JP2000227513A - Color filter and its production - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a color filter of high definition without defects such as white void and to provide its producing method by which good use efficiency of the material is obtd. in the production process and the processes can be easily simplified. SOLUTION: This color filter consists of a transparent substrate 1, photocatalyst- contg. layer 2 containing a photocatalyst formed on the transparent substrate 1, and wettability variable layer 3 which is formed on the photocatalyst-contg. layer 2 and which varies its wettability by the effect of the photocatalyst in the photocatalyst- contg. layer 2, and a pixel part 5 formed on the wettability variable layer 3 and having a specified pattern of plural colors. Or, in the color filter having a transparent substrate 1 and a pixel part 5 in a specified pattern of plural colors formed on the transparent substrate 1, the filter has a photocatalyst-contg. layer 2 containing a photocatalyst on a transparent substrate 1, and a decomposition removable layer 7 which is formed on the photocatalyst-contg. layer 2 and which can be decomposed and removed by the effect of the photocatalyst in the photocatalyst-contg. layer 2. The contact angle with water of the decomposition removable layer 7 is different from the contact angle with water of the surface of the photocatalyst-contg. layer 2 which is exposed when the layer 7 is decomposed and removed.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter suitable for a color liquid crystal display in which a pixel portion or the like of a color filter is formed by utilizing the action of a photocatalyst capable of changing wettability by exposure, and a method of manufacturing the same. Things.

[0002]

2. Description of the Related Art In recent years, with the development of personal computers, especially portable personal computers, the demand for liquid crystal displays, especially color liquid crystal displays, has been increasing. However, since the color liquid crystal display is expensive, there is an increasing demand for cost reduction, and in particular, there is a high demand for cost reduction for color filters having high specific gravity.

Such a color filter usually has three primary color patterns of red (R), green (G), and blue (B), and has electrodes corresponding to respective pixels of R, G, and B. Is turned on and off, the liquid crystal operates as a shutter, and light passes through each pixel of R, G, and B to perform color display.

A conventional color filter manufacturing method includes, for example, a dyeing method. In this dyeing method, first, a water-soluble polymer material, which is a material for dyeing, is formed on a glass substrate, and this is patterned into a desired shape by a photolithography process, and the obtained pattern is immersed in a dyeing bath. To obtain a colored pattern. This is repeated three times to form R, G, and B color filter layers.

Another method is a pigment dispersion method. In this method, first, a photosensitive resin layer in which a pigment is dispersed is formed on a substrate, and a monochromatic pattern is obtained by patterning the photosensitive resin layer. This process is further repeated three times to form R, G, and B color filter layers.

Still other methods include an electrodeposition method and a method of dispersing a pigment in a thermosetting resin, performing R, G, and B printing three times, and then thermosetting the resin. it can.

[0007]

However, in the conventional dyeing method and the pigment dispersion method, a material loss in a coating process on a transparent substrate by spin coating or the like is unavoidable.
A developing step and a washing step are required for each colored pattern formation, and it has been difficult to improve the material use efficiency and to simplify the steps, and to reduce the manufacturing cost. Further, in the printing method, it is difficult to form a high-definition pattern, and there is a problem that the pattern shape that can be formed in the electrodeposition method is limited.

The present invention has been made in view of the above-mentioned problems, and has a good use efficiency of materials at the time of manufacturing, can easily simplify the process, has high definition, and has no defects such as white spots. It is a primary object of the present invention to provide a color filter and a method for manufacturing the same.

[0009]

In order to achieve the above object, according to the present invention, a transparent substrate, a photocatalyst containing layer provided on the transparent substrate and containing a photocatalyst, are provided.
A wettability changing layer provided on the photocatalyst-containing layer, the wettability of which changes by the action of the photocatalyst in the photocatalyst-containing layer;
And a pixel portion provided on the wettability changing layer and provided with a plurality of colors in a predetermined pattern.

As described above, in the present invention, the pixel portion is provided on the wettability changing layer in which the wettability can be changed by the action of the photocatalyst in the photocatalyst containing layer. Therefore, by irradiating light to act a photocatalyst,
For example, the wettability of a portion where a pixel portion is provided in advance can be an ink-philic region having a small contact angle of water, and the other portion can be an ink-repellent region having a large contact angle of water. By coloring the portion of the lipophilic region where the pixel portion is provided, the ink adheres only to the lipophilic region having a small contact angle with water. Therefore, a pixel portion can be formed by performing pattern exposure and coloring, and there is no need to perform a developing process and a washing process each time a colored pattern is formed for each color pixel portion. For this reason, the process can be easily simplified, and the color filter obtained is inexpensive, high-definition, and free from defects such as white spots.

Further, in the present invention, since the pixel portion is formed on the wettability changing layer, the pixel portion does not directly contact the photocatalyst containing layer, that is, the photocatalyst. Therefore, problems that may occur when the pixel portion directly contacts the photocatalyst containing layer, for example, the organic groups in the pixel portion are oxidized,
The decomposition can prevent a problem that the pixel portion is deteriorated.

In the present invention, as described in claim 2, the color filter may have a light-shielding portion located at the boundary of the pixel portion. That is, the color filter of the present invention may be one in which a light shielding portion (so-called black matrix) is provided on the color filter.
Further, the light-shielding portion may be provided not on the color filter side but on the opposing substrate side, that is, the light-shielding portion may not be formed on the color filter. Providing a light-shielding portion on an opposing substrate is effective in improving the aperture ratio.

Further, when the light shielding portion is formed on the color filter side, the light shielding portion may be provided on the wettability changing layer. This is because, by providing a light-shielding portion on the wettability changing layer, as in the case of the pixel portion, by irradiating light to act on the photocatalyst,
For example, the wettability of the portion on the wettability changing layer in which the light shielding portion is provided in advance can be set as an ink-philic region having a small water contact angle, and the other portion can be set as an ink-repellent region having a large water contact angle. Therefore, by applying the light-shielding portion paint for forming the light-shielding portion to the portion where the light-shielding portion is provided as the ink-philic region, the light-shielding portion paint does not protrude into the ink-repellent region, so that the light-shielding portion can be easily shielded. A part can be provided.

In the present invention, as described in claim 4, it is preferable that the wettability changing layer is a wettability changing layer whose wettability changes so that the contact angle of water decreases by exposure. As described above, if the wettability changing layer whose wettability is changed so that the contact angle of water is reduced by exposure is formed, the wettability of this layer is easily changed by performing pattern exposure, etc. An ink-philic region having a small contact angle can be formed. For example, only a portion where a pixel portion is formed can be easily formed as an ink-philic region. Therefore, a color filter can be manufactured efficiently, which is advantageous in cost.

In the present invention, the contact angle with water on the wettability changing layer is preferably 90 ° or more in the unexposed portion and 30 ° or less in the exposed portion. Claim 24). Unexposed areas are areas where ink repellency is required,
If the contact angle with water is smaller than 90 degrees, the ink repellency is not sufficient, and there is a possibility that the ink or the light-shielding portion paint remains, which is not preferable. The reason why the water contact angle of the exposed portion is set to 30 degrees or less is that if the contact angle exceeds 30 degrees, the spread of the ink and the light-shielding portion paint in this portion may be inferior, and the color in the pixel portion may be reduced. This is because a dropout or the like may occur.

Further, as described in claim 6, the wettability changing layer is preferably a layer containing an organosiloxane. In the present invention, the property required for the wettability changing layer is that it is ink-repellent when light is not irradiated, and when it is irradiated with light, the action of the photocatalyst in the adjacent photocatalyst-containing layer causes the ink-repellent property. It is a characteristic that it becomes sexual. As a material for imparting such properties to the wettability changing layer, first, an organosiloxane is given.

[0017] Among such organosiloxanes,
As described in claim 7, Y _n SiX _(4-n) (where
Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, and X represents an alkoxyl group or a halogen. n is an integer from 0 to 3. ) Is preferably an organopolysiloxane that is one or more hydrolytic condensates or cohydrolytic condensates of the silicon compound represented by the formula (1). This is because such an organosiloxane satisfies the above characteristics well.

According to another aspect of the present invention, there is provided a color filter having a transparent substrate and a pixel portion provided with a plurality of colors in a predetermined pattern on the transparent substrate. In the above, a photocatalyst containing layer containing a photocatalyst on the transparent substrate, and provided on the photocatalyst containing layer, a decomposition removal layer that can be decomposed and removed by the action of the photocatalyst in the photocatalyst containing layer, this decomposition removal layer and this Provided is a color filter characterized in that the contact angle of water with the surface of the photocatalyst-containing layer exposed when the decomposition removal layer is decomposed and removed is different.

As described above, by providing the photocatalyst containing layer with the decomposition removal layer which can be decomposed and removed by the action of the photocatalyst in the photocatalyst containing layer, the exposed portion is decomposed and removed by the action of the photocatalyst. Therefore, the exposed portion exposes the photocatalyst-containing layer to the surface, and the unexposed portion leaves the decomposition removal layer. Here, since the decomposition removal layer and the exposed photocatalyst containing layer have different contact angles of water, for example, the decomposition removal layer is formed of an ink-repellent material, and the photocatalyst containing layer is formed of an ink-philic material. Then, by irradiating light to a portion where a pixel portion is to be formed in advance and causing a photocatalyst to act to remove the decomposition removal layer in that portion, the exposed portion becomes an ink-philic region, and the unexposed portion becomes an ink-repellent region. Become. Thereby, the wettability of the portion where the pixel portion is provided in advance can be an ink-philic region having a small contact angle with water, and the other portion can be an ink-repellent region having a large contact angle of water. By coloring the portion of the lipophilic region where the pixel portion is provided, the ink adheres only to the lipophilic region having a small contact angle with water. Therefore,
Similar to the above-described color filter having a wettability changing layer, a pixel portion can be formed by performing pattern exposure and coloring, and there is no need to perform a developing process and a washing process each time a colored pattern is formed for each color pixel portion. For this reason, the process can be easily simplified, and the color filter obtained is inexpensive, high-definition, and free from defects such as white spots.

In the present invention, as in the case of the color filter having the wettability changing layer described above, the color filter may have a light-shielding portion located at the boundary of the pixel portion. . That is, the color filter of the present invention may be one in which a light-shielding portion (a so-called black matrix) is provided on the color filter, or one in which the light-shielding portion is provided not on the color filter side but on the opposite substrate side, ie, the color filter. The filter may not be provided with the light shielding portion.

The contact angle of water on the decomposition removal layer is 60 degrees or more, and the contact angle of water on the surface of the photocatalyst-containing layer exposed when the decomposition removal layer is removed by decomposition is 30 degrees or less. Is preferable (claims 10 and 33).

In the present invention, an unexposed portion has a decomposition removal layer remaining. Here, the portion that is not exposed is a portion that normally requires ink repellency. If the contact angle of water on the decomposition removal layer is smaller than 60 degrees, the ink repellency is not sufficient, and ink or light shielding It is not preferable because there is a possibility that the part paint may remain.

On the other hand, the exposed portions are decomposed and removed by the action of the photocatalyst in the photocatalyst-containing layer adjacent to the decomposed and removed layer. Therefore, the exposed portion exposes the photocatalyst-containing layer on the surface. Since this part is usually a part requiring ink affinity, if the contact angle of water on the photocatalyst-containing layer exceeds 30 degrees, the spread of the ink and the light-shielding part paint in this part may be inferior. This is because there is a possibility that color omission or the like may occur in the pixel portion.

As described above, the decomposition removal layer is preferably decomposed and removed by the photocatalyst in the adjacent photocatalyst containing layer and has ink repellency. It is preferably a hydrogen-based, fluorine-based or silicone-based nonionic surfactant.

In any of the color filter having the wettability changing layer and the color filter having the decomposition removal layer of the present invention, the photocatalyst contained in the photocatalyst containing layer is made of titanium oxide (TiO 2). ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), tungsten oxide (W
O ₃ ), bismuth oxide (Bi ₂ O ₃ ), and iron oxide (F
e ₂ O ₃ ), and preferably one or more substances selected from e ₂ O ₃ ). In particular, as described in claim 13, titanium oxide (TiO ₂ ) is preferable. This is because titanium oxide has a high band gap energy and is effective as a photocatalyst, and is chemically stable, has no toxicity, and is easily available.

In each of the color filters having a wettability changing layer and the color filter having a decomposition removal layer according to the present invention, it is preferable that the pixel portion is formed by an ink jet method.
And claim 34).

The dyeing method, the pigment dispersing method, the electrodeposition method and the like, which are the conventional coloring methods for the pixel portion, all color three colors of red (R), green (G) and blue (B). Therefore, it is necessary to repeat the same process three times, which causes a problem that the cost is increased and a problem that the yield is reduced because the process is repeated. This is because, by coloring the pixel portion by an ink jet method, all colors can be colored at one time, and such a problem does not occur.

Further, in the present invention, it is preferable that the pixel portion colored by the ink jet method is a pixel portion colored by an ink jet method using a UV curable ink.
5). By using a UV curable ink, after forming a pixel portion by coloring with an ink jet method, by irradiating UV, the ink can be quickly cured, and can be immediately sent to the next process. Is preferred.

A liquid crystal panel having the above-described color filter and a substrate opposed thereto and obtained by enclosing a liquid crystal compound between the two substrates has the advantage of the above-described color filter, that is, a pixel portion. There is an advantage that there is no color omission or color unevenness and the cost is advantageous (claim 36).

The present invention further provides (1) a step of forming a photocatalyst-containing layer containing a photocatalyst on a transparent substrate, and (2) to achieve the above object.
Providing, on the photocatalyst-containing layer, a wettability changing layer in which the wettability of the exposed portion changes in the direction of decreasing the contact angle of water by the action of the photocatalyst in the photocatalyst-containing layer; Forming a light-shielding portion by forming a light-shielding portion by pattern exposure on a portion forming the light-shielding portion; and (4) providing a light-shielding portion by applying a light-shielding portion paint to the light-shielding portion exposure portion;
(5) exposing the substrate provided with the light-shielding portion to expose the wettability changing layer in the portion where the light-shielding portion is not formed to form an exposure portion for a pixel portion; Forming a pixel portion by coloring the exposed portion for application.

As described above, in the color filter manufacturing method of the present invention, the photocatalyst containing layer is provided on the transparent substrate,
Further, by providing a wettability changing layer on the photocatalyst containing layer and irradiating the wettability changing layer with light, the contact angle of water at the exposed portion can be reduced. Therefore, when forming the light-shielding portion, first, the wettability changing layer is simply subjected to pattern exposure to make it ink-philic only in the region where the light-shielding portion is to be formed. Can be formed. Therefore, since there is no need to perform a developing step or an etching step after pattern exposure, which has been performed when a conventional light shielding portion is provided, the light shielding portion can be efficiently formed. Further, thereafter, for example, by exposing the entire surface, the region where the pixel portion is easily formed can be made the ink-philic region. Therefore, by coloring this portion, the ink can be uniformly attached to the pixel portion, and a pixel portion without color omission or color unevenness can be formed.

Further, according to the present invention, (1) a photocatalyst-containing layer containing a photocatalyst is formed on the surface of the transparent substrate on which the light-shielding portion is formed, on the side where the light-shielding portion is formed. Forming, and (2) providing, on the photocatalyst-containing layer, a wettability changing layer in which the wettability of the exposed portion changes in the direction in which the contact angle of water decreases by the action of the photocatalyst in the photocatalyst-containing layer; 3) a step of exposing a portion of the wettability changing layer on which a pixel portion is to be formed to form an exposure portion for a pixel portion; and (4)
Forming a pixel portion by coloring the exposed portion for the pixel portion, thereby providing a method of manufacturing a color filter.

In this case, a photocatalyst-containing layer is provided on a transparent substrate on which a light-shielding portion is previously formed, a wettability changing layer is provided on the photocatalyst-containing layer, and pattern exposure is performed on a portion where a pixel portion is to be formed. Accordingly, only the portion where the pixel portion is easily formed can be made ink-philic. Therefore, by coloring the exposed portion for the pixel portion where the pixel portion is formed, the ink can be uniformly attached,
A pixel portion without color loss and without color unevenness can be formed.

In the case where the photocatalyst-containing layer is formed on the transparent substrate on which the light-shielding portion is formed in advance, the transparent substrate on which the light-shielding portion is not formed by using the light-shielding portion as a mask as described in claim 18. It is also possible to form an exposure portion for a pixel portion by exposing from the side. By exposing the entire surface from the side of the transparent substrate on which the light-shielding portion is not formed, only the portion of the wettability changing layer formed on the upper surface of the light-shielding portion is not exposed, and other portions can be exposed. Therefore,
Pattern exposure can be performed without using a photomask or the like, which is advantageous in cost.

As described in claim 19, it is preferable that the width of the pixel portion formed on the transparent substrate is wider than the opening formed by the light shielding portion. For example, in the case where a pixel portion is formed by exposure using a photomask or the like, by setting the width of the pixel portion wider than the opening formed by the light-shielding portion, the backlight light can be applied to portions other than the pixel portion. This is because the possibility of passing can be reduced.

