JP2005353849A - Processor - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a processor which efficiently and sufficiently exhausts unwanted gases produced from a process tank. <P>SOLUTION: The processor has a body 2 having a process chamber 6 inside, an inlet port 3 for feeding a gas G into the process chamber 6, and an exhaust port 4 for exhausting the gas G in the process chamber 6; a process tank 9 containing a treating solution 20 for treating workpieces 25; and a partition plate 17 for partitioning the process chamber 6 into a first space 7 at the inlet port 3, and a second space 8 at the exhaust port 4 with a gap 18 formed with the outer side wall of the process tank 9, so as to communicate with the first and second spaces 7, 8. An exhausting means (not shown) is connected to the exhaust port 4, and actuated to guide the gas G flowing into the process chamber 6 through the inlet port 3 to the exhaust port 4 in the process chamber 6 and exhaust it through the process chamber 6 to exhaust port 4 outside the process chamber 6. The gas G is restricted as passing through the gap 18 to increase the flowing velocity. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a processing apparatus for processing an object to be processed with a processing liquid, and particularly to a processing apparatus having a function of efficiently exhausting a gas generated during processing.

Conventionally, a cleaning apparatus (processing apparatus) for removing a resist layer from an object to be cleaned (processed object) such as a silicon wafer has been used.
For example, as illustrated in FIG. 3, the cleaning apparatus 100 includes a cleaning tank 101 therein, and is provided with an air supply port 102 and an exhaust port 103 (see Patent Document 1).
Then, by putting the cleaning object 105 into the cleaning liquid 104 stored in the cleaning tank 101, the resist layer present on the surface is decomposed and removed.

By the way, when the cleaning object 105 is processed using such a cleaning apparatus 100, gas is generated by the reaction between the cleaning liquid 104 and the organic substance or the evaporation of the cleaning liquid 104 itself. Since this gas is unnecessary, the exhaust gas of a certain amount or more is continuously collected and recovered, and this unnecessary gas or the like prevents health damage to the human body or prevents corrosion of the apparatus.
In the illustrated configuration, the top plate 106 having the opening 107 is arranged with a gap between the opening 107 and the upper end of the cleaning tank 101 to form an efficient air flow, thereby improving the efficiency. Trying to exhaust unnecessary gases.

However, in such a cleaning apparatus 100, an air flow having a high flow velocity is obtained in the direction along the lower surface of the top plate 106, but sufficient in the direction (vertical direction) along the outer peripheral wall of the cleaning tank (processing tank) 101. There is no airflow at the flow velocity.
For this reason, in order to exhaust the unnecessary gas, a large amount of air present at any location inside the cleaning apparatus 100 must be exhausted at the same time. As a result, the exhaust efficiency of the unnecessary gas from the exhaust port 103 is increased. There is a problem of lowering.

JP-A-6-333908

  An object of the present invention is to provide a treatment apparatus that can efficiently and sufficiently exhaust unnecessary gas generated from a treatment tank.

The above object is achieved by the present invention described below.
The processing apparatus of the present invention includes an apparatus main body including a processing chamber provided therein, an air supply port for supplying a gas into the processing chamber, and an exhaust port for exhausting the gas in the processing chamber;
A treatment tank provided in the treatment chamber and containing a treatment liquid for treating an object to be treated;
The processing chamber is partitioned into a first space on the air supply port side and a second space on the exhaust port side, and between the first space and the first space between the outer peripheral wall of the processing tank. And a partition plate forming a gap communicating with the two spaces.

Thus, when exhausting the processing chamber, a gas flow is formed in the processing chamber from the air supply port to the exhaust port through the first space, the gap, and the second space. By restricting the gap, the flow velocity is increased.
Therefore, since the gas generated in the treatment tank can be efficiently guided to the exhaust port by being put on this fast gas flow, the gas can be efficiently exhausted with a small exhaust amount (air supply amount). it can.

