JP2008020517A - Color filter - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a high-quality color filter which does not cause color irregularity, voids or the like with respect to the color filter formed of a colored layer by an inkjet method. <P>SOLUTION: The color filter comprises: a substrate; a light shielding part composed of a plurality of linear light shielding parts which are formed at regular intervals leaving a prescribed spacing on the substrate and connection light shielding parts which connect two adjacent linear light shielding parts with each other leaving a prescribed spacing; and colored layers which are formed between the respective linear light shielding parts and are formed so as to cover the connection light shielding parts, wherein the connection light shielding parts are formed so that the angle included by the side surfaces of the connection light shielding parts and a surface of the substrate is smaller than the angle included by the side surfaces of the linear light shielding parts and the surface of the substrate. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a high-quality color filter that can be used in a liquid crystal display device and has no white spots.

  In recent years, with the development of personal computers, especially portable personal computers, the demand for liquid crystal displays, particularly color liquid crystal displays, has been increasing. However, since this color liquid crystal display is expensive, there is an increasing demand for cost reduction, and in particular, there is a high demand for cost reduction for a color filter having a high specific gravity.

  In such a color filter, it is usually provided with coloring patterns of three primary colors of red (R), green (G), and blue (B), and electrodes corresponding to the respective pixels of R, G, and B are turned on, By turning it off, the liquid crystal operates as a shutter, and light passes through each of the R, G, and B pixels, and color display is performed.

  Examples of conventional color filter manufacturing methods include a dyeing method and a pigment dispersion method. However, in any method, in order to color three colors of R, G, and B, it is necessary to repeat the same process three times, and there is a problem that the cost is high, and the yield decreases because the process is repeated. There's a problem.

  Therefore, a photocatalyst-containing layer is formed on a substrate using a photocatalyst-containing layer-forming coating solution containing a photocatalyst and a material whose properties change due to the action of the photocatalyst accompanying energy irradiation, and exposed in a pattern. Thus, the present inventors have studied a method for forming a pattern with changed characteristics (Patent Document 1). According to this method, it is possible to easily form a colored layer using the difference in characteristics of the photocatalyst-containing layer.

  In addition, by applying such a method, a patterning substrate having a transparent base material, a light shielding portion formed on the base material, and a photocatalyst-containing layer formed so as to cover the light shielding portion, A method of changing the characteristics of the photocatalyst-containing layer only in the region where the light-shielding part is not formed by irradiating energy from the substrate side has also been studied by the present inventors (Patent Document 2). According to this method, there is an advantage that a pattern with changed characteristics can be formed without using a photomask or the like. For example, a striped colored layer used in a striped color filter or an IPS color A method for use in forming a zigzag colored layer used in a filter has also been studied.

  Here, in a color filter having a striped colored layer or a colored layer used in an IPS type color filter, for example, as shown in FIG. In general, the coating liquid for forming the colored layer is applied not only to the pattern forming the colored layer, that is, on the light shielding part intersecting with the pattern, but also to the opening partitioned by the light shielding part forming the colored layer. Is also applied to form a colored layer. However, when the above-described method of exposing the photocatalyst-containing layer from the substrate side is used, the characteristics of the photocatalyst-containing layer only in the openings defined by the light-shielding portions change, and on the light-shielding portions that intersect each pattern The characteristics of the photocatalyst containing layer do not change. Therefore, when the colored layer forming coating solution is applied, the colored layer forming coating solution does not adhere to the photocatalyst containing layer on the light-shielding portion intersecting with the colored layer. For example, as shown in FIG. In some cases, the colored layer forming coating solution 10 does not wet and spread cleanly at the end of the opening defined by the light-shielding part 4, and unevenness or white spots occur in the colored layer.

  As another example of a method for producing a color filter, a bank for holding a colored layer forming coating solution for forming a colored layer on a substrate is formed, and plasma treatment is performed using a fluorine compound as an introduced gas in the bank. However, a method of forming a colored layer by an ink jet method with a bank having liquid repellency has also been proposed (Patent Document 3). However, in this case as well, the colored layer forming coating solution does not adhere to the liquid-repellent bank that intersects with the striped colored layer or the like, and the end of the opening section defined by the light shielding portion is the same as described above. In some cases, the coating liquid for forming the colored layer did not spread cleanly at the part, and unevenness or white spots were generated in the colored layer.

Japanese Patent Laid-Open No. 2001-074928 JP 2004-212900 A JP 2000-187111 A

  Therefore, it is desired to provide a high-quality color filter free from color unevenness and white spots in a color filter having a colored layer formed by an inkjet method.

  In the present invention, a predetermined interval is provided between a base material, a linear light-shielding portion formed on the base material at a predetermined interval and at equal intervals, and two adjacent linear light-shielding portions. A color filter formed between the linear light-shielding portions and a color layer formed so as to cover the connection light-shielding portions, the connected light-shielding portions. Is characterized in that the angle formed between the side surface of the connected light shielding portion and the surface of the base material is smaller than the angle formed between the side surface of the linear light shielding portion and the surface of the base material. Provide a filter.

  According to the present invention, since the shape of the connected light shielding portion is the above shape, the colored layer forming coating liquid applied when forming the colored layer can easily run on the connected light shielding portion. Compared with the overlap between the light shielding part and the colored layer forming coating liquid, the overlap width between the connected light shielding part and the colored layer forming coating liquid can be increased. Therefore, the areas where the colored layer forming coating liquid is applied can be made close to each other between the openings adjacent to each other with the connected light shielding part interposed therebetween, and the colored layer forming coating liquid is also formed on the connected light shielding part. It can be easy to spread wet. Therefore, it is possible to reduce the occurrence of white spots, color unevenness, and the like in the vicinity of the connected light shielding portion, and a high-quality color filter can be obtained.

  In the above invention, the sum of the widths of the thin film regions from each end of the connection light shielding portion to a portion where the thickness of the connection light shielding portion is 50% of the maximum film thickness of the connection light shielding portion is the connection light shielding portion. It is preferable to be within a range of 1% to 50% of the line width. By making the shape of the connection light shielding part as described above, the colored layer forming coating solution can easily run on the connection light shielding part, and the overlapping of the color layer forming coating liquid and the connection light shielding part is large. This is because the regions to which the colored layer forming coating solution is applied can be made closer to each other.

  Moreover, in the said invention, the photocatalyst containing layer containing a photocatalyst and organopolysiloxane may be formed so that the said base material and the said light-shielding part may be covered. Since the photocatalyst-containing layer contains a photocatalyst and an organopolysiloxane, the contact angle with the liquid can be reduced by the action of the photocatalyst accompanying energy irradiation. Therefore, by using the photocatalyst-containing layer and irradiating energy from the base material side, the opening can be easily made a lyophilic region and the light shielding part can be made a liquid repellent region. A colored layer can be easily formed using the difference in properties.

