JP2005344203A - Method and device for producing thin film-deposited body - Google Patents

Method and device for producing thin film-deposited body Download PDF

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JP2005344203A
JP2005344203A JP2004168913A JP2004168913A JP2005344203A JP 2005344203 A JP2005344203 A JP 2005344203A JP 2004168913 A JP2004168913 A JP 2004168913A JP 2004168913 A JP2004168913 A JP 2004168913A JP 2005344203 A JP2005344203 A JP 2005344203A
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masking member
substrate
film
glass substrate
thin film
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Masaaki Kadomi
昌明 角見
Yoshimasa Yamaguchi
義正 山口
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Nippon Electric Glass Co Ltd
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Nippon Electric Glass Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To extremely facilitate the attaching-detaching operation of a masking member to the surface of a substrate, and to deposit a metallic film with a correct shape on the surface of the substrate without being influenced by thermal expansion or the like. <P>SOLUTION: In the method for producing a thin film-deposited body comprising a step where a thin film is deposited on the surface of a glass substrate 3, a magnet(s) 4 is arranged on the back side of the glass substrate 3, further, a masking member 2 composed of a magnetic substance is arranged on the surface side of the glass substrate 3, and, in a state wherein the masking member 2 is abutted against the surface of the glass substrate 3 by the magnetic force of the magnet(s) 4, a metallic film 9 is deposited on the surface of the glass substrate 3. Preferably, in a step prior to the deposition of the metallic film 9 on the surface of the glass substrate 3 using the masking member 2, an antireflection film 5 is deposited at least on the surface of the glass substrate 3. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、薄膜形成体の製造方法及びその装置に係り、特に、薄膜のうち金属膜の形成に使用するマスキング部材を適切に保持するための技術に関する。   The present invention relates to a method for manufacturing a thin film formed body and an apparatus therefor, and more particularly to a technique for appropriately holding a masking member used for forming a metal film in a thin film.

例えば、光通信或いは光学系システム等に使用される光半導体モジュール等の光素子部品は、パッケージ等からなる包囲体の内部に、半導体レーザダイオードやフォトダイオードなどの光素子を収納してなる。この光素子は、包囲体の壁部を介して外部との間で光信号を送受信する必要があるため、その包囲体の壁部には、光透過用孔が形成されると共に、この光透過用孔は、その内側と外側との間で光信号のやり取りを可能とする窓ガラスを備えた光素子用窓部品によって覆われる。この場合、包囲体は、光素子部品の高信頼性や高耐久性を確保することを目的として、その内部空間が密封状態(例えば真空状態)とされる。   For example, an optical element component such as an optical semiconductor module used for optical communication or an optical system system includes an optical element such as a semiconductor laser diode or a photodiode inside an enclosure made of a package or the like. Since this optical element needs to transmit and receive optical signals to and from the outside through the wall portion of the enclosure, a hole for light transmission is formed in the wall portion of the enclosure, and this light transmission The hole is covered with a window element for an optical element having a window glass that enables an optical signal to be exchanged between the inside and the outside. In this case, the inner space of the enclosure is sealed (for example, in a vacuum state) for the purpose of ensuring high reliability and high durability of the optical element component.

従って、上記の光素子用窓部品は、包囲体の壁部に形成された光透過用孔を気密状態に封止できることが要求される。このような要請に応じるべく、下記の特許文献1、2には、窓ガラス板の中央部を円形の光透過用の窓部とし且つその周囲に金属膜を形成してなる光素子用窓部品を、包囲体の壁部における光透過用孔の周縁に半田を介して接着する技術が開示されている。詳述すると、この光素子用窓部品は、窓ガラス板の表面の中央部周囲に形成した金属膜と、パッケージ等の包囲体の光透過用孔周縁における金属製の当接面とを、金属半田を使用して気密状態に接着することにより、光透過用孔を塞ぐように構成されている。   Therefore, the above-described optical element window part is required to be able to seal the light transmitting hole formed in the wall portion of the enclosure in an airtight state. In order to meet such a demand, the following Patent Documents 1 and 2 disclose that a window part for an optical element in which a central part of a window glass plate is a circular light transmitting window part and a metal film is formed around the window part. Has been disclosed in which a solder is attached to the periphery of a light transmitting hole in the wall portion of the enclosure. More specifically, this optical element window component includes a metal film formed around the center of the surface of the window glass plate and a metal contact surface at the periphery of the light transmitting hole of an enclosure such as a package. The light transmission hole is closed by bonding in an airtight state using solder.

尚、上記の金属膜は、窓ガラス板側から順に、窓ガラス板との付着性に優れたクロム膜やチタン膜からなる第1の膜と、金属半田成分の拡散を防止するためのパラジウム膜または白金膜もしくはニッケル膜からなる第2の膜と、金属半田との接着性に優れた金膜からなる第3の膜とによって構成される。   The metal film includes, in order from the window glass plate side, a first film made of a chromium film or a titanium film having excellent adhesion to the window glass plate, and a palladium film for preventing diffusion of metal solder components. Alternatively, the second film is made of a platinum film or a nickel film, and the third film is made of a gold film having excellent adhesion to metal solder.

