JPS54118779A - Device for matching position using random pattern - Google Patents

Device for matching position using random pattern

Info

Publication number
JPS54118779A
JPS54118779A JP2551978A JP2551978A JPS54118779A JP S54118779 A JPS54118779 A JP S54118779A JP 2551978 A JP2551978 A JP 2551978A JP 2551978 A JP2551978 A JP 2551978A JP S54118779 A JPS54118779 A JP S54118779A
Authority
JP
Japan
Prior art keywords
random pattern
matching position
matching
random
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2551978A
Other languages
Japanese (ja)
Other versions
JPS5620693B2 (en
Inventor
Kiwao Nakazawa
Kiyouichi Suwa
Shiyouichi Tanimoto
Tsuneyuki Kazama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Chemical Industrial Co Ltd
Original Assignee
Nippon Chemical Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP2551978A priority Critical patent/JPS54118779A/en
Publication of JPS54118779A publication Critical patent/JPS54118779A/en
Publication of JPS5620693B2 publication Critical patent/JPS5620693B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2551978A 1978-03-08 1978-03-08 Device for matching position using random pattern Granted JPS54118779A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2551978A JPS54118779A (en) 1978-03-08 1978-03-08 Device for matching position using random pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2551978A JPS54118779A (en) 1978-03-08 1978-03-08 Device for matching position using random pattern

Publications (2)

Publication Number Publication Date
JPS54118779A true JPS54118779A (en) 1979-09-14
JPS5620693B2 JPS5620693B2 (en) 1981-05-15

Family

ID=12168298

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2551978A Granted JPS54118779A (en) 1978-03-08 1978-03-08 Device for matching position using random pattern

Country Status (1)

Country Link
JP (1) JPS54118779A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005347544A (en) * 2004-06-03 2005-12-15 Canon Inc Positioning method, exposure device therewith, and device manufacturing method
JP2009200489A (en) * 2008-02-21 2009-09-03 Asml Netherlands Bv Mark structure for coarse wafer alignment and method for manufacturing such mark structure

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005347544A (en) * 2004-06-03 2005-12-15 Canon Inc Positioning method, exposure device therewith, and device manufacturing method
JP4590213B2 (en) * 2004-06-03 2010-12-01 キヤノン株式会社 Exposure apparatus and device manufacturing method
JP2009200489A (en) * 2008-02-21 2009-09-03 Asml Netherlands Bv Mark structure for coarse wafer alignment and method for manufacturing such mark structure
US8080462B2 (en) 2008-02-21 2011-12-20 Asml Netherlands B.V. Mark structure for coarse wafer alignment and method for manufacturing such a mark structure

Also Published As

Publication number Publication date
JPS5620693B2 (en) 1981-05-15

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