245A JP2006005276A JP 2006005276 A JP2006005276 A JP 2006005276A JP 2004182245 A JP2004182245 A JP 2004182245A JP 2004182245 A JP2004182245 A JP 2004182245A JP 2006005276 A JP2006005276 A JP 2006005276A
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mask
opening
wafer
mounting table
arraying
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JP4348696B2 (en
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Masanori Ochiai
正典 落合
Motomichi Ito
元通 伊藤
Kenichi Kubo
賢一 久保
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Proterial Ltd
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Hitachi Metals Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
    • H01L24/741Apparatus for manufacturing means for bonding, e.g. connectors
    • H01L24/742Apparatus for manufacturing bump connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/11Manufacturing methods
    • H01L2224/11001Involving a temporary auxiliary member not forming part of the manufacturing apparatus, e.g. removable or sacrificial coating, film or substrate
    • H01L2224/11005Involving a temporary auxiliary member not forming part of the manufacturing apparatus, e.g. removable or sacrificial coating, film or substrate for aligning the bump connector, e.g. marks, spacers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/11Manufacturing methods
    • H01L2224/113Manufacturing methods by local deposition of the material of the bump connector
    • H01L2224/1133Manufacturing methods by local deposition of the material of the bump connector in solid form
    • H01L2224/11334Manufacturing methods by local deposition of the material of the bump connector in solid form using preformed bumps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01005Boron [B]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01006Carbon [C]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01029Copper [Cu]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01042Molybdenum [Mo]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01074Tungsten [W]

Abstract

<P>PROBLEM TO BE SOLVED: To provide an improved mask for arraying a conductive ball and an arraying apparatus using thereof. <P>SOLUTION: The mask for arraying the conductive ball on a body to be arrayed by a prescribed arraying pattern is provided with an opening which is formed corresponding to the array pattern, and which the conductive ball can be put through; a non-opening part; and a projecting part formed on one surface of the non-opening part. The projecting part is formed surrounding the opening end of the opening. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、導電性を有するボールを被配列体に配列するマスクおよびそれを用いた配列装置に関し、特に、被配列体として電子部品の接続バンプを形成するにあたり用いられる微小な半田ボールを電子部品に配列するのに好適なマスクおよびそれを用いた配列装置に係るものである。   The present invention relates to a mask for arranging conductive balls on an arrayed body and an arraying apparatus using the same, and more particularly, to a small solder ball used for forming a connection bump of an electronic component as the arrayed body. The present invention relates to a mask suitable for arranging in a mask and an arrangement apparatus using the mask.

近年、携帯端末機器やノート型パソコンの高速化・高機能化及び小型化・薄型化が進んでおり、それらに内蔵される半導体部品や半導体部品を実装する基板などの電子部品にも小型化・薄型化が要求されるとともに接続端子数を増加させるという相反する要求がなされている。そのような要求に応じるものとして接続バンプをエリアアレイに配列したBGA(Ball Grid Array)型又はFC(Flip Chip)型の電子部品がある。   In recent years, mobile terminal devices and notebook PCs have become faster, more functional, smaller, and thinner, and semiconductor components built into them and electronic components such as substrates on which semiconductor components are mounted are also becoming smaller and smaller. There is a conflicting demand for reducing the thickness and increasing the number of connection terminals. In response to such demands, there are BGA (Ball Grid Array) type or FC (Flip Chip) type electronic components in which connection bumps are arranged in an area array.

その接続バンプの製造方法として半田ボールを採用したボール方式がある。ボール方式によれば、電子部品において半田ボールが配列される電極にソルダーペースト又はフラックスを印刷する印刷工程と、ソルダーペースト又はフラックスが印刷された電極に半田ボールを配列する半田ボール配列工程と、半田ボールを加熱し溶解して接続バンプを形成する半田ボール加熱工程を経て接続バンプは製造される。   As a method for manufacturing the connection bump, there is a ball method using a solder ball. According to the ball system, a printing process for printing solder paste or flux on an electrode on which solder balls are arranged in an electronic component, a solder ball arranging process for arranging solder balls on an electrode printed with solder paste or flux, and solder The connection bumps are manufactured through a solder ball heating process in which the balls are heated and melted to form connection bumps.

その半田ボール配列工程において半田ボールを配列する方法として、吸着ヘッド方式とマスク配列方式が周知であり、後者の一例が下記特許文献1に記載されている。マスク配列方式は、電子部品の配列位置に対応し半田ボールが挿通可能に形成された開口部を有するマスクを電子部品に対して位置合わせをし、マスクの上に供給された半田ボールを例えばスキージを用いて移動させ開口部に充填し(この動作を振込みという。)電子部品に半田ボールを配列する方式である。   As a method for arranging solder balls in the solder ball arrangement process, a suction head method and a mask arrangement method are well known, and an example of the latter is described in Patent Document 1 below. In the mask arrangement method, a mask having an opening formed so that a solder ball can be inserted corresponding to the arrangement position of the electronic component is aligned with the electronic component, and the solder ball supplied on the mask is, for example, a squeegee. Is used to fill the opening (this operation is referred to as transfer) and to arrange the solder balls on the electronic component.

