JP2006001832A5 - - Google Patents

Download PDF

Info

Publication number
JP2006001832A5
JP2006001832A5 JP2005174051A JP2005174051A JP2006001832A5 JP 2006001832 A5 JP2006001832 A5 JP 2006001832A5 JP 2005174051 A JP2005174051 A JP 2005174051A JP 2005174051 A JP2005174051 A JP 2005174051A JP 2006001832 A5 JP2006001832 A5 JP 2006001832A5
Authority
JP
Japan
Prior art keywords
hydrogel
xerogel
grinding
modifying
drying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005174051A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006001832A (ja
JP4886222B2 (ja
Filing date
Publication date
Priority claimed from DE102004029069A external-priority patent/DE102004029069A1/de
Application filed filed Critical
Publication of JP2006001832A publication Critical patent/JP2006001832A/ja
Publication of JP2006001832A5 publication Critical patent/JP2006001832A5/ja
Application granted granted Critical
Publication of JP4886222B2 publication Critical patent/JP4886222B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2005174051A 2004-06-16 2005-06-14 表面変性シリカゲル Expired - Fee Related JP4886222B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102004029069.5 2004-06-16
DE102004029069A DE102004029069A1 (de) 2004-06-16 2004-06-16 Oberflächenmodifizierte Silicagele

Publications (3)

Publication Number Publication Date
JP2006001832A JP2006001832A (ja) 2006-01-05
JP2006001832A5 true JP2006001832A5 (enExample) 2007-08-16
JP4886222B2 JP4886222B2 (ja) 2012-02-29

Family

ID=35079384

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005174051A Expired - Fee Related JP4886222B2 (ja) 2004-06-16 2005-06-14 表面変性シリカゲル

Country Status (15)

Country Link
US (1) US7612137B2 (enExample)
EP (1) EP1607448A3 (enExample)
JP (1) JP4886222B2 (enExample)
KR (1) KR20060049618A (enExample)
CN (1) CN1712455A (enExample)
AU (1) AU2005202577B2 (enExample)
BR (1) BRPI0502524A (enExample)
DE (1) DE102004029069A1 (enExample)
IL (1) IL169176A0 (enExample)
MX (1) MXPA05006188A (enExample)
MY (1) MY142515A (enExample)
NO (1) NO20052964L (enExample)
RU (1) RU2005118355A (enExample)
TW (1) TW200604098A (enExample)
ZA (1) ZA200504885B (enExample)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004005411A1 (de) * 2004-02-03 2005-08-18 Degussa Ag Hydrophobe Fällungskieselsäure für Entschäumerformulierungen
US7276156B2 (en) * 2005-05-26 2007-10-02 Tony Mason Lockerman Storm drain filter
US7767180B2 (en) 2006-05-26 2010-08-03 Degussa Gmbh Precipitated silicas having special surface properties
DE102006048850A1 (de) * 2006-10-16 2008-04-17 Evonik Degussa Gmbh Amorphe submicron Partikel
DE102006024590A1 (de) * 2006-05-26 2007-11-29 Degussa Gmbh Hydrophile Kieselsäure für Dichtungsmassen
DE102007025685A1 (de) * 2007-06-01 2008-12-04 Evonik Degussa Gmbh RTV-Zweikomponenten-Silikonkautschuk
US8623140B2 (en) 2007-07-25 2014-01-07 3M Innovative Properties Company System and method for making a film having a matte finish
DE102007052269A1 (de) * 2007-11-02 2009-05-07 Evonik Degussa Gmbh Fällungskieselsäuren für lagerstabile RTV-1 Siliconkautschukformulierungen ohne Stabilisator
US7985292B2 (en) 2007-11-26 2011-07-26 Evonik Degussa Corporation Precipitated silica for thickening and creating thixotropic behavior in liquid systems
EP2244827A1 (en) * 2007-12-12 2010-11-03 All-Tech Associates Inc. Metal oxide particles and methods of making and using the same
DE102008035867A1 (de) * 2008-08-01 2010-02-04 Evonik Degussa Gmbh Neuartige Fällungskieselsäuren für Trägeranwendungen
KR101047965B1 (ko) * 2009-06-11 2011-07-12 한국에너지기술연구원 에어로겔 매트, 이의 제조방법 및 제조장치
DE102009045104A1 (de) 2009-09-29 2011-03-31 Evonik Degussa Gmbh Neuartige Mattierungsmittel für UV-Lacke
DE102009045109A1 (de) 2009-09-29 2011-03-31 Evonik Degussa Gmbh Oberflächenmodifizierte Semi-Gele
US20110244382A1 (en) 2010-04-06 2011-10-06 Christopher Alyson M Hydrophobic silica particles and method of producing same
US9546285B2 (en) 2010-11-18 2017-01-17 Basf Coatings Gmbh Polyurethane coating composition, multilayer surface coatings having a matt surface produced therefrom and processes for producing the multilayer surface coatings
WO2013148241A1 (en) 2012-03-26 2013-10-03 Cabot Corporation Treated fumed silica
JP6042085B2 (ja) * 2012-03-27 2016-12-14 株式会社トクヤマ エアロゲル及び該エアロゲルからなる艶消し剤
CN107614264B (zh) 2014-12-05 2020-02-04 佛罗里达大学研究基金会有限公司 使用相变材料作为支撑体的3d打印
WO2016130953A1 (en) 2015-02-13 2016-08-18 University Of Florida Research Foundation, Inc. High speed 3d printing system for wound and tissue replacement
US11390835B2 (en) 2015-05-08 2022-07-19 University Of Florida Research Foundation, Inc. Growth media for three-dimensional cell culture
US11027483B2 (en) 2015-09-03 2021-06-08 University Of Florida Research Foundation, Inc. Valve incorporating temporary phase change material
WO2017096263A1 (en) 2015-12-04 2017-06-08 University Of Florida Research Foundation, Incorporated Crosslinkable or functionalizable polymers for 3d printing of soft materials
CN106470505A (zh) * 2016-07-29 2017-03-01 李哲元 节能环保耐高温型远红外线保健半导体发热浆料
JP6166440B2 (ja) * 2016-08-26 2017-07-19 株式会社トクヤマ エアロゲル及び該エアロゲルからなる艶消し剤
US11124644B2 (en) 2016-09-01 2021-09-21 University Of Florida Research Foundation, Inc. Organic microgel system for 3D printing of silicone structures
WO2020159916A1 (en) * 2019-02-01 2020-08-06 W.R. Grace & Co.-Conn. Silica-based matting agents and methods of making and using the same
US11370937B2 (en) * 2019-03-04 2022-06-28 Momentive Performance Materials Inc. Protective coating composition and coated metallic substrate comprising same
JP7322156B2 (ja) * 2019-09-30 2023-08-07 エルジー・ケム・リミテッド シリカゾル、これを用いて製造したシリカエアロゲルブランケットおよびその製造方法
JP7473291B2 (ja) * 2020-05-18 2024-04-23 関西ペイント株式会社 艶消し塗料組成物
EP3995320A1 (de) * 2020-11-09 2022-05-11 Continental Reifen Deutschland GmbH Energieeffizientes lösungsmittelfreies verfahren zur organosilanisierung von silikat- und siliciumdioxid-materialien
US11773234B2 (en) * 2021-02-09 2023-10-03 Pq, Llc Silica gel as reinforcement agent for rubber compounds
KR20240088921A (ko) * 2021-10-13 2024-06-20 그레이스 게엠베하 소광제 및 이를 함유하는 폴리우레탄 코팅 조성물

