JP2005292448A - Color filter - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a color filter of high quality where a columnar spacer formed on an ITO layer never peels off. <P>SOLUTION: The color filter is provided with: a base material; a light shielding part formed on the base material, a photo initiator containing layer formed so as to cover the base material and the light shielding part, and containing photo initiator and organopolysiloxane; a plurality of color layers formed on the photo initiator containing layer; the ITO layer formed so as to cover the color layers; and the columnar spacer formed on the ITO layer on the area where the light shielding part is formed. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a color filter suitable for a color liquid crystal display, which is obtained by coloring a colored layer by an inkjet method.

  In recent years, with the development of personal computers, especially portable personal computers, the demand for liquid crystal displays, particularly color liquid crystal displays, has been increasing. However, since this color liquid crystal display is expensive, there is an increasing demand for cost reduction, and in particular, there is a high demand for cost reduction for a color filter having a high specific gravity.

  In such a color filter, it is usually provided with coloring patterns of three primary colors of red (R), green (G), and blue (B), and electrodes corresponding to the respective pixels of R, G, and B are turned on, By turning it off, the liquid crystal operates as a shutter, and light passes through each of the R, G, and B pixels, and color display is performed.

  Here, in the general color filter, an ITO layer is formed as a transparent electrode on the colored layer, and a liquid crystal display device is formed on the ITO layer. Columnar spacers are provided for keeping the gaps constant. Usually, the columnar spacer is formed on the ITO layer on the region where the light shielding portion is formed. For example, when the light shielding portion is a resin light shielding portion, the light shielding portion and the inorganic material are used. There was a problem that the adhesion with the ITO layer as a layer was poor and the columnar spacer formed on the ITO layer was easily peeled off. In addition, a colored layer or a protective layer may be formed between the ITO layer in the region where the columnar spacer is formed and the light shielding portion. In this case, if the light shielding portion is made of a metal material, the colored layer In addition, the adhesion between the protective layer and the light shielding portion is poor, and there is a problem that the columnar spacer formed on the ITO layer is easily peeled off.

  Therefore, it is desired to provide a high-quality color filter in which the columnar spacer formed on the ITO layer is not peeled off.

  The present invention includes a base material, a light-shielding portion formed on the base material, a photocatalyst-containing layer formed so as to cover the base material and the light-shielding portion, and containing a photocatalyst and an organopolysiloxane, and the photocatalyst-containing material A plurality of colored layers formed on the layer; an ITO layer formed so as to cover the colored layer; and a columnar spacer formed on the ITO layer on the region where the light shielding portion is formed. A color filter is provided.

  According to the present invention, since the photocatalyst-containing layer contains a photocatalyst that is an inorganic material and an organopolysiloxane that is an organic material, the member adjacent to the photocatalyst-containing layer may be made of an organic material. Even if it consists of an inorganic material, the photocatalyst containing layer and the adhesiveness can be made good. Therefore, since the adhesion between the members bonded through the photocatalyst-containing layer can be improved, the columnar spacers formed on the ITO layer are stably supported, and the columnar spacers are peeled off. Thus, a high-quality color filter can be obtained.

  In the said invention, it has a gap | interval between two said adjacent colored layers, and the said columnar spacer shall be formed on the ITO layer formed on the said gap | interval. In this case, the columnar spacer is formed on the region where the light shielding portion, the photocatalyst containing layer, and the ITO layer are laminated. At this time, for example, even if the light shielding portion is a resin light shielding portion, the light shielding portion is adhered to the ITO layer via the photocatalyst containing layer, so that the adhesion between the light shielding portion and the ITO layer can be improved. . Thereby, the columnar spacer formed on the ITO layer is stably supported, and a color filter in which the columnar spacer is not peeled off can be obtained.

  In the above invention, there is a gap between two adjacent colored layers, and the columnar spacer is formed on the gap and on the ITO layer formed on the colored layer. be able to. In this case, the columnar spacer is formed so as to cover the region where the light shielding part, the photocatalyst containing layer and the ITO layer are laminated, and the region where the light shielding part, the photocatalyst containing layer, the coloring layer and the ITO layer are laminated. It will be. At this time, since the photocatalyst-containing layer is formed, even if the light shielding part is a resin light shielding part, for example, the adhesion between the ITO layer and the light shielding part can be improved. For example, even if the light shielding part is made of an inorganic material, the adhesion between the light shielding part and the colored layer can be improved. Therefore, even if the light shielding portion is made of an inorganic material or an organic material, the columnar spacer formed on the ITO layer can be stably supported, and the columnar spacer is peeled off. It is possible to obtain a high-quality color filter without the like.

  Moreover, in the said invention, the said columnar spacer shall be formed on the ITO layer formed on the said colored layer. In a general color filter, when the light-shielding portion is made of an inorganic material, the adhesion with the colored layer made of an organic material is poor, and the columnar shape formed on the ITO layer formed on the colored layer Although the strength of the spacer is low, according to the present invention, since the light shielding portion and the colored layer are bonded via the photocatalyst containing layer, even if the light shielding portion is made of an inorganic material, the colored layer It is possible to improve the adhesiveness between the light-shielding portion and the columnar spacer formed on the ITO layer.

  Furthermore, in the said invention, the protective layer is formed so that the said colored layer and the said light-shielding part may be covered, and the ITO layer may be formed on the said protective layer. In this case, since the photocatalyst-containing layer is formed, the adhesion between the light shielding part and the colored layer or the light shielding part and the protective layer can be improved, and the columnar spacer formed on the ITO layer It is possible to improve the adhesiveness of the.

  According to the present invention, since the adhesion between members bonded via the photocatalyst-containing layer can be improved, the columnar spacer formed on the ITO layer is stably supported, and the columnar spacer There is an effect that it is possible to obtain a high-quality color filter that does not peel off.

  The present invention relates to a color filter suitable for a color liquid crystal display obtained by coloring a colored layer by an inkjet method.

  The color filter of the present invention includes a base material, a light shielding part formed on the base material, a photocatalyst containing layer formed to cover the base material and the light shielding part, and containing a photocatalyst and an organopolysiloxane, A plurality of colored layers formed on the photocatalyst-containing layer, an ITO layer formed so as to cover the colored layer, and a columnar spacer formed on the ITO layer on the region where the light shielding portion is formed; There are three embodiments.

  In any embodiment, the color filter of the present invention covers, for example, as shown in FIG. 1, a base material 1, a light shielding part 2 formed on the base material 1, the light shielding part 2 and the base material. The photocatalyst containing layer 3 formed in this way, the colored layer 4 formed on the photocatalyst containing layer 3, the ITO layer 5 formed on the colored layer 4, and the columnar spacer formed on the ITO layer 6.

  Here, in a general color filter, the columnar spacer is formed on a region where the light shielding portion and the ITO layer are laminated, or on a region where the light shielding portion, the coloring layer, and the ITO layer are laminated. . Therefore, when the adhesiveness of each member in the region where the columnar spacer is formed is low, the columnar spacer cannot be stably supported, and the columnar spacer is easily peeled off.