ここで、半田ボールを電子部品に正確に配列するためにはマスクを電子部品にできるだけ密着した状態となるように位置決めする必要がある。しかしながら、電子部品には、接続バンプのボイドレスや境界面強度の確保および半田ボールの仮止めの目的のために粘着膜であるフラックスが塗布されている。そのフラックスがマスクに付着すると電子部品からマスクが離れ難くなってしまい、無理にマスクを剥がそうとすると破損してしまうことがある。さらに、マスクの開口部は半田ボールより若干大きい程度の径であるため、マスクの開口部に半田ボールが充填される時に半田ボールで押し広げられたフラックスが開口部に付着し、付着したフラックスに半田ボールが捕捉され、電子部品に配列されないこともある。   Here, in order to accurately arrange the solder balls on the electronic component, it is necessary to position the mask so as to be in close contact with the electronic component as much as possible. However, the electronic component is coated with a flux, which is an adhesive film, for the purpose of ensuring the voids of the connection bumps, ensuring the interface strength, and temporarily fixing the solder balls. If the flux adheres to the mask, it becomes difficult to separate the mask from the electronic component, and if the mask is forcibly removed, the mask may be damaged. Further, since the opening of the mask is slightly larger in diameter than the solder ball, the flux spread by the solder ball adheres to the opening when the solder ball is filled into the opening of the mask. The solder balls may be captured and not arranged on the electronic component.

そこで、特許文献1のマスクの底面には、その非開口部が直接フラックスに接触しないようにマスクを支える凸部が形成されている。したがって、特許文献1のマスクによれば、マスクを電子部品に重ね合わせた時にマスクにフラックスが付着しにくいという利点がある。
特開2001−267731号公報(段落番号0024〜0026)
Therefore, a convex portion that supports the mask is formed on the bottom surface of the mask of Patent Document 1 so that the non-opening portion does not directly contact the flux. Therefore, according to the mask of Patent Document 1, there is an advantage that the flux does not easily adhere to the mask when the mask is overlaid on the electronic component.
JP 2001-267331 A (paragraph numbers 0024 to 0026)

例えばFC用の半田ボールのように100μm以下の直径のボールを配列しようとする場合、それを配列するためのマスクの厚みは100μm前後となる。一般に、フラックスは、50μm前後の厚みで電子部品に印刷される。したがって、フラックスが付着しないようにマスクに凸部を設けた場合、マスクの非開口部の厚みが50μm以下と非常に薄いものとなりマスクの剛性の低下を招く。剛性の低いマスクを使用した場合、例えば半田ボールを移動させるスキージの動作によって生じる力や周囲の温度変化などでマスクが歪みマスクの開口部に充填された半田ボールが位置ずれしたり、フラックスがマスクに付着する可能性がある。この問題は、フラックスをより薄く印刷するとか半田ボールより小面積となるように印刷することで解消される場合もあるが、印刷設備が複雑となり多額なコストと厳密な印刷条件の管理が必要となる。   For example, when trying to arrange a ball having a diameter of 100 μm or less like a solder ball for FC, the thickness of the mask for arranging it is about 100 μm. Generally, the flux is printed on an electronic component with a thickness of about 50 μm. Therefore, when the convex portion is provided on the mask so that the flux does not adhere, the thickness of the non-opening portion of the mask is as very thin as 50 μm or less, leading to a reduction in the rigidity of the mask. When a mask with low rigidity is used, the mask is distorted due to the force generated by the movement of the squeegee that moves the solder balls or the surrounding temperature changes. There is a possibility to adhere to. This problem may be resolved by printing the flux thinner or with a smaller area than the solder balls, but the printing equipment becomes complicated and requires a large amount of cost and strict management of printing conditions. Become.

本発明は、上記した問題を鑑みてなされたものであり、導電性ボールを配列するための改良されたマスクおよびそれを用いた配列装置を提供することを目的としている。
なお、本発明で言う導電性ボールとは、Sn又はCu、Au、Ag、W、Ni、Mo、Alなど金属を主体としたボール、又はポリプロピレン又はポリ塩化ビニル、ポリスチレン、ポリアミド、酢酸セルロース、ポリエステル系などの樹脂を主体とした球体の表面に半田などの導電性金属をコーティングしたボールのことである。また、本発明で言う被配列体とは、半導体装置(チップ)または基板、ウエハー、それらのパッケージ、その他の電子部品など接続バンプとして導電性ボールが採用される電子部品、又は電子部品に接続バンプを形成するための部材、例えば導電性ボールを電子部品に搭載するため該導電性ボールが配置される部材のことである。
The present invention has been made in view of the above-described problems, and an object thereof is to provide an improved mask for arranging conductive balls and an arrangement apparatus using the mask.
The conductive ball referred to in the present invention is a ball mainly composed of metal such as Sn or Cu, Au, Ag, W, Ni, Mo, Al, or polypropylene or polyvinyl chloride, polystyrene, polyamide, cellulose acetate, polyester. A ball in which a conductive metal such as solder is coated on the surface of a sphere mainly composed of a resin such as a resin. In addition, the arrayed body referred to in the present invention is an electronic component in which a conductive ball is used as a connection bump such as a semiconductor device (chip) or a substrate, a wafer, a package thereof, and other electronic components, or a connection bump on the electronic component. For example, a member on which the conductive ball is disposed in order to mount the conductive ball on the electronic component.