特許第2993472号公報Japanese Patent No. 2993472 特開平10−112568号公報Japanese Patent Laid-Open No. 10-112568

ところで、上記の光素子用窓部品を製造する工程の中には、ガラスからなる基板の表面に、マスキング部材を着脱自在に固定し、スパッタ法や真空蒸着法によりガラス基板の表面に金属膜を形成する成膜工程が存在する。この成膜工程においては、多数の光素子用窓部品を一枚の大板からなるガラス基板に一挙に作り込むことが効率面で有利であることから、個々の光素子用窓部品に対応する所定形状の金属膜を多数箇所に形成することが行なわれている。このため、マスキング部材は、多数の枠材等が複雑に且つ狭ピッチで配列された状態になるものの、その大きさは、100mm×100mm程度と小型である。   By the way, in the process of manufacturing the above-mentioned optical element window part, a masking member is detachably fixed to the surface of the substrate made of glass, and a metal film is formed on the surface of the glass substrate by sputtering or vacuum evaporation. There is a film forming process to be formed. In this film forming process, it is advantageous in terms of efficiency to make a large number of optical element window parts on a glass substrate made of a single large plate. A metal film having a predetermined shape is formed in many places. For this reason, the masking member is in a state where a large number of frame members and the like are arranged in a complicated and narrow pitch, but the size thereof is as small as about 100 mm × 100 mm.

そして、このマスキング部材は、成膜時に高温雰囲気中に曝されることから、熱膨張等によって延びや変形或いは撓みが生じ、ガラス基板の表面(下面)から離反するおそれがあり、このような事態が生じた場合には、マスキング部材による適切なマスク効果を得ることができなくなり、ガラス基板の表面に所望形状の金属膜を正確に形成することが困難となる。   Since this masking member is exposed to a high temperature atmosphere at the time of film formation, the masking member may be extended, deformed or bent due to thermal expansion or the like, and may be separated from the surface (lower surface) of the glass substrate. When this occurs, it becomes impossible to obtain an appropriate mask effect by the masking member, and it becomes difficult to accurately form a metal film having a desired shape on the surface of the glass substrate.

このため、マスキング部材は、熱膨張等が生じた場合であっても、ガラス基板の表面全域に確実に当接保持されている必要があるが、その4角部をネジ等の止着部材を用いてガラス基板に対して固定したり或いは粘着テープ等を用いて固定する従来の手法では、上記のような要請に応じることが極めて困難となる。   For this reason, the masking member needs to be securely held in contact with the entire surface of the glass substrate even when thermal expansion or the like occurs. It is very difficult to meet the above requirements with the conventional method of using and fixing to a glass substrate using an adhesive tape or the like.

しかも、既述のようにマスキング部材が小型である場合には、上述の止着部材や粘着テープによる固定作業が極めて面倒且つ煩雑になり、作業性の悪化を招くばかりでなく、止着用または粘着用の領域を、小型のマスキング部材やガラス基板に設ける必要性が生じ、マスキング部材が相対的に大型である場合と比較すれば、スペース面での問題が深刻となる。したがって、熱膨張等の影響を受けることなく、小型のマスキング部材をガラス基板の表面に確実に当接保持させて、適切なマスク効果を得るようにするには、どのような対策を講じれば良いかが問題となる。   In addition, when the masking member is small as described above, the fixing work using the above-described fastening member and the adhesive tape becomes extremely troublesome and complicated, not only causing deterioration in workability but also wearing or sticking. Therefore, it is necessary to provide a region for a small masking member or a glass substrate, and the space problem becomes serious as compared with the case where the masking member is relatively large. Therefore, what measures should be taken to ensure that a small masking member is securely abutted and held on the surface of the glass substrate without being affected by thermal expansion or the like and to obtain an appropriate mask effect. Is a problem.

本発明は、上記事情に鑑みてなされたものであり、基板の表面に対するマスキング部材の着脱作業を極めて容易化すると共に、熱膨張等の影響を受けることなく正確な形状の金属膜を基板の表面に形成できるようにすることを技術的課題とする。   The present invention has been made in view of the above circumstances, and makes it extremely easy to attach and detach the masking member to the surface of the substrate, and an accurate-shaped metal film is formed on the surface of the substrate without being affected by thermal expansion or the like. It is a technical problem to make it possible to form a thin film.

上記技術的課題を解決するためになされた本発明に係る方法は、マスキング部材を用いて基板の表面に薄膜を形成する工程を含む薄膜形成体の製造方法において、上記基板の裏面側に磁石を配設すると共に、上記基板の表面側に磁性体からなるマスキング部材を配設し、上記磁石の磁力により上記マスキング部材を上記基板の表面に当接させた状態で、上記基板の表面に金属膜を形成することを特徴とするものである。この場合、基板としては、ガラス、セラミック、ガラスセラミック等からなるものを挙げることができる。   The method according to the present invention, which has been made to solve the above technical problem, includes a step of forming a thin film on the surface of a substrate using a masking member. A masking member made of a magnetic material is disposed on the surface side of the substrate, and a metal film is formed on the surface of the substrate in a state where the masking member is brought into contact with the surface of the substrate by the magnetic force of the magnet. It is characterized by forming. In this case, examples of the substrate include those made of glass, ceramic, glass ceramic and the like.

このような構成によれば、基板の裏面側に配設された磁石の磁力によって、マスキング部材が基板の表面に当接保持されることから、基板の表面に対するマスキング部材の着脱作業が極めて容易になり、作業性の向上が図られる。しかも、マスキング部材に熱膨張等が生じた場合であっても、磁石の磁力により的確にマスキング部材を基板の表面に当接させた状態を維持できることになり、これによりマスキング部材が熱膨張等に起因して基板の表面から離反し、正確な形状の金属膜を形成できなくなるという不具合が効果的に回避される。しかも、マスキング部材が小型であっても、その当接保持のための領域が別途必要とはならず、スペース面での無駄を招くこともない。尚、磁石は、電磁石であってもよいが、永久磁石であることが好ましい。また、磁石の個数は、マスキング部材の大きさに対応するものが1個であってもよく、或いはマスキング部材の大きさに対応するように複数個配列させてもよい。   According to such a configuration, the masking member is held in contact with the surface of the substrate by the magnetic force of the magnet disposed on the back side of the substrate, so that the masking member can be attached to and detached from the surface of the substrate very easily. Thus, workability is improved. In addition, even when thermal expansion or the like occurs in the masking member, it is possible to maintain the state in which the masking member is in contact with the surface of the substrate accurately by the magnetic force of the magnet. As a result, it is possible to effectively avoid the problem that the metal film having a precise shape cannot be formed due to separation from the surface of the substrate. Moreover, even if the masking member is small, a separate area for holding and holding the masking member is not required, and space is not wasted. The magnet may be an electromagnet, but is preferably a permanent magnet. The number of magnets may be one corresponding to the size of the masking member, or a plurality of magnets may be arranged so as to correspond to the size of the masking member.