Further, the present invention provides a method of manufacturing a color filter having no light-shielding portion, wherein (1) a step of forming a photocatalyst-containing layer containing a photocatalyst on a transparent substrate. (2) a step of providing a wettability changing layer on the photocatalyst-containing layer in which the wettability of the exposed portion changes in a direction in which the contact angle of water decreases by the action of the photocatalyst in the photocatalyst-containing layer; A step of exposing a portion for forming a pixel portion on the substrate provided with the wettability changing layer to form an exposed portion for the pixel portion; and (4) coloring the exposed portion for the pixel portion to form a pixel portion. And a method for manufacturing a color filter.

As described above, in the color filter manufacturing method of the present invention, the photocatalyst containing layer is provided on the transparent substrate,
By providing a wettability changing layer on the photocatalyst-containing layer and irradiating the wettability changing layer with light, it is possible to form an exposed portion for a pixel portion in which the contact angle of water at the exposed portion is reduced. The pixel portion can be easily formed by coloring the exposed portion for the pixel portion. Therefore, the pixel portion can be provided at low cost even on a transparent substrate on which the light shielding portion is not provided.

The present invention also provides a method of manufacturing a color filter having no light-shielding portion.
As described in (1), (1) a step of forming a photocatalyst containing layer on a transparent substrate, and (2) the wettability of the exposed portion on the photocatalyst containing layer by the action of the photocatalyst in the photocatalyst containing layer. Providing a wettability changing layer that changes in a direction in which the contact angle of water decreases, and (3) exposing a part of a portion of the wettability changing layer where a pixel portion is to be formed, to expose the first pixel portion. (4) coloring the exposed portion for the first pixel portion to form a first pixel portion; and (5) a portion on the photocatalyst containing layer where the first pixel portion is not formed. Forming a second pixel portion by exposing the second pixel portion to light, and (6) forming a second pixel portion by coloring the second pixel portion exposure portion. And a method for producing the same.

In the case where a pixel portion is formed without a light-shielding portion formed on a transparent substrate, the light-shielding portion cannot be used as a partition for coloring the pixel portion. Therefore,
In the case where the pixel portion is formed by coloring the exposed portion for the pixel portion that has been made into the ink-philic region by exposure, the interval between the exposed portions for the pixel portion is small, that is, the width of the ink-repellent region that is not exposed is small. In this case, there is a possibility that the inks of the pixel portions adjacent to each other beyond the ink-repellent region are mixed when forming the pixel portions. Therefore, when forming the pixel portion, it is desirable to form the pixel portion as far as possible from each other.
As described above, first, after forming the first pixel portion, the second pixel portion is formed.
According to the method of forming the pixel portion, for example, when forming the first pixel portion, it is possible to perform pattern exposure so that every other pixel portion is formed. In this case, it is possible to keep adjacent pixel portions apart. In this manner, the first pixel portion exposure portion is formed in a state having a relatively wide ink repellent region between the coloring regions, and the first pixel portion exposure portion is colored by, for example, an ink jet method, so that the ink of the adjacent pixel portion is formed. This eliminates the possibility that the inconvenience of mixing is caused. Exposure is again performed between the first pixel portions provided in this manner to form an exposed portion for the second pixel portion, and by coloring the portion, a color filter having no trouble such as mixing of ink is formed. Can be. Further, in the case of a color filter having no light-shielding portion, a color filter having no gap between pixel portions may be required. In such a case, it is necessary to use a method in which the formation of the pixel portion described above is inevitably performed twice or more.

Further, in this case, before forming the exposure portion for the pixel portion, a projection exposure portion for forming an ink-repellent convex portion is formed before forming the pixel portion exposure portion. The ink-repellent convex portions may be formed using a resin composition in the exposed portion for application.

By forming the ink-repellent convex portions in this manner, for example, when the ink-repellent convex portions are formed around the pixel portion region where the pixel portion is formed, the ink repellent portions are formed around the color filter. Can be prevented from flowing out and a pixel portion cannot be accurately formed. Further, for example, by forming such an ink-repellent convex portion between the pixel portions, the above-described problem, that is, the problem that the inks of the adjacent pixel portions are mixed does not occur.

Further, when the light-shielding portion is formed on the color filter side, it is possible to form the light-shielding portion after forming the pixel portion (claims 23 and 3).
1). For example, if there is a gap between the pixel portions, after forming the pixel portion, the entire surface is exposed, so that a region where the pixel portion is not formed becomes an ink-philic region, and a light-shielding portion paint is applied thereto. It is also possible to form a light-shielding portion by using the method described above, or to form a light-shielding portion on the pixel portion by various methods.

Further, according to the present invention, in order to achieve the above object, (1) a step of forming a photocatalyst-containing layer containing a photocatalyst on a transparent substrate,
(2) providing, on the photocatalyst-containing layer, a decomposition removal layer that can be decomposed and removed by the action of the photocatalyst in the photocatalyst-containing layer;
(3) a step of exposing a portion forming the light-shielding portion on the decomposition-removing layer, and then removing the portion to form an exposure portion for the light-shielding portion, and (4) applying a coating material for the light-shielding portion to the exposure portion for the light-shielding portion. (5) exposing the substrate on which the light-shielding portion is provided to expose and decompose and remove the decomposition-removed layer in the portion where the light-shielding portion is not formed by exposing the substrate provided with the light-shielding portion; And (6) forming a pixel portion by coloring the exposed portion for a pixel portion and providing a pixel portion.

As described above, in the color filter manufacturing method of the present invention, the photocatalyst containing layer is provided on the transparent substrate,
Further, by providing a decomposition removal layer on the photocatalyst containing layer, and irradiating the decomposition removal layer with light, the decomposition removal layer can be decomposed and removed by the action of the photocatalyst in the adjacent photocatalyst containing layer. Will be exposed on the surface. Therefore, for example, by making the photocatalyst-containing layer ink-philic having a small contact angle with water and the decomposing / removing layer with ink repellency having a large contact angle with water, the contact angle of water at the exposed portion can be reduced.

Therefore, when the light-shielding portion is formed, it is possible to decompose and remove only the region where the light-shielding portion is to be formed by simply pattern-exposing the decomposition-removing layer, thereby exposing the photocatalyst-containing layer. It can be an ink-philic region. Next, the light-shielding portion can be formed only by applying the light-shielding portion paint to this portion. This eliminates the necessity of performing a developing step or an etching step after pattern exposure, which has been performed when the conventional light-shielding portion is provided, so that the light-shielding portion can be efficiently formed. After that, by exposing the entire surface, for example, the decomposition removal layer in the region where the pixel portion is formed can be easily removed, and the photocatalyst containing layer which has been made ink-philic can be exposed. Therefore,
By coloring this portion, the ink can be uniformly attached to the pixel portion, and a pixel portion without color omission or color unevenness can be formed.

Further, according to the present invention, as described in claim 26, (1) a photocatalyst containing layer containing a photocatalyst is formed on the surface of the transparent substrate on which the light shielding portion is formed, on the side where the light shielding portion is formed. Forming; (2) providing a decomposition removal layer on the photocatalyst-containing layer that can be decomposed and removed by the action of the photocatalyst in the photocatalyst-containing layer; and (3) a portion on the decomposition-removal layer where a pixel portion is formed. And (4) forming a pixel portion by coloring the exposed portion for the pixel portion to form a pixel portion. A manufacturing method is provided.

In this case, a photocatalyst-containing layer is provided on a transparent substrate on which a light-shielding portion is previously formed, a decomposition removal layer is provided on the photocatalyst-containing layer, and pattern exposure is performed on a portion where a pixel portion is to be formed. By decomposing and removing only the decomposed and removed layer in the portion where the pixel portion is easily formed, for example, the photocatalyst-containing layer rendered ink-philic can be exposed to form the exposed portion for the pixel portion. Therefore, by coloring the exposed portion for the pixel portion where the pixel portion is formed, the ink can be uniformly attached, and a pixel portion without color loss and color unevenness can be formed.

In the case where the photocatalyst-containing layer is formed on the transparent substrate on which the light-shielding portion is formed in advance, the pixel is formed by exposing the light-shielding portion from the transparent substrate side using the light-shielding portion as a mask. It is also possible to form an exposing portion. By exposing the entire surface from the transparent substrate side where the light-shielding portion is not formed, only the decomposed and removed layer of the portion formed on the upper surface of the light-shielded portion remains without being exposed, and is decomposed and removed by exposing the other portion. Can be. Therefore, pattern exposure can be performed without using a photomask or the like, which is advantageous in cost.

Further, as described in claim 28, it is preferable that the width of the pixel portion formed on the transparent substrate is wider than the opening formed by the light shielding portion. For example, in the case where a pixel portion is formed by exposure using a photomask or the like, by setting the width of the pixel portion wider than the opening formed by the light-shielding portion, the backlight light can be applied to portions other than the pixel portion. This is because the possibility of passing can be reduced.

Further, in the present invention, as a method of manufacturing a color filter using a decomposition removal layer and having no light-shielding portion, (1)
(3) forming a photocatalyst-containing layer containing a photocatalyst on a transparent substrate; (2) providing a decomposition-removal layer on the photocatalyst-containing layer that can be decomposed and removed by the action of the photocatalyst in the photocatalyst-containing layer; A step of exposing a portion for forming a pixel portion on the substrate provided with the decomposition removal layer to form a pixel portion exposure portion; and (4) coloring the pixel portion exposure portion to form a pixel portion. And a method for manufacturing a color filter.

As described above, in the color filter manufacturing method of the present invention, the photocatalyst containing layer is provided on the transparent substrate,
By providing a decomposition removal layer on the photocatalyst containing layer and irradiating the decomposition removal layer with light, the decomposition removal layer at the exposed portion can be decomposed and removed by the action of the photocatalyst in the adjacent photocatalyst containing layer. Thus, for example, the photocatalyst-containing layer having ink affinity can be exposed to form the exposed portion for the pixel portion, and the pixel portion can be easily formed by coloring the exposed portion for the pixel portion. Therefore, the pixel portion can be provided at low cost even on a transparent substrate on which the light shielding portion is not provided.

The present invention also provides a method of manufacturing a color filter having no light-shielding portion.
(1) forming a photocatalyst-containing layer containing a photocatalyst on a transparent substrate; and (2) decomposing and removing the photocatalyst-containing layer on the transparent substrate by the action of the photocatalyst in the photocatalyst-containing layer. Providing a layer, and (3) forming a first pixel portion exposure portion by exposing and decomposing and removing a part of a portion forming a pixel portion on the decomposition removal layer;
(4) a step of coloring the exposed portion for the first pixel portion to form a first pixel portion; and (5) exposing the decomposition removal layer on the photocatalyst-containing layer where the first pixel portion is not formed. Forming an exposed portion for the second pixel portion by decomposing and removing;
(6) forming a second pixel portion by coloring the exposed portion for the second pixel portion, thereby providing a method of manufacturing a color filter.

When the pixel portion is formed in a state where the light-shielding portion is not formed on the transparent substrate, it cannot be used as a partition for coloring the pixel portion with the light-shielding portion. Therefore,
In the case where the pixel portion is formed by coloring the exposed portion for the pixel portion where the photocatalyst containing layer which has been made the ink-philic region exposed by the exposure is colored, if the interval between the exposed portions for the pixel portion is narrow, that is, it remains without being exposed When the width of the region formed of the decomposition removal layer is narrow, there is a possibility that the ink of the pixel portion adjacent to the region beyond this region is mixed when forming the pixel portion. Therefore, when forming the pixel portion, it is desirable to form the pixel portion as far as possible from each other. As described above, first, the first
If the method of forming the second pixel portion after forming the pixel portion is adopted, for example, when forming the first pixel portion, pattern exposure can be performed so that every other pixel portion is formed. In addition, adjacent pixel portions can be separated from each other when the first pixel portion is formed. Therefore, for the same reason as described in the method of manufacturing the color filter having the wettability changing layer, it is possible to manufacture a color filter free from problems such as mixing of ink.

In the method of manufacturing a color filter using the decomposition removal layer as described above, the decomposition removal layer and the surface of the photocatalyst-containing layer exposed when the decomposition removal layer is decomposed and removed. It is preferable that the contact angle of water with water is different. The difference in contact angle of water between the decomposition removal layer and the exposed photocatalyst containing layer facilitates formation of the light-shielding portion or the pixel portion.

[0055]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the color filter of the present invention will be described in detail. The color filter of the present invention, a color filter characterized by having a wettability changing layer whose wettability changes by the action of the photocatalyst in the photocatalyst containing layer,
Similarly, it can be divided into two color filters, a color filter characterized by having a decomposition removal layer that is decomposed and removed by the action of a photocatalyst. Here, a color filter having a wettability changing layer will be described first, and then a color filter having a decomposition removal layer will be described.

A. Color filter having a wettability changing layer Among the color filters of the present invention, a color filter having a wettability changing layer includes a transparent substrate, a photocatalyst containing layer provided on the transparent substrate, containing a photocatalyst, and a photocatalyst containing layer. A wettability changing layer provided on the layer and having a wettability changed by the action of the photocatalyst in the photocatalyst containing layer, and a pixel portion provided on the wettability changing layer and provided with a plurality of colors in a predetermined pattern. It has features in the places it has.

As described above, in the present invention, the pixel portion is provided on the wettability changing layer which can change the wettability by the action of the photocatalyst in the photocatalyst containing layer. Therefore, the wettability of the portion where the pixel portion is provided in advance can be an ink-philic region having a small water contact angle, and the other portion can be an ink-repellent region having a large contact angle of water. By coloring the portion where the pixel portion is provided, the ink adheres only to the ink-philic region having a small contact angle with water, so that the ink spreads evenly over the entire pixel portion, and there is no ink-free region or color in the pixel portion. There is no unevenness or the like, and ink does not adhere to other ink-repellent areas.

Further, in the present invention, since the pixel portion is formed on the wettability changing layer, the pixel portion does not directly contact the photocatalyst containing layer, that is, the photocatalyst. Therefore, problems that may occur when the pixel portion directly contacts the photocatalyst containing layer, for example, the organic groups in the pixel portion are oxidized,
The decomposition can prevent a problem that the pixel portion is deteriorated.

The color filter of the present invention may or may not have a light-shielding portion (black matrix) usually provided between pixel portions. When the light-shielding portion is not formed on the color filter, the light-shielding portion is usually formed on the opposing substrate. It can be said that the case where the light shielding portion is formed on the opposing substrate is preferable in that the aperture ratio is improved.

First, an example in which a light shielding portion is formed in the color filter of the present invention will be described with reference to the drawings.

FIG. 1 shows an example of the color filter of the present invention. This color filter is composed of a photocatalyst containing layer 2 provided on a transparent substrate 1 and a wettability formed on the photocatalyst containing layer 2. Change layer 3, and further this wettability change layer 3
A light-shielding part 4 partially formed on the upper part, and the light-shielding part 4
Red (R), green (G), and blue (B) formed between
Of the light-shielding portion 4 and the protective layer 6 provided on the pixel portion 5. The light-shielding portion 4 is also called a black matrix, and is usually formed at a boundary portion of the pixel portion.

In the case of the color filter provided with the light shielding portion as described above, the light shielding portion may be provided on the wettability changing layer. This is because, as shown in FIG. 1, by providing the light-shielding portion 4 on the wettability changing layer 3, the wettability of the portion where the light-shielding portion 4 is provided is changed in advance and the contact angle is small, as in the case of the pixel portion 5. The ink-repellent region can be an ink-philic region, and the other portion can be an ink-repellent region having a large contact angle with water. Therefore, the light shielding portion 4 is provided in the portion where the light shielding portion 4 is provided.
By applying a light-shielding part paint for forming
This is because the light-shielding portion can be easily provided without the light-shielding portion paint protruding into the ink-repellent region.

FIG. 2 shows an example in which the light shielding portion is not formed on the wettability changing layer. Also in this color filter, the photocatalyst containing layer 2 is formed on the transparent substrate 1,
Further, a wettability changing layer 3 is provided on the photocatalyst-containing layer 2, which is different from the example of FIG. 1 in that the light shielding portion 4 is first provided on the transparent substrate 1 in this example. 1 and a light-shielding portion 4 on which a photocatalyst containing layer 2 and a wettability changing layer 3 are formed. This wettability changing layer 3
The red, green, and blue pixel portions 5R, 5R
G and 5B are formed so as to close the space between the light-shielding portions 4, and a protective layer 6 is further provided thereon.

The color filter of the present invention may be one in which a light shielding portion 4 and a pixel portion 5 are provided on a wettability changing layer 3 as shown in FIG. 1, or as shown in FIG. Only the pixel portion 5 may be provided on the wettability changing layer 3.

Next, an example in which the light blocking portion is not formed in the color filter will be described with reference to FIG.

FIG. 3 shows an example of a color filter according to the present invention in which a light-shielding portion is not formed. This color filter is composed of a photocatalyst containing layer 2 provided on a transparent substrate 1 and a photocatalyst containing layer 2. Changeable wettability layer 3 formed on top
The red (R), green (G), and blue (B) pixel portions 5R, 5G, and 5B formed above, and the pixel portions 5
And a protective layer 6 provided as needed.

Hereinafter, each part constituting the color filter of the present invention will be described.

(Photocatalyst-Containing Layer) In the present invention, as shown in FIGS. 1, 2 and 3, the photocatalyst-containing layer 2 for changing the wettability of the wettability changing layer 3 on the transparent substrate 1.
Is formed.