本発明の一態様は、所定の配列パターンで被配列体に導電性ボールを配列するためのマスクであって、前記配列パターンに対応し形成され前記導電性ボールが挿通可能な開口部と、非開口部と、前記非開口部の一方の面に形成された凸部とを備え、前記凸部は前記開口部の開口端の周囲に形成されているマスクである。このマスクによれば、例えば粘着膜が形成された被配列体にマスクを位置合わせする場合において、該粘着膜が接触しないようにマスクの凸部が形成される。その際、凸部は、マスクの開口部の開口端の周囲に形成されているので、非開口部において薄肉の部分が少ない所定の剛性を有するマスクを得ることができる。   One embodiment of the present invention is a mask for arranging conductive balls on an object to be arranged in a predetermined arrangement pattern, and is formed corresponding to the arrangement pattern and has an opening through which the conductive balls can be inserted. An opening and a convex portion formed on one surface of the non-opening portion, the convex portion being a mask formed around the opening end of the opening portion. According to this mask, for example, in the case where the mask is aligned with the object to be arranged on which the adhesive film is formed, the convex portion of the mask is formed so that the adhesive film does not contact. In that case, since the convex part is formed around the opening end of the opening part of the mask, it is possible to obtain a mask having a predetermined rigidity with few thin portions in the non-opening part.

上記したマスクにおいて、前記配列パターンが規則的に配置された複数の一定のパターンからなる場合には、前記凸部は前記一定のパターンに対応し形成された前記開口部を包含可能な領域の域外に形成されていることが望ましい。このマスクは、開口部が比較的密に配置される場合に好適なものである。すなわち、そのような場合には開口部同士の間隔が狭小でその間に凸部を形成し難いが、このマスクのように一定のパターンで形成された開口部を含む領域の域外に凸部を設けることにより非開口部において薄肉の部分が少なくなりマスクの剛性を維持できる。   In the above-described mask, when the array pattern is composed of a plurality of regular patterns regularly arranged, the convex portion is outside the region that can include the opening formed corresponding to the regular pattern. It is desirable to be formed. This mask is suitable when the openings are arranged relatively densely. That is, in such a case, the interval between the openings is narrow and it is difficult to form the protrusions between them, but the protrusions are provided outside the region including the openings formed in a certain pattern like this mask. As a result, the thin portion is reduced in the non-opening portion, and the rigidity of the mask can be maintained.

さらに、その凸部は前記領域を包囲し矩形状に形成するようにすれば、凸部の形成が比較的容易になるので望ましい。さらに加えて、前記凸部の高さは前記導電性ボールの半径以下であれば、開口部に充填された導電性ボールが位置ずれし難いので好適である。さらにさらに加えて、上記マスクが軟磁性を有していれば、磁石で被配列体に密着させることができ望ましい。   Further, it is desirable that the convex portion surrounds the region and is formed in a rectangular shape because the convex portion can be formed relatively easily. In addition, if the height of the convex portion is equal to or less than the radius of the conductive ball, it is preferable that the conductive ball filled in the opening is not easily displaced. In addition, if the mask has soft magnetism, it is desirable that the mask can be brought into close contact with the object to be arranged.

また、本発明の一態様は、所定の配列パターンで導電性ボールを被配列体に配列するための装置であって、前記被配列体を載置する載置台と、前記載置台に載置される被配列体に対し位置決め可能に配設された上記したマスクとを有する装置である。   One embodiment of the present invention is an apparatus for arranging conductive balls on an arrayed body in a predetermined array pattern, and is placed on the mounting table on which the arrayed body is mounted and the mounting table. And an above-described mask disposed so as to be positioned with respect to the object to be arranged.

さらにまた、本発明の一態様は、所定の配列パターンで導電性ボールを被配列体に配列するための装置であって、前記被配列体を載置する載置台と、前記載置台に載置される被配列体に対し位置決め可能に配設された上記軟磁性を有するマスクと、前記載置台の下方に配設された磁石とを有する装置である。   Furthermore, one embodiment of the present invention is an apparatus for arranging conductive balls on an arrayed body in a predetermined array pattern, the mounting table on which the arrayed body is mounted, and the mounting table mounted on the mounting table An apparatus having the soft magnetic mask disposed so as to be positioned with respect to the arranged object and a magnet disposed below the mounting table.

上記したマスクによれば、例えば粘着膜が形成されたような被配列体にマスクを重ね合わせても、マスクの非開口部は開口部の周囲に設けられた凸部により粘着膜と接触しないのでマスクに粘着膜が付着することがなく、さらに、当該凸部は各開口部の周囲に設けられているので非開口部の厚みをいたずらに減ずることなく所定の剛性を有するマスクを得ることができる。   According to the above-described mask, for example, even when the mask is overlaid on an arrayed object on which an adhesive film is formed, the non-opening portion of the mask does not come into contact with the adhesive film due to the convex portion provided around the opening portion. The adhesive film does not adhere to the mask, and furthermore, since the convex portions are provided around the respective openings, a mask having a predetermined rigidity can be obtained without unnecessarily reducing the thickness of the non-openings. .

