JP2005344210A - Mold cleaning solution, mold cleaning method and mold cleaning apparatus - Google Patents

Mold cleaning solution, mold cleaning method and mold cleaning apparatus Download PDF

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JP2005344210A
JP2005344210A JP2005110362A JP2005110362A JP2005344210A JP 2005344210 A JP2005344210 A JP 2005344210A JP 2005110362 A JP2005110362 A JP 2005110362A JP 2005110362 A JP2005110362 A JP 2005110362A JP 2005344210 A JP2005344210 A JP 2005344210A
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cleaning
mold
main
cleaning liquid
tank
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JP2005344210A5 (en
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Kazumi Tomita
和巳 冨田
Michio Tomita
美智雄 冨田
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SOMAKKUSU KK
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Priority to PCT/JP2005/007022 priority patent/WO2005108041A1/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/70Maintenance
    • B29C33/72Cleaning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/045Cleaning involving contact with liquid using perforated containers, e.g. baskets, or racks immersed and agitated in a liquid bath
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/70Maintenance
    • B29C33/72Cleaning
    • B29C33/722Compositions for cleaning moulds
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02Inorganic compounds ; Elemental compounds
    • C11D3/04Water-soluble compounds
    • C11D3/044Hydroxides or bases
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02Inorganic compounds ; Elemental compounds
    • C11D3/04Water-soluble compounds
    • C11D3/10Carbonates ; Bicarbonates
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02Inorganic compounds ; Elemental compounds
    • C11D3/12Water-insoluble compounds
    • C11D3/124Silicon containing, e.g. silica, silex, quartz or glass beads
    • C11D3/1246Silicates, e.g. diatomaceous earth
    • C11D3/1253Layer silicates, e.g. talcum, kaolin, clay, bentonite, smectite, montmorillonite, hectorite or attapulgite
    • C11D3/1273Crystalline layered silicates of type NaMeSixO2x+1YH2O
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16Organic compounds
    • C11D3/20Organic compounds containing oxygen
    • C11D3/2075Carboxylic acids-salts thereof
    • C11D3/2086Hydroxy carboxylic acids-salts thereof
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16Organic compounds
    • C11D3/26Organic compounds containing nitrogen
    • C11D3/33Amino carboxylic acids
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/24Cleaning or pickling metallic material with solutions or molten salts with neutral solutions
    • C23G1/26Cleaning or pickling metallic material with solutions or molten salts with neutral solutions using inhibitors
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G3/00Apparatus for cleaning or pickling metallic material
    • C23G3/02Apparatus for cleaning or pickling metallic material for cleaning wires, strips, filaments continuously
    • C23G3/027Associated apparatus, e.g. for pretreating or after-treating
    • C23G3/028Associated apparatus, e.g. for pretreating or after-treating for thermal or mechanical pretreatment
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F1/00Electrolytic cleaning, degreasing, pickling or descaling
    • C11D2111/16

Abstract

<P>PROBLEM TO BE SOLVED: To provide a mold cleaning solution and a mold cleaning method suitable for cleaning an ultrafine mold to which resin dregs having oil resistance, heat resistance and wear resistance are stuck. <P>SOLUTION: A main cleaning solution for use in the electrolytic cleaning as a main cleaning comprises a strongly alkaline component containing one or more selected from sodium hydroxide, potassium hydroxide and sodium carbonate, a chelating agent comprising EDTA4-sodium salt, and oxidized material removing component comprising an organic or inorganic nitrogen, and sodium gluconate. A purified water is used for the preparation of the main cleaning solution, which results in that the present method is suitable for the cleaning of a nickel mold used for molding a fine molded article. When a pre-cleaning is carried out before the electrolytic cleaning as a main cleaning, a pre-cleaning solution comprising a nonionic, cationic or anionic surfactant, sodium metasilicate and/or sodium orthosilicate and a chelating agent is used. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、樹脂、ゴム、ガラス等の成形用金型に付着する樹脂カス、ゴムカス、ガラスカス、ガス焼け等の付着物を洗浄除去する洗浄液、洗浄方法および洗浄装置に関し、特に、微細構造の金型の洗浄を電解洗浄を行う本洗浄で用いる際に適した洗浄液と、該本洗浄前に行う前洗浄および必要に応じて後洗浄に用いる補助洗浄液の改良を図るものである。   The present invention relates to a cleaning liquid, a cleaning method, and a cleaning apparatus for cleaning and removing deposits such as resin residue, rubber residue, glass residue, and gas burns attached to a molding die such as resin, rubber, and glass, and in particular, a fine structure metal The present invention is intended to improve a cleaning liquid suitable for use in the main cleaning in which the mold cleaning is performed by electrolytic cleaning, and a pre-cleaning performed before the main cleaning and an auxiliary cleaning liquid used for post-cleaning as necessary.

近年、樹脂やゴムの成形用材料の改質および成形技術の進歩に伴い、従来プレス加工等により形成されていた金属製やガラス製等の部品も、大量生産が可能な金型で成形された樹脂製部品へと移行しつつある。
例えば、樹脂製品やゴム製品は金属製品やガラス製品と比較すると、強度、耐熱性、耐油性、耐摩耗性が乏しいとされてきたが、樹脂製品やゴム製品の改質により上記物性を付与され、耐熱性、耐油性が要求される自動車のボンネットの中に取り付けるデイストリビュータのケースも金属製品から樹脂製品へと代わっている。
また、超精密成形技術の進歩により、テレビの画面やレンズもガラスから樹脂に変わっている。金型による射出成型で超精密部品、例えば、フラットパネルディスプレイの導光板、携帯電話の超小型精密カメラ用のレンズ、ゴーグルのレンズ、歯車、コネクタ等も樹脂成形で大量生産されている。
In recent years, with the reform of molding materials for resin and rubber and the advancement of molding technology, parts made of metal or glass, which have been formed by conventional press processing, etc., have also been molded with molds that can be mass-produced. It is shifting to resin parts.
For example, resin products and rubber products have been considered to have poor strength, heat resistance, oil resistance, and wear resistance compared to metal products and glass products. Distributor cases that are installed in the hoods of automobiles that require heat resistance and oil resistance are also changing from metal products to resin products.
In addition, with advances in ultra-precision molding technology, TV screens and lenses are changing from glass to resin. Ultra-precision parts such as light guide plates for flat panel displays, lenses for ultra-small precision cameras for mobile phones, goggles lenses, gears, connectors, etc. are mass-produced by resin molding.

前記樹脂、ゴム、ガラス等の成形に用いる金型は、成形量に伴ってその内面に樹脂カス、ゴムカス、あるいはガラスカスが付着すると共に、樹脂が溶解された時に発生するガスが付着する。これらの付着物は、成形ショットを重ねると、ショット回数の増加に伴い金型表面に堆積し、簡単には除去することができない。しかしながら、これらを確実に除去しないと、成形不良につながる等の不都合が生じる。よって、成形用金型は定期的に取り外して洗浄し、上記付着物を除去しなければならない。   A mold used for molding the resin, rubber, glass or the like has a resin residue, a rubber residue, or a glass residue attached to its inner surface according to the amount of molding, and a gas generated when the resin is dissolved. These deposits accumulate on the mold surface as the number of shots increases as the molding shots are repeated, and cannot be easily removed. However, if these are not reliably removed, inconveniences such as lead to molding defects occur. Therefore, the molding die must be periodically removed and washed to remove the deposits.

特に、フラットパネルディスプレイの導光板、携帯電話の超小型精密なカメラレンズ、ゴーグル用レンズ、車両用リフレクタ等を射出成型する金型は、鉄或いは真ちゅうの表面に純ニッケルメッキ層やリンやボロンが配合されたニッケル合金メッキ層が設けられた金型、あるいはニッケル板やニッケル合金板が表面に貼り付けられた金型、さらにはニッケルのみまたはニッケル合金のみで形成された金型(以下、ニッケル金型と総称する)とされている。この種のニッケル金型ではニッケルが物質を吸着しやすい特性を有することから、電解液中で析出する金属微粒子や微小な樹脂片や異物が付着しやすい。これら超微粒子がニッケルメッキ表面に付着した状態で残存すると、該ニッケル金型で成形される導光板、レンズ、リフレクタの品質を維持できない問題がある。特に、前記導光板では微細で精度が要求されるパターンに、入り込んだ樹脂を取り除いたり、ガスの溜まりやすいパーツの縁などの汚れをすっきり取り除かなければ、高度化する精度に対応することができない。   In particular, molds for injection molding flat panel display light guide plates, mobile phone ultra-small precision camera lenses, goggles lenses, vehicle reflectors, etc. have a pure nickel plating layer, phosphorus or boron on the surface of iron or brass. A mold provided with a blended nickel alloy plating layer, a mold having a nickel plate or a nickel alloy plate attached to the surface, and a mold formed only of nickel or a nickel alloy (hereinafter referred to as nickel mold) And collectively referred to as a mold). In this type of nickel mold, since nickel has a characteristic of easily adsorbing a substance, metal fine particles, fine resin pieces, and foreign matters that are deposited in the electrolytic solution are likely to adhere. If these ultrafine particles remain attached to the nickel plating surface, there is a problem that the quality of the light guide plate, lens, and reflector formed by the nickel mold cannot be maintained. In particular, the light guide plate cannot cope with higher precision unless the resin that has entered the fine and precise pattern is removed or dirt such as edges of parts that easily collect gas is removed.

金型洗浄は、従来、トリクレンや炭化水素系の石油等に浸漬しておき、その後、ブラシや綿棒で擦りとる方法でなされていたが、トリクレンや炭化水素系の有機溶剤は人体に悪影響を与える。   Mold cleaning has been done by dipping in trichlene or hydrocarbon-based petroleum and then rubbing with a brush or cotton swab, but trichlene or hydrocarbon-based organic solvents adversely affect the human body. .

上記した問題より、本出願人は、水酸化ナトリウム等の強アルカリ成分が配合された洗浄液を用い、かつ、成形金型用の洗浄装置として、特開平7−214570号公報(特許文献1)において図8に示す電解洗浄装置を提供している。
この洗浄装置は電解洗浄と超音波洗浄とを併用して金型の洗浄を短時間で効率良く行うことができる利点を有するものである。図8中において、1は洗浄槽、2は洗浄槽内に着脱自在に挿入する金型保持カゴ、3は洗浄槽内に吊り下げるプラス側電極であり、マイナス極側となる上記金型保持カゴ2内に保持された金型5との間に電流を流すと共に、洗浄槽1の底面に取り付けた超音波振動子4により洗浄槽内の電解洗浄液に超音波振動を発生させ、よって、電解洗浄と超音波洗浄とを併用して、金型5の洗浄を行っている。
In view of the above problems, the present applicant uses a cleaning liquid in which a strong alkali component such as sodium hydroxide is blended, and as a cleaning device for a molding die in Japanese Patent Application Laid-Open No. 7-214570 (Patent Document 1). The electrolytic cleaning apparatus shown in FIG. 8 is provided.
This cleaning apparatus has an advantage that the mold can be cleaned efficiently in a short time by using both electrolytic cleaning and ultrasonic cleaning. In FIG. 8, 1 is a cleaning tank, 2 is a mold holding basket that is detachably inserted into the cleaning tank, and 3 is a positive electrode suspended in the cleaning tank, and the mold holding basket on the negative electrode side. 2 and an ultrasonic vibration is generated in the electrolytic cleaning liquid in the cleaning tank by the ultrasonic vibrator 4 attached to the bottom surface of the cleaning tank 1. And the ultrasonic cleaning are used together to clean the mold 5.