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4097302A (en) * 1976-02-17 1978-06-27 Scm Corporation Flatting agents
JPS54101795A (en) * 1978-01-30 1979-08-10 Toyo Soda Mfg Co Ltd Hydrophobic rendering method for oxide fine powder
JPS61148284A (ja) * 1984-12-21 1986-07-05 Toray Silicone Co Ltd 固体材料処理剤
NZ232095A (en) * 1989-02-15 1992-01-29 Grace W R & Co Flatting agent produced by milling a hydrous inorganic oxide hydrogel
DE4041827A1 (de) 1990-12-24 1992-07-02 Degussa Faellungskieselsaeurepaste
DE4202023A1 (de) 1992-01-25 1993-07-29 Degussa Haftpromoter fuer kautschuk- und kunststoffmischungen
JPH07207187A (ja) * 1994-01-17 1995-08-08 Nippon Unicar Co Ltd シリルアルキル基とポリオキシアルキレン基とを有する反応性オルガノポリシロキサンで表面処理された無機粉体およびそれを含有する化粧料
JP3261903B2 (ja) * 1994-11-29 2002-03-04 三菱マテリアル株式会社 高分散性疎水性金属酸化物粉体およびその製造方法
JPH0930810A (ja) * 1995-07-20 1997-02-04 Nippon Silica Ind Co Ltd 表面処理したシリカゲルの製造方法
DE19527278A1 (de) 1995-07-26 1997-01-30 Degussa Fällungskieselsäure
JPH09157545A (ja) * 1995-12-08 1997-06-17 Nippon Paint Co Ltd 塗料用艶消し剤、艶消し塗料組成物および艶消し塗膜
IN191468B (enExample) * 1996-03-29 2003-12-06 Degussa
US6191122B1 (en) 1996-03-29 2001-02-20 DEGUSSA HüLS AKTIENGESELLSCHAFT Partially hydrophobic precipitated silicas
US5807501A (en) * 1997-02-20 1998-09-15 Dow Corning Corporation Neutral-aged hydrophobic organosilicate-modified silica gels
US5750610A (en) * 1997-02-24 1998-05-12 Dow Corning Corporation Hydrophobic organosilicate-modified silica gels
JP4904567B2 (ja) * 2000-11-15 2012-03-28 日本アエロジル株式会社 非晶質微細シリカ粒子とその用途
DE10058616A1 (de) 2000-11-25 2002-05-29 Degussa Fällungskieselsäuren mit hoher Struktur
JP2003020218A (ja) * 2001-07-02 2003-01-24 Matsushita Electric Ind Co Ltd 疎水化乾燥ゲルの製造方法およびそれを用いた断熱材
DE10138492A1 (de) 2001-08-04 2003-02-13 Degussa Hydrophobe, nicht getemperte Fällungskieselsäure mit hohem Weißgrad
DE10138490A1 (de) 2001-08-04 2003-02-13 Degussa Hydrophobe Fällungskieselsäure mit hohem Weißgrad und extrem niedriger Feuchtigkeitsaufnahme
DE10138491A1 (de) 2001-08-04 2003-02-13 Degussa Verfahren zur Herstellung einer hydrophoben Fällungskieselsäure mit hohem Weißgrad und extrem niedriger Feuchtigkeitsaufnahme
EP1295906A1 (de) 2001-09-20 2003-03-26 Degussa AG Silikonkautschukformulierungen mit hydrophoben Kieselsäuren
JP2003192330A (ja) * 2001-10-18 2003-07-09 Mitsubishi Chemicals Corp シリカゲル組成物並びにこれを用いた樹脂充填剤,樹脂組成物及び樹脂成型体
DE10203500A1 (de) 2002-01-30 2003-08-07 Degussa Raumtemperaturvernetzende Einkomponenten-Silikonkautschukformulierungen mit hydrophoben Kieselsäuren
BR0317453A (pt) * 2002-12-18 2005-11-16 Degussa Sìlica estruturada, tipo aerogel de superfìcie modificada
ES2290625T3 (es) * 2003-05-14 2008-02-16 Evonik Degussa Gmbh Silices de precipitacion modificadas en la superficie.
DE102004005409A1 (de) 2004-02-03 2005-08-18 Degussa Ag Hydrophile Fällungskieselsäure für Entschäumerformulierungen
DE102004005411A1 (de) 2004-02-03 2005-08-18 Degussa Ag Hydrophobe Fällungskieselsäure für Entschäumerformulierungen
DE102004029073A1 (de) * 2004-06-16 2005-12-29 Degussa Ag Lackformulierung mit verbesserten rheologischen Eigenschaften
US7767180B2 (en) 2006-05-26 2010-08-03 Degussa Gmbh Precipitated silicas having special surface properties
DE102006024590A1 (de) 2006-05-26 2007-11-29 Degussa Gmbh Hydrophile Kieselsäure für Dichtungsmassen
DE102006048850A1 (de) 2006-10-16 2008-04-17 Evonik Degussa Gmbh Amorphe submicron Partikel