上記した配列装置によれば、上記のようなマスクを採用しているので、導電性ボールを高い確度で被配列体に配列できる。   According to the arrangement apparatus described above, since the mask as described above is employed, the conductive balls can be arranged on the arrayed object with high accuracy.

本発明について、その一実施様態に基づき図面を参照し説明する。なお、以下の態様のマスクは、直径が300μm以下の半田ボール、特にFCに採用されるような100μm〜50μm程度の半田ボールを配列するのに好適なものである。   The present invention will be described based on one embodiment with reference to the drawings. The mask of the following mode is suitable for arranging solder balls having a diameter of 300 μm or less, particularly solder balls having a diameter of about 100 μm to 50 μm as used in FC.

図1は、本発明の一実施態様のマスクを用いた配列装置の概略構成図である。図2は、図1の部分拡大断面図である。図3は、図1のウエハーの斜視図である。図4は、図1のマスクの斜視図である。図5は、図1の配列装置の動作を説明する図である。図6は、図3とは別の態様のウエハーの斜視図である。図7は、図6のウエハーに半田ボールを配列するマスクの斜視図である。図8は、図1のマスクを部分拡大した平面図と断面図である。   FIG. 1 is a schematic configuration diagram of an arrangement apparatus using a mask according to an embodiment of the present invention. FIG. 2 is a partially enlarged cross-sectional view of FIG. FIG. 3 is a perspective view of the wafer of FIG. FIG. 4 is a perspective view of the mask of FIG. FIG. 5 is a diagram for explaining the operation of the array device of FIG. FIG. 6 is a perspective view of a wafer according to another embodiment different from FIG. FIG. 7 is a perspective view of a mask for arranging solder balls on the wafer of FIG. FIG. 8 is a plan view and a sectional view in which the mask of FIG. 1 is partially enlarged.

まず、本態様において導電性ボールである半田ボール2が配列される被配列体であるウエハーについて説明する。図3(a)に示すように、ウエハー3は、規則的に配置された複数の半導体チップ32から構成されている。各半導体チップ32の一面(以下電極面と称する。)には、その入出力端子であり半田ボールが載置される電極31が一定のパターンで領域34の中に形成されている。そのウエハー3は、図3(b)の2点鎖線で示す切断線33に沿い個片に切断され、個々の半導体チップ32とされる。このウエハー3の電極31の上面には、図2に示すように、例えばハンダペースト又はフラックスが所定の厚みで印刷されてなる粘着膜4が予め形成されている。   First, a wafer that is an arrayed body on which solder balls 2 that are conductive balls in this embodiment are arranged will be described. As shown in FIG. 3A, the wafer 3 is composed of a plurality of semiconductor chips 32 arranged regularly. On one surface of each semiconductor chip 32 (hereinafter referred to as an electrode surface), electrodes 31 that are input / output terminals on which solder balls are placed are formed in a region 34 in a certain pattern. The wafer 3 is cut into individual pieces along a cutting line 33 indicated by a two-dot chain line in FIG. On the upper surface of the electrode 31 of the wafer 3, as shown in FIG. 2, for example, an adhesive film 4 is formed in advance by printing a solder paste or a flux with a predetermined thickness.

上記ウエハー3に半田ボール2を配列する配列装置1は、図1に示す様に、電極面を上にしてウエハー3が載置され水平状態を保持するウエハー載置部11と、そのウエハー3に半田ボール2を配列するためのマスク13と、マスク13をウエハー3の電極面に密着させる磁石部12と、半田ボール2を振込むボール供給部14とで構成されている。なお、この配列装置は、本発明に係るマスクを採用した特に自動化を目的とした最良の形態であって、ウエハー載置部11や磁石部12、ボール供給部14は必ずしも必須の構成ではなく、必要に応じ他の構成を採用することができる。   As shown in FIG. 1, the arrangement device 1 for arranging the solder balls 2 on the wafer 3 has a wafer placement portion 11 on which the wafer 3 is placed with the electrode surface facing upward and holds a horizontal state, and the wafer 3 is placed on the wafer 3. A mask 13 for arranging the solder balls 2, a magnet part 12 for bringing the mask 13 into close contact with the electrode surface of the wafer 3, and a ball supply part 14 for transferring the solder balls 2 are configured. Note that this arrangement device is the best mode especially for the purpose of automation employing the mask according to the present invention, and the wafer mounting unit 11, the magnet unit 12, and the ball supply unit 14 are not necessarily indispensable configurations. Other configurations can be employed as required.

ウエハー載置部11は、水平状態にウエハー3を取り付けるウエハー取り付け凹部113とウエハー取り付け凹部113の底部に開口した吸着管路114とを備えた載置台111と、配管116を介して吸着管路114に接続された真空ポンプ115とで構成されている。ここで、ウエハー取り付け凹部113は、ウエハー3が収まりウエハー3と載置台111の表上面が同一面となるように、ウエハー3の外形より若干大きくウエハー3の厚みとほぼ同じ深さに形成されている。   The wafer mounting unit 11 includes a mounting table 111 including a wafer mounting recess 113 for mounting the wafer 3 in a horizontal state and an adsorption conduit 114 opened at the bottom of the wafer mounting recess 113, and an adsorption conduit 114 via a pipe 116. And a vacuum pump 115 connected to the. Here, the wafer mounting recess 113 is formed slightly larger than the outer shape of the wafer 3 and substantially the same depth as the thickness of the wafer 3 so that the wafer 3 can be accommodated and the front surface of the wafer 3 and the mounting table 111 are flush with each other. Yes.