The photocatalyst-containing layer is not particularly limited as long as the photocatalyst in the photocatalyst-containing layer changes the wettability of the wettability changing layer formed thereon. And a film formed of a single photocatalyst may be used. In addition, the wettability of the surface may be particularly ink-philic or ink-repellent. However, the surface must be ink-philic for convenience of forming a wettability changing layer on the photocatalyst-containing layer. Is preferred.

The mechanism of action of the photocatalyst represented by titanium oxide as described later in the photocatalyst-containing layer is not necessarily clear, but the carrier generated by the light irradiation causes the direct reaction of the carrier with a nearby compound. Alternatively, it is thought that active oxygen species generated in the presence of oxygen and water change the chemical structure of organic substances. In the present invention, it is considered that the carrier acts on the compound in the wettability changing layer formed on the photocatalyst-containing layer.

The photocatalyst used in the present invention includes, for example, titanium oxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), and tungsten oxide (W) which are known as optical semiconductors.
O ₃ ), bismuth oxide (Bi ₂ O ₃ ), and iron oxide (F
e ₂ O ₃ ), and one or more of them may be used in combination.

In the present invention, titanium oxide is particularly preferably used because it has a high band gap energy, is chemically stable, has no toxicity, and is easily available. Titanium oxide includes anatase type and rutile type, and both can be used in the present invention, but anatase type titanium oxide is preferable. Anatase type titanium oxide has an excitation wavelength of 380 nm or less.

Examples of such anatase type titanium oxide include anatase type titania sol of peptized hydrochloric acid (STS-02 (average particle size: 7 nm) manufactured by Ishihara Sangyo Co., Ltd.)
ST-K01 manufactured by Ishihara Sangyo Co., Ltd., anatase titania sol of nitric acid peptization type (TA-15 (average particle size: 12 nm) manufactured by Nissan Chemical Industries, Ltd.) and the like can be mentioned.

The smaller the particle size of the photocatalyst is, the more effective the photocatalytic reaction takes place. The average particle size is preferably 50 nm or less, more preferably 20 nm or less. In addition, the smaller the particle size of the photocatalyst is, the smaller the surface roughness of the formed photocatalyst-containing layer is. It is preferable that the particle size of the photocatalyst exceeds 100 nm. It is not preferable because the ink repellency of the non-exposed portion of the containing layer is reduced, and the expression of ink affinity in the exposed portion is insufficient.

The photocatalyst-containing layer in the present invention may be formed by using a photocatalyst alone as described above, or may be formed by mixing with a binder.

When the photocatalyst is formed alone, for example, in the case of titanium oxide, amorphous titania is formed on a transparent substrate,
Next, a method of changing the phase to crystalline titania by baking is exemplified. As the amorphous titania used here, for example, titanium tetrachloride, hydrolysis, dehydration condensation of inorganic salts of titanium such as titanium sulfate, tetraethoxytitanium, tetraisopropoxytitanium, tetra-n-propoxytitanium, tetrabutoxytitanium, An organic titanium compound such as tetramethoxytitanium can be obtained by hydrolysis and dehydration condensation in the presence of an acid.

When a binder is used, it is preferable that the binder has such a high binding energy that the main skeleton of the binder is not decomposed by the photoexcitation of the photocatalyst. Incidentally, an organopolysiloxane described in detail can be mentioned.

When the organopolysiloxane is used as a binder as described above, the photocatalyst-containing layer is formed by dispersing the photocatalyst and the organopolysiloxane as a binder in a solvent together with other additives as necessary. It can be formed by preparing and applying this coating solution on a transparent substrate. As the solvent to be used, alcohol-based organic solvents such as ethanol and isopropanol are preferable. The coating can be performed by a known coating method such as spin coating, spray coating, dip coating, roll coating, and bead coating. When an ultraviolet-curable component is contained as a binder, the photocatalyst-containing layer can be formed by irradiating ultraviolet rays and performing a curing treatment.

Further, an amorphous silica precursor can be used as a binder. This amorphous silica precursor is represented by the general formula SiX ₄ , wherein X is a silicon compound such as a halogen, a methoxy group, an ethoxy group, or an acetyl group, a silanol hydrolyzate thereof, or an average molecular weight of 3,000 or less. Polysiloxanes are preferred.

Specific examples include tetraethoxysilane, tetraisopropoxysilane, tetra-n-propoxysilane, tetrabutoxysilane, tetramethoxysilane and the like. Further, in this case, the amorphous silica precursor and the photocatalyst particles are uniformly dispersed in the non-aqueous solvent,
The photocatalyst-containing layer can be formed by hydrolyzing the transparent substrate with moisture in the air to form a silanol, followed by dehydration-condensation polymerization at room temperature. If the dehydration-condensation polymerization of silanol is performed at 100 ° C. or higher, the degree of polymerization of silanol increases, and the strength of the film surface can be improved. These binders can be used alone or in combination of two or more.

The content of the photocatalyst in the photocatalyst containing layer is 5 to 5.
It can be set in the range of 60% by weight, preferably 20 to 40% by weight. Further, the thickness of the photocatalyst-containing layer is 0.1 mm.
It is preferably in the range of 05 to 10 μm.

The photocatalyst-containing layer may contain a surfactant in addition to the photocatalyst and the binder.
Specifically, NIKKOL B manufactured by Nikko Chemicals Co., Ltd.
Hydrocarbons such as L, BC, BO, and BB series, ZONYL FSN and FSO manufactured by DuPont, Asahi Glass Co., Ltd.
Surflon S-141 and 145 manufactured by Dainippon Ink and Chemicals, Inc. Megafax F-141 and 144 manufactured by Dainippon Ink and Chemicals, Neogent Co., Ltd. Ftagent F-200 and F251 manufactured by Daikin Industries, Ltd. Unidyne DS-401 and 402. And fluorine-based or silicone-based nonionic surfactants such as Florad FC-170 and 176 manufactured by 3M Co., Ltd., and cationic surfactants, anionic surfactants and amphoteric surfactants. It can also be used.

Further, in addition to the above-mentioned surfactants, the photocatalyst-containing layer contains polyvinyl alcohol, unsaturated polyester, acrylic resin, polyethylene, diallyl phthalate, ethylene propylene diene monomer, epoxy resin, phenol resin, polyurethane, melamine resin. Oligomers such as polycarbonate, polyvinyl chloride, polyamide, polyimide, styrene butadiene rubber, chloroprene rubber, polypropylene, polybutylene, polystyrene, polyvinyl acetate, polyester, polybutadiene, polybenzimidazole, polyacrylonitrile, epichlorohydrin, polysulfide, polyisoprene, A polymer or the like can be contained.

(Wetability Changing Layer) As shown in FIGS. 1, 2 and 3, the wettability changing layer 3 is formed on the photocatalyst containing layer 2. The wettability changing layer is not particularly limited as long as the wettability is changed by the photocatalyst in the photocatalyst-containing layer. It is preferable that the layer has a wettability changing layer in which the wettability changes.

As described above, by providing the wettability changing layer on the photocatalyst containing layer whose wettability changes so that the contact angle of water is reduced by exposure, the wettability can be easily changed by performing pattern exposure or the like. Thus, it is possible to form an ink-philic region having a small contact angle with water. For example, only a portion where a pixel portion is formed can be easily formed as an ink-philic region. Therefore, color filters can be manufactured efficiently,
This is because it is advantageous in terms of cost.

Here, the ink-philic region is a region where the contact angle of water is small, and is a region having good wettability with a coloring ink, for example, an ink-jet ink or a light-shielding portion paint. . The ink-repellent area is
It is a region where the contact angle of water is large, and is a region where the wettability with respect to the coloring ink and the light-shielding portion paint is poor.

The wettability changing layer has a water contact angle of
It is preferable that the angle is 90 degrees or more, preferably 140 degrees or more, in the unexposed portion. This is because the non-exposed portion is a portion that requires ink repellency in the present invention. Therefore, when the contact angle of water is smaller than 90 degrees, the ink repellency is not sufficient, and the ink or light shielding This is because there is a possibility that the part paint remains, which is not preferable.

Further, it is preferable that the wettability changing layer is a layer in which the contact angle of water upon exposure is reduced to 30 ° or less, more preferably 20 ° or less. The reason why the contact angle of water at the exposed portion is 30 degrees or less is that if the contact angle exceeds 30 degrees, the spread of the ink and the light-shielding portion paint at this portion may be inferior, and the color loss at the pixel portion, etc. Is likely to occur.

The contact angle of water here refers to a value measured using a contact angle measuring device (CA-Z type, manufactured by Kyowa Interface Science Co., Ltd.) 30 seconds after a water droplet is dropped from a micro syringe. .

The material used for such a wettability changing layer is a material whose wettability changes due to the photocatalyst in the adjacent photocatalyst containing layer upon exposure, ie, the property of the wettability changing layer. It is not particularly limited as long as it has a main chain that is hardly degraded or decomposed by, for example, (1) chloro or alkoxy silane is hydrolyzed and polycondensed by a sol-gel reaction or the like to exhibit a large strength. Organopolysiloxanes such as (2) organopolysiloxanes obtained by crosslinking reactive silicones having excellent water repellency and oil repellency.

In the case of the above (1), the general formula: Y _n SiX _(4-n) (where Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group,
X represents an alkoxyl group, an acetyl group or a halogen. n is an integer from 0 to 3. ) Is preferably an organopolysiloxane that is one or more hydrolytic condensates or cohydrolytic condensates of the silicon compound represented by the formula (1). Here, the carbon number of the group represented by Y is preferably in the range of 1 to 20, and the alkoxy group represented by X is preferably a methoxy group, an ethoxy group, a propoxy group, or a butoxy group. preferable.

More specifically, methyltrichlorosilane, methyltribromosilane, methyltrimethoxysilane, methyltriethoxysilane, methyltriisopropoxysilane, methyltri-t-butoxysilane; ethyltrichlorosilane, ethyltribromosilane, ethyltrichlorosilane Methoxysilane, ethyltriethoxysilane, ethyltriisopropoxysilane, ethyltri-t-butoxysilane; n
-Propyltrichlorosilane, n-propyltribromosilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, n-propyltriisopropoxysilane, n-propyltri-t-butoxysilane; n-
Hexyltrichlorosilane, n-hexyltribromosilane, n-hexyltrimethoxysilane, n-hexyltriethoxysilane, n-hexyltriisopropoxysilane, n-hexyltri-t-butoxysilane; n-decyltrichlorosilane, n-decyltribromosilane,
n-decyltrimethoxysilane, n-decyltriethoxysilane, n-decyltriisopropoxysilane, n-
Decyltri-t-butoxysilane; n-octadecyltrichlorosilane, n-octadecyltribromosilane, n
-Octadecyltrimethoxysilane, n-octadecyltriethoxysilane, n-octadecyltriisopropoxysilane, n-octadecyltri-t-butoxysilane; phenyltrichlorosilane, phenyltribromosilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyl Triisopropoxysilane, phenyltri-t-butoxysilane; tetrachlorosilane, tetrabromosilane, tetramethoxysilane, tetraethoxysilane, tetrabutoxysilane, dimethoxydiethoxysilane; dimethyldichlorosilane, dimethyldibromosilane, dimethyldimethoxysilane , Dimethyldiethoxysilane; diphenyldichlorosilane, diphenyldibromosilane, diphenyldimethoxysilane, diphenyldiethoxysilane Phenyl methyldichlorosilane,
Phenylmethyldibromosilane, phenylmethyldimethoxysilane, phenylmethyldiethoxysilane; trichlorohydrosilane, tribromohydrosilane, trimethoxyhydrosilane, triethoxyhydrosilane, triisopropoxyhydrosilane, tri-t-butoxyhydrosilane; vinyltrichlorosilane, vinyltribromo Silane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltriisopropoxysilane, vinyltrit
-Butoxysilane; trifluoropropyltrichlorosilane, trifluoropropyltribromosilane, trifluoropropyltrimethoxysilane, trifluoropropyltriethoxysilane, trifluoropropyltriisopropoxysilane, trifluoropropyltri-t-butoxysilane; γ- Glycidoxypropylmethyldimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ
Glycidoxypropyltriisopropoxysilane, γ
-Glycidoxypropyltri-t-butoxysilane; γ-
Methacryloxypropylmethyldimethoxysilane, γ
-Methacryloxypropylmethyldiethoxysilane,
γ-methacryloxypropyltrimethoxysilane, γ
-Methacryloxypropyltriethoxysilane, γ-
Methacryloxypropyltriisopropoxysilane,
γ-methacryloxypropyltri-t-butoxysilane; γ-aminopropylmethyldimethoxysilane, γ-
Aminopropylmethyldiethoxysilane, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-aminopropyltriisopropoxysilane, γ-aminopropyltri-t-butoxysilane;
γ-mercaptopropylmethyldimethoxysilane, γ-
Mercaptopropylmethyldiethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropyltriethoxysilane, γ-mercaptopropyltriisopropoxysilane, γ-mercaptopropyltri-t-butoxysilane; β- (3,4-epoxy Cyclohexyl) ethyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltriethoxysilane; and their partial hydrolysates; and mixtures thereof, can be used.

In particular, a polysiloxane containing a fluoroalkyl group can be preferably used. Specifically, one or more hydrolyzed condensates and co-hydrolyzed condensates of the following fluoroalkylsilanes can be used. For example, those generally known as a fluorine-based silane coupling agent can be used.

CF ₃ (CF ₂ ) ₃ CH ₂ CH ₂ Si (OC
H ₃ ) ₃ ; CF ₃ (CF ₂ ) ₅ CH ₂ CH ₂ Si (OC
H ₃ ) ₃ ; CF ₃ (CF ₂ ) ₇ CH ₂ CH ₂ Si (OC
H ₃ ) ₃ ; CF ₃ (CF ₂ ) ₉ CH ₂ CH ₂ Si (OC
_{H 3) 3; (CF 3} ) 2 CF (CF 2) 4 CH 2 CH 2 Si (O
CH ₃ ) ₃ ; (CF ₃ ) ₂ CF (CF ₂ ) ₆ CH ₂ CH ₂ Si
(OCH ₃ ) ₃ ; (CF ₃ ) ₂ CF (CF ₂ ) ₈ CH ₂ CH ₂ S
i (OCH ₃ ) ₃ ; CF ₃ (C ₆ H ₄ ) C ₂ H ₄ Si (OC
_{H 3) 3; CF 3 (} CF 2) 3 (C 6 H 4) C 2 H 4 Si (OC
H ₃ ) ₃ ; CF ₃ (CF ₂ ) ₅ (C ₆ H ₄ ) C ₂ H ₄ Si (OC
_{H 3) 3; CF 3 (} CF 2) 7 (C 6 H 4) C 2 H 4 Si (OC
H ₃ ) ₃ ; CF ₃ (CF ₂ ) ₃ CH ₂ CH ₂ SiCH ₃ (OCH
₃ ) ₂ ; CF ₃ (CF ₂ ) ₅ CH ₂ CH ₂ SiCH ₃ (OC
H ₃ ) ₂ ; CF ₃ (CF ₂ ) ₇ CH ₂ CH ₂ SiCH ₃ (OCH
₃ ) ₂ ; CF ₃ (CF ₂ ) ₉ CH ₂ CH ₂ SiCH ₃ (OC
H ₃ ) ₂ ; (CF ₃ ) ₂ CF (CF ₂ ) ₄ CH ₂ CH ₂ SiCH
₃ (OCH ₃ ) ₂ ; (CF ₃ ) ₂ CF (CF ₂ ) ₆ CH ₂ CH ₂
Si CH ₃ (OCH ₃ ) ₂ ; (CF ₃ ) ₂ CF (CF ₂ ) ₈
CH ₂ CH ₂ Si CH ₃ (OCH ₃ ) ₂ ; CF ₃ (C ₆ H ₄ )
C ₂ H ₄ SiCH ₃ (OCH ₃ ) ₂ ; CF ₃ (CF ₂ ) ₃ (C ₆
H ₄ ) C ₂ H ₄ SiCH ₃ (OCH ₃ ) ₂ ; CF ₃ (CF ₂ ) ₅
(C ₆ H ₄ ) C ₂ H ₄ SiCH ₃ (OCH ₃ ) ₂ ; CF ₃ (CF
_{2) 7 (C 6 H 4} ) C 2 H 4 SiCH 3 (OCH 3) 2; CF
₃ (CF ₂ ) ₃ CH ₂ CH ₂ Si (OCH ₂ CH ₃ ) ₃ ; CF ₃
(CF ₂ ) ₅ CH ₂ CH ₂ Si (OCH ₂ CH ₃ ) ₃ ; CF
₃ (CF ₂ ) ₇ CH ₂ CH ₂ Si (OCH ₂ CH ₃ ) ₃ ; CF _{3
(CF 2) 9 CH 2 CH} 2 Si (OCH 2 CH 3) 3; and _{CF 3 (CF 2) 7 SO} 2 N (C 2 H 5) C 2 H 4 CH 2 Si
(OCH _{3) 3.}

By using a fluorosiloxane-containing polysiloxane as described above as a binder,
The ink repellency of the non-exposed portion of the wettability changing layer is greatly improved,
It exhibits a function of preventing the adhesion of the light-shielding portion paint and the coloring ink.

The reactive silicone of the above (2) includes compounds having a skeleton represented by the following general formula.

