JP2005305729A - Method for producing flexible metal-clad laminate improved in productivity and flexible metal-clad laminate obtained by the method - Google Patents
Method for producing flexible metal-clad laminate improved in productivity and flexible metal-clad laminate obtained by the method Download PDFInfo
- Publication number
- JP2005305729A JP2005305729A JP2004123573A JP2004123573A JP2005305729A JP 2005305729 A JP2005305729 A JP 2005305729A JP 2004123573 A JP2004123573 A JP 2004123573A JP 2004123573 A JP2004123573 A JP 2004123573A JP 2005305729 A JP2005305729 A JP 2005305729A
- Authority
- JP
- Japan
- Prior art keywords
- film
- clad laminate
- flexible metal
- polyimide
- protective film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 30
- 238000000034 method Methods 0.000 title abstract description 76
- 229920001721 polyimide Polymers 0.000 claims abstract description 74
- 230000001681 protective effect Effects 0.000 claims abstract description 58
- 229910052751 metal Inorganic materials 0.000 claims abstract description 48
- 239000002184 metal Substances 0.000 claims abstract description 48
- 239000011888 foil Substances 0.000 claims abstract description 37
- 238000010438 heat treatment Methods 0.000 claims abstract description 31
- 229920006259 thermoplastic polyimide Polymers 0.000 claims abstract description 27
- 239000002313 adhesive film Substances 0.000 claims abstract description 25
- 238000003475 lamination Methods 0.000 claims abstract description 24
- 239000012790 adhesive layer Substances 0.000 claims abstract description 21
- 239000000463 material Substances 0.000 claims abstract description 20
- 238000001816 cooling Methods 0.000 claims abstract description 3
- 230000009477 glass transition Effects 0.000 claims description 15
- 239000000654 additive Substances 0.000 claims description 12
- 239000002734 clay mineral Substances 0.000 claims description 12
- 239000011521 glass Substances 0.000 claims description 12
- 230000000996 additive effect Effects 0.000 claims description 11
- 239000011324 bead Substances 0.000 claims description 11
- RJDOZRNNYVAULJ-UHFFFAOYSA-L [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] Chemical compound [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] RJDOZRNNYVAULJ-UHFFFAOYSA-L 0.000 claims description 10
- 239000006229 carbon black Substances 0.000 claims description 4
- 239000010954 inorganic particle Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 abstract description 15
- 239000010408 film Substances 0.000 description 105
- 238000010030 laminating Methods 0.000 description 40
- 229920005575 poly(amic acid) Polymers 0.000 description 40
- 230000015572 biosynthetic process Effects 0.000 description 30
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 29
- 239000000243 solution Substances 0.000 description 29
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 25
- 238000003786 synthesis reaction Methods 0.000 description 24
- 239000000945 filler Substances 0.000 description 22
- 239000010410 layer Substances 0.000 description 15
- 238000006116 polymerization reaction Methods 0.000 description 15
- 239000000853 adhesive Substances 0.000 description 14
- 239000002245 particle Substances 0.000 description 12
- 238000004804 winding Methods 0.000 description 12
- 239000002253 acid Substances 0.000 description 11
- 125000003118 aryl group Chemical group 0.000 description 11
- 239000006185 dispersion Substances 0.000 description 11
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 10
- 239000004642 Polyimide Substances 0.000 description 10
- 150000004985 diamines Chemical class 0.000 description 10
- 230000000694 effects Effects 0.000 description 10
- 239000011256 inorganic filler Substances 0.000 description 10
- -1 aromatic diamine compound Chemical class 0.000 description 9
- 229910003475 inorganic filler Inorganic materials 0.000 description 9
- 238000002156 mixing Methods 0.000 description 9
- 239000003960 organic solvent Substances 0.000 description 9
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 108010025899 gelatin film Proteins 0.000 description 7
- 239000002648 laminated material Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 239000002243 precursor Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 6
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 5
- 150000004984 aromatic diamines Chemical class 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000011889 copper foil Substances 0.000 description 5
- 239000012024 dehydrating agents Substances 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- 239000002798 polar solvent Substances 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 229920001187 thermosetting polymer Polymers 0.000 description 5
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 150000008065 acid anhydrides Chemical class 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical class C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 4
- 230000003139 buffering effect Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 238000001723 curing Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 229920001169 thermoplastic Polymers 0.000 description 4
- 239000004416 thermosoftening plastic Substances 0.000 description 4
- 229910052582 BN Inorganic materials 0.000 description 3
- 230000002776 aggregation Effects 0.000 description 3
- 238000004220 aggregation Methods 0.000 description 3
- 125000006159 dianhydride group Chemical group 0.000 description 3
- 230000005606 hygroscopic expansion Effects 0.000 description 3
- 238000006358 imidation reaction Methods 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000005060 rubber Substances 0.000 description 3
- 229910021647 smectite Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 2
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 2
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 2
- IJJNNSUCZDJDLP-UHFFFAOYSA-N 4-[1-(3,4-dicarboxyphenyl)ethyl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1C(C)C1=CC=C(C(O)=O)C(C(O)=O)=C1 IJJNNSUCZDJDLP-UHFFFAOYSA-N 0.000 description 2
- GEYAGBVEAJGCFB-UHFFFAOYSA-N 4-[2-(3,4-dicarboxyphenyl)propan-2-yl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1C(C)(C)C1=CC=C(C(O)=O)C(C(O)=O)=C1 GEYAGBVEAJGCFB-UHFFFAOYSA-N 0.000 description 2
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- HEFNNWSXXWATRW-UHFFFAOYSA-N Ibuprofen Chemical compound CC(C)CC1=CC=C(C(C)C(O)=O)C=C1 HEFNNWSXXWATRW-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000002270 dispersing agent Substances 0.000 description 2
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229920003055 poly(ester-imide) Polymers 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 238000007665 sagging Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000009823 thermal lamination Methods 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- HUWXDEQWWKGHRV-UHFFFAOYSA-N 3,3'-Dichlorobenzidine Chemical compound C1=C(Cl)C(N)=CC=C1C1=CC=C(N)C(Cl)=C1 HUWXDEQWWKGHRV-UHFFFAOYSA-N 0.000 description 1
- JRBJSXQPQWSCCF-UHFFFAOYSA-N 3,3'-Dimethoxybenzidine Chemical compound C1=C(N)C(OC)=CC(C=2C=C(OC)C(N)=CC=2)=C1 JRBJSXQPQWSCCF-UHFFFAOYSA-N 0.000 description 1
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical compound C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 1
- GWHLJVMSZRKEAQ-UHFFFAOYSA-N 3-(2,3-dicarboxyphenyl)phthalic acid Chemical compound OC(=O)C1=CC=CC(C=2C(=C(C(O)=O)C=CC=2)C(O)=O)=C1C(O)=O GWHLJVMSZRKEAQ-UHFFFAOYSA-N 0.000 description 1
- LXJLFVRAWOOQDR-UHFFFAOYSA-N 3-(3-aminophenoxy)aniline Chemical compound NC1=CC=CC(OC=2C=C(N)C=CC=2)=C1 LXJLFVRAWOOQDR-UHFFFAOYSA-N 0.000 description 1
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 1
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 1
- UCFMKTNJZCYBBJ-UHFFFAOYSA-N 3-[1-(2,3-dicarboxyphenyl)ethyl]phthalic acid Chemical compound C=1C=CC(C(O)=O)=C(C(O)=O)C=1C(C)C1=CC=CC(C(O)=O)=C1C(O)=O UCFMKTNJZCYBBJ-UHFFFAOYSA-N 0.000 description 1
- UCQABCHSIIXVOY-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]phenoxy]aniline Chemical group NC1=CC=CC(OC=2C=CC(=CC=2)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 UCQABCHSIIXVOY-UHFFFAOYSA-N 0.000 description 1
- WCXGOVYROJJXHA-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(=CC=2)S(=O)(=O)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 WCXGOVYROJJXHA-UHFFFAOYSA-N 0.000 description 1
- IBFJDBNISOJRCW-UHFFFAOYSA-N 3-methylphthalic acid Chemical compound CC1=CC=CC(C(O)=O)=C1C(O)=O IBFJDBNISOJRCW-UHFFFAOYSA-N 0.000 description 1
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 1
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- LFBALUPVVFCEPA-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C(C(O)=O)=C1 LFBALUPVVFCEPA-UHFFFAOYSA-N 0.000 description 1
- AVCOFPOLGHKJQB-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)sulfonylphthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1S(=O)(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 AVCOFPOLGHKJQB-UHFFFAOYSA-N 0.000 description 1
- YJOAIOIVLVUPST-UHFFFAOYSA-N 4-(4-amino-2-methoxyphenyl)-3-methoxyaniline Chemical compound COC1=CC(N)=CC=C1C1=CC=C(N)C=C1OC YJOAIOIVLVUPST-UHFFFAOYSA-N 0.000 description 1
- QYIMZXITLDTULQ-UHFFFAOYSA-N 4-(4-amino-2-methylphenyl)-3-methylaniline Chemical compound CC1=CC(N)=CC=C1C1=CC=C(N)C=C1C QYIMZXITLDTULQ-UHFFFAOYSA-N 0.000 description 1
- HYDATEKARGDBKU-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]phenoxy]aniline Chemical group C1=CC(N)=CC=C1OC1=CC=C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 HYDATEKARGDBKU-UHFFFAOYSA-N 0.000 description 1
- UTDAGHZGKXPRQI-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(S(=O)(=O)C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 UTDAGHZGKXPRQI-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N N-phenyl amine Natural products NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229920001646 UPILEX Polymers 0.000 description 1
- 125000004018 acid anhydride group Chemical group 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- OJMOMXZKOWKUTA-UHFFFAOYSA-N aluminum;borate Chemical compound [Al+3].[O-]B([O-])[O-] OJMOMXZKOWKUTA-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- WRPSKOREVDHZHP-UHFFFAOYSA-N benzene-1,4-diamine Chemical compound NC1=CC=C(N)C=C1.NC1=CC=C(N)C=C1 WRPSKOREVDHZHP-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- TUQQUUXMCKXGDI-UHFFFAOYSA-N bis(3-aminophenyl)methanone Chemical compound NC1=CC=CC(C(=O)C=2C=C(N)C=CC=2)=C1 TUQQUUXMCKXGDI-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- FUFJGUQYACFECW-UHFFFAOYSA-L calcium hydrogenphosphate Chemical compound [Ca+2].OP([O-])([O-])=O FUFJGUQYACFECW-UHFFFAOYSA-L 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- 229910000389 calcium phosphate Inorganic materials 0.000 description 1
- 235000011010 calcium phosphates Nutrition 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 235000019700 dicalcium phosphate Nutrition 0.000 description 1
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 125000000468 ketone group Chemical group 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- BAVYZALUXZFZLV-UHFFFAOYSA-N mono-methylamine Natural products NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 1
- OBKARQMATMRWQZ-UHFFFAOYSA-N naphthalene-1,2,5,6-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 OBKARQMATMRWQZ-UHFFFAOYSA-N 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- DOBFTMLCEYUAQC-UHFFFAOYSA-N naphthalene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 DOBFTMLCEYUAQC-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C66/00—General aspects of processes or apparatus for joining preformed parts
- B29C66/70—General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material
- B29C66/71—General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material characterised by the composition of the plastics material of the parts to be joined
Landscapes
- Laminated Bodies (AREA)
- Lining Or Joining Of Plastics Or The Like (AREA)
Abstract
Description
本発明は、少なくとも片面に、熱可塑性ポリイミドを含有する接着層を設けた接着フィルムと金属箔とを、一対以上の金属ロールを有する熱ロールラミネート装置により貼り合わせて得られるフレキシブル金属張積層板、ならびにその製造方法に関する。 The present invention is a flexible metal-clad laminate obtained by bonding an adhesive film provided with an adhesive layer containing a thermoplastic polyimide on at least one side and a metal foil by a hot roll laminating apparatus having a pair of metal rolls, And a manufacturing method thereof.
近年、エレクトロニクス製品の軽量化、小型化、高密度化にともない、各種プリント基板の需要が伸びているが、中でも、フレキシブル積層板(フレキシブルプリント配線板(FPC)等とも称する)の需要が特に伸びている。フレキシブル積層板は、絶縁性フィルム上に金属箔からなる回路が形成された構造を有している。 In recent years, the demand for various printed circuit boards has increased along with the reduction in weight, size and density of electronic products. In particular, the demand for flexible laminates (also referred to as flexible printed circuit boards (FPCs), etc.) has increased. ing. The flexible laminate has a structure in which a circuit made of a metal foil is formed on an insulating film.
上記フレキシブル積層板は、一般に、各種絶縁材料により形成され、柔軟性を有する絶縁性フィルムを基板とし、この基板の表面に、各種接着材料を介して金属箔を加熱・圧着することにより貼りあわせる方法により製造される。上記絶縁性フィルムとしては、ポリイミドフィルム等が好ましく用いられている。上記接着材料としては、エポキシ系、アクリル系等の熱硬化性接着剤が一般的に用いられている(これら熱硬化性接着剤を用いたFPCを以下、三層FPCともいう)。 The flexible laminate is generally formed of various insulating materials, and a flexible insulating film is used as a substrate, and a metal foil is bonded to the surface of the substrate by heating and pressure bonding via various adhesive materials. Manufactured by. A polyimide film or the like is preferably used as the insulating film. As the adhesive material, a thermosetting adhesive such as epoxy or acrylic is generally used (FPC using these thermosetting adhesives is hereinafter also referred to as three-layer FPC).