In the processing apparatus of the present invention, the processing tank has a processing tank body having an opening that opens upward,
It is preferable that the opening is provided in the processing chamber so as to be positioned in the first space.
Thereby, the unnecessary gas generated in the treatment tank can be put on the gas flow having a high flow velocity and led to the exhaust port more efficiently to be exhausted.

In the processing apparatus of the present invention, the processing tank has a lid mounted so as to close the opening of the processing tank main body,
It is preferable that a gap that communicates the inside of the processing tank and the processing chamber is formed in a state where the lid is installed in the processing tank main body.
As a result, the unnecessary gas generated in the processing tank flows out to the outer peripheral wall side of the processing tank through the gap between the upper end of the processing tank main body and the lid, and the flow velocity increases along the outer peripheral wall of the processing tank. Riding on the generated gas leads to the exhaust port more quickly and is exhausted.
In the processing apparatus of the present invention, the processing tank body includes an inner container for storing the processing liquid,
It is preferable to include an outer container that houses the inner container and has a function of storing the processing liquid leaked from the inner container.
Thereby, it can prevent more reliably that the inside of an apparatus main body is contaminated.

In the processing apparatus of this invention, it is preferable that the said air supply port is provided above the upper end of the said processing tank, and the said exhaust port is provided below the lower end of the said processing tank.
As a result, unnecessary gas generated in the treatment tank can be efficiently guided to the exhaust port by being put on the gas flow with a high flow velocity, and exhausted efficiently with a small exhaust amount (supply amount). can do.

In the processing apparatus of the present invention, the area in plan view of the portion surrounded by the outer peripheral wall of the processing tank is S ₁ [mm ² ], and the total area of the gap between the partition plate and the outer peripheral wall of the processing tank is A. _{When 1} [mm ² ], it is preferable to satisfy the relationship of 1 / 4S ₁ <A ₁ <1 / 2S ₁ .
As a result, the gas flow from the air supply port to the exhaust port through the first space, the gap, and the second space can be accelerated to a predetermined flow velocity at the gap portion, so that there is no need from the processing tank side. Gas can be efficiently carried and led to the exhaust port side.

In the processing apparatus of this invention, it is preferable that the said to-be-processed object is a base material to which organic substance adhered.
In the processing apparatus of this invention, it is preferable that the said organic substance is the resist layer used for patterning of the said base material.
In the processing apparatus of this invention, it is preferable that the said process liquid is what can decompose | disassemble and remove the said organic substance.

In the processing apparatus of the present invention, it is preferable that the processing liquid contains concentrated sulfur.
Although the treatment liquid containing sulfuric acid is highly hygroscopic, according to the present invention, the amount of gas flowing into the treatment chamber (amount of air supply) can be reduced. Even if it is used, the rate at which the concentration of the treatment liquid decreases due to the moisture contained therein can be reduced.
As a result, it is possible to prevent or suppress the deterioration / deterioration of the treatment liquid and extend the life of the liquid. Thereby, the cost of a processing liquid can be reduced and the processing cost of a to-be-processed object can be reduced significantly.

In the processing apparatus of this invention, it is preferable that the said process liquid has a hygroscopic property.
According to the present invention, since the amount of gas flowing into the processing chamber can be reduced, for example, even if normal air (including moisture) is used as the gas, the concentration of the processing liquid is reduced by moisture contained therein. You can slow down.
As a result, it is possible to prevent or suppress the deterioration / deterioration of the treatment liquid and extend the life of the liquid. Thereby, the cost of a processing liquid can be reduced and the processing cost of a to-be-processed object can be reduced significantly.
From this point of view, the present invention is particularly preferably applied to processing using a hygroscopic processing solution.