[0097]

Embedded image

Here, n is an integer of 2 or more, and R ¹ ,
R ² is a substituted or unsubstituted alkyl, alkenyl, aryl or cyanoalkyl group having 1 to 10 carbon atoms, and 40% or less of the whole is vinyl, phenyl or halogenated phenyl in a molar ratio. Further, those in which R ¹ and R ² are methyl groups are preferred because the surface energy is minimized, and the molar ratio of the methyl groups is preferably 60% or more. Further, the chain terminal or the side chain has at least one or more reactive group such as a hydroxyl group in the molecular chain.

In addition, a stable organosilicon compound which does not undergo a cross-linking reaction such as dimethylpolysiloxane may be mixed with the above-mentioned organopolysiloxane.

The wettability changing layer in the present invention may further contain a surfactant. Specifically, NIKKOL BL, BC, B manufactured by Nikko Chemicals Co., Ltd.
Hydrocarbons such as O and BB series, made by DuPont
ONYL FSN, FSO, Surflon S-141, 145 manufactured by Asahi Glass Co., Ltd., Megafac F-141, 144 manufactured by Dainippon Ink & Chemicals, Inc., Neogent Co., Ltd., Ftagent F-200, F251, Daikin Industries ( Fluorine or silicone nonionic surfactants such as Unidyne DS-401, 402 manufactured by Co., Ltd. and Florade FC-170, 176 manufactured by 3M Co., Ltd .; Surfactants and amphoteric surfactants can also be used.

In addition to the above-mentioned surfactants, the wettability changing layer may be made of polyvinyl alcohol, unsaturated polyester, acrylic resin, polyethylene, diallyl phthalate, ethylene propylene diene monomer, epoxy resin, phenol resin, polyurethane, melamine. Resins, polycarbonate, polyvinyl chloride, polyamide, polyimide, styrene butadiene rubber, chloroprene rubber, polypropylene, polybutylene, polystyrene, polyvinyl acetate, polyester, polybutadiene, polybenzimidazole, polyacrylonitrile, oligomers such as epichlorohydrin, polysulfide, polyisoprene , A polymer and the like.

Such a wettability changing layer is prepared by dispersing the above-mentioned components together with other additives as necessary in a solvent to prepare a coating solution, and applying the coating solution on the photocatalyst-containing layer. Can be formed. As the solvent to be used, alcohol-based organic solvents such as ethanol and isopropanol are preferable. The coating can be performed by a known coating method such as spin coating, spray coating, dip coating, roll coating, and bead coating. When the composition contains an ultraviolet curable component, the wettability changing layer can be formed by performing a curing treatment by irradiating ultraviolet rays.

In the present invention, the thickness of the wettability changing layer is set at 0.1 mm based on the relationship between the rate of change in wettability by the photocatalyst and the like.
It is preferably from 001 μm to 1 μm, particularly preferably from 0.01 to 0.1 μm.

In the present invention, by using the wettability changing layer of the above-mentioned components, the action of the photocatalyst in the adjacent photocatalyst containing layer causes the action such as oxidation and decomposition of the organic groups and additives which are part of the above components. By using this, the wettability of the exposed portion can be changed to make it ink-philic, and a large difference can be caused in the wettability with the non-exposed portion. Therefore, by improving the receptivity (ink-affinity) and repellency (ink-repellency) with a light-shielding portion paint or a coloring ink, for example, an ink-jet ink, good quality and cost-effectiveness are obtained. A color filter can be obtained.

In the present invention, since the pixel portion is formed on the wettability changing layer, the pixel portion does not directly contact the photocatalyst containing layer, that is, the photocatalyst. Therefore, problems that may occur when the pixel portion directly contacts the photocatalyst containing layer, for example, the organic groups in the pixel portion are oxidized,
The decomposition can prevent a problem that the pixel portion is deteriorated.

(Pixel Section) In the present invention, FIGS.
As shown in FIG. 3, the pixel portion 5 is provided on the wettability changing layer 3 formed on the photocatalyst containing layer 2. In the present invention, the photocatalyst-containing layer is exposed to the ink-philic region having a low contact angle of water,
A pixel portion is formed in a predetermined pattern using a plurality of color inks. The normal pixel portion is formed with three colors of red (R), green (G), and blue (B). The color pattern shape in this pixel portion can be a known arrangement such as a stripe type, a mosaic type, a triangle type, a four-pixel arrangement type, and the coloring area can be set arbitrarily.

In the present invention, the material for forming the pixel portion differs depending on the method for coloring the pixel portion. Examples of the method of coloring the pixel portion include a coating method in which a known paint is applied by a known method such as spray coating, dip coating, roll coating, and bead coating, and a vacuum thin film method. In the present invention, it is preferable that coloring is performed by an inkjet method.

This is because the above-described coloring method requires repeating the same process three times in order to color red (R), green (G), and blue (B). In addition, there is a problem that the cost is increased and a problem that the yield is reduced due to the repetition of the process. This is because, by coloring the pixel portion by an ink-jet method, all colors can be colored at one time, and such a problem does not occur.

The ink-jet ink for forming such a pixel portion is roughly classified into aqueous and oil-based inks. In the present invention, any ink can be used. Water-based aqueous inks are preferred.

In the aqueous ink used in the present invention, water alone or a mixed solvent of water and a water-soluble organic solvent can be used as a solvent. On the other hand, oil-based inks based on high-boiling solvents are preferably used in order to prevent clogging of the head. Known pigments and dyes are widely used as the colorant used in such an ink-jet type ink. Further, a resin soluble or insoluble in a solvent may be contained for improving dispersibility and fixing property. In addition, surfactants such as nonionic surfactants, cationic surfactants, and amphoteric surfactants; preservatives; fungicides; pH adjusters; defoamers; ultraviolet absorbers; viscosity adjusters: surface tension adjusters; May be added as needed.

Further, ordinary ink-jet inks cannot contain a large amount of binder resin due to low suitable viscosity. However, the coloring agent particles in the ink are granulated by being wrapped with the resin so that the colorant itself has fixing ability. Can be. Such an ink can also be used in the present invention.
Further, a so-called hot melt ink or UV curable ink can be used.

In the present invention, it is particularly preferable to use a UV curable ink. By using a UV curable ink, after forming a pixel portion by coloring with an ink jet method, the ink can be quickly cured by irradiating UV, and can be immediately sent to the next step. Therefore, a color filter can be efficiently manufactured.

Such a UV-curable ink contains a prepolymer, a monomer, a photoinitiator and a coloring agent as main components. As the prepolymer, polyester acrylate, polyurethane acrylate, epoxy acrylate, polyether acrylate, oligoacrylate, alkyd acrylate, polyol acrylate,
Any of prepolymers such as silicon acrylate can be used without any particular limitation.

Examples of the monomer include vinyl monomers such as styrene and vinyl acetate; monofunctional acrylic monomers such as n-hexyl acrylate and phenoxyethyl acrylate; diethylene glycol diacrylate, 1,6-hexanediol diacrylate, hydroxypiperate ester neopentyl Polyfunctional acrylic monomers such as glycol diacrylate, trimethylolpropane triacrylate, and dipentaerythrol hexaacrylate can be used. The above prepolymer and monomer may be used alone or in combination of two or more.

The photopolymerization initiators include isobutyl benzoin ether, isopropyl benzoin ether, benzoin ethyl ether, benzoin methyl ether, 1-phenyl-1,2-propadion-2-oxime, 2,2-
Dimethoxy-2-phenylacetophenone, benzyl,
Hydroxycyclohexylphenyl ketone, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzophenone, chlorothioxanthone, 2-chlorothioxanthone, isopropylthioxanthone, 2-methylthioxanthone, chlorine-substituted benzophenone, halogen-substituted Those which can obtain desired curing characteristics can be selected and used from alkyl-allyl ketones and the like. In addition, if necessary, a photoinitiating auxiliary such as an aliphatic amine or an aromatic amine; a photosensitizer such as thioxanthone may be added.

In the example of the color filter of the present invention shown in FIGS. 1, 2 and 3, the red (R), green (G) and blue (B) pixel portions are all provided with one wettability changing layer and Although an example formed on the photocatalyst containing layer is shown, the present invention is not limited to this, for example, a wettability changing layer and a photocatalyst containing layer for a red pixel portion, a wettability for a green pixel portion. It also includes those in which a pixel portion is formed on a plurality of wettability changing layers and a photocatalyst-containing layer, such as a property change layer and a photocatalyst-containing layer, and a wettability changing layer and a photocatalyst-containing layer for a blue pixel portion.

(Light-shielding portion) Among the color filters of the present invention, in the color filter of the type in which the light-shielding portion is formed on the color filter side, as shown in FIG. 1 and FIG. A light shielding part 4 is formed.

The light-shielding portion in the present invention is a layer containing carbon fine particles, metal oxides, inorganic pigments, organic pigments and the like in a resin binder, and the thickness can be set within a range of 0.5 to 10 μm. . As the resin binder, a composition in which one or two or more aqueous resins such as polyacrylamide, polyvinyl alcohol, gelatin, casein, and cellulose are mixed can be used. Further, as the resin binder, an O / W emulsion-type resin composition, for example, an emulsion of reactive silicone can be used.

Further, such a light-shielding portion can be formed by forming a metal thin film of chromium or the like having a thickness of about 1000 to 2000 ° by a sputtering method, a vacuum evaporation method or the like, and patterning the thin film. Furthermore, a resin layer of polyimide resin, acrylic resin, epoxy resin or the like containing light-shielding particles such as carbon fine particles is formed,
Those formed by patterning this resin layer, carbon fine particles, forming a photosensitive resin layer containing light-shielding particles such as metal oxides, and those formed by patterning this photosensitive resin layer, Any of them can be used.

In the present invention, when a light-shielding portion is formed on the wettability changing layer, a portion having good wettability is formed in advance on the wettability changing layer, and a light-shielding portion paint is applied to the portion. Since the light-shielding portion is easily formed by coating, the light-shielding portion is preferably formed of a light-shielding portion paint in which the light-shielding fine particles and the resin are dissolved in a solvent or the like.

(Transparent Substrate) In the present invention, as shown in FIG. 1, FIG. 2 and FIG. 3, when the wettability changing layer 3 is formed on the photocatalyst containing layer 2 formed on the transparent substrate 1 It has features.

The transparent substrate is not particularly limited as long as it has been conventionally used for a color filter. For example, a transparent substrate having no flexibility such as quartz glass, pyrex glass, and synthetic quartz plate is used. A rigid material or a transparent flexible material having flexibility such as a transparent resin film or an optical resin plate can be used. Of these, Corning 7059 glass is a material having a low coefficient of thermal expansion, excellent dimensional stability and workability in high-temperature heat treatment, and is an alkali-free glass containing no alkali component in the glass. It is suitable for a color filter for a color liquid crystal display device according to the method.

In the present invention, a transparent substrate is usually used, but a reflective substrate or a substrate colored white can also be used. Further, as the transparent substrate, a substrate which has been subjected to surface treatment for preventing alkali elution, imparting a gas barrier property or other purposes as necessary may be used.

(Protective Layer) As shown in FIGS. 1, 2 and 3, the protective layer 6 is formed on the surface of the color filter as required. The protective layer is provided to flatten the color filter and to prevent the coloring layer or components contained in the coloring layer and the photocatalyst from being eluted into the liquid crystal layer.

The thickness of the protective layer can be set in consideration of the light transmittance of the material used, the surface condition of the color filter, and the like. For example, the thickness can be set in the range of 0.1 to 2.0 μm. it can. The protective layer can be formed using, for example, a known transparent photosensitive resin, a two-component curable transparent resin, or the like having a light transmittance required for the transparent protective layer.

B. Next, a color filter having a separation removing layer will be described. Among the color filters of the present invention, a color filter having a decomposition removal layer is a color filter having a transparent substrate and a pixel portion in which a plurality of colors are provided in a predetermined pattern on the transparent substrate. A photocatalyst-containing layer, and a decomposition-removal layer that is provided on the photocatalyst-containing layer and that can be decomposed and removed by the action of the photocatalyst in the photocatalyst-containing layer. The contact angle of water with the surface of the photocatalyst-containing layer exposed at the time is different.

As described above, by providing the photocatalyst containing layer with the decomposition removal layer which can be decomposed and removed by the action of the photocatalyst in the photocatalyst containing layer, the exposed portion is decomposed and removed by the action of the photocatalyst. Therefore, the photocatalyst-containing layer remains on the surface in the exposed portion, and the decomposition removal layer is exposed on the surface in the unexposed portion. Therefore, for example, the decomposition removal layer is formed of an ink-repellent material, the photocatalyst containing layer is formed of an ink-philic material, and a portion where a pixel portion is formed is irradiated with light in advance to act on the photocatalyst. Is removed, the exposed portion becomes an ink-philic region, and the unexposed portion becomes an ink-repellent region. Thereby, the wettability of the portion where the pixel portion is provided in advance can be an ink-philic region having a small contact angle with water, and the other portion can be an ink-repellent region having a large contact angle of water. By coloring the portion of the lipophilic region where the pixel portion is provided, the ink adheres only to the lipophilic region having a small contact angle with water. Therefore, similarly to the above-described color filter having the wettability changing layer, the pixel portion can be formed by pattern exposure and coloring, and it is not necessary to perform the developing step and the washing step each time a colored pattern is formed for each color pixel section. For this reason, the process can be easily simplified, and the color filter obtained is inexpensive, high-definition, and free from defects such as white spots.

In the present invention, as exemplified in the above description, it is preferable that the decomposition removal layer is ink-repellent and the photocatalyst containing layer is ink-philic, but the present invention is not limited to this. . That is, the photocatalyst containing layer may be ink-repellent, and the decomposition removal layer may be ink-philic.
In this case, the portion where the pixel portion or the light-shielding portion is not formed is exposed to decompose and remove the decomposition removal layer, thereby exposing the photocatalyst containing layer. As a result, the exposed portion becomes ink-repellent, and the unexposed portion remains ink-removable with the decomposition removal layer remaining.

Here, the difference in the contact angle of water between the decomposition removal layer and the exposed photocatalyst-containing layer is preferably at least 30 degrees or more, more preferably at least 60 degrees. This is because, when the difference in water contact angle is small, it is difficult to form a pixel portion and a light-shielding portion using the difference in water contact angle.

In the color filter of the present invention having the decomposition removal layer, a light-shielding portion (black matrix) usually provided between the pixel portions is formed similarly to the color filter having the wettability changing layer. Or may not be formed.

In the color filter of the present invention, an example in which a light shielding portion is formed on the color filter will be described with reference to the drawings.

FIG. 4 shows an example in which the light-shielding portion of the color filter of the present invention is formed. In this color filter, a light shielding part 4 is formed on a transparent substrate 1, and a photocatalyst containing layer 2 is provided so as to cover the transparent substrate 1 and the light shielding part 4. A decomposition removal layer 7 remains in a portion corresponding to the light shielding portion 4 on the photocatalyst containing layer 2, and the red (R), green (G), and blue (B) pixel portions are interposed between the decomposition removal layers. 5R,
5G and 5B are formed. This decomposition removal layer 7
A protective layer 6 is formed on the pixel section 5.

In this example, the decomposition removal layer 7 was initially formed over the entire surface of the photocatalyst containing layer 2,
After that, by exposing the portion where the pixel portion 5 is formed,
The exposed portion of the decomposition removal layer 7 is decomposed and removed by the action of the photocatalyst of the photocatalyst containing layer 2. Therefore, in the formed color filter shown in FIG. 4, the decomposition removal layer 7 remains only in a portion corresponding to the light-shielding portion 4 that has not been exposed.

Next, an example in which a light shielding portion is not formed in a color filter will be described with reference to FIG.

FIG. 5 shows an example of a color filter according to the present invention in which a light-shielding portion is not formed. The color filter is composed of a photocatalyst containing layer 2 provided on a transparent substrate 1 and a photocatalyst containing layer 2. The decomposed and removed layer 7 partially remaining above and the red (R), green (G), and blue (B) pixel portions 5R and 5R formed between the decomposed and removed layers 7
G and 5B, and furthermore, this decomposition and removal layer 7 and a protective layer 6 provided on the pixel portion 5 as needed.

Also in this example, the decomposition removal layer 7 was formed on the entire surface of the photocatalyst containing layer 2 at the time of manufacture, but by exposing a portion of the decomposition removal layer 7 where the pixel portion 5 is to be formed, The decomposition removal layer 7 in the portion forming the pixel portion 5 is decomposed and removed by the action of the photocatalyst of the photocatalyst containing layer 2. Therefore, in the color filter shown in FIG. 5, the separation removal layer 7 remains only between the pixel portions 5.

Hereinafter, each part constituting the color filter of the present invention will be described.

The transparent substrate, the light-shielding portion, the pixel portion, and the protective layer among the components constituting the color filter having the decomposition removal layer of the present invention are described in the above “A. Color filter having wettability changing layer”. Because it overlaps with the content
These descriptions are omitted here.

(Photocatalyst-Containing Layer) In the present invention, FIG.
As shown in FIG. 5 and FIG.
The photocatalyst containing layer 2 for decomposing is formed.

