JP4401213B2 - Color filter - Google Patents

Description

  The present invention relates to a color filter suitable for a color liquid crystal display, which is obtained by coloring a colored layer by an inkjet method.

  In recent years, with the development of personal computers, especially portable personal computers, the demand for liquid crystal displays, particularly color liquid crystal displays, has been increasing. There is also a demand for larger liquid crystal displays. However, since this color liquid crystal display is expensive, there is an increasing demand for cost reduction, and in particular, there is a high demand for cost reduction for a color filter having a high specific gravity.

  Here, in a general color filter, the color filter and the counter substrate are bonded to face each other, and liquid crystal is injected between the counter substrate and the color filter, whereby a liquid crystal display device can be obtained.

  However, in the pigment dispersion method or the like conventionally used for forming a colored layer of a color filter, for example, as shown in FIG. 4, the end portion of the colored layer 4 formed on the light shielding portion 2 is subjected to a photolithography method or the like. Therefore, since it is formed by patterning, it is formed in a state of rapidly rising. Therefore, the ITO layer 5 formed so as to cover the colored layer and the light shielding portion is formed along the rising of the colored layer. However, when there is a sudden change in film thickness on the surface of the ITO layer, etc. In some cases, the liquid crystal injected on the color filter is affected by the influence, and the orientation may be disturbed.

  In addition, a photocatalyst-containing layer is formed on the base material using a coating solution for property change pattern formation containing a photocatalyst and a material whose properties change due to the action of the photocatalyst accompanying energy irradiation, and is exposed in a pattern. Thus, the inventors have studied a method for manufacturing a color filter that forms a pattern with changed characteristics and forms a colored layer (Patent Document 1). According to this method, it is possible to easily form a colored layer by an ink jet method or the like using the characteristics of the photocatalyst-containing layer.

  However, even in this case, for example, as shown in FIG. 5, when the coating amount of the coloring layer forming coating solution for forming the colored layer 4 is not appropriate, a sharp film thickness is formed at the end of the light shielding portion 2. When the color filter is used in a liquid crystal display device, there may be a sudden change in film thickness on the surface of the ITO layer 5 formed on the colored layer or the light shielding portion. In some cases, the orientation of the liquid crystal was disturbed.

Japanese Patent Laid-Open No. 2001-074928

  Therefore, it is desired to provide a high-quality color filter that does not cause a sudden change in film thickness on the surface of the ITO layer.

The present invention relates to a base material, a light shielding part containing a light shielding material and a resin formed on the base material, a photocatalyst formed so as to cover the base material and the light shielding part, and a photocatalyst containing an organopolysiloxane. A color filter having a containing layer, a colored layer formed on the photocatalyst containing layer in the opening of the light shielding part, and an ITO layer formed so as to cover the colored layer,
The maximum film thickness at which the height from the substrate surface to the ITO layer surface in each pixel is maximum, and the minimum film from which the height from the substrate surface to the ITO layer surface is minimum The thickness α of the 10 pixels when measuring the thickness of the thick portion and calculating (the thickness of the minimum thickness portion / the thickness of the maximum thickness portion) in each pixel is 0.30 <α < 0.95 and (the film thickness of the maximum film thickness portion−the film thickness of the minimum film thickness portion) / (the distance from the maximum film thickness portion to the minimum film thickness portion) in each pixel is calculated. The color filter is characterized in that the average β of 10 pixels is 0.002 <β <0.05.

  According to the present invention, since the average α of the ratio of the film thickness of the maximum film thickness portion and the film thickness of the minimum film thickness portion in each pixel is within the above range, the film thickness difference in each pixel is It can be less. In each pixel, the average value β of (the film thickness of the maximum film thickness portion−the film thickness of the minimum film thickness portion) / (the distance from the maximum film thickness portion to the minimum film thickness portion) is within the above range. Therefore, the change in film thickness can be made gradual. Therefore, a high-quality color filter can be obtained in which the orientation of the liquid crystal is not disturbed by a sudden change in film thickness.

  Furthermore, in the present invention, since the photocatalyst-containing layer containing the photocatalyst and the organopolysiloxane is formed, the photocatalyst-containing layer in the region where the colored layer is formed is irradiated with energy when the colored layer is formed. As a result, the contact angle with the liquid in that region can be reduced. Therefore, by utilizing the difference in wettability on the surface of the photocatalyst-containing layer, a colored layer with a gradual change in film thickness can be easily formed by, for example, an ink jet method, and the ITO layer formed on the colored layer can be formed. The change in film thickness can also be moderate.

The present invention also includes a base material, a light shielding portion containing a light shielding material and a resin formed on the base material, a photocatalyst and an organopolysiloxane formed so as to cover the base material and the light shielding portion. A color filter having a photocatalyst-containing layer, a colored layer formed on the photocatalyst-containing layer in the opening of the light-shielding part, and an ITO layer formed to cover the colored layer,
The color filter is characterized in that the average of the 10 pixels of the maximum kurtosis on the surface of the ITO layer in each pixel is 6.0 or less.

  According to the present invention, since the average of the maximum kurtosis in each pixel is equal to or less than the above value, there can be no sharp protrusions and the like, and the high quality without affecting the alignment of the liquid crystal Color filter.

  Also in the present invention, since a photocatalyst-containing layer containing a photocatalyst and an organopolysiloxane is formed as in the above invention, a colored layer can be easily formed using the difference in wettability, Furthermore, the change of the film thickness of the formed colored layer can be made gradual. Therefore, the change in the thickness of the ITO layer formed on the colored layer can be made gradual.

  According to the present invention, the unevenness on the ITO layer can be reduced in each pixel, and the change in the thickness of the ITO layer in each pixel can be made gradual. Therefore, a high-quality color filter can be obtained in which the orientation of the liquid crystal is not disturbed by a sudden change in film thickness.

  The present invention relates to a color filter suitable for a color liquid crystal display, which is obtained by coloring a colored layer by an inkjet method.

  The color filter of the present invention has two embodiments. In any of the embodiments, the color filter is a high-quality color which does not have a sudden change in film thickness on the surface of the ITO layer and does not disturb the orientation of the liquid crystal when used in a liquid crystal display device. Hereinafter, each embodiment will be described in detail.

A. First Embodiment First, a first embodiment of the color filter of the present invention will be described. A first embodiment of the color filter of the present invention includes a base material, a light shielding portion containing a light shielding material and a resin formed on the base material, and a photocatalyst formed to cover the base material and the light shielding portion. And a photocatalyst containing layer containing organopolysiloxane, a colored layer formed on the photocatalyst containing layer in the opening of the light shielding part, and an ITO layer formed so as to cover the colored layer There,
The maximum film thickness at which the height from the substrate surface to the ITO layer surface in each pixel is maximum, and the minimum film from which the height from the substrate surface to the ITO layer surface is minimum The average α of 10 pixels when the thickness of the thick portion is measured and (the thickness of the minimum thickness portion / the thickness of the maximum thickness portion) in each pixel is calculated is within a predetermined range. And the average of 10 pixels when calculating (the film thickness of the maximum film thickness portion−the film thickness of the minimum film thickness portion) / (the distance from the maximum film thickness portion to the minimum film thickness portion) in each pixel β is within a predetermined range.

  For example, as shown in FIG. 1, the color filter of this embodiment includes a base material 1, a light shielding portion 2 formed on the base material 1, and a photocatalyst formed so as to cover the base material 1 and the light shielding portion 2. Each having a containing layer 3, a colored layer 4 formed on the photocatalyst containing layer 3 formed in the opening of the light shielding part 2, and an ITO layer 5 formed on the colored layer, The film thickness s of the maximum film thickness portion a and the film thickness t of the minimum film thickness portion b are measured in the pixel (the range indicated by x in the drawing), and the film thickness s of the maximum film thickness portion a and the minimum film thickness portion are measured. The average when the ratio of b to the film thickness t is calculated is within a predetermined range, and the average of the slope from the minimum film thickness portion b to the maximum film thickness portion a in each pixel is within the predetermined range. Is.