  Moreover, in the said invention, the said light-shielding part is good also as what contains the fluorine. This is because the colored layer can be easily formed by utilizing the difference in wettability between the opening and the light shielding part by making the light shielding part liquid-repellent.

  According to the present invention, a colored layer can be formed without white spots or color unevenness by an ink jet method, and an effect is obtained that a high-quality color filter can be obtained.

  The present invention relates to a high-quality color filter having a high-definition pattern and no white spots. Hereinafter, the color filter of the present invention will be described in detail.

  The color filter of the present invention includes a base material, a plurality of linear light-shielding portions formed on the base material at equal intervals, and a distance between two adjacent linear light-shielding portions. A color filter having a light-shielding portion composed of a connected light-shielding portion that is connected at intervals, and a colored layer that is formed between each of the linear light-shielding portions and covers the connected light-shielding portion, The connection light-shielding part is formed such that an angle formed between a side surface of the connection light-shielding part and the substrate surface is smaller than an angle formed between a side surface of the linear light-shielding part and the substrate surface. It is what.

  For example, as shown in FIG. 1, the color filter of the present invention includes a base material (not shown), a linear light-shielding portion 1 formed on the base material with a plurality of equal intervals α, and the base material. And is formed between the two adjacent light shielding parts 1 and covers the connected light shielding part 2. And a colored layer 3 formed by an ink jet method. Normally, the frame light shielding portion 6 is formed in a region outside the region where the colored layer 3 is formed. Further, in the present invention, the connection light shielding portion is, for example, as shown in FIG. 2B from the angle a formed by the linear light shielding portion 1 and the surface of the base material 7 as shown in FIG. It is formed so that the angle b formed by the connected light shielding portion 2 and the surface of the base material 7 becomes smaller.

  In a color filter having a general striped colored layer, the linear light-shielding portion and the connection light-shielding portion are formed to have substantially the same shape. However, in this case, when the colored layer forming coating solution is applied in a stripe shape by the inkjet method, for example, as shown in FIG. 3A, the overlapping width of the light shielding portion 4 and the colored layer forming coating solution 10 b is small, and the distance between the colored layer forming coating liquids 10 applied to the adjacent openings 5 with the light-shielding part 4 interposed therebetween is long. Therefore, for example, as shown in FIG. 7, due to the presence of the light shielding part 4, the colored layer forming coating liquid 10 is difficult to wet and spread in the opening 5, and a colored layer is formed in the vicinity of the apex a at the corner of the opening 5. There is a problem that the coating liquid is difficult to be applied and color unevenness or white spots occur in the formed colored layer.

However, in the present invention, since the connecting light shielding part is formed in the shape as described above, for example, as shown in FIG. 3B, a colored layer forming coating solution is formed on the adjacent light shielding part 2. 10 is easy to get on, and the overlapping portion c between the adjacent light shielding portion 2 and the colored layer forming coating solution 10 can be widened. Therefore, the colored layer forming coating liquid can be easily wetted and spread on the connection light-shielding part, and the color unevenness and white spots can be reduced even in the vicinity of the corner of the opening. .
Hereinafter, each corner structure of the color filter of the present invention will be described in detail.

1. First, the light shielding part used in the present invention will be described. The light-shielding part used in the present invention has a predetermined interval between a linear light-shielding part in which a plurality of light-shielding parts are formed at regular intervals on the substrate and two adjacent linear light-shielding parts. The connection light-shielding part has an angle formed between the side surface of the connection light-shielding part and the surface of the base material, and the side surface of the linear light-shielding part and the surface of the base material are connected to each other. It is formed to be smaller than the angle formed. Hereinafter, description will be made by dividing into a linear light shielding portion and a connected light shielding portion.

(Linear shading part)
First, the linear light shielding part used in the present invention will be described. The linear light-shielding portion used in the present invention is not particularly limited as long as a plurality of linear light-shielding portions are formed at regular intervals with a predetermined interval on the substrate. For example, as shown in FIG. In addition, a plurality of linear light shielding portions 1 may be formed in a straight line at regular intervals with a predetermined gap α. For example, as shown in FIG. A plurality of zigzag shapes formed at regular intervals with a gap α may be used. In this case, the linear light shielding portion may have irregularities in the width direction. Further, the phrase “a plurality of lines are formed at equal intervals” means that the center lines of the respective linear light shielding portions are formed at equal intervals.

  The line width of such a linear light-shielding portion is appropriately selected depending on the type of color filter and the like, but is usually about 5 μm to 100 μm, and particularly about 10 μm to 50 μm. In addition, the maximum film thickness of the linear light-shielding portion is usually in the range of 0.1 μm to 10 μm, particularly about 0.2 μm to 3 μm.

  In addition, the cross-sectional shape of the linear light-shielding portion can be the same as the cross-sectional shape of the light-shielding portion used in a general color filter, and can be, for example, a rectangular shape or a trapezoidal shape. As a method for forming such a linear light shielding portion, it is assumed that the linear light shielding portion is formed by the same formation method using the same material as the light shielding portion used for a general stripe type color filter or IPS type color filter. it can.

  Specifically, even if the above-described linear light-shielding portion is formed by forming a metal thin film of chromium or the like having a thickness of about 1000 to 2000 mm by a sputtering method, a vacuum evaporation method, or the like, and patterning this thin film. Good. As this patterning method, a normal patterning method such as sputtering can be used.

  Alternatively, a method may be used in which a layer containing light-shielding particles such as carbon fine particles, metal oxides, inorganic pigments, and organic pigments in a resin binder is formed in a pattern. As the resin binder to be used, polyimide resin, acrylic resin, epoxy resin, polyacrylamide, polyvinyl alcohol, gelatin, casein, cellulose, or a mixture of one or more resins, photosensitive resin, or O / A W emulsion type resin composition, for example, an emulsion of a reactive silicone can be used. The thickness of such a resin light-shielding portion can be set within a range of 0.5 to 10 μm. As a method for patterning such a resin light shielding portion, a generally used method such as a photolithography method or a printing method can be used.

  Furthermore, in the present invention, the linear light shielding portion as described above may be formed by a thermal transfer method. The thermal transfer method for forming a linear light-shielding portion is usually a method of forming a linear light-shielding portion by placing a thermal transfer sheet having a photothermal conversion layer and a light-shielding portion transfer layer on one side of a transparent film base material. By irradiating the area with energy, the light shielding portion transfer layer is transferred onto the substrate to form a linear light shielding portion. The film thickness of the linear light-shielding portion formed by such a thermal transfer method can usually be about 0.5 μm to 10.0 μm, particularly about 0.8 μm to 5.0 μm.