熱硬化性接着剤は比較的低温での接着が可能であるという利点がある。しかし今後、耐熱性、屈曲性、電気的信頼性といった要求特性が厳しくなるに従い、熱硬化性接着剤を用いた三層FPCでは対応が困難になると考えられる。これに対し、絶縁性フィルムに直接金属層を設けたり、接着層に熱可塑性ポリイミドを使用したFPC(以下、二層FPCともいう)が提案されている。この二層FPCは、三層FPCより優れた特性を有し、今後需要が伸びていくことが期待される。 Thermosetting adhesives have the advantage that they can be bonded at relatively low temperatures. However, in the future, as required characteristics such as heat resistance, flexibility, and electrical reliability become stricter, it is considered that it is difficult to cope with a three-layer FPC using a thermosetting adhesive. On the other hand, an FPC (hereinafter also referred to as a two-layer FPC) in which a metal layer is directly provided on an insulating film or a thermoplastic polyimide is used for an adhesive layer has been proposed. This two-layer FPC has characteristics superior to those of the three-layer FPC, and demand is expected to increase in the future.
二層FPCに用いるフレキシブル金属張積層板の作製方法としては、金属箔上にポリイミドの前駆体であるポリアミド酸を流延、塗布した後イミド化するキャスト法、スパッタ、メッキによりポリイミドフィルム上に直接金属層を設けるメタライジング法、熱可塑性ポリイミドを介してポリイミドフィルムと金属箔とを貼り合わせるラミネート法が挙げられる。この中で、ラミネート法は、対応できる金属箔の厚み範囲がキャスト法よりも広く、装置コストがメタライジング法よりも低いという点で優れている。ラミネートを行う装置としては、ロール状の材料を繰り出しながら連続的にラミネートする熱ロールラミネート装置またはダブルベルトプレス装置等が用いられている。上記の内、生産性の点から見れば、熱ロールラミネート法をより好ましく用いることができる。 As a method for producing a flexible metal-clad laminate for use in a two-layer FPC, a polyamic acid, which is a polyimide precursor, is cast on a metal foil, applied, and then casted directly onto a polyimide film by sputtering or plating. Examples thereof include a metallizing method for providing a metal layer and a laminating method for bonding a polyimide film and a metal foil through a thermoplastic polyimide. Among these, the lamination method is superior in that the thickness range of the metal foil that can be handled is wider than that of the casting method and the apparatus cost is lower than that of the metalizing method. As a device for laminating, a hot roll laminating device or a double belt press device for continuously laminating a roll-shaped material is used. Of these, the hot roll laminating method can be used more preferably from the viewpoint of productivity.
従来の三層FPCをラミネート法で作製する際、接着層に熱硬化性樹脂を用いていたため、ラミネート温度は200℃未満で、ゴムロールを用いて行うことが可能であった(特許文献1参照)。 When a conventional three-layer FPC was produced by a laminating method, a thermosetting resin was used for the adhesive layer, so that the laminating temperature was less than 200 ° C. and it was possible to perform using a rubber roll (see Patent Document 1). .
これに対し、二層FPCは熱可塑性ポリイミドを接着層として用いるため、熱融着性を発現させるために200℃以上、場合によっては400℃近くの高温を加える必要がある。従って、ゴムロールは耐熱性の点から使用が困難であり、金属ロールを使用せざるを得ないが、金属ロールにはゴムロールのような緩衝作用は無く、材料に不均一に圧力が加えられる場合がある。そのため、安定した接着強度が得られにくいという問題があった。そこで、ポリイミドフィルムを保護フィルムとして使用することにより、緩衝効果を発現し、この問題を解決する方法が提案されている(特許文献2参照)。通常のプラスチックフィルムでは400℃近い加工温度には耐えられないが、ポリイミドフィルムは耐熱性に優れるため、高温でのラミネートでも問題無く使用することが可能である。 On the other hand, since the two-layer FPC uses thermoplastic polyimide as an adhesive layer, it is necessary to apply a high temperature of 200 ° C. or higher, and in some cases, close to 400 ° C., in order to develop heat-fusibility. Therefore, rubber rolls are difficult to use from the viewpoint of heat resistance, and metal rolls must be used, but metal rolls do not have a buffering action like rubber rolls, and pressure may be applied unevenly to the material. is there. Therefore, there is a problem that it is difficult to obtain a stable adhesive strength. Then, the method of expressing a buffer effect and solving this problem by using a polyimide film as a protective film has been proposed (see Patent Document 2). A normal plastic film cannot withstand a processing temperature close to 400 ° C., but a polyimide film is excellent in heat resistance, so that it can be used without problems even at a high temperature laminate.
しかしながら、一般にプラスチックフィルムは熱伝導性が低く、ポリイミドフィルムも例外では無い。そのため、生産性を向上させようとしてラミネート速度を上げると、加熱ロールの熱が金属箔や接着フィルムなどの被積層材料に充分に伝わらなくなり、得られる積層板の接着強度が低下する問題が生じる場合があった。保護フィルムを薄くすれば上記問題は解決できるものの、保護フィルムを薄くしすぎると緩衝効果を十分に発現しないという問題があった。
本発明は、上記の課題に鑑みてなされたものであって、その目的は、接着性ならびに生産性に優れたフレキシブル金属張積層板、ならびにその製造方法を提供することにある。 This invention is made | formed in view of said subject, The objective is to provide the flexible metal-clad laminated board excellent in adhesiveness and productivity, and its manufacturing method.
本発明者らは、上記の課題に鑑み鋭意検討した結果、特定の値以上の熱伝導率を有する保護フィルムを使用することにより、短時間で加熱ロールの熱が保護フィルムを介して被積層材料に伝わりやすくなり、ラミネート速度を向上できることを独自に見出し、本発明を完成させるに至った。 As a result of intensive studies in view of the above-mentioned problems, the present inventors have used a protective film having a thermal conductivity equal to or higher than a specific value, so that the heat of the heating roll can be laminated through the protective film in a short time. It has been found that the lamination speed can be improved and the present invention has been completed.
即ち本発明の第1は、少なくとも片面に、熱可塑性ポリイミドを含有する接着層を設けた接着フィルムと金属箔とを、一対以上の金属ロールを有する熱ロールラミネート装置により貼り合わせてなるフレキシブル金属張積層板の製造方法であって、該装置の加熱ロールと被積層材料との間に、熱伝導率が0.3W/m・K以上のポリイミドフィルムからなる保護フィルムを配してラミネートを行い、冷却後に積層板から保護フィルムを剥離することを特徴とする、フレキシブル金属張積層板の製造方法に関する。 That is, the first of the present invention is a flexible metal-clad laminate in which an adhesive film provided with an adhesive layer containing a thermoplastic polyimide on at least one surface and a metal foil are bonded together by a hot roll laminating apparatus having a pair of metal rolls. A method for producing a laminated board, comprising: laminating a protective film made of a polyimide film having a thermal conductivity of 0.3 W / m · K or more between a heating roll of the apparatus and a material to be laminated; The present invention relates to a method for producing a flexible metal-clad laminate, wherein the protective film is peeled off from the laminate after cooling.
好ましい実施態様は、熱伝導性無機粒子、カーボンブラック、合成粘土鉱物、合成雲母、ガラスビーズからなる群から選ばれる添加剤の少なくとも1種が分散、含有されているポリイミドフィルムを保護フィルムとして用いることを特徴とする、前記の製造方法に関する。 In a preferred embodiment, a polyimide film in which at least one additive selected from the group consisting of thermally conductive inorganic particles, carbon black, synthetic clay minerals, synthetic mica, and glass beads is dispersed and contained is used as a protective film. The present invention relates to the above manufacturing method.
更に好ましい実施態様は、保護フィルムとして、非熱可塑性ポリイミド、またはガラス転移温度(Tg)がラミネート温度よりも50℃以上高い熱可塑性ポリイミドを用いることを特徴とする、前記の製造方法に関する。 A further preferred embodiment relates to the above production method, characterized in that a non-thermoplastic polyimide or a thermoplastic polyimide having a glass transition temperature (Tg) higher by 50 ° C. or more than the lamination temperature is used as the protective film.
本発明の第2は、前記いずれかに記載の製造方法により得られるフレキシブル金属張積層板に関する。 2nd of this invention is related with the flexible metal tension laminated board obtained by the manufacturing method in any one of the said.
本発明の製造方法は、生産性に優れた高温ラミネート手段を提供するものであり、接着性に優れたフレキシブル金属張積層板を、効率良く製造することが可能である。 The production method of the present invention provides a high-temperature laminating means excellent in productivity, and can efficiently produce a flexible metal-clad laminate excellent in adhesiveness.
本発明の実施の一形態について、以下に説明する。 One embodiment of the present invention will be described below.
本発明にかかるフレキシブル金属張積層板は、後に詳述する、本発明にかかる製造方法により得られるものであり、少なくとも片面に、熱可塑性ポリイミドを含有する接着層を設けた接着フィルムと金属箔とが積層されている構造を含む積層体であれば特に限定されるものではない。 The flexible metal-clad laminate according to the present invention is obtained by the production method according to the present invention, which will be described in detail later. An adhesive film and a metal foil provided with an adhesive layer containing a thermoplastic polyimide on at least one surface. If it is a laminated body containing the structure where is laminated | stacked, it will not specifically limit.
本発明にかかるフレキシブル金属張積層板の製造に用いる接着フィルムは、基材となるフィルム上に、熱可塑性ポリイミドを含有する接着層を設けることにより得るのが一般的である(尚、接着層のみからなる接着フィルムを用いる場合は、基材からこれを剥離して使用するのが通常である)。基材と接着層を有する接着フィルムを使用する際の、基材となるフィルムは、熱ラミネート工程の加熱温度に耐え得るものであり、かつ、柔軟性や可撓性を有する基板であればよいが、本発明にかかるフレキシブル積層板は、電子・電気機器用途(部品も含む)に好適に用いることができるので、絶縁性を有することが非常に好ましい。絶縁性を有するフィルム(絶縁性フィルムと称する)としては、一般的には、各種樹脂フィルムを好適に用いることができ、特に限定されるものではないが、優れた耐熱性を発揮することができ、その他の物性も優れているポリイミドフィルムが好ましく用いられる。 The adhesive film used for the production of the flexible metal-clad laminate according to the present invention is generally obtained by providing an adhesive layer containing thermoplastic polyimide on a film serving as a base material (only the adhesive layer) In the case of using an adhesive film consisting of the above, it is usually used by peeling it from the base material). When using an adhesive film having a base material and an adhesive layer, the film serving as the base material may be a substrate that can withstand the heating temperature of the heat laminating step and has flexibility and flexibility. However, since the flexible laminated board concerning this invention can be used suitably for an electronic / electric equipment use (a part is also included), it is very preferable to have insulation. As an insulating film (referred to as an insulating film), generally, various resin films can be suitably used and are not particularly limited, but can exhibit excellent heat resistance. Further, a polyimide film excellent in other physical properties is preferably used.
本発明に用いられるポリイミドフィルムは一般的には、ポリアミド酸を前駆体として用いて製造される。ポリアミド酸の製造方法としては公知のあらゆる方法を用いることができ、通常、芳香族酸二無水物と芳香族ジアミンを、実質的等モル量を有機溶媒中に溶解させて、得られたポリアミド酸有機溶媒溶液を、制御された温度条件下で、上記酸二無水物とジアミンの重合が完了するまで攪拌することによって製造される。これらのポリアミド酸溶液は通常5〜35wt%、好ましくは10〜30wt%の濃度で得られる。この範囲の濃度である場合に適当な分子量と溶液粘度を得る。 The polyimide film used in the present invention is generally produced using polyamic acid as a precursor. Any known method can be used as a method for producing the polyamic acid. Usually, the polyamic acid obtained by dissolving a substantially equimolar amount of an aromatic dianhydride and an aromatic diamine in an organic solvent is obtained. The organic solvent solution is produced by stirring under controlled temperature conditions until the polymerization of the acid dianhydride and the diamine is completed. These polyamic acid solutions are usually obtained at a concentration of 5 to 35 wt%, preferably 10 to 30 wt%. When the concentration is in this range, an appropriate molecular weight and solution viscosity are obtained.
重合方法としてはあらゆる公知の方法およびそれらを組み合わせた方法を用いることができる。ポリアミド酸の重合における重合方法の特徴はそのモノマーの添加順序にあり、このモノマー添加順序を制御することにより得られるポリイミドの諸物性を制御することができる。従い、本発明においてポリアミド酸の重合にはいかなるモノマーの添加方法を用いても良い。代表的な重合方法として次のような方法が挙げられる。すなわち、
1)芳香族ジアミンを有機極性溶媒中に溶解し、これと実質的に等モルの芳香族テトラカルボン酸二無水物を反応させて重合する方法。
2)芳香族テトラカルボン酸二無水物とこれに対し過小モル量の芳香族ジアミン化合物とを有機極性溶媒中で反応させ、両末端に酸無水物基を有するプレポリマーを得る。続いて、全工程において芳香族テトラカルボン酸二無水物と芳香族ジアミン化合物が実質的に等モルとなるように芳香族ジアミン化合物を用いて重合させる方法。
3)芳香族テトラカルボン酸二無水物とこれに対し過剰モル量の芳香族ジアミン化合物とを有機極性溶媒中で反応させ、両末端にアミノ基を有するプレポリマーを得る。続いてここに芳香族ジアミン化合物を追加添加後、全工程において芳香族テトラカルボン酸二無水物と芳香族ジアミン化合物が実質的に等モルとなるように芳香族テトラカルボン酸二無水物を用いて重合する方法。
4)芳香族テトラカルボン酸二無水物を有機極性溶媒中に溶解及び/または分散させた後、実質的に等モルとなるように芳香族ジアミン化合物を用いて重合させる方法。
5)実質的に等モルの芳香族テトラカルボン酸二無水物と芳香族ジアミンの混合物を有機極性溶媒中で反応させて重合する方法。
などのような方法である。これら方法を単独で用いても良いし、部分的に組み合わせて用いることもできる。
As the polymerization method, any known method and a combination thereof can be used. The characteristic of the polymerization method in the polymerization of polyamic acid is the order of addition of the monomers, and the physical properties of the polyimide obtained can be controlled by controlling the order of addition of the monomers. Therefore, in the present invention, any method of adding monomers may be used for the polymerization of polyamic acid. The following method is mentioned as a typical polymerization method. That is,
1) A method in which an aromatic diamine is dissolved in an organic polar solvent and this is reacted with a substantially equimolar amount of an aromatic tetracarboxylic dianhydride for polymerization.