  Here, one pixel in the present embodiment refers to a region in which a colored layer is divided by an adjacent light shielding portion, and includes a light shielding portion covered with the colored layer. In addition, the maximum film thickness portion refers to the thickest portion of the pixel, and the minimum film thickness portion refers to the thinnest portion of the pixel. When there are a plurality of these parts, such as when the thickest part or the thinnest part is flat, for example, the part where the maximum film thickness part and the minimum film thickness part are closest to each other Will be selected.

  According to this embodiment, since the difference in film thickness between the maximum film thickness portion and the minimum film thickness portion is within a predetermined range, the step on the ITO layer can be small. Further, by making the average of the slope from the minimum film thickness portion to the maximum film thickness portion within a predetermined range, the change in the film thickness can be made gradual. Therefore, when the color filter of this embodiment is used in a liquid crystal display device, a high-quality color in which the alignment of the liquid crystal layer disposed on the ITO layer is hardly disturbed by a step on the ITO layer. It can be a filter.

  As described above, when a colored layer is formed by a pigment dispersion method used for forming a colored layer of a general color filter, or when a colored layer is formed by an inkjet method or the like, a coating solution for forming a colored layer When the amount of the film is not appropriate, the ITO layer formed on the ITO layer has a sudden film thickness difference, and the film thickness on the surface of the ITO layer as described above may change gradually. could not.

  On the other hand, in this embodiment, a photocatalyst-containing layer is formed on the light-shielding portion, and the photocatalyst-containing layer contains a photocatalyst and an organopolysiloxane. As a result, the contact angle with the liquid on the surface can be reduced. Thereby, a colored layer can be formed, for example with the inkjet method etc. using the difference in the wettability of a photocatalyst content layer. When the colored layer is formed by an ink jet method or the like, a step such as patterning after curing is not required, the colored layer formed on the light shielding portion is not raised and formed, and the amount of deposit is appropriate. As a result, the change in film thickness can be made gentle. Therefore, the change in the thickness of the ITO layer formed on the colored layer can be made gentle.

  Here, as the ratio of the film thickness of the maximum film thickness portion and the film thickness of the minimum film thickness portion in each pixel described above, specifically, the film thickness of the maximum film thickness portion and the film thickness of the minimum film thickness portion in each pixel When the thickness ratio is calculated and the average of 10 pixels is taken, the value α is preferably 0.30 <α <0.95, particularly 0.40 <α <0.90. This is because when the value of α is smaller than 0.30, the liquid crystal display device may disturb the orientation of the liquid crystal on the ITO layer due to the difference in film thickness. On the other hand, in order to form the value of α higher than 0.95, for example, the film thickness t in which the light shielding portion 2, the photocatalyst containing layer 3 and the ITO layer 5 shown in FIG. The film thickness s of the layer 4 and the ITO layer 5 needs to be approximately the same, and white spots may occur between the colored layer 3 and the light shielding portion 2, which is not preferable. Because. Here, the 10 pixels are arbitrarily selected.

Further, in the above-described pixels, 10 is calculated when (the film thickness of the maximum film thickness portion−the film thickness of the minimum film thickness portion) / (the distance from the maximum film thickness portion to the minimum film thickness portion) is calculated. The average β of the pixels is preferably 0.002 <β <0.05, more preferably 0.004 <β <0.03, and particularly preferably 0.01 <β <0.02. This value indicates the inclination from the minimum film thickness portion to the maximum film thickness portion, and it can be said that the larger the value, the steeper the inclination. This is because, when β is 0.05 or more, the inclination becomes steep, and the orientation of the liquid crystal on the ITO layer may be disturbed. On the other hand, when the inclination is 0.002 or less, white spots may occur between the colored layer and the light shielding portion, as in the case of α. In this embodiment, since the inclination is within the above range, the change in film thickness can be made relatively gradual, and the possibility of affecting the orientation of the liquid crystal is reduced. It can be done.
Hereinafter, the color filter of this embodiment will be described for each configuration.

1. Colored layer First, the colored layer used for the color filter of this embodiment is demonstrated. The colored layer used in the color filter of the present embodiment is not particularly limited as long as it is formed on the photocatalyst-containing layer described later and is formed in the opening of the light shielding portion. In order to prevent white spots of the color filter, the color filter is formed so as to cover a part of a light shielding portion described later.

  Here, the ITO layer described later is formed on the colored layer. Therefore, when the colored layer surface has irregularities, the ITO layer is formed along the irregularities, so that the film thickness of the color filter cannot be as described above. Therefore, in this embodiment, it is preferable that the difference in film thickness of the colored layer is small and the change in film thickness is gradual.

  In the present embodiment, the method for forming the colored layer is not particularly limited as long as it is a method capable of forming such a colored layer, but in particular, the difference in wettability of the photocatalyst-containing layer described later. It is preferable that the coating layer is formed by applying a coloring layer forming coating solution in an appropriate amount by a discharge method such as an ink jet method. Thus, the colored layer forming coating liquid for forming the colored layer can be formed by applying the coating liquid on the target photocatalyst-containing layer and curing the coating liquid, and has a gradual change in film thickness. Because it can.

  Here, the thickness of the portion where the thickness of the colored layer is maximized is appropriately selected depending on the type and application of the color filter, and is usually 1.5 μm to 3 μm, particularly 1.7 μm to 2 μm. .8 μm, particularly in the range of 1.8 μm to 2.5 μm.

  The colored layer is usually formed of three colors of red (R), green (G), and blue (B). The colored pattern shape in the colored layer can be a known arrangement such as a stripe type, a mosaic type, a triangle type, or a four-pixel arrangement type, and the colored area can be arbitrarily set. Moreover, since the coating liquid for forming a colored layer used in this step can be the same as that used for a general color filter, detailed description thereof is omitted here.

2. Next, the photocatalyst containing layer used in this embodiment will be described. The photocatalyst-containing layer used in this embodiment is not particularly limited as long as it contains a photocatalyst and an organopolysiloxane, and is formed so as to cover a base material and a light-shielding portion described later. Usually, in the photocatalyst-containing layer, the photocatalyst fine particles are formed in a mixture of a part or all of the photocatalyst fine particles coated with organopolysiloxane, and the photocatalyst fine particles are partially exposed on the surface.

  Here, since the photocatalyst-containing layer contains an organopolysiloxane, the wettability of the surface can be changed by the action of the photocatalyst when irradiated with energy. The water-repellent region and the region not irradiated with energy can be used as the liquid repellent region.

  In the present embodiment, the contact angle with a liquid having a surface tension of 30 mN / m is 10 ° or more, particularly the contact angle with a liquid having a surface tension of 30 mN / m is 10 ° or more in a non-energy-irradiated portion, that is, a liquid repellent region. It is preferable that the contact angle with a liquid having a surface tension of 20 mN / m is 10 ° or more. This is because the part that is not irradiated with energy is a part that requires liquid repellency, so when the contact angle with the liquid is small, the liquid repellency is not sufficient. For example, the above-described colored layer is formed. When the colored layer forming coating liquid is applied by an inkjet method and cured, the colored layer forming coating liquid may adhere to the liquid-repellent region. This is because it becomes difficult to form a colored layer.

  The photocatalyst-containing layer has a contact angle with a liquid of 40 mN / m of less than 9 °, preferably a liquid with a surface tension of 50 mN / m, in a portion irradiated with energy, that is, a lyophilic region. The layer is preferably such that the contact angle with a liquid having a surface tension of 10 ° or less, particularly 60 mN / m, is 10 ° or less. When the contact angle with the liquid in the energy irradiated part, that is, the lyophilic region is high, for example, the colored layer forming coating liquid for forming the colored layer may be repelled in the lyophilic region. This is because, for example, when the coating liquid for forming a colored layer is applied by an ink jet method, the coating liquid for forming a colored layer is not sufficiently spread and spread, and it may be difficult to form a colored layer.