  The linear light-shielding part transferred by the thermal transfer method is usually composed of a light-shielding material and a binder, and inorganic materials such as carbon black and titanium black can be used as the light-shielding material. The particle diameter of such a light-shielding material is preferably 0.01 μm to 1.0 μm, and more preferably 0.03 μm to 0.3 μm.

  Further, the binder is preferably a resin composition having thermoplasticity and thermosetting properties, has a thermosetting functional group, and has a softening point in the range of 50 ° C to 150 ° C, particularly 60 ° C. It is preferable that the resin material and the curing agent are in a range of ˜120 ° C. Specific examples of such a material include a combination of an epoxy compound or epoxy resin having two or more epoxy groups in one molecule and a latent curing agent thereof. As a latent curing agent for epoxy resins, it does not have reactivity with epoxy groups up to a certain temperature, but when it reaches the activation temperature by heating, it changes to a molecular structure with reactivity with epoxy groups. A curing agent can be used. Specific examples include neutral salts and complexes of acidic or basic compounds having reactivity with epoxy resins, block compounds, high melting point bodies, and microcapsules. In addition to the above materials, the light-shielding part may contain a release agent, an adhesion assistant, an antioxidant, a dispersant, and the like.

(Linked shading part)
Next, the connection light shielding part used for this invention is demonstrated. The connection light-shielding part used in the present invention connects two adjacent linear light-shielding parts at a predetermined interval, and a side surface of the connection light-shielding part and a substrate surface described later are formed. The corner is formed to be smaller than the angle formed between the side surface of the linear light-shielding portion and the surface of the base material. For example, as shown in FIG. 5, the angle formed by the connection light shielding portion and the substrate surface is the maximum film thickness of the connection light shielding portion 2 from the end e of the connection light shielding portion in the cross section of the connection light shielding portion 2. An angle b formed by a straight line connecting a portion d where the height of the outermost surface is 50% with respect to f and the surface of the substrate 7 is defined. In addition, when there are a plurality of portions where the height of the outermost surface is a predetermined height with respect to the maximum film thickness of the connection light shielding portion, the line closest to the boundary portion and the line connecting the boundary portion, and The angle formed by the surface of the substrate is assumed.

  Similarly, the angle formed between the side surface of the linear light shielding portion and the surface of the base material is the maximum film of the linear light shielding portion from the boundary portion between the linear light shielding portion and the opening in the cross section of the linear light shielding portion. The angle formed by the straight line connecting the portion where the height of the outermost surface is 50% of the thickness and the surface of the substrate is defined. In addition, when there are a plurality of portions where the height of the outermost surface is a predetermined height with respect to the maximum film thickness of the linear light shielding portion, a line connecting the portion closest to the boundary portion and the boundary portion And the angle formed by the substrate surface. Measurement of the angle between the connection light-shielding part and the linear light-shielding part with the base material, for example, a cross-sectional shape of the central part of the connection light-shielding part or the linear light-shielding part taken with a scanning electron microscope (SEM), etc. It can be calculated from

  In the present invention, the angle formed between the side surface of the connected light shielding portion and the base material is preferably 1 ° or more smaller than the angle formed between the side surface of the linear light shielding portion and the base material, and in particular, 5 ° to 50 °. It is preferable that it is small within the range.

  In addition, the angle formed between the side surface of the connection light-shielding portion and the base material is preferably in the range of 2 ° to 89 °, particularly in the range of 4 ° to 70 °. This is because by setting such an angle, the overlapping width between the connected light shielding portion and the colored layer forming coating liquid for forming the colored layer can be increased.

  Further, at this time, the connection light-shielding part has a total width of the thin film region from each end of the connection light-shielding part to a part where the thickness of the connection light-shielding part is 50% of the maximum film thickness of the connection light-shielding part. In addition, it is preferable to be within a range of 1% to 50% of the line width of the connected light shielding portion, particularly within a range of 5% to 50%, and particularly within a range of 8% to 50%. For example, as shown in FIG. 5, the thin film region refers to the height of the outermost surface from the end e of the connection light shielding portion to the maximum film thickness f of the connection light shielding portion 2 in the cross section of the connection light shielding portion 2. A region (g1 and g2) up to a portion d where the thickness is 50%. Here, when observing the cross section of the connection light shielding portion, when there are a plurality of portions where the height of the outermost surface is the above height with respect to the maximum film thickness, the end portion is closest to the end portion, And it is set as the area | region between the part from which the height of an outermost surface becomes said height. The sum of the widths of the thin film regions means the sum of the widths (g1 and g2) of the connected light shielding portions on the respective end portions e side. In the present invention, the colored layer forming coating liquid and the connected light-shielding part can be easily laid on the connected light-shielding part by making the shape of the connected light-shielding part as described above. This is because the overlap between the regions can be made larger, and the regions to which the colored layer forming coating solution is applied can be made closer to each other. The width of the thin film region can be calculated from, for example, a cross-sectional shape of the central portion of the connection light shielding portion taken with a scanning electron microscope (SEM) or the like.

  Here, the width of the connecting light-shielding portion is appropriately selected depending on the type of the color filter and the like, and is usually about 5 μm to 100 μm, particularly about 10 μm to 50 μm. Further, the maximum film thickness of the connecting light shielding portion is usually in the range of 0.1 μm to 10 μm, and in particular, about 0.2 μm to 3 μm.

  In addition, the cross-sectional shape of the connecting light-shielding portion is not particularly limited as long as it is formed in the shape as described above, and may be trapezoidal, semicircular, etc. Although it may be present, a triangular shape is particularly preferable. As a result, the colored layer forming coating solution is easily applied onto the connected light shielding portion, and the colored layer forming coating solution is wetted and cheaper on the connected light shielding portion. It is because it can be set as a color filter.

  The method for forming the connected light shielding portion having the above shape is not particularly limited. For example, using a material used for the light shielding portion of a general striped color filter or IPS color filter, a photolithography method or the like. Can be formed. Specifically, a method of adjusting the exposure amount using a mask used for exposure by a photolithography method as a gradation mask or the like to obtain the above-described shape can be used. In addition, the composition used for forming the light-shielding part is formed by using a low-molecular material as the resin used for forming the light-shielding part, or adding a large amount of monomer to the resin. And the like. In this case, after forming a rectangular connection light-shielding part in the same manner as a general light-shielding part in the region where the connection light-shielding part is formed, the composition for forming a connection light-shielding part is obtained by applying heat to the light-shielding part. It can be softened to have the shape described above.