マスク13は、図4に示す様に、ウエハー3の電極31の配列パターンに対応し形成され半田ボール2が挿通可能な貫通孔状の開口部131と、非開口部132と、非開口部132の底面に配設された凸部133とで構成されている。なお、マスク13は、後述する磁石部12で吸引可能なようにNiやFeなど軟磁性材で構成されている。   As shown in FIG. 4, the mask 13 is formed corresponding to the arrangement pattern of the electrodes 31 of the wafer 3 and has a through-hole-shaped opening 131 through which the solder ball 2 can be inserted, a non-opening 132, and a non-opening 132. It is comprised with the convex part 133 arrange | positioned at the bottom face. The mask 13 is made of a soft magnetic material such as Ni or Fe so as to be attracted by a magnet portion 12 described later.

凸部133は、図8(a)に示すように、電極31に対応し平面視において一定のパターンで形成された開口部131を包含する領域134について凹部135を形成することで、ウエハー3の切断線33に沿うように該領域134の外側(域外)に設けられている。この凹部135は、例えば開口部131が形成された金属の薄板にフォトリソプロセスを経てエッチング加工し形成される。したがって、凹部135を容易に形成するためは平面視において単純な形状とすることが望ましく、例えば図示するように凹部135を矩形状とし凸部133が領域134を包囲するようにすればよい。   As shown in FIG. 8A, the protrusion 133 forms a recess 135 in a region 134 corresponding to the electrode 31 and including the opening 131 formed in a fixed pattern in plan view. It is provided outside (outside) the region 134 along the cutting line 33. The recess 135 is formed, for example, by etching through a photolithography process on a metal thin plate in which the opening 131 is formed. Therefore, in order to easily form the concave portion 135, it is desirable to have a simple shape in plan view. For example, the concave portion 135 may be rectangular as shown in the figure, and the convex portion 133 may surround the region 134.

本態様のようにウエハー3に粘着膜4が形成されている場合には、凹部135は粘着膜4に接触しないように形成され、その深さ(すなわち凸部133の高さ)は該粘着膜4の高さより深く形成される。したがって、マスク13をウエハー3に重なる状態で位置決めしたとき、凹部135は粘着膜4に接触しない。なお、開口部131に半田ボール2が充填されたときその位置ずれし難いようにするためには、図2に示す様に、凹部135の深さの上限を半田ボール2の半径と同一程度とすればよい。   When the adhesive film 4 is formed on the wafer 3 as in this embodiment, the concave portion 135 is formed so as not to contact the adhesive film 4, and the depth thereof (that is, the height of the convex portion 133) is the adhesive film. It is formed deeper than the height of 4. Therefore, when the mask 13 is positioned so as to overlap the wafer 3, the recess 135 does not contact the adhesive film 4. In order to make it difficult for the position to be displaced when the solder ball 2 is filled in the opening 131, the upper limit of the depth of the recess 135 is set to be the same as the radius of the solder ball 2 as shown in FIG. 2. do it.

上記の形態のマスク13は、ウエハー3のように非常に密に配設された電極31に半田ボール2を配列する場合に有効なものである。具体的に言うと、電極31の配設される矩形状の領域34の大きさは5mm角程度であり、電極31の大きさは100μm角程度であり、電極31の間の距離は150μm程度であり、半田ボール2の直径は80μm程度である。したがって、電極31の間で余裕のあるスペースは50μm程度であるため、図8(d)に示すように、そのスペースに対応した部分に凸部133を設けるため開口部131ごとに凹部135を形成することが難しい。このような場合においても、領域134の外側に凸部131を設けるようにすれば非開口部135の厚みをいたずらに減ずることがなく工業生産上において比較的容易に所定の剛性を有するマスク13を得ることができる。   The mask 13 having the above-described form is effective when the solder balls 2 are arranged on the electrodes 31 arranged very densely like the wafer 3. Specifically, the size of the rectangular region 34 in which the electrodes 31 are disposed is about 5 mm square, the size of the electrodes 31 is about 100 μm square, and the distance between the electrodes 31 is about 150 μm. The diameter of the solder ball 2 is about 80 μm. Therefore, since the space with a sufficient space between the electrodes 31 is about 50 μm, as shown in FIG. 8D, a concave portion 135 is formed for each opening portion 131 to provide the convex portion 133 in the portion corresponding to the space. Difficult to do. Even in such a case, if the protrusion 131 is provided outside the region 134, the thickness of the non-opening 135 is not reduced unnecessarily, and the mask 13 having a predetermined rigidity can be relatively easily produced in industrial production. Obtainable.

図3に示したウエハー3とは別の配列パターンの電極31aを有するウエハー3a(図6参照)に半田ボール2を配列するためのマスク13aを図7およびその部分拡大平面図を図8(b)に示す。このウエハー3aでは、図示するように、各半導体チップ32aの電極31aは枠状の領域34に含まれるように密に配設されている。   FIG. 7 shows a mask 13a for arranging solder balls 2 on a wafer 3a (see FIG. 6) having electrodes 31a having an arrangement pattern different from that of the wafer 3 shown in FIG. 3, and FIG. ). In the wafer 3a, as shown in the drawing, the electrodes 31a of the respective semiconductor chips 32a are densely arranged so as to be included in the frame-shaped region 34.