2) An aromatic tetracarboxylic dianhydride is reacted with a small molar amount of an aromatic diamine compound in an organic polar solvent to obtain a prepolymer having acid anhydride groups at both ends. Then, the method of superposing | polymerizing using an aromatic diamine compound so that an aromatic tetracarboxylic dianhydride and an aromatic diamine compound may become substantially equimolar in all the processes.
3) An aromatic tetracarboxylic dianhydride and an excess molar amount of the aromatic diamine compound are reacted in an organic polar solvent to obtain a prepolymer having amino groups at both ends. Subsequently, after adding an aromatic diamine compound here, using the aromatic tetracarboxylic dianhydride so that the aromatic tetracarboxylic dianhydride and the aromatic diamine compound are substantially equimolar in all steps. How to polymerize.
4) A method in which an aromatic tetracarboxylic dianhydride is dissolved and / or dispersed in an organic polar solvent and then polymerized using an aromatic diamine compound so as to be substantially equimolar.
5) A method of polymerizing by reacting a substantially equimolar mixture of aromatic tetracarboxylic dianhydride and aromatic diamine in an organic polar solvent.
And so on. These methods may be used singly or in combination.
本発明においては、上記の様ないかなる重合方法を用いて得られたポリアミド酸を用いても良く、重合方法は特に限定されるのもではない。
本発明において、パラフェニレンジアミンや置換ベンジジンに代表される剛直構造を有するジアミン成分を用いてプレポリマーを得る重合方法を用いることも好ましい。本方法を用いることにより、弾性率が高く、吸湿膨張係数が小さいポリイミドフィルムが得やすくなる傾向にある。本方法においてプレポリマー調製時に用いる剛直構造を有するジアミンと酸二無水物のモル比は100:70〜100:99もしくは70:100〜99:100、さらには100:75〜100:90もしくは75:100〜90:100が好ましい。この比が上記範囲を下回ると弾性率および吸湿膨張係数の改善効果が得られにくく、上記範囲を上回ると線膨張係数が小さくなりすぎたり、引張伸びが小さくなるなどの弊害が生じることがある。
ここで、本発明にかかるポリアミック酸組成物に用いられる材料について説明する。
In the present invention, polyamic acid obtained by any polymerization method as described above may be used, and the polymerization method is not particularly limited.
In the present invention, it is also preferable to use a polymerization method in which a prepolymer is obtained using a diamine component having a rigid structure typified by paraphenylenediamine or substituted benzidine. By using this method, a polyimide film having a high elastic modulus and a small hygroscopic expansion coefficient tends to be easily obtained. The molar ratio of the diamine having a rigid structure and the acid dianhydride used in preparing the prepolymer in the present method is 100: 70 to 100: 99 or 70: 100 to 99: 100, and further 100: 75 to 100: 90 or 75: 100-90: 100 is preferable. When this ratio is less than the above range, it is difficult to obtain the effect of improving the elastic modulus and the hygroscopic expansion coefficient, and when it exceeds the above range, there are cases where the linear expansion coefficient becomes too small or the tensile elongation becomes small.
Here, the material used for the polyamic acid composition concerning this invention is demonstrated.
本発明において用いうる適当な酸二無水物は、ピロメリット酸二無水物、2,3,6,7−ナフタレンテトラカルボン酸二無水物、3,3’,4,4’−ビフェニルテトラカルボン酸二無水物、1,2,5,6−ナフタレンテトラカルボン酸二無水物、2,2’,3,3’−ビフェニルテトラカルボン酸二無水物、3,3’,4,4’−ベンゾフェノンテトラカルボン酸二無水物、4,4’−オキシフタル酸二無水物、2,2−ビス(3,4−ジカルボキシフェニル)プロパン二無水物、3,4,9,10−ペリレンテトラカルボン酸二無水物、ビス(3,4−ジカルボキシフェニル)プロパン二無水物、1,1−ビス(2,3−ジカルボキシフェニル)エタン二無水物、1,1−ビス(3,4−ジカルボキシフェニル)エタン二無水物、ビス(2,3−ジカルボキシフェニル)メタン二無水物、ビス(3,4−ジカルボキシフェニル)エタン二無水物、オキシジフタル酸二無水物、ビス(3,4−ジカルボキシフェニル)スルホン二無水物、p−フェニレンビス(トリメリット酸モノエステル酸無水物)、エチレンビス(トリメリット酸モノエステル酸無水物)、ビスフェノールAビス(トリメリット酸モノエステル酸無水物)及びそれらの類似物を含み、これらを単独または、任意の割合の混合物が好ましく用い得る。これら酸二無水物の中で特にはピロメリット酸二無水物及び/又は3,3’,4,4’−ベンゾフェノンテトラカルボン酸二無水物及び/又は4,4’−オキシフタル酸二無水物及び/又は3,3’,4,4’−ビフェニルテトラカルボン酸二無水物の使用が好ましい。 Suitable acid dianhydrides that can be used in the present invention are pyromellitic dianhydride, 2,3,6,7-naphthalenetetracarboxylic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic acid. Dianhydride, 1,2,5,6-naphthalenetetracarboxylic dianhydride, 2,2 ′, 3,3′-biphenyltetracarboxylic dianhydride, 3,3 ′, 4,4′-benzophenonetetra Carboxylic dianhydride, 4,4′-oxyphthalic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, 3,4,9,10-perylenetetracarboxylic dianhydride , Bis (3,4-dicarboxyphenyl) propane dianhydride, 1,1-bis (2,3-dicarboxyphenyl) ethane dianhydride, 1,1-bis (3,4-dicarboxyphenyl) Ethane dianhydride, bi (2,3-dicarboxyphenyl) methane dianhydride, bis (3,4-dicarboxyphenyl) ethane dianhydride, oxydiphthalic dianhydride, bis (3,4-dicarboxyphenyl) sulfone dianhydride, including p-phenylenebis (trimellitic acid monoester acid anhydride), ethylene bis (trimellitic acid monoester acid anhydride), bisphenol A bis (trimellitic acid monoester acid anhydride) and the like, these Can be preferably used alone or in any desired mixture. Among these acid dianhydrides, especially pyromellitic dianhydride and / or 3,3 ′, 4,4′-benzophenonetetracarboxylic dianhydride and / or 4,4′-oxyphthalic dianhydride and It is preferable to use 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride.
またこれら酸二無水物の中で3,3’,4,4’−ベンゾフェノンテトラカルボン酸二無水物及び/又は4,4’−オキシフタル酸二無水物及び/又は3,3’,4,4’−ビフェニルテトラカルボン酸二無水物の好ましい使用量は、全酸二無水物に対して、60mol%以下、好ましくは55mol%以下、更に好ましくは50mol%以下である。3,3’,4,4’−ベンゾフェノンテトラカルボン酸二無水物及び/又は4,4’−オキシフタル酸二無水物及び/又は3,3’,4,4’−ビフェニルテトラカルボン酸二無水物の使用量がこの範囲を上回るとポリイミドフィルムのガラス転移温度が低くなりすぎたり、熱時の貯蔵弾性率が低くなりすぎて製膜そのものが困難になったりすることがあるため好ましくない。 Among these acid dianhydrides, 3,3 ′, 4,4′-benzophenonetetracarboxylic dianhydride and / or 4,4′-oxyphthalic dianhydride and / or 3,3 ′, 4,4 The preferred amount of '-biphenyltetracarboxylic dianhydride is 60 mol% or less, preferably 55 mol% or less, more preferably 50 mol% or less, based on the total acid dianhydride. 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride and / or 4,4′-oxyphthalic dianhydride and / or 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride If the amount of use exceeds this range, the glass transition temperature of the polyimide film becomes too low, or the storage elastic modulus at the time of heating becomes too low and the film formation itself becomes difficult, which is not preferable.
また、ピロメリット酸二無水物を用いる場合、好ましい使用量は40〜100mol%、更に好ましくは45〜100mol%、特に好ましくは50〜100mol%である。ピロメリット酸二無水物をこの範囲で用いることによりガラス転移温度および熱時の貯蔵弾性率を使用または製膜に好適な範囲に保ちやすくなる。 Moreover, when using pyromellitic dianhydride, the preferable usage-amount is 40-100 mol%, More preferably, it is 45-100 mol%, Most preferably, it is 50-100 mol%. By using pyromellitic dianhydride in this range, the glass transition temperature and the storage elastic modulus at the time of heating can be easily maintained in a range suitable for use or film formation.
本発明にかかるポリイミド前駆体ポリアミド酸組成物において使用し得る適当なジアミンとしては、4,4’−ジアミノジフェニルプロパン、4,4’−ジアミノジフェニルメタン、ベンジジン、3,3’−ジクロロベンジジン、3,3‘−ジメチルベンジジン、2,2’−ジメチルベンジジン、3,3’−ジメトキシベンジジン、2,2’−ジメトキシベンジジン、4,4’−ジアミノジフェニルスルフィド、3,3’−ジアミノジフェニルスルホン、4,4’−ジアミノジフェニルスルホン、4,4’−オキシジアニリン、3,3’−オキシジアニリン、3,4’−オキシジアニリン、1,5−ジアミノナフタレン、4,4’−ジアミノジフェニルジエチルシラン、4,4’−ジアミノジフェニルシラン、4,4’−ジアミノジフェニルエチルホスフィンオキシド、4,4’−ジアミノジフェニルN−メチルアミン、4,4’−ジアミノジフェニル N−フェニルアミン、1,4−ジアミノベンゼン(p−フェニレンジアミン)、1,3−ジアミノベンゼン、1,2−ジアミノベンゼン、ビス{4−(4−アミノフェノキシ)フェニル}スルホン、ビス{4−(3−アミノフェノキシ)フェニル}スルホン、4,4’−ビス(4−アミノフェノキシ)ビフェニル、4,4’−ビス(3−アミノフェノキシ)ビフェニル、1,3−ビス(3−アミノフェノキシ)ベンゼン、1,3−ビス(4−アミノフェノキシ)ベンゼン、1,3−ビス(4−アミノフェノキシ)ベンゼン、1,3−ビス(3−アミノフェノキシ)ベンゼン、3,3’−ジアミノベンゾフェノン、4,4'−ジアミノベンゾフェノン及びそれらの類似物などが挙げられる。 Suitable diamines that can be used in the polyimide precursor polyamic acid composition according to the present invention include 4,4′-diaminodiphenylpropane, 4,4′-diaminodiphenylmethane, benzidine, 3,3′-dichlorobenzidine, 3, 3'-dimethylbenzidine, 2,2'-dimethylbenzidine, 3,3'-dimethoxybenzidine, 2,2'-dimethoxybenzidine, 4,4'-diaminodiphenyl sulfide, 3,3'-diaminodiphenylsulfone, 4, 4'-diaminodiphenyl sulfone, 4,4'-oxydianiline, 3,3'-oxydianiline, 3,4'-oxydianiline, 1,5-diaminonaphthalene, 4,4'-diaminodiphenyldiethylsilane 4,4'-diaminodiphenylsilane, 4,4'-diaminodiphenyl Tylphosphine oxide, 4,4′-diaminodiphenyl N-methylamine, 4,4′-diaminodiphenyl N-phenylamine, 1,4-diaminobenzene (p-phenylenediamine), 1,3-diaminobenzene, 1, 2-diaminobenzene, bis {4- (4-aminophenoxy) phenyl} sulfone, bis {4- (3-aminophenoxy) phenyl} sulfone, 4,4′-bis (4-aminophenoxy) biphenyl, 4,4 '-Bis (3-aminophenoxy) biphenyl, 1,3-bis (3-aminophenoxy) benzene, 1,3-bis (4-aminophenoxy) benzene, 1,3-bis (4-aminophenoxy) benzene, 1,3-bis (3-aminophenoxy) benzene, 3,3′-diaminobenzophenone, 4,4′-diamy Benzophenone and their analogs thereof.
これらジアミン類をジアミノベンゼン類、ベンジジン類などに代表されるいわゆる剛直構造のジアミンとエーテル基、スルホン基、ケトン基、スルフィド基など柔構造を有するジアミンとに分類して考えると、剛構造と柔構造のジアミンの使用比率はモル比で80/20〜20/80、好ましくは70/30〜30/70、特に好ましくは60/40〜30/70である。剛構造のジアミンの使用比率が上記範囲を上回ると得られるフィルムの引張伸びが小さくなる傾向にあり、またこの範囲を下回るとガラス転移温度が低くなりすぎたり、熱時の貯蔵弾性率が低くなりすぎて製膜が困難になるなどの弊害を伴うことがあるため好ましくない。 If these diamines are classified into so-called rigid diamines such as diaminobenzenes and benzidines and diamines having flexible structures such as ether groups, sulfone groups, ketone groups and sulfide groups, rigid structures and flexible diamines are considered. The use ratio of the structural diamine is 80/20 to 20/80, preferably 70/30 to 30/70, particularly preferably 60/40 to 30/70, in molar ratio. If the use ratio of the rigid diamine exceeds the above range, the tensile elongation of the resulting film tends to be small, and if it falls below this range, the glass transition temperature becomes too low or the storage modulus during heat decreases. This is not preferable because it may cause adverse effects such as difficulty in film formation.