The photocatalyst-containing layer in the present invention may be formed by using a photocatalyst alone or may be formed by mixing with a binder. It is necessary that the photocatalyst in the inside decomposes the decomposition removal layer formed thereon,
Further, it is preferable that the surface exposed after the removal of the decomposition removal layer has a water contact angle different from the water contact angle of the decomposition removal layer. In this case, as described above, the photocatalyst-containing layer preferably has ink-philicity, and particularly, the contact angle of water is 3
The contact angle of water is preferably 0 ° or less, more preferably 20 ° or less.

In the present invention, the exposed portion is decomposed and removed by the action of the photocatalyst in the photocatalyst-containing layer adjacent to the decomposed and removed layer. Therefore, the exposed portion exposes the photocatalyst-containing layer on the surface. Since this part is a part that requires ink affinity,
When the contact angle of water on the photocatalyst containing layer exceeds 30 degrees,
This is because the spread of the ink and the light-shielding portion paint in this portion may be inferior, and color loss or the like may occur in the pixel portion.

Such a photocatalyst containing layer may be formed solely by the light containing layer, or may be formed by mixing with the binder.

When the photocatalyst is formed alone, for example, in the case of titanium oxide, amorphous titania is formed on a transparent substrate,
Next, a method of changing the phase to crystalline titania by baking is exemplified. As the amorphous titania used here, for example, titanium tetrachloride, hydrolysis, dehydration condensation of inorganic salts of titanium such as titanium sulfate, tetraethoxytitanium, tetraisopropoxytitanium, tetra-n-propoxytitanium, tetrabutoxytitanium, An organic titanium compound such as tetramethoxytitanium can be obtained by hydrolysis and dehydration condensation in the presence of an acid.

When a binder is used, it is preferable that the binder has such a high binding energy that the main skeleton of the binder is not decomposed by the photoexcitation of the photocatalyst. For example, an amorphous silica precursor can be used. This amorphous silica precursor is represented by the general formula SiX ₄ , wherein X is a silicon compound such as a halogen, a methoxy group, an ethoxy group, or an acetyl group, a silanol hydrolyzate thereof, or an average molecular weight of 3,000 or less. Polysiloxanes are preferred.

Specifically, there may be mentioned tetraethoxysilane, tetraisopropoxysilane, tetra-n-propoxysilane, tetrabutoxysilane, tetramethoxysilane and the like. Further, in this case, the amorphous silica precursor and the photocatalyst particles are uniformly dispersed in the non-aqueous solvent,
The photocatalyst-containing layer can be formed by hydrolyzing the transparent substrate with moisture in the air to form a silanol, followed by dehydration-condensation polymerization at room temperature. If the dehydration-condensation polymerization of silanol is performed at 100 ° C. or higher, the degree of polymerization of silanol increases, and the strength of the film surface can be improved. These binders can be used alone or in combination of two or more.

Further, the photocatalyst-containing layer may be such that the contact angle with water is reduced by exposure, and the photocatalyst-containing layer falls within the above range. This is because, when the decomposition removal layer transmits light, the photocatalyst-containing layer is exposed through the decomposition removal layer when exposing the decomposition removal layer.

As such a photocatalyst containing layer, “A.
Examples of the binder include the organosiloxane described as a component of the wettability changing layer in the "color filter having a wettability changing layer".

The type and particle size of the photocatalyst used in such a photocatalyst-containing layer, the content of the photocatalyst in the photocatalyst-containing layer, additives such as surfactants, and the method for forming the photocatalyst-containing layer are described above. Since it is the same as that described in "A. Color filter having wettability changing layer", description is omitted here.

(Decomposition Removal Layer) As shown in FIGS. 4 and 5, the decomposition removal layer 7 is formed on the photocatalyst containing layer 2. The decomposition removal layer is not particularly limited as long as it is decomposed and removed by the action of the photocatalyst in the photocatalyst-containing layer when exposed, but the contact angle with water is 6.
It is preferable that the angle is 0 degrees or more.

This means that the decomposed / removed layer remains in the portion not exposed in the present invention. Here, the portion that is not exposed is a portion that preferably exhibits ink repellency as described above. Therefore, when the contact angle of water on the decomposition removal layer is smaller than 60 degrees, the ink repellency is not sufficient, and there is a possibility that the ink and the light-shielding portion paint remain, which is not preferable.

In the example shown in FIGS. 4 and 5, the decomposition removal layer 7 remaining after exposure remains in a portion where the pixel portion 5 is not formed, that is, between the pixel portions 5. In such a case, the decomposition removal layer 7 has a contact angle with water of 6
By providing the ink repellency of 0 degrees or more, the decomposition removal layer 7 can be used as an ink-repellent convex portion that separates the pixel portions 5 from each other, thereby preventing the ink of each pixel portion from being mixed. Can be prevented.

The material used for such a decomposition-removing layer is a material which is decomposed and removed by the action of the photocatalyst in the adjacent photocatalyst-containing layer upon exposure, that is, water and preferably water, Is a material having a contact angle of 60 degrees or more.

Examples of such a material include hydrocarbon-based, fluorine-based and silicone-based nonionic surfactants. Specific examples of such a material include polyoxyethylene alkyl ether, polyoxyethylene alkyl phenyl ether, perfluoroalkyl ethylene oxide adduct, and perfluoroalkyl amine oxide.

As such a material, if it is a hydrocarbon-based nonionic surfactant, NIKKOL BL, BC, B
O, BB series (trade name, manufactured by Nippon Surfactant Industries, Ltd.), ZONYL FSN, FSO (trade name, manufactured by DuPont), and Surflon S-141 as long as it is a fluorine-based or silicon-based nonionic surfactant. , 145
(Trade name, manufactured by Asahi Glass Co., Ltd.), Megafac F-141, 1
44 (trade name, manufactured by Dainippon Ink and Chemicals), Futuregent
It can be obtained as F200, F251 (trade name, manufactured by Neos), Unidyne DS-401, 402 (trade name, manufactured by Daikin Industries), and Florade FC-170, 176 (trade name, manufactured by 3M).

As the material for the decomposition removal layer, other cationic, anionic and amphoteric surfactants can be used. Specifically, sodium alkylbenzenesulfonate, alkyltrimethylammonium salt, perfluoroalkyl Carboxylates, perfluoroalkyl betaines and the like can be mentioned.

Further, as a material of the decomposition removal layer, various polymers or oligomers can be used in addition to the surfactant. Examples of such a polymer or oligomer include polyvinyl alcohol, unsaturated polyester, acrylic resin, polyethylene, diallyl phthalate, ethylene propylene diene monomer, epoxy resin, phenol resin, polyurethane, melamine resin,
Polycarbonate, polyvinyl chloride, polyamide, polyimide, styrene butadiene rubber, chloroprene rubber,
Polypropylene, polybutylene, polystyrene, polyvinyl acetate, nylon, polyester, polybutadiene,
Examples thereof include polybenzimidazole, polyacrylonitrile, epichlorohydrin, polysulfide, and polyisoprene. In the present invention, it is preferable to use an ink-repellent polymer having a high contact angle with water, such as polyethylene, polypropylene, polystyrene, and polyvinyl chloride.

Such a decomposition-removed layer is formed by dispersing the above components together with other additives as necessary in a solvent to prepare a coating solution, and applying the coating solution on the photocatalyst-containing layer. can do. Application is spin coating,
It can be performed by a known coating method such as spray coating, dip coating, roll coating, and bead coating.

In the present invention, the thickness of the decomposition removal layer is preferably from 0.001 μm to 1 μm, particularly preferably from 0.01 μm, in view of the decomposition rate by the photocatalyst.
It is in the range of 1 to 0.1 μm.

Next, the method for manufacturing the color filter of the present invention will be described. In the description of the method for manufacturing the color filter, the color filter having the wettability changing layer and the color filter having the decomposition removal layer are separately described. explain. First, a method for manufacturing a color filter having a wettability changing layer will be described.

C. Color filter having wettability changing layer
First, a method of manufacturing a color filter having a light-shielding portion in a color filter will be described, and then a color filter having no light-shielding portion will be described.

[0161] 1. Manufacture of a color filter having a light-shielding part
Method (First Embodiment) (Step of Forming Photocatalyst-Containing Layer on Transparent Substrate) FIG. 6 shows a method of manufacturing a color filter (see FIG. 1) of the present invention having a wettability changing layer and having a light shielding portion. 1 shows a first embodiment of the present invention. As shown in FIG. 6A, first, a photocatalyst containing layer 2 is formed on a transparent substrate 1. This photocatalyst containing layer 2
To form the coating, the photocatalyst and the binder are dispersed in a solvent together with other additives as necessary to prepare a coating solution, and after applying this coating solution, hydrolysis and polycondensation are allowed to proceed to form a binder. It is formed by firmly fixing the photocatalyst inside. As a solvent to be used, ethanol-based organic solvents such as ethanol and isopropanol are preferable, and application is performed by spin coating, spray coating, dip coating,
It can be performed by a known coating method such as roll coating and bead coating. When an amorphous silica precursor is used as a binder, the amorphous silica precursor and the photocatalyst particles are uniformly dispersed in a non-aqueous solvent, and are hydrolyzed on the transparent substrate 1 with moisture in the air. After the silanol is formed, the photocatalyst-containing layer 2 can be formed by dehydration-condensation polymerization at room temperature. Further, in the case of forming a film using only the photocatalyst, for example, amorphous titania is formed on a transparent substrate, and then baked to be phase-converted to crystalline titania to form a photocatalyst-containing layer.

(Step of forming wettability changing layer) Next, FIG.
As shown in (B), the wettability changing layer 3 is formed on the photocatalyst containing layer 2.
To form Using the material for the wettability changing layer 3 described above,
The wettability changing layer 3 is formed on the photocatalyst-containing layer by a method of applying this as a solution, a method of performing a surface graft treatment, a method of performing a surfactant treatment, a film formation method using a gas phase such as PVD or CVD, or the like. At the time of coating, known coating methods such as spin coating, spray coating, dip coating, roll coating and bead coating can be used.

(Step of Forming Light-Shielding Part) The light-shielding part forming portion of the wettability changing layer 3 thus formed is exposed to light using a photomask or the like to form a light-shielding part exposure part 8. The light-shielding portion exposure portion 8 is a portion where the contact angle of water on the surface of the wettability changing layer 3 is reduced due to the influence of the photocatalyst in the photocatalyst containing layer 2 and forms an ink-philic region. (FIG. 3
(C)). This exposure may be a pattern irradiation using a mercury lamp, a metal halide lamp, a xenon lamp, or the like through a light mask or the like for a light-shielding portion, but as another method,
A method of drawing and irradiating the pattern shape of the light shielding portion using a laser such as excimer or YAG may be used.

The wavelength of the light used for this exposure can be set within the range of 400 nm or less, preferably 380 nm or less. Is an irradiation amount necessary to exhibit ink-affinity (a contact angle of water is 30 degrees or less, preferably 20 degrees or less).

Then, the light-shielding portion paint is applied to the light-shielding portion exposure portion 8.
And then cured to form a light-shielding portion 4 (FIG. 3).
(D)). The coating of the light-shielding part paint on the light-shielding part exposure part 8 is performed by spray coating, dip coating, roll coating,
It can be performed by a known coating method such as bead coating. In this case, the applied light-shielding portion paint is repelled and removed in the ink-repellent region having a high contact angle with water on the wettability changing layer 3 other than the light-shielding portion exposure portion 8, and the water contact portion is removed. It selectively adheres only to the light-shielding portion exposure portion 8 which is an ink-philic region having a low corner.

The application of the light-shielding portion paint onto the light-shielding portion exposure portion 8 may be performed by a nozzle discharge method such as ink jet. In this case, the light-shielding portion paint supplied into the light-shielding portion exposure portion 8 by nozzle discharge uniformly diffuses and adheres to the light-shielding portion exposure portion 8, which is an ink-philic region, and exhibits ink repellency. It does not diffuse into the other wettability changing layers 3. Further, even if the paint supplied by the nozzle discharge protrudes from the light-shielding portion exposing portion 8, the paint is repelled by the other wettability changing layer 3 having high ink repellency and adheres to the light-shielding portion exposing portion 8. become.

Further, the light shielding portion 4 may be formed by a vacuum thin film forming method. That is, a metal thin film is formed on the wettability changing layer 3 after the exposure by an evaporation method or the like, and the difference in adhesion between the wettability changing layer 3 other than the light-shielding portion exposure portion 8 and the light-shielding portion exposure portion 8 is used. Then, the light shielding portion 4 can be formed by patterning by peeling using an adhesive tape, solvent treatment, or the like.

(Step of Forming Pixel Section) Next, the entire surface of the wettability changing layer 3 on which the light shielding section 4 is formed is exposed. Thereby, the portion of the wettability changing layer 3 where the light shielding portion 4 is not formed is
The exposure part 9 for the pixel part of the ink-philic area by the action of the photocatalyst
(FIG. 3E). This exposure is performed at the same wavelength as the above-described step of forming the light-shielding portion 4, but differs from the step of forming the light-shielding portion 4 in that the entire surface is irradiated. Note that this step is not particularly limited to the entire surface exposure, and pattern exposure may be performed if necessary.

Then, the ink is colored red, green, and blue, for example, by using an ink or the like in the pixel portion exposure portion 9 which has become the ink-philic region by exposure using an ink-jet device or the like. In this case, since the inside of the exposure unit 9 for the pixel portion is an ink-philic region having a small contact angle with water due to the exposure as described above, for example, the ink ejected from the inkjet device or the like is exposed to the exposure unit for the pixel portion. It spreads evenly in 9.

In the present invention, the exposure portion 9 for the pixel portion is used.
The coloring to may be any method such as a coating method,
Although not particularly limited, coloring is preferably performed by an inkjet method in view of the advantage that coloring of the exposure portion 9 for the pixel portion is completed in one process. in this case,
The inkjet device to be used is not particularly limited, but includes a method of continuously ejecting charged ink and controlling by a magnetic field, a method of intermittently ejecting ink by using a piezoelectric element, and a method of heating ink to foam the ink. An ink jet apparatus using various methods such as a method of intermittently ejecting the ink using the method described above can be used.

The pixel-portion exposure section 9 colored in this way
By solidifying the ink inside, the pixel portion 5 is formed (FIG. 3F). In the present invention, the solidification of the ink is performed by various methods depending on the type of the ink used.
For example, in the case of a water-soluble ink, the water is removed by heating or the like to be solidified.

In consideration of this ink solidification step, the type of ink used in the present invention is preferably UV curable ink. This is because the UV curable ink can quickly solidify the ink by irradiating the UV, so that the manufacturing time of the color filter can be shortened.

As described above, since the ink in the exposure section 9 for the pixel section is uniformly spread, when the ink is solidified in this way, it is possible to form the pixel section 5 without color omission or color unevenness. .

(Step of Forming Protective Layer) Then, a protective layer 6 is formed on the light-shielding portion 4 and the pixel portion 5 which were formed last, and a color filter is formed (FIG. 3G).

[0175] 2. Manufacture of a color filter having a light-shielding part
Method (Second Embodiment) Next, a method for manufacturing a color filter of the present invention will be described with reference to FIG.
A second embodiment will be described with reference to FIGS.

In this example, first, the light shielding portion 4 is formed on the transparent substrate 1 by a conventional method. Next, the photocatalyst-containing layer 2 is formed on the transparent substrate 1 on which the light-shielding portion 4 is formed (FIG. 7A). The formation of the photocatalyst-containing layer 2 can be performed in the same manner as the step of forming the photocatalyst-containing layer in the first embodiment described above.

The thus formed photocatalyst-containing layer 2
The wettability changing layer 3 is formed thereon (FIG. 7B). This wettability changing layer can be formed in the same manner as the wettability changing layer forming step in the first embodiment.

Next, by exposing the transparent substrate 1 on which the photocatalyst containing layer 2 and the wettability changing layer 3 are formed, the exposed portion on the wettability changing layer by the action of the photocatalyst in the photocatalyst containing layer 2 is exposed. The exposure section 9 for the pixel section is formed as an ink-philic area (FIG. 7C).

This exposure can be performed by exposing the entire surface of the transparent substrate 1 from the side where the light-shielding portion 4 is not formed, as shown in FIG. 8A, and as shown in FIG. 8B. As described above, it is also possible to use the photomask 10 from the wettability changing layer 3 side.

In the case where the entire surface is exposed from the transparent substrate 1 side, as is clear from FIG. 8A, the light-shielding portion 4 acts as a mask, and only the portion without the light-shielding portion 4 is exposed. Become. According to this method, exposure can be performed without using a photomask or the like for a pixel portion, which is advantageous in cost.

On the other hand, when the exposure is performed using the photomask 10 for forming the exposure portion 9 for the pixel portion, FIG.
Exposure is performed from the wettability changing layer 3 side as shown in FIG.
In this case, it is preferable that the width of the exposure unit 9 for the pixel unit formed by the exposure, that is, the width of the pixel unit 5 be larger than the width of the opening formed by the light shielding unit 4. By doing so, when the backlight is irradiated after the liquid crystal panel is completed, there is no possibility that the backlight transmits through a portion without a color filter.