この電極31aに半田ボール2を配列するマスク13aの凸部133aは、図8(b)に示すように、電極31の含まれる領域34に対応した領域134aに凹部135aを形成することにより領域134aの域外に設けられる。   As shown in FIG. 8B, the convex portion 133a of the mask 13a in which the solder balls 2 are arranged on the electrode 31a is formed in a region 134a by forming a concave portion 135a in a region 134a corresponding to the region 34 including the electrode 31. It is provided outside the area.

さらに、マスクの変形例を図8(c)、(d)に示す。図8(c)のマスクは、三角形状の領域に密に配設された電極に半田ボール2を配列するためのものであり、その三角形状の領域に対応した開口部131bを含む領域134bに凹部135bを設け、その領域134bの域外を凸部133bとしたものである。   Further, a modified example of the mask is shown in FIGS. The mask of FIG. 8C is for arranging the solder balls 2 on the electrodes densely arranged in the triangular area, and in the area 134b including the opening 131b corresponding to the triangular area. A concave portion 135b is provided, and a convex portion 133b is formed outside the region 134b.

電極が密に配設されていない場合には、図8(d)に示すように、電極に対応した開口部131cごとの周囲に凹部135cを設けることにより開口部131cの開口端の周囲に凸部133cを形成してもよい。   In the case where the electrodes are not densely arranged, as shown in FIG. 8D, a recess 135c is provided around each opening 131c corresponding to the electrode, thereby projecting around the opening end of the opening 131c. The portion 133c may be formed.

磁石部12は、載置台111の下方に配設され、ウエハー3に位置決めされるマスク13に相対する永久磁石121と、永久磁石121を収納する磁石ホルダー122と、磁石ホルダー122を昇降させる昇降機構であるエアシリンダ123と、配管124を介してエアシリンダ123に接続された昇降切替弁125と圧縮空気源126とから構成されている。かかる構成の磁石部12によれば、昇降切替弁125を切り替えて永久磁石121をマスク13に向かい上昇させるとマスク13は磁石121に吸引されてウエハー3の電極面に密着し、永久磁石121を下降させてマスク13から遠ざければ、マスク13は、磁石121の吸引力から開放されウエハー3から離脱可能となる。なお、永久磁石121は電磁石であってもよい。   The magnet unit 12 is disposed below the mounting table 111 and has a permanent magnet 121 facing the mask 13 positioned on the wafer 3, a magnet holder 122 that houses the permanent magnet 121, and a lifting mechanism that moves the magnet holder 122 up and down. The air cylinder 123, the up / down switching valve 125 connected to the air cylinder 123 via the pipe 124, and the compressed air source 126 are configured. According to the magnet unit 12 having such a configuration, when the up / down switching valve 125 is switched to raise the permanent magnet 121 toward the mask 13, the mask 13 is attracted by the magnet 121 and is brought into close contact with the electrode surface of the wafer 3. If it is lowered and moved away from the mask 13, the mask 13 is released from the attractive force of the magnet 121 and can be detached from the wafer 3. The permanent magnet 121 may be an electromagnet.

ボール供給部14は、ウエハー3に対し位置決めされたマスク13の上面に半田ボール2を供給する供給手段141と供給された半田ボール2をマスク13の開口部131に振込む振込手段であるスキージブラシ142とから構成されている。スキージブラシ142は、その先端部がマスク13の上面に当接するように配設されているとともに、図示しない水平移動手段によってマスク13の上方を水平移動する。   The ball supply unit 14 includes a supply unit 141 that supplies the solder balls 2 to the upper surface of the mask 13 positioned with respect to the wafer 3, and a squeegee brush 142 that is a transfer unit that transfers the supplied solder balls 2 to the opening 131 of the mask 13. It consists of and. The squeegee brush 142 is disposed so that the tip end of the squeegee brush 142 is in contact with the upper surface of the mask 13, and horizontally moves above the mask 13 by horizontal moving means (not shown).

かかる配列装置1の動作について図5を参照し説明する。   The operation of the arrangement device 1 will be described with reference to FIG.

永久磁石121を下端の位置にした状態で電極面を上にしてウエハー3をウエハー取り付け凹部113に水平状態で装着し、真空ポンプ115を作動させ、載置台111にウエハー3を固定する。(図5(a))   With the permanent magnet 121 in the lower end position, the wafer 3 is mounted in a horizontal state in the wafer mounting recess 113 with the electrode surface facing upward, the vacuum pump 115 is operated, and the wafer 3 is fixed to the mounting table 111. (Fig. 5 (a))

ウエハー3の電極31に対しマスク13の開口部131が一致するようにマスク3を位置決めし、ウエハー3の電極面にマスク13を密着した状態となるように重ねあわせる。(図5(b))このとき、マスク13にはウエハー3に形成されている粘着膜4が接触しないように凸部133が形成されているので、マスク13に粘着膜4が付着することはない。   The mask 3 is positioned so that the opening 131 of the mask 13 is aligned with the electrode 31 of the wafer 3, and the mask 13 is overlaid so as to be in close contact with the electrode surface of the wafer 3. (FIG. 5B) At this time, since the convex portion 133 is formed on the mask 13 so that the adhesive film 4 formed on the wafer 3 does not come into contact with the mask 13, the adhesion film 4 adheres to the mask 13. Absent.

