JP2005294310A5 - - Google Patents

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Publication number
JP2005294310A5
JP2005294310A5 JP2004103051A JP2004103051A JP2005294310A5 JP 2005294310 A5 JP2005294310 A5 JP 2005294310A5 JP 2004103051 A JP2004103051 A JP 2004103051A JP 2004103051 A JP2004103051 A JP 2004103051A JP 2005294310 A5 JP2005294310 A5 JP 2005294310A5
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JP
Japan
Prior art keywords
energy beam
chamber
irradiated
beam irradiation
irradiation apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004103051A
Other languages
English (en)
Japanese (ja)
Other versions
JP4406311B2 (ja
JP2005294310A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004103051A priority Critical patent/JP4406311B2/ja
Priority claimed from JP2004103051A external-priority patent/JP4406311B2/ja
Publication of JP2005294310A publication Critical patent/JP2005294310A/ja
Publication of JP2005294310A5 publication Critical patent/JP2005294310A5/ja
Application granted granted Critical
Publication of JP4406311B2 publication Critical patent/JP4406311B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2004103051A 2004-03-31 2004-03-31 エネルギー線照射装置およびそれを用いたパタン作成方法 Expired - Lifetime JP4406311B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004103051A JP4406311B2 (ja) 2004-03-31 2004-03-31 エネルギー線照射装置およびそれを用いたパタン作成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004103051A JP4406311B2 (ja) 2004-03-31 2004-03-31 エネルギー線照射装置およびそれを用いたパタン作成方法

Publications (3)

Publication Number Publication Date
JP2005294310A JP2005294310A (ja) 2005-10-20
JP2005294310A5 true JP2005294310A5 (enExample) 2007-04-19
JP4406311B2 JP4406311B2 (ja) 2010-01-27

Family

ID=35326950

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004103051A Expired - Lifetime JP4406311B2 (ja) 2004-03-31 2004-03-31 エネルギー線照射装置およびそれを用いたパタン作成方法

Country Status (1)

Country Link
JP (1) JP4406311B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5082050B2 (ja) * 2006-09-28 2012-11-28 株式会社日立製作所 電子線照射装置
JP6049627B2 (ja) * 2010-11-13 2016-12-21 マッパー・リソグラフィー・アイピー・ビー．ブイ． 中間チャンバを備えた荷電粒子リソグラフィシステム
US11348756B2 (en) 2012-05-14 2022-05-31 Asml Netherlands B.V. Aberration correction in charged particle system
NL2010797C2 (en) 2012-05-14 2014-08-21 Mapper Lithography Ip Bv Charged particle lithography system and beam generator.
US10586625B2 (en) 2012-05-14 2020-03-10 Asml Netherlands B.V. Vacuum chamber arrangement for charged particle beam generator

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