また、特開2001−241000号公報(特許文献2)において、図9に示す電解洗浄を行う本洗浄槽1’の前洗浄を行う脱脂槽6と、本洗浄槽1’による本洗浄後に後洗浄を行うリンス槽7を備えた金型洗浄装置が提供されている。該金型洗浄装置は、前記特許文献1の金型洗浄装置と同様の電解洗浄を行う本洗浄装置に、前洗浄を行う脱脂槽と、後洗浄を行いリンス槽を付設した構成とされている。   Further, in Japanese Patent Laid-Open No. 2001-241000 (Patent Document 2), a degreasing tank 6 that performs pre-cleaning of the main cleaning tank 1 ′ that performs electrolytic cleaning shown in FIG. 9 and post-cleaning after the main cleaning by the main cleaning tank 1 ′. A mold cleaning apparatus provided with a rinsing tank 7 is provided. The mold cleaning apparatus is configured such that a degreasing tank that performs pre-cleaning and a rinse tank that performs post-cleaning are attached to the main cleaning apparatus that performs the same electrolytic cleaning as the mold cleaning apparatus of Patent Document 1. .

前記特許文献1において、電解洗浄を行う本洗浄時に用いる洗浄液として、水酸化ナトリウムあるいは/および水酸化カリウム、EDTAのアルカリ塩、グルコン酸ナトリウムを含むアルカリ溶液を提供している。また、温度制御装置を付設して、洗浄液の温度を30〜70℃に加熱している。
特許文献2においても、電解洗浄を行う本洗浄で用いる電解液は、特許文献1と同様な水酸化ナトリウム、EDTA、界面活性剤および水からなる洗浄液が用いられている。
前洗浄の脱脂槽では、エーテル、アルコール等の有機脱脂溶剤が前洗浄液として用いられ、脱脂槽内に金型をカゴに搭載して浸漬し、蓋等で密閉しないオープンな構成で前洗浄が行われている。
In Patent Document 1, an alkaline solution containing sodium hydroxide and / or potassium hydroxide, an alkali salt of EDTA, and sodium gluconate is provided as a cleaning liquid used in the main cleaning for electrolytic cleaning. Moreover, the temperature control apparatus is attached and the temperature of the washing | cleaning liquid is heated to 30-70 degreeC.
Also in Patent Document 2, as the electrolytic solution used in the main cleaning in which electrolytic cleaning is performed, the same cleaning solution made of sodium hydroxide, EDTA, a surfactant, and water is used.
In the pre-cleaning degreasing tank, an organic degreasing solvent such as ether or alcohol is used as the pre-cleaning liquid, and the pre-cleaning is performed in an open configuration in which the mold is mounted and immersed in the degreasing tank and is not sealed with a lid or the like. It has been broken.

特開平7−214570号公報JP 7-214570 A 特開2001−241000号公報JP 2001-241000 A

前記特許文献1の金型洗浄装置は電解洗浄と超音波洗浄とを併用しているため、極めて効率良く短時間で金型の付着物を除去でき、洗浄効果が優れた利点を有する。しかしながら、近時は前記したように、フラットパネルディスプレイの導光板等の超精密成形部品が急増している。これらの超小型精密部品の金型では凹凸も微細になり、微細な凹部、特に凹部の隅に付着する樹脂カス等は除去しにくく、超微小な樹脂カス等が残存しやすい。また、近時、耐熱性、耐油性、耐摩耗性等の物性を改善した樹脂が増加しており、これらの樹脂成形用の金型の場合も、樹脂カスが除去しにくくなっている。   Since the mold cleaning apparatus of Patent Document 1 uses both electrolytic cleaning and ultrasonic cleaning, the deposit on the mold can be removed very efficiently in a short time, and the cleaning effect is excellent. However, recently, as described above, the number of ultra-precision molded parts such as light guide plates of flat panel displays has increased rapidly. In these ultra-small precision component molds, the unevenness becomes fine, and it is difficult to remove the fine recesses, particularly the resin debris attached to the corners of the recesses, and the ultrafine resin debris tends to remain. In recent years, resins having improved physical properties such as heat resistance, oil resistance, and abrasion resistance are increasing, and even in the case of molds for resin molding, it is difficult to remove the resin residue.

前記問題を解消するためには、洗浄力を高める必要がある。
しかしながら、特に、前記耐熱性、耐油性、耐摩耗性を高めた樹脂用の金型では、洗浄液の温度を上げて時間をかけても容易に樹脂カスが溶融、膨潤せずに、よって、これらの樹脂カスの除去は困難となっている。
かつ、水酸化ナトリウム等の強アルカリ性物質を増量した洗浄液を用いると、金型を腐食させるトラブルが発生する。
さらに、超音波振動を組み合わせて、洗浄液を撹拌する等により物理的に洗浄能力を高めることも考慮される。超音波の周波数を、例えば50KHzから20KHzに低くする程、汚れを落とす力が強くなるが、超音波振動による破壊力も比例して大きくなり、洗浄時間が長くなると金型にダメージを与えることとなる。特に、前記フラットパネルディスプレイの導光板等を成形するニッケル金型では、表面のニッケル層が超音波でダメージを受け易い問題がある。
In order to solve the problem, it is necessary to increase the cleaning power.
However, in particular, in the resin mold having improved heat resistance, oil resistance, and wear resistance, the resin residue does not easily melt and swell even when the temperature of the cleaning liquid is increased, so that these Removal of the resin residue is difficult.
In addition, when a cleaning liquid with an increased amount of a strong alkaline substance such as sodium hydroxide is used, troubles that corrode the mold occur.
Furthermore, it is considered that the cleaning ability is physically enhanced by combining ultrasonic vibration and stirring the cleaning liquid. The lower the frequency of ultrasonic waves is, for example, from 50 KHz to 20 KHz, the stronger the force to remove dirt, but the destructive force due to ultrasonic vibration also increases proportionally, and damage to the mold will occur if the cleaning time is prolonged. . In particular, a nickel mold for forming the light guide plate of the flat panel display has a problem that the nickel layer on the surface is easily damaged by ultrasonic waves.

また、洗浄能力を高める方法として、特許文献2に記載されていると共に、特許文献2の出願前からも当業者間で行われている前洗浄および後洗浄方法を改良し、前洗浄、本洗浄、後洗浄のトータルで洗浄能力を高める方法も採用しえる。
しかしながら、特許文献2に記載されている前洗浄を行う脱脂槽で、エーテル、アルコール等の有機脱脂溶剤からなる前洗浄液を用いても、本出願人の追試によると洗浄力の強化を認められなかった。
また、電解洗浄の本洗浄後にリンス槽で水洗することも従来から行われているが、水洗いしただけでは金型に錆が発生しやすい問題がある。
Further, as a method for enhancing the cleaning capability, it is described in Patent Document 2, and the pre-cleaning and post-cleaning methods performed by those skilled in the art from before the application of Patent Document 2 have been improved, so that pre-cleaning and main-cleaning are performed. Also, it is possible to adopt a method of improving the cleaning ability in the total after-cleaning.
However, even if a pre-cleaning liquid composed of an organic degreasing solvent such as ether or alcohol is used in the degreasing tank described in Patent Document 2, the enhancement of the detergency is not observed according to the applicant's additional test. It was.
In addition, washing with water in a rinsing tank after the main washing of electrolytic washing has been conventionally performed, but there is a problem that rust is likely to be generated in the mold only by washing with water.

本発明を前記問題に鑑みてなされたもので、前洗浄に用いる前洗浄液および電解洗浄を行う本洗浄時に用いる本洗浄液を改質して洗浄能力を高める等により、超微細金型で、耐熱、耐油、耐摩耗性を有する樹脂カスが付着していた場合にも、これを確実に除去できるように、洗浄能力を高めることを課題としている。   The present invention has been made in view of the above problems, and by improving the cleaning ability by modifying the pre-cleaning liquid used for the pre-cleaning and the main cleaning liquid used in the main cleaning for electrolytic cleaning, heat resistance, It is an object to increase the cleaning ability so that the resin residue having oil resistance and wear resistance can be reliably removed even when it adheres.

前記課題を解決するため、本発明は、第1に、電解洗浄を行う本洗浄前の前洗浄で用いる前洗浄液、および必要に応じて行う後洗浄で用いる後洗浄液として、ノニオン、カチオンあるいはアニオン系の界面活性剤、メタ珪酸ソーダあるいは/およびオルソ珪酸ソーダ、キレート剤を含むものであることを特徴とする金型洗浄液を提供している。   In order to solve the above-described problems, the present invention firstly provides non-ion, cation, or anion-based pre-cleaning liquid used in pre-cleaning before main cleaning for electrolytic cleaning and post-cleaning liquid used in post-cleaning as necessary. A mold cleaning liquid characterized in that it contains a surfactant, sodium metasilicate or / and sodium orthosilicate, and a chelating agent.

前記前洗浄液、後洗浄液からなる補助洗浄液は、本発明者が種々の成分を配合した洗浄液を調製し、これを用いて実験を繰り返した結果、前洗浄液としても界面活性剤、キレート剤および酸化物除去成分を配合すると共に、特にメタ珪酸ソータあるいは/およびオルソ珪酸ソーダを配合すると、前洗浄能力を高めることができることを知見して得られたものである。
前記キレート剤としては、EDTA4ナトリウム塩、カルボン酸含有ナトリウム塩等が挙げられる。前記酸化物除去成分として、有機窒素、あるいは硝酸塩やアンモニウム塩を含む無機窒素が挙げられる。
As the auxiliary cleaning liquid comprising the pre-cleaning liquid and the post-cleaning liquid, the present inventor prepared cleaning liquids containing various components, and repeated experiments using the same. As a result, the pre-cleaning liquids also include surfactants, chelating agents and oxides. It is obtained by knowing that the pre-cleaning ability can be enhanced by blending the removal component and, in particular, blending metasilicate or / or orthosilicate.
Examples of the chelating agent include EDTA tetrasodium salt and carboxylic acid-containing sodium salt. Examples of the oxide removing component include organic nitrogen, or inorganic nitrogen containing nitrate or ammonium salt.

特に、前記前洗浄液は、約40℃〜100℃に加熱した状態で用いると洗浄能力を高めることができる。
さらにまた、該前洗浄時に、前洗浄槽の上部開口を蓋で密閉して加熱し、言わば、圧力釜とした状態で加熱すると、沸点が上がり、より高温にできるため、洗浄能力を高めることができると共に、蓋で密閉していることから作業員の安全性を高めることができる。
なお、蓋で密閉して前洗浄液を煮沸しなくとも、前記成分からなる前洗浄液で洗浄しても洗浄能力を従来より高めることができ、その場合、作業員の安全性から40℃〜60℃程度に加熱することが好ましい。
In particular, when the pre-cleaning liquid is used in a state of being heated to about 40 ° C. to 100 ° C., the cleaning ability can be enhanced.
Furthermore, at the time of the pre-cleaning, the upper opening of the pre-cleaning tank is sealed with a lid and heated. In other words, if heated in a pressure kettle, the boiling point increases and the temperature can be raised, so that the cleaning ability can be increased. In addition, since it is sealed with a lid, the safety of workers can be enhanced.
In addition, even if it wash | cleans with the pre-cleaning liquid which consists of the said component even if it seals with a lid | cover and does not boil a pre-cleaning liquid, a cleaning capability can be improved conventionally, In that case, 40 to 60 degreeC from the safety | security of an operator. It is preferable to heat to the extent.