  In any aspect, the color filter of the present invention has a photocatalyst-containing layer, and this photocatalyst-containing layer contains an organopolysiloxane that is an organic material and a photocatalyst that is an inorganic material. Even if the adjacent member is made of an organic material or an inorganic material, it can have good adhesiveness. Therefore, the adhesion between the members formed via the photocatalyst-containing layer can be made good, and the adhesion of the columnar spacer formed on the ITO layer can be made good.

In addition, the photocatalyst-containing layer can change the wettability of the surface by the action of the photocatalyst accompanying energy irradiation. Therefore, using this difference in wettability of the surface of the photocatalyst-containing layer, the colored layer can be easily formed by an inkjet method or the like, and a color filter having a high-definition colored layer can also be obtained. It is.
Hereinafter, each embodiment will be described in detail.

1. First Embodiment First, a first embodiment of the color filter of the present invention will be described. 1st embodiment of the color filter of this invention is formed so that a base material, the said light-shielding part formed on the said base material, the said base material and the said light-shielding part may be covered, and contains a photocatalyst and organopolysiloxane. A photocatalyst-containing layer, a plurality of colored layers formed on the photocatalyst-containing layer, an ITO layer formed so as to cover the colored layer, and formed on the ITO layer on the region where the light shielding portion is formed The columnar spacers have a gap between the adjacent colored layers, and the columnar spacers are formed on the ITO layer formed on the gap.

  In this embodiment, since a gap is formed between adjacent colored layers, the columnar spacer is formed by stacking a light shielding portion 2, a photocatalyst containing layer 3 and an ITO layer 5 as shown in FIG. Will be formed. In a general color filter, when the light shielding portion and the ITO layer are laminated, if the light shielding portion is a resin light shielding portion, the adhesion with the ITO layer made of an inorganic material is poor, and the There is a problem that the columnar spacers are easily peeled off because the strength to support the columnar spacers formed on the substrate is low.

  On the other hand, in this embodiment, since the photocatalyst containing layer is formed between the light shielding part and the ITO layer, the adhesion between the light shielding part and the ITO layer is improved by the photocatalyst containing layer. In addition, the adhesion of the columnar spacer formed on the ITO layer can be improved.

  Here, in this embodiment, for example, as shown in FIG. 2, a gap is formed between adjacent colored layers 4, and columnar spacers 6 are formed on the gap and on the colored layer 4. It may be formed on the layer 5. In a general color filter having such a configuration, when the light shielding portion is a resin light shielding portion, as described above, the adhesion between the light shielding portion and the ITO layer is poor. Moreover, when the light shielding part is made of an inorganic material, the adhesion between the light shielding part and the colored layer is poor. Therefore, even when the light shielding portion is made of an organic material or an inorganic material, there is a problem that the strength of supporting the columnar spacer formed on the ITO layer is low and the columnar spacer is easily peeled off. is there.

However, in this embodiment, since the photocatalyst-containing layer is formed, even if the light shielding part is a resin light shielding part, the adhesion between the light shielding part and the ITO layer can be improved. Even when the light shielding part is made of an inorganic material, the adhesion between the light shielding part and the colored layer can be improved. Therefore, even when the light shielding portion is made of an organic material or an inorganic material, the columnar spacer formed on the ITO layer can be stably supported, and the columnar spacer is peeled off. There can be no high-quality color filter.
Hereinafter, each configuration of this embodiment will be described in detail.

(Columnar spacer)
First, the columnar spacer used in this embodiment will be described. The columnar spacer used in the present embodiment is formed on the ITO layer laminated with the light shielding portion via the photocatalyst containing layer, and when the color filter of the present embodiment is used in a liquid crystal display device, There is no particular limitation as long as the gap between the opposing substrate and the opposing substrate can be set to a predetermined distance. For example, as the shape of such a columnar spacer, for example, a columnar shape or a prismatic shape, a conical shape with a truncated top portion, a pyramidal shape, or the like can be used.

  In addition, such a columnar spacer can usually be formed by forming a negative photosensitive resin layer on an ITO layer described later and patterning the photosensitive resin layer. This photosensitive resin layer is formed by optimizing the viscosity of a known negative photosensitive resin composition, and then forming an ITO layer by a known means such as a spin coater, a roll coater, a die coater, or an ink jet. It can be formed by coating and drying so as to cover. At this time, the thickness of the photosensitive resin layer can be appropriately set according to the height required for the columnar spacer. The patterning of the photosensitive resin layer can be performed by exposing through a photomask for forming columnar spacers. The photomask used may be one having an opening at a predetermined position for forming columnar spacers. Thereafter, the photosensitive resin layer is developed with a developer, whereby the columnar spacer is formed without dissolving the photosensitive resin layer in the region where the columnar spacer is to be formed.

(Photocatalyst containing layer)
Next, the photocatalyst containing layer used in this embodiment will be described. The photocatalyst-containing layer used in the present embodiment contains a photocatalyst and an organopolysiloxane, and is formed so as to cover a base material and a light-shielding part described later, and has good adhesion to the light-shielding part and the ITO layer, respectively. If it is a thing, it will not specifically limit. Usually, in such a photocatalyst-containing layer, the photocatalyst fine particles are formed in a mixture state in which a part or all of the photocatalyst fine particles are coated with the organopolysiloxane, and the photocatalyst fine particles are partially exposed on the surface.

  Here, since the photocatalyst-containing layer contains an organopolysiloxane, the wettability of the surface can be changed by the action of the photocatalyst when irradiated with energy. The water-repellent region and the region not irradiated with energy can be used as the liquid repellent region. Thereby, the colored layer mentioned later can be easily formed using this difference in wettability.

  In the present embodiment, the contact angle with a liquid having a surface tension of 30 mN / m is 10 ° or more, particularly the contact angle with a liquid having a surface tension of 30 mN / m is 10 ° or more in a non-energy-irradiated portion, that is, a liquid repellent region. It is preferable that the contact angle with a liquid having a surface tension of 20 mN / m is 10 ° or more. This is because the part that is not irradiated with energy is a part that requires liquid repellency, so when the contact angle with the liquid is small, the liquid repellency is not sufficient. For example, a colored layer described later is formed. When the colored layer forming coating liquid is applied by an inkjet method and cured, the colored layer forming coating liquid may adhere to the liquid-repellent region. This is because it becomes difficult to form a colored layer.

  The photocatalyst-containing layer has a contact angle with a liquid of 40 mN / m of less than 9 °, preferably a liquid with a surface tension of 50 mN / m, in a portion irradiated with energy, that is, a lyophilic region. The layer is preferably such that the contact angle with a liquid having a surface tension of 10 ° or less, particularly 60 mN / m, is 10 ° or less. When the contact angle with the liquid in the energy irradiated part, that is, the lyophilic region is high, for example, the colored layer forming coating liquid for forming the colored layer may be repelled in the lyophilic region. This is because, for example, when the coating liquid for forming a colored layer is applied by an ink jet method, the coating liquid for forming a colored layer is not sufficiently spread and spread, and it may be difficult to form a colored layer.