  Furthermore, in this embodiment, the difference in the contact angle between the lyophilic region and the liquid repellent region with the liquid having a surface tension of 40 mN / m is 10 ° or more, and particularly within the range of 20 ° to 60 °. It is preferable. When the difference in wettability between the lyophilic area and the lyophobic area is small, the lyophilic liquid is applied when the colored layer forming coating liquid is applied in such a volume as to form the colored layer described above. This is because the colored layer-forming coating solution cannot be retained only in the property region, and it is difficult to form the colored layer in the intended shape.

  In addition, the contact angle with the liquid here is measured using a contact angle measuring instrument (Kyowa Interface Science Co., Ltd. CA-Z type) with a liquid having various surface tensions (from the microsyringe to the liquid. 30 seconds after dropping), and the result was obtained or the result was graphed. In this measurement, as a liquid having various surface tensions, a wetting index standard solution manufactured by Pure Chemical Co., Ltd. was used.

  The photocatalyst-containing layer used in the present embodiment contains fluorine in the photocatalyst-containing layer. Further, when the fluorine content on the surface of the photocatalyst-containing layer is irradiated with energy to the photocatalyst-containing layer, the photocatalyst-containing layer functions as described above. The photocatalyst-containing layer may be formed so as to be lower than that before energy irradiation, and can be decomposed by the action of the photocatalyst by energy irradiation, thereby changing the wettability on the photocatalyst-containing layer. You may form so that a decomposition | disassembly substance may be included.

  Hereinafter, the photocatalyst, organopolysiloxane, and other components constituting such a photocatalyst-containing layer will be described.

a. Photocatalyst First, the photocatalyst used in this embodiment will be described. Examples of the photocatalyst used in the present embodiment include titanium dioxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), and tungsten oxide (WO ₃ ), which are known as optical semiconductors. , Bismuth oxide (Bi ₂ O ₃ ), and iron oxide (Fe ₂ O ₃ ) can be used, and one or two or more can be selected and mixed.

  The mechanism of action of such a photocatalyst is not necessarily clear, but radicals generated by light irradiation are reacted directly with nearby compounds, or by active oxygen species generated in the presence of oxygen and water, It is thought to change the chemical structure of organic matter. In this embodiment, it is considered that this radical or active oxygen species acts on the organopolysiloxane in the photocatalyst containing layer to change the wettability of the surface.

  In this embodiment, titanium dioxide is particularly preferably used because it has a high band gap energy, is chemically stable, has no toxicity, and is easily available. Titanium dioxide includes anatase type and rutile type, and both can be used in this embodiment, but anatase type titanium dioxide is preferable. Anatase type titanium dioxide has an excitation wavelength of 380 nm or less.

  Examples of such anatase type titanium dioxide include hydrochloric acid peptizer type anatase type titania sol (STS-02 manufactured by Ishihara Sangyo Co., Ltd. (average particle size 7 nm), ST-K01 manufactured by Ishihara Sangyo Co., Ltd.), nitric acid solution An anatase type titania sol (TA-15 manufactured by Nissan Chemical Co., Ltd. (average particle size 12 nm)) and the like can be mentioned.

  The smaller the particle size of the photocatalyst, the more effective the photocatalytic reaction occurs. The average particle size is preferably 50 nm or less, and it is particularly preferable to use a photocatalyst of 20 nm or less.

  The content of the photocatalyst in the photocatalyst-containing layer used in this embodiment can be set in the range of 5 to 60% by weight, preferably 20 to 40% by weight.

b. Organopolysiloxane Next, the organopolysiloxane used in this embodiment will be described. The organopolysiloxane used in the present embodiment is not particularly limited as long as it can change the wettability of the surface of the photocatalyst containing layer by the action of the photocatalyst accompanying energy irradiation. However, those having a high binding energy that is not decomposed by photoexcitation of the photocatalyst and having an organic substituent that is decomposed by the action of the photocatalyst are preferable. Specifically, (1) an organopolysiloxane that exhibits high strength by hydrolyzing and polycondensing chloro or alkoxysilane by sol-gel reaction or the like, and (2) a reactive silicone having excellent water repellency and oil repellency. Cross-linked organopolysiloxanes can be mentioned.

In the case of (1) above, the general formula:
Y _n SiX _(4-n)
(Where Y is an alkyl group, fluoroalkyl group, vinyl group, amino group, phenyl group, chloroalkyl group, isocyanate group, or epoxy group, or an organic group containing these, and X is an alkoxyl group, acetyl group, or Represents halogen, n is an integer from 0 to 3)
It is preferable that it is the organopolysiloxane which is a 1 type, or 2 or more types of hydrolysis condensate or cohydrolysis condensate of the silicon compound shown by these. Here, the alkoxy group represented by X is preferably a methoxy group, an ethoxy group, a propoxy group, or a butoxy group. Moreover, it is preferable that the carbon number of the whole organic group shown by Y exists in the range of 1-20, especially in the range of 5-10.

  Thus, when the photocatalyst-containing layer is formed, the surface can be made liquid-repellent by Y constituting the organopolysiloxane, and the Y is decomposed by the action of the photocatalyst accompanying energy irradiation. This is because it can be made lyophilic.

In particular, when an organopolysiloxane in which Y constituting the organopolysiloxane is a fluoroalkyl group is used, the photocatalyst-containing layer before energy irradiation can be made particularly high in liquid repellency. When high liquid repellency is required, it is preferable to use an organopolysiloxane having these fluoroalkyl groups. Specific examples of such organopolysiloxanes include one or more of the following hydroalkyl silanes, co-hydrolysis condensates, and are generally known as fluorine-based silane coupling agents. Can be used.
_{CF 3 (CF 2) 3 CH} 2 CH 2 Si (OCH 3) 3;
_{CF 3 (CF 2) 5 CH} 2 CH 2 Si (OCH 3) 3;
_{CF 3 (CF 2) 7 CH} 2 CH 2 Si (OCH 3) 3;
_{CF 3 (CF 2) 9 CH} 2 CH 2 Si (OCH 3) 3;
(CF ₃ ) ₂ CF (CF ₂ ) ₄ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
_{(CF 3) 2 CF (CF} 2) 6 CH 2 CH 2 Si (OCH 3) 3;
_{(CF 3) 2 CF (CF} 2) 8 CH 2 CH 2 Si (OCH 3) 3;
_{CF 3 (C 6 H 4)} C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 3 (} C 6 H 4) C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 5 (} C 6 H 4) C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 7 (} C 6 H 4) C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 3 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 5 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 7 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 9 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{(CF 3) 2 CF (CF} 2) 4 CH 2 CH 2 SiCH 3 (OCH 3) 2;
_{(CF 3) 2 CF (CF} 2) 6 CH 2 CH 2 Si CH 3 (OCH 3) 2;
_{(CF 3) 2 CF (CF} 2) 8 CH 2 CH 2 Si CH 3 (OCH 3) 2;
_{CF 3 (C 6 H 4)} C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 3 (} C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 5 (} C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 7 (} C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 3 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 5 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 7 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 9 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 7 SO} 2 N (C 2 H 5) C 2 H 4 CH 2 Si (OCH 3) 3.

  Examples of the reactive silicone (2) include compounds having a skeleton represented by the following general formula.

However, n is an integer of 2 or more, R ^1, R ² are each a substituted or unsubstituted alkyl having 1 to 10 carbon atoms, alkenyl, aryl or cyanoalkyl group, the total molar ratio of 40% or less Vinyl, phenyl and phenyl halide. Further, those in which R ¹ and R ² are methyl groups are preferable because the surface energy becomes the smallest, and the methyl groups are preferably 60% or more by molar ratio. In addition, the chain end or side chain has at least one reactive group such as a hydroxyl group in the molecular chain.