The pixel portion exposure section 9 thus formed is colored in the same manner as in the pixel portion forming step of the first embodiment described above. Also in this case, it is preferable that coloring is performed by an ink jet method. For example, in the case of coloring by the ink jet method, the ink discharged from the ink jet device adheres to the exposure unit 9 for the pixel unit formed by exposure. At this time, the pixel unit exposure unit 9
As described above, the ink spreads uniformly and over the entire area because of the ink-philic region as described above. In addition, since the region of the photocatalyst-containing layer that has not been exposed is an ink-repellent region, the ink is repelled and removed in this region.

By solidifying this ink in the same manner as in the first embodiment, the pixel portion 5 is formed as shown in FIG. Then, by forming a protective layer 6 on the pixel portion 5, a color filter is completed (FIG. 7).
(E)).

[0184] 3. How to make a color filter without light blocking
Method (Third Embodiment) Next, a method for manufacturing a color filter of the present invention will be described with reference to FIG.
A third embodiment will be described with reference to FIGS.

As shown in FIG. 9A, first, a photocatalyst containing layer 2 is formed on a transparent substrate 1. Next, FIG.
The wettability changing layer 3 is formed on the photocatalyst containing layer 2 formed as shown in FIG. The photocatalyst forming step and the wettability changing layer forming step are performed in the same manner as in the above-described first embodiment.

Next, the pixel portion forming portion of the wettability changing layer 3 is exposed using a photomask 10 to form a pixel portion exposure portion 9 (FIG. 9C). The pixel portion exposure portion 9 is a portion where the contact angle of water of the wettability changing layer 3 is reduced by the action of the photocatalyst in the photocatalyst containing layer 2 and forms an ink-philic region. This exposure is performed in the same manner as in the first embodiment.

Then, the exposed portion 9 for the pixel portion is colored. As described above, various coloring methods can be used as the coloring method. Here, a description will be given as a step of coloring using an inkjet method. As shown in FIG. 9D, the ink jet device 11 ejects the ink 12 into the exposure portion 9 for the pixel portion, which has become the ink-philic region by exposure, and colors the red, green, and blue, respectively. In this case, since the inside of the exposure unit 9 for the pixel unit becomes an ink-philic region having a small contact angle with water due to exposure as described above,
The ink 12 ejected from the inkjet device 11 is
It spreads uniformly in the exposure part 9 for pixel parts. The usable ink jet device and ink are the same as those in the first embodiment.

As described above, the pixel portion 5 is formed by solidifying the ink adhered in the pixel portion exposure portion 9. In the present invention, the solidification of the ink is performed by various methods depending on the type of the ink used. For example, if it is a UV curable ink, it is solidified by irradiating UV,
In the case of a water-soluble ink, the water is removed by heating or the like to be solidified.

As described above, since the ink in the pixel portion exposure section 9 is uniformly spread, when the ink is solidified in this way, it is possible to form the pixel section 5 without color omission or color unevenness. .

Finally, a color filter is formed by forming a protective layer 6 on the pixel portion 5 (see FIG. 9).
(E)).

[0191] 4. How to make a color filter without light blocking
Method (Fourth Embodiment) A second example (fourth embodiment) of a method of manufacturing a color filter having no light-shielding portion according to the present invention will be described with reference to FIGS.

Also in this example, first, the photocatalyst containing layer 2 is formed on the transparent substrate 1 (FIG. 10A), and then the wettability changing layer 3 is formed on the photocatalyst containing layer 2 (FIG. 10).
(B)). The photocatalyst containing layer forming step and the wettability changing layer forming step are performed in the same manner as in the above-described first embodiment.

Next, exposure is performed using a photomask in the same manner as in the third embodiment. In the third embodiment, the photomask is so formed as to form exposure portions for pixel portions corresponding to all the pixel portions. In the fourth embodiment, the photomask is designed so that every other pixel portion is formed, and the photomask 10 is used to expose the wettability changing layer 3 to the first pixel portion. Form the part 13 (FIG. 10)
(C)).

The first pixel portion exposure section 13 is colored. In the present embodiment, an example in which this coloring is performed using an ink jet system will be described. FIG.
As shown in FIG. 0 (D), the ink 12 ejects the ink 12 into the first pixel portion exposure portion 13 which has become the ink-philic region by exposure, and the ink 12 is colored. It is referred to as part 14. This exposure and coloring of the pixel portion using the inkjet apparatus are performed by using a photomask 1
This is performed in the same manner as in the third embodiment except for the zero shape.

FIG. 11A shows the transparent substrate 1 on which the first pixel section 14 is formed. For example, in the case of forming pixel units of three colors of red (R), green (G), and blue (B), as shown in FIG. 11A, the first red pixel unit (R1) from the left. Is formed, and then the first green pixel portion (G
The first blue pixel portion (B1) is formed by skipping 1), and the second green pixel portion (G2) is formed by skipping the second red pixel portion (R2). As described above, the first pixel units 14 are formed every other first. An example of the photomask 10 used at this time is shown in FIG.

Next, a photomask 1 different from the first one is formed on the wettability changing layer 3 on which the first pixel portion 14 is formed.
Exposure is performed again using 0 '. This photomask 10 '
Is a second pixel portion exposure portion 15 between the first pixel portions 14.
Are formed, for example, as shown in FIG.
2) or a photomask as shown in (B-2) is used. Exposure is performed using such a photomask 10 ′ to form the second pixel portion exposure portion 15 (FIG. 10E). Note that in the example of FIG.
The photomask shown in (B-2) is used.

Then, the ink jet device 11
The ink 12 is jetted and colored into the second pixel portion exposure portion 15 which has become the ink-philic region by the exposure, and is cured to form the second pixel portion 16. The second pixel section 16 includes the first
It is formed so as to fill the space between the pixel portions 14 (FIG. 10).
(F)). This exposure and coloring of the pixel portion using the ink jet device are performed in the same manner as in the third embodiment except for the shape of the photomask 10.

FIG. 11B shows a state in which the second pixel portion is also formed. By forming the second pixel portion 16 so as to fill the space between the first pixel portions 14, three color pixel portions arranged in the order of red (R), green (G), and blue (B) from the left are formed. .

Finally, a color filter is formed by forming a protective layer on the pixel portion as required. It can be said that it is preferable to form the pixel portion twice in this manner for the following reasons.

In the case where the pixel portion is formed in a state where the light-shielding portion is not formed on the transparent substrate as in the above-described example, the light-shielding portion cannot be used as a partition for each pixel portion. Therefore, when the pixel portion is formed by coloring the exposed portion for the pixel portion, which has been made to be the ink-philic region by exposure, by an ink-jet method, the distance between the exposed portions for the pixel portion is small, that is, the ink repellency that has not been exposed. If the area is narrow,
In forming the pixel portion, there is a possibility that the inks of the pixel portions adjacent to each other beyond the ink-repellent region are mixed. Therefore, when forming the pixel portion, it is desirable to form the pixel portion as far as possible from each other. In the above-described fourth embodiment, when forming the first pixel portion 14, pattern exposure is performed so that every other pixel portion is formed. It can be separated. In this manner, the first pixel portion exposure portion 13 can be formed in a state having a relatively wide ink-repellent region therebetween, so that the inkjet device 11
In the case of coloring with the ink, there is no possibility that the inconvenience of mixing the inks 12 of the adjacent pixel portions occurs. Then
Exposure is again performed between the first pixel portions 14 to form the second pixel portion exposure portion 15, which is colored by the ink jet device 11, so that the inks 12 do not mix with each other, thereby causing problems such as uneven color. It is possible to form a color filter without any. Further, when it is necessary to provide the pixel portions continuously, it is necessary to use such a method.

In the fourth embodiment, the photomask 10 'used for the second exposure is the same as that shown in FIG.
As shown in (1), the entire region where the first pixel portion is formed may be exposed, and all the ink repellent regions between the first pixel portions 14 may be used as the second pixel portion exposure portion, FIG. 12 (A
As shown in -2), a predetermined portion of the first pixel portion may be exposed to be a second pixel portion. FIG. 12 (B-
When a photomask as shown in 2) is used, the obtained pixel portion is formed as shown in FIGS. 10F and 11B.
It is formed continuously without any gap between the pixel portions. In the case where a photomask as shown in FIG. 12A-2 is used, an ink-repellent region can be left between pixel portions; therefore, a region having a gap between pixel portions can be formed. it can. In the present invention, any method may be used, and the obtained color filter may be any type. Further, in the above description, an example is shown in which the first pixel portion is provided every other pixel region, but the present invention is not limited to this, and a plurality of first pixel portions may be separated if necessary. It may be provided. in this case,
Exposure and coloring are performed twice or more.

(Formation of Ink-Repellent Convex Portion) In the present invention, the ink-repellent convex portion may be formed before forming the pixel portion. This is because, for example, when this ink-repellent convex portion is formed around the pixel portion region where the pixel portion is formed, the ink flows out around the color filter and the pixel portion cannot be formed accurately. This is because a failure can be prevented.

Such an ink-repellent convex portion is formed by forming a convex-light exposed portion for forming an ink-repellent convex portion before forming the above-described pixel-portion exposed portion. Is formed by forming an ink-repellent convex portion using a resin composition. As a photomask for forming such an exposed portion for a convex portion, for example, FIG.
Examples shown in 1) can be mentioned. By exposing the photocatalyst-containing layer using these photomasks, first, an exposed portion for a convex portion is formed. In the case where the above-described photomask of FIG. 12C-1 is used, the exposing portion for a convex portion is formed with an exposing portion for a convex portion on an upper end side and a lower end side of a region where a pixel portion is formed. In the case where the photomask shown in (D-1) is used, a projection exposure portion is formed so as to surround a region where a pixel portion is formed.

Next, an ink-repellent convex portion can be formed by attaching and curing the resin composition on the exposed portion for the convex portion. The resin composition used here is not particularly limited, but is, for example, a material used for a black matrix (light shielding portion),
A material which does not contain a black material can be used. Specifically, an aqueous resin such as polyacrylamide, polyvinyl alcohol, gelatin, casein, and cellulose is
Examples thereof include a composition in which two or more kinds are mixed, and a resin composition of an O / W emulsion type, for example, an emulsified reactive silicone. In the present invention, a photocurable resin is preferably used for reasons such as easy handling and easy curing. In addition, since the ink-repellent projection preferably has ink-repellency, the surface thereof may be treated with an ink-repellent treating agent such as a silicone compound or a fluorine-containing compound.

In the present invention, the height of the ink-repellent convex portion is
Since the ink-repellent convex portion is provided to prevent the ink from flowing out when the ink-repellent convex portion is colored by, for example, an ink jet method, it is preferable that the height is somewhat high. Then, the thickness is preferably close to the thickness of the pixel portion. Specifically, it is preferably within the range of 0.1 to 2 μm, though it varies depending on the amount of ink to be sprayed.

After forming such an ink-repellent convex portion,
The first pixel portion is formed using a photomask shown in FIG. 12 (C-2 or D-2), and then (A-2)
Alternatively, the second pixel portion is formed using the photomask shown in (B-2). ), A pixel portion is formed and a color filter is formed.

In the present invention, the region where the ink-repellent convex portions are provided is not limited to the upper and lower sides of the pixel portion region and the periphery of the pixel portion region. May be. Further, in the present invention, it is apparent that the ink-repellent convex portion can be provided even in the color filter having the light shielding portion by the above-described exposure method.

(Formation of Light-Shielding Portion) In the examples shown in the third embodiment and the fourth embodiment, a method of manufacturing a color filter having no light-shielding portion (black matrix) has been described. It is also possible to manufacture a color filter having a light shielding portion by a manufacturing method.

That is, after the pixel portion is formed on the transparent substrate by the method of the third and fourth embodiments described above, a light-shielding portion is further formed to manufacture a color filter having a light-shielding portion. it can.

As a method of forming the light-shielding portion, as shown in FIG. 9D, for example, after forming the pixel portion 5 according to the third embodiment, the entire surface is exposed and the space between the pixel portions 5 is made ink-philic region. Here, a method may be used in which a light-shielding portion paint is applied and cured, or a method conventionally used after a pixel portion is formed on the entire surface as shown in FIG. For example, the light-shielding portion may be formed by a sputtering method, a vacuum evaporation method, or the like.

D. Color filter using decomposition removal layer
First, a method of manufacturing a color filter having a light-shielding portion in a color filter will be described, and then a color filter having no light-shielding portion will be described.

[0212] 1. Manufacture of a color filter having a light-shielding part
Method (Fifth Embodiment) (Step of Forming Photocatalyst-Containing Layer) FIG. 13 shows a method of manufacturing a color filter using a decomposition-removing layer, which is an example of a method of manufacturing a color filter having a light-shielding portion. It is an illustration of an embodiment. As shown in FIG. 13A, first, a photocatalyst containing layer 2 is formed on a transparent substrate 1. The formation of the photocatalyst-containing layer 2 is performed in the same manner as in the first embodiment described above. However, in the method of manufacturing a color filter using the decomposition removal layer, the decomposition removal layer and the decomposition removal layer are removed. It is preferable that the contact angle of water with the surface of the photocatalyst-containing layer exposed to the surface is different in forming the pixel portion and the light-shielding portion. The angle is preferably 30 degrees or less, particularly preferably 20 degrees or less. Therefore, it is necessary to select and form the photocatalyst containing layer in consideration of these points.

(Step of Forming Decomposition Removal Layer) Next, FIG.
As shown in (B), a decomposition removal layer 7 is formed on the photocatalyst containing layer 2. The photocatalyst-containing layer 2 is formed by using the above-described material for the decomposition removal layer 7 and applying it as a solution, a method of performing a surface graft treatment, a method of performing a surfactant treatment, or a film formation method using a gas phase such as PVD or CVD. Decomposition removal layer 7 on top
To form At the time of coating, known coating methods such as spin coating, spray coating, dip coating, roll coating and bead coating can be used.

(Step of Forming Light-Shielding Portion) When the light-shielding portion forming portion of the decomposition-removing layer 7 thus formed is exposed using a photomask or the like, the exposed portion of the decomposition-removing layer 7 is exposed to the photocatalyst-containing layer 2. A decomposition portion 17 is formed which is decomposed and removed by oxidation or the like by the action of the photocatalyst therein.
(C)). The decomposed portion 17 is oxidized and decomposed by the action of a photocatalyst by exposure and is vaporized or the like, so that it is removed without special processing to form the light-shielding portion exposure portion 8 (FIG. 13).
(D)). At this time, if necessary, a removal treatment such as solvent washing may be performed.

The light-shielding portion exposure portion 8 is a portion where the decomposition portion 17 is removed, and is a portion where the photocatalyst containing layer 2 is exposed. Here, if the photocatalyst containing layer 2 is lyophilic, this portion becomes an lyophilic region. Note that this exposure is the same as the exposure performed in the above-described first embodiment, and a description thereof will not be repeated.

The light-shielding portion 4 is added to the light-shielding portion exposure portion 8.
Is formed (FIG. 13E). The formation of the light-shielding portion 4 in the light-shielding portion exposure section 8 is the same as in the first embodiment described above.

(Step of Forming Pixel Section) Next, the entire surface of the decomposition removal layer 7 on which the light shielding section 4 is formed is exposed. Thus, the portion where the light shielding portion 4 is not formed becomes the disassembled portion 17 (FIG. 13F). This exposure is performed in the same manner as in the step of forming the light-shielding portion 4 described above, except that the entire surface is irradiated.
Is different from the forming process. Then, the decomposition portion 17 is removed by the action of the photocatalyst, and the photocatalyst containing layer 2 thereunder is removed.
Is exposed to form an exposure section 9 for the pixel section (FIG. 13
(G)). Here, if the photocatalyst containing layer 2 is lyophilic, this portion becomes an lyophilic region.

Next, red, green, and blue are respectively colored by using an ink or the like in the pixel-portion exposure section 9 using, for example, an ink-jet device. In this case, when the photocatalyst containing layer is lyophilic, the inside of the pixel portion exposure section 9 is an ink-philic region having a small contact angle with water. It spreads uniformly in the exposure part 9 for pixel parts. In this way, the pixel portion 5 is formed by solidifying the ink adhered in the pixel portion exposure portion 9 (FIG. 13H). In the present invention, the solidification of the ink is performed by various methods depending on the type of the ink used. For example, a UV-curable ink is solidified by irradiating UV, and a water-soluble ink is solidified by removing water by heating or the like. Note that an ink jet device, an ink, and the like that can be used when a coloring method and an ink jet method are used are the same as those in the first embodiment described above.

(Process of Forming Protective Layer) Then, a protective layer 6 is formed as necessary on the light-shielding portion 4 and the pixel portion 5 which were formed last, and a color filter is completed (FIG. 13).
(I)).

[0220] 2. Manufacture of a color filter having a light-shielding part
Method (Sixth Embodiment) In the above-described fifth embodiment, a method of manufacturing a color filter in which a separation removal layer does not remain between pixel portions of a final color filter is described. 6
The embodiment is an example of a method of manufacturing a color filter of a type in which a separation removal layer remains between pixel portions of a final color filter as shown in FIG.

In the sixth embodiment, first, a light shielding portion 4 is formed on a transparent substrate 1 by a conventional method. Next, the photocatalyst-containing layer 2 is formed on the transparent substrate 1 on which the light shielding portion 4 is formed (FIG. 14A). The formation of the photocatalyst-containing layer 2 can be performed in the same manner as the step of forming the photocatalyst-containing layer in the fifth embodiment described above.