本洗浄前に、前記補助洗浄液を用いて前洗浄を行うと、特に下記の作用を奏することができる。
金型に取り付けたヒータの熱伝導を良くするために熱伝導グリス(例えば、信越化学工業株式会社製の熱伝導グリスKS−609)や熱伝導ペースト(日本金型産業株式会社販売 インフラコートIKB)が使用された場合、洗浄時、特に電解洗浄時にトラブルの要因となる金属粉が熱伝導剤に含まれている。具体的には、前記熱伝導グリスには酸化亜鉛が75%含まれ、熱伝導ペーストには銅30%、グラファイト25%、アルミ10%が含有されている。
前記熱伝導グリス、熱伝導ペーストに含まれている金属粉が洗浄液中に流出され、これらが金型表面に置換反応または電解析出で付着されると、水酸化ナトリウムでは容易に取り除くことができずトラブルの要因となる。
しかも、前記熱伝導性剤中には、鉄製の金型表面に置換反応により析出しやすい銅、酸化亜鉛が含まれ、さらに、電解すると鉄を腐食するアルミも含まれている。さらにまた、有機物を吸着する多孔質のグラファイトが含有されているため、洗浄液中に含有する界面活性剤も吸着されて、金型への汚れ再付着防止や電解時に発生するミスト飛散防止の効果がなくなる。
前記トラブルを防ぐには、水酸化ナトリウムが主成分の電解洗浄前に、前記熱伝導性グリスやペーストを鹸化させるノニオン系等の界面活性剤やメタ珪酸ソーダ、オルト珪酸ソーダを主成分とし、EDTA4ナトリウム等のキレート剤で組成した補助洗浄液を用いて前洗浄を予め行い、前記熱伝導剤を取り除いた後、水酸化ナトリウム等の強アルカリで組成した電解洗浄液を使用して、耐熱、耐油、耐摩耗性に優れた樹脂を取り除くための本洗浄時間が短縮できる効果がある。
When the pre-cleaning is performed using the auxiliary cleaning liquid before the main cleaning, the following effects can be obtained.
Heat conduction grease (for example, heat conduction grease KS-609 made by Shin-Etsu Chemical Co., Ltd.) and heat conduction paste (Japan Mold Industry Co., Ltd. Sales Infrastructure Coat IKB) to improve the heat conduction of the heater attached to the mold Is used, metal powder that causes trouble during cleaning, particularly electrolytic cleaning, is contained in the heat conductive agent. Specifically, the thermally conductive grease contains 75% zinc oxide, and the thermally conductive paste contains 30% copper, 25% graphite, and 10% aluminum.
When the metal powder contained in the heat conductive grease and heat conductive paste flows out into the cleaning liquid and adheres to the mold surface by substitution reaction or electrolytic deposition, it can be easily removed with sodium hydroxide. Cause trouble.
In addition, the thermal conductive agent contains copper and zinc oxide that easily precipitate on the surface of the iron mold due to substitution reaction, and further contains aluminum that corrodes iron when electrolyzed. Furthermore, since porous graphite that adsorbs organic matter is contained, the surfactant contained in the cleaning liquid is also adsorbed, and it has the effect of preventing the reattachment of dirt to the mold and the prevention of mist scattering that occurs during electrolysis. Disappear.
In order to prevent the trouble, EDTA4 is mainly composed of a nonionic surfactant that saponifies the thermally conductive grease or paste, sodium metasilicate, or sodium orthosilicate before electrolytic cleaning mainly containing sodium hydroxide. Pre-cleaning is performed in advance using an auxiliary cleaning liquid composed of a chelating agent such as sodium, and after removing the thermal conductive agent, an electrolytic cleaning liquid composed of a strong alkali such as sodium hydroxide is used to achieve heat resistance, oil resistance, This has the effect of shortening the main cleaning time for removing the resin having excellent wear characteristics.

本発明は、第2に、電解洗浄時に用いる本洗浄液として、
電解洗浄を行う本洗浄液であって、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウムから選択された1以上を含む強アルカリ成分と、EDTA4ナトリウム塩からなるキレート剤と、有機窒素あるいは無機窒素からなる酸化物除去成分と、グルコン酸ナトリウムとを含むことを特徴とする金型洗浄液を提供している。
The present invention secondly, as the main cleaning liquid used at the time of electrolytic cleaning,
This cleaning solution for electrolytic cleaning is a strong alkaline component containing at least one selected from sodium hydroxide, potassium hydroxide and sodium carbonate, a chelating agent consisting of EDTA tetrasodium salt, and an oxidation consisting of organic nitrogen or inorganic nitrogen There is provided a mold cleaning liquid characterized by containing a product removing component and sodium gluconate.

前記無機窒素として 硝酸塩あるいはアンモニア塩を用い、
前記有機窒素として、エチレンジアミン、ジエチレントリアミン、トリエチレンテトラミン、ペンタエチレンベキサミンから選択されるエチレンジアミン類を用い、
前記キレート剤として、ヒドロキシエチルイミノ二酢酸ナトリウム塩、ニトリロトリセテック酸ー3ナトリウム(NTA・3Na)、ジカルボキシメチル−グルタミック酸テトラソジウムー4ナトリウム(GLDA・4Na)を用いることが好ましい。
Using nitrate or ammonia salt as the inorganic nitrogen,
As the organic nitrogen, ethylenediamine selected from ethylenediamine, diethylenetriamine, triethylenetetramine, pentaethylenebexamine,
As the chelating agent, hydroxyethyliminodiacetic acid sodium salt, nitrilotrisetecate-3sodium (NTA.3Na), dicarboxymethyl-glutamic acid tetrasodium-4sodium (GLDA.4Na) is preferably used.

本洗浄液は、前記したように、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウムから選択された1以上を含む強アルカリ成分と、グルコン酸ナトリウムに、EDTA4ナトリウム塩からなるキレート剤に更に有機窒素あるいは無機窒素を加えた酸化物除去成分を配合することにより、キレート剤単独で用いる場合よりも更に酸化物の除去性能を高めている。   As described above, this cleaning liquid is composed of a strong alkali component containing one or more selected from sodium hydroxide, potassium hydroxide, and sodium carbonate, sodium gluconate, a chelating agent composed of tetrasodium EDTA, and organic nitrogen or inorganic. By compounding an oxide removing component to which nitrogen is added, the oxide removing performance is further enhanced as compared with the case of using the chelating agent alone.

さらに、ノニオン系、カチオン系、アニオン系の界面活性剤から選択される1以上の界面活性剤を含めると、さらに洗浄力を高めることができると共に、金型から除去した樹脂カス等の金型への再付着や、ミストの発生を抑制する機能を有する。   Further, when one or more surfactants selected from nonionic, cationic, and anionic surfactants are included, the detergency can be further enhanced and the resin residue and other molds removed from the mold can be obtained. It has a function to suppress the re-adhesion of mist and generation of mist.

具体的には、前記本洗浄液は強アルカリ成分を30〜100g/リットル、前記EDTA4ナトリウム塩を30〜100g/リットル、グルコン酸ナトリウムを10〜60g/リットル、有機窒素あるいは無機窒素からなる酸化物除去成分を30〜150g/リットル配合することが好ましい。
また、前記ノニオン系、カチオン系、アニオン系の界面活性剤から選択される1以上の界面活性剤も配合する場合は、1〜3cc/リットル配合していることが好ましい。
前記配合量は、本発明者が実験を繰り返して知見したものである。
Specifically, the cleaning liquid is a strong alkali component of 30 to 100 g / liter, the EDTA tetrasodium salt of 30 to 100 g / liter, sodium gluconate of 10 to 60 g / liter, removal of oxides composed of organic nitrogen or inorganic nitrogen. It is preferable to blend the components in an amount of 30 to 150 g / liter.
Moreover, when mix | blending 1 or more surfactant selected from the said nonionic, cationic, and anionic surfactant, it is preferable to mix | blend 1-3 cc / liter.
The compounding amount was discovered by the present inventors through repeated experiments.

また、前記本洗浄液は加熱手段を付設して、30℃〜60℃に加熱することが、洗浄能力を高めることができる点から好ましい。
この本洗浄液を用いて電解洗浄、さらに、好ましくは超音波洗浄も併用して行う本洗浄時には、洗浄槽の上面開口をフードでカバーして洗浄を行うことが、洗浄液の温度制御、ミストの飛散や異臭の拡散を防止する点から好ましい。
In addition, it is preferable that the cleaning liquid is provided with a heating means and heated to 30 ° C. to 60 ° C. from the viewpoint of improving the cleaning ability.
When performing this electrolytic cleaning using this main cleaning liquid, and more preferably using ultrasonic cleaning together, it is possible to perform cleaning by covering the upper surface opening of the cleaning tank with a hood to control the temperature of the cleaning liquid and mist scattering. And is preferable from the viewpoint of preventing the diffusion of odors.

前記本洗浄液、前洗浄液あるいは/および本洗浄後に行う後洗浄で用いる洗浄液には、水を配合しているが、該水としては、水道水を精製手段を通して不純物を除去した水を配合していることが好ましい。
前記精製手段として、蒸留、イオン交換あるいは/および濾過法を採用した精製手段を用いられる。
これは、水道水はシリカやカルシウム等の異物を含んでおり、洗浄する金型が前記ニッケル金型等の高密度金型であると、洗浄液中に含まれるシリカやカルシウム等の異物が金型に付着して、金型精度を低下させ、成形不良の要因となる恐れがあるためである。よって、水道水は前記精製手段によりシリカやカルシウム等の異物を除去しておくことが好ましい。
The main cleaning liquid, the pre-cleaning liquid and / or the cleaning liquid used in the post-cleaning performed after the main cleaning is mixed with water, and the water is mixed with water from which impurities have been removed through purification means. It is preferable.
As the purification means, a purification means employing distillation, ion exchange or / and filtration can be used.
This is because tap water contains foreign substances such as silica and calcium, and when the mold to be cleaned is a high-density mold such as the nickel mold, the foreign substances such as silica and calcium contained in the cleaning liquid are molds. This is because it may be attached to the surface and reduce the precision of the mold and cause molding defects. Therefore, it is preferable to remove foreign matters such as silica and calcium from the tap water by the purification means.

第2の発明として、金型洗浄方法を提供しており、該金型洗浄方法は、
電解洗浄の本洗浄時に前記本洗浄液を用い、前洗浄を行う場合には前記前洗浄液を用い、必要に応じて前記後洗浄液を行う場合には前記後洗浄を行うことを特徴とする金型洗浄方法を提供している。
なお、洗浄する金型に応じて、本洗浄のみ、前洗浄→本洗浄→後洗浄を行うことが好ましい場合、前洗浄を無くして本洗浄と後洗浄のみを行うことが好ましい場合がある。
As a second invention, a mold cleaning method is provided, and the mold cleaning method includes:
Mold cleaning, wherein the main cleaning liquid is used during the main cleaning of the electrolytic cleaning, the pre-cleaning liquid is used when performing pre-cleaning, and the post-cleaning is performed when performing the post-cleaning liquid as necessary. Providing a way.
Depending on the mold to be cleaned, it is preferable to perform only main cleaning and only pre-cleaning → main cleaning → post-cleaning, or it is preferable to perform main cleaning and post-cleaning without pre-cleaning.

前記本洗浄は電解洗浄に超音波洗浄を併用することが好ましく、より洗浄力を高めることができる。
該超音波洗浄は、本洗浄槽の底面に超音波発生装置を付設し、超音波振動子を2種類以上の周波数に切り替えて超音波を発生させることが好ましい。このように、超音波振動を一定の周波数とせずに、異なる周波数、例えば34KHzと44KHzとに切り替えて交互の超音波振動を発生させると、電解洗浄液に適宜な撹拌作用を発生させることができ、洗浄力を高めることができる。超音波に変えて、30KHz〜100KHzの単波を用いてもよい。
洗浄する金型がフラットパネルディスプレイの導光板、超小型精密なレンズ、自動車のリフレクタ等の調整密な成形品用で、金型がニッケル金型である場合、超音波の周波数は30KHz〜100KHz、好ましくは40〜70KHzの範囲が好適である。該範囲とするとニッケルメッキ表面の金属結合のバランスを崩さず、ニッケル被覆層にダメージを与えない状態で洗浄することができる。
In the main cleaning, it is preferable to use ultrasonic cleaning in combination with electrolytic cleaning, and the cleaning power can be further enhanced.
The ultrasonic cleaning is preferably performed by attaching an ultrasonic generator to the bottom surface of the cleaning tank and switching the ultrasonic vibrator to two or more frequencies to generate ultrasonic waves. As described above, when the ultrasonic vibration is not changed to a constant frequency but is switched to a different frequency, for example, 34 KHz and 44 KHz, and alternating ultrasonic vibration is generated, an appropriate stirring action can be generated in the electrolytic cleaning liquid, Detergency can be increased. Instead of ultrasonic waves, a single wave of 30 KHz to 100 KHz may be used.
When the mold to be cleaned is for a controllable molded product such as a light guide plate of a flat panel display, an ultra small precision lens, an automobile reflector, etc., and the mold is a nickel mold, the frequency of the ultrasonic wave is 30 KHz to 100 KHz, A range of 40 to 70 KHz is preferable. Within this range, the metal bonding balance on the nickel plating surface is not lost, and the nickel coating layer can be cleaned without damaging it.