  In addition, the contact angle with the liquid here is measured using a contact angle measuring instrument (Kyowa Interface Science Co., Ltd. CA-Z type) with a liquid having various surface tensions (from the microsyringe to the liquid. 30 seconds after dropping), and the result was obtained or the result was graphed. In this measurement, as a liquid having various surface tensions, a wetting index standard solution manufactured by Pure Chemical Co., Ltd. was used.

  The photocatalyst-containing layer used in the present embodiment contains fluorine in the photocatalyst-containing layer. Further, when the fluorine content on the surface of the photocatalyst-containing layer is irradiated with energy to the photocatalyst-containing layer, the photocatalyst-containing layer functions as described above. The photocatalyst-containing layer may be formed so as to be lower than that before energy irradiation, and can be decomposed by the action of the photocatalyst by energy irradiation, thereby changing the wettability on the photocatalyst-containing layer. You may form so that a decomposition | disassembly substance may be included.

  Hereinafter, the photocatalyst, organopolysiloxane, and other components constituting such a photocatalyst-containing layer will be described.

a. Photocatalyst First, the photocatalyst used in this embodiment will be described. Examples of the photocatalyst used in the present embodiment include titanium dioxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), and tungsten oxide (WO ₃ ), which are known as optical semiconductors. , Bismuth oxide (Bi ₂ O ₃ ), and iron oxide (Fe ₂ O ₃ ), and one or a mixture of two or more selected from these can be used.

  In this embodiment, titanium dioxide is particularly preferably used because it has a high band gap energy, is chemically stable, has no toxicity, and is easily available. Titanium dioxide includes anatase type and rutile type, and both can be used in this embodiment, but anatase type titanium dioxide is preferable. Anatase type titanium dioxide has an excitation wavelength of 380 nm or less.

  Examples of such anatase type titanium dioxide include hydrochloric acid peptizer type anatase type titania sol (STS-02 manufactured by Ishihara Sangyo Co., Ltd. (average particle size 7 nm), ST-K01 manufactured by Ishihara Sangyo Co., Ltd.), nitric acid solution An anatase type titania sol (TA-15 manufactured by Nissan Chemical Co., Ltd. (average particle size 12 nm)) and the like can be mentioned.

  The smaller the particle size of the photocatalyst, the more effective the photocatalytic reaction occurs. The average particle size is preferably 50 nm or less, and it is particularly preferable to use a photocatalyst of 20 nm or less.

  The content of the photocatalyst in the photocatalyst-containing layer used in this embodiment can be set in the range of 5 to 60% by weight, preferably 20 to 40% by weight. This is because the adhesiveness to the ITO layer described later can be improved.

b. Organopolysiloxane Next, the organopolysiloxane used in this embodiment will be described. The organopolysiloxane used in the present embodiment is not particularly limited as long as it can change the wettability of the surface of the photocatalyst containing layer by the action of the photocatalyst accompanying energy irradiation. However, those having a high binding energy that is not decomposed by photoexcitation of the photocatalyst and having an organic substituent that is decomposed by the action of the photocatalyst are preferable. Specifically, (1) an organopolysiloxane that exerts a high strength by hydrolyzing and polycondensing chloro or alkoxysilane by sol-gel reaction or the like, and (2) a reactive silicone excellent in water repellency and oil repellency. Cross-linked organopolysiloxanes can be mentioned.

In the case of (1) above, the general formula:
Y _n SiX _(4-n)
(Where Y is an alkyl group, fluoroalkyl group, vinyl group, amino group, phenyl group, chloroalkyl group, isocyanate group, or epoxy group, or an organic group containing these, and X is an alkoxyl group, acetyl group, or Represents halogen, n is an integer from 0 to 3)
It is preferable that it is the organopolysiloxane which is a 1 type, or 2 or more types of hydrolysis condensate or cohydrolysis condensate of the silicon compound shown by these. Here, the alkoxy group represented by X is preferably a methoxy group, an ethoxy group, a propoxy group, or a butoxy group. Moreover, it is preferable that the carbon number of the whole organic group shown by Y exists in the range of 1-20, especially in the range of 5-10.

  Thus, when the photocatalyst-containing layer is formed, the surface can be made liquid-repellent by Y constituting the organopolysiloxane, and the Y is decomposed by the action of the photocatalyst accompanying energy irradiation. This is because it can be made lyophilic.

In particular, when an organopolysiloxane in which Y constituting the organopolysiloxane is a fluoroalkyl group is used, the photocatalyst-containing layer before energy irradiation can be made particularly high in liquid repellency. When high liquid repellency is required, it is preferable to use an organopolysiloxane having these fluoroalkyl groups. Specific examples of such organopolysiloxanes include one or more of the following hydroalkyl silanes, co-hydrolysis condensates, and are generally known as fluorine-based silane coupling agents. Can be used.
_{CF 3 (CF 2) 3 CH} 2 CH 2 Si (OCH 3) 3;
_{CF 3 (CF 2) 5 CH} 2 CH 2 Si (OCH 3) 3;
_{CF 3 (CF 2) 7 CH} 2 CH 2 Si (OCH 3) 3;
_{CF 3 (CF 2) 9 CH} 2 CH 2 Si (OCH 3) 3;
(CF ₃ ) ₂ CF (CF ₂ ) ₄ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
_{(CF 3) 2 CF (CF} 2) 6 CH 2 CH 2 Si (OCH 3) 3;
_{(CF 3) 2 CF (CF} 2) 8 CH 2 CH 2 Si (OCH 3) 3;
_{CF 3 (C 6 H 4)} C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 3 (} C 6 H 4) C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 5 (} C 6 H 4) C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 7 (} C 6 H 4) C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 3 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 5 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 7 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 9 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{(CF 3) 2 CF (CF} 2) 4 CH 2 CH 2 SiCH 3 (OCH 3) 2;
_{(CF 3) 2 CF (CF} 2) 6 CH 2 CH 2 Si CH 3 (OCH 3) 2;
_{(CF 3) 2 CF (CF} 2) 8 CH 2 CH 2 Si CH 3 (OCH 3) 2;
_{CF 3 (C 6 H 4)} C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 3 (} C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 5 (} C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 7 (} C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 3 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 5 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 7 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 9 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 7 SO} 2 N (C 2 H 5) C 2 H 4 CH 2 Si (OCH 3) 3.

  Examples of the reactive silicone (2) include compounds having a skeleton represented by the following general formula.

However, n is an integer of 2 or more, R ^1, R ² are each a substituted or unsubstituted alkyl having 1 to 10 carbon atoms, alkenyl, aryl or cyanoalkyl group, the total molar ratio of 40% or less Vinyl, phenyl and phenyl halide. Further, those in which R ¹ and R ² are methyl groups are preferable because the surface energy becomes the smallest, and the methyl groups are preferably 60% or more by molar ratio. In addition, the chain end or side chain has at least one reactive group such as a hydroxyl group in the molecular chain.