本発明において用いられるポリイミドフィルムは、上記の範囲の中で所望の特性を有するフィルムとなるように適宜芳香族酸二無水物および芳香族ジアミンの種類、配合比を決定して用いることにより得ることができる。 The polyimide film used in the present invention is obtained by appropriately determining the type and blending ratio of the aromatic dianhydride and aromatic diamine so as to be a film having desired characteristics within the above range. Can do.
ポリアミド酸を合成するための好ましい溶媒は、ポリアミド酸を溶解する溶媒であればいかなるものも用いることができるが、アミド系溶媒すなわちN,N−ジメチルフォルムアミド、N,N−ジメチルアセトアミド、N−メチル−2−ピロリドンなどであり、N,N−ジメチルフォルムアミド、N,N−ジメチルアセトアミドが特に好ましく用い得る。
また、摺動性、熱伝導性、導電性、耐コロナ性、ループスティフネス等のフィルムの諸特性を改善する目的でフィラーを添加することもできる。フィラーとしてはいかなるものを用いても良いが、好ましい例としてはシリカ、酸化チタン、アルミナ、窒化珪素、窒化ホウ素、リン酸水素カルシウム、リン酸カルシウム、雲母などが挙げられる。
As the preferred solvent for synthesizing the polyamic acid, any solvent can be used as long as it dissolves the polyamic acid. However, amide solvents such as N, N-dimethylformamide, N, N-dimethylacetamide, N- Examples thereof include methyl-2-pyrrolidone, and N, N-dimethylformamide and N, N-dimethylacetamide can be particularly preferably used.
In addition, a filler can be added for the purpose of improving various film properties such as slidability, thermal conductivity, conductivity, corona resistance, and loop stiffness. Any filler may be used, but preferred examples include silica, titanium oxide, alumina, silicon nitride, boron nitride, calcium hydrogen phosphate, calcium phosphate, mica and the like.
フィラーの粒子径は改質すべきフィルム特性と添加するフィラーの種類によって決定されるため、特に限定されるものではないが、一般的には平均粒径が0.05〜100μm、好ましくは0.1〜75μm、更に好ましくは0.1〜50μm、特に好ましくは0.1〜25μmである。粒子径がこの範囲を下回ると改質効果が現れにくくなり、この範囲を上回ると表面性を大きく損なったり、機械的特性が大きく低下したりする可能性がある。また、フィラーの添加部数についても改質すべきフィルム特性やフィラー粒子径などにより決定されるため特に限定されるものではない。一般的にフィラーの添加量はポリイミド100重量部に対して0.01〜100重量部、好ましくは0.01〜90重量部、更に好ましくは0.02〜80重量部である。フィラー添加量がこの範囲を下回るとフィラーによる改質効果が現れにくく、この範囲を上回るとフィルムの機械的特性が大きく損なわれる可能性がある。フィラーの添加は、
1.重合前または途中に重合反応液に添加する方法
2.重合完了後、3本ロールなどを用いてフィラーを混錬する方法
3.フィラーを含む分散液を用意し、これをポリアミド酸有機溶媒溶液に混合する 方法。
The particle size of the filler is not particularly limited because it is determined by the film characteristics to be modified and the kind of filler to be added, but generally the average particle size is 0.05 to 100 μm, preferably 0.1. It is -75 micrometers, More preferably, it is 0.1-50 micrometers, Most preferably, it is 0.1-25 micrometers. If the particle size is below this range, the modification effect is less likely to appear. If the particle size is above this range, the surface properties may be greatly impaired or the mechanical properties may be greatly deteriorated. Further, the number of added parts of the filler is not particularly limited because it is determined by the film properties to be modified, the filler particle diameter, and the like. Generally, the addition amount of the filler is 0.01 to 100 parts by weight, preferably 0.01 to 90 parts by weight, and more preferably 0.02 to 80 parts by weight with respect to 100 parts by weight of the polyimide. If the amount of filler added is less than this range, the effect of modification by the filler hardly appears, and if it exceeds this range, the mechanical properties of the film may be greatly impaired. Addition of filler
1. 1. A method of adding to a polymerization reaction solution before or during polymerization 2. A method of kneading fillers using three rolls after completion of polymerization. A method of preparing a dispersion containing a filler and mixing it with a polyamic acid organic solvent solution.
などいかなる方法を用いてもよいが、フィラーを含む分散液をポリアミド酸溶液に混合する方法、特に製膜直前に混合する方法が製造ラインのフィラーによる汚染が最も少なくすむため、好ましい。フィラーを含む分散液を用意する場合、ポリアミド酸の重合溶媒と同じ溶媒を用いるのが好ましい。また、フィラーを良好に分散させ、また分散状態を安定化させるために分散剤、増粘剤等をフィルム物性に影響を及ぼさない範囲内で用いることもできる。 Any method may be used, but a method of mixing a dispersion containing a filler with a polyamic acid solution, particularly a method of mixing just before film formation, is preferable because contamination by the filler in the production line is minimized. When preparing a dispersion containing a filler, it is preferable to use the same solvent as the polymerization solvent for the polyamic acid. Further, in order to disperse the filler satisfactorily and stabilize the dispersion state, a dispersant, a thickener and the like can be used within a range not affecting the film physical properties.
これらポリアミック酸溶液からポリイミドフィルムを製造する方法については従来公知の方法を用いることができる。この方法には熱イミド化法と化学イミド化法が挙げられ、どちらの方法を用いてフィルムを製造してもかまわないが、化学イミド化法によるイミド化の方が本発明に好適に用いられる諸特性を有したポリイミドフィルムを得やすい傾向にある。 A conventionally well-known method can be used about the method of manufacturing a polyimide film from these polyamic acid solutions. This method includes a thermal imidization method and a chemical imidization method, and either method may be used to produce a film, but the imidization by the chemical imidation method is more preferably used in the present invention. It tends to be easy to obtain a polyimide film having various characteristics.
また、本発明において特に好ましいポリイミドフィルムの製造工程は、
a)有機溶剤中で芳香族ジアミンと芳香族テトラカルボン酸二無水物を反応させてポリアミック酸溶液を得る工程、
b)上記ポリアミック酸溶液を含む製膜ドープを支持体上に流延する工程、
c)支持体上で加熱した後、支持体からゲルフィルムを引き剥がす工程、
d)更に加熱して、残ったアミック酸をイミド化し、かつ乾燥させる工程、
を含むことが好ましい。
In addition, the production process of the polyimide film particularly preferable in the present invention is as follows.
a) a step of reacting an aromatic diamine and an aromatic tetracarboxylic dianhydride in an organic solvent to obtain a polyamic acid solution;
b) casting a film-forming dope containing the polyamic acid solution on a support;
c) a step of peeling the gel film from the support after heating on the support;
d) further heating to imidize and dry the remaining amic acid,
It is preferable to contain.
上記工程において無水酢酸等の酸無水物に代表される脱水剤と、イソキノリン、β−ピコリン、ピリジン等の第三級アミン類等に代表されるイミド化触媒とを含む硬化剤を用いても良い。 In the above step, a curing agent containing a dehydrating agent typified by an acid anhydride such as acetic anhydride and an imidation catalyst typified by a tertiary amine such as isoquinoline, β-picoline or pyridine may be used. .
以下本発明の好ましい一形態、化学イミド法を一例にとり、ポリイミドフィルムの製造工程を説明する。ただし、本発明は以下の例により限定されるものではない。製膜条件や加熱条件は、ポリアミド酸の種類、フィルムの厚さ等により、変動し得る。
脱水剤及びイミド化触媒を低温でポリアミド酸溶液中に混合して製膜ドープを得る。引き続いてこの製膜ドープをガラス板、アルミ箔、エンドレスステンレスベルト、ステンレスドラムなどの支持体上にフィルム状にキャストし、支持体上で80℃〜200℃、好ましくは100℃〜180℃の温度領域で加熱することで脱水剤及びイミド化触媒を活性化することによって部分的に硬化及び/または乾燥した後支持体から剥離してポリアミック酸フィルム(以下、ゲルフィルムという)を得る。
In the following, a preferred embodiment of the present invention, the chemical imide method, is taken as an example to describe the process for producing a polyimide film. However, the present invention is not limited to the following examples. The film forming conditions and heating conditions can vary depending on the type of polyamic acid, the thickness of the film, and the like.
A film forming dope is obtained by mixing a dehydrating agent and an imidization catalyst in a polyamic acid solution at a low temperature. Subsequently, this film-forming dope is cast into a film on a support such as a glass plate, an aluminum foil, an endless stainless steel belt, or a stainless drum, and the temperature on the support is 80 ° C. to 200 ° C., preferably 100 ° C. to 180 ° C. By heating in the region, the dehydrating agent and imidization catalyst are activated to partially cure and / or dry, and then peel from the support to obtain a polyamic acid film (hereinafter referred to as gel film).
ゲルフィルムは、ポリアミド酸からポリイミドへの硬化の中間段階にあり、自己支持性を有し、式(1)
(A−B)×100/B・・・・(1)
式(1)中、A、Bは以下のものを表す。
A:ゲルフィルムの重量
B:ゲルフィルムを450℃で20分間加熱した後の重量
から算出される揮発分含量は5〜500重量%の範囲、好ましくは5〜200重量%、より好ましくは5〜150重量%の範囲にある。この範囲のフィルムを用いることが好適であり、焼成過程でフィルム破断、乾燥ムラによるフィルムの色調ムラ、特性ばらつき等の不具合が起こることがある。
The gel film is in the intermediate stage of curing from polyamic acid to polyimide, has self-supporting properties, and has the formula (1)
(AB) × 100 / B (1)
In formula (1), A and B represent the following.
A: Weight of gel film B: The volatile content calculated from the weight after heating the gel film at 450 ° C. for 20 minutes is in the range of 5 to 500% by weight, preferably 5 to 200% by weight, more preferably 5 to 5%. It is in the range of 150% by weight. It is preferable to use a film in this range, and problems such as film breakage, uneven film color due to drying unevenness, and characteristic variations may occur during the baking process.
脱水剤の好ましい量は、ポリアミド酸中のアミド酸ユニット1モルに対して、0.5〜5モル、好ましくは1.0〜4モルである。また、イミド化触媒の好ましい量はポリアミド酸中のアミド酸ユニット1モルに対して、0.05〜3モル、好ましくは0.2〜2モルである。 The preferable amount of the dehydrating agent is 0.5 to 5 mol, preferably 1.0 to 4 mol, relative to 1 mol of the amic acid unit in the polyamic acid. Moreover, the preferable quantity of an imidation catalyst is 0.05-3 mol with respect to 1 mol of amic acid units in a polyamic acid, Preferably it is 0.2-2 mol.
脱水剤及びイミド化触媒が上記範囲を下回ると化学的イミド化が不十分で、焼成途中で破断したり、機械的強度が低下したりすることがある。また、これらの量が上記範囲を上回ると、イミド化の進行が早くなりすぎ、フィルム状にキャストすることが困難となることがあるため好ましくない。 If the dehydrating agent and the imidization catalyst are below the above ranges, chemical imidization may be insufficient, and may break during firing or mechanical strength may decrease. Moreover, when these amounts exceed the above range, the progress of imidization becomes too fast, and it may be difficult to cast into a film, which is not preferable.
前記ゲルフィルムの端部を固定して硬化時の収縮を回避して乾燥し、水、残留溶媒、残存転化剤及び触媒を除去し、そして残ったアミド酸を完全にイミド化して、本発明のポリイミドフィルムが得られる。 The end of the gel film is fixed to avoid shrinkage during curing, water, residual solvent, residual conversion agent and catalyst are removed, and the remaining amic acid is completely imidized to obtain the present invention. A polyimide film is obtained.
この時、最終的に400〜650℃の温度で5〜400秒加熱するのが好ましい。この温度より高い及び/または時間が長いと、フィルムの熱劣化が起こり問題が生じることがある。逆にこの温度より低い及び/または時間が短いと所定の効果が発現しないことがある。 At this time, it is preferable to finally heat at a temperature of 400 to 650 ° C. for 5 to 400 seconds. Above this temperature and / or for a long time, the film may suffer from thermal degradation and may cause problems. Conversely, if the temperature is lower than this temperature and / or the time is shorter, the predetermined effect may not be exhibited.
また、フィルム中に残留している内部応力を緩和させるためにフィルムを搬送するに必要最低限の張力下において加熱処理をすることもできる。この加熱処理はフィルム製造工程において行ってもよいし、また、別途この工程を設けても良い。加熱条件はフィルムの特性や用いる装置に応じて変動するため一概に決定することはできないが、一般的には200℃以上500℃以下、好ましくは250℃以上500℃以下、特に好ましくは300℃以上450℃以下の温度で、1〜300秒、好ましくは2〜250秒、特に好ましくは5〜200秒程度の熱処理により内部応力を緩和することができる。 Moreover, in order to relieve the internal stress remaining in the film, heat treatment can be performed under the minimum tension necessary for transporting the film. This heat treatment may be performed in the film manufacturing process, or may be provided separately. The heating conditions vary depending on the characteristics of the film and the apparatus used, and therefore cannot be determined in general. The internal stress can be relaxed by heat treatment at a temperature of 450 ° C. or lower for 1 to 300 seconds, preferably 2 to 250 seconds, particularly preferably 5 to 200 seconds.