  Further, for example, a method using a large amount of a surface curable photoinitiator as the photoinitiator contained in the resin composition may be mentioned. In this case, for example, when etching is performed in a photolithography method or the like, the surface of the region where the connection light shielding portion is formed is cured, but photocuring is not completely effective inside the connection light shielding portion. Etching is performed in a reverse taper shape with a high angle. Therefore, after the etching is finished, by applying heat to the inversely tapered connected light shielding portion, the tapered portion is lowered, and the connected light shielding portion having the above-described shape can be formed.

  Furthermore, after the composition for forming the connected light-shielding portion is poured into a mold having a shape for forming the connected light-shielding portion and cured, a method of pasting the connected light-shielding portion on the transparent substrate may be used. it can.

(Other)
Here, in the present invention, it is preferable that the light-shielding portion is a liquid-repellent region, and the opening defined by the light-shielding portion is a lyophilic region. Thereby, a colored layer to be described later can be formed by using an lyophilic and lyophobic pattern, for example, by an inkjet method, and the adjacent colored layers of different colors are not mixed, etc. A high-quality color filter can be obtained. In general, even in the vicinity of the connected light-shielding portion where the colored layer-forming coating solution is difficult to wet and spread, according to the present invention, the connected light-shielding portion has the above shape. Can be easily spread out.

  Here, the liquid repellent region is a region having a large contact angle with the liquid, and refers to a region having poor wettability with respect to a colored layer forming coating liquid for forming a colored layer to be described later.

  In the present invention, when the contact angle with the liquid in the adjacent region is 1 ° or more lower than the contact angle with the liquid in the adjacent region, the contact with the liquid is determined from the contact angle with the liquid in the lyophilic region or the adjacent region. When the contact angle is higher by 1 ° or more, a liquid repellent region is assumed.

  Specifically, the contact angle with the liquid on the light-shielding part, that is, the liquid repellent region is 10 ° or more, particularly the contact angle with the liquid with a surface tension of 30 mN / m. The contact angle with a liquid having a surface tension of 20 mN / m is preferably 10 ° or more. This is because when the contact angle with the above liquid is small in the liquid repellent region, the liquid repellent property is not sufficient, and a colored layer forming coating solution for forming a colored layer is applied by an ink jet method and cured. This is because the colored layer forming coating liquid may adhere to the liquid repellent region.

  In the opening, that is, the lyophilic region, the contact angle with a liquid of 40 mN / m is less than 9 °, preferably the contact angle with a liquid with a surface tension of 50 mN / m is 10 ° or less, particularly a surface tension of 60 mN. The layer is preferably such that the contact angle with a / m liquid is 10 ° or less. When the contact angle with the liquid in the opening, that is, the lyophilic region is high, the colored layer forming coating solution may be repelled in the lyophilic region. This is because it may be difficult to form a colored layer, such as when the coating solution for forming a colored layer is not sufficiently applied and spreads.

  In addition, the contact angle with the liquid here refers to a contact angle with a liquid having various surface tensions measured using a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science Co., Ltd.). 30 seconds after dropping), and the result was obtained or the result was graphed. In this measurement, as a liquid having various surface tensions, a wetting index standard solution manufactured by Pure Chemical Co., Ltd. was used.

  There is no particular limitation on the method of making the light-shielding part a liquid-repellent region and making the opening part a lyophilic region. For example, the light-shielding part itself may have liquid repellency, and a method of making the substrate described later have lyophilicity or the like, or a liquid-repellent layer may be formed on the light-shielding part. It is good also as the method etc. which make it the area | region and form the layer which has lyophilicity on the said base material, and make it a lyophilic area | region.

  In the present invention, in particular, a method of forming a photocatalyst-containing layer containing a photocatalyst and an organopolysiloxane so as to cover a base material and the light-shielding portion described later, or a method in which the light-shielding portion contains fluorine is used. It is preferable.

  When the photocatalyst-containing layer is used, the action layer of the photocatalyst associated with energy irradiation can be used as a change layer so that the contact angle with the liquid is reduced. A region that is not irradiated with energy can be a liquid repellent region. Therefore, by forming the photocatalyst-containing layer so as to cover the base material and the light shielding part and irradiating energy from the base material side, only the opening part where the light shielding part is not easily formed is made a lyophilic region. This is because the liquid-repellent region can be formed on the light-shielding portion where energy is not irradiated. In addition, since the said photocatalyst containing layer used for such a method is demonstrated in detail later, detailed description here is abbreviate | omitted.

  On the other hand, even when the light shielding part contains fluorine, the light shielding part can be used as a liquid repellent region. Here, the presence of fluorine in the light-shielding part is measured by measuring the proportion of fluorine element in all elements detected from the surface of the light-shielding part in the analysis by an X-ray photoelectron spectrometer (XPS: ESCALAB 220i-XL). Can be confirmed. In this case, the fluorine ratio is preferably 10% or more.

  As a method for introducing fluorine into the light shielding portion in this manner, it is preferable to use a method in which a resin light shielding portion is used as the light shielding portion and plasma is irradiated using a fluorine compound as an introduction gas. This is because the liquid repellent region and the lyophilic region can be easily formed. According to the plasma irradiation, the fluorine compound can be introduced only into the organic substance. Therefore, by using an inorganic material as a base material to be described later and irradiating the plasma on the entire surface, it is possible to easily introduce the fluorine compound only into the light shielding part, and the liquid repellent property on the light shielding part into which the fluorine compound is introduced. The region and the region where the substrate is exposed can be made a lyophilic region.

Examples of the introduced gas fluorine compound used in such a method include carbon fluoride (CF ₄ ), fluorine nitride (NF ₃ ), sulfur fluoride (SF ₆ ), and the like. The plasma irradiation method is not particularly limited as long as the plasma irradiation is performed using a fluorine compound as an introduction gas, and the light shielding portion can be made liquid repellent. Plasma irradiation may be performed, and plasma irradiation may be performed under atmospheric pressure. In the present invention, it is particularly preferable that plasma irradiation is performed under atmospheric pressure. This is because an apparatus for decompression or the like is not necessary, which can be preferable in terms of cost, manufacturing efficiency, and the like. The irradiation conditions of such atmospheric pressure plasma can be as follows. For example, the power output can be the same as that used in a general atmospheric pressure plasma irradiation apparatus. In this case, the distance between the irradiated plasma electrode and the light shielding portion is preferably about 0.2 mm to 20 mm, and more preferably about 1 mm to 5 mm. Furthermore, the flow rate of the fluorine compound used as the introduction gas is preferably about 1 L / min to 100 L / min, and more preferably about 5 L / min to 50 L / min, and the substrate transport speed at this time is 0.1 m / min. About 10 to 10 m / min, particularly about 0.5 to 5 m / min is preferable.