  The organopolysiloxane is preferably contained in the photocatalyst-containing layer in an amount of 5 to 90% by weight, especially about 30 to 60% by weight.

c. Other Substances In the photocatalyst-containing layer used in the present embodiment, a stable organosilicon compound that does not undergo a crosslinking reaction, such as dimethylpolysiloxane, may be mixed with a binder together with the organopolysiloxane. Furthermore, examples of the binder include polysiloxanes having a high binding energy that does not cause the main skeleton to be decomposed by photoexcitation of the photocatalyst, or that do not have an organic substituent, or have an organic substituent. You may contain what hydrolyzed and polycondensed methoxysilane, tetraethoxysilane, etc.

  Furthermore, in order to assist the function of changing the wettability of the organopolysiloxane, a decomposition substance that is decomposed by energy irradiation may be included. Examples of such a decomposing substance include a surfactant having a function of decomposing by the action of a photocatalyst and changing the wettability of the photocatalyst-containing layer surface by decomposing. Specifically, hydrocarbons such as NIKKOL BL, BC, BO, BB series manufactured by Nikko Chemicals Co., Ltd., ZONYL FSN, FSO manufactured by DuPont, Surflon S-141, 145 manufactured by Asahi Glass Co., Ltd., Dainippon Megafac F-141, 144 manufactured by Ink Chemical Industry Co., Ltd., Footgent F-200, F251 manufactured by Neos Co., Ltd., Unidyne DS-401, 402 manufactured by Daikin Industries, Ltd., Fluorard FC-170 manufactured by 3M Co., Ltd. Fluorine-based or silicone-based nonionic surfactants such as 176, and cationic surfactants, anionic surfactants, and amphoteric surfactants can also be used.

  Besides surfactants, polyvinyl alcohol, unsaturated polyester, acrylic resin, polyethylene, diallyl phthalate, ethylene propylene diene monomer, epoxy resin, phenol resin, polyurethane, melamine resin, polycarbonate, polyvinyl chloride, polyamide, polyimide Styrene butadiene rubber, chloroprene rubber, polypropylene, polybutylene, polystyrene, polyvinyl acetate, nylon, polyester, polybutadiene, polybenzimidazole, polyacrylonitrile, epichlorohydrin, polysulfide, polyisoprene, oligomers, polymers, and the like.

d. In addition, in this embodiment, when the photocatalyst containing layer contains fluorine, and the fluorine content on the surface of the photocatalyst containing layer is irradiated with energy to the photocatalyst containing layer, the energy of the photocatalyst is increased by the action of the photocatalyst. The photocatalyst-containing layer is preferably formed so as to be lower than that before irradiation. Thereby, the pattern which consists of a part with little content of fluorine can be easily formed by irradiating energy with a pattern so that it may mention later. Here, fluorine has an extremely low surface energy. Therefore, the surface of a substance containing a large amount of fluorine has a smaller critical surface tension. Therefore, the critical surface tension of the portion having a small fluorine content is larger than the critical surface tension of the surface of the portion having a large fluorine content. This means that the portion with a low fluorine content is a lyophilic region compared to the portion with a high fluorine content. Therefore, forming a pattern composed of a portion having a lower fluorine content than the surrounding surface forms a pattern of a lyophilic region in the liquid repellent region.

  Therefore, when such a photocatalyst-containing layer is used, the pattern of the lyophilic region can be easily formed in the liquid-repellent region by irradiating the pattern with energy. This is because a high-definition colored layer can be formed when the colored layer forming coating solution is applied.

  As described above, the fluorine content contained in the photocatalyst containing layer containing fluorine is not irradiated with energy in the lyophilic region having a low fluorine content formed by energy irradiation. When the fluorine content of the part is 100, it is 10 or less, preferably 5 or less, particularly preferably 1 or less.

  By setting it within such a range, it is possible to make a large difference in lyophilicity between the energy-irradiated portion and the unirradiated portion. Therefore, for example, by attaching a coating liquid for forming a colored layer to such a photocatalyst-containing layer, it becomes possible to accurately form a colored layer only in a lyophilic region having a reduced fluorine content. This is because a good color filter can be obtained. This rate of decrease is based on weight.

  For the measurement of the fluorine content in the photocatalyst-containing layer, various commonly used methods can be used. For example, X-ray photoelectron spectroscopy (ES-ray photoelectron spectroscopy, ESCA) for Chemical Analysis)), and any method that can quantitatively measure the amount of fluorine on the surface, such as X-ray fluorescence analysis and mass spectrometry, is not particularly limited.

  In this embodiment, titanium dioxide is preferably used as the photocatalyst as described above. When titanium dioxide is used in this manner, the content of fluorine contained in the photocatalyst-containing layer is X-ray. When analyzed and quantified by photoelectron spectroscopy, when the titanium (Ti) element is defined as 100, fluorine (F) element is 500 or more, preferably 800 or more, particularly preferably 1200 or more. F) It is preferable that the element is contained in the surface of the photocatalyst containing layer.

  Fluorine (F) is included in the photocatalyst-containing layer to such an extent that the critical surface tension on the photocatalyst-containing layer can be sufficiently lowered, so that the liquid repellency on the surface can be secured, thereby irradiating the pattern with energy. This is because the difference in wettability with the lyophilic region on the surface of the pattern portion where the fluorine content is reduced can be increased, and the accuracy of the color filter finally obtained can be improved.

  Further, in such a color filter, the fluorine content in the lyophilic region formed by pattern irradiation with energy is 50 or less when the titanium (Ti) element is 100, preferably It is preferably contained in a ratio of 20 or less, particularly preferably 10 or less.

  If the fluorine content in the photocatalyst-containing layer can be reduced to this extent, sufficient lyophilicity can be obtained for forming a color filter, and the liquid repellency of the portion where the energy is not irradiated can be obtained. Due to the difference in wettability, the color filter can be formed with high accuracy, and a color filter with high utility value can be obtained.

e. Method for Forming Photocatalyst-Containing Layer As a method for forming the photocatalyst-containing layer as described above, a coating solution is prepared by dispersing the photocatalyst and organopolysiloxane in a solvent together with other additives as necessary. It can form by apply | coating a liquid on a base material. As the solvent to be used, alcohol-based organic solvents such as ethanol and isopropanol are preferable. The application can be performed by a known application method such as spin coating, spray coating, dip coating, roll coating, or bead coating. When an ultraviolet curable component is contained as a binder, the photocatalyst-containing layer can be formed by performing a curing treatment by irradiating ultraviolet rays. At this time, the thickness of the photocatalyst-containing layer is preferably in the range of 0.05 to 10 μm. If it is thinner than the above range, the wettability change of the surface of the photocatalyst-containing layer is not preferable because the functionality such as improving the adhesion with the ITO layer is lowered. Since the distance between the light shielding portion and the colored layer is increased, problems such as backlight light leakage may occur when the color filter is used in a liquid crystal display device.