上記の構成において、基板をガラス基板とすると共に、マスキング部材を使用してガラス基板の表面に金属膜を形成する前工程で、ガラス基板の少なくとも表面に反射防止膜を形成するようにしてもよい。   In the above configuration, the substrate may be a glass substrate, and an antireflection film may be formed on at least the surface of the glass substrate in a previous step of forming a metal film on the surface of the glass substrate using a masking member. .

このようにすれば、マスキング部材を使用してガラス基板の表面に金属膜を形成し終えた時点で、そのガラス基板における金属膜の非形成部位に反射防止膜が形成されていることになるため、その金属膜の非形成部位が光の反射防止効果を有効に奏することになり、光学的特性に優れたガラス物品を得ることが可能となる。   In this way, when the metal film is formed on the surface of the glass substrate using the masking member, an antireflection film is formed on the non-formation portion of the metal film on the glass substrate. And the non-formation site | part of the metal film will show | play the antireflection effect of light effectively, and it becomes possible to obtain the glass article excellent in the optical characteristic.

上記技術的課題を解決するためになされた本発明に係る装置は、マスキング部材を用いて基板の表面に薄膜を形成するように構成した薄膜形成体の製造装置において、金属膜形成用のマスキング部材を磁性体で形成すると共に、上記マスキング部材を基板の表面側に配設し、且つ、上記基板の裏面側に磁石を配設したことを特徴とするものである。この場合にも、基板としては、ガラス、セラミック、ガラスセラミック等からなるものを挙げることができる。   An apparatus according to the present invention made to solve the above technical problem is a masking member for forming a metal film in an apparatus for manufacturing a thin film forming body configured to form a thin film on the surface of a substrate using a masking member. The masking member is disposed on the front surface side of the substrate, and the magnet is disposed on the back surface side of the substrate. Also in this case, examples of the substrate include those made of glass, ceramic, glass ceramic and the like.

このような構成によっても、基板の裏面側に配設された磁石の磁力によって、マスキング部材が基板の表面に当接保持され、基板の表面に対するマスキング部材の着脱作業が極めて容易になると共に、マスキング部材に熱膨張等が生じた場合であっても、磁石の磁力により的確にマスキング部材を基板の表面に当接させた状態を維持できることになり、正確な形状の金属膜を形成できなくなるという不具合が効果的に回避され、更にはマスキング部材が小型であっても、その当接保持のための無駄なスペースが不要となる。尚、この場合にも、磁石は、電磁石であってもよいが、永久磁石であることが好ましく、また磁石の個数は、マスキング部材の大きさに対応するものが1個であってもよく、或いはマスキング部材の大きさに対応するように複数個配列させてもよい。   Even with such a configuration, the masking member is held in contact with the surface of the substrate by the magnetic force of the magnet disposed on the back side of the substrate, and the masking member can be attached to and detached from the surface of the substrate very easily. Even when thermal expansion or the like occurs in the member, the state in which the masking member is accurately brought into contact with the surface of the substrate by the magnetic force of the magnet can be maintained, and a metal film with an accurate shape cannot be formed. Is effectively avoided, and even if the masking member is small in size, a useless space for holding the contact is not required. In this case as well, the magnet may be an electromagnet, but is preferably a permanent magnet, and the number of magnets may be one corresponding to the size of the masking member, Alternatively, a plurality may be arranged so as to correspond to the size of the masking member.

上記の製造装置において、基板は、少なくとも表面に反射防止膜が形成されたガラス基板であることが好ましい。   In the above manufacturing apparatus, the substrate is preferably a glass substrate having an antireflection film formed on at least the surface.

このようにした場合にも、マスキング部材を使用してガラス基板の表面に金属膜を形成して得られるものは、そのガラス基板における金属膜の非形成部位に反射防止膜が形成されたものになるため、その金属膜の非形成部位が光の反射防止効果を有効に奏することになり、光学的特性に優れたガラス物品を得ることが可能となる。   Even if it does in this way, what is obtained by forming a metal film on the surface of a glass substrate using a masking member is obtained by forming an antireflection film on the non-formation part of the metal film on the glass substrate. Therefore, the non-formed portion of the metal film effectively exhibits the light reflection preventing effect, and a glass article having excellent optical characteristics can be obtained.

以上のように本発明に係る薄膜形成体の製造方法及びその装置によれば、基板の裏面側に配設された磁石の磁力によって、マスキング部材が基板の表面に当接保持され、基板の表面に対するマスキング部材の着脱作業が極めて容易になると共に、マスキング部材に熱膨張等が生じた場合であっても、磁石の磁力により的確にマスキング部材を基板の表面に当接させた状態を維持できることになり、正確な形状の金属膜を形成できなくなるという不具合が効果的に回避され、更にはマスキング部材が小型であっても、その当接保持のための無駄なスペースが不要になるという利点を享受できる。   As described above, according to the method and apparatus for manufacturing a thin film formed body according to the present invention, the masking member is held in contact with the surface of the substrate by the magnetic force of the magnet disposed on the back side of the substrate, and the surface of the substrate The masking member can be easily attached and detached with respect to the substrate, and even when the masking member is thermally expanded, the state in which the masking member is accurately brought into contact with the surface of the substrate by the magnetic force of the magnet can be maintained. Therefore, it is possible to effectively avoid the problem that a metal film having an accurate shape cannot be formed, and even when the masking member is small, there is an advantage that a useless space for holding the contact is not required. it can.