2. Colored layer Next, the colored layer used for the color filter of this invention is demonstrated. The colored layer used in the color filter of the present invention is formed between the two adjacent linear light-shielding portions, and can be formed by an inkjet method so as to cover the connection light-shielding portion. It is not particularly limited.

  Such a colored layer is usually formed of three colors of red (R), green (G), and blue (B), and the colored area can be arbitrarily set.

  Here, the colored layer forming coating solution used for forming such a colored layer is the same as that used for a colored layer of a general color filter in which the colored layer is formed by an inkjet method. Detailed explanation here is omitted.

3. Next, the substrate used in the present invention will be described. The base material used in the present invention is not particularly limited as long as it can form the light shielding part and the colored layer, and those conventionally used for color filters can be used. Specifically, transparent flexible materials such as quartz glass, Pyrex (registered trademark) glass, and synthetic quartz plates, or flexible flexible materials such as transparent resin films and optical resin plates, etc. Can be mentioned. Among them, Corning 7059 glass is a material having a small coefficient of thermal expansion, excellent dimensional stability and workability in high-temperature heat treatment, and is an alkali-free glass containing no alkali component in the active matrix. Suitable for color filters for color liquid crystal display devices. In the present invention, a transparent substrate is usually used, but a reflective substrate or a white colored substrate can also be used. Further, the substrate may be subjected to surface treatment for preventing alkali elution, imparting a gas barrier property or other purposes as required. Further, for example, in order to make the surface lyophilic, the above-described treatment of irradiating with plasma or the like using oxygen gas as an introduction gas may be performed.

  In addition, as mentioned above, when performing the plasma irradiation which used the said fluorine compound for the said light shielding part as the introduction gas, it is preferable to use what consists of an inorganic material as said base material. This is because when an organic material is used, the fluorine compound is introduced not only into the light shielding part but also into the base material, making it difficult to make the opening part a lyophilic region.

4). Next, the color filter of the present invention will be described. The color filter of the present invention is not particularly limited as long as the above-described base material, the light shielding part having the above shape, and the colored layer are formed. For example, the protective layer and the ITO layer are not limited. Etc. may be formed. The type of the color filter of the present invention is not particularly limited, and may be a color filter having a striped colored layer, for example, a color filter used in an IPS liquid crystal display device, or the like. May be.

  Here, in the present invention, as described above, a photocatalyst-containing layer containing a photocatalyst and an organopolysiloxane may be formed so as to cover the base material and the light shielding portion. The photocatalyst-containing layer can be a change layer so that the contact angle with the liquid is lowered by the action of the photocatalyst accompanying energy irradiation, so that the region irradiated with energy is a lyophilic region and the energy is not irradiated The region can be a liquid repellent region. Therefore, by forming the photocatalyst-containing layer and irradiating energy from the substrate side, it is possible to make only the opening where the light-shielding part is not easily formed a lyophilic region, and the light-shielding part is not irradiated with energy. This is because the liquid repellent region can be formed on the top.

  Further, in this case, in the present invention, since the above-described connection light shielding portion is formed in the shape as described above, the thin portion of the connection light shielding portion is a case where energy is irradiated from the substrate side. However, it may be possible to change the wettability of the photocatalyst-containing layer. As a result, it is possible to make the colored layer forming coating solution for forming a colored layer on the connection light shielding portion easier to get on, and to produce a high quality color filter with less color unevenness in the vicinity of the connection light shielding portion. It can be done. Hereinafter, such a photocatalyst-containing layer will be described.

(Photocatalyst containing layer)
The photocatalyst-containing layer used in the present invention is a layer containing at least a photocatalyst and an organopolysiloxane, and is particularly limited as long as it is a photocatalyst-containing layer whose contact angle with a liquid is lowered by the action of the photocatalyst accompanying energy irradiation. It is not something.
Hereinafter, the photocatalyst, organopolysiloxane, and other components constituting such a photocatalyst-containing layer will be described.

a. Photocatalyst First, the photocatalyst used in the present invention will be described. Examples of the photocatalyst used in the present invention include titanium dioxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), which are known as photo semiconductors. bismuth oxide _{(Bi 2 O} 3), and the like, and iron oxide _(Fe 2 _{O 3).} In addition to semiconductors, metal complexes and silver can also be used. In this invention, it can select from these and can use 1 type or in mixture of 2 or more types.

  The mechanism of action of such a photocatalyst is not necessarily clear, but radicals generated by light irradiation are reacted directly with nearby compounds, or by active oxygen species generated in the presence of oxygen and water, It is thought to change the chemical structure of organic matter. In the present invention, it is considered that these radicals and active oxygen species act on the organopolysiloxane in the photocatalyst-containing layer to reduce the contact angle with the liquid on the surface.

  In the present invention, titanium dioxide is particularly preferably used because it has a high band gap energy, is chemically stable, has no toxicity, and is easily available. Titanium dioxide includes an anatase type and a rutile type, and both can be used in the present invention, but anatase type titanium dioxide is preferred. Anatase type titanium dioxide has an excitation wavelength of 380 nm or less.

  Examples of such anatase type titanium dioxide include hydrochloric acid peptizer type anatase type titania sol (STS-02 manufactured by Ishihara Sangyo Co., Ltd. (average particle size 7 nm), ST-K01 manufactured by Ishihara Sangyo Co., Ltd.), nitric acid solution Examples include glue-type anatase-type titania sol (TA-15 (average particle size: 12 nm) manufactured by Nissan Chemical Co., Ltd.).

  The smaller the particle size of the photocatalyst, the more effective the photocatalytic reaction occurs. The average particle size is preferably 50 nm or less, and it is particularly preferable to use a photocatalyst of 20 nm or less.

  The content of the photocatalyst in the photocatalyst containing layer used in the present invention can be set in the range of 5 to 60% by weight, preferably 20 to 40% by weight. The thickness of the photocatalyst containing layer is preferably in the range of 0.05 to 10 μm.

b. Organopolysiloxane Next, the organopolysiloxane used in the present invention will be described. The organopolysiloxane used in the present invention is not particularly limited as long as it can reduce the contact angle with the liquid on the surface of the photocatalyst containing layer by the action of the photocatalyst accompanying energy irradiation, and is not particularly limited. It is preferable that the main skeleton has a high binding energy such that it is not decomposed by photoexcitation of the photocatalyst, and has an organic substituent that is decomposed by the action of the photocatalyst. Specifically, (1) an organopolysiloxane that exhibits high strength by hydrolyzing and polycondensing chloro or alkoxysilane by sol-gel reaction or the like, and (2) a reactive silicone having excellent water repellency and oil repellency. Cross-linked organopolysiloxanes can be mentioned.