ポリイミドフィルムの諸特性の制御は、用いるモノマーの種類、重合時のモノマーの添加順序、選択するイミド化方法等により適宜制御することができるが、本発明において概ね以下の特性を有するように分子設計することが好ましい。
1.引張弾性率は4.0GPa以上、好ましくは4.5GPa以上、特に好ましくは5 .0GPa以上
2.吸湿膨張係数は14ppm以下、好ましくは12ppm以下
3.線膨張係数は1〜20ppm、好ましくは5〜18ppm
また、本発明においては市販のポリイミドフィルムを用いてもよく、例えば、アピカル(鐘淵化学工業社製)、カプトン(デュポン社製)、ユーピレックス(宇部興産社製)が挙げられる。このうち、弾性率、線膨張係数、吸水率の点から、アピカルHP(鐘淵化学工業社製)を好ましく用いることができる。
Control of various properties of the polyimide film can be appropriately controlled according to the type of monomer used, the order of addition of the monomers during polymerization, the imidization method to be selected, etc., but in the present invention, the molecular design generally has the following properties. It is preferable to do.
1. The tensile elastic modulus is 4.0 GPa or more, preferably 4.5 GPa or more, particularly preferably 5. 0 GPa or more 2. Hygroscopic expansion coefficient is 14 ppm or less, preferably 12 ppm or less. The linear expansion coefficient is 1-20 ppm, preferably 5-18 ppm
In the present invention, a commercially available polyimide film may be used, and examples thereof include apical (manufactured by Kaneka Chemical Co., Ltd.), kapton (manufactured by DuPont), and upilex (manufactured by Ube Industries). Of these, Apical HP (manufactured by Kaneka Chemical Co., Ltd.) can be preferably used from the viewpoint of elastic modulus, linear expansion coefficient, and water absorption.
接着層に含有される熱可塑性ポリイミドとしては、熱可塑性ポリイミド、熱可塑性ポリアミドイミド、熱可塑性ポリエーテルイミド、熱可塑性ポリエステルイミド等を好適に用いることができる。中でも、低吸湿特性の点から、熱可塑性ポリエステルイミドが特に好適に用いられる。 As the thermoplastic polyimide contained in the adhesive layer, thermoplastic polyimide, thermoplastic polyamideimide, thermoplastic polyetherimide, thermoplastic polyesterimide and the like can be suitably used. Among these, thermoplastic polyesterimide is particularly preferably used from the viewpoint of low moisture absorption characteristics.
また、既存の装置でラミネートが可能であり、かつ得られる金属張積層板の耐熱性を損なわないという点から考えると、本発明における熱可塑性ポリイミドは、150〜300℃の範囲にガラス転移温度(Tg)を有していることが好ましい。なお、Tgは動的粘弾性測定装置(DMA)により測定した貯蔵弾性率の変曲点の値により求めることができる。 In view of the fact that lamination with an existing apparatus is possible and the heat resistance of the resulting metal-clad laminate is not impaired, the thermoplastic polyimide in the present invention has a glass transition temperature (150 to 300 ° C.). Tg) is preferred. In addition, Tg can be calculated | required from the value of the inflexion point of the storage elastic modulus measured with the dynamic viscoelasticity measuring apparatus (DMA).
本発明に用いられる熱可塑性ポリイミドの前駆体であるポリアミド酸については、特に限定されるわけではなく、公知のあらゆるポリアミド酸を用いることができる。その製造に関しても、公知の原料や反応条件等を用いることができる。また、必要に応じて無機あるいは有機物のフィラーを添加しても良い。 The polyamic acid that is a precursor of the thermoplastic polyimide used in the present invention is not particularly limited, and any known polyamic acid can be used. Also for the production, known raw materials and reaction conditions can be used. Moreover, you may add an inorganic or organic filler as needed.
本発明にかかるフレキシブル金属張積層板の製造に用いる接着フィルムは、上記基材フィルムの少なくとも片面に熱可塑性ポリイミドを含有する接着層を設けることにより得られる。接着フィルムの製造方法としては、基材フィルムに接着層を形成する方法、又は接着層を別途シート状に成形し、これを上記基材フィルムに貼り合わせる方法等が好適に例示され得る。このうち、前者の方法を採る場合、接着層に含有される熱可塑性ポリイミドの前駆体であるポリアミド酸を完全にイミド化してしまうと、有機溶媒への溶解性が低下する場合があることから、基材フィルム上に上記接着層を設けることが困難となることがある。従って、上記観点から、熱可塑性ポリイミドの前駆体であるポリアミド酸を含有する溶液を調製して、これを基材フィルムに塗布し、次いでイミド化する手順を採った方がより好ましい。この時のイミド化の方法としては、熱キュア法若しくはケミカルキュア法のどちらも用いることができるが、ケミカルキュア法は接着層を熱劣化させずに化学的転化剤等を除去する加熱条件を設定しなくてはならない場合があるという点から、熱キュア法によりイミド化する方がより好ましい。 The adhesive film used for the production of the flexible metal-clad laminate according to the present invention can be obtained by providing an adhesive layer containing thermoplastic polyimide on at least one surface of the base film. As a method for producing the adhesive film, a method of forming an adhesive layer on the base film, or a method of separately forming the adhesive layer into a sheet and bonding it to the base film can be suitably exemplified. Among these, when taking the former method, if the polyamic acid that is the precursor of the thermoplastic polyimide contained in the adhesive layer is completely imidized, the solubility in an organic solvent may decrease, It may be difficult to provide the adhesive layer on the base film. Therefore, from the above viewpoint, it is more preferable to prepare a solution containing polyamic acid which is a precursor of thermoplastic polyimide, apply this to a base film, and then imidize. As the imidization method at this time, either a thermal cure method or a chemical cure method can be used, but the chemical cure method sets a heating condition for removing a chemical conversion agent and the like without thermally deteriorating the adhesive layer. It is more preferable to imidize by a thermal curing method because it may be necessary.
一方、熱可塑性ポリイミドが有機溶媒に対して良好な溶解性を示す場合は、ポリアミド酸を完全にイミド化してポリイミドを得た後、これを適当な有機溶媒に溶解させた溶液を上記基材フィルムに塗工しても良い。 On the other hand, when the thermoplastic polyimide has good solubility in an organic solvent, after the polyamic acid is completely imidized to obtain a polyimide, a solution obtained by dissolving the polyimide in an appropriate organic solvent is used as the base film. You may apply to.
また、前記ポリアミド酸溶液には、用途に応じて、例えば、フィラーのような他の材料を含んでもよい。 In addition, the polyamic acid solution may contain other materials such as a filler, depending on the application.
また接着フィルム各層の厚み構成については、用途に応じた総厚みになるように適宜調整すれば良い。更に、必要に応じて、接着層を設ける前にコロナ処理、プラズマ処理、カップリング処理等の各種表面処理をコアフィルム表面に施しても良い。 Moreover, what is necessary is just to adjust suitably about the thickness structure of each layer of an adhesive film so that it may become the total thickness according to a use. Furthermore, if necessary, various surface treatments such as corona treatment, plasma treatment, and coupling treatment may be applied to the core film surface before providing the adhesive layer.
本発明にかかるフレキシブル金属張積層板は、上記接着フィルムに金属箔を貼り合わせることにより得られる。使用する金属箔としては特に限定されるものではないが、電子機器・電気機器用途に本発明のフレキシブル金属張積層板を用いる場合には、例えば、銅若しくは銅合金、ステンレス鋼若しくはその合金、ニッケル若しくはニッケル合金(42合金も含む)、アルミニウム若しくはアルミニウム合金からなる箔を挙げることができる。一般的なフレキシブル金属張積層板では、圧延銅箔、電解銅箔といった銅箔が多用されるが、本発明においても好ましく用いることができる。なお、これらの金属箔の表面には、防錆層や耐熱層あるいは接着層が塗布されていてもよい。 The flexible metal-clad laminate according to the present invention is obtained by bonding a metal foil to the adhesive film. The metal foil to be used is not particularly limited, but when the flexible metal-clad laminate of the present invention is used for electronic equipment / electric equipment, for example, copper or copper alloy, stainless steel or its alloy, nickel Alternatively, a foil made of a nickel alloy (including 42 alloy), aluminum, or an aluminum alloy can be used. In general flexible metal-clad laminates, copper foil such as rolled copper foil and electrolytic copper foil is frequently used, but it can also be preferably used in the present invention. In addition, the antirust layer, the heat-resistant layer, or the contact bonding layer may be apply | coated to the surface of these metal foil.
本発明において、上記金属箔の厚みについては特に限定されるものではなく、その用途に応じて、十分な機能が発揮できる厚みであればよい。 In the present invention, the thickness of the metal foil is not particularly limited, and may be any thickness as long as a sufficient function can be exhibited depending on the application.
上記接着フィルムと金属箔とを貼り合わせて、本発明にかかるフレキシブル金属張積層板を得るためには一対以上の金属ロールを有する熱ロールラミネート装置を用いる。加熱加圧成形装置としては、他にダブルベルトプレス(DBP)が挙げられるが、装置構成が単純であり保守コストの面で有利であるという点から、一対以上の金属ロールを有する熱ロールラミネート装置を用いるのが好ましい。ここでいう「一対以上の金属ロールを有する熱ロールラミネート装置」とは、材料を加熱加圧するための金属ロールを少なくとも一対有している装置のことを示す。 In order to obtain the flexible metal-clad laminate according to the present invention by laminating the adhesive film and the metal foil, a hot roll laminating apparatus having a pair of metal rolls is used. Other examples of the heating and pressing apparatus include a double belt press (DBP), but a hot roll laminating apparatus having a pair of metal rolls is simple because the apparatus configuration is simple and the maintenance cost is advantageous. Is preferably used. The “hot roll laminating apparatus having a pair of metal rolls” as used herein refers to an apparatus having at least a pair of metal rolls for heating and pressing a material.
上記熱ラミネートを実施する際には、得られる積層板の外観を良好なものとするために、加圧面と金属箔との間に保護フィルムを配置する。保護フィルムとしては、熱ラミネート工程の加熱温度に耐えうる材質である必要があり、ポリイミドフィルム等の耐熱性プラスチック、銅箔、アルミニウム箔、SUS箔等の金属箔等が挙げられるが、中でも、耐熱性、再使用等のバランスが優れる点から、非熱可塑性ポリイミドフィルムもしくはガラス転移温度が高い熱可塑性ポリイミドを用いることが好ましい。保護フィルムに熱可塑性ポリイミドを使用する場合、ガラス転移温度がラミネート温度よりも50℃以上高いなる熱可塑性ポリイミドを使用する。ガラス転移温度が上記値よりも低い場合、ラミネート時にロールや金属箔に貼り付く可能性がある。また、厚みが薄いとラミネート時の緩衝ならびに保護の役目を十分に果たさなくなるため、非熱可塑性ポリイミドフィルムの厚みは75μm以上であることが好ましい。 When carrying out the thermal lamination, a protective film is placed between the pressure surface and the metal foil in order to improve the appearance of the resulting laminate. The protective film needs to be a material that can withstand the heating temperature in the heat laminating process, and includes heat-resistant plastics such as polyimide films, metal foils such as copper foil, aluminum foil, and SUS foil. It is preferable to use a non-thermoplastic polyimide film or a thermoplastic polyimide having a high glass transition temperature from the viewpoint of excellent balance of properties and reuse. When using a thermoplastic polyimide for the protective film, a thermoplastic polyimide having a glass transition temperature higher by 50 ° C. or more than the lamination temperature is used. When the glass transition temperature is lower than the above value, there is a possibility of sticking to a roll or metal foil during lamination. In addition, if the thickness is thin, the function of buffering and protecting at the time of lamination will not be sufficiently fulfilled, so the thickness of the non-thermoplastic polyimide film is preferably 75 μm or more.
本願発明のラミネートに使用する保護フィルムは、単に金属箔表面の保護という効果だけではなく、金属ロール表面の微細な凹凸緩衝する効果も発現する。しかしながら、一般にプラスチックフィルムは熱伝導率が低く、ポリイミドフィルムも例外ではない。構造によっても異なるが、一般的なポリイミドフィルムの熱伝導率は0.2W/m・K未満である。そのため、本願のように熱可塑性ポリイミドを接着層に用いた高温ラミネートの場合、加熱ロールの熱が材料に充分に伝わらないままラミネートが行われ、結果として金属箔と接着フィルムの接着強度が不十分になる場合がある。特に生産性を向上させるためにラミネート速度を上げた場合、この問題は顕著となる。保護フィルムの薄膜化でいくらか改善は可能であるが、上記した通り、保護フィルムの厚みが薄いと、ラミネート時の緩衝の役目を十分に果たさなくなる。 The protective film used for the laminate of the present invention exhibits not only the effect of protecting the surface of the metal foil but also the effect of buffering fine irregularities on the surface of the metal roll. However, in general, plastic films have low thermal conductivity, and polyimide films are no exception. Although it depends on the structure, the thermal conductivity of a general polyimide film is less than 0.2 W / m · K. Therefore, in the case of a high temperature laminate using thermoplastic polyimide as an adhesive layer as in the present application, the lamination is performed without sufficiently transferring the heat of the heating roll to the material, and as a result, the adhesive strength between the metal foil and the adhesive film is insufficient. It may become. In particular, when the laminating speed is increased in order to improve productivity, this problem becomes remarkable. Although some improvement is possible by reducing the thickness of the protective film, as described above, if the thickness of the protective film is thin, the protective film does not sufficiently function as a buffer.
