JP2005344210A5

JP2005344210A5 -

Info

Publication number: JP2005344210A5
Application number: JP2005110362A
Authority: JP
Filing date: 2005-04-06
Publication date: 2008-03-21

Description

前記前洗浄液、後洗浄液からなる補助洗浄液は、本発明者が種々の成分を配合した洗浄液を調製し、これを用いて実験を繰り返した結果、前洗浄液としても界面活性剤、キレート剤および酸化物除去成分を配合すると共に、特にメタ珪酸ソータあるいは／およびオルソ珪酸ソーダを配合すると、前洗浄能力を高めることができることを知見して得られたものである。
前記キレート剤としては、ＥＤＴＡ４ナトリウム塩、カルボン酸含有ナトリウム塩等が挙げられる。前記酸化物除去成分として、有機窒素が挙げられる。 As the auxiliary cleaning liquid comprising the pre-cleaning liquid and the post-cleaning liquid, the present inventor prepared cleaning liquids containing various components, and repeated experiments using the same. As a result, the pre-cleaning liquids also include surfactants, chelating agents and oxides. It is obtained by knowing that the pre-cleaning ability can be enhanced by blending the removal component and, in particular, blending metasilicate or / or orthosilicate.
Examples of the chelating agent include EDTA tetrasodium salt and carboxylic acid-containing sodium salt. As the oxide removing component, and organic nitrogen.

本発明は、第２に、電解洗浄時に用いる本洗浄液として、
電解洗浄を行う本洗浄液であって、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウムから選択された１以上を含む強アルカリ成分と、ＥＤＴＡ４ナトリウム塩からなるキレート剤と、有機窒素からなる酸化物除去成分と、グルコン酸ナトリウムとを含むことを特徴とする金型洗浄液を提供している。 The present invention secondly, as the main cleaning liquid used at the time of electrolytic cleaning,
A book cleaning solution for performing electrolytic cleaning, sodium hydroxide, potassium hydroxide, and strong alkali component that comprises one or more selected from sodium carbonate, a chelating agent comprising a EDTA4 sodium salt, an organic nitrogen or Ranaru oxide removal A mold cleaning liquid comprising an ingredient and sodium gluconate is provided.

前記有機窒素として、エチレンジアミン、ジエチレントリアミン、トリエチレンテトラミン、ペンタエチレンベキサミンから選択されるエチレンジアミン類を用い、
前記キレート剤として、ヒドロキシエチルイミノ二酢酸ナトリウム塩、ニトリロトリセテック酸ー３ナトリウム（ＮＴＡ・３Ｎａ）、ジカルボキシメチル−グルタミック酸テトラソジウムー４ナトリウム（ＧＬＤＡ・４Ｎａ）を用いることが好ましい。 As the organic nitrogen, ethylenediamine selected from ethylenediamine, diethylenetriamine, triethylenetetramine, pentaethylenebexamine,
As the chelating agent, hydroxyethyliminodiacetic acid sodium salt, nitrilotrisetecate-3sodium (NTA.3Na), dicarboxymethyl-glutamic acid tetrasodium-4sodium (GLDA.4Na) is preferably used.

本洗浄液は、前記したように、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウムから選択された１以上を含む強アルカリ成分と、グルコン酸ナトリウムに、ＥＤＴＡ４ナトリウム塩からなるキレート剤に更に有機窒素を加えた酸化物除去成分を配合することにより、キレート剤単独で用いる場合よりも更に酸化物の除去性能を高めている。 As described above, this cleaning solution is prepared by adding organic nitrogen to a chelating agent comprising EDTA tetrasodium salt to sodium gluconate and a strong alkali component containing one or more selected from sodium hydroxide, potassium hydroxide and sodium carbonate. By adding the oxide removal component, the oxide removal performance is further improved as compared with the case of using the chelating agent alone.

具体的には、前記本洗浄液は強アルカリ成分を３０〜１００ｇ／リットル、前記ＥＤＴＡ４ナトリウム塩を３０〜１００ｇ／リットル、グルコン酸ナトリウムを１０〜６０ｇ／リットル、有機窒素からなる酸化物除去成分を３０〜１５０ｇ／リットル配合することが好ましい。
また、前記ノニオン系、カチオン系、アニオン系の界面活性剤から選択される１以上の界面活性剤も配合する場合は、１〜３ｃｃ／リットル配合していることが好ましい。
前記配合量は、本発明者が実験を繰り返して知見したものである。 Specifically, the present cleaning solution 30 to 100 g / l strongly alkaline components, the EDTA4 sodium salt 30 to 100 g / l, sodium gluconate 10 to 60 g / liter, an organic nitrogen or Ranaru oxide removing component It is preferable to mix 30 to 150 g / liter.
Moreover, when mix | blending 1 or more surfactant selected from the said nonionic, cationic, and anionic surfactant, it is preferable to mix | blend 1-3 cc / liter.
The compounding amount was discovered by the present inventors through repeated experiments.