In the case of (1) above, the general formula:
Y _n SiX _(4-n)
(Where Y is an alkyl group, fluoroalkyl group, vinyl group, amino group, phenyl group, chloroalkyl group, isocyanate group, or epoxy group, or an organic group containing these, and X is an alkoxyl group, acetyl group, or Represents halogen, n is an integer from 0 to 3)
It is preferable that it is the organopolysiloxane which is a 1 type, or 2 or more types of hydrolysis condensate or cohydrolysis condensate of the silicon compound shown by these. Here, the alkoxy group represented by X is preferably a methoxy group, an ethoxy group, a propoxy group, or a butoxy group. Moreover, it is preferable that the carbon number of the whole organic group shown by Y exists in the range of 1-20, especially in the range of 5-10.

  Thus, when the photocatalyst-containing layer is formed, the surface can be made liquid-repellent by Y constituting the organopolysiloxane, and the Y is decomposed by the action of the photocatalyst accompanying energy irradiation. This is because it can be made lyophilic.

  In particular, when an organopolysiloxane in which Y constituting the organopolysiloxane is a fluoroalkyl group is used, the photocatalyst-containing layer before energy irradiation can be made particularly high in liquid repellency. When high liquid repellency is required, it is preferable to use an organopolysiloxane having these fluoroalkyl groups. Examples of such an organopolysiloxane include one or two or more hydrolyzed condensates and cohydrolyzed condensates which are generally known as fluorine-based silane coupling agents. For example, those described in JP-A-2001-074928 What is being used can be used.

  Examples of the reactive silicone (2) include compounds having a skeleton represented by the following general formula.

However, n is an integer of 2 or more, R ^1, R ² are each a substituted or unsubstituted alkyl having 1 to 10 carbon atoms, alkenyl, aryl or cyanoalkyl group, the total molar ratio of 40% or less Vinyl, phenyl and phenyl halide. Further, those in which R ¹ and R ² are methyl groups are preferable because the surface energy becomes the smallest, and the methyl groups are preferably 60% or more by molar ratio. In addition, the chain end or side chain has at least one reactive group such as a hydroxyl group in the molecular chain.

  The organopolysiloxane is preferably contained in the photocatalyst-containing layer in an amount of 5 to 90% by weight, especially about 30 to 60% by weight.

c. Other Substances In the photocatalyst-containing layer used in the present invention, a stable organosilicon compound that does not undergo a crosslinking reaction, such as dimethylpolysiloxane, may be mixed with a binder together with the organopolysiloxane. Furthermore, examples of the binder include polysiloxanes having a high binding energy that does not cause the main skeleton to be decomposed by photoexcitation of the photocatalyst, or that do not have an organic substituent, or have an organic substituent. You may contain what hydrolyzed and polycondensed methoxysilane, tetraethoxysilane, etc.

  Furthermore, in order to assist the function of changing the wettability of the organopolysiloxane, a decomposition substance that is decomposed by energy irradiation may be included. Examples of such decomposition substances include surfactants that have the function of decomposing by the action of a photocatalyst and reducing the contact angle with the liquid on the surface of the photocatalyst-containing layer by being decomposed. Specifically, hydrocarbons such as NIKKOL BL, BC, BO, BB series manufactured by Nikko Chemicals Co., Ltd., ZONYL FSN, FSO manufactured by DuPont, Surflon S-141, 145 manufactured by Asahi Glass Co., Ltd., Dainippon Megafac F-141, 144 manufactured by Ink Chemical Industry Co., Ltd., Footgent F-200, F251 manufactured by Neos Co., Ltd., Unidyne DS-401, 402 manufactured by Daikin Industries, Ltd., Fluorard FC-170 manufactured by 3M Co., Ltd. Fluorine-based or silicone-based nonionic surfactants such as 176, and cationic surfactants, anionic surfactants, and amphoteric surfactants can also be used.

  Besides surfactants, polyvinyl alcohol, unsaturated polyester, acrylic resin, polyethylene, diallyl phthalate, ethylene propylene diene monomer, epoxy resin, phenol resin, polyurethane, melamine resin, polycarbonate, polyvinyl chloride, polyamide, polyimide Styrene butadiene rubber, chloroprene rubber, polypropylene, polybutylene, polystyrene, polyvinyl acetate, nylon, polyester, polybutadiene, polybenzimidazole, polyacrylonitrile, epichlorohydrin, polysulfide, polyisoprene, oligomers, polymers, and the like.

d. In addition, in the present invention, when the photocatalyst containing layer contains fluorine, and the fluorine content on the surface of the photocatalyst containing layer is irradiated with energy to the photocatalyst containing layer, the photocatalyst containing layer is irradiated with energy by the action of the photocatalyst. It is preferable that the photocatalyst-containing layer is formed so as to be lower than before. Thereby, by irradiating energy, the pattern which consists of a part with little content of fluorine can be easily formed so that it may mention later. Here, fluorine has an extremely low surface energy. Therefore, the surface of a substance containing a large amount of fluorine has a smaller critical surface tension. Therefore, the critical surface tension of the portion having a small fluorine content is larger than the critical surface tension of the surface of the portion having a large fluorine content. This means that the portion with a low fluorine content is a lyophilic region compared to the portion with a high fluorine content. Therefore, forming a pattern composed of a portion having a lower fluorine content than the surrounding surface forms a pattern of a lyophilic region in the liquid repellent region.

  Therefore, when such a photocatalyst-containing layer is used, the pattern of the lyophilic region can be easily formed in the lyophobic region by irradiating energy. This is because a high-definition colored layer can be formed when the coating liquid is applied.

  As described above, the fluorine content contained in the photocatalyst containing layer containing fluorine is not irradiated with energy in the lyophilic region having a low fluorine content formed by energy irradiation. When the fluorine content of the part is 100, it is 10 or less, preferably 5 or less, particularly preferably 1 or less.

  By setting it within such a range, it is possible to make a large difference in lyophilicity between the energy-irradiated portion and the unirradiated portion. Therefore, for example, by attaching a coating liquid for forming a colored layer to such a photocatalyst-containing layer, it is possible to accurately form a colored layer in an opening that is a lyophilic region having a reduced fluorine content. This is because an accurate color filter can be obtained. This rate of decrease is based on weight.

