JP2005347544A5 - - Google Patents

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Publication number
JP2005347544A5
JP2005347544A5 JP2004165878A JP2004165878A JP2005347544A5 JP 2005347544 A5 JP2005347544 A5 JP 2005347544A5 JP 2004165878 A JP2004165878 A JP 2004165878A JP 2004165878 A JP2004165878 A JP 2004165878A JP 2005347544 A5 JP2005347544 A5 JP 2005347544A5
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JP
Japan
Prior art keywords
patterns
mark
exposure apparatus
wafer
reticle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004165878A
Other languages
English (en)
Japanese (ja)
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JP2005347544A (ja
JP4590213B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2004165878A priority Critical patent/JP4590213B2/ja
Priority claimed from JP2004165878A external-priority patent/JP4590213B2/ja
Priority to US11/144,319 priority patent/US20050270509A1/en
Publication of JP2005347544A publication Critical patent/JP2005347544A/ja
Publication of JP2005347544A5 publication Critical patent/JP2005347544A5/ja
Application granted granted Critical
Publication of JP4590213B2 publication Critical patent/JP4590213B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004165878A 2004-06-03 2004-06-03 露光装置及びデバイス製造方法 Expired - Fee Related JP4590213B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004165878A JP4590213B2 (ja) 2004-06-03 2004-06-03 露光装置及びデバイス製造方法
US11/144,319 US20050270509A1 (en) 2004-06-03 2005-06-03 Measuring apparatus, exposure apparatus having the same, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004165878A JP4590213B2 (ja) 2004-06-03 2004-06-03 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2005347544A JP2005347544A (ja) 2005-12-15
JP2005347544A5 true JP2005347544A5 (https=) 2007-07-26
JP4590213B2 JP4590213B2 (ja) 2010-12-01

Family

ID=35448514

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004165878A Expired - Fee Related JP4590213B2 (ja) 2004-06-03 2004-06-03 露光装置及びデバイス製造方法

Country Status (2)

Country Link
US (1) US20050270509A1 (https=)
JP (1) JP4590213B2 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4101076B2 (ja) * 2003-02-06 2008-06-11 キヤノン株式会社 位置検出方法及び装置
US7583359B2 (en) * 2006-05-05 2009-09-01 Asml Netherlands B.V. Reduction of fit error due to non-uniform sample distribution
US11342184B2 (en) * 2019-11-25 2022-05-24 Xia Tai Xin Semiconductor (Qing Dao) Ltd. Method of forming multiple patterned layers on wafer and exposure apparatus thereof
NL2026937B1 (en) * 2020-11-20 2022-07-01 Nearfield Instr B V Alignment system and method for aligning an object having an alignment mark

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54118779A (en) * 1978-03-08 1979-09-14 Nippon Chemical Ind Device for matching position using random pattern
US4629313A (en) * 1982-10-22 1986-12-16 Nippon Kogaku K.K. Exposure apparatus
DE59305801D1 (de) * 1993-12-08 1997-04-17 Heidenhain Gmbh Dr Johannes Längenmesssystem
JPH102717A (ja) * 1996-06-14 1998-01-06 Mitsutoyo Corp 原点検出装置および原点検出方法
JPH10254123A (ja) * 1997-03-10 1998-09-25 Nikon Corp テストパターンが形成されたレチクル
US6344698B2 (en) * 1999-02-22 2002-02-05 International Business Machines Corporation More robust alignment mark design
DE50009018D1 (de) * 1999-11-18 2005-01-27 Hera Rotterdam Bv Positionssensor
DE19962278A1 (de) * 1999-12-23 2001-08-02 Heidenhain Gmbh Dr Johannes Positionsmeßeinrichtung
AU2002222596A1 (en) * 2000-12-11 2002-06-24 Nikon Corporation Position measuring method, exposure method and system thereof, device productionmethod
JP4101076B2 (ja) * 2003-02-06 2008-06-11 キヤノン株式会社 位置検出方法及び装置

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