Hereinafter, the processing apparatus of the present invention will be described in detail based on the illustrated preferred embodiment.
FIG. 1 is a longitudinal sectional view showing an embodiment of the processing apparatus of the present invention, and FIG. 2 is a view of the periphery of the processing tank of the processing apparatus shown in FIG. 1 as viewed from above (with the lid of the processing tank removed). is there. Hereinafter, the upper side in FIG. 1 will be described as “upper” or “upper”, and the lower side will be described as “lower” or “lower”.

A processing apparatus 1 shown in FIG. 1 is used for decomposing / removing organic substances from an object to be processed 25, and an apparatus main body 2 in which a processing chamber 6 for processing the object to be processed 25 is provided. And a processing tank 9 provided in the processing chamber 6 of the apparatus main body 2 and a transport means 40 for transporting the workpiece 25.
The object to be processed 25 is not particularly limited, and examples thereof include a resist layer used for patterning, and a substrate to which an organic substance such as an impurity attached when forming a metal layer is attached.

Examples of the base material include a silicon substrate (silicon wafer), a glass substrate, a quartz substrate, or a substrate on which various metal layers are formed.
The apparatus main body 2 has a box shape and has a processing chamber 6 sealed inside.
An air supply port 3 communicating with the processing chamber 6 is provided on the upper side surface of the apparatus main body 2, and an exhaust port 4 communicating with the processing chamber 6 is provided on the lower side surface of the apparatus main body 2. The exhaust port 4 is connected to an exhaust means (ventilation means) not shown.

By the operation of the exhaust means, the gas G flows (supplied) into the processing chamber 6 through the air supply port 3, flows through the processing chamber 6, is guided to the exhaust port 4, and is processed through the exhaust port 4. The air is exhausted outside the chamber 6.
Further, a filter 30 is provided near the air supply port 3 in the apparatus main body 2. The filter 30 has a function of capturing foreign matters such as dust contained in the gas G supplied into the processing chamber 6. When the gas G passes through the filter 30, foreign matter is removed and the gas G becomes clean.
Here, as the gas G, in addition to the atmosphere (air), for example, dried air, an inert gas such as nitrogen gas, and the like can be given.
A gas supply means (not shown) is connected to the air supply port 3, and the gas G is forcibly supplied from the air supply port 3 into the processing chamber 6 by the operation of the gas supply means. Also good.
An exhaust control valve 5 is provided at the exhaust port 4 of the apparatus body 2, and the exhaust control valve 5 adjusts the opening degree of the exhaust port 4 to obtain an exhaust amount corresponding to the degree of closure.

The processing tank 9 is fixed to a substantially central portion in the vertical direction (vertical direction) in the processing chamber 6 by a fixing means (not shown). The processing tank 9 includes a box-shaped processing tank main body 10 that is open at the top, and a plate-like lid body 16 that is detachably mounted so as to cover the opening 10 a of the processing tank main body 10.
The processing tank 9 is provided in the processing chamber 6 so that the air supply port 3 is located on the upper end side (opening 10a side) and the exhaust port 4 is located on the lower end side.

The processing tank main body 10 includes a box-shaped inner container 11 whose upper part is opened, and a box-shaped outer container 12 which houses the inner container 11 and whose upper part is opened.
A predetermined amount of the processing liquid 20 is filled (stored) in the inner container 11, and the organic matter is decomposed and removed from the processing object 25 by immersing (contacting) the processing object 25 in the processing liquid 20. The

Although it does not specifically limit as the processing liquid 20, When using for decomposition | disassembly and removal of a resist layer (organic substance), what contains sulfuric acid, such as sulfuric acid aqueous solution and sulfuric acid hydrogen peroxide (aqueous solution containing a sulfuric acid and hydrogen peroxide), for example. Is preferred. By using the treatment liquid 20, the resist layer can be easily and reliably decomposed and removed by its strong oxidizing power.
Moreover, when using sulfuric acid aqueous solution, it is preferable that the sulfuric acid concentration in sulfuric acid aqueous solution is 85 weight% or more, and it is more preferable that it is about 80 to 96 weight%.
On the other hand, when sulfuric acid / hydrogen peroxide is used, the sulfuric acid concentration in the sulfuric acid aqueous solution is preferably about 70 to 95% by weight, and more preferably about 80 to 96% by weight. Further, the concentration of hydrogen peroxide is preferably about 0.1 to 10% by weight, and more preferably about 0.5 to 7.5% by weight.