  The organopolysiloxane is preferably contained in the photocatalyst-containing layer in an amount of 5 to 90% by weight, especially about 30 to 60% by weight.

c. Other Substances In the photocatalyst-containing layer used in the present embodiment, a stable organosilicon compound that does not undergo a crosslinking reaction, such as dimethylpolysiloxane, may be mixed with a binder together with the organopolysiloxane. Furthermore, examples of the binder include polysiloxanes having a high binding energy that does not cause the main skeleton to be decomposed by photoexcitation of the photocatalyst, or that do not have an organic substituent, or have an organic substituent. You may contain what hydrolyzed and polycondensed methoxysilane, tetraethoxysilane, etc.

  Furthermore, in order to assist the function of changing the wettability of the organopolysiloxane, a decomposition substance that is decomposed by energy irradiation may be included. Examples of such a decomposing substance include a surfactant having a function of decomposing by the action of a photocatalyst and changing the wettability of the photocatalyst-containing layer surface by decomposing. Specifically, hydrocarbons such as NIKKOL BL, BC, BO, BB series manufactured by Nikko Chemicals Co., Ltd., ZONYL FSN, FSO manufactured by DuPont, Surflon S-141, 145 manufactured by Asahi Glass Co., Ltd., Dainippon Megafac F-141, 144 manufactured by Ink Chemical Industry Co., Ltd., Footgent F-200, F251 manufactured by Neos Co., Ltd., Unidyne DS-401, 402 manufactured by Daikin Industries, Ltd., Fluorard FC-170 manufactured by 3M Co., Ltd. Fluorine-based or silicone-based nonionic surfactants such as 176, and cationic surfactants, anionic surfactants, and amphoteric surfactants can also be used.

  Besides surfactants, polyvinyl alcohol, unsaturated polyester, acrylic resin, polyethylene, diallyl phthalate, ethylene propylene diene monomer, epoxy resin, phenol resin, polyurethane, melamine resin, polycarbonate, polyvinyl chloride, polyamide, polyimide Styrene butadiene rubber, chloroprene rubber, polypropylene, polybutylene, polystyrene, polyvinyl acetate, nylon, polyester, polybutadiene, polybenzimidazole, polyacrylonitrile, epichlorohydrin, polysulfide, polyisoprene, oligomers, polymers, and the like.

d. In addition, in this embodiment, when the photocatalyst containing layer contains fluorine, and the fluorine content on the surface of the photocatalyst containing layer is irradiated with energy to the photocatalyst containing layer, the energy of the photocatalyst is increased by the action of the photocatalyst. The photocatalyst-containing layer is preferably formed so as to be lower than that before irradiation. Thereby, the pattern which consists of a part with little content of fluorine can be easily formed by irradiating energy with a pattern so that it may mention later. Here, fluorine has an extremely low surface energy. Therefore, the surface of a substance containing a large amount of fluorine has a smaller critical surface tension. Therefore, the critical surface tension of the portion having a small fluorine content is larger than the critical surface tension of the surface of the portion having a large fluorine content. This means that the portion with a low fluorine content is a lyophilic region compared to the portion with a high fluorine content. Therefore, forming a pattern composed of a portion having a lower fluorine content than the surrounding surface forms a pattern of a lyophilic region in the liquid repellent region.

  Therefore, when such a photocatalyst-containing layer is used, the pattern of the lyophilic region can be easily formed in the liquid-repellent region by irradiating the pattern with energy. This is because a colored layer having the shape as described above can be formed.

  As described above, the fluorine content contained in the photocatalyst containing layer containing fluorine is not irradiated with energy in the lyophilic region having a low fluorine content formed by energy irradiation. When the fluorine content of the part is 100, it is 10 or less, preferably 5 or less, particularly preferably 1 or less.

  By setting it within such a range, it is possible to make a large difference in lyophilicity between the energy-irradiated portion and the unirradiated portion. Therefore, for example, by attaching a coating liquid for forming a colored layer to such a photocatalyst-containing layer, it becomes possible to accurately form a colored layer only in a lyophilic region having a reduced fluorine content. This is because a good color filter can be obtained. This rate of decrease is based on weight.

  For the measurement of the fluorine content in the photocatalyst-containing layer, various commonly used methods can be used. For example, X-ray photoelectron spectroscopy (ES-ray photoelectron spectroscopy, ESCA) for Chemical Analysis)), and any method that can quantitatively measure the amount of fluorine on the surface, such as X-ray fluorescence analysis and mass spectrometry, is not particularly limited.

  In this embodiment, titanium dioxide is preferably used as the photocatalyst as described above. When titanium dioxide is used in this manner, the content of fluorine contained in the photocatalyst-containing layer is X-ray. When analyzed and quantified by photoelectron spectroscopy, when the titanium (Ti) element is defined as 100, fluorine (F) element is 500 or more, preferably 800 or more, particularly preferably 1200 or more. F) It is preferable that the element is contained in the surface of the photocatalyst containing layer.

  Fluorine (F) is included in the photocatalyst-containing layer to such an extent that the critical surface tension on the photocatalyst-containing layer can be sufficiently lowered, so that the liquid repellency on the surface can be secured, thereby irradiating energy with the pattern This is because the difference in wettability with the lyophilic region on the surface of the pattern portion where the fluorine content is reduced can be increased, and the accuracy of the color filter finally obtained can be improved.

  Further, in such a color filter, the fluorine content in the lyophilic region formed by pattern irradiation with energy is 50 or less when the titanium (Ti) element is 100, preferably It is preferably contained in a ratio of 20 or less, particularly preferably 10 or less.

  If the fluorine content in the photocatalyst-containing layer can be reduced to this extent, sufficient lyophilicity can be obtained for forming a color filter, and the liquid repellency of the portion where the energy is not irradiated can be obtained. Due to the difference in wettability, the color filter can be formed with high accuracy, and a color filter with high utility value can be obtained.

e. Method for Forming Photocatalyst-Containing Layer As a method for forming the photocatalyst-containing layer as described above, a coating solution is prepared by dispersing the photocatalyst and organopolysiloxane in a solvent together with other additives as necessary. It can form by apply | coating a liquid on a base material. As the solvent to be used, alcohol-based organic solvents such as ethanol and isopropanol are preferable. The application can be performed by a known application method such as spin coating, spray coating, dip coating, roll coating, or bead coating. When an ultraviolet curable component is contained as a binder, the photocatalyst-containing layer can be formed by performing a curing treatment by irradiating ultraviolet rays. At this time, the thickness of the photocatalyst-containing layer is preferably in the range of 0.05 to 10 μm. If it is thinner than the above range, it is not preferable because the function such as change in wettability of the surface of the photocatalyst-containing layer is lowered, and if it is thicker than the above range, the distance between the light-shielding part and the colored layer to be described later This is because if the color filter is used in a liquid crystal display device, light leakage of the backlight may occur.

f. Method for forming wettability change pattern on photocatalyst-containing layer Next, the photocatalyst-containing layer is irradiated with energy, and a wettability change pattern with changed wettability is formed in a pattern that forms a colored layer described later. A method will be described. In this embodiment, as described above, the wettability of the organopolysiloxane in the photocatalyst-containing layer changes due to the action of the photocatalyst accompanying energy irradiation. Therefore, for example, as shown in FIG. 2, when the photocatalyst containing layer 3 is irradiated with energy 7 using a photomask 6 or the like (FIG. 2 (a)), the wettability with the wettability changed on the photocatalyst containing layer 3 is changed. The sex change pattern 8 is formed (FIG. 2B). When a wettability change pattern is formed on the photocatalyst-containing layer, when a coloring layer forming coating liquid for forming a colored layer described later is applied by an ink jet method or the like, an ink is not applied to a region not irradiated with energy. The coating liquid for forming a colored layer can be adhered with high precision only on the wettability change pattern 8 in which the wettability is not changed. In addition, a colored layer having the shape as described above can be formed.