  For the measurement of the fluorine content in the photocatalyst-containing layer, various commonly used methods can be used. For example, X-ray photoelectron spectroscopy (ES-ray photoelectron spectroscopy, ESCA) for Chemical Analysis)), and any method that can quantitatively measure the amount of fluorine on the surface, such as X-ray fluorescence analysis and mass spectrometry, is not particularly limited.

  In the present invention, as described above, titanium dioxide is preferably used as the photocatalyst. When titanium dioxide is used in this way, the fluorine content contained in the photocatalyst-containing layer is X-ray photoelectron. When analyzed and quantified by spectroscopy, when the titanium (Ti) element is defined as 100, the fluorine (F) element is in a ratio such that the fluorine (F) element is 500 or more, preferably 800 or more, particularly preferably 1200 or more. Is preferably contained on the surface of the photocatalyst-containing layer.

  Fluorine (F) is included in the photocatalyst containing layer to such an extent that the critical surface tension on the photocatalyst containing layer can be sufficiently lowered, so that the liquid repellency on the surface can be ensured, thereby irradiating energy. This is because the difference in wettability with the lyophilic region on the surface of the opening having a reduced fluorine content can be increased, and the accuracy of the finally obtained color filter can be improved.

  Further, in such a color filter, the fluorine content in the lyophilic region formed by pattern irradiation with energy is 50 or less when the titanium (Ti) element is 100, preferably It is preferably contained in a ratio of 20 or less, particularly preferably 10 or less.

  If the fluorine content in the photocatalyst-containing layer can be reduced to this extent, sufficient lyophilicity can be obtained for forming a color filter, and the liquid repellent liquid on the light-shielding portion where the energy is not irradiated. Therefore, the color filter can be formed with high accuracy due to the difference in wettability and the color filter with high utility value.

e. Method for Forming Photocatalyst-Containing Layer As a method for forming the photocatalyst-containing layer as described above, a coating solution is prepared by dispersing the photocatalyst and organopolysiloxane in a solvent together with other additives as necessary. It can form by apply | coating a liquid on the base material in which the said light-shielding part was formed. As the solvent to be used, alcohol-based organic solvents such as ethanol and isopropanol are preferable. The application can be performed by a known application method such as spin coating, spray coating, dip coating, roll coating, or bead coating. When an ultraviolet curable component is contained as a binder, the photocatalyst-containing layer can be formed by performing a curing treatment by irradiating ultraviolet rays. Even if any of the above coating methods is used, drying after coating is not performed by air drying, and after natural drying, the remaining solvent is preferably formed by heat drying such as infrared rays. . This is because it has the advantage that the stability of sensitivity and the sensitivity itself can be improved.

f. Next, a method of making the photocatalyst-containing layer irradiated with energy to make the opening to be a lyophilic region will be described. As described above, the contact angle with the liquid of the photocatalyst-containing layer decreases due to the action of the photocatalyst accompanying energy irradiation. Therefore, by irradiating energy from the substrate side opposite to the side on which the photocatalyst-containing layer is formed, energy can be applied only to the opening to reduce the contact angle with the liquid of the photocatalyst-containing layer. In the region where the light shielding part is formed, the contact angle with the liquid of the photocatalyst containing layer can be kept unchanged.

  Here, the energy applied to the photocatalyst containing layer is not particularly limited as long as it is a method of irradiating energy capable of reducing the contact angle with the liquid of the photocatalyst containing layer. Absent. The energy irradiation (exposure) in the present invention is a concept including irradiation of any energy beam capable of reducing the contact angle with the liquid on the surface of the photocatalyst containing layer, and is limited to irradiation with visible light. is not.

  Usually, the wavelength of light used for such energy irradiation is set in a range of 400 nm or less, preferably in a range of 150 nm to 380 nm or less. This is because, as described above, the preferred photocatalyst used in the photocatalyst-containing layer is titanium dioxide, and light having the above-described wavelength is preferable as the energy for activating the photocatalytic action by the titanium dioxide.

  Examples of light sources that can be used for such energy irradiation include mercury lamps, metal halide lamps, xenon lamps, excimer lamps, and various other light sources. In addition to the above-described method of irradiating energy using a light source as described above, a method of irradiating energy using a laser such as an excimer or YAG can also be used.

  In addition, the irradiation amount of energy at the time of energy irradiation is an irradiation amount necessary to reduce the contact angle with the liquid on the surface of the photocatalyst containing layer by the action of the photocatalyst in the photocatalyst containing layer.

  At this time, it is preferable in that the energy can be irradiated while heating the photocatalyst-containing layer, whereby the sensitivity can be further increased and the contact angle with the liquid on the surface of the photocatalyst-containing layer can be efficiently reduced. Specifically, it is preferable to heat within a range of 30 ° C to 80 ° C.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

Hereinafter, the present invention will be described in more detail through examples.
(Example 1)
<Production of light shielding part>
A negative black resist (DN83, manufactured by Tokyo Ohka Kogyo Co., Ltd.) was spin-coated on an alkali-free glass to a thickness of 1 μm and prebaked at 90 ° C. for 3 minutes. On this black resist, there are provided a number of rectangular light-shielding patterns (short side = 150 μm, long side = 300 μm) arranged in a matrix arrangement on the transparent mask substrate in vertical and horizontal directions and adjacent to the long side. A gradation photomask having a linear light-shielding part pattern (opening width 20 μm) and a connected light-shielding part pattern (opening width 20 μm) adjacent to the short side and connecting the linear light-shielding part patterns, The exposure gap was arranged to be 75 μm. The connection light shielding part pattern was an opening pattern in which the transmittance of i-line (light having a wavelength of 365 mm) changed from 100% to 50% from both ends to the center of the line width.
From the gradation photomask side, exposure was performed at an exposure amount of 50 mJ / cm ² using a high-pressure mercury lamp mainly emitting i-line (light having a wavelength of 365 mm) as a light source. Thereafter, the substrate was immersed in an alkaline developer (KOH 0.05 wt% aqueous solution) for 40 seconds and rinsed. Subsequently, the light shielding part which consists of a connection light-shielding part and a connection light-shielding part was formed on the base material by post-baking at 200 degreeC for 30 minutes.

<Shape evaluation of shading part>
As a result of evaluating the cross-sectional shape of the connection light-shielding part and the linear light-shielding part using a scanning electron microscope (SEM), the angle formed between the side surface of the connection light-shielding part and the substrate surface is 30 °, The angle formed between the side surface of the linear light shielding portion and the surface of the base material was 50 °. At this time, the width of the thin film region that is 50% or less of the maximum film thickness (1 μm) of the connection light shielding portion was 1.73 μm, and 8.66% of the line width (20 μm) of the connection light shielding portion.