By using such a sulfuric acid aqueous solution and sulfuric acid / hydrogen peroxide, the resist layer (organic substance) can be decomposed and removed more efficiently.
In this case, the treatment liquid 20 is, for example, an organic solvent such as a KOH aqueous solution, ozone water, N-methyl-2-pyrrolidone (NMP), dimethyl sulfoxide (DMSO), or the like depending on the type of organic matter. Can also be used.

The inner container 11 and the outer container 12 are provided such that their upper end surfaces are located on substantially the same plane. The outer container 12 has a function of storing the processing liquid 20 leaked from the inner container 11.
In addition, in the space formed between the inner container 11 and the outer container 12, for example, a heating medium for heating the processing liquid 20 may be circulated to heat the processing liquid 20.

The lid body 16 is attached to the processing tank body 10 so as to cover the opening 10a. Then, with the lid 16 attached to the processing tank body 10, a gap 15 is formed between the processing tank 9 and the processing chamber 6.
As a result, unnecessary gas (harmful gas) such as gas generated by decomposition of organic substances in the inner container 11 or gas generated (vaporized) by the processing liquid 20 itself is passed through the gap 15 through the processing tank. 9 to the outer peripheral wall side. As a result, as will be described later, this unnecessary gas can be put on the flow of the gas G formed along the outer peripheral wall of the processing tank 9 (along the vertical direction), and the unnecessary gas can be more quickly and reliably supplied. It can be discharged through the exhaust port 4.
In addition to providing a recess (groove) on the lower surface of the lid 16 as in the present embodiment, the gap 15 is provided with, for example, a recess (slit) at the upper edge of the inner container 11 and the outer container 12. Or the like.
Moreover, you may make it abbreviate | omit such a cover body 16 as needed.

A partition plate 17 is provided on the inner peripheral surface of the apparatus main body 2 so as to protrude substantially perpendicular to the outer peripheral surface (outer wall surface) of the outer container 12 of the processing tank 9 and to surround the outer container 12. ing.
The partition plate 17 divides the inside of the processing chamber 6 in the vertical direction into two spaces, a first space 7 on the air supply port 3 side and a second space 8 on the exhaust port 4 side. Further, the opening 10 a of the processing tank body 10 is located in the first space 7.
Thereby, between the inner peripheral surface of the partition plate 17 and the outer peripheral surface of the outer container 12 (the outer peripheral wall of the processing tank 9), the first space 7 and the second space 8 are formed over the entire periphery. A gap 18 communicating with each other is formed. The gas G that has flowed into the first space 7 from the air supply port 3 flows into the second space 8 through the gap 18.

At this time, the flow rate of the gas G that has flowed in is increased by being throttled in the gap 18, and the unnecessary gas that has flowed out from the gap 15 of the treatment tank 9 is on the flow of the gas G whose flow rate has been increased. Thereby, the unnecessary gas is quickly and reliably guided to the second space 8 through the gap 18, and is efficiently guided to the exhaust port 4 from the second space 8 and exhausted.
Thus, according to the present invention, unnecessary gas can be exhausted from the exhaust port 4 quickly and reliably with a small exhaust amount. In other words, the amount of gas (air supply amount) supplied into the processing chamber 6 can be reduced.