また、電解洗浄を行う本洗浄液は、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウムから選択された１以上を含む強アルカリ成分と、ＥＤＴＡ４ナトリウム塩からなるキレート剤と、有機窒素からなる酸化物除去成分と、グルコン酸ナトリウムとを含む水を用い、該水は精製手段で精製した水として、水道水に含まれるシリカやカルシウムなどの異物を除去している。そのため、該電解洗浄液で洗浄する金型が、精密部品成形用のニッケル金型である場合、１０００〜１００００倍の電子顕微鏡で観察しても異物が付着されていない優れた洗浄力で洗浄することができる。
よって、フラットパネルディスプレイの導光板、レンズ、自動車のリフレクタ等を成形するためのニッケル金型を洗浄する場合に、その洗浄能力が高いことにより、効果的に用いることができる。 Further, the present cleaning solution to perform electrolytic cleaning, sodium hydroxide, potassium hydroxide, and strong alkali component that comprises one or more selected from sodium carbonate, a chelating agent comprising a EDTA4 sodium salt, an organic nitrogen or Ranaru oxide removal Water containing components and sodium gluconate is used, and the water is purified by purification means to remove foreign substances such as silica and calcium contained in tap water. Therefore, when the mold to be cleaned with the electrolytic cleaning solution is a nickel mold for forming a precision part, it should be cleaned with an excellent cleaning power that does not have foreign matter attached even when observed with an electron microscope of 1000 to 10000 times. Can do.
Therefore, when cleaning a nickel mold for forming a light guide plate, a lens, an automobile reflector or the like of a flat panel display, it can be effectively used due to its high cleaning ability.

本洗浄液Ｑ２（即ち、電解洗浄液）は、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウムから選択された１以上を含む強アルカリ成分と、ＥＤＴＡ４ナトリウム塩からなるキレート剤と、有機窒素からなる酸化物除去成分と、グルコン酸ナトリウムと、ノニオン系、カチオン系、アニオン系の界面活性剤から選択される１以上の界面活性剤を、水道水を精製手段で精製した純水に配合している。
そのさい、配合量は、強アルカリ成分を３０〜１００ｇ／リットル、ＥＤＴＡ４ナトリウム塩を３０〜１００ｇ／リットル、グルコン酸ナトリウムを１０〜６０ｇ／リットル、前記酸化物除去成分を３０〜１５０ｇ／リットル、前記ノニオン系、カチオン系、アニオン系の界面活性剤から選択される１以上の界面活性剤を１〜３ｃｃ／リットルとし、残りを純水として、配合している。 This washing liquid Q2 (i.e., electrolytic cleaning liquid) are sodium hydroxide, potassium hydroxide, and strong alkali component that comprises one or more selected from sodium carbonate, a chelating agent comprising a EDTA4 sodium salt, an organic nitrogen or Ranaru oxides A removal component, sodium gluconate, and one or more surfactants selected from nonionic, cationic, and anionic surfactants are blended in pure water obtained by purifying tap water by a purification means.
At that time, the compounding amount is 30-100 g / liter of strong alkali component, 30-100 g / liter of EDTA tetrasodium salt, 10-60 g / liter of sodium gluconate, 30-150 g / liter of the oxide removing component, One or more surfactants selected from nonionic, cationic, and anionic surfactants are added in an amount of 1 to 3 cc / liter, and the remainder is added as pure water.

Claims

A cleaning solution used for pre-cleaning before and / or post-cleaning after electrolytic cleaning, and nonionic, cationic or anionic surfactant, sodium metasilicate or / and sodium orthosilicate, and chelating agent. A mold cleaning liquid characterized by containing.

The mold cleaning liquid according to claim 1, wherein the pre-cleaning liquid and / or the post-cleaning liquid is heated to about 40 ° C to 100 ° C.

A book cleaning solution for performing electrolytic cleaning, sodium hydroxide, potassium hydroxide, and strong alkali component that comprises one or more selected from sodium carbonate, a chelating agent comprising a EDTA4 sodium salt, an organic nitrogen or Ranaru oxide removal A mold cleaning liquid comprising an ingredient and sodium gluconate.

As the organic nitrogen, ethylenediamine selected from ethylenediamine, diethylenetriamine, triethylenetetramine, pentaethylenebexamine,
The gold according to claim 3, wherein hydroxyethyliminodiacetic acid sodium salt, nitrilotricetecate-3sodium (NTA.3Na), dicarboxymethyl-glutamic acid tetrasodium-4sodium (GLDA.4Na) is used as the chelating agent. Mold cleaning solution.

The mold cleaning liquid according to claim 3 or 4, comprising one or more surfactants selected from nonionic, cationic and anionic surfactants.

6. The gold according to any one of claims 1 to 5, wherein tap water is mixed with water from which impurities are removed through purification means in the cleaning liquid used in the main cleaning, pre-cleaning and / or post-cleaning. Mold cleaning solution.

