JP2005528234A5 - - Google Patents
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- JP2005528234A5 JP2005528234A5 JP2004509589A JP2004509589A JP2005528234A5 JP 2005528234 A5 JP2005528234 A5 JP 2005528234A5 JP 2004509589 A JP2004509589 A JP 2004509589A JP 2004509589 A JP2004509589 A JP 2004509589A JP 2005528234 A5 JP2005528234 A5 JP 2005528234A5
- Authority
- JP
- Japan
- Prior art keywords
- silicon substrate
- integer
- composition
- providing
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 11
- 229910052710 silicon Inorganic materials 0.000 claims 11
- 239000010703 silicon Substances 0.000 claims 8
- 150000001336 alkenes Chemical class 0.000 claims 4
- 125000000962 organic group Chemical group 0.000 claims 4
- 125000005647 linker group Chemical group 0.000 claims 3
- 150000003376 silicon Chemical class 0.000 claims 3
- 239000002904 solvent Substances 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 1
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/160,738 US6841079B2 (en) | 2002-05-31 | 2002-05-31 | Fluorochemical treatment for silicon articles |
PCT/US2003/009894 WO2003101888A2 (en) | 2002-05-31 | 2003-04-01 | Fluorochemical treatment for silicon articles |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005528234A JP2005528234A (ja) | 2005-09-22 |
JP2005528234A5 true JP2005528234A5 (US06244707-20010612-C00007.png) | 2006-05-25 |
Family
ID=29709726
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004509589A Pending JP2005528234A (ja) | 2002-05-31 | 2003-04-01 | シリコン物品のフルオロケミカル処理 |
Country Status (7)
Families Citing this family (36)
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CN101189271A (zh) * | 2004-02-13 | 2008-05-28 | 北卡罗来纳大学查珀尔希尔分校 | 制造微流体设备的功能材料和新型方法 |
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WO2005111157A1 (en) * | 2004-05-07 | 2005-11-24 | 3M Innovative Properties Company | Stain repellent optical hard coating |
US7101618B2 (en) * | 2004-05-07 | 2006-09-05 | 3M Innovative Properties Company | Article comprising fluorochemical surface layer |
US20050249940A1 (en) * | 2004-05-07 | 2005-11-10 | 3M Innovative Properties Company | Fluoropolyether poly(meth)acryl compounds |
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US20050272599A1 (en) * | 2004-06-04 | 2005-12-08 | Kenneth Kramer | Mold release layer |
US7682771B2 (en) * | 2004-12-29 | 2010-03-23 | 3M Innovative Properties Company | Compositions containing photosensitive fluorochemical and uses thereof |
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US7723812B2 (en) | 2005-11-23 | 2010-05-25 | Miradia, Inc. | Preferentially deposited lubricant to prevent anti-stiction in micromechanical systems |
US7616370B2 (en) * | 2005-11-23 | 2009-11-10 | Miradia, Inc. | Preferentially deposited lubricant to prevent anti-stiction in micromechanical systems |
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US8993479B2 (en) * | 2008-10-17 | 2015-03-31 | Surfix Bv | Photochemical modification of solid materials |
EP2638107A1 (en) | 2010-11-10 | 2013-09-18 | 3M Innovative Properties Company | Hydrophobic fluorinated coatings |
EP3636696A1 (en) | 2011-05-04 | 2020-04-15 | Cornell University | Multiblock copolymer films, methods of making same and uses thereof |
CA2882622C (en) | 2012-08-21 | 2021-11-09 | Kratos LLC | Group iva functionalized particles and methods of use thereof |