Here, the area in plan view of the portion surrounded by the outer peripheral wall of the processing tank 9 (the area indicated by the oblique lines in FIG. 2), that is, the projected area of the outer container 12 is S ₁ [mm ² ], and the partition plate 17 When the total area of the gap 18 (shown by hatching in FIG. 2) with the outer peripheral wall of the treatment tank 9 (outer container 12) is A ₁ [mm ² ], 1 / 4S ₁ <A ₁ <1 / 2S ₁ It is preferable to satisfy this relationship.
When the total area A ₁ [mm ² ] of the gap 18 becomes ¼ or less of the projected area S ₁ [mm ² ] of the outer container 12, a flow faster than the flow rate of the gas G in the second space 8 is caused in the gap 18. It is difficult to generate uniformly, resistance to the flow of the gas G is generated, and the exhaust efficiency may be deteriorated.
On the other hand, when the total area A ₁ [mm ² ] of the gap 18 becomes ½ or more of the projected area S ₁ [mm ² ] of the outer container 12, the exhaust energy is dispersed, so There is a possibility that a flow faster than the flow rate of the gas G in the second space 8 cannot be created uniformly.

Note that the total area A ₁ [mm ² ] of the gap 18 is appropriately set according to the flow rate of the exhaust port 4 so that the flow rate of the gas G in the gap 18 becomes a desired one.
In the case of this embodiment, since the gap 15 on the treatment tank 9 side is close to the gap 18 on the partition plate 17 side, the unnecessary gas flowing out from the gap 15 on the treatment tank 9 side can be more efficiently It can be put on the flow of the gas G along the outer peripheral wall of the processing tank 9.

Using such a processing apparatus 1, the object to be processed 25 can be processed as follows.
<1> First, the conveying means 40 is operated. And the cover body 16 is removed from the processing tank main body 10. FIG. Next, the workpiece 25 is immersed in the processing liquid 20 stored (stored) in the inner container 11. In this state, the lid body 16 is attached to the processing tank main body 10 so as to cover the opening 10a.
At this time, a gap 15 communicating with the processing chamber 6 is formed in the processing tank 9 (between the processing tank main body 10 and the lid body 16).

<2> Next, the processing liquid 20 in the inner container 11 is heated to a predetermined temperature by heating by a heating means (not shown). Thereby, the organic substance which the to-be-processed object 25 has is decomposed | disassembled and removed gradually.
The temperature (treatment temperature) of the treatment liquid 20 is not particularly limited, but is preferably about 25 to 150 ° C, and more preferably about 90 to 130 ° C.
Further, the processing time may be a time for sufficiently decomposing / removing the organic matter, and slightly varies depending on the type, composition, processing temperature, etc. of the processing liquid 20.

<3> At this time, unnecessary gas such as gas due to decomposition of organic matter or gas due to vaporization of the processing liquid 20 is generated, and this unnecessary gas flows out to the outer peripheral wall side of the processing tank 9 through the gap 15. To do.
Then, by operating the exhaust means, a flow of the gas G from the air supply port 3 to the exhaust port 4 through the first space 7, the gap 18, and the second space 8 is formed. An unnecessary gas from the treatment tank 9 is placed on the exhaust gas and exhausted through the exhaust port 4.

In the processing apparatus 1 of the present embodiment, the unnecessary gas that has flowed out of the processing tank 9 can be placed on the flow of the gas G whose flow velocity has been increased along the outer peripheral wall of the processing tank 9. It does not diffuse inside and can be efficiently exhausted on the flow of the gas G.
Therefore, since the amount of the gas G flowing into the processing chamber 8 can be reduced when exhausting unnecessary gas or the like, the total air supply amount (total exhaust amount) can be significantly reduced as compared with the conventional case.

  For example, as in this embodiment, the treatment liquid 20 containing sulfuric acid is highly hygroscopic, but the amount of the gas G flowing into the treatment chamber 8 can be reduced. Even when a material containing a large amount of water (for example, normal air) is used, the rate at which the concentration of the treatment liquid 20 decreases due to moisture contained therein can be slowed. As a result, alteration / deterioration of the treatment liquid 20 can be prevented or suppressed, and the life of the liquid can be extended. Thereby, the cost of the processing liquid 20 can be reduced.

