JP2005336535A5 - - Google Patents
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- Publication number
- JP2005336535A5 JP2005336535A5 JP2004155765A JP2004155765A JP2005336535A5 JP 2005336535 A5 JP2005336535 A5 JP 2005336535A5 JP 2004155765 A JP2004155765 A JP 2004155765A JP 2004155765 A JP2004155765 A JP 2004155765A JP 2005336535 A5 JP2005336535 A5 JP 2005336535A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- target
- film
- film thickness
- thickness distribution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 118
- 239000010408 film Substances 0.000 claims description 110
- 230000007246 mechanism Effects 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 18
- 239000002245 particle Substances 0.000 claims description 10
- 239000010409 thin film Substances 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 5
- 238000000926 separation method Methods 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 13
- 239000007789 gas Substances 0.000 description 6
- 238000005457 optimization Methods 0.000 description 6
- 238000004364 calculation method Methods 0.000 description 4
- 238000004088 simulation Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000013077 target material Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 150000002751 molybdenum Chemical class 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004155765A JP2005336535A (ja) | 2004-05-26 | 2004-05-26 | 成膜装置及び成膜方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004155765A JP2005336535A (ja) | 2004-05-26 | 2004-05-26 | 成膜装置及び成膜方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005336535A JP2005336535A (ja) | 2005-12-08 |
| JP2005336535A5 true JP2005336535A5 (enrdf_load_stackoverflow) | 2007-07-19 |
Family
ID=35490423
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004155765A Pending JP2005336535A (ja) | 2004-05-26 | 2004-05-26 | 成膜装置及び成膜方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2005336535A (enrdf_load_stackoverflow) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007291506A (ja) * | 2006-03-31 | 2007-11-08 | Canon Inc | 成膜方法 |
| JP2011162858A (ja) * | 2010-02-12 | 2011-08-25 | Ulvac Japan Ltd | 位置決め装置 |
| JP5868017B2 (ja) | 2010-04-14 | 2016-02-24 | キヤノン株式会社 | 光学素子成形用型の製造方法および光学素子成形用型 |
| JP2013001920A (ja) * | 2011-06-14 | 2013-01-07 | Hitachi High-Technologies Corp | スパッタリング装置、スパッタリング装置を用いた成膜装置、およびそれらの成膜方法 |
| CN107429385B (zh) * | 2015-03-20 | 2019-11-22 | 芝浦机械电子装置株式会社 | 成膜装置以及成膜工件制造方法 |
| CN111684101B (zh) | 2018-02-06 | 2023-02-17 | 佳能安内华股份有限公司 | 基板处理装置以及基板处理方法 |
| CN114150278A (zh) * | 2021-12-07 | 2022-03-08 | 业成科技（成都）有限公司 | 圆心对称型3d基板镀膜方法 |
| CN115354284A (zh) * | 2022-07-15 | 2022-11-18 | 湖南红太阳光电科技有限公司 | 一种旋转阴极及靶基距在线调节方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH064921A (ja) * | 1992-06-24 | 1994-01-14 | Victor Co Of Japan Ltd | 光磁気記録媒体の製作方法及び製作装置 |
| JPH10121237A (ja) * | 1996-10-11 | 1998-05-12 | Sony Corp | スパッタ装置 |
| JP3808148B2 (ja) * | 1996-10-21 | 2006-08-09 | 株式会社アルバック | 複合スパッタリングカソード、そのカソードを用いたスパッタリング装置 |
-
2004
- 2004-05-26 JP JP2004155765A patent/JP2005336535A/ja active Pending
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