The photocatalyst containing layer 2 thus formed
The decomposition removal layer 7 is formed thereon (FIG. 14B). The formation of the decomposition removal layer 7 can be performed in the same manner as the formation step of the decomposition removal layer in the fifth embodiment.

By performing pattern exposure on the transparent substrate 1 on which the photocatalyst-containing layer 2 and the decomposition removal layer 7 are formed, the exposed portion on the decomposition removal layer 7 is set as a decomposition part 17 (FIG. 14C). .

This exposure is the same as that described with reference to FIG. 8 in the second embodiment, except that the wettability changing layer 3 is replaced with the decomposition removal layer 7, so that the description is omitted here.

The decomposition section 17 thus formed is
The exposed portion 9 is removed by the action of the photocatalyst and the photocatalyst-containing layer 2 is exposed (FIG. 14D).

The pixel portion exposure section 9 is colored in the same manner as in the pixel portion forming process of the first embodiment described above. Also in this case, it is preferable that coloring is performed by an ink jet method. For example, in the case of coloring by the ink jet method, the ink discharged from the ink jet device adheres to the exposure unit 9 for the pixel unit formed by exposure. At this time, between the exposure units 9 for the pixel units,
As is clear from (D), the decomposition removal layer 7 remains. For this reason, when coloring the exposed portion 9 for the pixel portion, the action of the decomposition removal layer 7 makes it difficult for ink to be mixed or the like. In particular, if the decomposition removal layer 7 has an ink repellency, preferably a contact angle with water of 60 degrees or more, it is preferable because this effect is remarkably obtained.

If the photocatalyst-containing layer 2 exposed and removed by the decomposition / removal layer 7 serving as the decomposition portion 17 is ink-philic having a small contact angle with water, the pixel portion exposure portion 9 is colored. This is preferred because the ink spreads uniformly and throughout. From such a viewpoint, the contact angle of the exposed photocatalyst-containing layer 2 with water is preferably 30 degrees or less, and particularly preferably 2 degrees.
It is preferable that it is 0 degrees or less.

If the remaining removal layer 7 is ink-repellent with a high contact angle with water and the exposed photocatalyst-containing layer 2 is ink-philic, the colored ink and the like are uniformly distributed in the pixel area. The ink is repelled and removed by the decomposition removal layer 7 which spreads in the exposure section 9 and acts as an ink-repellent convex portion present at the boundary portion, so that there is no problem such as mixing.

By solidifying this ink in the same manner as in the first embodiment, the pixel portion 5 is formed as shown in FIG. Then, a protective layer 6 is formed on the pixel portion 5 to complete a color filter (FIG. 14).
(F)).

[0230] 3. How to make a color filter without light blocking
Method (Seventh Embodiment) Next, a method for manufacturing a color filter of the present invention will be described with reference to FIG.
A method of manufacturing the color filter shown in FIG. 15 will be described as a seventh embodiment with reference to FIG.

As shown in FIG. 15A, first, a photocatalyst containing layer 2 is formed on a transparent substrate 1. Then, FIG.
The decomposition removal layer 7 is formed on the photocatalyst containing layer 2 formed as shown in FIG. The photocatalyst containing layer forming step and the decomposition removal layer forming step are performed in the same manner as in the fifth embodiment described above.

Next, the pixel portion forming portion of the decomposition removing layer 7 is exposed using a photomask 10, and the decomposition removing layer 7 at a portion corresponding to the pixel portion forming portion is decomposed by oxidative decomposition by the action of a photocatalyst. 17 (FIG. 15C).

[0233] The disassembled portion 17 thus formed is
The exposed portion 9 for the pixel portion is removed by the action of the photocatalyst and the photocatalyst containing layer 2 is exposed (FIG. 15D).

The pixel portion exposure section 9 is colored in the same manner as in the pixel portion forming process of the first embodiment described above. The coloring is not particularly limited, but is preferably performed by an inkjet method. This is because coloring is completed in one process.

When the ink or the like is attached to the exposed portions 9 for the pixel portions formed by exposure, as shown in FIG.
Remains. Therefore, in the seventh embodiment as well as in the sixth embodiment, when the exposed portion 9 for the pixel portion is colored, the action of the decomposition removal layer 7 makes it difficult to mix ink and the like. In particular, if the decomposition removal layer 7 has an ink repellency, preferably a contact angle with water of 60 degrees or more, it is preferable because this effect is remarkably obtained. Further, for the same reason as in the sixth embodiment, the contact angle of the exposed photocatalyst containing layer 2 with water is preferably 30 degrees or less, particularly preferably 20 degrees or less.

If the remaining decomposed and removed layer 7 has ink repellency having a high contact angle with water and the exposed photocatalyst containing layer 2 is ink-philic, the colored ink and the like are uniformly distributed in the pixel area. The ink is repelled and removed by the decomposition removal layer 7 which spreads in the exposure unit 9 and acts as an ink-repellent convex portion present at the boundary portion, and does not cause a problem such as mixing. This is the same as the sixth embodiment.

By solidifying this ink in the same manner as in the first embodiment, the pixel portion 5 is formed as shown in FIG. By forming the protective layer 6 on the pixel portion 5, a color filter is completed (FIG. 15).
(F)).

[0238] 4. How to make a color filter without light blocking
Method (Eighth Embodiment) A second example (eighth embodiment) of a method of manufacturing a color filter without a light-shielding portion in a method of manufacturing a color filter using a decomposition removal layer will be described with reference to FIG. .

Also in this example, first, the photocatalyst containing layer 2 is formed on the transparent substrate 1 (FIG. 16A), and then the decomposition removal layer 7 is formed on the photocatalyst containing layer 2 (FIG. 16).
(B)). The photocatalyst containing layer forming step and the wettability changing layer forming step are performed in the same manner as in the fifth embodiment described above.

Next, exposure is performed using a photomask in the same manner as in the seventh embodiment. In the seventh embodiment, the photomask is formed so as to form exposure portions for pixel portions corresponding to all the pixel portions. In the eighth embodiment, a photomask is designed so that every other pixel portion is formed, and the photomask 10 is used to form a portion of the decomposition removal layer 7 where the first pixel portion is formed. Exposure is performed, and this portion is used as a decomposing unit 17 (FIG. 16C).

The decomposition portion 17 is removed by the action of the photocatalyst to form the first pixel portion exposure portion 13 where the photocatalyst containing layer 2 is exposed (FIG. 16D). The first pixel portion exposure section 13 is colored. In the present embodiment, an example in which the coloring is performed using an inkjet method will be described. As shown in FIG. 16 (E), the ink 12 ejects the ink 12 into the exposed portion 13 for the first pixel portion where the photocatalyst-containing layer 2 is exposed by exposure, and the ink 12 is colored, and the ink 12 is cured to form the first portion. The pixel section 14 is assumed. This exposure and coloring of the pixel portion using the ink jet device are performed in the same manner as in the third embodiment except for the shape of the photomask 10. The shape of the photomask 10, the order of printing, and the like are performed in the same manner as in the fourth embodiment.

Next, a photomask 10 ′ different from the first one is formed on the transparent substrate 1 on which the first pixel portion 14 is formed.
Is exposed again so as to expose the second pixel portion forming portion (FIG. 16F). This photomask 10 'is the same as in the fourth embodiment.

Then, after the exposure, the second pixel portion forming portion of the decomposed / removed layer 7 is turned into a decomposed portion 17, and this decomposed portion 17 is removed by the action of a photocatalyst, and the photocatalyst containing layer 2 is exposed to the second pixel portion. The exposure part 15 is formed (FIG. 16
(G)). The ink 12 is jetted to the second pixel portion exposure unit 15 by, for example, the ink jet device 11 to be colored, and is cured to form the second pixel unit 16. This second
The pixel portion 16 is formed so as to fill the space between the first pixel portions 14 (FIG. 16H). This exposure and coloring of the pixel portion using the ink jet device are performed in the same manner as in the third embodiment except for the shape of the photomask 10. Finally, a protective layer 6 is formed to form a color filter (FIG. 16I).

In the eighth embodiment, as described in the fourth embodiment, every other pixel portion is formed so that adjacent inks are not mixed. In the eighth embodiment, the decomposition removal section 7 functions as an ink-repellent convex portion at the time of the first coloring (see FIG. 16 (E)). Is unlikely to occur.

(Formation of Ink-Repellent Convex Parts) In this embodiment, it is possible to form the ink-repellent convex parts in the same manner as described in the fourth embodiment. However, depending on the thickness of the decomposition-removal layer 7, the decomposition-removal layer 2 remaining around the pixel portion may function similarly to the ink-repellent convex portions. This is applicable to any of the fifth to eighth embodiments.

(Formation of Light-Shielding Portion) In the examples shown in the seventh and eighth embodiments, the method of manufacturing a color filter having no light-shielding portion (black matrix) has been described. It is also possible to manufacture a color filter having a light shielding portion by a manufacturing method. This is the same as that described in the fourth embodiment.

E. Liquid Crystal Panel A color liquid crystal panel is formed by combining the thus obtained color filter with a counter substrate facing the color filter and sealing a liquid crystal compound therebetween. At this time, if a light shielding portion (black matrix) is not formed on the color filter side, a corresponding substrate having a light shielding portion is used. The color liquid crystal panel thus obtained has advantages of the color filter of the present invention,
That is, there is an advantage that there is no color dropout or discoloration and the cost is advantageous.

[0248]

EXAMPLES Hereinafter, the present invention will be described in more detail with reference to Examples.

[Example 1] 1. Formation of Photocatalyst-Containing Layer 30 g of isopropyl alcohol and 0.4 g of MF-160E (manufactured by Tochem Products Co., Ltd.) whose main components are fluoroalkylsilane and 3 g of trimethoxymethylsilane (TSL8113 manufactured by Toshiba Silicone Co., Ltd.) 20 g of ST-K01 (produced by Ishihara Sangyo Co., Ltd.), which is an aqueous dispersion of titanium oxide as a photocatalyst, was mixed and stirred at 100 ° C. for 20 minutes. This was diluted three times with isopropyl alcohol to obtain a photocatalyst-containing layer composition.

The above composition was applied on a transparent substrate made of soda glass by a spin coater and dried at 150 ° C. for 30 minutes to form a transparent photocatalyst-containing layer (0.2 μm in thickness).

[0251] 2. Formation of wettability changing layer Silica sol (trade name: Glasca HPC7002, JSR
30 parts by weight and an alkylalkoxysilane (trade name: Glasca HPC402H, JSR Corporation)
Was mixed with stirring for 30 minutes to obtain a composition for a wettability changing layer. This composition was applied to the photocatalyst-containing layer formed on the transparent substrate using a spin coater. Heating was performed at 100 ° C. for 10 minutes to form a wettable layer having a thickness of 0.1 μm.

[0252] 3. Confirmation of formation of ink-philic region by exposure The photocatalyst-containing layer and the wettability changing layer were applied with 70 mW /
Exposure was performed at an illuminance of cm ² for 60 seconds to form an exposed portion. The contact angle of the wettability changing layer with respect to water before and after the exposure was measured using a contact angle measuring device (CA-Z type, manufactured by Kyowa Interface Science Co., Ltd.).
As a result, the contact angle of water before exposure was 97 degrees, while the contact angle of water after exposure was 5 degrees, the exposed portion became an ink-philic region, and the exposed portion and the non-exposed portion It was confirmed that a pattern could be formed due to the difference in wettability with the pattern.

[0253] 4. Next, a photocatalyst-containing layer and a wettability changing layer were formed on the same transparent substrate as described above (corresponding to FIG. 6B). The photocatalyst-containing layer and the wettability changing layer were exposed to light (at an illuminance of 70 mW / cm ² ) using a mercury lamp (wavelength 365 nm) through a light-shielding portion mask provided with a matrix-shaped open pattern (opening line width 30 μm). Seconds)
The light-shielding portion exposure portion was set as an ink-philic region (equivalent to a contact angle of water of 10 degrees or less) (corresponding to FIG. 6C).

On the other hand, a mixture having the following composition was heated and dissolved at 90 ° C., centrifuged at 12,000 rpm, and then filtered through a 1 μm glass filter. To the obtained aqueous colored resin solution, 1% by weight of ammonium bichromate was added as a cross-linking agent to prepare a light-shielding portion paint.

Carbon black (# 950, manufactured by Mitsubishi Chemical Corporation): 4 parts by weight Polyvinyl alcohol: 0.7 parts by weight (Gohsenol AH-26 manufactured by Nippon Synthetic Chemical Co., Ltd.) Ion-exchanged water: 95.3 Parts by weight

Next, the above-mentioned coating material for a light-shielding portion was applied to the entire surface of the photocatalyst-containing layer by a blade coater. The coating material for the light-shielding portion applied in this manner was repelled at the non-exposed portion of the wettability changing layer, and selectively adhered only to the exposed portion for the light-shielding portion.
Thereafter, the coating is dried at 60 ° C. for 3 minutes, and is exposed with a mercury lamp to cure the light-shielding portion paint.
Heat treatment was performed at 150 ° C. for 30 minutes to form a light-shielding portion (corresponding to FIG. 6D).

[0257] 5. Next, the entire surface of the photocatalyst-containing layer on which the light-shielding portion was formed was exposed to light, and the exposed portion for the pixel portion was rendered ink-philic. Next, using an ink jet device, a UV-curable polyfunctional acrylate monomer ink of each color of RGB including 5 parts by weight of a pigment, 20 parts by weight of a solvent, 5 parts by weight of a polymerization initiator, and 70 parts by weight of a UV-curable resin was prepared. It was attached to the exposed portion for the pixel portion, which was colored, and was subjected to UV treatment and cured. Here, for each of the red, green, and blue inks, polyethylene glycol monomethylethyl acetate was used as a solvent, and Irgacure 369 was used as a polymerization initiator (trade name,
Ciba Specialty Chemicals Co., Ltd.), UV
DPHA (dipentaerythritol hexaacrylate (Nippon Kayaku Co., Ltd.)) was used as the cured resin. As for the pigment, CI Pigmen for red ink
t Red 177, CI Pigment Green for green ink
36, CI Pigment Blue 15 + for blue ink
CI Pigment Violet 23 was used.

[0258] 6. Formation of Protective Layer As a protective layer, a two-component mixed type thermosetting agent (SS7265 manufactured by Nippon Synthetic Rubber Co., Ltd.) is applied by a spin coater and cured at 200 ° C. for 30 minutes to form a protective layer. I got

The obtained color filter was of high quality without color loss or color unevenness in the pixel portion.

[Example 2] Formation of Photocatalyst-Containing Layer A photocatalyst-containing layer was formed using the same materials as in Example 1.

[0261] 2. Formation of decomposition removal layer Polyvinyl alcohol (trade name: Gohsenol AH-2)
6, Nippon Synthetic Chemical Co., Ltd.) 2 parts by weight and 98 parts by weight of ion-exchanged water were stirred and mixed at 100 ° C. for 30 minutes.
For 10 minutes. Thus, a decomposition removal layer having a thickness of 0.1 μm was formed.

[0262] 3. Confirmation of formation of ink-philic region by exposure The photocatalyst-containing layer and the decomposed / removed layer were placed on the decomposed / removed layer side with a mercury lamp (wavelength 365 nm) at 70 mW / cm
Pattern exposure was performed at an illuminance of ² for 5 minutes to form an exposed portion (decomposed portion). This decomposed portion was decomposed and removed by the action of the photocatalyst, exposing the photocatalyst-containing layer. The contact angle of water between the photocatalyst surface before and after exposure, that is, after the exposure, and the decomposition removal layer surface before the exposure is measured using a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science Co., Ltd.) (micro syringe As a result, the contact angle of water before exposure (surface of the decomposed / removed layer) was 70 degrees, whereas the contact angle of water after exposure (surface of the photocatalyst containing layer) was 5 seconds. It was confirmed that the exposed portion became an ink-philic region and that pattern formation was possible due to the difference in wettability between the exposed portion and the non-exposed portion.

[0263] 4. Next, a matrix-shaped opening pattern (opening 100 × 300 μm) was applied to the photocatalyst-containing layer and the decomposition removal layer.
m, light exposure (70 mW / cm) using a mercury lamp (wavelength 365 nm) through a pixel portion mask provided with a light-shielding portion 20 μm.
5 minutes at an illuminance of ² ) to form a decomposed part. This disassembled portion was removed by the action of the photocatalyst to serve as a pixel portion exposure portion where the photocatalyst-containing layer was exposed. The surface of the photocatalyst-containing layer exposed in the pixel portion exposure portion has a contact angle with water of 1
The parent ink area was 0 degrees or less.

Next, using the same materials as in Example 1, ink of each color of RGB was attached to the exposed portion for the pixel portion, which was made ink-philic, by an ink jet device and colored, and UV treatment was performed. And cured to form a pixel portion.

[0265] 5. Formation of Protective Layer Using the same material as in Example 1, a protective layer was formed in the same manner to obtain a color filter. The obtained color filter was of high quality without color omission or color unevenness in the pixel portion.

Note that the present invention is not limited to the above embodiment. The above embodiment is an exemplification, and has substantially the same configuration as the technical idea described in the scope of the claims of the present invention. It is included in the technical scope of the invention.

For example, in the description of the above embodiment, the example in which the coloring means is mainly performed by the ink jet method has been described. However, the present invention is not limited to these, and other methods such as a coating method may be used. Good.