前記前洗浄液を用いた前洗浄後、本洗浄液を用いた本洗浄後、あるいは/および後洗浄液を用いた後洗浄後に、下記の(1)〜(3)のいずれかの方法で洗浄液を除去している。
(1)清浄水による水洗いのみを行う。
(2)清浄水による水洗い後に、アルコール、エタノール、アセトン、これらと水との混合液のいずれかでリンス洗浄を行う。
(3)水洗いをせずに、直接、アルコール、エタノール、アセトン、これらと水との混合液のいずれかでリンス洗浄を行う。
このように、洗浄液の除去を行うことにより、洗浄液の水に含まれる組成物や不純物の影響で金型表面の水染みが生じるのを防止できる。
After the pre-cleaning using the pre-cleaning liquid, the main cleaning using the main cleaning liquid, and / or the post-cleaning using the post-cleaning liquid, the cleaning liquid is removed by any of the following methods (1) to (3). ing.
(1) Only rinse with clean water.
(2) After rinsing with clean water, rinsing with alcohol, ethanol, acetone, or a mixture of these with water is performed.
(3) Rinse washing is performed directly with alcohol, ethanol, acetone, or a mixture of these with water without washing with water.
In this way, by removing the cleaning liquid, it is possible to prevent water stain on the mold surface from occurring due to the influence of the composition and impurities contained in the water of the cleaning liquid.

金型洗浄では、金型に付着している樹脂カスの量、付着力、付着位置、樹脂の種類などに応じて洗浄強度を変えており、かつ、全体的な洗浄工程としては、例えば、下記の(1)〜(5)から選択されることが好ましい。
(1)本洗浄→洗浄液除去
(2)本洗浄→洗浄液除去→防錆処理
(3)前洗浄→洗浄液除去→本洗浄→洗浄液除去→防錆処理
(4)本洗浄→洗浄液除去→後洗浄→洗浄液除去→防錆処理
(5)前洗浄→洗浄液除去→本洗浄→洗浄液除去→後洗浄→洗浄液除去→防錆処理。
なお、ニッケル金型では(1)が好ましい。
In the mold cleaning, the cleaning strength is changed according to the amount of resin residue adhering to the mold, the adhesive force, the adhesion position, the type of resin, etc. (1) to (5) are preferably selected.
(1) Main cleaning → Cleaning liquid removal
(2) Main cleaning → Cleaning liquid removal → Rust prevention treatment (3) Pre cleaning → Cleaning liquid removal → Main cleaning → Cleaning liquid removal → Rust prevention treatment (4) Main cleaning → Cleaning liquid removal → Post cleaning → Cleaning liquid removal → Rust prevention treatment (5 ) Pre-cleaning → Cleaning liquid removal → Main cleaning → Cleaning liquid removal → Post-cleaning → Cleaning liquid removal → Rust prevention treatment.
In the case of a nickel mold, (1) is preferable.

電解洗浄を行う本洗浄前に前洗浄液を用いた前洗浄あるいは/および本洗浄後に後洗浄液を用いた後洗浄を行うことで、金型表面に強固に付着している前記耐熱、耐油、耐摩耗性樹脂カスが確実に除去することができる。   Electrolytic cleaning Before the main cleaning, the pre-cleaning using the pre-cleaning liquid and / or the post-cleaning using the post-cleaning liquid after the main cleaning, the heat resistance, oil resistance, wear resistance that adheres firmly to the mold surface Can be reliably removed.

前記いずれの工程を採用しても、本洗浄は電解洗浄に超音波洗浄を併用すると洗浄能力を高めることができ、かつ、金型の汚れ程度に応じて洗浄時間の調節、本洗浄液および前洗浄、後洗浄の洗浄液の成分を前記範囲内て調節している。   Regardless of which process is used, the cleaning performance can be improved by using ultrasonic cleaning in combination with electrolytic cleaning, and the cleaning time can be adjusted according to the degree of mold contamination, and the main cleaning liquid and pre-cleaning. The components of the cleaning liquid for post-cleaning are adjusted within the above range.

前記水洗いは水をノズル等から吐出させてシャワー洗浄としても良いし、水を溜めた洗浄槽に金型を浸漬してもよい。リンス洗浄は前記揮発成分あるいは揮発成分と水との混合液をノズル等から金型に塗布しても良いし、該液を溜めた洗浄槽に金型を浸漬しても良い。   The water washing may be shower washing by discharging water from a nozzle or the like, or the mold may be immersed in a washing tank in which water is stored. In the rinse cleaning, the volatile component or a mixed solution of the volatile component and water may be applied to the mold from a nozzle or the like, or the mold may be immersed in a cleaning tank in which the liquid is stored.

前記後洗浄の後で後洗浄液を除去した後に金型表面に防錆剤を塗布する防錆処理を行うことが好ましい。該防錆処理は、防錆剤を溜めた液槽に金型を浸漬することにより行われるが、他の塗布方法でもよい。
前記防錆剤として、低級アミンからなる水性防錆剤を用い、特に、モルホリンが好適に用いられる。
なお、導光板、プラスチックレンズ、リフレクター用のニッケル金型では、ニッケル被覆面に残渣が残りやすいため、で防錆処理をしない方が好ましい。
After the post-cleaning, it is preferable to perform a rust prevention treatment by applying a rust preventive agent to the mold surface after removing the post-cleaning liquid. The rust prevention treatment is performed by immersing the mold in a liquid tank in which a rust inhibitor is stored, but other coating methods may be used.
An aqueous rust inhibitor made of a lower amine is used as the rust inhibitor, and morpholine is particularly preferably used.
In addition, in the nickel mold for the light guide plate, the plastic lens, and the reflector, it is preferable that the rust preventive treatment is not performed because the residue tends to remain on the nickel-coated surface.

前記のように水性防錆剤を用いると、100℃前後で蒸発、揮発し、かつ加熱しなくとも2〜3日で自然蒸発し、金型で成形する成形品に防錆剤が付着することが防止できる。
一方、水性系の防錆剤は防錆期間が比較的短いため、防錆剤が成形品の表面に付着しても問題がない場合には、水性系防錆剤に代えて、あるいは水性系防錆剤を塗布した金型表面に再度油性防錆剤を重ねて塗布してもよい。
As described above, when an aqueous rust inhibitor is used, it evaporates and volatilizes at around 100 ° C., and spontaneously evaporates in 2 to 3 days without heating, and the rust inhibitor adheres to a molded product molded with a mold. Can be prevented.
On the other hand, since the water-based rust preventive agent has a relatively short rust prevention period, if there is no problem even if the rust preventive agent adheres to the surface of the molded product, it can be replaced with the water-based rust preventive agent or the water-based rust preventive agent. The oil-based rust preventive agent may be applied again on the mold surface coated with the rust preventive agent.

本発明は、第3の発明として、前洗浄を行う前洗浄槽あるいは/および後洗浄を行う後洗浄槽と、電解洗浄手段で本洗浄を行う本洗浄槽とを備え、前記前洗浄槽には前記した前洗浄液を供給していると共に、前記本洗浄槽には前記した本洗浄液を供給していることを特徴とする金型洗浄装置を提供している。   The present invention includes, as a third invention, a pre-cleaning tank for performing pre-cleaning and / or a post-cleaning tank for performing post-cleaning, and a main cleaning tank for performing main cleaning with an electrolytic cleaning means. A mold cleaning apparatus is provided in which the pre-cleaning liquid is supplied and the main cleaning tank is supplied with the main cleaning liquid.

さらに、洗浄液を流し落とすための水洗い、揮発成分によるリンス洗浄を行うためのシャワーや洗浄槽、さらに、防錆手段を付設しても良いことは言うまでもない。   Furthermore, it goes without saying that a shower and a washing tank for rinsing with a volatile component for rinsing off the washing liquid and a rust prevention means may be additionally provided.

前洗浄する場合には、前洗浄液が供給された前洗浄槽には、金型を所要時間浸漬する構成としている。
電解洗浄、好ましくは超音波洗浄も併用して行う本洗浄用の洗浄槽としては、先に本出願人が出願している前記特許文献1等に記載した洗浄装置、特願2004−101361号に記載した洗浄装置等が好適に用いられる。
In the case of pre-cleaning, the mold is immersed in the pre-cleaning tank supplied with the pre-cleaning liquid for a required time.
As a cleaning tank for main cleaning that is also performed in combination with electrolytic cleaning, preferably ultrasonic cleaning, the cleaning apparatus described in Patent Document 1 and the like previously filed by the present applicant, Japanese Patent Application No. 2004-101361. The described cleaning device or the like is preferably used.

前洗浄槽から本洗浄槽、本洗浄槽から後洗浄への金型の搬送は、上方に設置したガイドレールで金型保持具を把持して搬送しても良いし、作業員が金型を保持具で保持して搬送してもよい。   The mold can be transported from the pre-cleaning tank to the main cleaning tank and from the main cleaning tank to the post-cleaning by holding the mold holder with the guide rail installed at the upper side. You may hold | maintain and convey with a holder.

特に、前記前洗浄槽には、洗浄時に前洗浄槽の上面開口を密閉する蓋を設けていると共に、該蓋で密閉した状態で前記補助洗浄槽を加熱する手段を設け、補助洗浄槽を圧力釜の構成としていることが好ましい。   In particular, the pre-cleaning tank is provided with a lid that seals the top opening of the pre-cleaning tank during cleaning, and is provided with means for heating the auxiliary cleaning tank in a state of being sealed with the lid so that the auxiliary cleaning tank is pressurized. It is preferable to have a hook configuration.

洗浄される金型が、フラットパネルディスプレイの導光板、レンズ、自動車のリフレクタ等の精密成形品用で、ニッケル金型とされる場合は、前記したように、前洗浄を無くし、本洗浄槽において、前記本洗浄液を用い、電解洗浄と超音波洗浄とを併用した洗浄方法とすることが最も好ましい。該洗浄方法で洗浄すると、超微粒子の付着の防止、付着した超微粒子の除去を含め、最もシビアに求められる洗浄性能を得ることができる。   When the mold to be cleaned is a precision mold for flat panel display light guide plates, lenses, automobile reflectors, etc., and is a nickel mold, as described above, there is no pre-cleaning in the main cleaning tank. It is most preferable to use a cleaning method in which electrolytic cleaning and ultrasonic cleaning are used in combination using the cleaning solution. When the cleaning method is used, it is possible to obtain the most demanding cleaning performance including prevention of adhesion of ultrafine particles and removal of attached ultrafine particles.

また、前記ニッケル金型を洗浄する場合には、本洗浄槽の電解洗浄用として用いるプラス極側の電極は、プラチナ(白金)、パラジウム、ロジウム、イリジウム、ルテニウム、オスミウム、金、銀の貴金属、あるいはこれらの貴金属の合金の1種あるいは複数種からなる金属からなり、あるいは前記金属でメッキされたものとすることが好ましい。
さらに、前記プラス極側の電極は、チタンに前記金属がメッキあるいは貼り付けられたものとしていることがこのましい。
さらに、前記本洗浄槽の電解洗浄用の電極に印加する電圧を2〜5Vの範囲としていることが好ましい。
When cleaning the nickel mold, the positive electrode used for electrolytic cleaning of the main cleaning tank is platinum (platinum), palladium, rhodium, iridium, ruthenium, osmium, gold, silver noble metals, Alternatively, it is preferable to use one or a plurality of these precious metal alloys or to be plated with the metal.
Furthermore, it is preferable that the electrode on the positive electrode side is formed by plating or pasting the metal on titanium.
Furthermore, it is preferable that the voltage applied to the electrode for electrolytic cleaning of the main cleaning tank is in the range of 2 to 5V.

