JP2005508512A5 - - Google Patents

Download PDF

Info

Publication number
JP2005508512A5
JP2005508512A5 JP2002575708A JP2002575708A JP2005508512A5 JP 2005508512 A5 JP2005508512 A5 JP 2005508512A5 JP 2002575708 A JP2002575708 A JP 2002575708A JP 2002575708 A JP2002575708 A JP 2002575708A JP 2005508512 A5 JP2005508512 A5 JP 2005508512A5
Authority
JP
Japan
Prior art keywords
optionally substituted
carbon atoms
bridged
ether bond
leaving group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002575708A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005508512A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2002/007938 external-priority patent/WO2002077712A2/en
Publication of JP2005508512A publication Critical patent/JP2005508512A/ja
Publication of JP2005508512A5 publication Critical patent/JP2005508512A5/ja
Pending legal-status Critical Current

Links

JP2002575708A 2001-03-22 2002-03-15 フォトレジスト組成物 Pending JP2005508512A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US27786001P 2001-03-22 2001-03-22
PCT/US2002/007938 WO2002077712A2 (en) 2001-03-22 2002-03-15 Photoresist composition

Publications (2)

Publication Number Publication Date
JP2005508512A JP2005508512A (ja) 2005-03-31
JP2005508512A5 true JP2005508512A5 (cg-RX-API-DMAC10.html) 2005-12-22

Family

ID=23062664

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002575708A Pending JP2005508512A (ja) 2001-03-22 2002-03-15 フォトレジスト組成物

Country Status (2)

Country Link
JP (1) JP2005508512A (cg-RX-API-DMAC10.html)
WO (1) WO2002077712A2 (cg-RX-API-DMAC10.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6939662B2 (en) 2002-05-31 2005-09-06 Fuji Photo Film Co., Ltd. Positive-working resist composition
JP2006018193A (ja) * 2004-07-05 2006-01-19 Toyobo Co Ltd ポジ型感光性樹脂前駆体組成物
JP5171422B2 (ja) 2008-06-19 2013-03-27 ルネサスエレクトロニクス株式会社 感光性組成物、これを用いたパターン形成方法、半導体素子の製造方法
KR101834253B1 (ko) 2010-12-03 2018-03-06 삼성전자주식회사 막질 간 인터믹싱을 제어하는 ｄｐｔ 공정을 이용한 반도체 소자의 제조방법 및 그 방법에 의해 제조된 반도체 소자
JP7395278B2 (ja) * 2019-07-31 2023-12-11 日東電工株式会社 感光性組成物、デバイス及びデバイスの製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4207261C2 (de) * 1992-03-07 2000-03-16 Clariant Gmbh Styrol-Monomere mit 2,2-Bis-trifluormethyl-oxaethano-Brückengliedern, Polymere und deren Verwendung
US6136501A (en) * 1998-08-28 2000-10-24 Shipley Company, L.L.C. Polymers and photoresist compositions comprising same
US6673523B2 (en) * 1999-03-09 2004-01-06 Matsushita Electric Industrial Co., Ltd. Pattern formation method
DE60044493D1 (de) * 1999-05-04 2010-07-15 Du Pont Fluorierte photoresists und verfahren für die mikrolithographie

Similar Documents

Publication Publication Date Title
JP2000298347A5 (cg-RX-API-DMAC10.html)
JP2002244289A5 (cg-RX-API-DMAC10.html)
JP2005509176A5 (cg-RX-API-DMAC10.html)
JP2004117688A5 (cg-RX-API-DMAC10.html)
JP2009258722A5 (cg-RX-API-DMAC10.html)
JP2014085643A5 (cg-RX-API-DMAC10.html)
JP2009543340A5 (cg-RX-API-DMAC10.html)
TWI456350B (zh) 含有具脲基之聚矽氧的阻劑底層膜形成組成物
JP2003107710A5 (cg-RX-API-DMAC10.html)
JP2008133246A5 (cg-RX-API-DMAC10.html)
JP2009276406A5 (cg-RX-API-DMAC10.html)
KR20150097550A (ko) 환상 디에스테르기를 갖는 실리콘 함유 레지스트 하층막 형성 조성물
JP2008524650A5 (cg-RX-API-DMAC10.html)
KR100963111B1 (ko) 감광성 수지 조성물
JP2004361629A5 (cg-RX-API-DMAC10.html)
JP2004038143A5 (cg-RX-API-DMAC10.html)
JP2002278053A5 (cg-RX-API-DMAC10.html)
JP2007529037A5 (cg-RX-API-DMAC10.html)
JPH11344808A5 (cg-RX-API-DMAC10.html)
JP2016157451A5 (cg-RX-API-DMAC10.html)
JP2008260839A5 (cg-RX-API-DMAC10.html)
JP2002236358A5 (cg-RX-API-DMAC10.html)
EP1276012A3 (en) Resist patterning process
EP2166411A3 (en) Lithographic printing plate precursor, process for producing lithographic printing plate, and lithographic printing plate
JP2002006495A5 (cg-RX-API-DMAC10.html)