In the description of the above embodiment, the pixel portion is mainly colored by the ink jet method, and as a result, only a photocatalyst containing layer and a wettability changing layer or a decomposition removal layer are formed on a transparent substrate. However, the present invention is not limited to this. For example, three layers each for a red pixel portion, a green pixel portion, and a blue pixel portion may be formed. That is, first, a photocatalyst containing layer and a wettability changing layer or a decomposition removal layer are formed, and after pattern exposure, a red pixel portion is formed, and a photocatalyst containing layer and a wettability changing layer or a decomposition removal layer are further formed thereon. After pattern exposure, a green pixel portion is formed, and a photocatalyst containing layer and a wettability changing layer or a decomposition removal layer are further formed thereon. After pattern exposure, the blue pixel portion is formed. The present invention also includes a color filter formed with the above and such a manufacturing method.

[0269]

According to the present invention, a transparent substrate, a photocatalyst containing layer provided on the transparent substrate and containing a photocatalyst, and a photocatalyst containing layer provided on the photocatalyst containing layer are wetted by the action of the photocatalyst in the photocatalyst containing layer. This is a color filter having a wettability changing layer whose property is changed, and a pixel portion provided on the wettability changing layer and provided with a plurality of colors in a predetermined pattern.

As described above, in the present invention, the pixel portion is provided on the wettability changing layer in which the wettability can be changed by the action of the photocatalyst in the photocatalyst containing layer. Therefore, by pattern exposure of the wettability changing layer,
The ink-philic region and the ink-repellent region can be easily formed, and the pixel portion can be easily formed by coloring the ink-philic region.

Further, the present invention provides a color filter having a transparent substrate and a pixel portion in which a plurality of colors are provided in a predetermined pattern on the transparent substrate, wherein a photocatalyst-containing layer containing a photocatalyst on the transparent substrate; A photocatalyst-containing layer, which is provided on the photocatalyst-containing layer and has a decomposition-removal layer that can be decomposed and removed by the action of the photocatalyst in the photocatalyst-containing layer, and a surface of the photocatalyst-containing layer exposed when the decomposition-removal layer is decomposed and removed. The color filters have different contact angles of water with the color filters.

As described above, by providing the photocatalyst containing layer with the decomposition removal layer which can be decomposed and removed by the action of the photocatalyst in the photocatalyst containing layer, the exposed portion is decomposed and removed by the action of the photocatalyst. Therefore, the exposed portion exposes the photocatalyst-containing layer to the surface, and the unexposed portion leaves the decomposition removal layer. Here, since the decomposition removal layer and the exposed photocatalyst containing layer have different contact angles of water, for example, the decomposition removal layer is formed of an ink-repellent material, and the photocatalyst containing layer is formed of an ink-philic material. Then, by irradiating light to a portion where a pixel portion is to be formed in advance and causing a photocatalyst to act to remove the decomposition removal layer in that portion, the exposed portion becomes an ink-philic region, and the unexposed portion becomes an ink-repellent region. Become. Thereby, the wettability of the portion where the pixel portion is provided in advance can be an ink-philic region having a small contact angle with water, and the other portion can be an ink-repellent region having a large contact angle of water. By coloring the portion of the lipophilic region where the pixel portion is provided, the ink adheres only to the lipophilic region having a small contact angle with water. Therefore,
Similar to the above-described color filter having a wettability changing layer, a pixel portion can be formed by performing pattern exposure and coloring, and there is no need to perform a developing process and a washing process each time a colored pattern is formed for each color pixel portion.

As described above, the process can be easily simplified in any color filter, and the obtained color filter is inexpensive, high-definition, and free from defects such as white spots. It has.

[Brief description of the drawings]

FIG. 1 is a schematic sectional view showing an example of a color filter of the present invention having a wettability changing layer and having a light shielding portion.

FIG. 2 is a schematic cross-sectional view showing another example of the color filter of the present invention having a wettability changing layer and having a light shielding portion.

FIG. 3 is a schematic cross-sectional view showing an example of the color filter of the present invention having a wettability changing layer and having no light shielding portion.

FIG. 4 is a schematic cross-sectional view showing an example of a color filter of the present invention having a decomposition removal layer and having a light shielding portion.

FIG. 5 is a schematic cross-sectional view showing an example of the color filter of the present invention having a decomposition removal layer and having no light shielding portion.

FIGS. 6A to 6G are process diagrams for explaining an example of a method for manufacturing a color filter of the present invention having a wettability changing layer and having a light-shielding portion.

FIGS. 7A to 7E are process diagrams for explaining another example of a method for manufacturing a color filter of the present invention having a wettability changing layer and having a light shielding portion.

8A and 8B are schematic diagrams for explaining an exposure method in the manufacturing method shown in FIG.

FIGS. 9A to 9E are process diagrams illustrating an example of a method for manufacturing a color filter of the present invention having a wettability changing layer and having no light-shielding portion.

10 (A) to 10 (F) each have a wettability changing layer,
It is a flowchart for explaining another example of a manufacturing method of a color filter of the present invention which does not have a light shielding part.

FIG. 11 is a schematic plan view showing a first pixel portion and a second pixel portion in the manufacturing method shown in FIG.

FIG. 12 is a schematic plan view showing an example of a photomask used in the method for manufacturing a color filter of the present invention.

FIGS. 13A to 13I are process diagrams for explaining an example of a method for manufacturing a color filter of the present invention using a decomposition removal layer and having a light-shielding portion.

FIGS. 14A to 14F are process diagrams for explaining an example of a method for manufacturing a color filter of the present invention having a decomposition removal layer and having a light-shielding portion.

FIGS. 15A to 15F are process diagrams illustrating an example of a method for manufacturing a color filter of the present invention having a decomposition removal layer and no light-shielding portion.

FIGS. 16A to 16I are process diagrams illustrating an example of a method for manufacturing a color filter of the present invention using a decomposition removal layer and having no light-shielding portion.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Transparent board | substrate, 2 ... Photocatalyst containing layer, 3 ... Wettability change layer, 4 ... Light shielding part, 5 ... Pixel part, 6 ... Protective layer, 7 ...
8: Exposure section for light-shielding section, 9: Exposure section for pixel section, 10, 10 ': Photomask, 11: Inkjet apparatus, 12: Ink, 13: Exposure section for first pixel section, 14: No. 1 pixel section, 15 exposure section for second pixel section,
16: second pixel portion, 17: decomposition portion.

 ────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Manabu Yamamoto 1-1-1, Ichigaya-Kaga-cho, Shinjuku-ku, Tokyo F-term in Dai Nippon Printing Co., Ltd. (reference) 2C056 FB01 FB08 2H048 BA02 BA12 BB02 BB42 2H091 FA02Y FA34Y FB02 FB04 FC01 FC10 FC23 FC25 GA03 LA12 LA16

Claims (36)

[Claims] 1. A transparent substrate, a photocatalyst containing layer provided on the transparent substrate and containing a photocatalyst, and provided on the photocatalyst containing layer, and the wettability is changed by the action of the photocatalyst in the photocatalyst containing layer. A color filter, comprising: a wettability changing layer; and a pixel portion provided on the wettability changing layer and provided with a plurality of colors in a predetermined pattern. 2. The color filter according to claim 1, further comprising a light-shielding portion located at a boundary of said pixel portion. 3. The color filter according to claim 2, wherein said light shielding portion is also formed on said wettability changing layer. 4. The wettability changing layer, wherein the wettability changing layer changes the wettability by the action of a photocatalyst in the photocatalyst-containing layer at the time of exposure so that the contact angle of water is reduced by the exposure. The color filter according to any one of claims 1 to 3, wherein 5. The color according to claim 4, wherein a contact angle of water on the wettability changing layer is 90 ° or more in an unexposed portion and 30 ° or less in an exposed portion. filter. 6. The color filter according to claim 4, wherein the wettability changing layer is a layer containing an organopolysiloxane. 7. The method according to claim 1, wherein the organopolysiloxane is Y _n S
iX _(4-n) (where Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, and X represents an alkoxyl group or a halogen.
n is an integer from 0 to 3. 7. The color filter according to claim 6, which is an organopolysiloxane which is one or more hydrolytic condensates or cohydrolytic condensates of the silicon compound represented by the formula (1). 8. A color filter having a transparent substrate and a pixel portion in which a plurality of colors are provided in a predetermined pattern on the transparent substrate, wherein a photocatalyst-containing layer containing a photocatalyst on the transparent substrate; A decomposition removal layer that can be decomposed and removed by the action of the photocatalyst in the photocatalyst-containing layer, and water between the decomposition-removal layer and the surface of the photocatalyst-containing layer exposed when the decomposition-removal layer is decomposed and removed. A color filter characterized by different contact angles. 9. The color filter according to claim 8, further comprising a light-shielding portion located at a boundary of said pixel portion. 10. The contact angle of water on the decomposition removal layer is 60.
10. The color filter according to claim 8, wherein the contact angle of water on the surface of the photocatalyst-containing layer exposed when the decomposition removal layer is decomposed and removed is 30 degrees or less. . 11. The color filter according to claim 10, wherein the decomposition removal layer is a hydrocarbon-based, fluorine-based, or silicone-based nonionic surfactant. 12. The photocatalyst contained in the photocatalyst containing layer is titanium oxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ), strontium titanate (SrT).
a material selected from the group consisting of iO ₃ ), tungsten oxide (WO ₃ ), bismuth oxide (Bi ₂ O ₃ ), and iron oxide (Fe ₂ O ₃ ). The color filter according to any one of claims 1 to 11. 13. The photocatalyst according to claim 1, wherein said photocatalyst is titanium oxide (TiO ₂ ).
The color filter according to claim 12, wherein 14. The pixel unit according to claim 1, wherein the pixel unit is formed by an ink-jet method.
The color filter according to claim 1. 15. The color filter according to claim 14, wherein the pixel portion formed by the inkjet method uses a UV curable ink. 16. A step of (1) forming a photocatalyst-containing layer on a transparent substrate, and (2) forming a photocatalyst-containing layer on the photocatalyst-containing layer by the action of the photocatalyst in the photocatalyst-containing layer. Providing a wettability changing layer that changes in the direction in which the contact angle decreases, and (3) forming a light-shielding portion exposure portion by pattern-exposing a portion of the wettability changing layer on which the light-shielding portion is to be formed. (4) a step of applying a light-shielding portion paint to the light-shielding portion exposure portion to provide a light-shielding portion; and (5) exposing the substrate provided with the light-shielding portion to form no light-shielding portion. A color filter comprising: a step of exposing a portion of the wettability changing layer to form an exposed portion for a pixel portion; and (6) a step of coloring the exposed portion for a pixel portion to form a pixel portion. Manufacturing method. 17. A step of (1) forming a photocatalyst-containing layer containing a photocatalyst on a surface of a transparent substrate on which a light-shielding portion is formed, on a surface on which the light-shielding portion is formed; ,
Providing a wettability changing layer in which the wettability of the exposed portion changes in the direction of decreasing the contact angle of water by the action of the photocatalyst in the photocatalyst containing layer; and (3) forming a pixel portion on the wettability changing layer A method for producing a color filter, comprising: a step of exposing a portion to form an exposure portion for a pixel portion; and (4) a step of coloring the exposure portion for a pixel portion to form a pixel portion. 18. The method for manufacturing a color filter according to claim 17, wherein the light-shielding portion is used as a mask to expose from a transparent substrate side where no light-shielding portion is formed to form an exposure portion for a pixel portion. 19. The method according to claim 17, wherein a width of the pixel portion formed on the transparent substrate is wider than an opening formed by the light shielding portion. 20. (1) forming a photocatalyst-containing layer containing a photocatalyst on a transparent substrate; and (2) forming a photocatalyst-containing layer on the photocatalyst-containing layer by the action of the photocatalyst in the photocatalyst-containing layer. Providing a wettability changing layer that changes in the direction in which the contact angle decreases, and (3) exposing a portion for forming a pixel portion on the substrate provided with the wettability changing layer to form an exposure portion for the pixel portion. Forming a pixel portion, and (4) coloring the exposed portion for the pixel portion to form a pixel portion. 21. A step of (1) forming a photocatalyst-containing layer containing a photocatalyst on a transparent substrate; and (2) forming a photocatalyst-containing layer on the photocatalyst-containing layer by the action of the photocatalyst in the photocatalyst-containing layer so that the wettability of the exposed portion is water. (3) providing a wettability changing layer that changes in the direction in which the contact angle decreases, and (3) exposing a part of a portion forming a pixel portion on the wettability changing layer to form an exposure portion for a first pixel portion. Forming the first pixel portion; (4) coloring the exposed portion for the first pixel portion to form a first pixel portion; and (5) forming a portion on the photocatalyst-containing layer where the first pixel portion is not formed. Exposing to form a second pixel portion exposure portion; and (6) forming the second pixel portion exposure portion.
Forming a second pixel portion by coloring the exposed portion for the pixel portion to form a second pixel portion. 22. Before forming the exposure portion for the pixel portion,
21. An ink-repellent convex portion for forming an ink-repellent convex portion, wherein a convex portion is formed by using a resin composition in the convex portion exposed portion. Item 22. A method for producing a color filter according to item 21. 23. The method for manufacturing a color filter according to claim 20, wherein a light shielding portion is formed after forming the pixel portion. 24. A contact angle of water on the wettability changing layer is as follows:
The method for manufacturing a color filter according to any one of claims 16 to 23, wherein the angle is 90 degrees or more in an unexposed portion and 30 degrees or less in an exposed portion. 25. A step of (1) forming a photocatalyst-containing layer on a transparent substrate, and (2) a decomposition-removal layer on the photocatalyst-containing layer which can be decomposed and removed by the action of the photocatalyst in the photocatalyst-containing layer. And (3) exposing a portion forming the light-shielding portion on the decomposition removal layer, exposing and removing the portion to form an exposure portion for the light-shielding portion, and (4) forming an exposure portion for the light-shielding portion. A step of applying a light-shielding portion paint to provide a light-shielding portion, and (5) exposing the substrate provided with the light-shielding portion to expose and decompose and remove the decomposed and removed layer in a portion where the light-shielding portion is not formed. And (6) forming a pixel portion by coloring the exposed portion for the pixel portion, thereby forming a pixel portion. 26. A step of (1) forming a photocatalyst-containing layer containing a photocatalyst on the surface of the transparent substrate on which the light-shielding portion is formed, on the surface on which the light-shielding portion is formed; ,
Providing a decomposition removal layer that can be decomposed and removed by the action of the photocatalyst in the photocatalyst-containing layer; and (3) exposing and decomposing and removing a portion of the decomposition removal layer on which a pixel portion is to be formed to expose the pixel portion. And (4) forming a pixel portion by coloring the exposed portion for the pixel portion to form a pixel portion. 27. The method for manufacturing a color filter according to claim 26, wherein the light-shielding portion is used as a mask to expose from a transparent substrate side on which the light-shielding portion is not formed to form an exposure portion for a pixel portion. 28. The method according to claim 26, wherein a width of the pixel portion formed on the transparent substrate is wider than an opening formed by the light shielding portion. 29. (1) a step of forming a photocatalyst-containing layer on a transparent substrate, and (2) a decomposition removal layer on the photocatalyst-containing layer which can be decomposed and removed by the action of the photocatalyst in the photocatalyst-containing layer. And (3) exposing a portion of the substrate on which the decomposition removal layer is provided to form a pixel portion to form a pixel portion exposure portion; and (4) forming a pixel portion exposure portion. Coloring and forming a pixel portion. 30. (1) a step of forming a photocatalyst containing layer on a transparent substrate, and (2) a decomposition removal layer on the photocatalyst containing layer which can be decomposed and removed by the action of the photocatalyst in the photocatalyst containing layer. And (3) forming a first pixel portion exposure portion by exposing and decomposing and removing a part of a portion forming a pixel portion on the decomposition removal layer;
(4) a step of coloring the exposed portion for the first pixel portion to form a first pixel portion; and (5) exposing the decomposition removal layer on the photocatalyst-containing layer where the first pixel portion is not formed. Forming an exposed portion for the second pixel portion by decomposing and removing;
(6) forming a second pixel portion by coloring the exposed portion for the second pixel portion to form a second pixel portion. 31. The light-shielding part is formed after the pixel part is formed.
3. The method for producing a color filter according to item 1. 32. The method according to claim 25, wherein the contact angle of water between the decomposition removal layer and the surface of the photocatalyst-containing layer exposed when the decomposition removal layer is removed is different.
The method for manufacturing a color filter according to claim 1. 33. A contact angle of water on the decomposition removal layer is 60.
33. The method for producing a color filter according to claim 32, wherein the contact angle of water of the photocatalyst-containing layer exposed by decomposition-removal of the decomposition removal layer is 30 degrees or less. 34. The method for manufacturing a color filter according to claim 16, wherein the coloring of the exposed portion for the pixel portion is performed by an ink-jet method. 35. The method according to claim 3, wherein the coloration of the exposed portion for the pixel portion by the ink jet method is performed by the ink jet method using a UV curable ink.
5. The method for producing a color filter according to item 4. 36. A color filter according to claim 1, further comprising a substrate facing the color filter, wherein a liquid crystal compound is sealed between the two substrates. LCD panel.