f. Method for forming wettability change pattern on photocatalyst-containing layer Next, the photocatalyst-containing layer is irradiated with energy, and a wettability change pattern with changed wettability is formed in a pattern that forms a colored layer described later. A method will be described. In this embodiment, as described above, the wettability of the organopolysiloxane in the photocatalyst-containing layer changes due to the action of the photocatalyst accompanying energy irradiation. Therefore, for example, as shown in FIG. 3, when the photocatalyst containing layer 2 is irradiated with energy 11 using a photomask 10 or the like (FIG. 3 (a)), the wettability with the wettability changed on the photocatalyst containing layer 2 is changed. The sex change pattern 8 is formed (FIG. 3B). When a wettability change pattern is formed on the photocatalyst-containing layer, when a coloring layer forming coating liquid for forming a colored layer described later is applied by an ink jet method or the like, an ink is not applied to a region not irradiated with energy. The coating liquid for forming the colored layer can be attached with high definition only on the wettability change pattern 8 in which the wettability is changed without being attached, and a high-definition colored layer can be formed.

  Here, the energy irradiated to the photocatalyst containing layer is not particularly limited as long as it is a method of irradiating energy capable of changing the wettability of the photocatalyst containing layer. The energy irradiation (exposure) in the present embodiment is a concept including irradiation of any energy ray capable of changing the wettability of the surface of the photocatalyst containing layer, and is not limited to visible light irradiation. .

  Usually, the wavelength of light used for such energy irradiation is set in a range of 400 nm or less, preferably in a range of 150 nm to 380 nm or less. This is because, as described above, the preferred photocatalyst used in the photocatalyst-containing layer is titanium dioxide, and light having the above-described wavelength is preferable as the energy for activating the photocatalytic action by the titanium dioxide.

  Examples of light sources that can be used for such energy irradiation include mercury lamps, metal halide lamps, xenon lamps, excimer lamps, and various other light sources. In addition to the method of performing pattern irradiation using a light mask using a light source as described above, it is also possible to use a method of drawing and irradiating in a pattern using a laser such as excimer or YAG.

  In addition, the irradiation amount of energy at the time of energy irradiation is set to an irradiation amount necessary for changing the wettability of the surface of the photocatalyst containing layer by the action of the photocatalyst in the photocatalyst containing layer.

  At this time, it is preferable in that the sensitivity can be further increased by irradiating energy while heating the photocatalyst-containing layer, and the wettability can be changed efficiently. Specifically, it is preferable to heat within a range of 30 ° C to 80 ° C.

  The energy irradiation direction in the present embodiment may be the pattern energy irradiation or the laser drawing irradiation through the photomask from any direction on the substrate side and the photocatalyst containing layer side when the substrate described later is transparent. good. In addition, in this embodiment, since the light-shielding part mentioned later is formed on the base material, when energy is irradiated to the whole surface from the base material side, the photocatalyst containing layer on the area | region in which the light-shielding part was formed The wettability of only the opening of the light shielding part can be changed. Therefore, there is an advantage that the wettability change pattern can be efficiently formed without requiring a step of alignment of a photomask or the like. On the other hand, when the substrate is opaque, it is necessary to irradiate energy from the photocatalyst containing layer side.

(Shading part)
Next, the light shielding part used in this embodiment will be described. The light-shielding part used in this embodiment is formed on a base material to be described later, and shields the energy irradiated when a color filter is formed, and has good adhesion to the photocatalyst-containing layer. As long as it has properties, it is not particularly limited. Such a method for forming the light shielding portion is appropriately selected and used depending on the shielding property against the required energy.

  In the present embodiment, the light shielding part may be formed using an inorganic material, or may be formed using an organic material. In either case, it can be said that the adhesiveness with the ITO layer or the colored layer can be improved as described above, and the advantages of this embodiment can be utilized.

  Such a light shielding portion may be formed, for example, by forming a metal thin film of chromium or the like having a thickness of about 1000 to 2000 mm by a sputtering method, a vacuum deposition method, or the like, and patterning the thin film. As this patterning method, a normal patterning method such as sputtering can be used.

  In addition, as a method of forming a light shielding portion using an organic material, for example, a layer in which a light shielding particle such as a carbon fine particle, a metal oxide, an inorganic pigment, or an organic pigment is contained in a resin binder is formed in a pattern. It may be a method. As the resin binder to be used, polyimide resin, acrylic resin, epoxy resin, polyacrylamide, polyvinyl alcohol, gelatin, casein, cellulose, or a mixture of one or more kinds, photosensitive resin, or O / A W emulsion type resin composition, for example, an emulsion of a reactive silicone can be used. The thickness of such a resin light-shielding portion can be set within a range of 0.5 to 10 μm. As a method for patterning such a resin light shielding portion, a generally used method such as a photolithography method or a printing method can be used.

  Furthermore, the light shielding part may be formed by a thermal transfer method. The thermal transfer method for forming a light-shielding part is usually a thermal transfer sheet having a light-to-heat conversion layer and a light-shielding part transfer layer provided on one side of a transparent film base material, and energy is applied to the area where the light-shielding part is formed. By irradiating, the light shielding part transfer layer is transferred onto the substrate to form the light shielding part. The thickness of the light-shielding portion formed by such a thermal transfer method can usually be about 0.5 μm to 10.0 μm, particularly about 0.8 μm to 5.0 μm.

  The light shielding part transferred by the thermal transfer method is usually composed of a light shielding material and a binder, and inorganic particles such as carbon black and titanium black can be used as the light shielding material. The particle diameter of such a light-shielding material is preferably 0.01 μm to 1.0 μm, and more preferably 0.03 μm to 0.3 μm.

  Further, the binder is preferably a resin composition having thermoplasticity and thermosetting properties, has a thermosetting functional group, and has a softening point in the range of 50 ° C to 150 ° C, particularly 60 ° C. It is preferable to be comprised by the resin material which exists in the range of -120 degreeC, a hardening | curing agent, etc. Specific examples of such a material include a combination of an epoxy compound or epoxy resin having two or more epoxy groups in one molecule and a latent curing agent thereof. As a latent curing agent for epoxy resins, it does not have reactivity with epoxy groups up to a certain temperature, but when it reaches the activation temperature by heating, it changes to a molecular structure with reactivity with epoxy groups. A curing agent can be used. Specific examples include neutral salts and complexes of acidic or basic compounds having reactivity with epoxy resins, block compounds, high melting point bodies, and microcapsules. In addition to the above materials, the light-shielding part may contain a release agent, an adhesion assistant, an antioxidant, a dispersant, and the like.

  In this embodiment, a primer layer may be formed between the photocatalyst containing layer and the light shielding part. Although the action and function of this primer layer are not necessarily clear, by forming the primer layer, it becomes a factor that inhibits the above-mentioned wettability change of the photocatalyst-containing layer from the light-shielding part and the opening existing between the light-shielding parts. This is considered to exhibit a function of preventing diffusion of impurities, particularly residues generated when the light shielding portion is patterned, and impurities. Therefore, by forming the primer layer, the wettability of the photocatalyst containing layer can be changed with high sensitivity, and as a result, a high resolution pattern can be obtained.