7. The mold cleaning liquid according to claim 6, wherein a purification means employing distillation, ion exchange or / and filtration is used as the purification means.

The strong alkali component 30 to 100 g / liter, the EDTA4 sodium 30 to 100 g / l, sodium gluconate 10 to 60 g / liter, and an organic nitrogen or Ranaru oxide removing component 30 to 150 g / l formulation The mold cleaning liquid according to any one of claims 3 to 7.

The mold cleaning liquid according to claim 8, wherein 1 to 3 cc / liter of one or more surfactants selected from the nonionic, cationic, and anionic surfactants are blended.

The mold cleaning liquid according to any one of claims 3 to 9, wherein the cleaning liquid used for the main cleaning is heated to about 30 ° C to 60 ° C.

A mold cleaning method using the cleaning liquid according to any one of claims 3 to 10 at the time of main cleaning in electrolytic cleaning.

3. A mold cleaning method using the cleaning liquid according to claim 1 or 2 for pre-cleaning before main cleaning of electrolytic cleaning and / or post-cleaning after main cleaning of electrolytic cleaning.

The mold cleaning method according to claim 11 or 12, wherein ultrasonic cleaning is used in combination with the main cleaning.

The mold cleaning method according to claim 13, wherein a frequency of the ultrasonic cleaning is in a range of 30 KHz to 100 KHz.

After the pre-cleaning using the pre-cleaning liquid, the main cleaning using the main cleaning liquid, and / or the post-cleaning using the post-cleaning liquid, the cleaning liquid is removed by any of the following methods (1) to (3). The mold cleaning method according to claim 11 to 14.
(1) Only rinse with clean water.
(2) After rinsing with clean water, rinsing with alcohol, ethanol, acetone, or a mixture of these with water is performed.
(3) Rinsing with alcohol, ethanol, acetone, or a mixture of these and water is directly performed without washing with water.

The mold cleaning method according to claim 11, wherein the cleaning step is selected from the following (1) to (5).
(1) Main cleaning → Cleaning liquid removal (2) Main cleaning → Cleaning liquid removal → Rust prevention treatment (3) Pre-cleaning → Cleaning liquid removal → Main cleaning → Cleaning liquid removal → Rust prevention treatment (4) Main cleaning → Cleaning liquid removal → Post cleaning → Cleaning liquid removal → rust prevention treatment (5) Pre-cleaning → cleaning liquid removal → main washing → cleaning liquid removal → post-cleaning → cleaning liquid removal → rust prevention treatment.

17. The mold cleaning method according to claim 16, wherein the rust prevention treatment is performed by applying a rust inhibitor to the mold surface, and an aqueous rust inhibitor composed of a lower amine is used as the rust inhibitor.

The mold cleaning method according to claim 17, wherein morpholine is used as the lower amine.

19. The mold cleaning method according to claim 12, wherein the cleaning tank is covered and sealed at the time of the pre-cleaning and heated to about 40 ° C. to 100 ° C. 19.

A cleaning tank for performing at least pre-cleaning and / or post-cleaning and a main cleaning tank for performing main cleaning with an electrolytic cleaning means are provided, and the cleaning tank for pre-cleaning and / or post-cleaning is defined in claim 1 or claim 2. A mold cleaning apparatus, wherein the main cleaning liquid according to any one of claims 3 to 10 is supplied to the main cleaning tank.

The said pre-cleaning tank is provided with the lid | cover which seals the upper surface opening of a pre-cleaning tank at the time of washing | cleaning, and the means to heat the said pre-cleaning tank in the state sealed with this lid | cover is provided. Mold cleaning equipment.

The mold to be cleaned in this cleaning tank having at least electrolytic cleaning means and ultrasonic cleaning means is a nickel plating mold, a nickel alloy plating mold, a nickel plate surface application mold, a nickel alloy plate surface application mold or nickel. A nickel mold consisting of a mold formed of
11. A mold cleaning apparatus, wherein the main cleaning tank is supplied with the main cleaning liquid according to any one of claims 3 to 10.

The mold cleaning apparatus according to claim 22, wherein the nickel mold is a mold for injection molding of a light guide plate of a flat panel display, a mold for injection molding of a lens, or a mold for injection molding of a vehicle reflector. .

The electrode on the positive electrode side used for electrolytic cleaning of the main cleaning tank is one or more of platinum (platinum), palladium, rhodium, iridium, ruthenium, osmium, gold, silver noble metals, or alloys of these noble metals. The mold cleaning apparatus according to claim 22 or 23, which is made of a seed metal or a metal plated with the metal.

The mold cleaning apparatus according to claim 24, wherein the positive electrode is made of titanium plated with the metal.

The mold cleaning apparatus according to any one of claims 22 to 25, wherein a voltage applied to an electrode for electrolytic cleaning in the main cleaning tank is in a range of 2 to 5V.