Similar Documents

Publication Publication Date Title
JP2006001832A5 (enExample)
WO2003078315A3 (en) Nanocomposites: products, process for obtaining them and uses thereof
JP2009149290A5 (enExample)
EP1810950A4 (en) CARBON NANOTUBE AGGREGATE AND METHOD OF MANUFACTURING THE SAME
ZA200803616B (en) Process for production of silicon tetrafluoride, and apparatus for the process
EP1857413A4 (en) REGULARLY ARRANGED NANOPARTICULAR SILICON DIOXIDE AND METHOD OF MANUFACTURING THEREOF
EP1728550A4 (en) Method for producing coated fine particles
JP2005536763A5 (enExample)
DE602005021868D1 (de) Waschmittel
NO20043828D0 (no) Fremgangsmate for fremstilling av triklorsilan, fremgangsmate for fremstilling av silisium og silisium for bruk ved fremstilling av triklorsilan
JP2005515064A5 (enExample)
JP2007149203A5 (enExample)
JP2010285408A5 (enExample)
EP1967544A4 (en) RUBBER COMPOSITION FOR SIDE WALL AND MANUFACTURING METHOD THEREFOR
NO20055732D0 (no) Fremgangsmate ved fremstilling av metallbaserte, submikroskopiske partikler
DE112005000203D2 (de) Nano-Carbon-Fullerene (NCF), Verfahren zur Herstellung von NFC und Verwendung von NCF in Form von Nano-Compounds
TH100606B (th) ฝาครอบยางอะไหล่สำหรับรถยนต์
TH102534B (th) ยางรถยนต์
TH102533B (th) ยางรถยนต์
TH102520B (th) โครงรถสี่ล้อ
TH41693S1 (th) ยางรถยนต์
TH106890S (th) ยางรถยนต์
TH38619S1 (th) โครงรถสี่ล้อ
TH102512B (th) ยางรถยนต์
TH102521B (th) ยางรถยนต์