本発明においては、熱伝導率が0.3W/m・K以上であるポリイミドフィルムを用いることにより、上記課題を解決し、厚みの厚い保護フィルムを使用しても、生産性良くフレキシブル金属張積層板を製造することが可能となる。熱伝導率が0.4W/m・K以上であると、生産性を更に向上できるため、より好ましい。 In the present invention, by using a polyimide film having a thermal conductivity of 0.3 W / m · K or more, the above-mentioned problems can be solved, and even if a thick protective film is used, a flexible metal-clad laminate with good productivity. A board can be manufactured. It is more preferable that the thermal conductivity is 0.4 W / m · K or more because productivity can be further improved.
なお、フィルムの熱伝導率は厚みに依存し、フィルム厚みが厚くなるほど小さくなる傾向にある。そのため、ラミネートで使用する厚みにおける熱伝導率が0.3W/m・K以上であるようなポリイミドフィルムを適宜選択して使用する。 The thermal conductivity of the film depends on the thickness, and tends to decrease as the film thickness increases. For this reason, a polyimide film having a thermal conductivity of 0.3 W / m · K or more at the thickness used in the laminate is appropriately selected and used.
本発明の製造方法で使用する、熱伝導率が0.3W/m・K以上のポリイミドフィルムからなる保護フィルムを得るための手段については、ポリイミドフィルム中に熱伝導性無機粒子、カーボンブラック、合成粘土鉱物、合成雲母、ガラスビーズからなる群から選ばれる添加剤の少なくとも1種を分散、含有させて形成することが好ましい。より具体的には、ポリイミドフィルムの表面にアルミ等の熱伝導率の高い金属の薄膜を蒸着形成する方法、ポリイミドフィルム表面に熱伝導性無機フィラーを含有する溶液を塗布して熱伝導率の高い層を形成する方法、金属箔をポリイミド系接着フィルムで挟んで一体化する方法、熱伝導率を向上させる添加剤をフィルム中に分散させる方法等が挙げられる。このうち、保護フィルムの熱的挙動への影響、高温条件下での耐久性、再使用性、加熱ロール表面への攻撃性等を考慮に入れると、添加剤をフィルム中に分散させる方法を採るのが好ましい。添加剤としては、熱伝導性無機粒子、カーボンブラック、合成粘土鉱物、合成雲母、ガラスビーズが挙げられる。これら添加剤について、以下説明する。 Regarding means for obtaining a protective film made of a polyimide film having a thermal conductivity of 0.3 W / m · K or more, which is used in the production method of the present invention, in the polyimide film, thermally conductive inorganic particles, carbon black, synthetic It is preferably formed by dispersing and containing at least one additive selected from the group consisting of clay minerals, synthetic mica, and glass beads. More specifically, a method of depositing a thin film of a metal having high thermal conductivity such as aluminum on the surface of the polyimide film, a solution containing a thermal conductive inorganic filler is applied on the surface of the polyimide film, and the thermal conductivity is high. Examples thereof include a method for forming a layer, a method for sandwiching and integrating a metal foil with a polyimide adhesive film, and a method for dispersing an additive for improving thermal conductivity in the film. Among these, taking into consideration the influence on the thermal behavior of the protective film, durability under high temperature conditions, reusability, aggressiveness to the surface of the heated roll, etc., a method of dispersing the additive in the film is adopted. Is preferred. Examples of the additive include thermally conductive inorganic particles, carbon black, synthetic clay mineral, synthetic mica, and glass beads. These additives will be described below.
熱伝導性無機フィラーとしては、シリカ、アルミナ、ホウ酸アルミニウム、タングステンカーバイト、窒化ケイ素、窒化ホウ素、窒化アルミニウム、チタン酸カリウム、炭酸カルシウム等が挙げられる。これら無機フィラーは、種類によって粒子状、燐片状、針状等、様々な形状を有する。 Examples of the thermally conductive inorganic filler include silica, alumina, aluminum borate, tungsten carbide, silicon nitride, boron nitride, aluminum nitride, potassium titanate, and calcium carbonate. These inorganic fillers have various shapes such as particles, flakes, and needles depending on the type.
前記無機フィラーが粒子状である場合、粒径は10μm以下、好ましくは5μm以下、更に好ましくは1μm以下のものを使用する。無機フィラーが10μmよりも大きい場合、分散不良による局部的なフィラーの凝集が生じると、保護フィルムの表面平滑性に影響を与えるので好ましくない。粒径が10μm以下であれば、多少の凝集があっても表面平滑性の悪化に至りにくいため好ましい。 When the inorganic filler is in the form of particles, a particle size of 10 μm or less, preferably 5 μm or less, more preferably 1 μm or less is used. When the inorganic filler is larger than 10 μm, local aggregation of the filler due to poor dispersion is not preferable because it affects the surface smoothness of the protective film. If the particle size is 10 μm or less, it is preferable that the surface smoothness is hardly deteriorated even if there is some aggregation.
前記無機フィラーが針状や燐片状である場合、その短軸径が5μm以下、好ましくは3μm以下、更に好ましくは1μm以下のものを使用する。5μmよりも大きい場合、粒子状フィラーと同様に保護フィルムの表面平滑性に影響を与えるので好ましくない。短軸径が5μm以下であれば、多少の凝集があっても表面平滑性の悪化に至りにくいため好ましい。 When the inorganic filler is in the form of needles or flakes, those having a minor axis diameter of 5 μm or less, preferably 3 μm or less, more preferably 1 μm or less are used. When it is larger than 5 μm, it is not preferable because it affects the surface smoothness of the protective film in the same manner as the particulate filler. If the minor axis diameter is 5 μm or less, it is preferable that the surface smoothness is hardly deteriorated even if there is some aggregation.
ポリイミドフィルムに対する上記無機フィラーの配合量は、フィラー自体の熱伝導率と、得られるポリイミドフィルムの熱伝導率によって適宜調整するが、ポリイミド樹脂100重量部に対し30〜250重量部であることが好ましく、50〜200重量部であることがより好ましく、50〜180重量部であることが特に好ましい。フィラーの配合量が上記範囲よりも多いと、得られるポリイミドフィルムが脆くなり、保護フィルムとしての使用に支障を生じることがある。逆に上記範囲よりも少ないと、熱伝導率の改良効果が小さく、目的の熱伝導性を有するポリイミドフィルムを得ることが困難となる。 The blending amount of the inorganic filler with respect to the polyimide film is appropriately adjusted according to the thermal conductivity of the filler itself and the thermal conductivity of the obtained polyimide film, but is preferably 30 to 250 parts by weight with respect to 100 parts by weight of the polyimide resin. 50 to 200 parts by weight is more preferable, and 50 to 180 parts by weight is particularly preferable. If the blending amount of the filler is more than the above range, the resulting polyimide film becomes fragile, which may hinder use as a protective film. On the other hand, when the amount is less than the above range, the effect of improving the thermal conductivity is small, and it is difficult to obtain a polyimide film having the desired thermal conductivity.
合成粘土鉱物としては、膨潤性または非膨潤性のもの、更に膨潤性合成粘土鉱物には水に膨潤するもの(親水性)と有機溶剤に膨潤するもの(親油性)がある。このうち、分散性に優れていることから膨潤性合成粘土鉱物が好ましく、その中でもポリイミドの製造工程で有機溶剤を使用することから、親油性合成粘土鉱物が好ましい。また、無機フィラーと同様に、ポリイミドフィルムの表面平滑性に影響することから、粒子径は0.005〜20μmのものを用いるのが好ましく、更に好ましくは0.01〜5μm、特に好ましくは0.01〜1μmのものを用いる。 Synthetic clay minerals are swellable or non-swellable, and swellable synthetic clay minerals are those that swell in water (hydrophilic) and those that swell in organic solvents (lipophilic). Among these, a swellable synthetic clay mineral is preferable because of its excellent dispersibility, and among them, an oleophilic synthetic clay mineral is preferable because an organic solvent is used in the production process of polyimide. Moreover, since it influences the surface smoothness of a polyimide film like an inorganic filler, it is preferable to use a particle diameter of 0.005-20 micrometers, More preferably, 0.01-5 micrometers, Especially preferably, it is 0.00. A thing of 01-1 micrometer is used.
合成雲母についても、合成粘土鉱物と同様、親水性のものと親油性のものがあるが、同様の理由から、親油性のものが好ましい。また、粒子系についても、0.005〜20μmが好ましく、更に好ましくは0.01〜5μm、特に好ましくは0.01〜1μmのものを用いる。ガラスビーズについても、同様の粒子径範囲のものを使用することが好ましい。 Synthetic mica is also hydrophilic and oleophilic, similar to synthetic clay minerals. For the same reason, oleophilic ones are preferred. Further, the particle system is preferably 0.005 to 20 μm, more preferably 0.01 to 5 μm, and particularly preferably 0.01 to 1 μm. It is preferable to use glass beads having a similar particle size range.
ポリイミドフィルムに対するこれら合成粘土鉱物、合成雲母、ガラスビーズの配合量は、添加剤自体の熱伝導率と、得られるポリイミドフィルムの熱伝導率によって適宜調整するが、ポリイミド樹脂100重量部に対し5〜50重量部であることが好ましく、5〜40重量部であることがより好ましく、5〜25重量部であることが特に好ましい。フィラーの配合量が上記範囲よりも多いと、得られるポリイミドフィルムが脆くなり、保護フィルムとしての使用に支障を生じることがある。逆に上記範囲よりも少ないと、熱伝導率の改良効果が小さく、目的の熱伝導性を有するポリイミドフィルムを得ることが困難となる。 The blending amount of these synthetic clay minerals, synthetic mica, and glass beads with respect to the polyimide film is appropriately adjusted depending on the thermal conductivity of the additive itself and the thermal conductivity of the polyimide film to be obtained. The amount is preferably 50 parts by weight, more preferably 5 to 40 parts by weight, and particularly preferably 5 to 25 parts by weight. If the blending amount of the filler is more than the above range, the resulting polyimide film becomes fragile, which may hinder use as a protective film. On the other hand, when the amount is less than the above range, the effect of improving the thermal conductivity is small, and it is difficult to obtain a polyimide film having the desired thermal conductivity.
上記無機フィラー、合成粘土鉱物、合成雲母、ガラスビーズをポリイミドフィルム中に分散、含有させる方法としては、ポリイミドの前駆体であるポリアミド酸に上記添加剤を分散させた後、この混合溶液を用いて製膜、イミド化する方法が挙げられる。ポリアミド酸への添加方法としては、添加剤を固体のまま添加する方法、適当な溶媒中に添加剤を分散させた後、この溶液をホ゜リアミト゛酸へ添加する方法が挙げられるが、添加剤の凝集を防ぐために、後者の方法を採ったほうが好ましい。製膜ならびにイミド化は、上記の手順に従い行うことが可能である。また、上記添加剤の分散性を向上させるために、種々の分散剤を配合しても良い。 As a method of dispersing and containing the inorganic filler, synthetic clay mineral, synthetic mica, and glass beads in the polyimide film, the additive is dispersed in the polyamic acid which is a polyimide precursor, and then this mixed solution is used. Examples of the method include film formation and imidization. Examples of the addition method to the polyamic acid include a method of adding the additive as a solid, and a method of dispersing the additive in a suitable solvent and then adding this solution to the polyamido acid. In order to prevent this, it is preferable to adopt the latter method. Film formation and imidization can be performed according to the above-described procedure. Moreover, in order to improve the dispersibility of the said additive, you may mix | blend various dispersing agents.
本発明の熱ラミネート手段における被積層材料の加熱方式は特に限定されるものではなく、例えば、熱循環方式、熱風加熱方式、誘導加熱方式等、所定の温度で加熱し得る従来公知の方式を採用した加熱手段を用いることができる。同様に、上記熱ラミネート手段における被積層材料の加圧方式も特に限定されるものではなく、例えば、油圧方式、空気圧方式、ギャップ間圧力方式等、所定の圧力を加えることができる従来公知の方式を採用した加圧手段を用いることができる。 The heating method of the material to be laminated in the heat laminating means of the present invention is not particularly limited, and a conventionally known method that can be heated at a predetermined temperature such as a heat circulation method, a hot air heating method, an induction heating method, etc. is adopted. The heating means can be used. Similarly, the pressurization method of the material to be laminated in the heat laminating means is not particularly limited, and a conventionally known method capable of applying a predetermined pressure such as a hydraulic method, a pneumatic method, a gap pressure method, etc. The pressurizing means adopting can be used.
上記熱ラミネート工程における加熱温度、すなわちラミネート温度は、接着フィルムのガラス転移温度(Tg)+50℃以上の温度であることが好ましく、接着フィルムのTg+100℃以上がより好ましい。Tg+50℃以上の温度であれば、接着フィルムと金属箔とを良好に熱ラミネートすることができる。またTg+100℃以上であれば、ラミネート速度を上昇させてその生産性をより向上させることができる。 The heating temperature in the thermal laminating step, that is, the laminating temperature, is preferably a glass transition temperature (Tg) of the adhesive film + 50 ° C. or higher, and more preferably Tg + 100 ° C. or higher of the adhesive film. If it is Tg + 50 degreeC or more temperature, an adhesive film and metal foil can be heat-laminated favorably. Moreover, if it is Tg + 100 degreeC or more, the lamination speed | rate can be raised and the productivity can be improved more.