  Here, the energy irradiated to the photocatalyst containing layer is not particularly limited as long as it is a method of irradiating energy capable of changing the wettability of the photocatalyst containing layer. The energy irradiation (exposure) in the present embodiment is a concept including irradiation of any energy ray capable of changing the wettability of the surface of the photocatalyst containing layer, and is not limited to visible light irradiation. .

  Usually, the wavelength of light used for such energy irradiation is set in the range of 400 nm or less, preferably in the range of 150 nm to 380 nm. This is because, as described above, the preferred photocatalyst used in the photocatalyst-containing layer is titanium dioxide, and light having the above-described wavelength is preferable as the energy for activating the photocatalytic action by the titanium dioxide.

  Examples of light sources that can be used for such energy irradiation include mercury lamps, metal halide lamps, xenon lamps, excimer lamps, and various other light sources. In addition to the method of performing pattern irradiation using a light mask using a light source as described above, it is also possible to use a method of drawing and irradiating in a pattern using a laser such as excimer or YAG.

  In addition, the irradiation amount of energy at the time of energy irradiation is set to an irradiation amount necessary for changing the wettability of the surface of the photocatalyst containing layer by the action of the photocatalyst in the photocatalyst containing layer.

  At this time, it is preferable in that the sensitivity can be further increased by irradiating energy while heating the photocatalyst-containing layer, and the wettability can be changed efficiently. Specifically, it is preferable to heat within a range of 30 ° C to 80 ° C.

  The energy irradiation direction in the present embodiment may be the pattern energy irradiation or the laser drawing irradiation through the photomask from any direction on the substrate side and the photocatalyst containing layer side when the substrate described later is transparent. good. In addition, in this embodiment, since the light-shielding part mentioned later is formed on the base material, when energy is irradiated to the whole surface from the base material side, the photocatalyst containing layer on the area | region in which the light-shielding part was formed The wettability of only the opening of the light shielding part can be changed. Therefore, there is an advantage that the wettability change pattern can be efficiently formed without requiring a step of alignment of a photomask or the like. On the other hand, when the substrate is opaque, it is necessary to irradiate energy from the photocatalyst containing layer side.

3. Next, the light shielding part used in the present embodiment will be described. The light-shielding part used in this embodiment is formed on a base material to be described later and contains a light-shielding material and a resin. It is not limited. Such a method for forming the light shielding portion is appropriately selected and used depending on the shielding property against the required energy.

  The thickness of such a light shielding portion is usually set within a range of 1.0 μm to 1.5 μm, particularly 1.1 μm to 1.4 μm. In this embodiment, as described above, it is preferable that the difference in film thickness from the substrate surface to the ITO layer surface is small and the change in film thickness is gradual. Therefore, by making the film thickness of the light shielding part within the above range and forming the colored layer as described above, the change in film thickness on the surface of the ITO layer formed on the light shielding part or the colored layer is reduced. Because it can.

  In this embodiment, as a method for forming such a light shielding part, for example, a layer containing light shielding particles such as carbon fine particles, metal oxides, inorganic pigments, and organic pigments in a resin binder is formed in a pattern. And the like. As the resin binder to be used, polyimide resin, acrylic resin, epoxy resin, polyacrylamide, polyvinyl alcohol, gelatin, casein, cellulose, or a mixture of one or more kinds, photosensitive resin, or O / A W emulsion type resin composition, for example, an emulsion of a reactive silicone can be used. As a method for patterning such a resin light shielding portion, a generally used method such as a photolithography method or a printing method can be used.

  Furthermore, in the present embodiment, the light shielding portion may be formed by a thermal transfer method. The thermal transfer method for forming a light-shielding part is usually a thermal transfer sheet having a light-to-heat conversion layer and a light-shielding part transfer layer provided on one side of a transparent film base material, and energy is applied to the area where the light-shielding part is formed By irradiating, the light shielding part transfer layer is transferred onto the substrate to form the light shielding part.

  The light shielding part transferred by the thermal transfer method is usually composed of a light shielding material and a binder, and inorganic particles such as carbon black and titanium black can be used as the light shielding material. The particle diameter of such a light-shielding material is preferably 0.01 μm to 1.0 μm, and more preferably 0.03 μm to 0.3 μm.

  Further, the binder is preferably a resin composition having thermoplasticity and thermosetting properties, has a thermosetting functional group, and has a softening point in the range of 50 ° C to 150 ° C, particularly 60 ° C. It is preferable to be comprised by the resin material which exists in the range of -120 degreeC, a hardening | curing agent, etc. Specific examples of such a material include a combination of an epoxy compound or epoxy resin having two or more epoxy groups in one molecule and a latent curing agent thereof. As a latent curing agent for epoxy resins, it does not have reactivity with epoxy groups up to a certain temperature, but when it reaches the activation temperature by heating, it changes to a molecular structure with reactivity with epoxy groups. A curing agent can be used. Specific examples include neutral salts and complexes of acidic or basic compounds having reactivity with epoxy resins, block compounds, high melting point bodies, and microcapsules. In addition to the above materials, the light-shielding part may contain a release agent, an adhesion assistant, an antioxidant, a dispersant, and the like.

  In this embodiment, a primer layer may be formed between the photocatalyst containing layer and the light shielding part. Although the action and function of this primer layer are not necessarily clear, by forming the primer layer, it becomes a factor that inhibits the above-mentioned wettability change of the photocatalyst-containing layer from the light-shielding part and the opening existing between the light-shielding parts. This is considered to exhibit a function of preventing diffusion of impurities, particularly residues generated when the light shielding portion is patterned, and impurities. Therefore, by forming the primer layer, the wettability of the photocatalyst containing layer can be changed with high sensitivity, and as a result, a high resolution pattern can be obtained.

  In this embodiment, the primer layer prevents impurities present in the openings formed between the light shielding portions as well as the light shielding portions from affecting the action of the photocatalyst. It is preferable that it is formed over the entire light shielding part.

  The primer layer in this embodiment is not particularly limited as long as the primer layer is formed so that the light shielding part and the photocatalyst containing layer do not come into contact with each other.

The material constituting the primer layer is not particularly limited, but an inorganic material that is not easily decomposed by the action of the photocatalyst is preferable. Specific examples include amorphous silica. When such amorphous silica is used, the precursor of the amorphous silica is represented by the general formula SiX ₄ and X is a silicon compound such as halogen, methoxy group, ethoxy group, or acetyl group, Silanol which is a hydrolyzate thereof or polysiloxane having an average molecular weight of 3000 or less is preferable.

  The thickness of the primer layer is preferably in the range of 0.001 μm to 1 μm, particularly preferably in the range of 0.001 μm to 0.1 μm.

4). ITO layer Next, the ITO layer used in this embodiment will be described. The ITO layer used in this embodiment is formed on the colored layer, and is formed by adhering to the photocatalyst-containing layer between adjacent colored layers.

  The ITO layer used in this embodiment can be the same as the ITO layer used for a general color filter. Examples of such an ITO layer forming method include in-line low-temperature sputtering method, in-line high-temperature sputtering method, batch-type low-temperature sputtering method, batch-type high-temperature sputtering method, vacuum deposition method, and plasma CVD method. In order to reduce damage to the filter, a low temperature sputtering method is preferably used. Further, when a high film forming speed is required, a high temperature sputtering method is preferably used.

  The thickness of the ITO layer used in this embodiment is preferably about 500 to 3000 mm, and more preferably about 1000 to 2500 mm. It is because the film thickness from the substrate surface to the ITO layer surface can be as described above by setting the film thickness of the ITO layer within the above range. In addition, when the thickness is smaller than the above range, the resistance value of the ITO film becomes too high, so that it may be difficult to express the performance as an electrode. This is because, since the strain stress of the layer becomes strong, fine cracks may occur.