以下、本発明の実施形態を添付図面を参照して説明する。   Embodiments of the present invention will be described below with reference to the accompanying drawings.

図1は、本発明の実施形態に係る薄膜形成体(光素子用窓部品)の製造装置1を概略的に示す縦断正面図である。同図に示すように、この製造装置1は、金属膜形成用の磁性体からなるマスキング部材2と、ガラス基板3の裏面側に配設された磁石4とを有し、この磁石4の磁力によってマスキング部材2をガラス基板3の表面(下面)に当接保持させるように構成したものである。この場合、磁石4は、マスキング部材2の大きさに対応する1個、またはマスキング部材2の大きさに対応するように配列された複数個からなり、この実施形態では、ガラス基板3の裏面に当接保持されている。   FIG. 1 is a longitudinal front view schematically showing a manufacturing apparatus 1 for a thin film forming body (optical element window part) according to an embodiment of the present invention. As shown in the figure, the manufacturing apparatus 1 includes a masking member 2 made of a magnetic material for forming a metal film, and a magnet 4 disposed on the back side of the glass substrate 3. Thus, the masking member 2 is configured to abut on and hold the surface (lower surface) of the glass substrate 3. In this case, the magnet 4 is composed of one piece corresponding to the size of the masking member 2 or a plurality of pieces arranged so as to correspond to the size of the masking member 2. In this embodiment, the magnet 4 is formed on the back surface of the glass substrate 3. It is held in contact.

ガラス基板3の表裏両面(表面のみでもよい)の全域には、反射防止膜5が形成されている。この反射防止膜5は、ガラス基板3の表裏両面にそれぞれ直接成膜されたタンタル酸化物膜(Ta25)またはニオブ酸化物膜(Nb25)と、このタンタル酸化物膜上またはニオブ酸化物膜上に成膜されたシリカ膜(SiO2)とから構成されている。そして、必要ならば、シリカ膜上に更にタンタル酸化物膜またはニオブ酸化物膜を成膜し且つその上にシリカ膜を形成するようにしてもよい。 An antireflection film 5 is formed on the entire front and back surfaces (or only the front surface) of the glass substrate 3. The antireflection film 5 includes a tantalum oxide film (Ta 2 O 5 ) or a niobium oxide film (Nb 2 O 5 ) directly formed on both the front and back surfaces of the glass substrate 3 and the tantalum oxide film or And a silica film (SiO 2 ) formed on the niobium oxide film. If necessary, a tantalum oxide film or a niobium oxide film may be further formed on the silica film, and a silica film may be formed thereon.

図2は、マスキング部材2の一部を示す平面図、図3は、その要部拡大図である。これらの図に示すように、マスキング部材2は、縦方向に直線上に延びる複数本の縦枠材2aと、これらに直交する横方向に直線上に延びる複数本の横枠材2bとが交差連結されることにより、複数箇所に正方形状枠部2xが形成されている。更に、このマスキング部材2は、縦枠材2a及び横枠材2bに45°の傾斜角度をもって相反する2方向に延びる第1傾斜枠材2cと第2傾斜枠材2dとが交差連結され、且つこれらの傾斜枠材2c、2dが上記正方形状枠部2xの4角部周辺と交差連結されることにより、複数箇所に正八角形状枠部2yが形成されている。そして、これらの正八角形状枠部2yの内側に、それぞれ全周に所定の間隙を介在させた状態で円形の覆設体2eが配設され、この覆設体2eの外周部と、正八角形状枠部2yの各角部との間が、相互に離隔し且つ放射状に延びる複数本の連結体2fによって連結されている。   FIG. 2 is a plan view showing a part of the masking member 2, and FIG. 3 is an enlarged view of a main part thereof. As shown in these drawings, the masking member 2 includes a plurality of vertical frame members 2a extending linearly in the vertical direction and a plurality of horizontal frame members 2b extending linearly in the horizontal direction perpendicular thereto. By being connected, square frame portions 2x are formed at a plurality of locations. Further, the masking member 2 includes a first inclined frame member 2c and a second inclined frame member 2d extending in two opposite directions with an inclination angle of 45 ° to the vertical frame member 2a and the horizontal frame member 2b. These inclined frame members 2c, 2d are cross-connected to the periphery of the four corners of the square frame portion 2x, thereby forming regular octagonal frame portions 2y at a plurality of locations. In addition, a circular covering body 2e is disposed inside each of the regular octagonal frame portions 2y with a predetermined gap interposed on the entire circumference, and the outer periphery of the covering body 2e and the regular octagon The corners of the shape frame 2y are connected by a plurality of connecting bodies 2f that are spaced apart from each other and extend radially.