上述したように、本発明は、洗浄液に関しては、電解洗浄(好ましくは超音波洗浄を併用)する本洗浄前の前洗浄液として、有機溶剤を含む洗浄液ではなく、ノニオン、カチオンあるいはアニオン系の界面活性剤と、メタ珪酸ソーダあるいは/およびオルト珪酸ソーダと、キレート剤を含む洗浄液を用いて前洗浄を行っているため、耐熱、耐油、耐摩耗性を有する樹脂が金型表面、特に微細な凹部の隅に樹脂カスとして付着している場合においても、これら従来の電解あるいは/および超音波金型洗浄では除去しきれなかったものを確実に除去することができる。
さらに、汚れが酷い金型の場合には、前洗浄液と同一成分の後洗浄液を用いて、電解洗浄および超音波洗浄による本洗浄後に、後洗浄すると、除去しにくい樹脂カスを略完全に除去することができる。
As described above, according to the present invention, the cleaning liquid is not a cleaning liquid containing an organic solvent, but a nonionic, cationic or anionic surface active as a pre-cleaning liquid before the main cleaning for electrolytic cleaning (preferably combined with ultrasonic cleaning). Since the pre-cleaning is performed using a cleaning liquid containing an agent, sodium metasilicate or / and sodium orthosilicate, and a chelating agent, the resin having heat resistance, oil resistance, and abrasion resistance is formed on the mold surface, particularly on the fine recesses. Even when the resin is adhered to the corner, it is possible to surely remove those that could not be removed by conventional electrolysis or / and ultrasonic mold cleaning.
Furthermore, in the case of a mold with severe dirt, the post-cleaning liquid of the same component as the pre-cleaning liquid is used, and after the main cleaning by electrolytic cleaning and ultrasonic cleaning, the post-cleaning removes the resin residue that is difficult to remove. be able to.

また、電解洗浄を行う本洗浄液は、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウムから選択された1以上を含む強アルカリ成分と、EDTA4ナトリウム塩からなるキレート剤と、有機窒素あるいは無機窒素からなる酸化物除去成分と、グルコン酸ナトリウムとを含む水を用い、該水は精製手段で精製した水として、水道水に含まれるシリカやカルシウムなどの異物を除去している。そのため、該電解洗浄液で洗浄する金型が、精密部品成形用のニッケル金型である場合、1000〜10000倍の電子顕微鏡で観察しても異物が付着されていない優れた洗浄力で洗浄することができる。
よって、フラットパネルディスプレイの導光板、レンズ、自動車のリフレクタ等を成形するためのニッケル金型を洗浄する場合に、その洗浄能力が高いことにより、効果的に用いることができる。
In addition, the main cleaning solution for electrolytic cleaning is a strong alkali component containing at least one selected from sodium hydroxide, potassium hydroxide, and sodium carbonate, a chelating agent composed of EDTA tetrasodium salt, and an oxidation composed of organic nitrogen or inorganic nitrogen. Water containing an object removing component and sodium gluconate is used, and the water is purified by a purification means to remove foreign matters such as silica and calcium contained in tap water. Therefore, when the mold to be cleaned with the electrolytic cleaning solution is a nickel mold for forming a precision part, it should be cleaned with an excellent cleaning power that does not have foreign matter attached even when observed with an electron microscope of 1000 to 10000 times. Can do.
Therefore, when cleaning a nickel mold for forming a light guide plate, a lens, an automobile reflector or the like of a flat panel display, it can be effectively used due to its high cleaning ability.

以下、本発明を図面に示す実施形態を参照して詳細に説明する。
図1は第1実施形態の金型洗浄装置の全体概略図を示し、10は前洗浄槽、11は水洗い槽、12は本洗浄槽、13はリンス槽、14は防錆塗布槽である。
該第1実施形態の洗浄装置で洗浄される金型は、ニッケル被覆されたニッケル金型ではなく、一般的な鉄鋼性の金型である。
前記洗浄槽のうち、前洗浄槽10と本洗浄槽12とは洗浄槽10、12の上面開口を閉鎖する蓋16、17を備え、洗浄時にはこれら蓋16、17で閉鎖して洗浄する構成としている。
なお、前記蓋は各槽に個別に設けずに1つの連続蓋としてもよい。また、蓋で密閉せずに洗浄してもよいが、前洗浄槽10は蓋16で密閉して前洗浄することが好ましい。
Hereinafter, the present invention will be described in detail with reference to embodiments shown in the drawings.
FIG. 1 is an overall schematic view of a mold cleaning apparatus according to the first embodiment, where 10 is a pre-cleaning tank, 11 is a water-washing tank, 12 is a main cleaning tank, 13 is a rinsing tank, and 14 is a rust-proof coating tank.
The mold cleaned by the cleaning device of the first embodiment is not a nickel-coated nickel mold but a general steel mold.
Among the cleaning tanks, the pre-cleaning tank 10 and the main cleaning tank 12 include lids 16 and 17 that close the upper surface openings of the cleaning tanks 10 and 12, and are closed and cleaned with these lids 16 and 17 during cleaning. Yes.
In addition, the said lid | cover is good also as one continuous lid, without providing in each tank separately. Moreover, although it may wash | clean without sealing with a cover, it is preferable to pre-clean the pre-cleaning tank 10 with the cover 16 sealed.

上記洗浄槽10〜14を並設しており、これら洗浄槽10〜14の上部にガイドレール20を装架し、洗浄する合成樹脂用の金型21を保持する金属製の保持カゴ22をアーム23を着脱自在に取り付けて、順次搬送する構成としている。
なお、上記搬送機構は必ずしも必要でなく、作業者が金型を保持する保持具を順次洗浄槽に挿入していってもよい。
The cleaning tanks 10 to 14 are arranged side by side, a guide rail 20 is mounted on the upper part of the cleaning tanks 10 to 14, and a metal holding basket 22 that holds a mold 21 for synthetic resin to be cleaned is armed. 23 is detachably attached and sequentially conveyed.
In addition, the said conveyance mechanism is not necessarily required, The operator may insert the holder which hold | maintains a metal mold | die into a washing tank sequentially.

前記前洗浄槽10は上面開口のボックス形状で、その内部に前洗浄液Q1を貯溜しており、該前洗浄槽10内に、図2に示すように、金型21を搭載した金属製のカゴ22を浸漬して、所要時間(好ましくは15分〜30分)浸けている。
前洗浄液Q1は、ノニオン、カチオンあるいはアニオン系の界面活性剤と、メタ珪酸ソーダあるいは/およびオルト珪酸ソーダと、キレート剤を水に配合したものである。水は水道水を精製手段で精製した純水としている。
本実施形態の前洗浄液Q1で、界面活性剤を2cc/リットル、メタ珪酸ソーダを50g/リットル〜100g/リットル、EDTA4ナトリウム塩からなるキレート剤を100g/リットル〜50g/リットルで配合し、残りを水としている。
The pre-cleaning tank 10 has a box shape with an upper surface opening, and stores a pre-cleaning liquid Q1 in the inside. As shown in FIG. 22 is immersed, and the required time (preferably 15 minutes to 30 minutes) is immersed.
The pre-cleaning liquid Q1 is obtained by blending nonionic, cationic or anionic surfactant, sodium metasilicate or / and sodium orthosilicate, and a chelating agent in water. The water is pure water obtained by purifying tap water by a purification means.
In the pre-cleaning liquid Q1 of this embodiment, 2 cc / liter of surfactant, 50 g / liter to 100 g / liter of sodium metasilicate, and 100 g / liter to 50 g / liter of a chelating agent composed of sodium EDTA are mixed, and the rest It's water.

前洗浄槽10はその下部にヒータ等からなる加熱手段18を配置し、洗浄時には、蓋16で前洗浄槽10の上部開口を閉鎖して圧力釜の状態としている。この状態で、加熱手段18で前洗浄槽10内の前洗浄液Q1を煮沸し、該前洗浄液Q1で金型21を前洗浄している。   The pre-cleaning tank 10 is provided with a heating means 18 comprising a heater or the like in the lower part thereof, and at the time of cleaning, the upper opening of the pre-cleaning tank 10 is closed with a lid 16 to form a pressure cooker. In this state, the pre-cleaning liquid Q1 in the pre-cleaning tank 10 is boiled with the heating means 18, and the mold 21 is pre-cleaned with the pre-cleaning liquid Q1.

前洗浄槽10での前洗浄後には、金型を水洗いする水洗槽11を設けて、金型表面に付着した前洗浄液を洗い落としている。この水洗槽11では上部に配置したシャワー15より水を流して、金型を簡単に水洗いしている。なお、清浄水を貯溜した槽に浸漬して水洗いしてもよい。   After the pre-cleaning in the pre-cleaning tank 10, a water-washing tank 11 for washing the mold is provided to wash off the pre-cleaning liquid adhering to the mold surface. In this water rinsing tank 11, water is poured from a shower 15 arranged at the upper part to easily wash the mold. In addition, you may immerse in the tank which stored clean water and wash with water.

水洗槽11で水洗した金型は図3および図4に示す本洗浄槽12に移送している。該本洗浄槽12では電解洗浄方式と超音波洗浄方式とを併用した洗浄を行う構成としている。
本洗浄槽12は上面開口のボックス形状で、その外周面の略全面に沿ってシリコンゴムヒータからなる面状ヒータ(図示せず)を取り付け、本洗浄槽12内の本洗浄液Q2を30〜60℃に加熱するようにしている。
The mold washed in the water washing tank 11 is transferred to the main washing tank 12 shown in FIGS. The main cleaning tank 12 is configured to perform cleaning using both an electrolytic cleaning method and an ultrasonic cleaning method.
The main cleaning tank 12 has a box shape with an upper surface opening, and a planar heater (not shown) made of a silicon rubber heater is attached along substantially the entire outer peripheral surface of the main cleaning tank 12, and the main cleaning liquid Q2 in the main cleaning tank 12 is 30-60. Heat to ℃.

本洗浄液Q2(即ち、電解洗浄液)は、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウムから選択された1以上を含む強アルカリ成分と、EDTA4ナトリウム塩からなるキレート剤と、有機窒素あるいは無機窒素からなる酸化物除去成分と、グルコン酸ナトリウムと、ノニオン系、カチオン系、アニオン系の界面活性剤から選択される1以上の界面活性剤を、水道水を精製手段で精製した純水に配合している。
そのさい、配合量は、強アルカリ成分を30〜100g/リットル、EDTA4ナトリウム塩を30〜100g/リットル、グルコン酸ナトリウムを10〜60g/リットル、前記酸化物除去成分を30〜150g/リットル、前記ノニオン系、カチオン系、アニオン系の界面活性剤から選択される1以上の界面活性剤を1〜3cc/リットルとし、残りを純水として、配合している
This cleaning liquid Q2 (that is, electrolytic cleaning liquid) is composed of a strong alkali component containing one or more selected from sodium hydroxide, potassium hydroxide, and sodium carbonate, a chelating agent composed of EDTA tetrasodium salt, and organic nitrogen or inorganic nitrogen. One or more surfactants selected from an oxide removal component, sodium gluconate, and nonionic, cationic, and anionic surfactants are blended in pure water obtained by purifying tap water by a purification means. .
At that time, the compounding amount is 30-100 g / liter of strong alkali component, 30-100 g / liter of EDTA tetrasodium salt, 10-60 g / liter of sodium gluconate, 30-150 g / liter of the oxide removing component, One or more surfactants selected from nonionic, cationic, and anionic surfactants are added to 1 to 3 cc / liter, and the remainder is added as pure water.