上記熱ラミネート工程におけるラミネート速度は、1.5m/分以上であることが好ましく、2.0m/分以上であることがより好ましい。1.5m/分以上であれば十分な熱ラミネートが可能になり、2.0m/分以上であれば生産性をより一層向上することができる。本発明において保護フィルムとして使用するポリイミドフィルムは熱伝導率が高いため、通常のポリイミドフィルムを使用する場合と比較して、ラミネート速度の向上が可能となっている。しかし、ラミネート速度を上げすぎると、本発明に使用する保護フィルムでも充分に熱を伝えきれない場合がある。その場合は、加熱ロールの一部に接触させて予め予備加熱を行った方が好ましい。 The laminating speed in the thermal laminating step is preferably 1.5 m / min or more, and more preferably 2.0 m / min or more. If it is 1.5 m / min or more, sufficient thermal lamination is possible, and if it is 2.0 m / min or more, productivity can be further improved. Since the polyimide film used as the protective film in the present invention has high thermal conductivity, the laminating speed can be improved as compared with the case of using a normal polyimide film. However, if the laminating speed is increased too much, the protective film used in the present invention may not be able to transfer heat sufficiently. In that case, it is preferable to perform preliminary heating in contact with a part of the heating roll.
上記熱ラミネート工程における圧力、すなわちラミネート圧力は、高ければ高いほどラミネート温度を低く、かつラミネート速度を速くすることができる利点があるが、一般にラミネート圧力が高すぎると得られる積層板の寸法変化が悪化する傾向がある。また、逆にラミネート圧力が低すぎると得られる積層板の金属箔の接着強度が低くなる。そのためラミネート圧力は、49〜490N/cm(5〜50kgf/cm)の範囲内であることが好ましく、98〜294N/cm(10〜30kgf/cm)の範囲内であることがより好ましい。この範囲内であれば、ラミネート温度、ラミネート速度およびラミネート圧力の三条件を良好なものにすることができ、生産性をより一層向上することができる。 The higher the pressure in the heat laminating step, that is, the laminating pressure, is advantageous in that the laminating temperature can be lowered and the laminating speed can be increased. There is a tendency to get worse. On the other hand, if the lamination pressure is too low, the adhesive strength of the metal foil of the laminate obtained is lowered. Therefore, the lamination pressure is preferably in the range of 49 to 490 N / cm (5 to 50 kgf / cm), and more preferably in the range of 98 to 294 N / cm (10 to 30 kgf / cm). Within this range, the three conditions of the lamination temperature, the lamination speed and the lamination pressure can be made favorable, and the productivity can be further improved.
ラミネート時の金属箔の張力は、0.1〜200N/cm、さらには1〜100N/cm、特には5〜50N/cmが好ましい。張力がこの範囲を下回ると、搬送時にたるみ等が生じるため、外観の良好なフレキシブル金属張積層板を得ることが困難となる場合があり、またこの範囲を上回ると、弾性率の高い金属箔でも張力の影響が大きくなるため、ラミネートの進行方向に沿って金属箔に縦皺が生じ、接着フィルムと均一に圧着することが困難となる場合がある。 The tension of the metal foil during lamination is preferably 0.1 to 200 N / cm, more preferably 1 to 100 N / cm, and particularly preferably 5 to 50 N / cm. If the tension is below this range, sagging may occur during transportation, which may make it difficult to obtain a flexible metal-clad laminate with good appearance. Since the influence of the tension is increased, vertical flaws are generated in the metal foil along the laminating direction, and it may be difficult to uniformly press the adhesive with the adhesive film.
また、ラミネート時の接着フィルム張力は、0.01〜2N/cm、さらには0.02〜1.5N/cm、特には0.05〜1.0N/cmが好ましい。張力がこの範囲を下回ると、搬送時にたるみ等が生じるため、外観の良好なフレキシブル金属張積層板を得ることが困難となる場合があり、またこの範囲を上回ると、接着フィルムがラミネートの進行方向に強く引っ張られた状態でラミネートが行われることになり、縦皺が生じて、金属箔と均一に圧着することが困難となる場合がある。 The adhesive film tension during lamination is preferably 0.01 to 2 N / cm, more preferably 0.02 to 1.5 N / cm, and particularly preferably 0.05 to 1.0 N / cm. If the tension is below this range, sagging may occur during transportation, which may make it difficult to obtain a flexible metal-clad laminate with good appearance. Lamination is performed in a state of being pulled strongly to the surface, causing vertical wrinkles, which may make it difficult to uniformly press the metal foil.
本発明にかかるフレキシブル金属張積層板を得るためには、連続的に被積層材料を加熱しながら圧着する熱ラミネート装置を用いることが好ましいが、この熱ラミネート装置では、熱ラミネート手段の前段に、被積層材料を繰り出す被積層材料繰出手段を設けてもよいし、熱ラミネート手段の後段に、被積層材料を巻き取る被積層材料巻取手段を設けてもよい。これらの手段を設けることで、上記熱ラミネート装置の生産性をより一層向上させることができる。上記被積層材料繰出手段および被積層材料巻取手段の具体的な構成は特に限定されるものではなく、例えば、接着フィルムや金属箔、あるいは得られる積層板を巻き取ることのできる公知のロール状巻取機等を挙げることができる。 In order to obtain the flexible metal-clad laminate according to the present invention, it is preferable to use a thermal laminating apparatus that continuously press-bonds the material to be laminated while heating, but in this thermal laminating apparatus, before the thermal laminating means, A laminated material feeding means for feeding the laminated material may be provided, or a laminated material winding means for winding the laminated material may be provided after the thermal laminating means. By providing these means, the productivity of the thermal laminating apparatus can be further improved. The specific configuration of the laminated material feeding means and the laminated material winding means is not particularly limited, and for example, an adhesive film, a metal foil, or a known roll shape capable of winding up the obtained laminated plate A winder etc. can be mentioned.
さらに、保護フィルムを巻き取ったり繰り出したりする保護フィルム巻取手段や保護フィルム繰出手段を設けると、より好ましい。これら保護フィルム巻取手段・保護フィルム繰出手段を備えていれば、熱ラミネート工程で、一度使用された保護フィルムを巻き取って繰り出し側に再度設置することで、保護フィルムを再使用することができる。また、保護フィルムを巻き取る際に、保護フィルムの両端部を揃えるために、端部位置検出手段および巻取位置修正手段を設けてもよい。これによって、精度よく保護フィルムの端部を揃えて巻き取ることができるので、再使用の効率を高めることができる。なお、これら保護フィルム巻取手段、保護フィルム繰出手段、端部位置検出手段および巻取位置修正手段の具体的な構成は特に限定されるものではなく、従来公知の各種装置を用いることができる。 Furthermore, it is more preferable to provide a protective film winding means or a protective film feeding means for winding or feeding the protective film. If these protective film winding means and protective film feeding means are provided, the protective film can be reused by winding the protective film once used in the heat laminating step and installing it again on the feeding side. . Moreover, when winding up a protective film, in order to align the both ends of a protective film, you may provide an edge part position detection means and a winding position correction means. Thereby, since the edge part of a protective film can be aligned and wound accurately, the efficiency of reuse can be improved. The specific configurations of the protective film winding means, the protective film feeding means, the end position detecting means, and the winding position correcting means are not particularly limited, and various conventionally known devices can be used.
本発明にかかる製造方法によって得られるフレキシブル金属張積層板は、前述したように、金属箔をエッチングして所望のパターン配線を形成すれば、各種の小型化、高密度化された部品を実装したフレキシブル配線板として用いることができる。もちろん、本発明の用途はこれに限定されるものではなく、金属箔を含む積層体であれば、種々の用途に利用できることはいうまでもない。 As described above, the flexible metal-clad laminate obtained by the manufacturing method according to the present invention can be mounted with various miniaturized and high-density components by forming a desired pattern wiring by etching the metal foil. It can be used as a flexible wiring board. Of course, the application of the present invention is not limited to this, and it goes without saying that it can be used for various applications as long as it is a laminate including a metal foil.
以下、実施例により本発明を具体的に説明するが、本発明はこれら実施例のみに限定されるものではない。 EXAMPLES Hereinafter, although an Example demonstrates this invention concretely, this invention is not limited only to these Examples.
なお、合成例、実施例及び比較例におけるポリイミドフィルムの熱伝導率、接着フィルムのガラス転移温度、金属箔引き剥し強度の評価法は次の通りである。 In addition, the evaluation methods of the thermal conductivity of the polyimide film, the glass transition temperature of the adhesive film, and the metal foil peel strength in the synthesis examples, examples, and comparative examples are as follows.
(熱伝導率)
熱伝導率は、真空理工株式会社製TC−7000を測定装置として使用し、25℃、真空中(圧力;約1×10-2Torr)でレーザーフラッシュ法によって、フィルム厚み方向の熱伝導率を評価した。
(Thermal conductivity)
The thermal conductivity is TC-7000 manufactured by Vacuum Riko Co., Ltd. as a measuring device, and the thermal conductivity in the film thickness direction is measured by a laser flash method in a vacuum (pressure: about 1 × 10 −2 Torr) at 25 ° C. evaluated.
(ガラス転移温度)
ガラス転移温度は、セイコーインスツルメンツ社製 DMS200により、昇温速度3℃/分にて、室温から400℃までの温度範囲で測定し、貯蔵弾性率の変曲点をガラス転移温度とした。
(Glass-transition temperature)
The glass transition temperature was measured with a DMS200 manufactured by Seiko Instruments Inc. at a temperature rising rate of 3 ° C./min in a temperature range from room temperature to 400 ° C., and the inflection point of the storage elastic modulus was taken as the glass transition temperature.
(金属箔の引き剥がし強度:接着強度)
JIS C6471の「6.5 引きはがし強さ」に従って、サンプルを作製し、5mm幅の金属箔部分を、180度の剥離角度、50mm/分の条件で剥離し、その荷重を測定した。
(Stripping strength of metal foil: Adhesive strength)
A sample was prepared according to “6.5 Peel Strength” of JIS C6471, and a 5 mm wide metal foil part was peeled off at a peeling angle of 180 degrees and 50 mm / min, and the load was measured.
(合成例1;保護フィルムに用いるポリイミドフィルムの合成)
10℃に冷却したN,N−ジメチルホルムアミド(以下、DMFともいう)236kgに4,4’−ジアミノジフェニルエーテル(以下、ODAともいう)25.8kgを溶解した後、ピロメリット酸二無水物(以下、PMDAともいう)27.4kgを添加し1時間撹拌して溶解させた。
別途調製しておいたPMDAのDMF溶液(PMDA:DMF=0.90kg:10.2kg)を上記反応液に徐々に添加し、粘度が3000ポイズ程度に達したところで添加を止めた。1時間撹拌を行って固形分濃度18重量%、23℃での回転粘度が3400ポイズのポリアミド酸溶液を得た。
(Synthesis Example 1: Synthesis of polyimide film used for protective film)
After dissolving 25.8 kg of 4,4′-diaminodiphenyl ether (hereinafter, also referred to as ODA) in 236 kg of N, N-dimethylformamide (hereinafter also referred to as DMF) cooled to 10 ° C., pyromellitic dianhydride (hereinafter, referred to as “DM”). 27.4 kg) was added and stirred for 1 hour to dissolve.
A separately prepared DMF solution of PMDA (PMDA: DMF = 0.90 kg: 10.2 kg) was gradually added to the reaction solution, and the addition was stopped when the viscosity reached about 3000 poise. Stirring was conducted for 1 hour to obtain a polyamic acid solution having a solid content concentration of 18% by weight and a rotational viscosity at 23 ° C. of 3400 poise.
一方、DMFに窒化ホウ素(UHP−S1,昭和電工社製)を添加した溶液をホモジナイザイーで分散させ、窒化ホウ素分散液を調整した(固形分濃度18重量%)。この窒化ホウ素分散液を、上記ポリアミド酸溶液100重量部に対して70重量部添加し、撹拌を行った。 On the other hand, a solution obtained by adding boron nitride (UHP-S1, manufactured by Showa Denko KK) to DMF was dispersed with a homogenizer to prepare a boron nitride dispersion (solid content concentration: 18% by weight). 70 parts by weight of this boron nitride dispersion was added to 100 parts by weight of the polyamic acid solution and stirred.
このポリアミド酸溶液に、無水酢酸/イソキノリン/DMF(重量比4.0/1.0/4.0)からなる硬化剤をポリアミド酸溶液に対して重量比25%で添加し、連続的にミキサーで攪拌しTダイから押出してダイの下20mmを走行しているステンレス製のエンドレスベルト上に流延した。この樹脂膜を130℃×100秒で加熱した後エンドレスベルトから自己支持性のゲル膜を引き剥がして(揮発分含量30重量%)テンタークリップに固定し、300℃×50秒、400℃×50秒、500℃×50秒で乾燥・イミド化させ75μm厚のポリイミドフィルムを得た。 A curing agent composed of acetic anhydride / isoquinoline / DMF (weight ratio 4.0 / 1.0 / 4.0) was added to the polyamic acid solution at a weight ratio of 25% with respect to the polyamic acid solution, and the mixture was continuously mixed. And then extruded from a T die and cast onto a stainless steel endless belt running 20 mm below the die. This resin film is heated at 130 ° C. for 100 seconds, and then the self-supporting gel film is peeled off from the endless belt (volatile content 30% by weight) and fixed to the tenter clip, 300 ° C. × 50 seconds, 400 ° C. × 50 The film was dried and imidized at 500 ° C. for 50 seconds to obtain a 75 μm thick polyimide film.
(合成例2;保護フィルムに用いるポリイミドフィルムの合成)
DMFに合成粘土鉱物(親油性スメクタイト(STN),コープケミカル株式会社製)を添加した溶液をホモジナイザイーで分散させ、スメクタイト分散液を調整した(固形分濃度18重量%)。窒化ホウ素分散液の代わりに、このスメクタイト分散液をポリアミド酸溶液100重量部に対して20重量部添加する以外は合成例1と同様の操作を行い、75μm厚のポリイミドフィルムを得た。
(Synthesis Example 2: Synthesis of polyimide film used for protective film)
A solution obtained by adding synthetic clay mineral (lipophilic smectite (STN), manufactured by Co-op Chemical Co., Ltd.) to DMF was dispersed with a homogenizer to prepare a smectite dispersion (solid content concentration: 18% by weight). A 75 μm-thick polyimide film was obtained in the same manner as in Synthesis Example 1 except that 20 parts by weight of this smectite dispersion was added to 100 parts by weight of the polyamic acid solution instead of the boron nitride dispersion.