この場合、図1に示すように、マスキング部材2を一枚のガラス基板3の表面に磁石4の磁力によりセット(着脱自在に固定)した状態の下では、上記正八角形状枠部2yを構成する枠材を含む全ての枠材2a〜2dと、全ての円形の覆設体2eとが、ガラス基板3の表面に当接する当接マスク部となるのに対して、全ての連結体2fつまり全ての連結マスク部と、ガラス基板3の表面との間には、隙間6が形成される。この隙間6は、その高さ方向寸法t1が、連結体2fの厚みの2倍以上とされている。詳述すると、このマスキング部材2は、全ての枠材2a〜2dの表面と、全ての覆設体2eの表面と、全ての連結体2fの表面とが、同一平面となるように形成された上で、連結体2fの厚みのみが、他の部位の共通した厚みt2の1/2未満(好ましくは1/3未満)となるように形成されている。そして、このマスキング部材2は、ステンレス鋼(例えばSUS430)で形成され、その大きさは、縦方向が50mm〜150mmで且つ横方向が50mm〜150mmとされている。また、上記の厚みt2つまりマスキング部材2の厚みは、0.1mm〜2.0mm、好ましくは0.1mm〜1.0mm、この実施形態では0.25mmとされている。   In this case, as shown in FIG. 1, when the masking member 2 is set (removably fixed) by the magnetic force of the magnet 4 on the surface of one glass substrate 3, the regular octagonal frame portion 2y is formed. All the frame members 2a to 2d including the frame member to be performed and all the circular covering bodies 2e serve as contact mask portions that contact the surface of the glass substrate 3, whereas all the connected members 2f, A gap 6 is formed between all the connection mask portions and the surface of the glass substrate 3. The gap 6 has a height direction dimension t1 that is at least twice the thickness of the coupling body 2f. More specifically, the masking member 2 is formed so that the surfaces of all the frame members 2a to 2d, the surfaces of all the covering bodies 2e, and the surfaces of all the connecting bodies 2f are in the same plane. Above, only the thickness of the connection body 2f is formed to be less than 1/2 (preferably less than 1/3) of the thickness t2 common to other parts. And this masking member 2 is formed with stainless steel (for example, SUS430), and the magnitude | size is 50 mm-150 mm in the vertical direction, and is 50 mm-150 mm in the horizontal direction. The thickness t2, that is, the thickness of the masking member 2, is 0.1 mm to 2.0 mm, preferably 0.1 mm to 1.0 mm, and in this embodiment is 0.25 mm.

このような構成のマスキング部材2をガラス基板3の表面に磁石4の磁力によりセットして、スパッタ法または真空蒸着法により成膜を行なう場合には、材料粒子は、各枠材2a〜2d、覆設体2e、及び連結体2fの相互間の間隙を通過することにより、ガラス基板3の表面(この時点では、ガラス基板3の表裏両面に、スパッタ法または真空蒸着法により既述の反射防止膜5が形成されている)に達する。その場合に、マスキング部材2の正八角形状枠部2yと円形の覆設体2eとの間の間隙には、複数本の連結体2fが配設されているため、各連結体2fの両側部近傍を通過した材料粒子は、各連結体2fの裏側の隙間6に回り込んでガラス基板3の表面に達するのに対して、各連結体2fの相互間における周方向中央部の周辺を通過した材料粒子は、直進してガラス基板3の表面に達する。従って、マスキング部材2の正八角形状枠部2yと覆設体2eとの間の間隙に対応するガラス基板3の表面部分には、材料粒子が直進して到達する部位と、材料粒子が回り込んで到達する部位とが存在することになる。   When the masking member 2 having such a structure is set on the surface of the glass substrate 3 by the magnetic force of the magnet 4 and film formation is performed by a sputtering method or a vacuum evaporation method, the material particles are the frame materials 2a to 2d, By passing through the gap between the covering body 2e and the connecting body 2f, the surface of the glass substrate 3 (at this time, both the front and back surfaces of the glass substrate 3 are sputtered or vacuum-deposited to prevent reflection as described above. Film 5 is formed). In that case, since a plurality of connecting bodies 2f are disposed in the gap between the regular octagonal frame portion 2y of the masking member 2 and the circular covering body 2e, both side portions of each connecting body 2f are arranged. The material particles that have passed through the vicinity pass around the gap 6 on the back side of each connecting body 2f and reach the surface of the glass substrate 3, while passing through the periphery of the central portion in the circumferential direction between the connecting bodies 2f. The material particles go straight and reach the surface of the glass substrate 3. Therefore, the portion where the material particles go straight and reach the surface portion of the glass substrate 3 corresponding to the gap between the regular octagonal frame portion 2y of the masking member 2 and the covering body 2e. There will be a part that can be reached by.

このようにして成膜工程が実行されることにより、図4に示すように、ガラス基板3には、縦横に規則的に複数の正八角形状の単位薄膜形成部7が形成される。詳述すると、各単位薄膜形成部7は、ガラス基板3におけるマスキング部材2の正八角形状枠部2yの内側領域に対応する部位に、覆設体2eの形状に対応する円形の窓部8を中央部に有し且つその周囲の表面に金属膜9(同図に狭ピッチの平行斜線を付した部位)が形成されることにより構成されている。このような単位薄膜形成部7を複数有する一枚のガラス基板3は、45°ずつ相違する4方向に沿って、具体的には、複数箇所で矢印a方向に一挙に、複数箇所で矢印b方向に一挙に、複数箇所で矢印c方向に一挙に、複数箇所で矢印d方向に一挙に、それぞれ切断加工される。これにより、計4回の切断加工を行なうだけで、多数の光素子用窓部品10が製作される。   By performing the film forming step in this manner, as shown in FIG. 4, a plurality of regular octagonal unit thin film forming portions 7 are formed regularly and vertically on the glass substrate 3. More specifically, each unit thin film forming portion 7 has a circular window portion 8 corresponding to the shape of the covering body 2e at a portion corresponding to the inner region of the regular octagonal frame portion 2y of the masking member 2 in the glass substrate 3. A metal film 9 (a portion with a narrow-pitch parallel diagonal line in the figure) is formed on the surface around the central portion. One glass substrate 3 having a plurality of such unit thin film forming portions 7 is arranged in four directions that are different by 45 °, specifically, at a plurality of places in the direction of arrow a, and at a plurality of places, arrows b. Cutting is performed in one direction at a time, at a plurality of locations in the direction of the arrow c, and at a plurality of locations in a direction of the arrow d. As a result, a large number of optical element window parts 10 can be manufactured by performing a total of four cutting operations.