エアシリンダ123により永久磁石121を上昇させ、永久磁石121の磁力によりマスク13をウエハー3にさらに密着固定する。(図5(c))このとき、マスク13には、それを下方に撓ませるように永久磁石121の磁力が働くが、マスク13の非開口部132には凸部133が形成され十分な剛性が確保されているので大きく撓むことなく粘着膜4が付着することがない。   The permanent magnet 121 is raised by the air cylinder 123, and the mask 13 is further tightly fixed to the wafer 3 by the magnetic force of the permanent magnet 121. At this time, the magnetic force of the permanent magnet 121 acts on the mask 13 so as to bend it downward, but the convex part 133 is formed on the non-opening part 132 of the mask 13 and has sufficient rigidity. Therefore, the adhesive film 4 does not adhere without greatly bending.

供給手段141でマスク13の上に半田ボール2を供給し、スキージブラシ142を水平移動させて開口部131に半田ボール2を充填し、電極31に配列する。その後、磁石121を下降させる。(図5(d))   The solder ball 2 is supplied onto the mask 13 by the supply means 141, the squeegee brush 142 is moved horizontally to fill the opening 131 with the solder ball 2, and arranged on the electrode 31. Thereafter, the magnet 121 is lowered. (Fig. 5 (d))

マスク13をウエハー3から取り外し、真空ポンプ115を停止してウエハー3の固定を解除しウエハー3を載置台112から取り出す。(図5(e))   The mask 13 is removed from the wafer 3, the vacuum pump 115 is stopped, the fixation of the wafer 3 is released, and the wafer 3 is taken out from the mounting table 112. (Fig. 5 (e))

なお、図4、7及び8で説明したマスクの凸部は連続的に配設されているが、突起状にし離散的に配設してもよい。   In addition, although the convex part of the mask demonstrated in FIG.4, 7 and 8 is arrange | positioned continuously, you may make it into a protrusion shape and discretely arrange | position.

本発明は、上記で説明に限定されることなく、例えば医薬品や窯業などの分野において徴小な或いは不定形の粉体や粒体を基板に搭載する用途にも利用することが可能である。   The present invention is not limited to the above description, and can also be used for applications in which small or irregular powders or granules are mounted on a substrate, for example, in fields such as pharmaceuticals and ceramics.

本発明の一実施態様のマスクを用いた配列装置の概略構成図である。It is a schematic block diagram of the arrangement | sequence apparatus using the mask of one embodiment of this invention. 図1の部分拡大断面図である。It is a partial expanded sectional view of FIG. 図1のウエハーの斜視図である。It is a perspective view of the wafer of FIG. 図1のマスクの斜視図である。It is a perspective view of the mask of FIG. 図1の配列装置の動作を説明する図である。It is a figure explaining operation | movement of the arrangement | sequence apparatus of FIG. 別の態様のウエハーの斜視図である。It is a perspective view of the wafer of another aspect. 図6のウエハーに半田ボールを配列するマスクの斜視図である。FIG. 7 is a perspective view of a mask for arranging solder balls on the wafer of FIG. 6. 図1のマスクを部分拡大した平面図と断面図である。It is the top view and sectional drawing which expanded the mask of FIG.

符号の説明Explanation of symbols

1 配列装置
11 ウエハー載置部
111 載置台
112 支持部材
113 ウエハー取り付け凹部
114 吸着経路
115 真空ポンプ
116 配管
12 磁石部
121 磁石
122 磁石ホルダー
123 昇降手段
124 配管
125 昇降切替弁
126 圧縮空気源
13 マスク
131 開口部
132 非開口部
133 凸部
134 開口部の配設領域
135 凹部
14 ボール供給部
141 供給手段
142 スキージブラシ
2 半田ボール
3 ウエハー
31 電極
32 半導体チップ
33 切断線
34 電極の配設領域
4 粘着膜
DESCRIPTION OF SYMBOLS 1 Array apparatus 11 Wafer mounting part 111 Mounting stand 112 Support member 113 Wafer mounting recessed part 114 Adsorption path 115 Vacuum pump 116 Piping 12 Magnet part 121 Magnet 122 Magnet holder 123 Lifting means 124 Piping 125 Raising / lowering switching valve 126 Compressed air source 13 Mask 131 Opening 132 Non-opening 133 Protruding part 134 Opening area 135 Recess 14 Ball supply part 141 Supplying means 142 Squeegee brush 2 Solder ball 3 Wafer 31 Electrode 32 Semiconductor chip 33 Cutting line 34 Electrode providing area 4 Adhesive film

Claims (7)