US9290380B2 (en) | 2012-12-18 | 2016-03-22 | Freescale Semiconductor, Inc. | Reducing MEMS stiction by deposition of nanoclusters |
FR3000069B1 (fr) * | 2012-12-21 | 2015-02-06 | Bluestar Silicones France | Procede d'hydrosilylation d'un siloxane photocatalyse par un compose polyoxometallate |
WO2015087903A1 (ja) * | 2013-12-13 | 2015-06-18 | 旭硝子株式会社 | ケイ素化合物の製造方法 |
US20150243973A1 (en) * | 2014-02-21 | 2015-08-27 | Kratos LLC | Nanosilicon material preparation for functionalized group iva particle frameworks |
KR101719340B1 (ko) | 2016-01-27 | 2017-03-23 | 제이에스아이실리콘주식회사 | 지문 돋보임 방지 피막용 친수성 및 친유성 기 실리콘 결합제 및 이의 제조 방법 |
JP7007365B2 (ja) | 2016-04-28 | 2022-01-24 | テラポア テクノロジーズ,インコーポレイテッド | 静電分離のための帯電したイソポーラス材料 |
US11522178B2 (en) | 2016-07-05 | 2022-12-06 | Kratos LLC | Passivated pre-lithiated micron and sub-micron group IVA particles and methods of preparation thereof |
KR102596197B1 (ko) | 2016-11-17 | 2023-11-02 | 테라포어 테크놀로지스, 인코포레이티드 | 고 분자량 친수성 첨가제를 포함하는 이소포러스 자기-조립 블록 공중합체 필름 및 이의 제조방법 |
SG11201907674WA (en) | 2017-02-22 | 2019-09-27 | Terapore Tech Inc | Ligand bound mbp membranes, uses and method of manufacturing |
WO2018183909A1 (en) | 2017-03-31 | 2018-10-04 | Kratos LLC | Precharged negative electrode material for secondary battery |
WO2018209121A1 (en) * | 2017-05-12 | 2018-11-15 | Terapore Technologies, Inc. | Chemically resistant fluorinated multiblock polymer structures, methods of manufacturing and use |
WO2019178045A1 (en) | 2018-03-12 | 2019-09-19 | Terapore Technologies, Inc. | Isoporous mesoporous asymmetric block copolymer materials with macrovoids and method of making the same |
US10626013B2 (en) * | 2018-04-04 | 2020-04-21 | Canon Kabushiki Kaisha | Anti-wetting coating for Si-based MEMS fluidic device, and method of application of same |
KR20180099609A (ko) | 2018-08-29 | 2018-09-05 | 제이에스아이실리콘주식회사 | 플루오로알킬기 또는 퍼플루오로알킬 이더기 치환 비스(실릴)알칸 실리콘 결합제 및 그의 제조방법 |
CN111074349A (zh) * | 2019-07-12 | 2020-04-28 | 杭州师范大学 | 一种光催化含氟单体修饰制备超疏水多孔硅的方法 |
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DE69939733D1 (de) | 1998-01-22 | 2008-11-27 | Purdue Research Foundation | Funktionalisierte poröse siliziumoberflächen |
US6277485B1 (en) | 1998-01-27 | 2001-08-21 | 3M Innovative Properties Company | Antisoiling coatings for antireflective surfaces and methods of preparation |
US6284317B1 (en) | 1998-04-17 | 2001-09-04 | Massachusetts Institute Of Technology | Derivatization of silicon surfaces |
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EP1246856B1 (en) | 1999-10-27 | 2009-07-15 | 3M Innovative Properties Company | Fluorochemical sulfonamide surfactants |
US6310018B1 (en) | 2000-03-31 | 2001-10-30 | 3M Innovative Properties Company | Fluorinated solvent compositions containing hydrogen fluoride |
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-
2002
- 2002-05-31 US US10/160,738 patent/US6841079B2/en not_active Expired - Lifetime
-
2003
- 2003-04-01 CN CNB038164051A patent/CN1314693C/zh not_active Expired - Fee Related
- 2003-04-01 JP JP2004509589A patent/JP2005528234A/ja active Pending
- 2003-04-01 AU AU2003226168A patent/AU2003226168A1/en not_active Abandoned
- 2003-04-01 EP EP03756154A patent/EP1513763A2/en not_active Withdrawn
- 2003-04-01 WO PCT/US2003/009894 patent/WO2003101888A2/en active Application Filing
- 2003-04-01 CA CA002487715A patent/CA2487715A1/en not_active Abandoned