前記本洗浄液Q2は本洗浄槽12内に、金型21の量に応じて所要レベルまで収容しており、図示していないが、所要時に本洗浄槽12の底壁に設けた取出口より循環管に排出し、浄化タンク内に導いて濾過した後、循環ポンプで吸い上げて、本洗浄槽11の上面開口へと投入して循環させるようにしている。   The main cleaning liquid Q2 is stored in the main cleaning tank 12 up to a required level according to the amount of the mold 21, and is circulated from an outlet provided on the bottom wall of the main cleaning tank 12 when necessary. After being discharged into a pipe, guided into the purification tank, filtered, sucked up by a circulation pump, and introduced into the upper surface opening of the main cleaning tank 11 for circulation.

本洗浄槽12には、その上面開口を囲む外周フランジ部の上面に絶縁ベース21を取り付け、前記金型の保持カゴ22の支持腕22aを絶縁ベース21に吊り下げて、本洗浄槽12の内部に保持カゴ22を着脱自在に吊り下げるようにしており、かつ、本洗浄槽12内で、その底面、内周面にカゴ22が接触しないようにしている。
該金型保持カゴ22はパンチングメタルからなる底部22bより支持腕22aを突設し、該支持腕22aに設けた上部屈折部22cを絶縁ベース21上に載置して取り付けている。其の際、絶縁ベース21の対向する2辺上に取り付けたステンレス製の給電板23に一部の支持腕22aを位置きめ載置している。なお、金型保持カゴ22の支持腕22aは洗浄槽12の内面と接触して通電しないように絶縁被覆を施しており、給電板23との接触部分のみ絶縁被覆を設けていない。
An insulating base 21 is attached to the upper surface of the outer peripheral flange portion surrounding the upper surface opening of the main cleaning tank 12, and the support arm 22 a of the holding cage 22 of the mold is suspended from the insulating base 21 to The holding basket 22 is detachably suspended and the basket 22 is prevented from contacting the bottom surface and the inner peripheral surface of the main cleaning tank 12.
The mold holding basket 22 has a support arm 22a protruding from a bottom portion 22b made of punching metal, and an upper refracting portion 22c provided on the support arm 22a is mounted on the insulating base 21. At that time, some support arms 22a are positioned and placed on a stainless steel power supply plate 23 mounted on two opposing sides of the insulating base 21. The support arm 22a of the mold holding basket 22 is provided with an insulation coating so as not to be energized by contacting the inner surface of the cleaning tank 12, and only the contact portion with the power supply plate 23 is not provided with an insulation coating.

上記給電板23は、絶縁ベース21内を貫通する長尺な通電ボルト(図示せず)で絶縁ベース21に固定し、通電ボルトの下端をブスバーに介して電解用変換器のマイナス側電極に接続している。
同様に、上記絶縁ベース21の他の対向する2辺上に、同様の給電板27を取り付け、該給電板27の間に導電支持棒28を軸架すると共に、給電板27をブスバーを介して電解用交換気のプラス側電極と接続している。
The feeding plate 23 is fixed to the insulating base 21 with a long energizing bolt (not shown) penetrating the insulating base 21, and the lower end of the energizing bolt is connected to the negative electrode of the converter for electrolysis via a bus bar. doing.
Similarly, a similar power supply plate 27 is mounted on the other two opposite sides of the insulating base 21, and a conductive support rod 28 is pivoted between the power supply plates 27, and the power supply plate 27 is connected via a bus bar. It is connected to the positive electrode of the exchange air for electrolysis.

導電支持棒28には、長さ方向に一定間隔をあけて取付穴28aを設け、これら取付穴28aに、上部縦軸29aの下端を横方向に2又に分岐させ、これら分岐部29bの先端を下向きに屈曲させ、その下端に円形の電極板29cを揺動可能に取り付けた電極材29を上下長さ調整可能に取り付け、導電支持棒28に間隔をあけて並列に吊り下げた電極板29cが金型および保持カゴ22と接触しないようにしている。   The conductive support rods 28 are provided with mounting holes 28a at regular intervals in the length direction, and the lower ends of the upper longitudinal axes 29a are bifurcated in the lateral direction into the mounting holes 28a. Is bent downward, and an electrode material 29 having a circular electrode plate 29c attached to the lower end thereof so as to be swingable is attached so that the vertical length can be adjusted, and the electrode plate 29c is suspended in parallel with an interval from the conductive support rod 28. Is not in contact with the mold and the holding basket 22.

上記電解用変換器は交流の電源器と接続し、電流を交流から直流に変換して電解洗浄用の上記電極と金型保持カゴ22に電流を供給している。このように、電極材29を電解用変換器のプラス側、上記金型保持カゴ22をマイナス側に接続することにより、電解洗浄液からなる本洗浄液Q2を介して通電させて電解方式の洗浄を行うようにしている。   The electrolysis converter is connected to an AC power supply, converts current from AC to DC, and supplies current to the electrode and the mold holding cage 22 for electrolytic cleaning. In this way, by connecting the electrode material 29 to the plus side of the electrolysis converter and the mold holding basket 22 to the minus side, the electrolysis cleaning is performed by energizing the main cleaning liquid Q2 made of an electrolytic cleaning liquid. I am doing so.

さらに、本洗浄槽12の底面には、超音波方式の洗浄を行う超音波を発生する振動子(図示せず)を取り付け、本洗浄槽12内の本洗浄液Q2に超音波振動を発生させるようにしている。   Further, a vibrator (not shown) that generates ultrasonic waves for performing ultrasonic cleaning is attached to the bottom surface of the main cleaning tank 12 so as to generate ultrasonic vibrations in the main cleaning liquid Q2 in the main cleaning tank 12. I have to.

前記本洗浄槽12では、本洗浄液を所要温度に加熱した後、給電板23、27から金型保持カゴ22と電極材29とに通電し、本洗浄液Q2を通して、金型保持カゴ22に保持された金型5の電解洗浄を行うと共に、超音波振動を発生させて超音波洗浄を併用している。
電解方式と超音波方式の洗浄方法を併用した本洗浄槽において、超音波方式の洗浄方法により、金型21の外部より樹脂カス等の付着物に振動を与えて付着物を破壊すると共に、電解方式の洗浄方法により金属製の金型表面より発生する水素ガスにより金型21から付着物を浮き上がらせ、付着物を金型21より剥離して除去する。かつ、其の際、本洗浄液Q2を所要加熱しているため、強い洗浄力を発揮させることができる。
In the main cleaning tank 12, after the main cleaning liquid is heated to a required temperature, the power is supplied to the mold holding basket 22 and the electrode material 29 from the power supply plates 23 and 27, and is held in the mold holding basket 22 through the main cleaning liquid Q2. In addition to performing electrolytic cleaning of the mold 5, ultrasonic cleaning is also used to generate ultrasonic vibration.
In the main cleaning tank using both the electrolytic method and the ultrasonic cleaning method, the ultrasonic cleaning method applies vibrations to the deposits such as the resin residue from the outside of the mold 21 to destroy the deposits. The deposits are lifted from the mold 21 by the hydrogen gas generated from the metal mold surface by the cleaning method, and the deposits are peeled off from the mold 21 and removed. And in that case, since this cleaning liquid Q2 is required heating, strong cleaning power can be exhibited.

本洗浄槽12で本洗浄をした金型21はリンス槽13に搬送している。このリンス槽13には、シャワー19を付設して、エタノールと水の混合液を、保持カゴ22に金型を保持した状態で塗布してリンス洗浄を行っている。なお、本実施形態ではアルコールと水との混合液でリンス洗浄している。   The mold 21 that has been subjected to main cleaning in the main cleaning tank 12 is conveyed to the rinsing tank 13. This rinsing tank 13 is provided with a shower 19, and a rinse solution is applied by applying a mixed solution of ethanol and water in a state where the mold is held on the holding basket 22. In the present embodiment, rinsing is performed with a mixture of alcohol and water.

前記リンス槽13でリンス洗浄した後に、防錆処理槽14に移送している。該防錆処理槽14内に低級アミンからなる水性防錆剤Q3を貯溜しており、該防錆処理槽15内に保持カゴ22で保持した金型21を浸漬して、金型21の表面に水性防錆剤を塗布している。
本実施形態では低級アミンからなる水性防錆剤としてモルホリンを用いている。
なお、金型で成形する樹脂成形品が表面に防錆剤が付着しても良い製品であれば、さらに、油性防錆剤を貯溜した第2の防錆処理槽へ浸漬している。
After rinsing and washing in the rinsing tank 13, it is transferred to the rust prevention treatment tank 14. An aqueous rust inhibitor Q3 made of a lower amine is stored in the rust prevention treatment tank 14, and a mold 21 held by a holding basket 22 is immersed in the rust prevention treatment tank 15, so that the surface of the mold 21 is immersed. A water-based rust preventive agent is applied.
In the present embodiment, morpholine is used as an aqueous rust inhibitor made of a lower amine.
In addition, if the resin molded product shape | molded with a metal mold | die is a product with which a rust preventive agent may adhere to the surface, it is further immersed in the 2nd rust prevention processing tank which stored the oil-based rust preventive agent.

前記した実施形態によれば、洗浄される金型は、まず、前洗浄槽10で前洗浄液Q1により洗浄され、ついで、水洗槽11で前洗浄液Q2を清浄水を用いて洗い流さした後に、本洗浄槽12で電解洗浄と超音波洗浄とを併用して本洗浄液Q2で本洗浄がなされる。
その際、前洗浄液Q1による前洗浄と、本洗浄液Q2による電解洗浄および超音波洗浄とで、金型21に付着している樹脂カスが、耐熱性、耐油性、耐摩耗性を有する樹脂であっても、かつ、微細な凹部のコーナ部に付着していても、確実に除去することができ、洗浄能力を高めることができる。
According to the above-described embodiment, the mold to be cleaned is first cleaned with the pre-cleaning liquid Q1 in the pre-cleaning tank 10, and then the main cleaning is performed after the pre-cleaning liquid Q2 is rinsed with clean water in the water cleaning tank 11. The main cleaning is performed with the main cleaning solution Q2 in the tank 12 using both electrolytic cleaning and ultrasonic cleaning.
At that time, the resin residue adhering to the mold 21 in the pre-cleaning with the pre-cleaning liquid Q1, the electrolytic cleaning with the main cleaning liquid Q2, and the ultrasonic cleaning is a resin having heat resistance, oil resistance, and wear resistance. Even if it adheres to the corners of the fine recesses, it can be reliably removed and the cleaning ability can be enhanced.

本発明の金型洗浄装置はは上記実施形態に限定されず、電解洗浄と超音波洗浄とを併用する本洗浄槽として、本出願人の先願に係る特開2004−101361号に開示した図5に示す洗浄装置を用いてもよい。   The mold cleaning apparatus of the present invention is not limited to the above-described embodiment, and is disclosed in Japanese Patent Application Laid-Open No. 2004-101361 according to the prior application of the present applicant as a main cleaning tank that uses both electrolytic cleaning and ultrasonic cleaning. A cleaning apparatus shown in FIG.

また、本洗浄槽は図5に示す構成としてもよい。該本洗浄槽35では、導電性金属板からなる底板30上に樹脂からなる側板31を四角枠状に立設し、底板30上に金型21を直接載置し、底板30より金型に通電している。側壁31上に前記実施形態と同様に電極29を吊り下げた構成としている。底板30と側板31より構成する洗浄槽35内には前記本洗浄液Q2を供給している。   Moreover, this cleaning tank is good also as a structure shown in FIG. In the main cleaning tank 35, a side plate 31 made of resin is erected in a square frame shape on a bottom plate 30 made of a conductive metal plate, and a mold 21 is directly placed on the bottom plate 30, and the mold is moved from the bottom plate 30 to the mold. Energized. The electrode 29 is suspended on the side wall 31 in the same manner as in the above embodiment. The main cleaning liquid Q2 is supplied into the cleaning tank 35 constituted by the bottom plate 30 and the side plate 31.