所定の配列パターンで被配列体に導電性ボールを配列するためのマスクであって、
前記配列パターンに対応し形成され前記導電性ボールが挿通可能な開口部と、非開口部と、前記非開口部の一方の面に形成された凸部とを備え、前記凸部は前記開口部の開口端の周囲に形成されているマスク。
A mask for arranging conductive balls on an object to be arranged in a predetermined arrangement pattern,
An opening formed in correspondence with the array pattern, through which the conductive ball can be inserted, a non-opening, and a convex formed on one surface of the non-opening, the convex being the opening The mask is formed around the open end of the.
請求項1に記載のマスクにおいて、前記配列パターンは規則的に配置された複数の一定のパターンからなり、前記凸部は前記一定のパターンに対応し形成された前記開口部を包含可能な領域の域外に形成されているマスク。   2. The mask according to claim 1, wherein the array pattern includes a plurality of regularly arranged regular patterns, and the convex portion is a region that can include the opening formed corresponding to the certain pattern. 3. A mask formed outside the area. 請求項2に記載されたマスクにおいて、前記凸部は前記領域を包囲し矩形状に形成されているマスク。   3. The mask according to claim 2, wherein the convex portion surrounds the region and is formed in a rectangular shape. 請求項1乃至3のいずれかに記載されたマスクにおいて、前記凸部の高さは前記導電性ボールの半径以下であるマスク。   4. The mask according to claim 1, wherein a height of the convex portion is equal to or less than a radius of the conductive ball. 5. 請求項1乃至4のいずれかに記載されたマスクにおいて、軟磁性を有するマスク。   5. The mask according to claim 1, wherein the mask has soft magnetism. 所定の配列パターンで導電性ボールを被配列体に配列するための装置であって、前記被配列体を載置する載置台と、前記載置台に載置される被配列体に対し位置決め可能に配設された請求項1乃至4のいずれかに記載されたマスクとを有する装置。   An apparatus for arranging conductive balls on an arrayed body in a predetermined array pattern, and capable of positioning with respect to a mounting table on which the arrayed body is mounted and an arrayed object mounted on the mounting table A device comprising a mask according to any one of claims 1 to 4 disposed. 所定の配列パターンで導電性ボールを被配列体に配列するための装置であって、前記被配列体を載置する載置台と、前記載置台に載置される被配列体に対し位置決め可能に配設された請求項5に記載されたマスクと、前記載置台の下方に配設された磁石とを有する装置。   An apparatus for arranging conductive balls on an arrayed body in a predetermined array pattern, and capable of positioning with respect to a mounting table on which the arrayed body is mounted and an arrayed object mounted on the mounting table An apparatus comprising: the mask according to claim 5 disposed; and a magnet disposed below the mounting table.
JP2004182245A 2004-06-21 2004-06-21 Conductive ball array mask and array device using the same Expired - Fee Related JP4348696B2 (en)

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Application Number Priority Date Filing Date Title
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JP2006005276A true JP2006005276A (en) 2006-01-05
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Cited By (8)

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JP2008117859A (en) * 2006-11-01 2008-05-22 Shinko Electric Ind Co Ltd Solder ball mounting method
US7514351B2 (en) 2006-10-25 2009-04-07 Shinko Electric Industries Co., Ltd. Solder ball mounting method and solder ball mounting substrate manufacturing method
JP2009099963A (en) * 2007-09-25 2009-05-07 Ngk Spark Plug Co Ltd Method of forming wiring board having solder bump
US7644856B2 (en) 2006-11-07 2010-01-12 Shinko Electric Industries Co., Ltd. Solder ball mounting method and solder ball mounting apparatus
US7784671B2 (en) 2007-07-25 2010-08-31 Shinko Electric Industries Co., Ltd. Apparatus and method for arranging magnetic solder balls
JP2012019000A (en) * 2010-07-07 2012-01-26 Mitsubishi Materials Corp Solder paste printing apparatus
JP2013229428A (en) * 2012-04-25 2013-11-07 Fuji Mach Mfg Co Ltd Squeegee and conductive ball feeder including squeegee
US8671561B2 (en) 2007-05-24 2014-03-18 Shinko Electric Industries Co., Ltd. Substrate manufacturing method

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7514351B2 (en) 2006-10-25 2009-04-07 Shinko Electric Industries Co., Ltd. Solder ball mounting method and solder ball mounting substrate manufacturing method
JP2008117859A (en) * 2006-11-01 2008-05-22 Shinko Electric Ind Co Ltd Solder ball mounting method
US7644856B2 (en) 2006-11-07 2010-01-12 Shinko Electric Industries Co., Ltd. Solder ball mounting method and solder ball mounting apparatus
US8671561B2 (en) 2007-05-24 2014-03-18 Shinko Electric Industries Co., Ltd. Substrate manufacturing method
US7784671B2 (en) 2007-07-25 2010-08-31 Shinko Electric Industries Co., Ltd. Apparatus and method for arranging magnetic solder balls
US7854367B2 (en) 2007-07-25 2010-12-21 Shinko Electric Industries Co., Ltd. Apparatus and method for arranging magnetic solder balls
JP2009099963A (en) * 2007-09-25 2009-05-07 Ngk Spark Plug Co Ltd Method of forming wiring board having solder bump
JP2012019000A (en) * 2010-07-07 2012-01-26 Mitsubishi Materials Corp Solder paste printing apparatus
JP2013229428A (en) * 2012-04-25 2013-11-07 Fuji Mach Mfg Co Ltd Squeegee and conductive ball feeder including squeegee

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