(合成例3;保護フィルムに用いるポリイミドフィルムの合成)
DMFに合成雲母(ソマシフ(ME−100),コープケミカル株式会社製)を添加した溶液をホモジナイザイーで分散させ、合成雲母分散液を調整した(固形分濃度18重量%)。窒化ホウ素分散液の代わりに、この合成雲母分散液をポリアミド酸溶液100重量部に対して20重量部添加する以外は合成例1と同様の操作を行い、75μm厚のポリイミドフィルムを得た。
(Synthesis Example 3: Synthesis of polyimide film used for protective film)
A solution obtained by adding synthetic mica (Somasif (ME-100), manufactured by Co-op Chemical Co., Ltd.) to DMF was dispersed with a homogenizer to prepare a synthetic mica dispersion (solid content concentration: 18% by weight). A 75 μm-thick polyimide film was obtained in the same manner as in Synthesis Example 1 except that 20 parts by weight of this synthetic mica dispersion was added to 100 parts by weight of the polyamic acid solution instead of the boron nitride dispersion.
(合成例4;保護フィルムに用いるポリイミドフィルムの合成)
DMFにガラスビーズ(東芝ガラスビーズ(MB−10),東芝バロティーニ株式会社製)を添加した溶液をホモジナイザイーで分散させ、ガラスビーズ分散液を調整した(固形分濃度18重量%)。窒化ホウ素分散液の代わりに、このガラスビーズ分散液をポリアミド酸溶液100重量部に対して20重量部添加する以外は合成例1と同様の操作を行い、75μm厚のポリイミドフィルムを得た。
(Synthesis Example 4: Synthesis of polyimide film used for protective film)
A solution in which glass beads (Toshiba glass beads (MB-10), manufactured by Toshiba Barotini Co., Ltd.) were added to DMF was dispersed with a homogenizer to prepare a glass bead dispersion (solid content concentration: 18% by weight). A 75 μm-thick polyimide film was obtained in the same manner as in Synthesis Example 1 except that 20 parts by weight of this glass bead dispersion was added to 100 parts by weight of the polyamic acid solution instead of the boron nitride dispersion.
(合成例5;保護フィルムに用いるポリイミドフィルムの合成)
窒化ホウ素分散液を添加しない以外は合成例1と同様の操作を行い、75μm厚のポリイミドフィルムを得た。
(Synthesis Example 5: Synthesis of polyimide film used for protective film)
Except for not adding the boron nitride dispersion, the same operation as in Synthesis Example 1 was performed to obtain a 75 μm-thick polyimide film.
(合成例6;保護フィルムに用いるポリイミドフィルムの合成)
窒化ホウ素分散液をポリアミド酸溶液100重量部に対して3重量部添加する以外は合成例1と同様の操作を行い、75μm厚のポリイミドフィルムを得た。
(Synthesis Example 6; synthesis of polyimide film used for protective film)
Except for adding 3 parts by weight of the boron nitride dispersion to 100 parts by weight of the polyamic acid solution, the same operation as in Synthesis Example 1 was performed to obtain a 75 μm thick polyimide film.
(実施例1)
接着層のガラス転移温度が240℃である両面接着フィルム(PIXEO HC−142,鐘淵化学工業社製)の両側に、18μm厚の圧延銅箔(BHY−22B−T,ジャパンエナジー社製)を配し、更にその上下に保護フィルムとして、合成例1で得られたポリイミドフィルムを配して、接着フィルムの張力0.4N/cm、ラミネート温度380℃、ラミネート圧力196N/cm(20kgf/cm)、ラミネート速度2.5m/分の条件で連続的に熱ラミネートを行った。ラミネート後、両側の保護フィルムを剥離し、フレキシブル銅張積層板を得た。
(Example 1)
On both sides of a double-sided adhesive film (PIXEO HC-142, Kaneka Chemical Co., Ltd.) whose glass transition temperature of the adhesive layer is 240 ° C., 18 μm thick rolled copper foil (BHY-22B-T, Japan Energy Co., Ltd.) Further, the polyimide film obtained in Synthesis Example 1 is disposed as protective films on the upper and lower sides thereof, the adhesive film tension is 0.4 N / cm, the laminating temperature is 380 ° C., and the laminating pressure is 196 N / cm (20 kgf / cm). Then, heat lamination was continuously performed under the condition of a lamination speed of 2.5 m / min. After lamination, the protective films on both sides were peeled off to obtain a flexible copper clad laminate.
(実施例2)
保護フィルムとして、合成例2で得られたポリイミドフィルムを用いる以外は実施例1と同様の操作を行い、フレキシブル銅張積層板を得た。
(Example 2)
As a protective film, the same operation as in Example 1 was performed except that the polyimide film obtained in Synthesis Example 2 was used to obtain a flexible copper-clad laminate.
(実施例3)
保護フィルムとして、合成例3で得られたポリイミドフィルムを用いる以外は実施例1と同様の操作を行い、フレキシブル銅張積層板を得た。
(Example 3)
A flexible copper-clad laminate was obtained by performing the same operation as in Example 1 except that the polyimide film obtained in Synthesis Example 3 was used as the protective film.
(実施例4)
保護フィルムとして、合成例4で得られたポリイミドフィルムを用いる以外は実施例1と同様の操作を行い、フレキシブル銅張積層板を得た。
Example 4
As a protective film, the same operation as in Example 1 was performed except that the polyimide film obtained in Synthesis Example 4 was used to obtain a flexible copper-clad laminate.
(比較例1)
保護フィルムとして、合成例5で得られたポリイミドフィルムを用いる以外は実施例1と同様の操作を行い、フレキシブル銅張積層板を得た。
(Comparative Example 1)
As a protective film, the same operation as in Example 1 was performed except that the polyimide film obtained in Synthesis Example 5 was used to obtain a flexible copper-clad laminate.
(比較例2)
保護フィルムとして、合成例6で得られたポリイミドフィルムを用いる以外は実施例1と同様の操作を行い、フレキシブル銅張積層板を得た。
(Comparative Example 2)
As a protective film, the same operation as in Example 1 was performed except that the polyimide film obtained in Synthesis Example 6 was used to obtain a flexible copper-clad laminate.
各実施例、比較例で得られたフレキシブル金属張積層板の特性を評価した結果を表1に示す。 Table 1 shows the results of evaluating the characteristics of the flexible metal-clad laminates obtained in the examples and comparative examples.
比較例1及び2に示すように、保護フィルムの熱伝導率が0.3W/m・K未満である場合、高いラミネート速度ではロールの熱が材料に十分に伝わらず、得られるフレキシブル金属張積層板の接着強度が劣る結果となった。これに対し、熱伝導率の高い保護フィルムを使用した実施例1〜4では、充分な接着強度を有するフレキシブル金属張積層板が得られた。
As shown in Comparative Examples 1 and 2, when the thermal conductivity of the protective film is less than 0.3 W / m · K, the heat of the roll is not sufficiently transferred to the material at a high lamination speed, and the resulting flexible metal-clad laminate is obtained. The result was that the adhesive strength of the plate was inferior. On the other hand, in Examples 1-4 using a protective film with high thermal conductivity, a flexible metal-clad laminate having sufficient adhesive strength was obtained.
Claims (4)
A flexible metal-clad laminate obtained by the production method according to claim 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004123573A JP4410021B2 (en) | 2004-04-19 | 2004-04-19 | Method for producing flexible metal-clad laminate with improved productivity and flexible metal-clad laminate obtained thereby |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004123573A JP4410021B2 (en) | 2004-04-19 | 2004-04-19 | Method for producing flexible metal-clad laminate with improved productivity and flexible metal-clad laminate obtained thereby |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005305729A true JP2005305729A (en) | 2005-11-04 |
JP4410021B2 JP4410021B2 (en) | 2010-02-03 |
Family
ID=35435042
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004123573A Expired - Lifetime JP4410021B2 (en) | 2004-04-19 | 2004-04-19 | Method for producing flexible metal-clad laminate with improved productivity and flexible metal-clad laminate obtained thereby |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4410021B2 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008014859A (en) * | 2006-07-07 | 2008-01-24 | Fujifilm Corp | Radiation image conversion panel and method for manufacturing radiation image conversion panel |
JP2008302569A (en) * | 2007-06-07 | 2008-12-18 | Ube Ind Ltd | Manufacturing method of laminated body of parting agent and one side metal leaf laminated resin film, and one side metal leaf laminated film |
WO2009008029A1 (en) * | 2007-07-10 | 2009-01-15 | Mitsui Chemicals, Inc. | Circuit substrate |
KR20170113092A (en) | 2016-03-30 | 2017-10-12 | 제이엑스금속주식회사 | Copper foil, copper-clad laminate, and flexible printed wiring board and electronic device |
JPWO2017209060A1 (en) * | 2016-06-03 | 2019-02-21 | 株式会社有沢製作所 | Method for producing flexible metal-clad laminate |
US10461234B2 (en) | 2016-09-29 | 2019-10-29 | Nichia Corporation | Metal-base substrate, semiconductor device and method for manufacturing the same |
-
2004
- 2004-04-19 JP JP2004123573A patent/JP4410021B2/en not_active Expired - Lifetime
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008014859A (en) * | 2006-07-07 | 2008-01-24 | Fujifilm Corp | Radiation image conversion panel and method for manufacturing radiation image conversion panel |
JP2008302569A (en) * | 2007-06-07 | 2008-12-18 | Ube Ind Ltd | Manufacturing method of laminated body of parting agent and one side metal leaf laminated resin film, and one side metal leaf laminated film |
WO2009008029A1 (en) * | 2007-07-10 | 2009-01-15 | Mitsui Chemicals, Inc. | Circuit substrate |
JP2010533362A (en) * | 2007-07-10 | 2010-10-21 | 三井化学株式会社 | Circuit board |
KR20170113092A (en) | 2016-03-30 | 2017-10-12 | 제이엑스금속주식회사 | Copper foil, copper-clad laminate, and flexible printed wiring board and electronic device |
JPWO2017209060A1 (en) * | 2016-06-03 | 2019-02-21 | 株式会社有沢製作所 | Method for producing flexible metal-clad laminate |
JP2020104517A (en) * | 2016-06-03 | 2020-07-09 | 株式会社有沢製作所 | Method for manufacturing flexible metal-clad laminated plate |
US10461234B2 (en) | 2016-09-29 | 2019-10-29 | Nichia Corporation | Metal-base substrate, semiconductor device and method for manufacturing the same |
US11018288B2 (en) | 2016-09-29 | 2021-05-25 | Nichsa Corporation | Metal-base substrate and semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JP4410021B2 (en) | 2010-02-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101550005B1 (en) | Multilayer polyimide film, laminate and metal-clad laminate | |
JPWO2005111165A1 (en) | Method for producing adhesive film | |
WO2006033267A1 (en) | Novel polyimide film and adhesive film and flexible metal-clad laminate both obtained with the same | |
JPWO2007108284A1 (en) | Adhesive film | |
JP2006306973A (en) | New polyimide film, adhesive film given by using the same, and flexible metal clad sheet | |
JP4410021B2 (en) | Method for producing flexible metal-clad laminate with improved productivity and flexible metal-clad laminate obtained thereby | |
JP4551094B2 (en) | Adhesive film, flexible metal-clad laminate with improved dimensional stability obtained therefrom, and method for producing the same | |
JP5620093B2 (en) | Method for producing flexible metal-clad laminate with improved dimensional stability and flexible metal-clad laminate obtained thereby | |
JP4271563B2 (en) | Method for producing flexible metal-clad laminate | |
JP2005199481A (en) | Adhesive film and flexible metal clad laminated sheet enhanced in dimensional stability obtained therefrom | |
JP2007098672A (en) | One side metal-clad laminate | |
JP2005186574A (en) | Method for manufacturing adhesive sheet, adhesive sheet and flexible metal clad laminated plate made by using the same | |
JP2005178242A (en) | Method for producing flexible metal-clad laminated plate improved in dimensional stability | |
JP4838509B2 (en) | Method for producing flexible metal-clad laminate | |
JP2005305968A (en) | Manufacturing method of adhesive film | |
JP2008272958A (en) | Method for producing single-sided metal clad laminate | |
JP2007230019A (en) | Manufacturing method of metal clad laminated sheet | |
JP2005193542A (en) | Manufacturing method of flexible metal clad laminated sheet enhanced in dimensional stability and flexible metal clad laminated sheet obtained thereby | |
JP2006291150A (en) | Heat resistant adhesive sheet | |
JP4663976B2 (en) | Method for producing flexible metal-clad laminate with improved dimensional stability | |
JP5918822B2 (en) | Method for producing flexible metal-clad laminate with improved dimensional stability and flexible metal-clad laminate obtained thereby | |
JP4516769B2 (en) | Method for producing semi-additive metal-clad laminate and semi-additive metal-clad laminate obtained thereby | |
JP2005193541A (en) | Manufacturing method of flexible metal clad laminated sheet enhanced in dimensional stability and flexible metal clad laminated sheet obtained thereby | |
JP2007313854A (en) | Copper-clad laminated sheet | |
JP2006316232A (en) | Adhesive film and its preparation process |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20070226 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20090825 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090901 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20091016 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20091110 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20091112 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 Ref document number: 4410021 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121120 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131120 Year of fee payment: 4 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131120 Year of fee payment: 4 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term |