Moreover, by using normal air as the gas G, the cost required for the gas G can be reduced.
For this reason, according to the present invention, the processing cost of the workpiece 25 can be greatly reduced.
As described above, the processing apparatus of the present invention is particularly preferably applied to processing using the processing liquid 20 having hygroscopicity.

The processing apparatus of the present invention has been described above, but the present invention is not limited to this.
For example, the configuration of each part of the processing apparatus of the present invention can be replaced with any one that can exhibit the same function, or can be added with any configuration.
In addition, the treatment in the present invention is not limited to decomposition / removal of organic substances, and is applicable to, for example, cleaning of a substrate (substrate) using an organic solvent as a treatment liquid, peeling of a mask using a peeling liquid, and the like. can do.

It is a longitudinal cross-sectional view which shows embodiment of the processing apparatus of this invention. It is the figure (state which removed the cover body of the processing tank) which looked at the processing tank periphery of the processing apparatus shown in FIG. 1 from upper direction. It is the schematic which showed an example of the conventional processing apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Processing apparatus 2 ... Apparatus body 3 ... Supply port 4 ... Exhaust port 5 ... Exhaust control valve 6 ... Processing chamber 7 ... 1st space 8 ... 2nd space 9 ... Processing Tank 10... Processing tank body 10 a .. Opening 11... Inner container 12... Outer container 15... Object 30... Filter 40... Conveying means G .. Gas 100... Cleaning device 101. 107... Opening S ₁ ... Area of the portion surrounded by the outer peripheral wall of the processing tank in plan view A ₁ ... Total area of the gap 18 between the partition plate and the outer peripheral wall of the processing tank 9

Claims (11)

An apparatus main body comprising a processing chamber provided inside, an air supply port for supplying a gas into the processing chamber, and an exhaust port for exhausting the gas in the processing chamber;
A treatment tank provided in the treatment chamber and containing a treatment liquid for treating an object to be treated;
The processing chamber is partitioned into a first space on the air supply port side and a second space on the exhaust port side, and between the first space and the first space between the outer peripheral wall of the processing tank. And a partition plate that forms a gap communicating with the two spaces. The treatment tank has a treatment tank body having an opening that opens upward,
The processing apparatus according to claim 1, wherein the processing unit is provided in the processing chamber so that the opening is located in the first space. The treatment tank has a lid mounted so as to close the opening of the treatment tank main body,
The processing apparatus according to claim 2, wherein a gap that communicates the inside of the processing tank and the processing chamber is formed in a state in which the lid is installed in the processing tank main body. The processing tank main body includes an inner container for storing the processing liquid,
The processing apparatus of Claim 2 or 3 provided with the outer side container which has a function which accommodates this inner side container and stores the said processing liquid leaked from the said inner side container.   The processing apparatus according to claim 1, wherein the air supply port is provided above an upper end of the processing tank, and the exhaust port is provided below a lower end of the processing tank. The area in plan view of the portion surrounded by the outer peripheral wall of the treatment tank was S ₁ [mm ² ], and the total area of the gap between the partition plate and the outer peripheral wall of the treatment tank was A ₁ [mm ² ]. The processing apparatus according to any one of claims 1 to 5, wherein a relationship of 1 / 4S ₁ <A ₁ <1 / 2S ₁ is satisfied.   The processing apparatus according to claim 1, wherein the object to be processed is a base material to which an organic substance is attached.   The processing apparatus according to claim 7, wherein the organic substance is a resist layer used for patterning the base material.   The processing apparatus according to claim 7, wherein the processing liquid is capable of decomposing and removing the organic matter.   The processing apparatus according to claim 1, wherein the processing liquid contains concentrated sulfur.   The processing apparatus according to claim 1, wherein the processing liquid has a hygroscopic property.

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