前記第1実施形態は、図6(A)で示す工程からなる。即ち、前洗浄液での前洗浄→清浄水による水洗い→電解洗浄と超音波洗浄による本洗浄→エタノールと水との混合液によるリンス洗浄→防錆塗布からなり、後洗浄液による後洗浄は省略している。
洗浄工程は前記(A)に限定されず、(B)に示すように、前洗浄後に清浄水による水洗い後にさらに、エタノール単体でリンス洗浄して、前洗浄液を完全に除去した後に、本洗浄をしてもよい。
The first embodiment includes the steps shown in FIG. That is, it consists of pre-cleaning with pre-cleaning liquid → water cleaning with clean water → main cleaning by electrolytic cleaning and ultrasonic cleaning → rinsing cleaning with ethanol / water mixture → anti-rust coating, and post-cleaning with post-cleaning liquid is omitted. Yes.
The washing step is not limited to the above (A), and as shown in (B), after the pre-washing, after rinsing with clean water, rinse with ethanol alone to completely remove the pre-washing solution, and then perform the main washing. May be.

前記第1実施形態では後洗浄液による後洗浄を行っていないが、金型の樹脂カスが除去が容易でない場合には、図6(C)に示すように、本洗浄後に清浄水で水洗い後に、後洗浄液を満たした後洗浄槽に浸漬して後洗浄している。この後洗浄でも前洗浄と同様に後洗浄液が煮沸する程度に加熱することが好ましい。後洗浄液による洗浄後は清浄水による水洗い、ついで、エタノール単体でリンス洗浄を行っている。
図6(D)では、後洗浄液による後洗浄後、水洗いを省略して、エタノールと水との混合液によるリンス洗浄を行っている。
In the first embodiment, the post-cleaning with the post-cleaning liquid is not performed. However, in the case where the resin residue of the mold is not easily removed, as shown in FIG. After the post-cleaning liquid is filled, the post-cleaning is performed by dipping in a cleaning tank. It is preferable that the post-cleaning is heated to such an extent that the post-cleaning liquid is boiled as in the pre-cleaning. After washing with the post-cleaning liquid, washing with clean water and then rinsing with ethanol alone are performed.
In FIG. 6D, after the post-cleaning with the post-cleaning liquid, the water cleaning is omitted, and the rinse cleaning with the mixed liquid of ethanol and water is performed.

さらに、図7(A)(B)に示すように、前洗浄液による前洗浄を省略してもよい。
図7(A)では、本洗浄→エタノールと水との混合液によるリンス洗浄→防錆塗布を行っている。
図7(B)では後洗浄液による後洗浄は行い、本洗浄→清浄液による水洗い→後洗浄液による後洗浄→清浄液による水洗い→エタノール単体でのリンス洗浄→防錆塗布を行っている。
Further, as shown in FIGS. 7A and 7B, the pre-cleaning with the pre-cleaning liquid may be omitted.
In FIG. 7A, main cleaning → rinse cleaning with a mixed solution of ethanol and water → rust prevention coating is performed.
In FIG. 7B, post-cleaning with post-cleaning liquid is performed, main cleaning → washing with cleaning liquid → post-cleaning with post-cleaning liquid → water cleaning with cleaning liquid → rinse cleaning with ethanol alone → rust prevention coating.

さらに、図7(C)に示すように、本洗浄→水洗い→リンス洗浄、図7(D)に示すように、本洗浄→水洗い→乾燥とし、最終工程の防錆塗布を省いてもよい。この図7(D)が前記導光板、レンズ等の成形用のニッケル金型の洗浄に適している。   Further, as shown in FIG. 7C, main cleaning → water washing → rinse cleaning, and main cleaning → water washing → drying as shown in FIG. FIG. 7D is suitable for cleaning a nickel mold for molding the light guide plate and the lens.

本発明の第2実施形態は、フラットディスプレイの導光板を成形するためのニッケル金型を洗浄するものである。洗浄は前記図7(D)の本洗浄→水洗い→乾燥工程とし、第1実施形態で示した図3、図4に洗浄槽12内に図2に示す金型保持カゴ22上にニッケル金型を搭載して洗浄している。よって、第2実施形態の洗浄装置の図示は省略し、図2〜4を用いて説明する。   The second embodiment of the present invention cleans a nickel mold for forming a light guide plate of a flat display. 7D is the main cleaning → water washing → drying step, and the nickel mold is placed on the mold holding basket 22 shown in FIG. 2 in the cleaning tank 12 shown in FIGS. 3 and 4 shown in the first embodiment. It is mounted and washed. Therefore, the illustration of the cleaning device of the second embodiment is omitted, and will be described with reference to FIGS.

前記洗浄槽12内において前記本洗浄液Q2を供給している。該本洗浄液に配合する水は、水道水を蒸留したものである。
本洗浄槽12に電解洗浄用として吊り下げる電極材29の下端に取り付ける電極板29cは、チタンの表面を白金で被覆したものを用い、該電極板29cおよび金型保持カゴ22との間に印加する電圧は約5Vとしている。
また、本洗浄槽12の底面に配置する超音波振動子の振動周波数は40〜70KHzの範囲に設定している。
In the cleaning tank 12, the main cleaning liquid Q2 is supplied. The water blended in the main cleaning liquid is obtained by distilling tap water.
The electrode plate 29c attached to the lower end of the electrode material 29 suspended for electrolytic cleaning in the main cleaning tank 12 uses a titanium surface coated with platinum, and is applied between the electrode plate 29c and the mold holding basket 22. The voltage to be set is about 5V.
Further, the vibration frequency of the ultrasonic vibrator arranged on the bottom surface of the main cleaning tank 12 is set in the range of 40 to 70 KHz.

前記第2実施形態では、金型がニッケル金型で損傷を受け易いため、本洗浄後の水洗いおよび乾燥を行うために搬送せず、洗浄槽12に浸漬した状態のままとし、本洗浄後は本洗浄液を排出させ、排出後に水洗い用の水を洗浄槽12に供給している。
この水洗い用の水の供給を2回ほど繰り返した後に、アルコールあるいはアセトンを所要圧力をかけて金型に吹き付けて乾燥させている。
In the second embodiment, since the mold is easily damaged by the nickel mold, the mold is not transported for water washing and drying after the main cleaning, and remains immersed in the cleaning tank 12, and after the main cleaning. The main cleaning liquid is discharged, and water for washing is supplied to the cleaning tank 12 after discharging.
After the water supply for washing is repeated about twice, alcohol or acetone is sprayed on the mold under a required pressure and dried.

第2実施形態では、ニッケル金型を本洗浄槽12内で電解洗浄と超音波洗浄を併用して洗浄する際、洗浄液Q2に含まれる界面活性剤がニッケル被覆面に金属微粒子や樹脂微粒片が付着するのを抑制するバリアを築き、金属微粒子等の異物の付着を防止する。
また、電極材29を白金としていることにより析出量を減少させ、さらに、超音波振動の周波数を40〜70KHzとしてニッケルメッキ層の金属結合のバランスを崩さないようにしているため、ニッケルメッキ表面にダメージの発生を防止できる。
よって、フラットパネルディスプレイの導光板、携帯電話等の超小型精密なカメラレンズ、車両用のリフレクタ(光反射器)等の微細な樹脂成形品用のニッケル金型の洗浄に最も適したものとなる。
In the second embodiment, when the nickel mold is cleaned in the main cleaning tank 12 by using both electrolytic cleaning and ultrasonic cleaning, the surfactant contained in the cleaning liquid Q2 contains metal fine particles and resin fine particles on the nickel-coated surface. A barrier that suppresses adhesion is built up to prevent foreign particles such as metal particles from adhering.
Further, since the electrode material 29 is made of platinum, the amount of precipitation is reduced, and furthermore, the frequency of ultrasonic vibration is set to 40 to 70 KHz so as not to break the balance of metal bonding of the nickel plating layer. Damage can be prevented from occurring.
Therefore, it is most suitable for cleaning nickel molds for fine resin molded products such as light guide plates for flat panel displays, ultra-small and precise camera lenses such as mobile phones, and reflectors (light reflectors) for vehicles. .

本発明に係わる洗浄液、洗浄方法および洗浄装置は、実施形態に記載の合成樹脂用金型に限定されず、ゴム成形用、ガラス成形用等の金型の洗浄にも好適に用いることができる。
また、フラットディスプレイの導光板等の精密成形品を成形するためのニッケル金型の洗浄に用いた場合において、高精度の洗浄能力を発揮できるものである。よって、高度化する精密品、例えば、CD−ROM、DVD−ROM、スパーマルチドライブRAM、HDDVDピックアップレンズ、ブルーレイディスクピックアップレンズ、液状デイスプレイホログラム・プリズム、デジタルカメラ液状ホログラム・プリズム、携帯電話CCDカメラレンズ、各種導光板等を成形するための精密部品成形用金型の洗浄に好適に用いることができる。
The cleaning liquid, the cleaning method, and the cleaning apparatus according to the present invention are not limited to the synthetic resin mold described in the embodiment, and can be suitably used for cleaning molds for rubber molding, glass molding, and the like.
Further, when used for cleaning a nickel mold for forming a precision molded product such as a light guide plate of a flat display, the cleaning ability with high accuracy can be exhibited. Therefore, advanced precision products such as CD-ROM, DVD-ROM, spar multi-drive RAM, HDDVD pickup lens, Blu-ray disc pickup lens, liquid display hologram prism, digital camera liquid hologram prism, mobile phone CCD camera lens It can be suitably used for cleaning precision part molding dies for molding various light guide plates and the like.

本発明の実施形態の全体概略図である。1 is an overall schematic diagram of an embodiment of the present invention. 金型の保持カゴを示す斜視図である。It is a perspective view which shows the holding basket of a metal mold | die. 本洗浄装置を示す平面図である。It is a top view which shows this cleaning apparatus. 図3の斜視図である。FIG. 4 is a perspective view of FIG. 3. 他の実施形態の断面図である。It is sectional drawing of other embodiment. (A)〜(D)は洗浄工程を示す図面である。(A)-(D) are drawings which show a washing process. (A)〜(D)は他の洗浄工程を示す図面である。(A)-(D) are drawings which show another washing process. 従来例を示す図面である。It is drawing which shows a prior art example. 他の従来例を示す図面である。It is drawing which shows another prior art example.