  Here, in a general color filter, the thickness of the ITO layer is about 1600 to 1700 mm, the resistance value is about 20Ω / □, and the transmittance is 95% or more / 400 nm. On the other hand, in the color filter of the present embodiment, the photocatalyst containing layer contains the photocatalyst fine particles that are inorganic components, and is in partial contact with the ITO layer. Even when the film thickness is increased and strain stress is applied to the ITO layer, the adhesion of the ITO layer can be improved. Therefore, for example, an ITO layer having a thickness of about 2000 to 2500 mm can be formed. When the thickness of the ITO layer is in such a range, the resistance value of the ITO layer of a normal color filter is about 20Ω / □, but the resistance value can be lowered from 10Ω / □ to 1Ω / □. . At this time, the transmittance is lowered by increasing the thickness of the ITO layer. However, if the transmittance is reduced in the thickness within this range, there is no problem as a color filter. It can be said.

  Here, it is effective to use the color filter having a reduced resistance value of the ITO layer as described above for a large-sized liquid crystal display device of, for example, 40 inches or more. This is because the sheet resistance of the ITO layer in the image region is reduced due to the low resistance value of the ITO layer, so that the driving speed of the electric driving circuit is improved and higher speed electric driving can be supported. Therefore, it is possible to cope with high-speed liquid crystal driving, the electric responsiveness in the image area plane becomes more uniform, and the in-plane uniformity of the image is improved.

5). Next, the base material used in this embodiment will be described. The base material used in this embodiment is not particularly limited as long as it can form the light-shielding part and the photocatalyst-containing layer, and those conventionally used for color filters can be used. . Specifically, transparent flexible materials such as quartz glass, Pyrex (registered trademark) glass, and synthetic quartz plates, or flexible flexible materials such as transparent resin films and optical resin plates, etc. Can be mentioned. Among them, Corning 7059 glass is a material having a small coefficient of thermal expansion, excellent dimensional stability and workability in high-temperature heat treatment, and is an alkali-free glass containing no alkali component in the active matrix. Suitable for color filters for color liquid crystal display devices. In this embodiment, a transparent substrate is usually used, but a reflective substrate or a white colored substrate can also be used. Further, the substrate may be subjected to surface treatment for preventing alkali elution, imparting a gas barrier property or other purposes as required.

6). Color filter The color filter of the present embodiment includes the above-described base material, a light-shielding portion formed on the base material, a photocatalyst-containing layer formed so as to cover the base material and the light-shielding portion, and the photocatalyst-containing layer. In each pixel, the film thickness from the substrate surface to the ITO layer surface is as described above in each pixel. There is no particular limitation as long as it is present. In addition, a protective layer or the like may be formed.

B. Second Embodiment Next, a second embodiment of the color filter of the present invention will be described. A second embodiment of the color filter of the present invention includes a base material, a light shielding part containing a light shielding material and a resin formed on the base material, and a photocatalyst formed so as to cover the base material and the light shielding part. And a photocatalyst containing layer containing organopolysiloxane, a colored layer formed on the photocatalyst containing layer in the opening of the light shielding part, and an ITO layer formed so as to cover the colored layer There,
The average of 10 pixels of the maximum kurtosis on the surface of the ITO layer in each pixel is not more than a predetermined value.

  In the color filter of this embodiment, since the average value of the maximum kurtosis on the surface of the ITO layer is not more than a predetermined value, there can be little change in the thickness of the ITO layer on the surface. In addition, the orientation of the liquid crystal formed on the ITO layer may not be affected.

  Here, the kurtosis is a parameter indicating the degree of steepness of the protrusions existing on the surface. The lower the numerical value, the gentler the protrusion shape. In this embodiment, when the maximum kurtosis of the ITO layer surface in each pixel is measured, the average of 10 pixels is preferably 6.0 or less, particularly 5.0 or less, particularly 4.0 or less. This kurtosis is measured by Digital Instrument Co., Ltd., dimension 3000 series, measurement software ver. It can be measured by 4.31 Release 31. The 10 pixels are arbitrarily selected.

  In this embodiment, the color filter having the maximum kurtosis is formed by using the photocatalyst-containing layer, the colored layer, the light shielding portion, the ITO layer, the base material, etc. described in the first embodiment. Since it is realizable, detailed description here is abbreviate | omitted.

C. Next, a method for manufacturing a color filter in the above-described two embodiments will be described. In any of the color filters described above,
On the base material, a light shielding part forming step of forming a light shielding part containing a light shielding material and a resin so that the film thickness is within a predetermined range;
A photocatalyst-containing layer forming step of forming a photocatalyst-containing layer containing a photocatalyst and an organopolysiloxane so as to cover the substrate and the light-shielding portion;
A wettability change pattern forming step for forming a wettability change pattern in which a contact angle with the liquid on the surface of the photocatalyst containing layer is reduced by irradiating the photocatalyst containing layer with energy from a predetermined direction;
On the wettability change pattern, a colored layer forming coating solution coating step of applying a colored layer forming coating solution in a predetermined amount within a predetermined range with respect to a predetermined area of the photocatalyst containing layer by an inkjet method. And an ITO layer forming step of forming an ITO layer on the colored layer.

  In the above-described color filter manufacturing method, for example, as shown in FIG. 3, a light shielding part forming step (FIG. 3A) for forming a light shielding part 2 having a predetermined film thickness on a substrate 1 is performed. A photocatalyst-containing layer forming step (FIG. 3B) for forming the photocatalyst-containing layer 3 so as to cover the part 2 and the substrate 1 is performed.

  Next, the photocatalyst-containing layer 3 is irradiated with energy 7 from a predetermined direction using, for example, a photomask 6 (FIG. 3C), so that the wettability of the surface of the photocatalyst-containing layer 3 is changed. A wettability change pattern forming step (FIG. 3D) for forming the change pattern 8 is performed. Subsequently, a coloring layer forming coating liquid application step (FIG. 3 (e)) is performed on the wettability change pattern 8 by applying the coloring layer forming coating liquid 11 by the inkjet device 10 or the like. It forms (FIG.3 (f)). Further, an ITO layer forming step for forming the ITO layer 5 on the colored layer 4 is performed (FIG. 3G), and a color filter can be manufactured.

In the present invention, the photocatalyst-containing layer is irradiated with energy, and a wettability change pattern forming step for forming a wettability change pattern is performed. The coating liquid for forming a colored layer can be applied in a quantity of. As a result, it is possible to prevent a sudden change in film thickness on the colored layer or on the light-shielding portion, and to prevent a sudden change in film thickness in the ITO layer formed on the colored layer. Therefore, a high-quality color filter can be obtained without disturbing the alignment of the liquid crystal.
Hereinafter, each process will be described in detail.

1. First, the light shielding part forming process in the present invention will be described. The light shielding part forming step in the present invention is a process of forming a light shielding part containing a light shielding material and a resin with a predetermined film thickness on a base material.

  The thickness of the light shielding portion formed in the present invention is usually 1.0 μm to 1.5 μm, preferably 1.1 μm to 1.4 μm. Thereby, when the coating liquid for forming a colored layer is applied in a predetermined amount in the coating liquid coating process for forming a colored layer, which will be described later, a sudden change in film thickness on the colored layer or on the light shielding portion It is because it can be assumed that there is no.

  Here, the formation method of the light shielding part in this step is not particularly limited as long as the light shielding part can be formed as described above. For example, carbon fine particles, metal oxide, inorganic pigment, A layer containing light-shielding particles such as an organic pigment can be formed by a method of forming a pattern by a photolithography method, a printing method, or the like, a thermal transfer method, or the like. The material used for such a light shielding portion can be the same as that described in the section of the light shielding portion of “A. Color filter” described above, and a detailed description thereof will be omitted here.