  In this embodiment, the primer layer prevents impurities present in the openings formed between the light shielding portions as well as the light shielding portions from affecting the action of the photocatalyst. It is preferable that it is formed over the entire light shielding part.

  The primer layer in this embodiment is not particularly limited as long as the primer layer is formed so that the light shielding part and the photocatalyst containing layer do not come into contact with each other.

The material constituting the primer layer is not particularly limited, but an inorganic material that is not easily decomposed by the action of the photocatalyst is preferable. Specific examples include amorphous silica. When such amorphous silica is used, the precursor of the amorphous silica is represented by the general formula SiX ₄ and X is a silicon compound such as halogen, methoxy group, ethoxy group, or acetyl group, Silanol which is a hydrolyzate thereof or polysiloxane having an average molecular weight of 3000 or less is preferable.

  The thickness of the primer layer is preferably in the range of 0.001 μm to 1 μm, particularly preferably in the range of 0.001 μm to 0.1 μm.

(ITO layer)
Next, the ITO layer used in this embodiment will be described. The ITO layer used in the present embodiment is formed on the light shielding part and a colored layer described later, and is formed by adhering to the photocatalyst-containing layer between adjacent colored layers.

  The ITO layer used in this embodiment can be the same as the ITO layer used for a general color filter. Examples of such an ITO layer forming method include in-line low-temperature sputtering method, in-line high-temperature sputtering method, batch-type low-temperature sputtering method, batch-type high-temperature sputtering method, vacuum deposition method, and plasma CVD method. In order to reduce damage to the filter, a low temperature sputtering method is preferably used. Further, when a high film forming speed is required, a high temperature sputtering method is preferably used.

  The thickness of the ITO layer used in this embodiment is preferably about 500 to 3000 mm, and more preferably about 1000 to 2500 mm. If it is thinner than the above range, the resistance value of the ITO layer becomes too high, so it may be difficult to express the performance as an electrode, and if it is thicker than the above range, it is not preferable. This is because the strain stress becomes strong and fine cracks may occur.

  Here, in a general color filter, the thickness of the ITO layer is about 1600 to 1700 mm, the resistance value is about 20Ω / □, and the transmittance is 95% or more / 400 nm. On the other hand, in the color filter of the present embodiment, the photocatalyst containing layer contains the photocatalyst fine particles that are inorganic components, and is in partial contact with the ITO layer. Even when the film thickness is increased and strain stress is applied to the ITO layer, the adhesion of the ITO layer can be improved. Therefore, for example, an ITO layer having a thickness of about 2000 to 2500 mm can be formed. When the thickness of the ITO layer is in such a range, the resistance value of the ITO layer of a normal color filter is about 20Ω / □, but the resistance value can be lowered from 10Ω / □ to 1Ω / □. . At this time, the transmittance is lowered by increasing the thickness of the ITO layer. However, if the transmittance is reduced in the thickness within this range, there is no problem as a color filter. It can be said.

  Here, it is effective to use the color filter having a reduced resistance value of the ITO layer as described above for a large-sized liquid crystal display device of, for example, 40 inches or more. This is because the sheet resistance of the ITO layer in the image region is reduced due to the low resistance value of the ITO layer, so that the driving speed of the electric driving circuit is improved and higher speed electric driving can be supported. Therefore, it is possible to cope with high-speed liquid crystal driving, the electric responsiveness in the image area plane becomes more uniform, and the in-plane uniformity of the image is improved.

(Colored layer)
Next, the colored layer used in this embodiment will be described. The colored layer used in this embodiment is formed on the above-described photocatalyst-containing layer and is formed so as to have a gap between adjacent colored layers. The gap is usually formed on the light shielding portion.

  Here, the gap between the adjacent colored layers is appropriately selected depending on the type of the light-shielding part described above, the type of the target color filter, and the like. The light-shielding part is made of an inorganic material such as chromium, for example. In such a case, the width of the gap is preferably 2 μm to 80 μm, more preferably 10 μm to 30 μm. Moreover, when the light shielding part is made of resin, the width of the gap is preferably 2 μm to 80 μm, and more preferably 10 μm to 30 μm. This is because the photocatalyst-containing layer and the ITO layer can be adhered between the colored layers, and the columnar spacer formed thereon can be made a high-quality color filter without peeling off. .

  Here, in this embodiment, as described above, the photocatalyst-containing layer can be formed along the wettability change pattern in which the wettability has changed.

  Such a colored layer is usually formed of three colors of red (R), green (G), and blue (B). The colored pattern shape in the colored layer can be a known arrangement such as a stripe type, a mosaic type, a triangle type, or a four-pixel arrangement type, and the colored area can be arbitrarily set.

  In the present embodiment, the method for coloring the colored layer is not particularly limited. For example, a coating method in which a known paint is applied by a known method such as spray coating, dip coating, roll coating, or bead coating, In this embodiment, it is preferably colored by an ink jet method. This is because a colored layer can be formed with high definition on the wettability change pattern.

  Here, since the coating liquid for forming a colored layer used for forming such a colored layer can be the same as that used for the colored layer of a general color filter, detailed description here Is omitted.

(Base material)
Next, the base material used in this embodiment will be described. The base material used in this embodiment is not particularly limited as long as it can form the light-shielding part and the photocatalyst-containing layer, and those conventionally used for color filters can be used. . Specifically, transparent flexible materials such as quartz glass, Pyrex (registered trademark) glass, and synthetic quartz plates, or flexible flexible materials such as transparent resin films and optical resin plates, etc. Can be mentioned. Among them, Corning 7059 glass is a material having a small coefficient of thermal expansion, excellent dimensional stability and workability in high-temperature heat treatment, and is an alkali-free glass containing no alkali component in the active matrix. Suitable for color filters for color liquid crystal display devices. In this embodiment, a transparent substrate is usually used, but a reflective substrate or a white colored substrate can also be used. Further, the substrate may be subjected to surface treatment for preventing alkali elution, imparting a gas barrier property or other purposes as required.

(Color filter)
Next, the color filter of this embodiment will be described. The color filter of this embodiment is not particularly limited as long as it has the above-described base material, light-shielding part, photocatalyst-containing layer, colored layer, ITO layer, and columnar spacers. It may have a layer or the like.

2. Second Embodiment Next, a second embodiment of the color filter of the present invention will be described. The second embodiment of the color filter of the present invention is formed to cover the base material, the light shielding part formed on the base material, the base material and the light shielding part, and contains a photocatalyst and an organopolysiloxane. A photocatalyst-containing layer, a plurality of colored layers formed on the photocatalyst-containing layer, an ITO layer formed so as to cover the colored layer, and an ITO layer on the region where the light shielding portion and the colored layer are formed Columnar spacers are formed on the substrate.

