JP2005503027A5 - - Google Patents

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Publication number
JP2005503027A5
JP2005503027A5 JP2003527843A JP2003527843A JP2005503027A5 JP 2005503027 A5 JP2005503027 A5 JP 2005503027A5 JP 2003527843 A JP2003527843 A JP 2003527843A JP 2003527843 A JP2003527843 A JP 2003527843A JP 2005503027 A5 JP2005503027 A5 JP 2005503027A5
Authority
JP
Japan
Prior art keywords
electrode
laser
discharge
anode
cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003527843A
Other languages
English (en)
Japanese (ja)
Other versions
JP3971382B2 (ja
JP2005503027A (ja
Filing date
Publication date
Priority claimed from US09/953,026 external-priority patent/US6711202B2/en
Priority claimed from US10/081,589 external-priority patent/US20020154670A1/en
Priority claimed from US10/104,502 external-priority patent/US6690706B2/en
Application filed filed Critical
Priority claimed from PCT/US2002/028463 external-priority patent/WO2003023910A2/en
Publication of JP2005503027A publication Critical patent/JP2005503027A/ja
Publication of JP2005503027A5 publication Critical patent/JP2005503027A5/ja
Application granted granted Critical
Publication of JP3971382B2 publication Critical patent/JP3971382B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2003527843A 2001-09-13 2002-09-06 改良された電極を備える高繰返率のレーザ Expired - Fee Related JP3971382B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US09/953,026 US6711202B2 (en) 2000-06-09 2001-09-13 Discharge laser with porous insulating layer covering anode discharge surface
US10/081,589 US20020154670A1 (en) 2000-06-09 2002-02-21 Electric discharge laser with two-material electrodes
US10/104,502 US6690706B2 (en) 2000-06-09 2002-03-22 High rep-rate laser with improved electrodes
PCT/US2002/028463 WO2003023910A2 (en) 2001-09-13 2002-09-06 High rep-rate laser with improved electrodes

Publications (3)

Publication Number Publication Date
JP2005503027A JP2005503027A (ja) 2005-01-27
JP2005503027A5 true JP2005503027A5 (enExample) 2006-01-05
JP3971382B2 JP3971382B2 (ja) 2007-09-05

Family

ID=27374022

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003527843A Expired - Fee Related JP3971382B2 (ja) 2001-09-13 2002-09-06 改良された電極を備える高繰返率のレーザ

Country Status (4)

Country Link
EP (1) EP1436866A4 (enExample)
JP (1) JP3971382B2 (enExample)
KR (1) KR100940782B1 (enExample)
WO (1) WO2003023910A2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7230965B2 (en) * 2001-02-01 2007-06-12 Cymer, Inc. Anodes for fluorine gas discharge lasers
US7095774B2 (en) * 2001-09-13 2006-08-22 Cymer, Inc. Cathodes for fluorine gas discharge lasers
US7339973B2 (en) * 2001-09-13 2008-03-04 Cymer, Inc. Electrodes for fluorine gas discharge lasers
US7301980B2 (en) * 2002-03-22 2007-11-27 Cymer, Inc. Halogen gas discharge laser electrodes
EP2259390A1 (en) * 2003-07-29 2010-12-08 Cymer, Inc. Gas discharge laser electrode
JP4579002B2 (ja) * 2005-02-21 2010-11-10 株式会社小松製作所 パルス発振型放電励起レーザ装置
US7542502B2 (en) * 2005-09-27 2009-06-02 Cymer, Inc. Thermal-expansion tolerant, preionizer electrode for a gas discharge laser
WO2015125286A1 (ja) * 2014-02-21 2015-08-27 ギガフォトン株式会社 レーザチャンバ
KR102626653B1 (ko) * 2018-01-11 2024-01-17 사이머 엘엘씨 방전 체임버용 전극
CN112210775B (zh) * 2020-10-09 2022-12-02 中国科学院微电子研究所 一种零件涂层制备装置及零件涂层制备方法、终端装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6348874A (ja) * 1986-08-19 1988-03-01 Matsushita Electric Ind Co Ltd レ−ザ装置
JPH04218985A (ja) * 1990-07-06 1992-08-10 Mitsubishi Electric Corp エキシマレーザ装置
CA2082405C (en) * 1991-03-06 2004-09-28 Gregory M. Jursich Method for extending the gas lifetime of excimer lasers
DE4113241C2 (de) * 1991-04-23 1994-08-11 Lambda Physik Forschung Gepulster Gasentladungslaser
US5359620A (en) * 1992-11-12 1994-10-25 Cymer Laser Technologies Apparatus for, and method of, maintaining a clean window in a laser
US5377215A (en) * 1992-11-13 1994-12-27 Cymer Laser Technologies Excimer laser
DE4401892C2 (de) * 1994-01-24 1999-06-02 Lambda Physik Forschung Elektrode für einen Gasentladungslaser und Verfahren zum Formen einer Elektrode für einen Gasentladungslaser
US5763930A (en) * 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
US5818865A (en) * 1997-05-16 1998-10-06 Cymer, Inc. Compact excimer laser insulator with integral pre-ionizer
US6330261B1 (en) * 1997-07-18 2001-12-11 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate ArF excimer laser
JPH1168196A (ja) * 1997-08-26 1999-03-09 Nissin Electric Co Ltd ガスレーザ装置
US6654403B2 (en) * 2000-06-09 2003-11-25 Cymer, Inc. Flow shaping electrode with erosion pad for gas discharge laser
US6711202B2 (en) * 2000-06-09 2004-03-23 Cymer, Inc. Discharge laser with porous insulating layer covering anode discharge surface
US6466602B1 (en) * 2000-06-09 2002-10-15 Cymer, Inc. Gas discharge laser long life electrodes

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