KR100940782B1 - 향상된 전극을 구비한 고반복률 레이저 - Google Patents

향상된 전극을 구비한 고반복률 레이저 Download PDF

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Publication number
KR100940782B1
KR100940782B1 KR1020047003801A KR20047003801A KR100940782B1 KR 100940782 B1 KR100940782 B1 KR 100940782B1 KR 1020047003801 A KR1020047003801 A KR 1020047003801A KR 20047003801 A KR20047003801 A KR 20047003801A KR 100940782 B1 KR100940782 B1 KR 100940782B1
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South Korea
Prior art keywords
anode
discharge
laser
cathode
gas discharge
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Expired - Fee Related
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KR1020047003801A
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English (en)
Korean (ko)
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KR20040031790A (ko
Inventor
모르톤리차드지.
다이어티모시에스.
스테이거토마스디.
우자즈도우스키리차드씨.
왓슨톰에이.
무스만브라이언
이바스첸코알렉스피.
길레스피에왈터디
레티그커티스엘.
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사이머 인코포레이티드
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Filing date
Publication date
Priority claimed from US09/953,026 external-priority patent/US6711202B2/en
Priority claimed from US10/081,589 external-priority patent/US20020154670A1/en
Priority claimed from US10/104,502 external-priority patent/US6690706B2/en
Application filed by 사이머 인코포레이티드 filed Critical 사이머 인코포레이티드
Publication of KR20040031790A publication Critical patent/KR20040031790A/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0381—Anodes or particular adaptations thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0388—Compositions, materials or coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09702—Details of the driver electronics and electric discharge circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
KR1020047003801A 2001-09-13 2002-09-06 향상된 전극을 구비한 고반복률 레이저 Expired - Fee Related KR100940782B1 (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US09/953,026 US6711202B2 (en) 2000-06-09 2001-09-13 Discharge laser with porous insulating layer covering anode discharge surface
US09/953,026 2001-09-13
US10/081,589 2002-02-21
US10/081,589 US20020154670A1 (en) 2000-06-09 2002-02-21 Electric discharge laser with two-material electrodes
US10/104,502 2002-03-22
US10/104,502 US6690706B2 (en) 2000-06-09 2002-03-22 High rep-rate laser with improved electrodes
PCT/US2002/028463 WO2003023910A2 (en) 2001-09-13 2002-09-06 High rep-rate laser with improved electrodes

Publications (2)

Publication Number Publication Date
KR20040031790A KR20040031790A (ko) 2004-04-13
KR100940782B1 true KR100940782B1 (ko) 2010-02-11

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020047003801A Expired - Fee Related KR100940782B1 (ko) 2001-09-13 2002-09-06 향상된 전극을 구비한 고반복률 레이저

Country Status (4)

Country Link
EP (1) EP1436866A4 (enExample)
JP (1) JP3971382B2 (enExample)
KR (1) KR100940782B1 (enExample)
WO (1) WO2003023910A2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7230965B2 (en) * 2001-02-01 2007-06-12 Cymer, Inc. Anodes for fluorine gas discharge lasers
US7095774B2 (en) * 2001-09-13 2006-08-22 Cymer, Inc. Cathodes for fluorine gas discharge lasers
US7339973B2 (en) * 2001-09-13 2008-03-04 Cymer, Inc. Electrodes for fluorine gas discharge lasers
US7301980B2 (en) * 2002-03-22 2007-11-27 Cymer, Inc. Halogen gas discharge laser electrodes
EP2259390A1 (en) * 2003-07-29 2010-12-08 Cymer, Inc. Gas discharge laser electrode
JP4579002B2 (ja) * 2005-02-21 2010-11-10 株式会社小松製作所 パルス発振型放電励起レーザ装置
US7542502B2 (en) * 2005-09-27 2009-06-02 Cymer, Inc. Thermal-expansion tolerant, preionizer electrode for a gas discharge laser
WO2015125286A1 (ja) * 2014-02-21 2015-08-27 ギガフォトン株式会社 レーザチャンバ
KR102626653B1 (ko) * 2018-01-11 2024-01-17 사이머 엘엘씨 방전 체임버용 전극
CN112210775B (zh) * 2020-10-09 2022-12-02 中国科学院微电子研究所 一种零件涂层制备装置及零件涂层制备方法、终端装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5359620A (en) * 1992-11-12 1994-10-25 Cymer Laser Technologies Apparatus for, and method of, maintaining a clean window in a laser
US5586134A (en) * 1992-11-13 1996-12-17 Cymer Laser Technologies Excimer laser
US5818865A (en) * 1997-05-16 1998-10-06 Cymer, Inc. Compact excimer laser insulator with integral pre-ionizer
US5897847A (en) * 1991-03-06 1999-04-27 American Air Liquide Method for extending the gas lifetime of excimer lasers

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6348874A (ja) * 1986-08-19 1988-03-01 Matsushita Electric Ind Co Ltd レ−ザ装置
JPH04218985A (ja) * 1990-07-06 1992-08-10 Mitsubishi Electric Corp エキシマレーザ装置
DE4113241C2 (de) * 1991-04-23 1994-08-11 Lambda Physik Forschung Gepulster Gasentladungslaser
DE4401892C2 (de) * 1994-01-24 1999-06-02 Lambda Physik Forschung Elektrode für einen Gasentladungslaser und Verfahren zum Formen einer Elektrode für einen Gasentladungslaser
US5763930A (en) * 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
US6330261B1 (en) * 1997-07-18 2001-12-11 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate ArF excimer laser
JPH1168196A (ja) * 1997-08-26 1999-03-09 Nissin Electric Co Ltd ガスレーザ装置
US6654403B2 (en) * 2000-06-09 2003-11-25 Cymer, Inc. Flow shaping electrode with erosion pad for gas discharge laser
US6711202B2 (en) * 2000-06-09 2004-03-23 Cymer, Inc. Discharge laser with porous insulating layer covering anode discharge surface
US6466602B1 (en) * 2000-06-09 2002-10-15 Cymer, Inc. Gas discharge laser long life electrodes

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5897847A (en) * 1991-03-06 1999-04-27 American Air Liquide Method for extending the gas lifetime of excimer lasers
US5359620A (en) * 1992-11-12 1994-10-25 Cymer Laser Technologies Apparatus for, and method of, maintaining a clean window in a laser
US5586134A (en) * 1992-11-13 1996-12-17 Cymer Laser Technologies Excimer laser
US5818865A (en) * 1997-05-16 1998-10-06 Cymer, Inc. Compact excimer laser insulator with integral pre-ionizer

Also Published As

Publication number Publication date
WO2003023910A2 (en) 2003-03-20
JP3971382B2 (ja) 2007-09-05
WO2003023910A3 (en) 2003-05-30
EP1436866A4 (en) 2009-10-28
EP1436866A2 (en) 2004-07-14
JP2005503027A (ja) 2005-01-27
KR20040031790A (ko) 2004-04-13

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KR100940782B1 (ko) 향상된 전극을 구비한 고반복률 레이저
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