  In a general color filter, when a columnar spacer is formed on a region where a light shielding portion, a colored layer, and an ITO layer are laminated, and the light shielding portion is made of an inorganic material, Since the adhesion with the colored layer made of the material is poor and the stability is poor, the columnar spacer formed on the region may be easily peeled off.

  In the color filter of this embodiment, for example, as shown in FIG. 4, columnar spacers 6 are formed on a region where the light shielding portion 2, the photocatalyst containing layer 3, the colored layer 4, and the ITO layer 5 are laminated. It becomes. Since the photocatalyst-containing layer 3 is formed between the light shielding part 2 and the colored layer 4, even if the light shielding part 2 is made of an inorganic material, the light shielding part 2 and the colored layer 4 are bonded. Therefore, the columnar spacer 6 formed on the ITO layer can be stably supported.

  Here, since each member such as a base material, a light shielding part, a photocatalyst containing layer, a light shielding part, a colored layer, an ITO layer, and a columnar spacer used in the present embodiment is the same as the first embodiment, The description in is omitted. In the present embodiment, it is preferable to use a light shielding part made of an inorganic material as the light shielding part. In this embodiment, even if the light shielding part is made of an inorganic material, as described above, the photocatalyst-containing layer is formed between the colored layer and the light shielding part. It is because it can be said that it can be made favorable, and it can be said that the advantage of this embodiment can be utilized more.

  Also, the color filter of the present embodiment is not particularly limited as long as it has the above-described base material, light-shielding part, photocatalyst-containing layer, colored layer, ITO layer, and columnar spacers. Other layers and the like may be appropriately provided.

3. Third Embodiment Next, a third embodiment of the color filter of the present invention will be described. The color filter of the present embodiment includes a base material, a light shielding part formed on the base material, a photocatalyst containing layer formed to cover the base material and the light shielding part, and containing a photocatalyst and an organopolysiloxane. A plurality of colored layers formed on the photocatalyst-containing layer, an ITO layer formed so as to cover the colored layer, and a columnar spacer formed on the ITO layer on the region where the light shielding portion is formed The protective layer is formed so as to cover the colored layer and the light shielding portion, and the ITO layer is formed on the protective layer.

  In a general color filter having a protective layer on the colored layer, when the light shielding part is made of an inorganic material, the adhesiveness between the protective layer and the light shielding part, and the adhesion between the colored layer and the light shielding part are It will be low. Therefore, the columnar spacer formed on the ITO layer formed on the protective layer is poor in stability, and the columnar spacer may be easily peeled off.

  In this embodiment, for example, as shown in FIG. 5, the region where the columnar spacer 6 is formed is a region where the light shielding part 2, the photocatalyst containing layer 3, the protective layer 7, and the ITO layer 5 are laminated, or the light shielding. The region 2, the photocatalyst containing layer 3, the colored layer 4, the protective layer 7, and the ITO layer 5 are stacked. According to this embodiment, since the photocatalyst-containing layer is formed between the light-shielding part and the protective layer or between the light-shielding part and the colored layer, for example, the light-shielding part is a layer made of an inorganic material. Also, the adhesion of these layers can be good. Therefore, the columnar spacers formed on this region can be stably supported, and a high-quality color filter can be obtained in which the columnar spacers are not peeled off.

  Here, since each member such as a base material, a light shielding part, a photocatalyst containing layer, a light shielding part, a colored layer, an ITO layer, and a columnar spacer used in the present embodiment is the same as the first embodiment, The protective layer used in this embodiment will be described below. In the present embodiment, it is preferable to use a light shielding part made of an inorganic material as the light shielding part. In this embodiment, even if the light shielding part is made of an inorganic material, as described above, the photocatalyst-containing layer is formed between the colored layer and the light shielding part. This is because it can be said that the adhesiveness of the present embodiment can be improved and the advantages of the present embodiment can be further utilized.

(Protective layer)
The protective layer used in this embodiment is formed so as to cover the colored layer and the photocatalyst-containing layer formed on the light shielding portion, and the ITO layer is formed on the protective layer. Become. In this embodiment, by forming such a protective layer, it is possible to prevent the outflow of impurities from the colored layer and the like, and to improve the smoothness of the surface. It is not particularly limited as long as it can be bonded well.

  The protective layer used in the present embodiment can be the same as the protective layer used in a general color filter. For example, an ultraviolet curable resin transparent to visible light, a thermosetting resin, etc. Can be used.

  Here, the color filter of the present embodiment is not particularly limited as long as it has the above-described base material, light shielding part, photocatalyst containing layer, colored layer, ITO layer, protective layer, and columnar spacer, Other layers and the like may be appropriately provided as necessary.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

  Hereinafter, the present invention will be described more specifically with reference to Examples and Comparative Examples.

<Example 1>
1. Formation of light shielding portion First, a light shielding material having the following composition was applied on a soda glass substrate having a thickness of 1.1 mm, and then prebaked at 100 ° C. for 15 minutes to dry the light shielding material to form a film. At this time, the light shielding material was applied by spin coating. The spin coating conditions were 1500 rpm / min.
・ Carbon black (black pigment) 28.5%
-Partially cyclized polyisoprene (negative photopolymer) 15.0%
・ Aromatic bisazide (photosensitive agent) 1.5%
・ Other additives 0.3%
・ Polyethylene glycol monomethyl ether acetate (solvent) 54.7%
Next, the thin film of the light shielding material formed as described above was irradiated with ultraviolet rays through a photomask, exposed at an exposure amount of 300 mJ / cm ² , developed and rinsed to form a light shielding portion. For development, a 0.1% NaCO ₃ aqueous solution was used as a developer. Thereafter, the light shielding part obtained above was dried and then post-baked at 200 ° C. for 10 minutes to obtain a light shielding part having a film thickness of 1.2 μm, a line width of 30 μm, and an interval of 100 μm.

2. Formation of a photocatalyst-containing layer 30 g of isopropyl alcohol and 0.4 g of MF-160E (manufactured by Tochem Products Co., Ltd.) and 3 g of trimethoxymethylsilane (manufactured by Toshiba Silicone Co., Ltd., TSL8113), 20 g of ST-K01 (manufactured by Ishihara Sangyo Co., Ltd.), which is a titanium oxide aqueous dispersion that is a photocatalyst, was mixed and stirred at 100 ° C. for 20 minutes. This was diluted 3 times with isopropyl alcohol to obtain a composition for a photocatalyst-containing layer.
A transparent photocatalyst-containing layer (thickness 0.2 μm) is formed by applying the composition to a transparent substrate made of soda glass on which the light-shielding part is formed, using a spin coater and performing a drying treatment at 150 ° C. for 10 minutes. Formed.