符号の説明Explanation of symbols

10 前洗浄槽
12 本洗浄槽
13 リンス槽
14 防錆処理槽
21 金型
22 保持カゴ
Q1 前洗浄液
Q2 本洗浄液
Q3 水性防錆剤
10 Pre-cleaning tank 12 Main cleaning tank 13 Rinse tank 14 Rust prevention tank 21 Mold 22 Holding basket Q1 Pre-cleaning liquid Q2 Main cleaning liquid Q3 Water-based anti-corrosion agent

Claims (26)

電解洗浄を行う本洗浄前の前洗浄あるいは/および本洗浄後に行う後洗浄で用いる洗浄液であって、ノニオン、カチオンあるいはアニオン系の界面活性剤、メタ珪酸ソーダあるいは/およびオルソ珪酸ソーダ、キレート剤を含むものであることを特徴とする金型洗浄液。   A cleaning solution used for pre-cleaning before and / or post-cleaning after electrolytic cleaning, and nonionic, cationic or anionic surfactant, sodium metasilicate or / and sodium orthosilicate, and chelating agent. A mold cleaning liquid characterized by containing. 前記前洗浄液あるいは/および後洗浄液は約40℃〜100℃に加熱されている請求項1に記載の金型洗浄液。   The mold cleaning liquid according to claim 1, wherein the pre-cleaning liquid and / or the post-cleaning liquid is heated to about 40 ° C to 100 ° C. 電解洗浄を行う本洗浄液であって、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウムから選択された1以上を含む強アルカリ成分と、EDTA4ナトリウム塩からなるキレート剤と、有機窒素あるいは無機窒素からなる酸化物除去成分と、グルコン酸ナトリウムとを含むことを特徴とする金型洗浄液。   This cleaning solution for electrolytic cleaning is a strong alkaline component containing at least one selected from sodium hydroxide, potassium hydroxide and sodium carbonate, a chelating agent consisting of EDTA tetrasodium salt, and an oxidation consisting of organic nitrogen or inorganic nitrogen The metal mold | die washing | cleaning liquid characterized by including a thing removal component and sodium gluconate. 前記無機窒素として、硝酸塩あるいはアンモニア塩を用い、
前記有機窒素として、エチレンジアミン、ジエチレントリアミン、トリエチレンテトラミン、ペンタエチレンベキサミンから選択されるエチレンジアミン類を用い、
前記キレート剤として、ヒドロキシエチルイミノ二酢酸ナトリウム塩、ニトリロトリセテック酸ー3ナトリウム(NTA・3Na)、ジカルボキシメチル−グルタミック酸テトラソジウムー4ナトリウム(GLDA・4Na)を用いている請求項3に記載の金型洗浄液。
As the inorganic nitrogen, nitrate or ammonia salt is used,
As the organic nitrogen, ethylenediamine selected from ethylenediamine, diethylenetriamine, triethylenetetramine, pentaethylenebexamine,
The gold according to claim 3, wherein hydroxyethyliminodiacetic acid sodium salt, nitrilotricetecate-3sodium (NTA.3Na), dicarboxymethyl-glutamic acid tetrasodium-4sodium (GLDA.4Na) is used as the chelating agent. Mold cleaning solution.
ノニオン系、カチオン系、アニオン系の界面活性剤から選択される1以上の界面活性剤を含む請求項3あるいは請求項4に記載の金型洗浄液。   The mold cleaning liquid according to claim 3 or 4, comprising one or more surfactants selected from nonionic, cationic and anionic surfactants. 前記本洗浄、前洗浄あるいは/および後洗浄で用いる洗浄液に、水道水を精製手段を通して不純物を除去している水を配合している請求項1乃至請求項5のいずれか1項に記載の金型洗浄液。   6. The gold according to any one of claims 1 to 5, wherein tap water is mixed with water from which impurities are removed through purification means in the cleaning liquid used in the main cleaning, pre-cleaning and / or post-cleaning. Mold cleaning solution. 前記精製手段として、蒸留、イオン交換あるいは/および濾過法を採用した精製手段を用いている請求項6に記載の金型洗浄液。   7. The mold cleaning liquid according to claim 6, wherein a purification means employing distillation, ion exchange or / and filtration is used as the purification means. 前記強アルカリ成分を30〜100g/リットル、前記EDTA4ナトリウムを30〜100g/リットル、グルコン酸ナトリウムを10〜60g/リットル、有機窒素あるいは無機窒素からなる酸化物除去成分を30〜150g/リットル配合している請求項3乃至請求項7のいずれか1項に記載の金型洗浄液。   30 to 100 g / liter of the strong alkali component, 30 to 100 g / liter of the EDTA4 sodium, 10 to 60 g / liter of sodium gluconate, and 30 to 150 g / liter of the oxide removing component composed of organic nitrogen or inorganic nitrogen. The mold cleaning liquid according to any one of claims 3 to 7. 前記ノニオン系、カチオン系、アニオン系の界面活性剤から選択される1以上の界面活性剤を1〜3cc/リットル配合している請求項8に記載の金型洗浄液。   The mold cleaning liquid according to claim 8, wherein 1 to 3 cc / liter of one or more surfactants selected from the nonionic, cationic, and anionic surfactants are blended. 前記本洗浄に用いる洗浄液は約30℃〜60℃に加熱されている請求項3乃至請求項9のいずれか1項に記載の金型洗浄液。   The mold cleaning liquid according to any one of claims 3 to 9, wherein the cleaning liquid used for the main cleaning is heated to about 30 ° C to 60 ° C. 電解洗浄の本洗浄時に請求項3乃至請求項10のいずれか1項の記載の洗浄液を用いていることを特徴とする金型洗浄方法。   A mold cleaning method using the cleaning liquid according to any one of claims 3 to 10 at the time of main cleaning in electrolytic cleaning. 電解洗浄の本洗浄前の前洗浄あるいは/および電解洗浄の本洗浄後の後洗浄に請求項1または請求項2に記載の洗浄液を用いていることを特徴とする金型洗浄方法。   3. A mold cleaning method using the cleaning liquid according to claim 1 or 2 for pre-cleaning before main cleaning of electrolytic cleaning and / or post-cleaning after main cleaning of electrolytic cleaning. 前記本洗浄に超音波洗浄を併用している請求項11または請求項12に記載の金型洗浄方法。   The mold cleaning method according to claim 11 or 12, wherein ultrasonic cleaning is used in combination with the main cleaning. 前記超音波洗浄の周波数を30KHz〜100KHzの範囲としている請求項13に記載の金型洗浄方法。   The mold cleaning method according to claim 13, wherein a frequency of the ultrasonic cleaning is in a range of 30 KHz to 100 KHz. 前記前洗浄液を用いた前洗浄後、本洗浄液を用いた本洗浄後、あるいは/および後洗浄液を用いた後洗浄後に、下記の(1)〜(3)のいずれかの方法で洗浄液を除去している請求項11乃至請求項14に記載の金型洗浄方法。
(1)清浄水による水洗いのみを行う。
(2)清浄水による水洗い後に、アルコール、エタノール、アセトン、これらと水との混合液のいずれかによるリンス洗浄を行う。
(3)水洗いをせずに、直接、アルコール、エタノール、アセトン、これらと水との混合液によるリンス洗浄を行う。
After the pre-cleaning using the pre-cleaning liquid, the main cleaning using the main cleaning liquid, and / or the post-cleaning using the post-cleaning liquid, the cleaning liquid is removed by any of the following methods (1) to (3). The mold cleaning method according to claim 11 to 14.
(1) Only rinse with clean water.
(2) After rinsing with clean water, rinsing with alcohol, ethanol, acetone, or a mixture of these with water is performed.
(3) Rinsing with alcohol, ethanol, acetone, or a mixture of these and water is directly performed without washing with water.
洗浄工程が下記の(1)〜(5)から選択される請求項11乃至請求項15に記載の金型洗浄方法。
(1)本洗浄→洗浄液除去
(2)本洗浄→洗浄液除去→防錆処理
(3)前洗浄→洗浄液除去→本洗浄→洗浄液除去→防錆処理
(4)本洗浄→洗浄液除去→後洗浄→洗浄液除去→防錆処理
(5)前洗浄→洗浄液除去→本洗浄→洗浄液除去→後洗浄→洗浄液除去→防錆処理。
The mold cleaning method according to claim 11, wherein the cleaning step is selected from the following (1) to (5).
(1) Main cleaning → Cleaning liquid removal
(2) Main cleaning → Cleaning liquid removal → Rust prevention treatment (3) Pre cleaning → Cleaning liquid removal → Main cleaning → Cleaning liquid removal → Rust prevention treatment (4) Main cleaning → Cleaning liquid removal → Post cleaning → Cleaning liquid removal → Rust prevention treatment (5 ) Pre-cleaning → Cleaning liquid removal → Main cleaning → Cleaning liquid removal → Post-cleaning → Cleaning liquid removal → Rust prevention treatment.
前記防錆処理は、金型表面に防錆剤を塗布して行い、該防錆剤として低級アミンからなる水性防錆剤を用いている請求項16に記載の金型洗浄方法。   17. The mold cleaning method according to claim 16, wherein the rust prevention treatment is performed by applying a rust inhibitor to the mold surface, and an aqueous rust inhibitor composed of a lower amine is used as the rust inhibitor. 前記低級アミンとしてモルホリンを用いている請求項17に記載の金型洗浄方法。   The mold cleaning method according to claim 17, wherein morpholine is used as the lower amine. 前記前洗浄時に洗浄槽に蓋をして密閉状態として、約40℃〜100℃に加熱している請求項12乃至請求項18に記載の金型洗浄方法。   19. The mold cleaning method according to claim 12, wherein the cleaning tank is covered and sealed at the time of the pre-cleaning and heated to about 40 ° C. to 100 ° C. 19. 少なくとも前洗浄あるいは/および後洗浄を行う洗浄槽と、電解洗浄手段で本洗浄を行う本洗浄槽とを備え、前記前洗浄あるいは/および後洗浄の洗浄槽には請求項1または請求項2に記載の前洗浄液を供給していると共に、前記本洗浄槽には請求項3乃至請求項10のいずれか1項に記載の本洗浄液を供給していることを特徴とする金型洗浄装置。   A cleaning tank for performing at least pre-cleaning and / or post-cleaning and a main cleaning tank for performing main cleaning with an electrolytic cleaning means are provided, and the cleaning tank for pre-cleaning and / or post-cleaning is defined in claim 1 or claim 2. A mold cleaning apparatus, wherein the main cleaning liquid according to any one of claims 3 to 10 is supplied to the main cleaning tank. 前記前洗浄槽には、洗浄時に前洗浄槽の上面開口を密閉する蓋を設けていると共に、該蓋で密閉した状態で前記前洗浄槽を加熱する手段を設けている請求項20に記載の金型洗浄装置。   The said pre-cleaning tank is provided with the lid | cover which seals the upper surface opening of a pre-cleaning tank at the time of washing | cleaning, and the means to heat the said pre-cleaning tank in the state sealed with this lid | cover is provided. Mold cleaning equipment. 少なくとも電解洗浄手段と超音波洗浄手段を備えた本洗浄槽において洗浄される金型が、ニッケルメッキ金型、ニッケル合金メッキ金型、ニッケル板表面貼付金型、ニッケル合金板表面貼付金型あるいはニッケルで形成された金型からなるニッケル金型であり、
前記本洗浄槽には請求項3乃至請求項10のいずれか1項に記載の本洗浄液を供給していることを特徴とする金型洗浄装置。
The mold to be cleaned in this cleaning tank having at least electrolytic cleaning means and ultrasonic cleaning means is a nickel plating mold, a nickel alloy plating mold, a nickel plate surface application mold, a nickel alloy plate surface application mold or nickel. A nickel mold consisting of a mold formed of
A mold cleaning apparatus, wherein the main cleaning liquid according to any one of claims 3 to 10 is supplied to the main cleaning tank.
前記ニッケル金型は、フラットパネルディスプレイの導光板の射出成型用金型、レンズの射出成型用の金型、車両用リフレクタの射出成型用の金型である請求項22に記載の金型洗浄装置。   The mold cleaning apparatus according to claim 22, wherein the nickel mold is a mold for injection molding of a light guide plate of a flat panel display, a mold for injection molding of a lens, or a mold for injection molding of a vehicle reflector. . 前記本洗浄槽の電解洗浄用として用いるプラス極側の電極は、プラチナ(白金)、パラジウム、ロジウム、イリジウム、ルテニウム、オスミウム、金、銀の貴金属、あるいはこれら貴金属の合金のうちの1種または複数種の金属、あるいは前記金属でメッキされたものからなる請求項22または請求項23に記載の金型洗浄装置。   The electrode on the positive electrode side used for electrolytic cleaning of the main cleaning tank is one or more of platinum (platinum), palladium, rhodium, iridium, ruthenium, osmium, gold, silver noble metals, or alloys of these noble metals. The mold cleaning apparatus according to claim 22 or 23, which is made of a seed metal or a metal plated with the metal. 前記プラス極側の電極は、チタンに前記金属がメッキされたものからなる請求項24に記載の金型洗浄装置。   The mold cleaning apparatus according to claim 24, wherein the positive electrode is made of titanium plated with the metal. 前記本洗浄槽の電解洗浄用の電極に印加する電圧を2〜5Vの範囲としている請求項22乃至請求項25のいずれか1項に記載の金型洗浄装置。   The mold cleaning apparatus according to any one of claims 22 to 25, wherein a voltage applied to an electrode for electrolytic cleaning in the main cleaning tank is in a range of 2 to 5V.
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