2. Next, the photocatalyst containing layer forming step in the present invention will be described. The photocatalyst-containing layer forming step of the present invention is not particularly limited as long as it is a step of forming a photocatalyst-containing layer containing a photocatalyst and an organopolysiloxane so as to cover the base material and the light shielding part. In this step, the photocatalyst described in the section “A. Color filter” and organopolysiloxane are dispersed in a solvent together with other additives as necessary to prepare a coating solution, and this coating solution is applied onto a substrate. It can form by apply | coating to. The coating solution can be applied by a known coating method such as spin coating, spray coating, dip coating, roll coating, or bead coating. Further, in the case where an ultraviolet curable component is contained as a binder, the photocatalyst-containing layer can be formed by performing a curing treatment by irradiating ultraviolet rays. At this time, the thickness of the photocatalyst-containing layer is preferably in the range of 0.05 to 10 μm.

3. Energy Irradiation Step Next, the energy irradiation step in the present invention will be described. In the energy irradiation step of the present invention, the wettability change pattern in which the contact angle with the liquid on the surface of the photocatalyst containing layer is reduced by irradiating the photocatalyst containing layer formed in the photocatalyst containing layer forming step with energy from a predetermined direction. Is a step of forming. In this step, by forming a wettability change pattern in which the wettability of the photocatalyst-containing layer is changed into a pattern that forms the colored layer, this wettability change pattern is applied to the colored layer forming coating liquid application step described later. A colored layer can be formed along the line, and the colored layer can be formed in a high-definition pattern. In the present invention, since the colored layer forming coating solution is applied along the wettability change pattern, the applied colored layer forming coating solution does not spread out except for the wettability changing pattern. In the colored layer forming step described later, the colored layer forming coating solution can be applied in a predetermined amount. Thereby, a colored layer can be formed in a target shape, and a high-quality color filter that does not cause white spots or color unevenness at the end of the light shielding portion can be manufactured.

  Here, in the present invention, the contact angle with the liquid of the wettability change pattern in which the wettability has changed by energy irradiation, and the surface tension of 40 mN / m with the region where the energy has not been irradiated and the wettability has not changed. The difference in the contact angle with the liquid is preferably 10 ° or more, more preferably in the range of 20 ° to 60 °. Thereby, in the colored layer forming coating liquid application step described later, the colored layer forming coating liquid can be applied in a predetermined amount, and a colored layer having a desired shape can be formed. is there.

  In addition, since the energy irradiation method in this process can be the same as that described in the section of the photocatalyst containing layer of “A. Color filter” described above, detailed description thereof is omitted here.

4). Colored layer forming step Next, the colored layer forming step in the present invention will be described. In the colored layer forming step of the present invention, a colored layer is formed by an inkjet method with a predetermined amount on a predetermined area of the photocatalyst-containing layer on the wettability changing pattern formed by the wettability changing pattern forming step. It is the process of apply | coating the coating liquid. In the present invention, since the wettability change pattern is formed in the wettability change pattern forming step, the colored layer forming coating liquid is applied on the wettability change pattern with a predetermined amount. It is possible to reduce the film thickness abruptly on the light shielding portion or the colored layer.

Here, as the amount of the coating liquid for forming the colored layer, specifically, it is preferably applied within a range of 10 fl (femtoliter) to 100 fl, particularly 20 fl to 50 fl per 1 μm ^{2 of the} photocatalyst containing layer. Thereby, the film thickness of the colored layer to be formed can be normally 1.5 μm to 3 μm, especially 1.7 μm to 2.8 μm, and there is little change in the film thickness on the colored layer. Because it can.

  In addition, as the colored layer forming coating solution used in this step, a colored layer forming coating solution used when forming a colored layer of a general color filter can be used. The solid content concentration of the coating liquid is 15 to 30% by weight, preferably about 20% by weight, and the pigment is contained in the solid content in a P (pigment) / V (binder) ratio (ratio in weight%). Therefore, it is preferable to use a material containing about 0.2 to 0.4, especially about 0.3. This is because the film thickness can be obtained with the above-mentioned height and a colored layer with good color development can be obtained.

  In this step, the inkjet apparatus used for applying the coating liquid for forming the colored layer is not particularly limited. For example, a method in which charged ink is continuously ejected and controlled by a magnetic field, piezoelectric An ink jet apparatus using various methods such as a method of intermittently ejecting ink by using an element and a method of intermittently ejecting ink by heating and bubbling the ink can be used.

5). ITO Layer Forming Step Next, the ITO layer forming step will be described. The ITO layer forming step in the present invention can be the same as the ITO layer used in a general color filter. Examples of such an ITO layer forming method include in-line low-temperature sputtering method, in-line high-temperature sputtering method, batch-type low-temperature sputtering method, batch-type high-temperature sputtering method, vacuum deposition method, and plasma CVD method. In order to reduce damage to the filter, a low temperature sputtering method is preferably used. Further, when a high film forming speed is required, a high temperature sputtering method is preferably used.

  The thickness of the ITO layer used in the present invention is preferably about 500 to 3000 mm, more preferably about 1000 to 2500 mm.

  Here, since the ITO layer formed in this step can be the same as that described in the section of the ITO layer of “A. Color filter” described above, detailed description thereof is omitted here.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

  Hereinafter, the present invention will be described more specifically with reference to Examples and Comparative Examples.

[Example 1]
1. Formation of light shielding layer First, a soda glass substrate having a thickness of 1.1 mm was coated with a light shielding material having the following composition, and then prebaked at 100 ° C. for 15 minutes to dry the light shielding material to form a film. At this time, the light shielding material was applied by spin coating. The spin coating conditions were 1500 rpm / min.
・ Carbon black (black pigment) 28.5%
-Partially cyclized polyisoprene (negative photopolymer) 15.0%
・ Aromatic bisazide (photosensitive agent) 1.5%
・ Other additives 0.3%
・ Polyethylene glycol monomethyl ether acetate (solvent) 54.7%
Next, the thin film of the light shielding material formed as described above was irradiated with ultraviolet rays through a photomask, exposed at an exposure amount of 300 mJ / cm ² , developed and rinsed to form a light shielding layer. For development, a 0.1% NaCO ₃ aqueous solution was used as a developer. Thereafter, the light shielding layer obtained above was dried and then post-baked at 200 ° C. for 10 minutes to obtain a light shielding layer having a film thickness of 1.2 μm, a line width of 30 μm, and an interval of 100 μm.

2. Formation of a photocatalyst containing layer 0.4 g of MF-160E (manufactured by Tochem Products Co., Ltd.) having 30 g of isopropyl alcohol and fluoroalkylsilane as main components and 3 g of trimethoxymethylsilane (TSL8113 manufactured by Toshiba Silicone Co., Ltd.) 20 g of ST-K01 (manufactured by Ishihara Sangyo Co., Ltd.), which is a titanium oxide aqueous dispersion that is a photocatalyst, was mixed and stirred at 100 ° C. for 20 minutes. This was diluted 3 times with isopropyl alcohol to obtain a composition for a photocatalyst-containing layer.
A transparent photocatalyst-containing layer (thickness 0.2 μm) is formed by applying the composition to a transparent substrate made of soda glass on which the light-shielding layer is formed using a spin coater and performing a drying treatment at 150 ° C. for 10 minutes. Formed.

3. Confirmation of formation of ink-philic region by exposure This photocatalyst-containing layer is exposed to light through a mask with a mercury lamp (wavelength 365 nm) at an illuminance of 70 mW / cm ² for 50 seconds to form an exposed portion. The contact angle with the liquid was measured. In the non-exposed area, a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science Co., Ltd.) is used for the contact angle with a liquid having a surface tension of 30 mN / m (manufactured by Pure Chemical Co., Ltd., ethylene glycol monoethyl ether) As a result of measurement (30 seconds after dropping a droplet from the microsyringe), it was 30 degrees. In the exposed area, the contact angle with a liquid having a surface tension of 50 mN / m (manufactured by Junsei Co., Ltd., wetting index standard solution No. 50) was measured in the same manner, and as a result, it was 7 degrees. As described above, it was confirmed that the exposed portion becomes an ink-philic region with respect to the non-exposed portion, and that it is possible to form a pattern due to the difference in wettability between the exposed portion and the non-exposed portion.