3. Confirmation of formation of lyophilic region by exposure The exposed portion is formed by exposing the photocatalyst-containing layer through a mask with a mercury lamp (wavelength 365 nm) at an illuminance of 70 mW / cm ² for 50 seconds to form an exposed portion. The contact angle with the liquid was measured. In the non-exposed area, a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science Co., Ltd.) is used for the contact angle with a liquid having a surface tension of 30 mN / m (manufactured by Junsei Chemical Co., Ltd., ethylene glycol monoethyl ether). As a result of measurement (30 seconds after dropping a droplet from the microsyringe), it was 30 degrees. In the exposed area, the contact angle with a liquid having a surface tension of 50 mN / m (manufactured by Junsei Co., Ltd., wetting index standard solution No. 50) was measured in the same manner, and as a result, it was 7 degrees. As described above, it was confirmed that the exposed portion became a lyophilic region, and pattern formation was possible due to the difference in wettability between the exposed portion and the non-exposed portion.

4). Formation of Colored Layer Next, using a photomask on the photocatalyst-containing layer on which the light-shielding portion is formed, exposure with a line width of 110 μm and an interval of 20 μm (5 μm on both sides of the line width of 110 μm is formed on the light-shielding portion) 3), and the exposed portion for the colored layer was made lyophilic. Next, using each inkjet apparatus for RGB, thermosetting of each color of RGB including 5 parts by weight of pigment, 20 parts by weight of solvent, 70 parts by weight of acrylic acid / benzyl acrylate copolymer, and 5 parts by weight of bifunctional epoxy-containing monomer The polyepoxy acrylate ink was attached to the lyophilic colored layer exposure area and colored, and cured by heat treatment at 150 ° C. for 30 minutes. Here, for each of the red, green, and blue inks, the solvent is polyethylene glycol monomethyl ethyl acetate, the pigment is CI Pigment Red 177 for red ink, CI Pigment Green 36 for green ink, and CI Pigment Green 36 for blue ink Pigment Blue 15+ CI Pigment Violet 23 was used.
As a result, an RGB stripe color filter having a line width of 100 μm and a light shielding portion of 30 μm was obtained.

5). Formation of ITO layer Set the surface of the obtained color filter downward, set it in the sputtering waiting room, exhaust in advance to medium vacuum (1 × 10 ⁻⁴ Torr), and then exhaust the pressure to 1 × 10 ⁻⁶ Torr Then, the substrate was heated to 210 ° C. Thereafter, Ar gas containing 1.5 vol% O ₂ was introduced into the sputtering chamber, and the discharge gas pressure was controlled to 1.8 × 10 ⁻⁴ Torr. Size: 150 × 457 mm, resistivity: 1.9 × 10 ⁻⁴ Using an ITO target containing 10 wt% SnO ₂ at Ω · cm, sputtering is performed with a target surface magnetic field of 900 G at a target current density of 20 mA / cm ² and a discharge impedance of 10Ω to form an ITO layer having a thickness of 170 nm and a resistance value of 20 Ω / □. did.

6). Formation of Columnar Spacers Next, a coating liquid prepared by adjusting the viscosity of a negative transparent photosensitive resin material having the following composition with propylene glycol monomethyl ether acetate is applied onto the ITO layer by a spin coating method and dried to obtain a thickness of 5 A transparent photosensitive resin layer having a thickness of 5 μm was formed.
Composition of transparent photosensitive resin material Binder resin 150 parts by weight benzyl methacrylate / methacrylic acid copolymer (molar ratio 73/27)
Monomer: 80 parts by weight Dipentaerythritol hexaacrylate Polymerization initiator: 25 parts by weight Ciba Specialty Chemicals Co., Ltd. Irgacure 369
Next, the exposure was performed with a proximity exposure machine using an ultrahigh pressure mercury lamp as an exposure light source at an exposure amount of 400 mJ / cm ² through a photomask having an opening of a predetermined shape at the position where the columnar spacer was formed.
Next, development was performed by immersing the substrate in a developer (a 0.05% by weight aqueous solution of potassium hydroxide) for 60 seconds, and after washing, post-baking (200 ° C., 30 minutes) was performed in a clean oven. As a result, a color filter in which a transparent cylindrical columnar spacer having a radius of 5 μm (diameter 10 μm) from the center of the portion where the exposed colored layer is not formed and a height of 5.0 μm is formed on the ITO layer is obtained. It was.

<Example 2>
A color filter was produced in the same manner as in Example 1 except that a columnar spacer having a radius of 12 μm (diameter 24 μm) was formed on the ITO layer from the center of the portion where the exposed colored layer was not formed. At this time, the columnar spacer was formed so as to cover the ITO layer formed on the light shielding portion and the colored layer.

<Example 3>
A thermosetting resin material (Optomer SS6699G manufactured by JSR Co., Ltd.) is applied on the substrate on which the colored layer is formed by a spin coating method to form a thermosetting resin layer, and for this thermosetting resin layer, A color filter was obtained in the same manner as in Example 1 except that a prebaking treatment at 120 ° C. for 5 minutes was performed to form a transparent protective layer having a thickness of 1.5 μm.

<Comparative Example 1>
A color filter having columnar spacers was obtained in the same manner as in Example 1 except that the photocatalyst-containing layer was not formed and the dropping of the ink jet was controlled and a colored layer was provided at 100 μm between the light shielding portions.

<Peel test>
For the color filters of Examples 1 to 3 and Comparative Example 1, the adhesion of the columnar spacers of the color filter was evaluated. In a tape peel strength tester (TPM-200: manufactured by CNC), a peel test was performed under the conditions of a tape width of 20 mm, a peel speed of 300 mm / min, and a peel strength of 200 g. However, in the color filter of Comparative Example 1, peeling of the columnar spacers, peeling of the laminate of the columnar spacers and the ITO layer, and the like were observed everywhere.

It is a schematic sectional drawing which shows an example of the color filter of this invention. It is a schematic sectional drawing which shows the other example of the color filter of this invention. It is explanatory drawing which showed the process of changing the wettability of the photocatalyst content layer used for this invention. It is a schematic sectional drawing which shows the other example of the color filter of this invention. It is a schematic sectional drawing which shows the other example of the color filter of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Base material 2 ... Light-shielding part 3 ... Photocatalyst containing layer 4 ... Colored layer 5 ... ITO layer 6 ... Columnar spacer

Claims (5)

  A base material, a light-shielding part formed on the base material, a photocatalyst-containing layer containing a photocatalyst and an organopolysiloxane formed so as to cover the base material and the light-shielding part, and formed on the photocatalyst-containing layer A plurality of colored layers formed, an ITO layer formed so as to cover the colored layer, and a columnar spacer formed on the ITO layer on the region where the light shielding portion is formed. Color filter.   2. The color filter according to claim 1, wherein a gap is provided between two adjacent colored layers, and the columnar spacer is formed on an ITO layer formed on the gap.   2. The gap between two adjacent colored layers is provided, and the columnar spacer is formed on the gap and on the ITO layer formed on the colored layer. Color filter.   The color filter according to claim 1, wherein the columnar spacer is formed on an ITO layer formed on the colored layer. The color filter according to claim 1, wherein a protective layer is formed so as to cover the colored layer and the light shielding portion, and an ITO layer is formed on the protective layer.

Images