<Formation of photocatalyst containing layer>
GF-160E (manufactured by Tochem Products Co., Ltd.) 0.4 g, trimethoxymethylsilane (manufactured by Toshiba Silicone Co., Ltd., TSL8113) 3 g, and titanium oxide as a photocatalyst 20 g of ST-K01 (Ishihara Sangyo Co., Ltd.), which is an aqueous dispersion, was mixed and stirred at 100 ° C. for 20 minutes. This was diluted 3 times with isopropyl alcohol to obtain a composition for a photocatalyst-containing layer.
The photocatalyst-containing layer-forming composition is applied onto the substrate on which the light-shielding part is formed by a spin coater, dried at room temperature for 5 minutes, and then dried at 150 ° C. for 10 minutes to obtain a transparent A photocatalyst-containing layer (thickness 0.2 μm) was formed. As a result of measuring the surface roughness of the obtained photocatalyst-containing layer using a surface roughness measuring device (DEKTAK STYLUS PROFILERS), it was a layer having irregularities of 15 nm to 60 nm.

<Confirmation of formation of lyophilic region by exposure>
This photocatalyst-containing layer was subjected to pattern exposure with a mercury lamp (wavelength 365 nm) through a mask at an illuminance of 70 mW / cm ² for 50 seconds. When the contact angle of the liquid with the non-exposed portion and the exposed portion was measured, in the non-exposed portion, the contact angle with a liquid having a surface tension of 30 mN / m (manufactured by Pure Chemical Co., Ltd., ethylene glycol monoethyl ether) It was 30 degrees. In the exposed area, the contact angle with a liquid with a surface tension of 50 mN / m (manufactured by Junsei Co., Ltd., wetting index standard solution No. 50) was 7 degrees. The contact angle with the liquid is a value measured using a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science Co., Ltd.) (30 seconds after dropping a droplet from a microsyringe). As described above, it was confirmed that the photocatalyst-containing layer had an exposed portion that became a lyophilic region as compared with the non-exposed portion, and pattern formation was possible due to the difference in wettability between the exposed portion and the non-exposed portion. Moreover, as a result of analyzing the surface of the exposed part and the non-exposed part by time-of-flight secondary ion mass spectrometry (TOF-SIMS), it was confirmed that a large amount of fluorine components exist only on the surface of the non-exposed part.

<Formation of colored layer>
Next, on the photocatalyst containing layer formed on the above-described light shielding portion, a photomask having a line and space with an opening line width of 150 μm and a light shielding portion of 20 μm is arranged so that the light shielding portion is on the linear light shielding portion, Exposure was performed under the same conditions as described above, and a region where the colored layer was formed was defined as lyophilic (exposed portion for colored layer). Next, thermal curing of each color of RGB including 5 parts by weight of a pigment, 30 parts by weight of a solvent, 70 parts by weight of an acrylic acid / benzyl acrylate copolymer, and 5 parts by weight of a bifunctional epoxy-containing monomer is performed using each RGB inkjet device. Type polyepoxyacrylate ink (viscosity 18 cp) was adhered to the exposed portion of the colored layer made lyophilic, and cured by heating at 150 ° C. for 30 minutes. Here, for each of the red, green, and blue colored layer forming coating solutions, the solvent is polyethylene glycol monomethyl ethyl acetate, the pigment is CI Pigment Red 177 for red ink, and CI Pigment Green 36 for green ink. CI Pigment Blue 15+ CI Pigment Violet 23 was used for the blue ink. Thereby, an RGB stripe color filter having a line width of 150 μm and a light shielding part of 20 μm was obtained. Moreover, as a result of observing the obtained RGB stripe color filter with an optical microscope, it was confirmed that there was no unevenness or white spots in the vicinity of the connected light shielding portion.

(Example 2)
In the same manner as in Example 1, a light shielding part composed of a connected light shielding part and a connected light shielding part was formed on the base material. Subsequently, the substrate on which the light shielding part was formed under the following conditions was treated with atmospheric pressure plasma, and a fluorine compound was introduced only into the light shielding part. The surface of the light-shielding part into which the fluorine compound is introduced has a contact angle of 27 degrees (liquid repellent area) with a liquid having a surface tension of 30 mN / m, and the area where the substrate is exposed has a surface tension of 50 mN / m. The contact angle with the liquid was 7 degrees or less (lyophilic region).
<Plasma irradiation conditions>
Introducing gas: CF ₄ ... 10 (l / min.)
・ Distance between electrode and substrate: 2mm
・ Power supply output: 200V-5A
-Conveying speed: 0.25 mm / min.
Thereafter, in the same manner as in Example 1, colored layers of three colors (RGB) were formed to obtain a stripe color filter. As a result of observing the obtained RGB stripe color filter with an optical microscope, it was confirmed that there was no unevenness or white spots in the vicinity of the connected light shielding portion.

It is a top view which shows an example of the color filter of this invention. It is explanatory drawing for demonstrating the shape of the connection light-shielding part used for the color filter of this invention. It is explanatory drawing for demonstrating the shape of the connection light-shielding part used for the color filter of this invention. It is a top view which shows an example of the color filter of this invention. It is explanatory drawing for demonstrating the shape of the connection light-shielding part used for the color filter of this invention. It is explanatory drawing for demonstrating the conventional color filter. It is explanatory drawing for demonstrating the conventional color filter.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Linear light-shielding part 2 ... Connection light-shielding part 3 ... Colored layer 4 ... Light-shielding part 5 ... Opening part

Claims (4)

A connection between a base material, a plurality of linear light shielding portions formed on the base material at regular intervals at equal intervals, and two adjacent linear light shielding portions at a predetermined interval. A color filter having a light-shielding part composed of a light-shielding part and a colored layer formed between the linear light-shielding parts and covering the connection light-shielding part,
The connection light-shielding part is formed so that an angle formed between a side surface of the connection light-shielding part and the substrate surface is smaller than an angle formed between a side surface of the linear light-shielding part and the substrate surface. Characteristic color filter.   The total width of the thin film region from each end of the connection light-shielding portion to the portion where the thickness of the connection light-shielding portion is 50% of the maximum film thickness of the connection light-shielding portion is 1% of the line width of the connection light-shielding portion. The color filter according to claim 1, wherein the color filter is in a range of ˜50%.   The color filter according to claim 1, wherein a photocatalyst-containing layer containing a photocatalyst and an organopolysiloxane is formed so as to cover the base material and the light shielding portion.   The color filter according to claim 1, wherein the light shielding portion contains fluorine.

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