この光素子用窓部品10は、図5及び図6に示すように、外輪郭形状が正八角形の板状体からなる窓ガラス11を有し、この窓ガラス11の中央部には、円形をなす光透過用の窓部8が形成されると共に、この窓部8の周囲における表面側には、複数層の金属膜9が形成されている。そして、この金属膜9の表面には、周方向に等間隔で且つ放射状に延びる複数本の溝状の凹部12が形成されている。図7に示すように、これらの凹部12の底面12xは、凹部12を横切る方向においてそれぞれ湾曲し、且つこれらの底面12xから表面9xにそれぞれ連なる部位9yも、凹部12を横切る方向において湾曲しており、従ってこれらの凹部12の底面12xから表面9xに至る部位は、屈曲部を有することなく滑らかに連続している。このような形状の凹部12が形成される理由は、既述のマスキング部材2において、各連結体2fの存在により材料粒子が回り込んでガラス基板3の表面に到達する部位の方が、直進して到達する部位よりも材料粒子の到達量が相対的に少なくなることに由来する。そして、これに伴なって、各連結体2f及びその両側部近傍に対応するガラス基板3の表面の部位に、上記のような凹部12を有する金属膜9が形成されることになる。   As shown in FIGS. 5 and 6, the optical element window part 10 has a window glass 11 made of a plate-like body having an outer contour shape of a regular octagon, and a circular shape is formed at the center of the window glass 11. A light transmitting window 8 is formed, and a plurality of layers of metal films 9 are formed on the surface side around the window 8. On the surface of the metal film 9, a plurality of groove-like recesses 12 extending radially at equal intervals in the circumferential direction are formed. As shown in FIG. 7, the bottom surfaces 12 x of these recesses 12 are curved in the direction crossing the recesses 12, and the portions 9 y connected from the bottom surface 12 x to the surface 9 x are also curved in the direction crossing the recesses 12. Therefore, the portion from the bottom surface 12x to the surface 9x of these recesses 12 is smoothly continuous without having a bent portion. The reason why the concave portion 12 having such a shape is formed is that the portion of the masking member 2 described above where the material particles wrap around due to the presence of each connecting body 2f and reach the surface of the glass substrate 3 goes straight ahead. This is because the arrival amount of the material particles is relatively smaller than the reaching portion. Along with this, the metal film 9 having the concave portions 12 as described above is formed on the surface portions of the glass substrate 3 corresponding to the respective connected bodies 2f and the vicinity of both side portions thereof.

この場合、図5に示すように、窓ガラス11の外輪郭に外接する外接円の直径をL1とし、円形をなす窓部8の直径をL2とした場合に、この両者の比率L2/L1は、0.1〜0.9、好ましくは0.3〜0.8とされている。尚、この実施形態では、上記外接円の直径L1が、2.0〜3.5mm程度とされ、窓部8の直径L2が、0.6〜2.8mm程度とされている。また、上記の金属膜9は、図6及び図7に示すように、光透過性を有する円形の窓部8の周囲において、反射防止膜5(シリカ膜)上に形成されたクロム膜(またはチタン膜)からなる第1の膜9aと、この第1の膜9a上に形成されたパラジウム膜(または白金膜もしくはニッケル膜)からなる第2の膜9bと、この第2の膜9b上に形成された金膜からなる第3の膜9cとを有している。この場合、第1の膜9aは、窓ガラス11との付着性に優れると共に、第2の膜9bは、半田成分の拡散防止の役目を果たし、また第3の膜9cは、半田との付着性に優れている。そして、上記の反射防止膜5は、表面が凹部を有しない平面状の膜であるのに対して、第1、第2及び第3の膜9a、9b、9cは、それぞれ周方向に等間隔で且つ放射状に延びる複数本の凹部を有していることから、金属膜9の表面には、既に述べたように、複数本の凹部12が形成されている。 In this case, as shown in FIG. 5, when the diameter of the circumscribed circle circumscribing the outer contour of the window glass 11 is L 1 and the diameter of the circular window portion 8 is L 2 , the ratio L 2 between the two is shown. / L 1 is 0.1 to 0.9, preferably 0.3 to 0.8. In this embodiment, the circumscribed circle has a diameter L 1 of about 2.0 to 3.5 mm, and the window portion 8 has a diameter L 2 of about 0.6 to 2.8 mm. Further, as shown in FIGS. 6 and 7, the metal film 9 is a chromium film (or a film formed on the antireflection film 5 (silica film) around the circular window portion 8 having light transmittance. A first film 9a made of a titanium film), a second film 9b made of a palladium film (or a platinum film or a nickel film) formed on the first film 9a, and on the second film 9b. And a third film 9c made of a formed gold film. In this case, the first film 9a has excellent adhesion to the window glass 11, the second film 9b serves to prevent diffusion of solder components, and the third film 9c adheres to solder. Excellent in properties. The antireflection film 5 is a planar film having no concave portion on the surface, whereas the first, second, and third films 9a, 9b, and 9c are equally spaced in the circumferential direction. In addition, since there are a plurality of recesses extending radially, a plurality of recesses 12 are formed on the surface of the metal film 9 as described above.