4). Next, using a photomask on the photocatalyst-containing layer in which the light-shielding part is formed, the exposure (3) is performed with a line width of 110 μm and an interval of 20 μm (the line width is 110 μm, both sides are 5 μm on the light-shielding layer). The same exposure condition) was performed, and the exposure part for the pixel part was made ink-philic. Next, thermal curing of each color of RGB including 5 parts by weight of a pigment, 20 parts by weight of a solvent, 70 parts by weight of an acrylic acid / benzyl acrylate copolymer, and 5 parts by weight of a bifunctional epoxy-containing monomer is performed using each RGB inkjet device. The type polyepoxyacrylate ink was attached to the exposed portion of the pixel portion which was made ink-philic and colored, and was cured by heat treatment at 150 ° C. for 30 minutes. Here, for each of the red, green, and blue inks, the solvent is polyethylene glycol monomethyl ethyl acetate, the pigment is CI Pigment Red 177 for red ink, CI Pigment Green 36 for green ink, and CI Pigment Green 36 for blue ink Pigment Blue 15+ CI Pigment Violet 23 was used. The filling amount was dropped at 35 fl per 1 μm ² . As a result, an RGB stripe color filter having a line width of 100 μm and a light shielding portion of 30 μm was obtained. For each of the colored portions R, G, and B, when the boundary between the thickness of the central portion and the light-shielding portion was measured with a film thickness meter (Dectac), the thickness of the central portion was 2.3 μm, 2.4 μm, The film thickness of 2.3 μm and the boundary with the light shielding part was 2.1 μm, 2.2 μm, and 2.1 μm.

5). Formation of ITO film Set the surface of the obtained color filter face down, set it in the sputtering waiting room, exhaust in advance to medium vacuum (1 × 10 ⁻⁴ Torr), then exhaust the pressure to 1 × 10 ⁻⁶ Torr Then, the substrate was heated to 210 ° C. Thereafter, Ar gas containing 1.5 vol% O ₂ was introduced into the sputtering chamber, and the discharge gas pressure was controlled to 1.8 × 10 ⁻⁴ Torr. Size: 150 × 457 mm, resistivity: 1.9 × 10 ⁻⁴ Using an ITO target containing 10 wt% SnO ₂ at Ω · cm, sputtering is performed with a target surface magnetic field of 900 G at a target current density of 20 mA / cm ² and a discharge impedance of 10 Ω to form an ITO film having a thickness of 170 nm and a resistance value of 20 Ω / □. did.
Since the obtained ITO film had a smooth surface of the color filter, it could be uniformly formed, and the kurtosis was 1.0 even at a large place.
Moreover, the film thickness of the maximum film thickness part from the base-material surface to the ITO layer surface in each said pixel (R, G, B) is 2.47 micrometer, 2.57 micrometer, 2.47 micrometer, The film | membrane of the minimum film thickness part The thicknesses were 2.27 μm, 2.37 μm, and 2.27 μm, respectively. Therefore, the value of α was in the range of 0.919 to 0.922. Further, since the distance from the maximum film thickness portion to the minimum film thickness portion of each colored portion was 40 μm, the value of β was 0.005.

[Example 2]
The amount of the colored ink of Example 1 was increased from 35 fl to 50 fl, and a color filter and an ITO film were produced in the same process.
In this case, the film thickness of the central portion of the colored portions R, G, and B is 2.8 μm, 2.9 μm, and 2.8 μm, and the film thickness that can be placed at the boundary with the light shielding portion is 2.4 μm. It became 5 micrometers and 2.4 micrometers. As a result of depositing ITO in the same manner as in Example 1, the obtained ITO film had a smooth surface of the color filter, so that it could be uniformly formed and the kurtosis was 2.0 even at a large place. Moreover, the film thickness of the maximum film thickness part from the substrate surface to the ITO layer surface in each pixel (R, G, B) is 2.97 μm, 3.07 μm, 2.97 μm, and the film of the minimum film thickness part The thicknesses were 2.57 μm, 2.67 μm, and 2.57 μm, respectively. Therefore, the value of α was in the range of 0.865 to 0.870. Moreover, since the distance from the maximum film thickness part to the minimum film thickness part of the colored part was 40 μm, the value of β was 0.01.

[Comparative Example 1]
As a light-shielding layer, metallic chromium formed by sputtering was formed on a transparent substrate, and a similar color filter was formed except that a film thickness of 0.1 μm, a line width of 30 μm, and an interval of 100 μm was used. In this case, the film thickness at the central portion of the colored portion remained unchanged at 2.3 μm, but the film thickness at the boundary portion with the light shielding portion was all 0.3 μm.
Similarly, as a result of depositing ITO, the obtained ITO film had many irregularities on the surface of the color filter, making it difficult to form a uniform film thickness, and cracking occurred at the boundary of the colored portion. The kurtosis was 7.0 at the crack. The maximum film thickness from the substrate surface to the ITO layer surface in each pixel (R, G, B) is 2.47 μm, 2.47 μm, 2.47 μm. The thicknesses were 0.47 μm, 0.47 μm, and 0.47 μm, respectively. Therefore, each α value was 0.19. Further, since the distance from the maximum film thickness portion to the minimum film thickness portion of the colored portion was 30 μm, the value of β was 0.07.
[Comparative Example 2]
A color filter was produced in the same manner as in Example 1 except that the amount of the colored ink in Example 1 was changed from 35 fl to 10 fl per 1 μm ² .
As a result, the colored portion was thinner than the light shielding layer, and the colored portion had a shape as shown in FIG. Further, as a result of depositing ITO in the same manner as in Example 1, ITO breakage occurred at the boundary portion, and the kurtosis was 8.0 at the breakage portion. Further, the value of α was 0.83, but a sudden change in film thickness occurred at the boundary of the colored portion and the light shielding portion of 2 μm, and β became 0.1 and had a steep slope.

It is explanatory drawing which shows an example of the color filter of this invention. It is explanatory drawing which showed the process of changing the wettability of the photocatalyst content layer used for this invention. It is explanatory drawing which shows an example of the manufacturing method of the color filter of this invention. It is the schematic sectional drawing which showed the conventional color filter. It is the schematic sectional drawing which showed the conventional color filter.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Base material 2 ... Light-shielding part 3 ... Photocatalyst containing layer 4 ... Colored layer 5 ... ITO layer

Claims (2)

A base material, a light shielding portion containing a light shielding material and a resin formed on the base material, a photocatalyst and an organopolysiloxane-containing layer containing a photocatalyst formed to cover the base material and the light shielding portion, A color filter having a colored layer formed on the photocatalyst-containing layer in the opening of the light-shielding part, and an ITO layer formed to cover the colored layer,
The maximum film thickness at which the height from the substrate surface to the ITO layer surface in each pixel is maximum, and the minimum film from which the height from the substrate surface to the ITO layer surface is minimum The thickness α of the 10 pixels when the thickness of the thick portion is measured and (the thickness of the minimum thickness portion / the thickness of the maximum thickness portion) in each pixel is calculated is 0.87 <α <0.92 and (film thickness of the maximum film thickness portion−film thickness of the minimum film thickness portion) / (distance from the maximum film thickness portion to the minimum film thickness portion) in each pixel. An average β of 10 pixels at the time of calculation is 0.005 <β <0.01 . A base material, a light shielding portion containing a light shielding material and a resin formed on the base material, a photocatalyst and an organopolysiloxane-containing layer containing a photocatalyst formed to cover the base material and the light shielding portion, A color filter having a colored layer formed on the photocatalyst-containing layer in the opening of the light-shielding part, and an ITO layer formed to cover the colored layer,
An average of 10 pixels of the maximum kurtosis on the surface of the ITO layer in each pixel is 2.0 or less.

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