更に、図7に示すように、金属膜9の面方向における端縁部9wの表面は、終端側に移行するに連れて窓ガラス11の表面に漸次近づき且つその終端で窓ガラス11の表面(反射防止膜5)に至っている。また、金属膜9の端縁部9wにおいては、第1の膜9aが第2の膜9bにより全域または略全域が覆われ且つ第2の膜9bが第3の膜9cにより全域または略全域が覆われている。したがって、半田との接着性の低い第1、第2の膜9a、9bは、露出していない状態または殆ど露出していない状態となっている。このような形態の端縁部9wが形成される理由は、マスキング部材2を使用してスパッタ法または真空蒸着法により金属膜9を形成することに由来する。尚、金属膜9の膜厚(端縁部9wを除く領域の膜厚)は、反射防止膜5が0.5μm程度、第1の膜9aが0.1μm程度、第2の膜9bが0.7μm程度、第3の膜9cが0.3μm程度とされている。   Furthermore, as shown in FIG. 7, the surface of the edge portion 9w in the surface direction of the metal film 9 gradually approaches the surface of the window glass 11 as it moves to the terminal side, and the surface of the window glass 11 ( It reaches the antireflection film 5). Further, at the edge portion 9w of the metal film 9, the first film 9a is entirely or substantially entirely covered by the second film 9b, and the second film 9b is entirely or substantially entirely covered by the third film 9c. Covered. Therefore, the first and second films 9a and 9b having low adhesiveness to the solder are not exposed or hardly exposed. The reason why the edge portion 9w having such a form is formed is that the metal film 9 is formed by the sputtering method or the vacuum deposition method using the masking member 2. The thickness of the metal film 9 (the thickness of the region excluding the edge portion 9w) is about 0.5 μm for the antireflection film 5, about 0.1 μm for the first film 9a, and 0 for the second film 9b. The third film 9c has a thickness of about 0.3 μm.

図8は、上記の光素子用窓部品10が装着されてなる半導体レーザーダイオードモジュール(光素子部品)13の概略構成を示す縦断側面図である。同図に示すように、この光素子部品13は、レーザーチップ(光素子)14を収納するパッケージからなる包囲体15を備え、その内部空間は真空状態とされている。包囲体15の一壁部15aには、円形の光透過用孔16が形成されると共に、その一壁部15aの内面には、光透過用孔16を塞ぐ光素子用窓部品10が金属半田を用いて気密接着されている。そして、この実施形態では、レーザーチップ14から発せられた光が、包囲体15の内部空間に収納された球状レンズ17、上記の光素子用窓部品10、及び包囲体15の外部の光通路に配設された球状レンズ18を介して、フェルール19内の光ファイバ20に送られる構成とされている。   FIG. 8 is a longitudinal sectional side view showing a schematic configuration of a semiconductor laser diode module (optical element component) 13 to which the above-described optical element window component 10 is mounted. As shown in the figure, the optical element component 13 includes an enclosure 15 made of a package for storing a laser chip (optical element) 14 and its internal space is in a vacuum state. A circular light transmitting hole 16 is formed in one wall portion 15a of the enclosure 15, and an optical element window component 10 that closes the light transmitting hole 16 is formed on the inner surface of the one wall portion 15a with metal solder. Is hermetically bonded. In this embodiment, the light emitted from the laser chip 14 passes through the spherical lens 17 housed in the inner space of the enclosure 15, the optical element window component 10, and the light path outside the enclosure 15. It is configured to be sent to the optical fiber 20 in the ferrule 19 through the arranged spherical lens 18.

そして、この光素子用窓部品10は、図9に示すように、包囲体15の一壁部15aの内面(金属面)における光透過用孔16の周縁部に、金属半田を用いて接着されている(金属半田については図示略)。詳述すると、窓ガラス11の窓部8の周囲に形成されている金属膜9が、包囲体15の一壁部15aの内面に、Au−Sn半田を用いて気密接着され、これにより光透過用孔16が光素子用窓部品10によって完全閉鎖された状態となっている。この場合、金属膜9の表面には、複数本の凹部12が形成されていることから、その表面積が単なる平面よりも広くなっている。従って、包囲体15の一壁部15aに対する金属膜9の接着面積、つまり金属膜9とAu−Sn半田との接着面積が広くなり、その接着強度が高められている。   Then, as shown in FIG. 9, the optical element window component 10 is bonded to the peripheral portion of the light transmitting hole 16 on the inner surface (metal surface) of the one wall portion 15 a of the enclosure 15 using metal solder. (The metal solder is not shown). More specifically, the metal film 9 formed around the window portion 8 of the window glass 11 is hermetically bonded to the inner surface of one wall portion 15a of the enclosure 15 using Au—Sn solder, thereby transmitting light. The hole 16 is completely closed by the optical element window part 10. In this case, since a plurality of recesses 12 are formed on the surface of the metal film 9, the surface area thereof is wider than a simple plane. Therefore, the adhesion area of the metal film 9 to the one wall portion 15a of the enclosure 15, that is, the adhesion area between the metal film 9 and the Au—Sn solder is increased, and the adhesion strength is increased.

尚、上記実施形態では、ガラスからなる基板の表面に金属膜を形成する場合に本発明を適用したが、この基板は、セラミックまたはガラスセラミックであってもよい。   In the above embodiment, the present invention is applied when a metal film is formed on the surface of a substrate made of glass. However, the substrate may be ceramic or glass ceramic.

また、上記実施形態は、半導体レーザーダイオードモジュールに装着される光素子用窓部品10に本発明を適用したが、これ以外の光半導体モジュールその他の光素子部品に使用される薄膜形成体についても、同様に本発明を適用することが可能であるばかりでなく、例えば太陽電池パネルやデフォーカス板等の薄膜形成体についても、同様に本発明を適用することが可能である。   Moreover, although the said embodiment applied this invention to the optical element window component 10 with which a semiconductor laser diode module is mounted | worn, also about the thin film formation body used for optical semiconductor modules other than this and other optical element components, Similarly, the present invention can be applied to the present invention, and the present invention can also be applied to a thin film forming body such as a solar cell panel or a defocus plate.

本発明の実施形態に係る薄膜形成体(光素子用窓部品)の製造装置を示す要部縦断正面図であって、図2のB−B線にしたがって切断した断面図に対応する図である。It is a principal part longitudinal front view which shows the manufacturing apparatus of the thin film formation body (window part for optical elements) which concerns on embodiment of this invention, Comprising: It is a figure corresponding to sectional drawing cut | disconnected according to the BB line of FIG. . 本発明の実施形態に係る薄膜形成体(光素子用窓部品)の製造に使用されるマスキング部材を示す要部概略平面図である。It is a principal part schematic plan view which shows the masking member used for manufacture of the thin film formation body (window part for optical elements) which concerns on embodiment of this invention. 本発明の実施形態に係る薄膜形成体(光素子用窓部品)の製造に使用されるマスキング部材を示す要部拡大平面図である。It is a principal part enlarged plan view which shows the masking member used for manufacture of the thin film formation body (window part for optical elements) which concerns on embodiment of this invention. 本発明の実施形態に係る薄膜形成体(光素子用窓部品)の製造途中の状態を示す要部概略平面図である。It is a principal part schematic plan view which shows the state in the middle of manufacture of the thin film forming body (window part for optical elements) which concerns on embodiment of this invention. 本発明の実施形態に係る製造装置で製作された薄膜形成体(光素子用窓部品)を示す平面図である。It is a top view which shows the thin film formation body (window component for optical elements) manufactured with the manufacturing apparatus which concerns on embodiment of this invention. 本発明の実施形態に係る製造装置で製作された薄膜形成体(光素子用窓部品)を示す縦断面図であって、図5のA−A線にしたがって切断した断面図である。It is a longitudinal cross-sectional view which shows the thin film formation body (window component for optical elements) manufactured with the manufacturing apparatus which concerns on embodiment of this invention, Comprising: It is sectional drawing cut | disconnected according to the AA line of FIG. 本発明の実施形態に係る製造装置で製作された薄膜形成体(光素子用窓部品)を示す要部拡大縦断面図である。It is a principal part expansion longitudinal cross-sectional view which shows the thin film formation body (window component for optical elements) manufactured with the manufacturing apparatus which concerns on embodiment of this invention. 本発明の実施形態に係る製造装置で製作された薄膜形成体(光素子用窓部品)が装着されてなる光素子部品を示す概略縦断面図である。It is a schematic longitudinal cross-sectional view which shows the optical element component by which the thin film formation body (window component for optical elements) manufactured with the manufacturing apparatus which concerns on embodiment of this invention is mounted | worn. 本発明の実施形態に係る製造装置で製作された薄膜形成体(光素子用窓部品)が光素子部品に装着されてなる状態を示す要部拡大概略横断面図である。It is a principal part expansion schematic cross-sectional view which shows the state by which the thin film formation body (window component for optical elements) produced with the manufacturing apparatus which concerns on embodiment of this invention is mounted | worn with an optical element component.

符号の説明Explanation of symbols

1 製造装置
2 マスキング部材
3 基板(ガラス基板)
4 磁石
5 反射防止膜
9 金属膜
10 薄膜形成体(光素子用窓部品)
1 Manufacturing equipment 2 Masking member 3 Substrate (glass substrate)
4 Magnet 5 Antireflection film 9 Metal film 10 Thin film forming body (window component for optical element)

Claims (4)

マスキング部材を用いて基板の表面に薄膜を形成する工程を含む薄膜形成体の製造方法において、上記基板の裏面側に磁石を配設すると共に、上記基板の表面側に磁性体からなるマスキング部材を配設し、上記磁石の磁力により上記マスキング部材を上記基板の表面に当接させた状態で、上記基板の表面に金属膜を形成することを特徴とする薄膜形成体の製造方法。   In the method of manufacturing a thin film forming body including a step of forming a thin film on the surface of the substrate using a masking member, a magnet is disposed on the back side of the substrate, and a masking member made of a magnetic material is provided on the surface side of the substrate. A method for producing a thin film forming body, comprising: forming a metal film on a surface of the substrate in a state where the masking member is in contact with the surface of the substrate by the magnetic force of the magnet. 上記基板をガラス基板とすると共に、上記マスキング部材を使用してガラス基板の表面に金属膜を形成する前工程で、上記ガラス基板の少なくとも表面に反射防止膜を形成することを特徴とする請求項1に記載の薄膜形成体の製造方法。   The substrate is a glass substrate, and an antireflection film is formed on at least the surface of the glass substrate in a previous step of forming a metal film on the surface of the glass substrate using the masking member. A method for producing the thin film-formed body according to 1. マスキング部材を用いて基板の表面に薄膜を形成するように構成した薄膜形成体の製造装置において、金属膜形成用のマスキング部材を磁性体で形成すると共に、上記マスキング部材を基板の表面側に配設し、且つ、上記基板の裏面側に磁石を配設したことを特徴とする薄膜形成体の製造装置。   In an apparatus for manufacturing a thin film forming body configured to form a thin film on the surface of a substrate using a masking member, the masking member for forming a metal film is formed of a magnetic material, and the masking member is disposed on the surface side of the substrate. An apparatus for manufacturing a thin film forming body, characterized in that a magnet is disposed on the back side of the substrate. 上記基板は、少なくとも表面に反射防止膜が形成されたガラス基板であることを特徴とする請求項3に記載の薄膜形成体の製造装置。   The said board | substrate is a glass substrate in which the antireflection film was formed in the surface at least, The manufacturing apparatus of the thin film formation body of Claim 3 characterized by the above-mentioned.
JP2004168913A 2004-06-07 2004-06-07 Method and device for producing thin film-deposited body Pending JP2005344203A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018066987A (en) * 2016-10-17 2018-04-26 株式会社昭和真空 Annular film formation method, annular film formation tool, and annular film formation mask

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018066987A (en) * 2016-10-17 2018-04-26 株式会社昭和真空 Annular film formation method, annular film formation tool, and annular film formation mask
JP7161163B2 (en) 2016-10-17 2022-10-26 株式会社昭和真空 Annular film-forming method, annular film-forming tool, and annular film-forming mask

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